Epitaxial equipment

Abstract

The utility model belongs to the technical field of semiconductor equipment, and provides epitaxial equipment which comprises a lower top cover, an upper top cover, a base ring and a rotary shell, a working chamber is defined between the upper top cover and the lower top cover, the base ring surrounds the working chamber and is located between the upper top cover and the lower top cover, a base for placing a substrate is arranged in the working chamber, and the rotary shell is arranged on the base ring. A first detection path and a second detection path are arranged in the base ring, the first detection path and the second detection path are both connected to the digital display pressure switch through a vacuum pipeline, the rotary shell is connected to the lower portion of the lower top cover, and the rotary shell is provided with a third detection path connected to the digital display pressure switch through a vacuum pipeline; the digital display pressure switch can monitor the vacuum degree of a vacuum passage in real time, can reflect the sealing state of the equipment in real time through the numerical value of the vacuum degree, can judge the reliability of the digital display pressure switch, achieves the real-time monitoring of the sealing performance of the epitaxial equipment, improves the reliability of a detection result, reduces the leakage risk, and improves the installation efficiency.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor equipment, and in particular to an epitaxial equipment. Background Art

[0002] The epitaxial process is an important process in semiconductor manufacturing and has a direct impact on the performance of the final semiconductor device. The epitaxial process is also called epitaxial growth or epitaxial deposition, which refers to the process of growing a thin single crystal layer on the surface of an existing single crystal substrate. Growing an epitaxial layer on the surface of a silicon wafer can help improve the crystal quality, stability and reliability of the entire device, reduce defects and impurities, and combined with the doping process, the conductivity of the epitaxial layer can be regulated. The epitaxial process needs to be carried out in an epitaxial device, which has a working chamber, and the substrate is placed in the working chamber for the epitaxial process.

[0003] When performing the epitaxial process, the sealing of the epitaxial equipment is crucial to ensuring the quality and efficiency of the epitaxial process. Good sealing can prevent leakage, maintain a clean working environment inside the equipment, and avoid external interference and pollution. At present, in the existing technology, when monitoring the sealing of the epitaxial equipment, it is impossible to reflect the sealing condition of the epitaxial equipment in real time, and the maintenance and inspection of the detector itself for sealing detection is also relatively cumbersome, so that the reliability of the detector detection results cannot be guaranteed, thereby increasing the risk of leakage of the epitaxial equipment and leaving hidden dangers for subsequent maintenance, which will seriously affect the installation progress. Utility Model Content

[0004] The purpose of the present application is to provide an epitaxial device for solving the problem in the prior art that the sealing of the epitaxial device cannot be effectively monitored, so as to realize real-time monitoring of the sealing of the epitaxial device itself and ensure the reliability and timeliness of the detection results.

[0005] To achieve the above-mentioned and other related purposes, the present application provides an epitaxial device, including an upper top cover, a lower top cover, a base ring and a rotating housing;

[0006] The base ring has a first surface and a second surface that are oppositely arranged, the upper cover is sealed and connected to the first surface, the lower cover is sealed and connected to the second surface, a working chamber is formed between the upper cover and the lower cover, the base ring surrounds the outside of the working chamber, and a base for placing a substrate is arranged in the working chamber;

[0007] The base ring is provided with an air inlet, an air outlet, a first detection passage and a second detection passage, the air inlet and the air outlet are connected to the working chamber to allow working gas to enter, the first detection passage has a first opening and a second opening at opposite ends, the first opening exposes the contact surface between the upper cover and the base ring, the second opening is connected to a digital pressure switch via a vacuum pipeline, the second detection passage has a third opening and a fourth opening at opposite ends, the third opening exposes the contact surface between the lower cover and the base ring, and the fourth opening is connected to the digital pressure switch via a vacuum pipeline;

[0008] The rotating shell is connected to the bottom of the lower top cover, and a third detection passage is arranged in the rotating shell. The opposite ends of the third detection passage respectively have a fifth opening and a sixth opening, the fifth opening exposes the contact surface between the lower top cover and the rotating shell, and the sixth opening is connected to the digital pressure switch via a vacuum pipeline.

