An adsorption platform
By designing a combination of the base and the pressing plate mechanism on the ceramic substrate adsorption platform, and using the light-transmitting film to increase the vacuum adsorption pressure, the poor exposure problem caused by warping and deformation of the ceramic substrate is solved, and flat adsorption and high-efficiency exposure are achieved.
Patent Information
- Application Number
- CN202420641946.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-31
- Publication Date
- 2025-04-08
- Estimated Expiration
- 2034-03-31
AI Technical Summary
Ceramic substrates are prone to warping and deforming during exposure processing, resulting in the inability to flatly adsorption on the vacuum adsorption platform, affecting the exposure effect. The prior art can only increase the power consumption and equipment temperature by increasing the vacuum suction force.
An adsorption platform is designed, using a combination of a base and a pressure plate mechanism to cover the vacuum adsorption area through a translucent film, increase the vacuum adsorption pressure, and realize the adsorption of the translucent film through a flip mechanism to ensure the smooth adsorption of the ceramic substrate.
Without increasing the blower power, the ceramic substrate is effectively leveled and adsorbed, which solves the problem of poor exposure caused by warping and deformation, improves the exposure effect, and reduces power consumption and equipment temperature.
Smart Images

Figure CN222734394U_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of ceramic substrate exposure processing equipment, in particular to an adsorption platform applied to ceramic substrate exposure processing equipment. Background Art
[0002] At present, exposure processing equipment usually fixes the printed circuit board (PCB) placed on the workbench by vacuum adsorption. When the exposure processing equipment processes the ceramic substrate, due to the high hardness of the ceramic substrate, it is easy to deform and the deformation is irregular and difficult to control. When the ceramic substrate to be exposed has the problem of warping and deformation, the ceramic substrate cannot be flatly adsorbed on the workbench when vacuum adsorption is used, which affects the exposure effect and causes poor exposure. If the problem of uneven adsorption is solved by increasing the vacuum suction force, the power of the blower needs to be increased, which will increase the power consumption and increase the internal temperature of the processing equipment, causing a series of problems. Summary of the invention
[0003] The technical problem to be solved by the present invention is to provide an adsorption platform, which enables a ceramic substrate to be flatly adsorbed on the adsorption platform without increasing the power of a blower.
[0004] In order to solve the above problems, the present invention provides an adsorption platform, which includes a base and a pressing plate mechanism. The base includes a vacuum adsorption area, and the substrate is placed in the vacuum adsorption area. The pressing plate mechanism includes a light-transmitting film, a fixed frame and a flipping mechanism. The light-transmitting film is fixed to the fixed frame. The pressing plate mechanism is fixed to the base through the flipping mechanism. When the pressing plate mechanism is closed, it is in the vacuum adsorption area of the base.
[0005] Furthermore, the adsorption platform also includes a pressure plate mechanism accommodating area, and the pressure plate mechanism flips between the pressure plate mechanism accommodating area and the vacuum adsorption area.
[0006] Furthermore, the flipping mechanism includes a bearing fixing seat and a driven bearing, the bearing fixing seat is connected to the base, and the driven bearing is fixedly connected to the fixing frame and rotatably connected to the bearing fixing seat.
[0007] Furthermore, the bearing fixing seat includes a seat body and a bearing fixing hole located on the seat body, the upper area and the lower area of the bearing fixing hole are set corresponding to the size of the driven bearing, and a buffer zone is set in the middle position of the bearing fixing hole, and the buffer zone is a strip-shaped area.
[0008] Furthermore, the adsorption platform also includes a limit frame, and the limit frame is fixed in the vacuum adsorption area.
[0009] Furthermore, the limiting frame includes a peripheral frame and a separation bar, wherein the separation bar is connected to the peripheral frame to divide the area defined by the peripheral frame into a plurality of areas.
[0010] Furthermore, the limiting frame is provided with ventilation holes corresponding to the adsorption holes in the vacuum adsorption area.
[0011] Furthermore, the pressing plate mechanism is flipped between the pressing plate mechanism accommodating area and the vacuum adsorption area by a power driving device, and the power driving device connects the transmission rod to the pressing plate mechanism through a bearing.
[0012] Furthermore, the adsorption platform is provided with a pair of magnetic sensors, which are respectively arranged at one end of the base close to the vacuum adsorption area and the outside of the fixed frame of the pressing plate mechanism. During the closing process of the pressing plate mechanism, the base and the magnetic sensors of the pressing plate mechanism are continuously approached, and the magnetic sensors are used to judge whether the pressing plate mechanism is closed.
[0013] Furthermore, the adsorption platform is also provided with a proximity sensor, which is arranged on the base and corresponds to each board placement area.
[0014] Compared with the prior art, the adsorption platform increases the vacuum adsorption pressure on the ceramic substrate by setting a pressure plate mechanism and using a light-transmitting film to cover the vacuum adsorption area, thereby flattening the warped substrate and meeting the exposure requirements, thus solving the problem of poor exposure caused by the warped substrate.
[0015] By setting a limit frame, the position of the substrate is limited, and at the same time, the light-transmitting film has a smaller deformation during vacuum adsorption, making it easier to adsorb. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 Schematic diagram of an embodiment of an adsorption platform.
