Cleaning assembly for wet processing equipment
By setting a flow stop plate and overflow area in the cleaning tank of the wet treatment equipment, and using the return tank and the pump body circulating medium, the problem of the decline in the medium concentration during the wet cleaning process is solved, and a stable cleaning effect is achieved.
Patent Information
- Application Number
- CN202421016926.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-11
- Publication Date
- 2025-03-18
- Estimated Expiration
- 2034-05-11
AI Technical Summary
During the cleaning process of existing wet cleaning equipment, the concentration of the medium decreases, affecting the cleaning effect.
A cleaning assembly for wet treatment equipment is designed, including a cleaning tank and a return tank. By setting a flow stopper and overflow area in the cleaning tank, the high-concentration medium is pumped back to the cleaning tank by using the return tank and the pump body to keep the liquid level of the medium unchanged.
It effectively ensures the concentration of the medium, ensures the cleaning effect, and avoids the reduction in the cleaning effect caused by the decrease in the concentration of the medium.
Smart Images
Figure CN222625561U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of silicon wafer cleaning, and in particular relates to a cleaning component for wet processing equipment. Background Art
[0002] Wet cleaning is a cleaning method that requires the introduction of a solution, which usually includes steam cleaning, solution immersion cleaning, and rotary spray cleaning. This cleaning method uses specific chemical solutions and deionized water to clean the wafer surface without damaging it, and has the advantages of high efficiency and low cost.
[0003] However, in the existing cleaning tank, as the cleaning progresses, the effective solute in the medium will be consumed, causing the concentration of the medium to decrease, affecting the cleaning effect;
[0004] Therefore, it is necessary to provide a cleaning component for wet processing equipment that can add a medium with a higher concentration into a cleaning tank to ensure the concentration of the medium. Utility Model Content
[0005] The utility model aims to provide a cleaning component for wet processing equipment which can add a medium with a higher concentration into a cleaning tank to ensure the concentration of the medium.
[0006] In order to solve the above technical problems, the utility model provides a cleaning component for wet processing equipment, comprising: a cleaning tank, a pair of baffles are arranged in the cleaning tank, the height of the baffles is lower than the height of the cleaning tank, the interior of the baffles is a cleaning area, the outer side of the baffles is an overflow area, a cleaning liquid outlet is arranged at the bottom of the overflow area, and a plurality of cleaning liquid inlets are arranged at the bottom of the cleaning area; a reflux tank, the reflux tank is arranged at the bottom of the cleaning tank, a plurality of first reflux ports are arranged on the side wall of the reflux tank, the first reflux port is connected with the cleaning liquid outlet, a second reflux port is arranged at the bottom of the reflux tank, and the second reflux port is connected with the cleaning liquid inlet through a pump body.
[0007] Preferably, the pump body is arranged on the side of the cleaning tank, and the inlet of the pump body is connected to the second reflux port through a pipeline, and the outlet of the pump body is provided with a cleaning liquid inlet pipe, and a plurality of branch pipe bodies are plugged on the cleaning liquid inlet pipe, and the branch pipe bodies are respectively connected to the cleaning liquid inlet.
[0008] Preferably, a manual diaphragm valve is provided at one end of the branch pipe body, and an inlet of the manual diaphragm valve is connected to the cleaning liquid inlet pipe.
[0009] Preferably, a convergence partition is integrally provided at the bottom of the cleaning tank, the convergence partition is connected to the two overflow areas, and the cleaning liquid outlet is provided at the bottom of the convergence partition.
[0010] Preferably, a mesh plate is provided at the bottom of the overflow area, and the holes on the mesh plate are connected to the convergence partition.
[0011] Preferably, a plurality of filling boxes are provided at the bottom of the cleaning area, and the filling boxes are hollow inside.
[0012] Preferably, a reflux liquid inlet is provided on the side wall of the reflux groove, and a reflux liquid outlet is provided on the bottom of the reflux groove.
[0013] Preferably, a group of liquid level alarms are provided in the reflux tank.
[0014] Preferably, a tank cover is provided on the top of the cleaning tank, and a plurality of handles are provided on the top of the tank cover.
[0015] Preferably, the reflux tank is integrally arranged at the bottom of the cleaning tank.
[0016] The beneficial effects of the utility model are:
[0017] 1. By setting a baffle plate lower than the cleaning tank in the cleaning tank, it can be ensured that the liquid level of the medium can contact the transmission roller to complete the cleaning of the silicon wafer;
[0018] 2. Through the setting of the cleaning liquid inlet, a medium with a higher concentration can be added to the cleaning tank, and the overflowed medium flows to the overflow area to ensure that the liquid level of the medium remains unchanged, and the overflowed medium can be discharged through the cleaning liquid outlet;
[0019] 3. The reflux tank receives the overflowed cleaning medium through the first reflux port, and the second reflux port is arranged in conjunction with the pump body to pump the medium with a higher concentration into the cleaning tank.