[0009] Optionally, a first groove is provided on one side of the base ring close to the upper cover, a first boss is provided at the bottom of the first groove, and the first detection passage passes through the first boss so that the first opening is located on the top surface of the first boss;

[0010] In the first groove, a first sealing ring is arranged on the side of the first boss close to the working chamber, and a second sealing ring is arranged on the side of the first boss away from the working chamber. The upper cover can press the first sealing ring and the second sealing ring to form a first sealing space between the first sealing ring and the second sealing ring.

[0011] Optionally, a second groove is provided on one side of the base ring close to the lower top cover, a second boss is provided at the bottom of the second groove, and the second detection passage passes through the second boss so that the third opening is located on the top surface of the second boss;

[0012] In the second groove, a third sealing ring is arranged on the side of the second boss close to the working chamber, and a fourth sealing ring is arranged on the side of the second boss away from the working chamber, and the lower top cover can press the third sealing ring and the fourth sealing ring to form a second sealed space between the third sealing ring and the fourth sealing ring.

[0013] Optionally, the upper cover includes a first cover body and a first outer flange, and the lower cover includes a second cover body, a second outer flange and a lower cylinder;

[0014] The second cover body is a funnel-shaped structure, and together with the first cover body, forms the working chamber; the first outer flange surrounds the outer side of the first cover body and is sealed to the first surface; the second outer flange surrounds the outer side of the second cover body and is sealed to the second surface;

[0015] The lower cylinder is in a cylindrical structure and is coaxially connected to the lower side of the second cover. One end of the lower cylinder away from the second cover has an arc-shaped outer side surface.

[0016] Optionally, the rotating shell is a cylindrical structure, the cylindrical structure of the rotating shell surrounds the arc-shaped outer side surface of the lower cylinder and is sealed and connected to the lower cylinder;

[0017] A third groove is provided on the inner wall surface of the rotating housing, a third boss is provided at the bottom of the third groove, and the third detection passage passes through the third boss so that the fifth opening is located on the top surface of the third boss;

[0018] In the third groove, a fifth sealing ring is arranged on the side of the third boss close to the working chamber, and a sixth sealing ring is arranged on the side of the third boss away from the working chamber, and the arc-shaped outer side surface of the lower cylinder can press the fifth sealing ring and the sixth sealing ring to form a third sealing space between the fifth sealing ring and the sixth sealing ring.

[0019] Optionally, the epitaxial device also includes a rotating support portion, which is connected to the bottom of the base to support the base and drive the base to rotate. One end of the rotating support portion away from the base extends to the outside of the working chamber through the through hole of the cylindrical structure of the lower cylinder.

[0020] Optionally, the epitaxial device further includes an upper clamping ring and a lower clamping ring, and the first outer flange and the second outer flange are located between the upper clamping ring and the lower clamping ring.

[0021] Optionally, the vacuum pipeline includes a sealed main pipe, a first pipeline communicating with the second opening, a second pipeline communicating with the fourth opening, and a third pipeline communicating with the sixth opening;

[0022] The sealed main pipe has a first end and a second end opposite to each other, the digital pressure switch is connected between the first end and the second end of the sealed main pipe, and the first end of the sealed main pipe is respectively connected to the first pipeline, the second pipeline and the third pipeline, so that the digital pressure controls the opening and closing of the first pipeline, the second pipeline and the third pipeline.

[0023] Optionally, a first valve is provided in the first pipeline to control the opening and closing of the first pipeline, a second valve is provided in the second pipeline to control the opening and closing of the second pipeline, and a third valve is provided in the third pipeline to control the opening and closing of the third pipeline.

[0024] Optionally, a barrier member for shielding the base ring is further provided in the working chamber, and an air inlet channel and an air outlet channel are provided in the barrier member, the air inlet channel is connected to the air inlet, and the air outlet channel is connected to the air outlet.