[0017] Figure 2 Schematic diagram of an exploded view of an embodiment of an adsorption platform.
[0018] Figure 3 It is a schematic diagram of the pressure plate mechanism.
[0019] Figure 4 It is a plan view of the driven bearing.
[0020] Figure 5 is a schematic diagram of another embodiment of an adsorption platform. DETAILED DESCRIPTION
[0021] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention is described below by means of specific embodiments shown in the accompanying drawings.
[0022] like Figure 1-Figure 5As shown, it is an embodiment of an adsorption platform, the adsorption platform comprises a base 1, a limit frame 2 and a pressing plate mechanism 3, the limit frame 2 and the pressing plate mechanism 3 are fixed to the base 1.
[0023] The base 1 includes a vacuum adsorption area 10 and a pressure plate mechanism accommodating area 11. The limit frame 2 is fixed to the vacuum adsorption area 10 to define at least one ceramic substrate placement area. The ceramic substrate is placed in the vacuum adsorption area in the limit frame 2. The limit frame 2 is provided with a plurality of vents 20, which are arranged corresponding to the adsorption holes 100 in the vacuum adsorption area of the base where the limit frame 2 is fixed. When the limit frame 2 defines a plurality of ceramic substrate placement areas, the limit frame includes a peripheral frame body 21 and a dividing bar 22. The dividing bar 22 is connected to the peripheral frame body 21 to divide the area defined by the peripheral frame body 21 into a plurality of areas. The dividing bar 22 and the peripheral frame body 21 are provided with vents 20 corresponding to the adsorption holes 100 in the vacuum adsorption area 10 of the base.
[0024] The pressing plate mechanism 3 includes a light-transmitting film 30, a fixing frame 31 and a flipping mechanism 32. The fixing frame 31 fixes the light-transmitting film 30. The flipping mechanism 32 is connected to the fixing frame 31 to drive the fixing frame 31 and the light-transmitting film 30 to flip from the pressing plate mechanism accommodating area 11 of the base to the vacuum adsorption area 10. The light-transmitting film 30 covers the ceramic substrate 4 placed in the vacuum adsorption area 10. A sealing frame 33 is provided between the light-transmitting film 30 and the fixing frame 31 to increase the airtightness during vacuum adsorption. The light-transmitting film 30 can be a Mylar film.
[0025] The flip mechanism 32 includes a bearing fixing seat 320 and a driven bearing 321. The bearing fixing seat 320 is connected to the base 1. The driven bearing 321 is fixedly connected to the fixed frame 31 and is rotatably connected to the bearing fixing seat 320. The bearing fixing seat 320 includes a seat body 3200 and a bearing fixing hole 3201 located on the seat body. The upper area 3202 and the lower area 3203 of the bearing fixing hole 3201 correspond to the size of the driven bearing. A buffer zone 3204 is provided in the middle of the bearing fixing hole 3201. The buffer zone 3204 is a strip area. Due to the difference in thickness of the processed ceramic substrate, the fixed frame 31 is easily warped. By setting the buffer zone 3204, the driven bearing 321 can move in the bearing fixing hole 3201 following the force of the fixed frame 31, so as to avoid the fixed frame 31 from warping and poor sealing when the thickness of the ceramic substrate changes, thereby affecting the adsorption effect.
[0026] The pressing plate mechanism 3 is flipped between the pressing plate mechanism accommodation area and the vacuum adsorption area by a driving mechanism. The driving mechanism can be provided with a handle 50 for manual flipping, or a power driving device 5 can be connected to the pressing plate mechanism 3 through a transmission rod 51 to realize the flipping of the pressing plate mechanism 3. The power driving device 5 can be a cylinder, and the transmission rod 51 is connected to the pressing plate mechanism 3 through a bearing 52, and the bearing can be a fisheye bearing.
[0027] The adsorption platform is provided with a pair of magnetic sensors (6, 7), which are respectively arranged at one end of the base close to the vacuum adsorption area and outside the fixed frame of the pressing plate mechanism. During the closing process of the pressing plate mechanism, the base and the magnetic sensors (6, 7) of the pressing plate mechanism are constantly approaching each other, and the magnetic sensors (6, 7) are used to judge whether the pressing plate mechanism 3 is closed.
[0028] A buffer mechanism is provided at both ends of the magnetic sensor (6, 7), and the buffer mechanism comprises a buffer component 8 located on the base 1 and a baffle 9 located on the pressure plate mechanism 3. The buffer component 8 can adopt the same type of buffer components or different types of buffer components, and the buffer mechanism can alleviate the impact force between the pressure plate mechanism and the base when the pressure plate mechanism is closed.
[0029] The adsorption platform is also provided with a proximity sensor 19, which is provided on the base 1 and corresponds to each board placement area defined by the limit frame 2. Through the proximity sensor 19, it is judged whether the ceramic substrate is placed in the board placement area defined by the limit frame 2, which facilitates accurate automatic control.
