Silicon wafer transmission device
By designing a transmission device including a pneumatic suspension mechanism and a driving mechanism, contactless transmission of the silicon wafer of the solar cell is realized, solving the problem of contacting the silicon wafer process surface in the prior art, and improving the quality of the battery cell.
Patent Information
- Application Number
- CN202421618050.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-10
- Publication Date
- 2025-04-22
- Estimated Expiration
- 2034-07-10
AI Technical Summary
The prior art cannot completely avoid contact with the process surface of the solar cell silicon wafer, resulting in contamination and damage, affecting the conversion efficiency and appearance of the cell.
A transmission device including a pneumatic suspension mechanism and a driving mechanism is designed to achieve contactless transmission of silicon wafers through a floating plate assembly and a conveying track. The pneumatic suspension mechanism suspends the silicon wafer through a high-pressure airflow, conveying the stop on the track to push the silicon wafer, ensuring contact on the side of the silicon wafer rather than the process surface.
It realizes complete contactless transmission of silicon wafers, avoids pollution and damage to the process surface, and improves the conversion efficiency and appearance quality of the battery cell.
Smart Images

Figure CN222785273U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of silicon slice production equipment, and in particular relates to a silicon slice transmission device for solar cell slices. Background Art
[0002] During the processing of solar cells, due to process problems, the front and back of the silicon wafer need to avoid contact with anything to prevent the process surface (the front and back of the silicon wafer) from being contaminated and damaged, which in turn affects the conversion efficiency and appearance of the final finished cell.
[0003] The transmission devices disclosed in existing patents such as application numbers 202211553205.3 and 201810846002.0 cannot completely avoid contact with the process surface of the silicon wafer. Utility Model Content
[0004] In view of this, in order to solve the problems of the prior art, the utility model provides an improved transmission device for silicon wafers for solar cells, which can completely avoid contact with the process surface of the silicon wafers.
[0005] In order to achieve the above purpose, the utility model adopts the following technical solutions:
[0006] A transmission device for silicon wafers for solar cell wafers, used for taking wafers from a first buffer mechanism and / or feeding wafers into a second buffer mechanism, comprises a mounting plate, a pneumatic suspension mechanism and a driving mechanism arranged on the mounting plate, wherein the pneumatic suspension mechanism comprises a steam floating plate assembly, and a gas outlet for gas flow is arranged on the top of the steam floating plate assembly; the driving mechanism comprises a conveying crawler and a driving assembly for driving the conveying crawler to move, the conveying crawler is provided with a block contacting the side of the silicon wafer, the driving mechanism is located on both sides of the length or width direction of the silicon wafer, and the conveying crawler rotates in the horizontal direction (in the horizontal plane); the spacing between the two conveying crawlers is greater than the length or width of the silicon wafer. The force generated by the block when contacting the silicon wafer is parallel to the plane where the silicon wafer is located, and no component force perpendicular to the silicon wafer is generated, thereby avoiding adverse effects on the edge of the silicon wafer.
[0007] According to some preferred implementation aspects of the utility model, the conveying belts on both sides of the silicon wafer rotate in opposite directions, and a space for accommodating the silicon wafer and pushing the silicon wafer forward is formed between the corresponding blocks on the two conveying belts, and the distance between two adjacent blocks on the same conveying belt is smaller than the length or width of the silicon wafer.
[0008] According to some preferred implementation aspects of the utility model, the stopper on the conveyor belt extends toward the silicon wafer, and the direction is parallel to the silicon wafer, that is, the stopper extends horizontally from the conveyor belt outside the side of the silicon wafer toward the silicon wafer.
[0009] According to some preferred implementation aspects of the utility model, the transmission device includes an auxiliary suspension mechanism, which is arranged between the pneumatic suspension mechanism and the driving mechanism; the auxiliary suspension mechanism includes a main body, an auxiliary air inlet hole opened on the bottom of the main body and an auxiliary air outlet hole opened on the top of the main body, the auxiliary air inlet hole and the auxiliary air outlet hole are connected, and the auxiliary air inlet hole is connected to a high-pressure air source.
[0010] According to some preferred implementation aspects of the utility model, the auxiliary air outlet is vertically or tilted; and / or the cross section of the auxiliary air outlet is rectangular or conical. The conical air outlet can increase the airflow of the outlet and facilitate suspension.
[0011] According to some preferred implementation aspects of the utility model, the auxiliary suspension mechanism includes a first auxiliary mechanism close to the first cache mechanism and / or a second auxiliary mechanism close to the second cache mechanism, and the auxiliary air outlets on the first auxiliary mechanism and the second auxiliary mechanism have opposite inclination directions.
[0012] According to some preferred implementation aspects of the present invention, the air outlet holes on the first auxiliary mechanism are inclined from bottom to top toward the second cache mechanism; and / or, the air outlet holes on the second auxiliary mechanism are inclined from bottom to top toward the first cache mechanism.
[0013] Preferably, the main body is provided with multiple rows of auxiliary air outlets, and viewed from a cross section perpendicular to the transmission direction of the silicon wafer, the auxiliary air outlets are inclined from bottom to top toward the suspension mechanism, so as to ensure the centering of the silicon wafer during transmission and avoid contact with the conveying crawler.