[0025] The epitaxial device provided in this application has at least the following beneficial effects:

[0026] The first detection passage, the second detection passage and the third detection passage are all connected to the digital pressure switch, which monitors the vacuum degree of the vacuum pipeline in real time through the digital pressure switch, and can monitor the sealing between the base ring and the upper top cover and the lower top cover, as well as the sealing between the lower top cover and the rotating shell in real time, thereby realizing real-time monitoring of the sealing of the epitaxial equipment; at the same time, the digital pressure switch can display the value of the vacuum degree, and the working reliability of the digital pressure switch can be judged according to the value of the vacuum degree, thereby ensuring the working stability of the digital pressure switch, improving the reliability of the detection results, and reflecting the sealing status of the equipment in real time, thereby reducing the risk for subsequent installation and leakage detection, and improving the efficiency of pre-maintenance; by setting the first valve, the second valve and the third valve, the sealing of the first sealing space, the second sealing space and the third sealing space can be separately monitored, thereby further improving the pre-maintenance efficiency and installation efficiency of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0028] Figure 1 Shown is a schematic diagram of the structure of the epitaxial device provided in Example 1 of the present application.

[0029] Figure 2 Display as Figure 1 A schematic diagram of the structure of the connection between the base ring and the upper cover in the epitaxial device shown.

[0030] Figure 3 Display as Figure 1 A schematic diagram of the structure of the connection between the base ring and the lower top cover in the epitaxial device shown.

[0031] Figure 4 Display as Figure 1 A schematic diagram of the structure of the connection between the rotating shell and the lower top cover in the epitaxial device shown.

[0032] Figure 5 Shown is a schematic diagram of the structure of another epitaxial device provided in Example 1 of the present application.

[0033] Reference numerals:

[0034] 1. Upper cover; 11. First cover body; 12. First outer flange; 2. Lower cover; 21. Second cover body; 22. Second outer flange; 23. Lower cylinder; 3. Base ring; 301. First surface; 302. Second surface; 303. Air inlet; 304. Air outlet; 31. First detection passage; 311. First opening; 312. Second opening; 32. Second detection passage; 321. Third opening; 322. Fourth opening; 33. First groove; 331. First boss; 332. First sealing ring; 333. Second sealing ring; 34. Second groove; 341. Second boss; 342. Third sealing ring; 343. Fourth sealing ring; 4. Rotating housing; 41. third detection passage; 411. fifth opening; 412. sixth opening; 42. third groove; 421. third boss; 422. fifth sealing ring; 423. sixth sealing ring; 51. vacuum pipeline; 511. first pipeline; 512. second pipeline; 513. third pipeline; 514. sealing main pipe; 5141. first end; 5142. second end; 52. digital pressure switch; 531. first valve; 532. second valve; 533. third valve; 61. base; 62. rotating support; 621. support frame; 622. rotating shaft; 7. barrier; 71. air inlet channel; 72. air outlet channel; 81. upper clamping ring; 82. lower clamping ring. DETAILED DESCRIPTION

[0035] In order to make the technical purpose, technical solution and technical effect of the present application clearer, the technical solution in the present application will be clearly and completely described in conjunction with the embodiments below. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.

[0036] Therefore, the following detailed description of the embodiments of the present application is not intended to limit the scope of the present application for protection, but merely represents the selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work are within the scope of protection of the present application. In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0037] In the description of the present application, it should be noted that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0038] In the description of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. In addition, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "example", "specific example" or "some examples" means that the specific features, structures, materials or characteristics described in combination with the implementation or example are included in at least one implementation or example of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same implementation or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more implementations or examples in a suitable scheme.

[0039] This embodiment provides an epitaxial device that can monitor its own sealing in real time and ensure the reliability and timeliness of the detection results. Figure 1 The epitaxial device of this embodiment includes an upper cover 1, a lower cover 2, a base ring 3 and a rotating shell 4.

