TFT (Thin Film Transistor) grinding and cleaning platform convenient for breaking vacuum

Abstract

The utility model relates to the technical field of placing platforms, in particular to a TFT (Thin Film Transistor) grinding and cleaning platform convenient for vacuum breaking, which comprises a platform main body, a vacuum adsorption area and a special vacuum breaking area are arranged on the upper surface of the platform main body, the vacuum adsorption area adsorbs a product in a vacuum manner during grinding, the action is changed into vacuum breaking during sheet placing, and the special vacuum breaking area is arranged on the upper surface of the platform main body. The special vacuum breaking area is used for breaking vacuum when the wafer is placed after the action is completed, and the vacuum adsorption area and the special vacuum breaking area are synchronously used for breaking vacuum. Compared with the prior art, the TFT grinding and cleaning platform facilitating vacuum breaking is uniform in stress when a product is placed, avoids breaking the product, and can effectively solve the problem that glass cannot fall off due to the fact that a vacuum-free part of the product is too tightly adhered to the platform.

Description

[Technical field]

[0001] The utility model relates to the technical field of placement platforms, in particular to a TFT grinding and cleaning platform which is convenient for breaking vacuum. [Background technology]

[0002] The TFT grinding and cleaning platform is a platform used for washing and grinding the glass TFT surface. After grinding, the product is placed on the transmission wheel in the air-drying area for air drying. The existing TFT grinding platform uses 2-4 suction rods to lift and lower the film at the center of the corresponding platform. However, after the product is washed and ground, the glass is tightly combined with the platform. The use of suction rods to lift and lower to break the vacuum can easily cause uneven force on the glass and cause broken pieces. [Contents of the utility model]

[0003] In order to overcome the above problems, the utility model proposes a TFT grinding and cleaning platform which is convenient for breaking vacuum and can effectively solve the above problems.

[0004] The utility model provides a technical solution to solve the above technical problems: providing a TFT grinding and cleaning platform that is easy to break vacuum, including a platform body, wherein the upper surface of the platform body is provided with a vacuum adsorption area and a special vacuum breaking area; the vacuum adsorption area includes a first vacuum adsorption groove, second vacuum adsorption grooves are respectively provided on both sides of the first vacuum adsorption groove, a third vacuum adsorption groove is provided above the first vacuum adsorption groove, fourth vacuum adsorption grooves are respectively provided on both sides of the third vacuum adsorption groove, a fifth vacuum adsorption groove is provided above the third vacuum adsorption groove, a sixth vacuum adsorption groove is provided above the fifth vacuum adsorption groove, a seventh vacuum adsorption groove is provided above the sixth vacuum adsorption groove, and a An eighth vacuum adsorption groove is provided, and ninth vacuum adsorption grooves are respectively provided on both sides of the fifth vacuum adsorption groove, the sixth vacuum adsorption groove and the seventh vacuum adsorption groove; the special vacuum breaking area includes two first special vacuum breaking grooves, two second special vacuum breaking grooves, a third special vacuum breaking groove, a fourth special vacuum breaking groove and a fifth special vacuum breaking groove, the two first special vacuum breaking grooves are respectively arranged on the outsides of the two ninth vacuum adsorption grooves, the two second special vacuum breaking grooves are respectively arranged on both sides of the fifth vacuum adsorption groove, the third special vacuum breaking groove is located between the sixth vacuum adsorption groove and the seventh vacuum adsorption groove, the fourth special vacuum breaking groove is located between the seventh vacuum adsorption groove and the eighth vacuum adsorption groove, and the fifth special vacuum breaking groove is located above the eighth vacuum adsorption groove.

[0005] Preferably, the first vacuum adsorption groove, the second vacuum adsorption groove, the third vacuum adsorption groove, the fourth vacuum adsorption groove, the fifth vacuum adsorption groove, the sixth vacuum adsorption groove, the seventh vacuum adsorption groove, the eighth vacuum adsorption groove and the ninth vacuum adsorption groove are all inwardly concave grooves.

