Reaction chamber and etching equipment
By designing a reaction chamber containing a dislocation connection structure, the problem of loose sealing components and gas leakage in the dry etching equipment caused by vibration of the reaction chamber, and higher sealing properties and etching efficiency are achieved.
Patent Information
- Application Number
- CN202420711739.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-08
- Publication Date
- 2025-03-25
- Estimated Expiration
- 2034-04-08
AI Technical Summary
In existing dry etching equipment, mechanical vibration between reaction chambers causes loosening of sealing components, causing gas leakage and affecting etching quality.
A reaction chamber is designed, including a base, a reactor and a fixing member. A plurality of accommodation grooves and misplaced connection holes or connecting blocks are provided on the base. The fixing member is inserted and cooperates with the base to effectively fix the reactor and relieve mechanical vibration stress.
By reducing vibration of the reactor vessel and relieving mechanical stress, the sealing of the reaction chamber is improved, gas leakage is avoided, and etching efficiency and quality are improved.
Smart Images
Figure CN222672976U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductor equipment, in particular to a reaction chamber and etching equipment. Background Art
[0002] With the rapid development of the semiconductor industry, etching technology can be divided into two categories: wet etching and dry etching. Among them, dry etching is a technology that uses plasma to etch thin films. Dry etching requires the use of a variety of gases for etching, such as inert, corrosive, oxidizing, C and F gases. These gases react in a closed cavity, and mechanical vibrations are easily generated between the cavities, causing the sealing parts to loosen, resulting in gas leakage, which affects the etching quality. Utility Model Content
[0003] The utility model aims to provide a reaction chamber and an etching device, which can reduce the vibration of a reaction vessel during operation, effectively alleviate the mechanical stress between adjacent reaction vessels, and improve the airtightness of the reaction vessel.
[0004] The embodiment of the utility model is achieved as follows:
[0005] In a first aspect, the utility model provides a reaction chamber, comprising:
[0006] A base, wherein a plurality of accommodating grooves are provided on the base;
[0007] A reaction vessel, wherein the reaction vessel is disposed in the containing tank;
[0008] A fixing member, the fixing member pressing the reaction vessel;
[0009] One of the fixing member and the base is provided with a connecting hole, and the other is provided with a connecting block, and the fixing member and the base are plugged into each other; and the base between adjacent accommodating grooves is provided with at least two rows of staggered connecting blocks and / or connecting holes on one side facing the fixing member.
[0010] In an optional embodiment, the cross-section of the containing groove is polygonal, and the cross-section of the reaction vessel is adapted to the cross-section of the containing groove.
[0011] In an optional embodiment, a groove for mounting the fixing member is formed on the base.
[0012] In an optional embodiment, the depth of the groove is equal to the thickness of the fixing member.
[0013] In an optional embodiment, the accommodating groove is arranged at the bottom of the groove.
[0014] In an optional embodiment, the fixing member adopts a double hexagonal structure, and at least two rows of staggered connection holes and / or connection blocks are provided in the middle of the double hexagonal structure to be plugged into the base.
[0015] In an optional embodiment, each of the fixing members presses at least two of the reaction vessels.
[0016] In an optional embodiment, the reaction vessel is provided with a through hole therethrough.
[0017] In an optional embodiment, the cross-section of the through hole is circular.
[0018] In a second aspect, the utility model provides an etching device, comprising a reaction chamber as described in any one of the aforementioned embodiments.
[0019] The beneficial effects of the utility model include:
[0020] The reaction chamber provided by the utility model is plugged and matched with the fixing piece and the base, which can effectively fix the reaction vessel and reduce the vibration of the reaction vessel during operation. The connection holes or connection blocks arranged in a staggered manner on the base can effectively alleviate the mechanical stress generated by vibration between adjacent reaction vessels, play a buffering and vibration reduction role, prevent the sealing parts from loosening, improve the airtightness, and avoid gas leakage.
[0021] The etching equipment provided by the utility model comprises the above-mentioned reaction chamber. Since the structure of the reaction chamber is fixed and reliable, it can alleviate mechanical vibration stress, has good sealing performance, and avoids gas leakage. Therefore, the etching efficiency of the etching equipment is high and the etching quality is good. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.