[0040] The base ring 3 has a first surface 301 and a second surface 302 that are arranged opposite to each other. The upper top cover 1 is sealed to the first surface 301, and the lower top cover 2 is sealed to the second surface 302. A working chamber is formed between the upper top cover 1 and the lower top cover 2, and a base 61 is arranged in the working chamber, and the base 61 is used to be placed on the substrate.

[0041] The base ring 3 is provided with an air inlet 303, an air outlet 304, a first detection passage 31 and a second detection passage 32. The air inlet 303 and the air outlet 304 are connected to the working chamber, and the working gas flows into the working chamber from the air inlet 303 and flows out through the air outlet 304. The first detection passage 31 runs through the base ring 3, and the opposite ends of the first detection passage 31 respectively have a first opening 311 and a second opening 312. The first opening 311 is located on the first surface 301 of the base ring 3 and exposes the contact surface between the upper cover 1 and the base ring 3. The second opening 312 is connected to the digital pressure switch 52 through the vacuum pipeline 51. The second detection passage 32 runs through the base ring 3, and the opposite ends of the second detection passage 32 respectively have a third opening 321 and a fourth opening 322. The third opening 321 is located on the second surface 302 of the base ring 3 and exposes the contact surface between the lower cover 2 and the base ring 3. The fourth opening 322 is connected to the digital pressure switch 52 through the vacuum passage. The digital pressure switch 52 is a digital pressure switch, which can detect and display the vacuum degree of the vacuum pipeline 51 connected thereto.

[0042] The rotating shell 4 is connected to the bottom of the lower top cover 2, and the rotating shell 4 and the lower top cover 2 are sealed. A third detection passage 41 is provided in the rotating shell 4. The third detection passage 41 runs through the rotating shell 4, and the opposite ends of the third detection passage 41 have a fifth opening 411 and a sixth opening 412 respectively. The fifth opening 411 exposes the contact surface between the lower top cover 2 and the rotating shell 4, and the sixth opening 412 is connected to the digital pressure switch 52 via a vacuum passage.

[0043] When in use, through the first detection passage 31, the second detection passage 32 and the third detection passage 41, the digital pressure switch 52 can display the vacuum degree in the vacuum pipeline 51 in real time, and then reflect the sealing between the upper top cover 1 and the base ring 3, the sealing between the lower top cover 2 and the base ring 3, and the sealing between the lower top cover 2 and the rotating shell 4 in real time, thereby realizing real-time monitoring of the sealing of the epitaxial equipment, and the digital pressure switch 52 can display the value of the vacuum degree. According to the value of the vacuum degree, the reliability of the digital pressure switch 52 can be judged, thereby ensuring the working stability of the digital pressure switch 52, thereby improving the reliability of the detection result, avoiding hidden dangers for subsequent maintenance, and reducing the risk of leakage in the epitaxial equipment.

[0044] In this embodiment, refer to Figure 1 and Figure 2, the base ring 3 surrounds the outside of the working chamber, and optionally, the base ring 3 is an annular structure. A first groove 33 is provided on the side of the base ring 3 close to the upper cover 1, and the upper cover 1 can cover at least part of the first groove 33. Optionally, the first groove 33 is an annular structure and surrounds the working chamber. A first boss 331 is provided at the bottom of the first groove 33, and the first boss 331 is spaced apart from the side wall of the first groove 33 close to the working chamber, and is spaced apart from the side wall of the first groove 33 away from the working chamber. Optionally, the first groove 33 is an annular structure and surrounds the working chamber. The first detection passage 31 passes through the first boss 331, so that the first opening 311 is located on the top surface of the first boss 331, wherein the top surface of the first boss 331 is the surface of the first boss 331 close to the upper cover 1.