[0020] Other features and advantages of the present invention will be set forth in the following description, and in part will become apparent from the description, or may be understood by implementing the present invention.
[0021] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, preferred embodiments are given below and described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0023] Figure 1 It is a stereogram of a preferred embodiment of the cleaning assembly of the utility model;
[0024] Figure 2 It is a stereogram of a preferred embodiment of the cleaning tank and the reflux tank of the utility model;
[0025] Figure 3 It is a top view of a preferred embodiment of the cleaning assembly of the utility model;
[0026] Figure 4 It is a top view of a preferred embodiment of the slot cover of the utility model.
[0027] In the figure:
[0028] 100, cleaning tank; 101, baffle; 102, cleaning area; 103, overflow area; 104, cleaning liquid outlet; 105, cleaning liquid inlet; 106, convergence partition; 107, mesh plate; 108, filling box; 109, tank cover; 110, handle;
[0029] 200, reflux groove; 201, first reflux port; 202, second reflux port; 203, reflux liquid inlet; 204, reflux liquid outlet; 205, liquid level alarm;
[0030] 300, pump body; 301, cleaning liquid inlet pipe; 302, branch pipe body; 303, manual diaphragm valve. DETAILED DESCRIPTION
[0031] In order to make the purpose, technical solution and advantages of the embodiments of the utility model clearer, the technical solution of the utility model will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0032] Embodiment 1, as Figure 1-4A cleaning component for wet processing equipment is shown, comprising: a cleaning tank 100, wherein a pair of baffles 101 are arranged in the cleaning tank 100, wherein the height of the baffles 101 is lower than the height of the cleaning tank 100, wherein the interior of the baffles 101 is a cleaning area 102, wherein the outer side of the baffles 101 is an overflow area 103, wherein a cleaning liquid outlet 104 is arranged at the bottom of the overflow area 103, and wherein a plurality of cleaning liquid inlets 105 are arranged at the bottom of the cleaning area 102; and a reflux tank 200, wherein the reflux tank 200 is arranged at the bottom of the cleaning tank 100, and preferably, the reflux tank 200 is directly welded to the bottom of the cleaning tank 100, wherein a plurality of first reflux ports 201 are arranged on the sidewall of the reflux tank 200, wherein the first reflux ports 201 are connected to the cleaning liquid outlet 104, and the reflux ports 205 are connected to the cleaning liquid outlet 104. A second reflux port 202 is provided at the bottom of the flow trough 200, and the second reflux port 202 is connected to the cleaning liquid inlet 105 through the pump body 300; in short, by providing a baffle 101 lower than the cleaning trough 100 in the cleaning trough 100, it can be ensured that the liquid level of the medium can contact the drive roller, thereby completing the cleaning of the silicon wafer; further, by providing the cleaning liquid inlet 105, a medium with a higher concentration can be added to the cleaning trough 100, and the overflowing medium flows to the overflow area 103, ensuring that the liquid level of the medium remains unchanged, and the overflowing medium can be discharged through the cleaning liquid outlet 104; further, the reflux trough 200 receives the overflowing cleaning medium through the first reflux port 201, and the provision of the second reflux port 202 cooperates with the pump body 300 to pump the medium with a higher concentration into the cleaning trough 100.
[0033] The pump body 300 is arranged on the side of the cleaning tank 100, and the inlet of the pump body 300 is connected to the second reflux port through a pipeline. The outlet of the pump body 300 is provided with a cleaning liquid inlet pipe 301, and a plurality of branch pipe bodies 302 are plugged into the cleaning liquid inlet pipe 301, and the branch pipe bodies 302 are respectively connected to the cleaning liquid inlet 105; in short, the medium can be transported through the cleaning liquid inlet pipe 301, and the medium can be distributed to the cleaning liquid inlet 105 through the branch pipe body 302.
[0034] A manual diaphragm valve 303 is provided at one end of the branch pipe body 302, and the inlet of the manual diaphragm valve 303 is connected to the cleaning liquid inlet pipe 301; in short, through the setting of the manual diaphragm valve 303, the on-off of the branch pipe body 302 can be controlled, and the structure is simple and reliable.
[0035] The bottom of the cleaning tank 100 is integrally provided with a converging partition 106, the converging partition 106 is connected to the two overflow areas 103, and the cleaning liquid outlet 104 is arranged at the bottom of the converging partition 106; in short, the media of the two overflow areas 103 can be converged through the converging partition 106 and transported to the reflux tank 200 through the cleaning liquid outlet 104.
[0036] A mesh plate 107 is provided at the bottom of the overflow area 103, and the holes on the mesh plate 107 are connected to the convergence partition 106; in short, the setting of the mesh plate 107 can ensure that when the silicon wafer is broken, it will not fall into the pipeline and cause the pipeline to be blocked, and the medium in the overflow area 103 can be discharged in a uniform flow.
