Design pattern and photomask plate for laser exposure machine

Abstract

The utility model discloses a design pattern for a laser exposure machine and a photomask. The design pattern comprises a pattern and a correction pattern. The first edge and the second edge of the pattern intersect and are perpendicular to each other, a corner is formed at the intersection, a circle is drawn with the corner as the circle center and a preset length as the radius, and a formed circular area is a corner area. The correction pattern partially coincides with the corner area, the circular area is internally tangent to at least two edges of the correction pattern, the contour of the pattern located in the corner area extends and expands in the direction away from the center of the pattern, and the expanded contour and the contour of the pattern in the corner area form the contour of the correction pattern. Or, the outline of the graph located in the corner area extends and shrinks inwards from the outline of the corner area in the direction close to the center of the graph, and the inwards-contracted outline and the outline of the graph in the corner area form the outline of the corrected graph. Therefore, the fidelity of the angle can be improved, the angle can pass inspection under the condition of high sensitivity, the production cost is reduced, and the production efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor exposure, in particular to a design pattern and a photomask plate used for a laser exposure machine. Background Art

[0002] In the mask manufacturing process, the light sources used for exposure are divided into laser beams and electron beams. When using laser beams, because the laser beam light source is larger than the electron beam light source, when exposing the corners of some graphics, the actual exposure effect is quite different from the target effect in the exposure file, which in turn causes trouble for back-end inspection and even makes inspection impossible.

[0003] The current solution is to check the graphics to be exposed in advance, transfer the graphics that are prone to the above-mentioned exposure problems to an electron beam machine for exposure, or reduce the sensitivity of the inspection machine when inspecting the exposed product to avoid the situation where the inspection cannot be performed. However, manual inspection of the graphics to be exposed requires confirmation of the inspection results and selection of a machine for exposure in advance. This process is cumbersome and will affect production efficiency. In addition, products that are prone to this problem are generally not of high grade, and because of this problem, the use of an electron beam machine for exposure will also affect the working efficiency of the machine. In addition, there are risks in manually determining the inspection results. If the wrong machine is selected, the product may be scrapped, affecting shipment. Summary of the invention

[0004] In view of the above-mentioned shortcomings of the prior art, the purpose of the utility model is to provide a design pattern and a photomask for a laser exposure machine, which can correct the contour of the pattern corners during exposure, so as to facilitate the back-end inspection of the exposed pattern product.

[0005] In order to achieve the above-mentioned and other related purposes, the utility model provides a design pattern for a laser exposure machine, comprising:

[0006] A figure, comprising a first side and a second side, the first side and the second side intersect and are perpendicular to each other, and form a corner at the intersection, a circle is drawn with the corner as the center and a preset length less than the length of the first side and less than the length of the second side as the radius, and the circular area formed is the corner area;

[0007] The corrected figure partially overlaps with the corner area, and the circular area is inscribed in at least two sides of the corrected figure. The outline of the figure located in the corner area extends and expands in a direction away from the center of the figure, and the figure forms a designed figure after expansion; the expanded outline and the outline of the figure in the corner area constitute the outline of the corrected figure; or, the outline of the figure located in the corner area extends and retracts from the outline of the corner area in a direction close to the center of the figure, and the figure forms a designed figure after retraction, and the retracted outline and the outline of the figure in the corner area constitute the outline of the corrected figure.

[0008] Optionally, the corner is formed as an outer corner, which protrudes from the outline of the figure toward the outside of the figure.

[0009] Optionally, the corrected figure is translated a distance X from the first edge in the corner region in a direction perpendicular to the first edge toward a direction away from the figure, a distance Y from the second edge in the corner region in a direction perpendicular to the second edge toward a direction away from the figure, and a distance Z from the corner in the corner region in a direction along the diagonal between the first edge and the second edge toward a direction away from the figure.

[0010] Optionally, the corner is formed as an inner corner, and the inner corner protrudes from the outline of the figure toward the inside of the figure.

[0011] Optionally, the corrected figure is translated a distance X from the first edge of the corner region in a direction perpendicular to the first side toward the direction close to the figure, translated a distance Y from the second edge of the corner region in a direction perpendicular to the second side toward the direction close to the figure, and translated a distance Z from the corner in the corner region along the direction of the diagonal between the first side and the second side toward the direction away from the figure.