[0045] In the first groove 33, a first sealing ring 332 is arranged on the side of the first boss 331 close to the working chamber, and a second sealing ring 333 is arranged on the side of the first boss 331 away from the working chamber. The upper cover 1 can press the first sealing ring 332 and the second sealing ring 333 to form a first sealed space between the first sealing ring 332 and the second sealing ring 333. Optionally, other annular components such as heat insulation rings and other sealing rings can be arranged in the first groove 33 according to actual needs, but the present embodiment is not limited thereto. The first sealed space is connected to the vacuum pipeline 51 through the first opening 311, so that the digital pressure switch 52 can monitor the vacuum degree of the first sealed space. The vacuum degree of the first sealed space can reflect the sealing between the upper cover 1 and the base ring 3, thereby realizing the monitoring of the sealing of the epitaxial equipment.

[0046] In this embodiment, refer to Figure 1 and Figure 3 A second groove 34 is provided on the side of the base ring 3 close to the lower cover 2, and the lower cover 2 can cover at least part of the second groove 34. Optionally, the second groove 34 is an annular structure and surrounds the working chamber. A second boss 341 is provided at the bottom of the second groove 34. The second boss 341 is spaced apart from the side wall of the second groove 34 close to the working chamber, and is also spaced apart from the side wall of the second groove 34 away from the working chamber. Optionally, the second groove 34 is an annular structure and surrounds the working chamber. The second detection passage 32 passes through the second boss 341, so that the third opening 321 is located on the top surface of the second boss 341, wherein the top surface of the second boss 341 is the surface of the second boss 341 close to the lower cover 2.

[0047] In the second groove 34, a third sealing ring 342 is arranged on the side of the second boss 341 close to the working chamber, and a fourth sealing ring 343 is arranged on the side of the second boss 341 away from the working chamber. The lower top cover 2 can press the third sealing ring 342 and the fourth sealing ring 343 to form a second sealed space between the third sealing ring 342 and the fourth sealing ring 343. Optionally, other annular components such as insulation rings and other sealing rings can be arranged in the second groove 34 according to actual needs. The second sealed space is connected to the vacuum pipeline 51 through the third opening 321, so that the digital pressure switch 52 can monitor the vacuum degree of the second sealed space. The vacuum degree of the second sealed space can reflect the sealing between the lower top cover 2 and the base ring 3, thereby realizing the monitoring of the sealing of the epitaxial equipment.

[0048] In this embodiment, the upper cover 1 includes a first cover body 11 and a first outer flange 12, and the lower cover 2 includes a second cover body 21, a second outer flange 22 and a lower cylinder 23. The second cover body 21 is a funnel-shaped structure. The second cover body 21 and the first cover body 11 form a working chamber. The first outer flange 12 surrounds the first cover body 11 and is located on the outside of the first cover body 11. The first outer flange 12 is sealed and connected to the first surface 301 of the base ring 3; the second outer flange 22 surrounds the outside of the second cover body 21 and is located on the outside of the second cover body 21. The second outer flange 22 is sealed and connected to the second surface 302 of the base ring 3. The lower cylinder 23 is a cylindrical structure and is connected to the bottom of the second cover body 21. The lower cylinder 23 is coaxially arranged with the second cover body 21. The end of the lower cylinder 23 away from the second cover body 21 has an arc-shaped outer side surface. Optionally, the end of the lower cylinder 23 away from the second cover body 21 has an outwardly convex arc-shaped outer side surface.

[0049] Reference Figure 1 and Figure 4The rotating shell 4 is a cylindrical structure, and the cylindrical structure of the rotating shell 4 surrounds the arc-shaped outer side surface of the lower cylinder 23 and is sealed and connected with the lower cylinder 23. A third groove 42 is provided on the inner wall surface of the rotating shell 4, and a third boss 421 is provided at the bottom of the third groove 42. The third boss 421 is spaced apart from the side wall of the third groove 42 close to the working chamber, and is spaced apart from the side wall of the third groove 42 away from the working chamber. Optionally, the third groove 42 and the third boss 421 are both annular structures and surround the outer side of the lower cylinder 23. The third detection passage 41 passes through the third boss 421 so that the fifth opening 411 is located on the top surface of the third boss 421, wherein the top surface of the third boss 421 is the surface of the third boss 421 close to the arc-shaped outer side surface of the lower cylinder 23. In the third groove 42, a fifth sealing ring 422 is provided on the side of the third boss 421 close to the working chamber, and a sixth sealing ring 423 is provided on the side of the third boss 421 away from the working chamber. The arc-shaped outer side surface of the lower cylinder 23 can press the fifth sealing ring 422 and the sixth sealing ring 423, so that a third sealed space is formed between the fifth sealing ring 422 and the sixth sealing ring 423. The third sealed space is connected to the vacuum pipeline 51 through the fifth opening 411, so that the digital pressure switch 52 can monitor the vacuum degree of the third sealed space. The vacuum degree of the third sealed space can reflect the sealing between the rotating shell 4 and the lower cylinder 23 of the lower top cover 2, thereby realizing the monitoring of the sealing of the epitaxial equipment.