[0006] Preferably, the first dedicated vacuum breaking groove, the second dedicated vacuum breaking groove, the third dedicated vacuum breaking groove, the fourth dedicated vacuum breaking groove and the fifth dedicated vacuum breaking groove are all inwardly recessed grooves.

[0007] Preferably, vacuum adsorption holes are arranged inside the first vacuum adsorption groove, the second vacuum adsorption groove, the third vacuum adsorption groove, the fourth vacuum adsorption groove, the fifth vacuum adsorption groove, the sixth vacuum adsorption groove, the seventh vacuum adsorption groove, the eighth vacuum adsorption groove and the ninth vacuum adsorption groove.

[0008] Preferably, vacuum breaking holes are arranged inside the first dedicated vacuum breaking groove, the second dedicated vacuum breaking groove, the third dedicated vacuum breaking groove, the fourth dedicated vacuum breaking groove and the fifth dedicated vacuum breaking groove.

[0009] Preferably, a plurality of positioning holes are provided on the platform body, positioning pins are vertically fixed in the positioning holes, and the positioning pins are used to position the silicone layer, and the silicone layer covers the surface of the platform body.

[0010] Preferably, the vacuum adsorption area and the dedicated vacuum breaking area are exposed from the silica gel layer.

[0011] Preferably, a positive pressure air source hole and a negative pressure air source hole are provided on the side of the platform body, the positive pressure air source hole is connected with the vacuum adsorption area and the dedicated vacuum breaking area, and the negative pressure air source hole is connected with the vacuum adsorption area.

[0012] Compared with the prior art, the TFT grinding and cleaning platform of the utility model which is easy to break vacuum is subjected to uniform force when the product is placed, thus avoiding the breakage of the pieces, and can effectively solve the problem that the non-vacuum part of the product adheres too tightly to the platform, resulting in the glass not falling off.

Brief Description of the Drawings

[0013] Figure 1 This is a front view of the TFT grinding and cleaning platform that is convenient for breaking vacuum in the utility model;

[0014] Figure 2 It is a side view of the TFT grinding and cleaning platform which is convenient for breaking vacuum according to the utility model. [Specific implementation method]

[0015] In order to make the purpose, technical solution and advantages of the utility model more clear, the utility model is further described in detail below with reference to the accompanying drawings and implementation examples. It should be understood that the specific embodiments described here are only used to explain the utility model and are not used to limit the utility model.

[0016] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are limited to relative positions on the specified view rather than absolute positions.

[0017] In addition, in the present invention, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0018] See also Figure 1 and Figure 2 The utility model provides a TFT grinding and cleaning platform that is easy to break vacuum, including a platform body 30. The upper surface of the platform body 30 is provided with a vacuum adsorption area and a special vacuum breaking area. The vacuum adsorption area vacuum adsorbs the product during grinding, and turns to breaking vacuum when the film is placed after the action is completed. The special vacuum breaking area breaks vacuum when the film is placed after the action is completed. The vacuum adsorption area and the special vacuum breaking area are performed synchronously when breaking the vacuum.

[0019] The vacuum adsorption area includes a first vacuum adsorption groove 11, second vacuum adsorption grooves 12 are respectively arranged on both sides of the first vacuum adsorption groove 11, a third vacuum adsorption groove 13 is arranged above the first vacuum adsorption groove 11, fourth vacuum adsorption grooves 14 are respectively arranged on both sides of the third vacuum adsorption groove 13, a fifth vacuum adsorption groove 15 is arranged above the third vacuum adsorption groove 13, a sixth vacuum adsorption groove 16 is arranged above the fifth vacuum adsorption groove 15, a seventh vacuum adsorption groove 17 is arranged above the sixth vacuum adsorption groove 16, an eighth vacuum adsorption groove 18 is arranged above the seventh vacuum adsorption groove 17, and ninth vacuum adsorption grooves 19 are respectively arranged on both sides of the fifth vacuum adsorption groove 15, the sixth vacuum adsorption groove 16 and the seventh vacuum adsorption groove 17.