[0014] More preferably, the angle between the side wall of the auxiliary air outlet close to the suspension mechanism and the horizontal plane gradually increases from the side close to the suspension mechanism to the side away from the suspension mechanism, so as to ensure the transmission effect and centering.
[0015] That is, the auxiliary air outlet has two-dimensional tilt directions, one is parallel to the transmission direction of the silicon wafer, which is used to assist (speed up or slow down) the transmission of the silicon wafer, and the other is perpendicular to the transmission direction of the silicon wafer, which is used to align the silicon wafer during transmission.
[0016] According to some preferred implementation aspects of the utility model, the pneumatic suspension mechanism includes a first suspension mechanism close to the first cache mechanism, and / or a second suspension mechanism close to the second cache mechanism, and / or an intermediate suspension mechanism located between the first suspension mechanism and the second suspension mechanism; the air outlets on the first suspension mechanism, the second suspension mechanism and the intermediate suspension mechanism are vertically or inclined.
[0017] According to some preferred implementation aspects of the utility model, the air outlet on the first suspension mechanism is inclined from bottom to top toward the middle suspension mechanism; and / or, the air outlet on the second suspension mechanism is inclined from bottom to top toward the middle suspension mechanism. Through the inclined setting of the air outlet of the first suspension mechanism, the silicon wafer can have an initial forward movement state to avoid backward movement; through the inclined setting of the air outlet of the second suspension mechanism, the movement speed of the silicon wafer is slowed down, and its speed when entering the wafer is reduced to avoid accelerating forward to touch other objects and damage the silicon wafer.
[0018] Preferably, the air outlet holes on each suspension mechanism include a middle hole located in the middle and side holes symmetrically distributed on both sides of the middle hole. When viewed from a cross section perpendicular to the transmission direction of the silicon wafer, the middle hole is opened in a vertical direction, and the side holes are inclined from bottom to top toward the middle hole, so as to ensure the centering of the silicon wafer during the transmission process and avoid contact with the conveying crawler.
[0019] More preferably, the angle between the side wall of the side hole close to the middle hole and the horizontal plane gradually increases from the side close to the middle hole to the side away from the middle hole, so as to ensure the transmission effect and centering.
[0020] That is, the air outlet on the suspension mechanism has two-dimensional tilt directions, one is parallel to the transmission direction of the silicon wafer, which is used to assist (speed up or slow down) the transmission of the silicon wafer, and the other is perpendicular to the transmission direction of the silicon wafer, which is used to center the silicon wafer during transmission.
[0021] When the air outlets on the pneumatic suspension mechanism and the auxiliary suspension mechanism are both inclined, the two have similar functions, and one or a combination is selected to achieve the corresponding function. In some embodiments, the auxiliary air outlets on the auxiliary suspension mechanism are preferably arranged at an angle to achieve auxiliary transmission and centering, and the air outlets on the pneumatic suspension mechanism are arranged vertically and rectangularly. At the same time, the auxiliary suspension mechanism and the pneumatic suspension mechanism are independently connected to two high-pressure air sources for easy control. At this time, the conveying track and the block thereon play a blocking and limiting role to prevent the silicon wafer from deviating from the predetermined track. The block is used to block between the front and rear silicon wafers to avoid collision between the front and rear silicon wafers. The width of the block in the up and down direction is greater than the thickness of a single silicon wafer.
[0022] According to some preferred implementation aspects of the utility model, the air outlet is rectangular or conical. The conical air outlet can increase the air flow of the outlet and facilitate suspension.
[0023] According to some preferred implementation aspects of the utility model, the steam floating plate assembly includes a bottom plate, a side plate and a top plate, the bottom plate is provided with an air inlet, and the top plate is provided with an air outlet. The air inlet is connected to a high-pressure gas source to deliver gas to the pressure stabilizing chamber.
[0024] According to some preferred implementation aspects of the utility model, the pneumatic suspension mechanism includes a transverse partition plate disposed between the bottom plate and the top plate, the transverse partition plate is provided with a through hole; a first pressure stabilizing chamber is formed between the transverse partition plate and the bottom plate, and a second pressure stabilizing chamber is formed between the transverse partition plate and the top plate. By providing two pressure stabilizing chambers, the air pressure can be further stabilized.
[0025] Preferably, a vertical partition plate for separating the second pressure-stabilizing chamber is provided between the transverse partition plate and the top plate; an air inlet hole is provided on the bottom plate, and a through hole corresponding to each second pressure-stabilizing chamber is provided on the transverse partition plate to further stabilize the air pressure.
[0026] According to some preferred implementation aspects of the utility model, in each of the steam floating plate components, the area of the air inlet hole is larger than the area of all the through holes; the area of all the through holes is larger than the area of all the air outlet holes to ensure continuous and stable output of air pressure and avoid a decrease in air pressure.
[0027] According to some preferred implementation aspects of the utility model, the driving assembly includes a driving wheel and a driven wheel arranged in the conveying crawler and a driver driving the driving wheel to rotate.
[0028] According to some preferred implementation aspects of the utility model, the driver is installed below the mounting plate, a connecting shaft is provided between the driving wheel and the driver, and a mounting hole for the connecting shaft to pass through is opened on the mounting plate.