[0037] A plurality of filling boxes 108 are disposed at the bottom of the cleaning area 102, and the filling boxes 108 are hollow inside. In short, by disposing the filling boxes 108, the solvent in the cleaning area 102 can be reduced, thereby reducing the overall weight of the cleaning assembly.
[0038] The side wall of the reflux groove 200 is provided with a reflux liquid inlet 203, and the bottom of the reflux groove 200 is provided with a reflux liquid outlet 204; in short, the medium can be added to the reflux groove 200 through the reflux liquid inlet 203, and the medium in the reflux groove 200 can be discharged through the reflux liquid outlet 204.
[0039] A group of liquid level alarms 205 are arranged in the reflux tank 200; in short, the liquid level alarm 205 can ensure that the medium in the reflux tank 200 is not too much or too little, and the liquid level alarm 205 here can be a liquid level float.
[0040] A tank cover 109 is provided on the top of the cleaning tank 100, and a plurality of handles 110 are provided on the top of the tank cover 109; in short, the tank cover 109 protects the internal structure of the cleaning tank 100 and can prevent impurities from entering the cleaning tank 100; further, the tank cover 109 can be quickly lifted up through the plurality of handles 110, and the structure is simple and reliable.
[0041] The reflux groove 200 is integrally arranged at the bottom of the cleaning groove 100; in short, the reflux groove 200 is welded to the bottom of the cleaning groove 100, so that the cleaning groove 100 and the reflux groove 200 form a whole.
[0042] All devices (parts without specific structure) selected in this application are universal standard parts or parts known to those skilled in the art, and their structures and principles can be known by those skilled in the art through technical manuals or conventional experimental methods. In addition, the software programs involved in this application are all prior art, and this application does not involve any improvement to the software programs.
[0043] In the description of the embodiments of the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0044] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.
[0045] Based on the above ideal embodiments of the utility model, the relevant staff can make various changes and modifications without deviating from the technical concept of the utility model through the above description. The technical scope of the utility model is not limited to the content of the specification, and its technical scope must be determined according to the scope of the claims.
Claims
1. A cleaning assembly for wet processing equipment, characterized in that: include: A cleaning tank, wherein a pair of baffles are arranged in the cleaning tank, wherein the height of the baffles is lower than the height of the cleaning tank, wherein the interior of the baffles is a cleaning area, and the exterior of the baffles is an overflow area, wherein a cleaning liquid outlet is arranged at the bottom of the overflow area, and wherein a plurality of cleaning liquid inlets are arranged at the bottom of the cleaning area; A reflux groove is arranged at the bottom of the cleaning groove, and a plurality of first reflux ports are arranged on the side wall of the reflux groove, and the first reflux ports are connected with the cleaning liquid outlet, and a second reflux port is arranged at the bottom of the reflux groove, and the second reflux port is connected with the cleaning liquid inlet through a pump body.
2. The cleaning assembly for wet processing equipment according to claim 1, characterized in that: The pump body is arranged on the side of the cleaning tank, and the inlet of the pump body is connected to the second reflux port through a pipeline. The outlet of the pump body is provided with a cleaning liquid inlet pipe, and a plurality of branch pipe bodies are plugged on the cleaning liquid inlet pipe, and the branch pipe bodies are respectively connected to the cleaning liquid inlet.
3. The cleaning assembly for wet processing equipment according to claim 2, characterized in that: A manual diaphragm valve is provided at one end of the branch pipe body, and an inlet of the manual diaphragm valve is communicated with the cleaning liquid inlet pipe.
4. The cleaning assembly for wet processing equipment according to claim 3, characterized in that: The bottom of the cleaning tank is provided with an integrated converging partition, the converging partition is communicated with the two overflow areas, and the cleaning liquid outlet is provided at the bottom of the converging partition.
5. The cleaning assembly for wet processing equipment according to claim 4, characterized in that: A mesh plate is provided at the bottom of the overflow area, and the holes on the mesh plate are communicated with the convergence partition.
6. The cleaning assembly for wet processing equipment according to claim 5, characterized in that: A plurality of filling boxes are arranged at the bottom of the cleaning area, and the filling boxes are hollow inside.
7. The cleaning assembly for wet processing equipment according to claim 6, characterized in that: The side wall of the reflux groove is provided with a reflux liquid inlet, and the bottom of the reflux groove is provided with a reflux liquid outlet.
8. The cleaning assembly for wet processing equipment according to claim 7, characterized in that: A group of liquid level alarms are arranged in the reflux tank.
9. The cleaning assembly for wet processing equipment according to claim 8, characterized in that: A tank cover is arranged on the top of the cleaning tank, and a plurality of handles are arranged on the top of the tank cover.
10. The cleaning assembly for wet processing equipment according to claim 1, characterized in that: The reflux tank is integrally arranged at the bottom of the cleaning tank.