[0020] The dedicated vacuum breaking area includes two first dedicated vacuum breaking grooves 21, two second dedicated vacuum breaking grooves 22, a third dedicated vacuum breaking groove 23, a fourth dedicated vacuum breaking groove 24 and a fifth dedicated vacuum breaking groove 25. The two first dedicated vacuum breaking grooves 21 are respectively arranged on the outsides of the two ninth vacuum adsorption grooves 19, the two second dedicated vacuum breaking grooves 22 are respectively arranged on both sides of the fifth vacuum adsorption groove 15, the third dedicated vacuum breaking groove 23 is located between the sixth vacuum adsorption groove 16 and the seventh vacuum adsorption groove 17, the fourth dedicated vacuum breaking groove 24 is located between the seventh vacuum adsorption groove 17 and the eighth vacuum adsorption groove 18, and the fifth dedicated vacuum breaking groove 25 is located above the eighth vacuum adsorption groove 18.

[0021] The first vacuum adsorption groove 11, the second vacuum adsorption groove 12, the third vacuum adsorption groove 13, the fourth vacuum adsorption groove 14, the fifth vacuum adsorption groove 15, the sixth vacuum adsorption groove 16, the seventh vacuum adsorption groove 17, the eighth vacuum adsorption groove 18 and the ninth vacuum adsorption groove 19 are all inwardly concave grooves.

[0022] The first dedicated vacuum breaking groove 21 , the second dedicated vacuum breaking groove 22 , the third dedicated vacuum breaking groove 23 , the fourth dedicated vacuum breaking groove 24 and the fifth dedicated vacuum breaking groove 25 are all grooves recessed inwards.

[0023] The first vacuum adsorption groove 11, the second vacuum adsorption groove 12, the third vacuum adsorption groove 13, the fourth vacuum adsorption groove 14, the fifth vacuum adsorption groove 15, the sixth vacuum adsorption groove 16, the seventh vacuum adsorption groove 17, the eighth vacuum adsorption groove 18 and the ninth vacuum adsorption groove 19 are all provided with vacuum adsorption holes therein.

[0024] The first dedicated vacuum breaking groove 21 , the second dedicated vacuum breaking groove 22 , the third dedicated vacuum breaking groove 23 , the fourth dedicated vacuum breaking groove 24 and the fifth dedicated vacuum breaking groove 25 are all provided with vacuum breaking holes therein.

[0025] The platform body 30 is provided with a plurality of mounting holes 31 for mounting the platform.

[0026] The platform body 30 is provided with a plurality of positioning holes 32, and positioning pins are vertically fixed in the positioning holes 32. The positioning pins are used to position the silicone layer, which covers the surface of the platform body 30 to protect the LCD from scratches. The silicone layer is made of silicone with a hardness of about 80-90. The vacuum adsorption area and the special vacuum breaking area are exposed from the silicone layer.

[0027] Inwardly recessed handle grooves 33 are provided on both sides of the platform body 30 to facilitate carrying the platform.

[0028] A positive pressure air source hole 34 and a negative pressure air source hole 35 are provided on the side of the platform body 30 . The positive pressure air source hole 34 is connected to the vacuum adsorption area and the dedicated vacuum breaking area, and the negative pressure air source hole 35 is connected to the vacuum adsorption area.

[0029] Compared with the prior art, the TFT grinding and cleaning platform of the utility model which is easy to break vacuum is subjected to uniform force when the product is placed, thus avoiding the breakage of the pieces, and can effectively solve the problem that the non-vacuum part of the product adheres too tightly to the platform, resulting in the glass not falling off.

[0030] The above description is only a preferred embodiment of the present invention, and does not limit the patent scope of the present invention. Any modifications, equivalent substitutions and improvements made within the concept of the present invention should be included in the patent protection scope of the present invention.