[0012] Optionally, the graphic comprises four outer corners.

[0013] Optionally, the graphic comprises at least one inner corner.

[0014] Optionally, the translation distance X occupies 1 / 100 to 12 / 100 of the width L of the graphic, the translation distance Y occupies 1 / 100 to 12 / 100 of the width L of the graphic, and the translation distance Z is greater than or equal to the translation distance X and the translation distance Y.

[0015] Optionally, the preset length occupies 1 / 10 to 1 / 2 of the width L of the graphic.

[0016] According to one aspect of the utility model, a photomask is also provided, comprising the above-mentioned design pattern, and the photomask is used in a laser exposure machine.

[0017] Compared with the prior art, the design pattern and photomask for laser exposure machine described in the utility model have at least the following beneficial effects:

[0018] The design figure in the utility model includes a figure and a correction figure. The figure includes a first side and a second side, the first side and the second side intersect and are perpendicular to each other, and form a corner at the intersection. A circle is drawn with the corner as the center and a preset length that is less than the length of the first side and less than the length of the second side as the radius, and the circular area formed is the corner area. The correction figure partially overlaps with the corner area, and the circular area is inscribed with at least two sides of the correction figure. The outline of the figure located in the corner area extends and expands in a direction away from the center of the figure, and the figure is expanded to form a design figure. The expanded outline and the outline of the figure in the corner area constitute the outline of the correction figure. Alternatively, the outline of the figure located in the corner area extends and retracts from the outline of the corner area in a direction close to the center of the figure, and the figure is retracted to form the design figure, and the retracted outline and the outline of the figure in the corner area constitute the outline of the correction figure. Therefore, the utility model can avoid the operation of a turntable. By enhancing the angle, additional features are added to the angle (positive or negative, i.e., outward expansion or inward contraction). Additional auxiliary correction graphics are added to assist in exposure according to whether the exposed feature is an inner angle or an outer angle, thereby increasing the fidelity of the angle and allowing it to pass inspection under high sensitivity conditions. This can reduce production costs and improve production efficiency.

[0019] The photomask in the utility model includes the above-mentioned design pattern and also has the above-mentioned technical effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1a and 1b It is a graphic photograph of a graphic with a corner after being exposed by a laser beam in the prior art;

[0021] Figure 1c It is a graphic photograph after being corrected by a correction function and exposed by a laser beam in the prior art;

[0022] Figure 2 It is a structural schematic diagram of a design figure in an embodiment of the utility model;

[0023] Figure 3 It is a structural schematic diagram of another design graphic in an embodiment of the utility model;

[0024] Figure 4 In order to adopt the embodiment of the utility model Figure 2 A photograph of the design pattern shown after laser beam exposure;

[0025] Figure 5 In order to adopt the embodiment of the utility model Figure 3 A photograph of the design pattern shown after laser beam exposure.

[0026] List of reference numerals:

[0027] 001 Curved Corner

[0028] 002 Corner

[0029] 100 Graphics

[0030] 101 First Side

[0031] 102 Second Side

[0032] 200 Corrected graphics DETAILED DESCRIPTION

[0033] The following is a specific embodiment of the present invention. People familiar with the technology can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments. The details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present application. It should be noted that the following embodiments and features in the embodiments can be combined with each other without conflict.

[0034] It should be noted that the illustrations provided in the embodiments of the present invention are only used to illustrate the basic concept of the present invention in a schematic manner. Although the illustrations only show the components related to the present invention and are not drawn according to the number, shape and size of the components in actual implementation, the form, quantity and proportion of each component can be changed at will during actual implementation, and the layout of the components may also be more complex. The structures, proportions, sizes, etc. illustrated in the drawings of the specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the limiting conditions that can be implemented in this application, so they have no technical substantive significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed in this application without affecting the effects and purposes that can be achieved by the present invention.

[0035] Reference Figure 1a and Figure 1b In the prior art, when a laser beam is used for exposure, if there is a 90° corner on the exposure pattern, the pattern will have different degrees of curvature at each corner after exposure, for example, a curved corner 001. This curvature will cause trouble for subsequent inspection.