[0023] Figure 1 A schematic diagram of the structure of the reaction chamber provided in an embodiment of the utility model;
[0024] Figure 2 A schematic diagram of the split structure of the reaction chamber provided in an embodiment of the utility model;
[0025] Figure 3 A schematic structural diagram of a base of a reaction chamber provided in an embodiment of the utility model.
[0026] Icon: 100 - reaction chamber; 110 - base; 111 - receiving groove; 113 - connecting hole; 115 - groove; 120 - reaction vessel; 121 - through hole; 130 - fixing piece; 131 - connecting block. DETAILED DESCRIPTION
[0027] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Generally, the components of the embodiments of the utility model described and shown in the drawings here can be arranged and designed in various different configurations.
[0028] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the present invention to be protected, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0029] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.
[0030] In the description of the present utility model, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inside", "outside", etc. indicate the orientation or position relationship based on the orientation or position relationship shown in the accompanying drawings, or the orientation or position relationship in which the utility model product is usually placed when in use, which is only for the convenience of describing the utility model and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.
[0031] In addition, the terms "horizontal", "vertical" and the like do not mean that the components are required to be absolutely horizontal or suspended, but can be slightly tilted. For example, "horizontal" only means that its direction is more horizontal than "vertical", and does not mean that the structure must be completely horizontal, but can be slightly tilted.
[0032] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0033] In the existing etching process, mechanical vibrations are easily generated between the reaction chambers, and these vibrations are likely to cause the sealing components of the reaction chambers to loosen, thereby posing the risk of gas leakage.
[0034] In order to overcome at least one defect in the prior art, the present embodiment provides a reaction chamber that can be applied to semiconductor equipment, including but not limited to etching equipment, deposition equipment or other equipment.
[0035] Please refer to Figures 1 to 3 The present embodiment provides a reaction chamber 100, which includes a base 110, a reaction vessel 120 and a fixing member 130. The base 110 is provided with a plurality of receiving grooves 111. The reaction vessel 120 is arranged in the receiving grooves 111, and a reaction vessel 120 is placed in each receiving groove 111. The fixing member 130 presses the reaction vessel 120. One of the fixing member 130 and the base 110 is provided with a connecting hole 113, and the other is provided with a connecting block 131, and the fixing member 130 and the base 110 are plugged together. And at least two rows of staggered connecting blocks 131 and / or connecting holes 113 are provided on a side of the base 110 facing the fixing member 130 between adjacent receiving grooves 111. In the reaction chamber 100, the fixing member 130 and the base 110 are plugged together, and the fixing member 130 can effectively fix the reaction vessel 120 and reduce the vibration of the reaction vessel 120 during operation. The staggered connection holes 113 or connection blocks 131 on the base 110 can effectively alleviate the mechanical stress between adjacent reaction vessels 120, play a buffering and vibration reduction role, prevent the sealing components from loosening, improve air tightness, and avoid gas leakage.
[0036] In this embodiment, the fixing member 130 is provided with a connection block 131, and the base 110 is provided with a connection hole 113. The number of the connection holes 113 and the connection block 131 is equal, and the size is adapted to achieve the plug-in fit between the base 110 and the fixing member 130. Of course, in some embodiments, the connection hole 113 can also be provided on the fixing member 130, and the connection block 131 plugged with the connection hole 113 can be provided on the base 110, which can also achieve similar technical effects. Alternatively, the fixing member 130 is provided with a connection hole 113 and a connection block 131, respectively, and the base 110 is provided with a connection hole 113 and a connection block 131. The connection hole 113 on the fixing member 130 and the connection block 131 on the base 110 are arranged correspondingly, and the connection block 131 on the fixing member 130 and the connection hole 113 on the base 110 are arranged correspondingly, so that the plug-in fit between the base 110 and the fixing member 130 can be achieved, and the connection is reliable and easy to assemble.
[0037] In this embodiment, only two reaction vessels 120 are shown on the base 110. In actual equipment, the number of reaction vessels 120 is more than two, and may be more, such as three, four, five, six, or even more, up to dozens or hundreds, which is not specifically limited here. Optionally, the cross-section of the receiving groove 111 is polygonal, and the cross-section of the reaction vessel 120 is adapted to the cross-section of the receiving groove 111. With the polygonal design, the contour of the reaction vessel 120 has certain edges and corners, which can prevent rotation and fix more securely, while also reducing vibration and alleviating the mechanical stress caused by vibration between the reaction vessels 120.