[0029] Preferably, the two drive mechanisms on both sides of the silicon wafer are driven by one driver. Specifically, a main drive wheel and a slave drive wheel in contact with each other are provided below the mounting plate, and the main drive wheel is driven by a belt to the output shaft of the driver, and the slave drive wheel is driven by a belt to the connecting shaft below the driving wheel of another drive assembly. That is, two sets of transmission tracks are driven by one driver, which saves cost and space.
[0030] More preferably, the mounting holes on the mounting plate are waist-shaped holes, which are opened perpendicular to the length direction of the conveying track to adjust the distance between the two conveying track, and are suitable for silicon wafers of different specifications.
[0031] Compared with the prior art, the utility model is advantageous in that: the transmission device for silicon wafers for solar cell wafers of the utility model sets the conveying belts outside the two sides of the silicon wafer, and the spacing between the two conveying belts is greater than the width or length of the silicon wafer, so that the blocks on the belts contact the rear side of the silicon wafer, pushing the silicon wafer forward without contacting the process surface of the silicon wafer; and the force generated by the block contacting the silicon wafer is parallel to the silicon wafer, and there is no cross or perpendicular force on the process surface of the silicon wafer, thereby avoiding the risk of crushing or damaging the silicon wafer. BRIEF DESCRIPTION OF THE DRAWINGS
[0032] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0033] Figure 1 It is a schematic diagram of the three-dimensional structure of a contactless conveying device for silicon wafers used in solar cells according to an embodiment of the present invention;
[0034] Figure 2 It is a schematic diagram of the three-dimensional structure of the transmission device and the film taking device in the embodiment of the present invention;
[0035] Figure 3 It is a schematic diagram of the three-dimensional structure of the transmission device in an embodiment of the present invention;
[0036] Figure 4 is a schematic diagram of the three-dimensional structure of the transmission device in another viewing angle in an embodiment of the present invention;
[0037] Figure 5 It is a schematic diagram of the exploded structure of the steam floating plate assembly in an embodiment of the present invention;
[0038] Figure 6 It is a perspective structural diagram of a steam floating plate assembly in an embodiment of the present invention;
[0039] Figure 7 It is a schematic diagram of the three-dimensional structure of the auxiliary suspension mechanism in an embodiment of the present invention;
[0040] Figure 8 A schematic diagram of the cross-sectional structure of the auxiliary suspension mechanism in an embodiment of the present invention;
[0041] Fig. 9 It is a schematic diagram of the structure of the air outlet holes on the top plate of the steam floating plate assembly according to an embodiment of the present invention;
[0042] Fig.10 It is a schematic diagram of the three-dimensional structure of the film taking device in an embodiment of the present invention;
[0043] Fig.11 Schematic diagram of the three-dimensional structure of the support rod in the embodiment of the present invention;
[0044] Fig.12 It is a schematic diagram of the cross-sectional structure of the support rod in an embodiment of the present invention;
[0045] In the attached drawings, silicon wafer 1, first cache mechanism 2, second cache mechanism 3, supporting block 31, transmission device 4, mounting plate 41, movable groove 411, steam flotation plate assembly 42, top plate 421, air outlet 4211, side plate 422, bottom plate 423, air inlet 4231, transverse partition plate 424, through hole 4241, first pressure stabilizing chamber 425, second pressure stabilizing chamber 426, vertical partition plate 427, driving mechanism 43, transmission crawler 431, block 432, driving wheel 433, driven wheel 434, driver 435, connecting shaft 436, main driving wheel 437, slave driving wheel 438, mounting hole 439, positioner -4310, auxiliary suspension mechanism-44, suspension block body-441, auxiliary air inlet hole-442, auxiliary air outlet hole-443, auxiliary flow channel-444, film taking device-5, support rod-51, support rod body-511, accommodating groove-512, bottom surface-513, inclined surface-514, blocking surface-515, air suction port-516, air suction port-517, air suction channel-518, vertical moving component-52, vertical guide rail-521, vertical slider-522, vertical driver-523, horizontal moving component-53, horizontal guide rail-531, horizontal slider-532, horizontal driver-533, connecting plate-54, horizontal part-541, vertical part-542, connecting rod-55. DETAILED DESCRIPTION
[0046] In order to enable those skilled in the art to better understand the technical solution of the present invention, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.
[0047] like Figure 1-Figure 12 As shown, the contactless conveying device for silicon wafers 1 for solar cells of this embodiment is used to take the wafer from the first cache mechanism 2, perform contactless transmission of the silicon wafer 1, and then put the wafer into the second cache mechanism 3. In other embodiments, it can also be used only for contactless transmission of the silicon wafer 1 after taking the wafer from the first cache mechanism 2, or for putting the wafer into the second cache mechanism 3 after contactless transmission of the silicon wafer 1. The second cache mechanism 3 in this embodiment is provided with a supporting block 31 for supporting the silicon wafer 1. The supporting block 31 is conical and is used to contact with the edge of the silicon wafer 1 to avoid contact with the process surface of the silicon wafer 1. The silicon wafer 1 in the present invention is rectangular, such as 210mm×210mm, 182mm×182mm, etc., with a thickness of 110 to 130um.