[0036] In addition to the solutions in the background art, it is also possible to add a corner correction function to the exposure machine or use a device with a corner correction function to perform exposure correction. However, this function or the machine with this function is expensive, and the corner repair area is not smooth and detailed enough. Figure 1c shown.

[0037] In order to solve the background technology and the above technical problems, this embodiment provides a design pattern and a photomask for a laser exposure machine. The above design pattern or photomask can avoid the problem that a large curvature appears at the corner of the pattern after exposure when a laser beam is used for exposure, thereby affecting subsequent inspection. At the same time, it can also improve work efficiency, product yield, and reduce production costs.

[0038] The present invention is described in detail below in conjunction with specific embodiments.

[0039] Example 1

[0040] This embodiment provides a design pattern for a laser exposure machine. Figure 2 Or 3, the design figure includes a figure 100 and a modified figure 200. The figure 100 includes at least a first side 101 and a second side 102, the first side 101 and the second side 102 intersect and are perpendicular to each other, and form a corner at the intersection. Generally, the corner includes an inner corner and an outer corner, wherein the outer corner protrudes from the outline of the figure 100 to the outside direction of the figure 100. The inner corner protrudes from the outline of the figure 100 to the inside direction of the figure 100. Optionally, the figure 100 can be a square, a rectangle or an L-shaped figure. In the present embodiment, a square and an L-shaped figure are selected as examples for illustration. Among them, the square figure includes four outer corners, and the L-shaped figure includes an inner corner and four outer corners.

[0041] A corner area is selected, and a correction figure 200 is formed at the corner area. Specifically, a circle is drawn with a preset length less than the length of the first side 101 and less than the length of the second side 102 as the radius, with the intersection of the corners as the center. The circular area (the dotted circle in the figure) formed is the corner area. Optionally, the preset length (i.e., the radius R of the circle) occupies 1 / 10 to 1 / 2 of the width L of the figure 100. In this embodiment, refer to Figure 2 When the pattern 100 is a square, the radius R can be 1 / 10 to 1 / 2 of the side length of the square (that is, the width L of the pattern) to form a corner area. Figure 3 When the graphic 100 is L-shaped, a corner area is formed with a radius R of 1 / 10 to 1 / 2 of the width of the L-shaped graphic.

[0042] The correction figure 200 partially overlaps with the corner area (the dotted circle in the figure), and the circle of the corner area is inscribed with at least two sides of the correction figure 200 .

[0043] In one example, refer to Figure 2, the graphic 100 is a square, and the square graphic 100 includes four corner regions. The outline of the graphic 100 located in the corner region extends and expands in a direction away from the center of the graphic 100, and the graphic 100 is expanded to form a design graphic. The expanded outline and the outline of the graphic 100 in the corner region constitute the outline of the modified graphic 200. Among them, the side length of the square graphic 100 is also the width L of the graphic 100. The modified graphic 200 is translated by a distance X from the endpoint of the first side 101 in the corner region in a direction perpendicular to the first side 101 in a direction away from the graphic 100, and by a distance Y from the endpoint of the second side 102 in the corner region in a direction perpendicular to the second side 102 in a direction away from the graphic 100, and by a distance Z from the corner of the graphic in the corner region in a direction perpendicular to the diagonal of the square graphic, and the endpoint of the first side 101 and the extension point of the endpoint, the extension point of the corner, the extension point of the endpoint of the second side 102, and the endpoint of the second side 102 are sequentially connected, and the modified graphic 200 is formed with the contour of the graphic in the corner region, which can be understood as the contour of the modified graphic 200 is expanded outward along the contour in the corner region to obtain the design graphic. Optionally, the translation distance X occupies 1 / 100 to 12 / 100 of the width L of the graphic 100, and the translation distance Y occupies 1 / 100 to 12 / 100 of the width L of the graphic 100. Optionally, the value of the translation distance Z is greater than or equal to the value of X or the value of Y. Optionally, Z 2 =X 2 +Y 2 Optionally, the R value is greater than or equal to the X value or the Y value. Optionally, the X value is equal to the Y value.