[0038] Optionally, the cross section of the receiving groove 111 is hexagonal, the outer contour of the reaction vessel 120 is a hexagonal prism, and the plurality of receiving grooves 111 are distributed in a honeycomb shape. Optionally, the fixing member 130 adopts a double hexagonal structure, and at least two rows of staggered connection holes 113 and / or connection blocks 131 are provided in the middle of the double hexagonal structure to be plugged with the base 110.
[0039] In this embodiment, the base 110 is provided with connection holes 113, which are located on the outer periphery of the receiving groove 111 and are evenly distributed along the circumferential direction. Two adjacent receiving grooves 111 share a groove wall, and the upper surface of the groove wall is provided with two rows of connection holes 113, and the two rows of connection holes 113 are staggered. Correspondingly, two rows of staggered connection blocks 131 are provided at corresponding positions on the fixing member 130. Such staggered distribution can effectively alleviate the stress generated by mechanical vibration, reduce the risk of loosening of the sealing component due to vibration, and avoid gas leakage.
[0040] It should be noted that the number of rows of connecting blocks 131 or connecting holes 113 arranged on the common groove wall between adjacent accommodating grooves 111 can be two rows, three rows or four rows, etc. The number of rows is not limited as long as the staggered arrangement can reduce mechanical stress, and no specific limitation is made here.
[0041] It can be understood that in this embodiment, the staggered arrangement of multiple rows of connecting blocks 131 on the fixing member 130 can not only play a role in buffering and shock absorption and reducing mechanical stress, but also play a role in installation positioning and prevent the fixing member 130 from being installed in reverse, thereby improving assembly efficiency and preventing the fixing member 130 from being assembled in the wrong direction.
[0042] The cross section of the receiving groove 111 may also be a triangle, rectangle, square, pentagon, octagon or decagon, etc., which is not specifically limited here. Accordingly, the cross section of the outer contour of the reaction vessel 120 is a triangle, rectangle, square, pentagon, octagon or decagon, etc.
[0043] Optionally, a groove 115 for installing the fixing member 130 is provided on the base 110, and the bottom of the groove 115 forms a sink on the periphery of the receiving groove 111. The connecting hole 113 is provided at the bottom of the groove 115, that is, the connecting hole 113 is provided on the sink. It can be understood that the receiving groove 111 is provided at the bottom of the groove 115. That is, the central axis of the receiving groove 111 coincides with the central axis of the groove 115.
[0044] Optionally, the depth of the groove 115 is equal to the thickness of the fixing member 130. Thus, after the fixing member 130 is installed in the groove 115, the surface of the fixing member 130 is flush with the surface of the base 110, the surface of the base 110 has no protrusions or depressions, and the entire surface is smoother.
[0045] Optionally, each fixing member 130 holds at least two reaction vessels 120. In this embodiment, the fixing member 130 adopts a double hexagonal structure and can simultaneously hold two reaction vessels 120. According to actual conditions, the structural shape of the fixing member 130 can be flexibly designed to hold a larger number of reaction vessels 120, such as holding three, four, five, six or more reaction vessels 120 at the same time, which is not specifically limited here.
[0046] Optionally, the reaction vessel 120 is provided with a through hole 121. The through hole 121 serves as a working chamber for the gas reaction, and the through hole 121 is used to place the wafer. It should be noted that in some embodiments, according to the actual installation position of the reaction vessel 120, the through hole 121 can be designed as a blind hole, which is not specifically limited here. In the present embodiment, the cross-section of the through hole 121 is circular to facilitate the placement of wafers of corresponding sizes. Of course, if the reaction vessel 120 is used in other fields, the cross-sectional shape of the through hole 121 can also be designed as other shapes, such as an ellipse, square, semicircle, triangle, pentagon, hexagon, octagon or decagon, etc.