[0048] The contactless conveying device in this embodiment includes a transmission device 4 and a wafer taking device 5 located between the first buffer mechanism 2 and the second buffer mechanism 3. The transmission device 4 is used to realize contactless transmission. The wafer taking device 5 is arranged close to the first buffer mechanism 2 and is used to take out the silicon wafer 1 in the first buffer mechanism 2 and place it on the transmission device 4. The following is a detailed description of each component:
[0049] The transmission device 4 includes a mounting plate 41, a pneumatic suspension mechanism and a driving mechanism 43 arranged on the mounting plate 41, wherein the pneumatic suspension mechanism includes a pneumatic suspension plate assembly 42. Further preferably, an auxiliary suspension mechanism 44 is provided between the pneumatic suspension mechanism and the driving mechanism 43. The driving mechanism 43 includes a conveying crawler 431 and a driving assembly for driving the conveying crawler 431 to move, and a stopper 432 is provided on the conveying crawler 431 to contact the side of the silicon wafer 1.
[0050] The steam flotation plate assembly 42 includes a bottom plate 423, a side plate 422, a top plate 421, and a transverse partition plate 424 disposed between the bottom plate 423 and the top plate 421. The bottom plate 423 is provided with an air inlet hole 4231, and the top plate 421 is provided with an air outlet hole 4211 for gas to flow out. The transverse partition plate 424 is provided with a through hole 4241; a first pressure stabilizing chamber 425 is formed between the transverse partition plate 424 and the bottom plate 423, and a second pressure stabilizing chamber 426 is formed between the transverse partition plate 424 and the top plate 421. By providing two pressure stabilizing chambers, the air pressure can be further stabilized. The air inlet hole 4231 is connected to a high-pressure gas source to deliver high-pressure gas to the pressure stabilizing chamber.
[0051] Preferably, a vertical partition plate 427 is provided between the horizontal partition plate 424 and the top plate 421 to separate the second pressure stabilizing chamber 426; a through hole 4241 corresponding to each of the separated second pressure stabilizing chambers 426 is provided on the horizontal partition plate 424 to further stabilize the air pressure. In each steam floating plate assembly 42, the area of the air inlet hole 4231 is larger than the area of all the through holes 4241; the area of all the through holes 4241 is larger than the area of all the air outlet holes 4211, so as to ensure the continuous and stable output of the air pressure and avoid the reduction of the air pressure.
[0052] Furthermore, in the present embodiment, an air inlet hole 4231 is provided on the bottom plate 423 of each steam floating plate assembly 42, and the air inlet hole 4231 is located at the center of the bottom plate 423. The steam floating plate assembly 42 has four second pressure stabilizing chambers 426 separated by vertical partition plates 427, and there is no overlapping part between the projections of the air inlet hole 4231 and the through hole 4241 on the horizontal plane, so as to prevent excessive air pressure from directly flowing out through the through hole 4241 and the air outlet hole 4211, causing unstable air pressure.
[0053] The pneumatic suspension mechanism includes a first suspension mechanism close to the first cache mechanism 2 and a second suspension mechanism close to the second cache mechanism 3. It further includes an intermediate suspension mechanism located between the first suspension mechanism and the second suspension mechanism. The air outlet holes 4211 on the first suspension mechanism, the second suspension mechanism, and the intermediate suspension mechanism are vertically or inclinedly arranged.
[0054] In this embodiment, the air outlet 4211 on the first suspension mechanism is inclined from bottom to top toward the second cache mechanism 3, and the air outlet 4211 on the second suspension mechanism is inclined from bottom to top toward the first cache mechanism 2. Through the inclined setting of the air outlet 4211 of the first suspension mechanism, the silicon wafer 1 can have an initial forward movement state to avoid collision caused by backward movement; through the inclined setting of the air outlet 4211 of the second suspension mechanism, the movement speed of the silicon wafer 1 is slowed down, and its speed when entering the wafer is reduced to avoid speeding up and touching other objects and damaging the silicon wafer 1. When the air outlet 4211 on the middle suspension mechanism adopts the same inclined setting as the second suspension mechanism, the suspension and forward movement of the silicon wafer 1 can be achieved by relying on the airflow of the suspension mechanism. At this time, the block 432 on the conveying crawler 431 is mainly used to separate the front and rear silicon wafers 1 to prevent collision between the silicon wafers 1 and cause damage.
[0055] Seen from the cross section perpendicular to the transmission direction of the silicon wafer 1, the air outlet holes 4211 on each steam floating plate assembly 42 are inclined from bottom to top toward the middle position of the steam floating plate assembly 42, that is, inclined inward, so as to ensure the centering of the silicon wafer 1 during the transmission process and prevent the silicon wafer 1 from moving outward and contacting the conveying crawler 431. Preferably, seen from the cross section perpendicular to the transmission direction of the silicon wafer 1, the angle between the outlet air flow direction of the air outlet holes 4211 on the top plate 421 and the horizontal plane gradually increases from the side close to the middle position of the steam floating plate assembly 42 to the side close to the edge position of the steam floating plate assembly 42. Specifically, the angle between the side wall of the air outlet hole 4211 close to the middle position of the steam floating plate assembly 42 and the horizontal plane gradually increases from the side close to the middle position of the steam floating plate assembly 42 to the side close to the edge position of the steam floating plate assembly 42, so as to ensure the transmission effect and centering, such as Fig. 9 Preferably, the angle between the side wall of the air outlet 4211 away from the middle of the steam floating plate assembly 42 and the horizontal plane remains unchanged, so that the outlet size of the air outlet 4211 remains unchanged, and the inlet size gradually increases from the side close to the middle of the steam floating plate assembly 42 to the side close to the edge of the steam floating plate assembly 42.