[0044] For example, in a specific example, when the L value of the square graphic 100 is 1.8 μm, the X value is 0.17 μm, the Y value is 0.17 μm, and the R value is 0.17 μm; or, the X value is 0.07 μm, the Y value is 0.07 μm, and the R value is 0.17 μm; or, the X value is 0.07 μm, the Y value is 0.07 μm, and the R value is 0.14 μm.

[0045] When the L value of the square pattern 100 is 1 μm, the X value is 0.215 μm, the Y value is 0.215 μm, and the R value is 0.215 μm. The laser beam exposure is performed using the designed pattern to obtain the following Figure 4 As shown in the figure, it can be seen Figure 4 The corner 002 in the figure has clearer edges, and the corner area repair effect is smoother and more delicate, with better fidelity. When the figure is inspected at the back end, it can be inspected by the defect detection equipment when the defect sensitivity (DB sensitivity) is 80 when the defect is captured.

[0046] In one example, refer to Figure 3The graphic 100 is an L-shaped graphic 100, and the L-shaped graphic 100 includes an inner corner area, and other outer corner areas and Figure 2 The example in is the same, and will not be repeated here. Among them, the outline of the figure 100 in the corner area of ​​the L-shaped figure 100 located at the inner corner extends and retracts from the outline of the corner area in the direction close to the center of the figure 100, and the figure 100 is retracted to form a design figure, and the retracted outline and the outline of the figure 100 in the corner area constitute the outline of the modified figure 200. The width of the L-shaped figure 100 is L. The modified figure 200 is translated from the end point of the first side 101 of the corner area in a direction perpendicular to the first side 101 to the direction close to the figure 100 by a distance X, from the end point of the second side 102 of the corner area in a direction perpendicular to the second side 102 to the direction close to the figure 100 by a distance Y, and from the corner of the corner area in a direction along the diagonal line of the first side 101 and the second side 102 to the direction close to the figure 100 by a distance Z. The endpoint of the first side 101 and the extension point of the endpoint, the extension point of the corner, the extension point of the endpoint of the second side 102, and the endpoint of the second side 102 are connected in sequence, and together with the outline of the graphic in the corner area, a modified graphic 200 is formed. This can be understood as obtaining a designed graphic after the outline of the graphic 100 in the corner area is indented into the outline of the modified graphic 200. Optionally, the translation distance X occupies 1 / 100 to 12 / 100 of the width L of the graphic 100, and the translation distance Y occupies 1 / 100 to 12 / 100 of the width L of the graphic 100. Optionally, the value of the translation distance Z is greater than or equal to the value of X or the value of Y. Optionally, Z 2 =X 2 +Y 2 Optionally, the R value is greater than or equal to the X value or the Y value. Optionally, the X value is equal to the Y value.

[0047] For example, in a specific example, when the L value of the L pattern 100 is 1 μm, the X value is 0.115 μm, the Y value is 0.115 μm, and the R value is 0.215 μm.

[0048] When the L value of the L pattern 100 is 2 μm, the X value is 0.04 μm, the Y value is 0.04 μm, and the R value is 0.14 μm. The laser beam exposure is performed using the designed pattern to obtain the following Figure 5 As shown in the figure, it can be seen Figure 5 The corner 002 in the image has a clearer edge and better fidelity. When the image is tested at the back end, it can pass the test at a DB sensitivity of 80.

[0049] When the design pattern in this embodiment is used for laser beam exposure, the correction pattern can be used to assist the exposure, increase the fidelity of the angle, and pass the inspection under high sensitivity. At the same time, the operation of rotating the machine table for exposure can be avoided, which can reduce production costs and improve production efficiency.

[0050] Example 2

[0051] This embodiment also provides a photomask, which includes the design pattern in the above-mentioned embodiment 1 and can be used to expose a semiconductor wafer to form a semiconductor wafer with a pattern structure.

[0052] When the above-mentioned design pattern is set on a photomask and a laser beam is used to expose through the photomask with the design pattern, the exposure can be assisted by correcting the pattern to increase the fidelity of the angle so that it can pass the inspection under high sensitivity conditions, thereby reducing production costs and improving production efficiency.