[0030] When the adsorption platform is working, the ceramic substrate is placed in the limiting frame 2, and the pressing plate mechanism 3 is flipped from the pressing plate mechanism accommodating area 11 to the vacuum adsorption area 10, so that the light-transmitting film 30 of the pressing plate mechanism 3 is attached to the upper surface of the ceramic substrate 4. At the same time, the magnetic sensor 6 located on the base 1 senses the approach of the inductive magnetic sensor 7 at the end of the pressing plate mechanism 3. According to the induction of the magnetic sensors (6, 7), the adsorption platform sends a vacuum pumping signal and starts vacuum pumping. The light-transmitting film 30 in the pressing plate mechanism 3 is attached to the ceramic substrate 4 by the vacuum pressure. The light-transmitting film 30 that does not contact the ceramic base is adsorbed on the area of the vacuum adsorption area 10 that is not covered by the ceramic substrate 4 and / or the limiting frame 2, thereby increasing the adsorption pressure of the ceramic substrate 4 by vacuum pumping, so that the lifted ceramic substrate 4 is sucked flat, and the exposure is performed to meet the exposure requirements, thereby solving the problem of poor exposure caused by the lifted ceramic substrate 4.
[0031] When the adsorption platform is provided with a proximity sensor 19, the ceramic substrate 4 is placed in the limit frame 2, and the proximity sensor 19 senses that the ceramic substrate 4 is placed in the limit frame 2, and issues an instruction to make the pressing plate mechanism 3 flip from the pressing plate mechanism accommodating area 11 to the vacuum adsorption area 10, and the light-transmitting film 30 of the pressing plate mechanism 3 is attached to the upper surface of the ceramic substrate 4. At the same time, the magnetic sensor 6 located on the base 1 senses that the inductive magnetic sensor 7 at the end of the pressing plate mechanism 3 is close. According to the induction of the magnetic sensors (6, 7), the adsorption platform sends a vacuum pumping signal and starts to vacuumize. The light-transmitting film 30 in the pressing plate mechanism is attached to the ceramic substrate 4 by the vacuum pressure, and the light-transmitting film 30 that does not contact the ceramic substrate 4 is adsorbed on the area of the vacuum adsorption area 10 that is not covered by the ceramic substrate 4 and / or the limit frame 2, thereby increasing the vacuum adsorption pressure on the ceramic substrate 3, so that the lifted ceramic substrate 4 is sucked flat, and the exposure is performed to meet the exposure requirements, thereby solving the problem of poor exposure caused by the lifted ceramic substrate.
Claims
1. An adsorption platform, comprising a base and a pressing plate mechanism, characterized in that: The base comprises a vacuum adsorption area, the substrate is placed in the vacuum adsorption area, the pressing plate mechanism comprises a light-transmitting film, a fixed frame and a flipping mechanism, the light-transmitting film is fixed to the fixed frame, the pressing plate mechanism is fixed to the base through the flipping mechanism, and when the pressing plate mechanism is closed, it is in the vacuum adsorption area of the base.
2. The adsorption platform according to claim 1, characterized in that: The adsorption platform further comprises a pressure plate mechanism accommodating area, and the pressure plate mechanism is flipped between the pressure plate mechanism accommodating area and the vacuum adsorption area.
3. The adsorption platform according to claim 1, characterized in that: The flip mechanism comprises a bearing fixing seat and a driven bearing, wherein the bearing fixing seat is connected to the base, and the driven bearing is fixedly connected to the fixing frame and rotatably connected to the bearing fixing seat.
4. The adsorption platform according to claim 3, characterized in that: The bearing fixing seat includes a seat body and a bearing fixing hole located on the seat body. The upper area and the lower area of the bearing fixing hole are set corresponding to the size of the driven bearing. A buffer zone is set in the middle position of the bearing fixing hole, and the buffer zone is a strip-shaped area.
5. The adsorption platform according to claim 1, characterized in that: The adsorption platform further comprises a limit frame, and the limit frame is fixed in the vacuum adsorption area.
6. The adsorption platform according to claim 5, characterized in that: The limiting frame includes a peripheral frame body and a separation bar, wherein the separation bar is connected to the peripheral frame body and divides the area defined by the peripheral frame body into a plurality of areas.
7. The adsorption platform according to claim 5, characterized in that: The limiting frame is provided with ventilation holes corresponding to the adsorption holes of the vacuum adsorption area.
8. The adsorption platform according to claim 1, characterized in that: The pressing plate mechanism is turned over between the pressing plate mechanism accommodating area and the vacuum adsorption area through a power driving device, and the power driving device connects the transmission rod to the pressing plate mechanism through a bearing.
9. The adsorption platform according to claim 1, characterized in that: The adsorption platform is provided with a pair of magnetic sensors, which are respectively arranged at one end of the base close to the vacuum adsorption area and the outside of the fixed frame of the pressing plate mechanism. During the closing process of the pressing plate mechanism, the base and the magnetic sensors of the pressing plate mechanism are constantly approaching each other, and the magnetic sensors are used to judge whether the pressing plate mechanism is closed.
10. The adsorption platform according to claim 1, characterized in that: The adsorption platform is also provided with a proximity sensor, which is arranged on the base and corresponds to each board placement area.