[0056] That is, the air outlet 4211 on the pneumatic suspension mechanism can have two-dimensional tilt directions, one is parallel to the transmission direction of the silicon wafer 1, which is used to assist (speed up or slow down) the transmission of the silicon wafer 1, and the other is perpendicular to the transmission direction of the silicon wafer 1, which is used to center the silicon wafer 1 during transmission.
[0057] The auxiliary suspension mechanism 44 includes a suspension block body 441, an auxiliary air inlet 442 provided on the bottom of the suspension block body 441, an auxiliary air outlet 443 provided on the top of the suspension block body 441, and an auxiliary flow channel 444 provided inside the suspension block body 441. The auxiliary air inlet 442 and the auxiliary air outlet 443 are connected through the auxiliary flow channel 444, and the auxiliary air inlet 442 is connected to the high-pressure gas source. The auxiliary air outlet 443 is vertically arranged or inclined. There is no overlap of the projections of the auxiliary air outlet 443 and the auxiliary air inlet 442 on the horizontal plane, and the connection through the auxiliary flow channel 444 ensures the balance and stability of the air pressure of each auxiliary air outlet 443.
[0058] The auxiliary suspension mechanism 44 includes a first auxiliary mechanism close to the first cache mechanism 2 and a second auxiliary mechanism close to the second cache mechanism 3. The auxiliary air outlet holes 443 on the first auxiliary mechanism and the second auxiliary mechanism are inclined in opposite directions. The air outlet holes 4211 on the first auxiliary mechanism are inclined from bottom to top toward the second cache mechanism 3; the air outlet holes 4211 on the second auxiliary mechanism are inclined from bottom to top toward the first cache mechanism 2.
[0059] Preferably, the suspension block body 441 is provided with multiple rows of auxiliary air outlet holes 443, and the auxiliary air outlet holes 443 are inclined from bottom to top toward the steam flotation plate assembly 42 in a cross section perpendicular to the transmission direction of the silicon wafer 1, so as to ensure the centering of the silicon wafer 1 during the transmission process and avoid contact with the conveying crawler 431.
[0060] More preferably, the angle between the outlet air flow direction of the multiple rows of auxiliary air outlet holes 443 and the horizontal plane gradually increases from the side close to the steam floating plate assembly 42 to the side away from the steam floating plate assembly 42. Specifically, the angle between the side wall of the auxiliary air outlet hole 443 close to the suspension mechanism and the horizontal plane gradually increases from the side close to the pneumatic suspension mechanism to the side away from the pneumatic suspension mechanism, ensuring the transmission effect and centering. Preferably, the angle between the side wall of the auxiliary air outlet hole 443 away from the steam floating plate assembly and the horizontal plane remains unchanged, so that the outlet size of the auxiliary air outlet hole 443 remains unchanged, and the inlet size gradually increases from the side close to the pneumatic suspension mechanism to the side away from the pneumatic suspension mechanism.
[0061] That is, the auxiliary air outlet 443 has two-dimensional tilt directions, one is parallel to the transmission direction of the silicon wafer 1, used to assist (accelerate or slow down) the transmission of the silicon wafer 1, and the other is perpendicular to the transmission direction of the silicon wafer 1, used to center the silicon wafer 1 during transmission.
[0062] The auxiliary air outlet 443 of the auxiliary suspension mechanism 44 and the air outlet 4211 of the pneumatic suspension mechanism are rectangular or conical. The conical air outlet 4211 can increase the air flow of the exhaust and facilitate suspension. When the air outlet 4211 on the pneumatic suspension mechanism and the auxiliary suspension mechanism 44 are both inclined, the two functions are similar, and one or a combination is selected to achieve the corresponding function. In this embodiment, the auxiliary air outlet 443 on the auxiliary suspension mechanism 44 is preferably inclined to achieve auxiliary transmission and centering, and the air outlet 4211 on the pneumatic suspension mechanism is vertical and rectangular. At the same time, the auxiliary suspension mechanism 44 and the pneumatic suspension mechanism are independently connected to two high-pressure air sources for easy control. At this time, the conveying crawler 431 and the block 432 thereon play a blocking and limiting role to prevent the silicon wafer 1 from deviating from the predetermined track. The block 432 is used to block between the front and rear two silicon wafers 1 to avoid collision between the front and rear two silicon wafers 1. The width of the block 432 in the up and down direction is greater than the total thickness of the two silicon wafers 1.
[0063] Furthermore, the apertures of the air outlet holes 4211 and the auxiliary air outlet holes 443 are 1.0-3.0 mm, preferably 1.5 mm, with a hole spacing of 20-30 mm, and an input air pressure of more than 6 bar, which is set by the pressure reducing valve and the flow valve, and the corresponding air outlet pressure is adjusted according to the weight of silicon wafers of different specifications.