Claims

1. A TFT polishing and cleaning platform that is easy to break vacuum, characterized in that: It comprises a platform body, wherein the upper surface of the platform body is provided with a vacuum adsorption area and a dedicated vacuum breaking area; The vacuum adsorption area includes a first vacuum adsorption groove, second vacuum adsorption grooves are respectively arranged on both sides of the first vacuum adsorption groove, a third vacuum adsorption groove is arranged above the first vacuum adsorption groove, fourth vacuum adsorption grooves are respectively arranged on both sides of the third vacuum adsorption groove, a fifth vacuum adsorption groove is arranged above the third vacuum adsorption groove, a sixth vacuum adsorption groove is arranged above the fifth vacuum adsorption groove, a seventh vacuum adsorption groove is arranged above the sixth vacuum adsorption groove, an eighth vacuum adsorption groove is arranged above the seventh vacuum adsorption groove, and ninth vacuum adsorption grooves are respectively arranged on both sides of the fifth vacuum adsorption groove, the sixth vacuum adsorption groove and the seventh vacuum adsorption groove; The special vacuum breaking area includes two first special vacuum breaking grooves, two second special vacuum breaking grooves, one third special vacuum breaking groove, one fourth special vacuum breaking groove and a fifth special vacuum breaking groove. The two first special vacuum breaking grooves are respectively arranged on the outsides of the two ninth vacuum adsorption grooves, the two second special vacuum breaking grooves are respectively arranged on both sides of the fifth vacuum adsorption groove, the third special vacuum breaking groove is located between the sixth vacuum adsorption groove and the seventh vacuum adsorption groove, the fourth special vacuum breaking groove is located between the seventh vacuum adsorption groove and the eighth vacuum adsorption groove, and the fifth special vacuum breaking groove is located above the eighth vacuum adsorption groove.

2. The TFT polishing and cleaning platform that is easy to break vacuum according to claim 1, characterized in that: The first vacuum adsorption groove, the second vacuum adsorption groove, the third vacuum adsorption groove, the fourth vacuum adsorption groove, the fifth vacuum adsorption groove, the sixth vacuum adsorption groove, the seventh vacuum adsorption groove, the eighth vacuum adsorption groove and the ninth vacuum adsorption groove are all inwardly concave grooves.

3. The TFT polishing and cleaning platform that is easy to break vacuum according to claim 1, characterized in that: The first dedicated vacuum breaking groove, the second dedicated vacuum breaking groove, the third dedicated vacuum breaking groove, the fourth dedicated vacuum breaking groove and the fifth dedicated vacuum breaking groove are all grooves recessed inwardly.

4. The TFT polishing and cleaning platform that is easy to break vacuum according to claim 2, characterized in that: The first vacuum adsorption groove, the second vacuum adsorption groove, the third vacuum adsorption groove, the fourth vacuum adsorption groove, the fifth vacuum adsorption groove, the sixth vacuum adsorption groove, the seventh vacuum adsorption groove, the eighth vacuum adsorption groove and the ninth vacuum adsorption groove are all provided with vacuum adsorption holes therein.

5. The TFT polishing and cleaning platform that is easy to break vacuum as claimed in claim 3, characterized in that: The first dedicated vacuum breaking groove, the second dedicated vacuum breaking groove, the third dedicated vacuum breaking groove, the fourth dedicated vacuum breaking groove and the fifth dedicated vacuum breaking groove are all provided with vacuum breaking holes therein.

6. The TFT polishing and cleaning platform for easy vacuum breaking according to claim 1, characterized in that: The platform body is provided with a plurality of positioning holes, positioning pins are vertically fixed in the positioning holes, and the positioning pins are used to position the silicone layer, and the silicone layer covers the surface of the platform body.

7. The TFT polishing and cleaning platform for easy vacuum breaking according to claim 6, characterized in that: The vacuum adsorption area and the dedicated vacuum breaking area are exposed from the silica gel layer.

8. The TFT polishing and cleaning platform for easy vacuum breaking according to claim 1, characterized in that: A positive pressure air source hole and a negative pressure air source hole are arranged on the side of the platform body. The positive pressure air source hole is connected with the vacuum adsorption area and the special vacuum breaking area, and the negative pressure air source hole is connected with the vacuum adsorption area.

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