[0050] In this embodiment, refer to Figure 5 The epitaxial device further includes a rotating support portion 62, which is connected to the bottom of the base 61. The rotating support portion 62 is used to support the base 61 and drive the base 61 to rotate so that the substrate rotates with the base 61. One end of the rotating support portion 62 away from the base 61 extends to the outside of the working chamber through the through hole in the cylindrical structure of the lower cylinder 23. Optionally, the rotating support portion 62 includes a support frame 621 and a rotating shaft 622, the support frame 621 is connected to the bottom of the base 61 to support the base 61, and the rotating shaft 622 is connected to the bottom of the support frame 621, which can support the support frame 621 and drive the support frame 621 to rotate.

[0051] In this embodiment, refer to Figure 1 The epitaxial device also includes an upper clamping ring 81 and a lower clamping ring 82, and the first outer flange 12 and the second outer flange 22 are located between the upper clamping ring 81 and the lower clamping ring 82. Optionally, the upper clamping ring 81 is connected to the first outer flange 12, and the lower clamping ring 82 is connected to the second outer flange 22. The upper clamping ring 81 presses the first outer flange 12 toward the lower clamping ring 82, and the lower clamping ring 82 presses the second outer flange 22 toward the upper clamping ring 81, so that the upper top cover 1 is sealedly connected to the first surface 301 of the base ring 3, and the lower top cover 2 is sealedly connected to the second surface 302 of the base ring 3.

[0052] In this embodiment, refer to Figure 5 The vacuum pipeline 51 includes a first pipeline 511, a second pipeline 512, a third pipeline 513 and a sealed main pipe 514. The sealed main pipe 514 has a first end 5141 and a second end 5142 that are arranged opposite to each other. The digital pressure switch 52 is connected between the first end 5141 and the second end 5142 of the sealed main pipe 514. One end of the first pipeline 511 is connected to the second opening 312, and the other end is connected to the first end 5141 of the sealed main pipe 514. One end of the second pipeline 512 is connected to the fourth opening 322, and the other end is connected to the first end 5141 of the sealed main pipe 514. One end of the third pipeline 513 is connected to the sixth opening 412, and the other end is connected to the first end 5141 of the sealed main pipe 514, so that the second opening 312, the fourth opening 322 and the sixth opening 412 are all connected to the sealed main pipe 514, and the digital pressure switch 52 can control the opening and closing of the first pipeline 511, the second pipeline 512 and the third pipeline 513.

[0053] In an alternative embodiment, reference Figure 5 A first valve 531 is provided in the first pipeline 511 to control the opening and closing of the first pipeline 511, a second valve 532 is provided in the second pipeline 512 to control the opening and closing of the second pipeline 512, and a third valve 533 is provided in the third pipeline 513 to control the opening and closing of the third pipeline 513. Optionally, the first valve 531, the second valve 532 and the third valve 533 can be, for example, manual valves. By controlling the opening and closing of the first valve 531, the second valve 532 and the third valve 533, the digital pressure switch 52 can be used to detect the sealing of the first sealed space, the second sealed space and the third sealed space respectively, so as to realize separate monitoring of the sealing between the upper top cover 1 and the base ring 3, the sealing between the lower top cover 2 and the base ring 3, and the sealing between the lower cylinder 23 of the lower top cover 2 and the rotating shell 4. When the vacuum degree detected by the digital pressure switch 52 cannot meet the design requirements, the first valve 531, the second valve 532 and the third valve 533 can be used to quickly determine the fault location, thereby improving the maintenance rate of the equipment and thereby improving the installation efficiency.