[0064] The auxiliary suspension mechanism 44 and the pneumatic suspension mechanism in this embodiment are modularly designed and can be connected in series according to different transmission lengths, and are convenient for installation, disassembly and maintenance. The upper and lower double pressure chambers of the pneumatic suspension mechanism are designed to stabilize the silicon wafer 1 and ensure that the front and back of the silicon wafer 1 do not touch any object.
[0065] Furthermore, the auxiliary air outlet 443 of the auxiliary suspension mechanism 44 and the air outlet 4211 of the pneumatic suspension mechanism are both arranged at an angle, so as to better realize the suspension and forward movement of the silicon wafer 1 .
[0066] In this embodiment, the driving mechanism 43 is located on both sides of the length or width direction of the silicon wafer 1, and the conveying crawler 431 rotates in a horizontal plane; the distance between the two conveying crawlers 431 is greater than the length or width of the silicon wafer 1. The conveying crawlers 431 on both sides of the silicon wafer 1 rotate in opposite directions, and a space for accommodating the silicon wafer 1 is formed between the corresponding blocks 432 on the two conveying crawlers 431 and pushing the silicon wafer 1 forward, and the distance between two adjacent blocks 432 on each conveying crawler 431 is less than the length or width of the silicon wafer 1.
[0067] The stopper 432 is used to block between the front and rear silicon wafers 1 to prevent the front and rear silicon wafers 1 from touching each other; the stopper 432 on the conveyor belt 431 extends toward the silicon wafer 1, and the direction is parallel to the plane where the silicon wafer 1 is located. That is, the stopper 432 extends horizontally from the conveyor belt 431 located outside the side of the silicon wafer 1 toward the direction close to the silicon wafer 1. The mounting plate 41 has a positioner 4310 for monitoring the position of the stopper 432.
[0068] The driving assembly includes a driving wheel 433 and a driven wheel 434 arranged in the conveying crawler 431, and a driver 435 for driving the driving wheel 433 to rotate. The driver 435 is installed below the mounting plate 41, a connecting shaft 436 is arranged between the driving wheel 433 and the driver 435, and a mounting hole 439 is opened on the mounting plate 41 for the connecting shaft 436 to pass through.
[0069] Preferably, the two driving mechanisms 43 on both sides of the silicon wafer 1 are driven by a driver 435. Specifically, a main driving wheel 437 and a slave driving wheel 438 in contact with each other are provided below the mounting plate 41. The main driving wheel 437 is driven by a belt to the output shaft of the driver 435, and the slave driving wheel 438 is driven by a belt to the connecting shaft 436 below the driving wheel 433 of another driving component. That is, two sets of conveyor belts 431 are driven to move by one driver 435, which saves cost and space, and can ensure the synchronous movement of the two conveyor belts 431.
[0070] More preferably, the mounting hole 439 on the mounting plate 41 is a waist-shaped hole, which is opened perpendicular to the length direction of the conveying crawler 431 to adjust the spacing between the two conveying crawlers 431, suitable for silicon wafers 1 of different specifications. At the same time, the two driving components are adjusted synchronously to keep the silicon wafer 1 in the middle during transmission, avoiding instability in the transmission of the silicon wafer 1.
[0071] The wafer taking device 5 in this embodiment includes a supporting rod 51 and a moving mechanism for driving the supporting rod 51 to move. The supporting rod 51 includes a supporting rod body 511 and a receiving groove 512 opened on the supporting rod body 511. The receiving groove 512 has a bottom surface 513, inclined surfaces 514 located on both sides of the bottom surface 513, and a blocking surface 515 extending upward from the inclined surface 514 away from the bottom surface 513 to block the movement of the silicon wafer 1.
[0072] The inclined surface 514 is inclined from bottom to top toward the side away from the bottom surface 513; the angle between the inclined surface 514 and the horizontal plane is 10-45°, preferably 10-15°. The minimum distance between the two inclined surfaces 514 is less than the length or width of the silicon wafer 1, and the maximum distance between the two inclined surfaces 514 is greater than the length or width of the silicon wafer 1. When the silicon wafer 1 is located on the supporting rod 51, the edge (edge) of the silicon wafer 1 is in line contact with the inclined surface 514. Preferably, the inclined surfaces 514 on both sides are symmetrically arranged about the midpoint of the length direction of the bottom surface 513 of the receiving groove 512.
[0073] The supporting rod 51 extends in the horizontal direction; the wafer taking device 5 is provided with two supporting rods 51 corresponding to one silicon wafer 1, and the distance between the two supporting rods 51 is less than the length or width of the silicon wafer 1. The supporting rod 51 extending in the horizontal direction is used to extend into the first buffer mechanism 2 of the silicon wafer 1 to take out the silicon wafer 1, and the spacing is less than the length or width of the silicon wafer 1 for more stable taking and placing; the distance between the two supporting rods 51 is greater than the distance between the outer sides of the two auxiliary suspension mechanisms 44, so as to facilitate moving outside the auxiliary suspension mechanism 44 to take and place the silicon wafer 1.