[0053] In summary, the design graphics in the utility model include graphics and correction graphics. The graphics include a first side and a second side, the first side and the second side intersect and are perpendicular to each other, and form a corner at the intersection. A circle is drawn with the corner as the center and a preset length that is less than the length of the first side and less than the length of the second side as the radius, and the circular area formed is the corner area. The correction graphics partially overlap with the corner area, and the circular area is inscribed with at least two sides of the correction graphics. The outline of the graphics located in the corner area extends and expands in a direction away from the center of the graphics, and the graphics is expanded to form a design graphics. The expanded outline and the outline of the graphics in the corner area constitute the outline of the correction graphics. Alternatively, the outline of the graphics located in the corner area extends and retracts from the outline of the corner area in a direction close to the center of the graphics, and the graphics is retracted to form the design graphics, and the retracted outline and the outline of the graphics in the corner area constitute the outline of the correction graphics. Therefore, the utility model can avoid the operation of a turntable. By enhancing the angle, additional features are added to the angle (positive or negative, i.e., outward expansion or inward contraction). Additional auxiliary correction graphics are added to assist in exposure according to whether the exposed feature is an inner angle or an outer angle, thereby increasing the fidelity of the angle and allowing it to pass inspection under high sensitivity conditions. This can reduce production costs and improve production efficiency.

[0054] The photomask in the utility model includes the above-mentioned design pattern and also has the above-mentioned technical effect.

[0055] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the technology may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed in the present invention shall still be covered by the claims of the present invention.

Claims

1. A design pattern for a laser exposure machine, characterized in that: include: A figure, comprising a first side and a second side, wherein the first side intersects and is perpendicular to the second side and forms a corner at the intersection, and a circle is drawn with the corner as the center and a preset length as the radius that is less than the length of the first side and less than the length of the second side, and the formed circular area is the corner area; The modified figure partially overlaps with the corner area, and the circular area is inscribed with at least two sides of the modified figure, the outline of the figure in the corner area extends and expands in a direction away from the center of the figure, and the figure is expanded to form the design figure; the expanded outline and the outline of the figure in the corner area constitute the outline of the modified figure; Alternatively, the outline of the figure located in the corner area extends and retracts from the outline of the corner area in a direction close to the center of the figure, and the figure is retracted to form the design figure, and the retracted outline and the outline of the figure in the corner area constitute the outline of the corrected figure.

2. The design pattern according to claim 1, characterized in that: The corner is formed as an outer corner, and the outer corner protrudes from the outline of the figure toward the outside of the figure.

3. The design pattern according to claim 2, characterized in that: The corrected figure is translated a distance X from the end point of the first side in the corner area along a direction perpendicular to the first side in a direction away from the figure, a distance Y from the end point of the second side in the corner area along a direction perpendicular to the second side in a direction away from the figure, and a distance Z from the corner in the corner area along a diagonal line between the first side and the second side in a direction away from the figure.

4. The design pattern according to claim 1, characterized in that: The corner is formed as an inner corner, and the inner corner protrudes from the outline of the figure toward the inside of the figure.

5. The design pattern according to claim 4, characterized in that: The corrected figure is translated a distance X from the first edge of the corner area in a direction perpendicular to the first edge toward the direction close to the figure, a distance Y from the second edge of the corner area in a direction perpendicular to the second edge toward the direction close to the figure, and a distance Z from the corner in the corner area in a direction along the diagonal of the first edge and the second edge toward the direction away from the figure.

6. The design pattern according to claim 2, characterized in that: The figure includes four outer corners.

7. The design pattern according to claim 4, characterized in that: The graphic includes at least one inner corner.

8. The design pattern according to claim 3 or 5, characterized in that: The translation distance X occupies 1 / 100 to 12 / 100 of the width L of the graphic, the translation distance Y occupies 1 / 100 to 12 / 100 of the width L of the graphic, and the translation distance Z is greater than or equal to the translation distance X and the translation distance Y.

9. The design pattern according to claim 1, characterized in that: The preset length occupies 1 / 10 to 1 / 2 of the width L of the graphic.

10. A photomask, characterized in that: Comprising the design pattern as claimed in any one of claims 1 to 9, the photomask is used in a laser exposure machine.

Images