[0054] In this embodiment, refer to Figure 5, a barrier 7 is also provided in the working chamber, and an inlet channel 71 and an outlet channel 72 are provided in the barrier 7, the inlet channel 71 is communicated with the inlet port 303, and the outlet channel 72 is communicated with the outlet port 304, and the working gas flowing in through the inlet port 303 can flow to the substrate on the base 61 through the inlet channel 71 to react with the substrate, and then the working gas flows out from the outlet port 304 through the outlet channel 72. Optionally, the barrier 7 is an annular structure and surrounds the inner side of the base ring 3, and the barrier 7 can shield the base ring 3 to isolate the base ring 3 from the working chamber, thereby preventing the base ring 3 from affecting the substrate or the base 61.

[0055] In the epitaxial device of the present embodiment, the vacuum degree of the vacuum pipeline 51 is monitored in real time by the digital pressure switch 52, and the sealing between the base ring 3 and the upper cover 1 and the lower cover 2, as well as the sealing between the lower cover 2 and the rotating shell 4, can be monitored in real time, thereby realizing real-time monitoring of the sealing of the epitaxial device. In addition, the digital pressure switch 52 can display the value of the vacuum degree. According to the value of the vacuum degree, the working reliability of the digital pressure switch 52 can be judged, thereby ensuring the working stability of the digital pressure switch 52, improving the reliability of the monitoring result, and reflecting the sealing state of the equipment in real time, thereby reducing the risk for subsequent installation and leakage detection, and improving the efficiency of pre-maintenance. By setting the first valve 531, the second valve 532 and the third valve 533, the sealing between the upper cover 1 and the base ring 3, the sealing between the lower cover 2 and the base ring 3, and the sealing between the rotating shell 4 and the lower cylinder 23 of the lower cover 2 are separately monitored, thereby improving the troubleshooting and maintenance efficiency of the equipment, thereby further improving the pre-maintenance efficiency and the installation efficiency.

[0056] The above embodiments are merely illustrative of the principles and effects of the present application and are not intended to limit the present application. Anyone familiar with the technology may modify, change or combine the above embodiments without violating the spirit and scope of the present application. Therefore, all equivalent modifications or changes made by a person of ordinary skill in the art without departing from the spirit and technical ideas disclosed in the present application shall still be covered by the claims of the present application.

Claims

1. An epitaxial device, characterized in that: It includes an upper cover, a lower cover, a base ring and a rotating housing; The base ring has a first surface and a second surface that are oppositely arranged, the upper cover is sealed and connected to the first surface, the lower cover is sealed and connected to the second surface, a working chamber is formed between the upper cover and the lower cover, the base ring surrounds the outside of the working chamber, and a base for placing a substrate is arranged in the working chamber; The base ring is provided with an air inlet, an air outlet, a first detection passage and a second detection passage, the air inlet and the air outlet are connected to the working chamber to allow working gas to enter, the first detection passage has a first opening and a second opening at opposite ends, the first opening exposes the contact surface between the upper cover and the base ring, the second opening is connected to a digital pressure switch via a vacuum pipeline, the second detection passage has a third opening and a fourth opening at opposite ends, the third opening exposes the contact surface between the lower cover and the base ring, and the fourth opening is connected to the digital pressure switch via a vacuum pipeline; The rotating shell is connected to the bottom of the lower top cover, and a third detection passage is arranged in the rotating shell. The opposite ends of the third detection passage respectively have a fifth opening and a sixth opening, the fifth opening exposes the contact surface between the lower top cover and the rotating shell, and the sixth opening is connected to the digital pressure switch via a vacuum pipeline.