[0074] The bottom of the supporting rod body 511 is provided with an air extraction port 516, the top of the supporting rod body 511 is provided with an air suction port 517, and the supporting rod body 511 is provided with an air extraction flow channel 518 connecting the air extraction port 516 and the air suction port 517. The air suction port 517 connects the receiving groove 512 and the air extraction port 516, and the air extraction port 516 is connected to the vacuum pumping mechanism. The vacuum pumping mechanism is used to vacuumize the air suction port 517, so that the air suction port 517 is under negative pressure, thereby generating a certain suction force on the silicon wafer 1 to prevent the silicon wafer 1 from moving on the supporting rod 51. And there is no overlap between the projections of the air suction port 517 and the air extraction port 516 on the horizontal plane to ensure the balance and stability of the air pressure. The bottom of the receiving groove 512 is evenly spaced with multiple air suction ports 517. Preferably, the multiple air suction ports 517 are symmetrically arranged about the midpoint of the length direction of the bottom surface 513 of the receiving groove 512 to ensure the balance of the suction force, the uniform force on the silicon wafer 1, and the movement of the silicon wafer 1.
[0075] The moving mechanism in this embodiment includes a vertical moving assembly 52 for driving the support rod 51 to move in the vertical direction, a horizontal moving assembly 53 for driving the support rod 51 to move in the horizontal direction, and a connecting mechanism for connecting the support rod 51 and the moving mechanism. The vertical moving assembly 52 includes a vertical guide rail 521, a vertical slider 522 and a vertical driver 523. The vertical driver 523 is used to drive the vertical slider 522 to slide on the vertical guide rail 521, and the vertical slider 522 is used to connect with the connecting mechanism. The horizontal moving assembly 53 includes a horizontal guide rail 531, a horizontal slider 532 and a horizontal driver 533. The horizontal driver 533 is used to drive the horizontal slider 532 to slide on the horizontal guide rail 531, and the horizontal slider 532 is used to connect with the vertical moving assembly 52. The vertical moving assembly 52 is used to rise and hold the silicon wafer 1 in the cache mechanism, and to lower the silicon wafer 1 and place it on the silicon wafer 1 transmission device 4 for transmission; the horizontal moving assembly 53 is used to drive the support rod 51 to enter and exit the cache mechanism horizontally.
[0076] The connecting mechanism includes a connecting plate 54 and a connecting rod 55 connecting the two connecting plates 54, and the connecting rod 55 is connected to the vertical slider 522. The two connecting plates 54 are fixed on the two ends of the connecting rod 55, and are driven to move by the moving mechanism through the connecting rod 55. The connecting plate 54 includes a horizontal portion 541 and a vertical portion 542, the lower portion of the vertical portion 542 is connected to the vertical moving component 52, the upper portion of the vertical portion 542 is connected to the horizontal portion 541, and the end of the horizontal portion 541 away from the vertical portion 542 is connected to the support rod 51. The mounting plate 41 of the transmission device 4 close to the first cache mechanism 2 is provided with a movable groove 411 for the connecting plate 54 and the support rod 51 of the film-taking device 5 to move.
[0077] The following briefly describes the working process of the contactless conveying device for the silicon wafer 1 for solar cells in this embodiment:
[0078] After the silicon wafer 1 is loaded, the first buffer mechanism 2 moves to a suitable position.
[0079] The initial position of the support rod 51 of the wafer taking device 5 is below the mounting plate 41. The support rod 51 of the wafer taking device 5 enters the first cache mechanism 2 under the drive of the horizontal moving component 53 and is located below the silicon wafer 1 at the bottom of the first cache mechanism 2. The vertical moving component 52 drives the support rod 51 to rise, and the silicon wafer 1 is separated from the support position of the card slot in the first cache mechanism 2, so that the silicon wafer 1 is completely separated from the first cache mechanism 2. At the same time, under the action of the vacuum mechanism, the silicon wafer 1 is adsorbed on the support rod 51 to prevent the silicon wafer 1 from moving during the lateral movement. The silicon wafer 1 contacts the inclined surface 514 of the support rod 51 through the edge of the silicon wafer 1 on the support rod 51, so as to prevent the front and back of the silicon wafer 1 from contacting any object.
[0080] Driven by the horizontal moving assembly 53, the supporting rod 51 of the wafer taking device 5 drives the silicon wafer 1 to withdraw from the first buffer mechanism 2. After withdrawing to a suitable position, driven by the vertical moving assembly 52, the supporting rod 51 descends, and the vacuum pumping mechanism corresponding to the supporting rod 51 is closed, and the silicon wafer 1 is placed above the steam floating plate assembly 42. Under the action of the steam floating plate assembly 42 and / or the auxiliary suspension mechanism 44, the silicon wafer 1 is suspended and moves forward. At the same time, the first buffer mechanism 2 drives the silicon wafer 1 to move downward a fixed distance to ensure that the horizontal height position of each wafer taking remains unchanged.
[0081] After the support rod 51 of the film taking device 5 drops to the specified position, it reenters the first buffer mechanism 2 under the drive of the horizontal moving assembly 53 to take the film, and the film taking height remains the same. This is repeated to continuously take the film.
[0082] When the silicon wafer 1 moves to the vicinity of the second cache mechanism 3 under the action of the steam floating plate assembly 42 and the auxiliary suspension mechanism 44, the speed of the silicon wafer 1 is reduced under the action of the second suspension mechanism and / or the second auxiliary mechanism, and the silicon wafer 1 enters the second cache mechanism 3 and falls on the supporting block 31. The edge of the silicon wafer 1 is in line contact with the supporting block 31, and the wafer is inserted.