[0047] The installation process of the reaction chamber 100 provided in the embodiment of the present utility model is as follows:
[0048] First, place the reaction vessel 120 in the receiving groove 111 of the base 110, and then install the fixing member 130 in the groove 115 of the base 110. Among them, the connection block 131 on the fixing member 130 and the connection hole 113 on the base 110 are plugged and matched to press and fix the reaction vessel 120, thereby improving the stability of the reaction vessel 120 during the reaction process. The staggered arrangement of the connection holes 113 on the base 110 can reduce the mechanical vibration stress between adjacent reaction vessels 120, prevent the sealing components from loosening, and reduce the risk of gas leakage. At the same time, it also has the function of rapid positioning to prevent the fixing member 130 from being installed in reverse.
[0049] The embodiment of the utility model provides an etching device, comprising a reaction chamber 100 as in any one of the aforementioned embodiments. It is understood that the etching device also includes a gas pipeline, which is connected to the reaction vessel 120 and is used to pass gas into the reaction vessel 120 and to discharge the gas in the reaction vessel 120. Since the reaction chamber 100 has the characteristics of buffering and shock absorption and reducing mechanical stress, it can prevent the sealing components from being loosened by vibration, thereby reducing the risk of gas leakage.
[0050] It should be noted that, in addition to being used in etching equipment, the reaction chamber 100 can also be used in deposition equipment or other semiconductor equipment, or can also be used in other fields and industries besides semiconductors, which are not specifically limited here.
[0051] In summary, the reaction chamber 100 and etching equipment provided by the embodiment of the utility model have the following beneficial effects, including:
[0052] The reaction chamber 100 provided by the utility model, the fixing member 130 and the base 110 are plugged and matched, which can effectively fix the reaction vessel 120, reduce the vibration of the reaction vessel 120 during the working process, and improve the stability of the reaction vessel 120 during the reaction process. The connection holes 113 or the connection blocks 131 arranged in a staggered manner on the base 110 can effectively alleviate the mechanical stress generated by the vibration between adjacent reaction vessels 120, play a buffering and vibration reduction role, prevent the sealing components from loosening, improve the air tightness, and avoid gas leakage. At the same time, it also has the function of rapid positioning to prevent the fixing member 130 from being installed in reverse.
[0053] The etching equipment provided by the utility model includes the above-mentioned reaction chamber 100. Since the structure of the reaction chamber 100 is fixed and reliable, it can alleviate mechanical vibration stress, has good sealing performance, and can reduce the risk of gas leakage. Therefore, the etching efficiency of the etching equipment is high and the etching quality is good.
[0054] The above description is only an optional embodiment of the utility model and is not intended to limit the utility model. For those skilled in the art, the utility model can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.
Claims
1. A reaction chamber, characterized in that: include: A base, wherein a plurality of accommodating grooves are provided on the base; A reaction vessel, wherein the reaction vessel is disposed in the containing tank; A fixing member, the fixing member pressing the reaction vessel; One of the fixing member and the base is provided with a connecting hole, and the other is provided with a connecting block, and the fixing member and the base are plugged into each other; and the base between adjacent accommodating grooves is provided with at least two rows of staggered connecting blocks and / or connecting holes on one side facing the fixing member.
2. The reaction chamber according to claim 1, characterized in that: The cross section of the containing groove is polygonal, and the cross section of the reaction vessel is adapted to the cross section of the containing groove.
3. The reaction chamber according to claim 1, characterized in that: The base is provided with a groove for installing the fixing member.
4. The reaction chamber according to claim 3, characterized in that: The depth of the groove is equal to the thickness of the fixing member.
5. The reaction chamber according to claim 3, characterized in that: The containing groove is arranged at the groove bottom of the groove.
6. The reaction chamber according to claim 1, characterized in that: The fixing member adopts a double hexagonal structure, and at least two rows of staggered connection holes and / or connection blocks are arranged in the middle of the double hexagonal structure to be plugged with the base.
7. The reaction chamber according to claim 1, characterized in that: Each of the fixing members presses and holds at least two of the reaction vessels.
8. The reaction chamber according to any one of claims 1 to 7, characterized in that: The reaction vessel is penetrated by a through hole.
9. The reaction chamber according to claim 8, characterized in that: The cross section of the through hole is circular.
10. An etching device, characterized in that: The method comprises a reaction chamber as claimed in any one of claims 1 to 9.