2. The epitaxial device according to claim 1, characterized in that: A first groove is provided on one side of the base ring close to the upper cover, a first boss is provided at the bottom of the first groove, and the first detection passage passes through the first boss so that the first opening is located on the top surface of the first boss; In the first groove, a first sealing ring is arranged on the side of the first boss close to the working chamber, and a second sealing ring is arranged on the side of the first boss away from the working chamber. The upper cover can press the first sealing ring and the second sealing ring to form a first sealing space between the first sealing ring and the second sealing ring.

3. The epitaxial device according to claim 1, characterized in that: A second groove is provided on one side of the base ring close to the lower top cover, a second boss is provided at the bottom of the second groove, and the second detection passage passes through the second boss so that the third opening is located on the top surface of the second boss; In the second groove, a third sealing ring is arranged on the side of the second boss close to the working chamber, and a fourth sealing ring is arranged on the side of the second boss away from the working chamber, and the lower top cover can press the third sealing ring and the fourth sealing ring to form a second sealed space between the third sealing ring and the fourth sealing ring.

4. The epitaxial device according to claim 1, characterized in that: The upper cover comprises a first cover body and a first outer flange, and the lower cover comprises a second cover body, a second outer flange and a lower cylinder; The second cover body is a funnel-shaped structure, and together with the first cover body, forms the working chamber; the first outer flange surrounds the outer side of the first cover body and is sealed to the first surface; the second outer flange surrounds the outer side of the second cover body and is sealed to the second surface; The lower cylinder is in a cylindrical structure and is coaxially connected to the lower side of the second cover. One end of the lower cylinder away from the second cover has an arc-shaped outer side surface.

5. The epitaxial device according to claim 4, characterized in that: The rotating shell is a cylindrical structure, which surrounds the arc-shaped outer side surface of the lower cylinder and is sealed with the lower cylinder; A third groove is provided on the inner wall surface of the rotating housing, a third boss is provided at the bottom of the third groove, and the third detection passage passes through the third boss so that the fifth opening is located on the top surface of the third boss; In the third groove, a fifth sealing ring is arranged on the side of the third boss close to the working chamber, and a sixth sealing ring is arranged on the side of the third boss away from the working chamber, and the arc-shaped outer side surface of the lower cylinder can press the fifth sealing ring and the sixth sealing ring to form a third sealing space between the fifth sealing ring and the sixth sealing ring.

6. The epitaxial device according to claim 4, characterized in that: It also includes a rotating support part, which is connected to the bottom of the base to support the base and drive the base to rotate. One end of the rotating support part away from the base extends to the outside of the working chamber through the through hole of the cylindrical structure of the lower cylinder.

7. The epitaxial device according to claim 4, characterized in that: It also includes an upper clamping ring and a lower clamping ring, and the first outer flange and the second outer flange are located between the upper clamping ring and the lower clamping ring.

8. The epitaxial device according to claim 1, characterized in that: The vacuum pipeline includes a sealed main pipe, a first pipeline communicating with the second opening, a second pipeline communicating with the fourth opening, and a third pipeline communicating with the sixth opening; The sealed main pipe has a first end and a second end opposite to each other, the digital pressure switch is connected between the first end and the second end of the sealed main pipe, and the first end of the sealed main pipe is respectively connected to the first pipeline, the second pipeline and the third pipeline, so that the digital pressure controls the opening and closing of the first pipeline, the second pipeline and the third pipeline.

9. The epitaxial device according to claim 8, characterized in that: A first valve is provided in the first pipeline to control the opening and closing of the first pipeline, a second valve is provided in the second pipeline to control the opening and closing of the second pipeline, and a third valve is provided in the third pipeline to control the opening and closing of the third pipeline.

10. The epitaxial device according to claim 1, characterized in that: The working chamber is also provided with a barrier for shielding the base ring, and the barrier is provided with an air inlet channel and an air outlet channel, the air inlet channel is communicated with the air inlet, and the air outlet channel is communicated with the air outlet.

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