[0083] In some embodiments, the film taking device 5 in this embodiment can also perform a film inserting action, and its action process is opposite to the film taking process, which will not be repeated here.
[0084] The above embodiments prepared by the method of the present invention are only for illustrating the technical concept and features of the present invention, and their purpose is to enable people familiar with the technology to understand the content of the present invention and implement it accordingly, and they cannot be used to limit the protection scope of the present invention. Any equivalent changes or modifications made according to the spirit and essence of the present invention should be included in the protection scope of the present invention.
Claims
1. A silicon wafer transmission device, characterized in that: It includes a mounting plate, a pneumatic suspension mechanism and a driving mechanism arranged on the mounting plate, wherein the pneumatic suspension mechanism includes a steam floating plate assembly, and the top of the steam floating plate assembly is provided with an outlet hole for gas to flow out; the driving mechanism includes a conveying crawler and a driving assembly for driving the conveying crawler to move, and the conveying crawler is provided with a block in contact with the side of the silicon wafer, the driving mechanism is located on both sides of the silicon wafer in the length or width direction, and the conveying crawler rotates in the horizontal direction; the spacing between the two conveying crawlers is greater than the length or width of the silicon wafer.
2. The transmission device according to claim 1, characterized in that: The conveying tracks on both sides of the silicon wafer rotate in opposite directions, and a space for accommodating the silicon wafer is formed between the corresponding blocks on the two conveying tracks, and the distance between the two blocks is smaller than the length or width of the silicon wafer.
3. The transmission device according to claim 1, characterized in that: The stopper on the conveying crawler extends toward the silicon wafer, and the direction is parallel to the silicon wafer.
4. The transmission device according to claim 1, characterized in that: The transmission device includes an auxiliary suspension mechanism, which is arranged between the pneumatic suspension mechanism and the driving mechanism; the auxiliary suspension mechanism includes a main body, an auxiliary air inlet hole opened on the bottom of the main body and an auxiliary air outlet hole opened on the top of the main body, the auxiliary air inlet hole and the auxiliary air outlet hole are connected, and the auxiliary air inlet hole is connected to a high-pressure air source.
5. The transmission device according to claim 4, characterized in that: The auxiliary air outlet is vertically arranged or inclined; and / or the cross section of the auxiliary air outlet is rectangular or conical.
6. The transmission device according to claim 5, characterized in that: The auxiliary suspension mechanism comprises a first auxiliary mechanism close to the first cache mechanism and / or a second auxiliary mechanism close to the second cache mechanism, and the auxiliary air outlet holes on the first auxiliary mechanism and the second auxiliary mechanism have opposite inclination directions.
7. The transmission device according to claim 6, characterized in that: The air outlet holes on the first auxiliary mechanism are inclined from bottom to top toward the second cache mechanism; and / or the air outlet holes on the second auxiliary mechanism are inclined from bottom to top toward the first cache mechanism.
8. The transmission device according to any one of claims 1 to 7, characterized in that: The pneumatic suspension mechanism includes a first suspension mechanism close to the first cache mechanism, and / or a second suspension mechanism close to the second cache mechanism, and / or an intermediate suspension mechanism located between the first suspension mechanism and the second suspension mechanism; the air outlet holes on the first suspension mechanism, the second suspension mechanism and the intermediate suspension mechanism are vertically or inclinedly arranged.
9. The transmission device according to claim 8, characterized in that: The air outlet holes on the first suspension mechanism are inclined from bottom to top toward the middle suspension mechanism; and / or the air outlet holes on the second suspension mechanism are inclined from bottom to top toward the middle suspension mechanism.
10. The transmission device according to claim 8, characterized in that: The air outlet is arranged in a rectangular shape or a conical shape.
11. The transmission device according to claim 1, characterized in that: The steam floating plate assembly comprises a bottom plate, a side plate and a top plate. The bottom plate is provided with an air inlet hole, and the top plate is provided with an air outlet hole.
12. The transmission device according to claim 11, characterized in that: The pneumatic suspension mechanism includes a transverse partition plate arranged between the bottom plate and the top plate, and a through hole is arranged on the transverse partition plate; a first pressure stabilizing chamber is formed between the transverse partition plate and the bottom plate, and a second pressure stabilizing chamber is formed between the transverse partition plate and the top plate.
13. The transmission device according to claim 12, characterized in that: In each of the steam floating plate assemblies, the area of the air inlet hole is larger than the area of all the through holes; and the area of all the through holes is larger than the area of all the air outlet holes.
14. The transmission device according to claim 1, characterized in that: The driving assembly comprises a driving wheel and a driven wheel arranged in the conveying crawler and a driver for driving the driving wheel to rotate.
15. The transmission device according to claim 14, characterized in that: A connecting shaft is arranged between the driving wheel and the driver, and a mounting hole for the connecting shaft to pass through is opened on the mounting plate.
Citation Information
Patent Citations
Silicon wafer transmission device, silicon wafer transmission system and silicon wafer transmission method
CN108735642A
Transmission line for realizing non-contact transmission of silicon wafers
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