Deep impurity removal device for metal silicon smelting

Abstract

The utility model discloses a deep impurity removal device for metal silicon smelting, which relates to the technical field of metal silicon smelting devices and comprises a shell, a circulating pipe penetrates through the top end of the shell, a gas circulating pump is arranged at the bottom of the circulating pipe, a connecting pipe is clamped at the output end of the gas circulating pump, a chlorine gas inlet pipe is arranged at the bottom of the connecting pipe, and a chlorine gas outlet pipe is arranged at the bottom of the chlorine gas inlet pipe. A cover cylinder is fixedly connected to one end of the chlorine inlet pipe, a fan impeller is arranged in the middle of the inner side of the cover cylinder, a coke rod is fixedly connected to the top of the inner side of the cover cylinder, a discharging pipe penetrates through the top of one side wall of the cover cylinder, a flat plate is arranged at the bottom of the cover cylinder, and a cavity is formed in the shell. According to the utility model, a series of structures are arranged, so that the reaction rate of metal silicon purification is improved, the purification of metal silicon is facilitated, unreacted chlorine can be recycled, unnecessary waste of chlorine is reduced, and the purification and impurity removal cost of the device is saved.

Description

Technical Field

[0001] The utility model relates to the technical field of metal silicon smelting devices, in particular to a deep impurity removal device for metal silicon smelting. Background Art

[0002] The crude silicon obtained after heating in an electric arc furnace will still contain impurities, so it is necessary to deeply remove impurities from the crude silicon through purification and smelting. This process is also called silicon refining. It is mainly to remove impurities such as calcium, aluminum, and iron in the crude silicon obtained after silicon smelting. The methods of silicon refining include ventilation refining and flux refining.

[0003] However, when the existing deep impurity removal device for metallic silicon smelting uses aeration refining to remove impurities from crude silicon, it is usually necessary to introduce high-purity chlorine gas into the device so that the chlorine gas contacts the silicon dioxide powder. In this process, since the contact between chlorine gas and silicon dioxide is not sufficient and it is not easy to react, the purification reaction rate of metallic silicon is low, which is not conducive to the purification of metallic silicon. In addition, after the chlorine gas is introduced into the device, some chlorine gas still does not react with the silicon dioxide powder and is directly discharged from the exhaust pipe along with other generated gases, resulting in unnecessary waste of chlorine gas and increasing the cost of purification and impurity removal of the device. Utility Model Content

[0004] The utility model aims to provide a deep impurity removal device for metal silicon smelting to solve the problems raised in the above background technology.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a deep impurity removal device for metallic silicon smelting, comprising an outer shell, a circulation pipe passing through the top of the outer shell, a gas circulation pump being arranged at the bottom of the circulation pipe, a connecting pipe being engaged with the output end of the gas circulation pump, a chlorine gas inlet pipe being arranged at the bottom of the connecting pipe, a cover tube being fixedly connected to one end of the chlorine gas inlet pipe, a fan impeller being arranged at the middle of the inner side of the cover tube, a coke rod being fixedly connected to the top of the inner side of the cover tube, a feed pipe being passed through the top of one side wall of the cover tube, a flat plate being arranged at the bottom of the cover tube, a cavity being opened inside the outer shell, a wire mesh being engaged with the top of the inner side of the cavity, catcher powder being flatly laid at the top of the wire mesh, a liquid outlet pipe being passed through the bottom of the outer shell, a second valve being fixedly installed at the middle of the liquid outlet pipe.

[0006] Preferably, the gas circulation pump is fixedly mounted on an outer wall of one side of the housing, and the circulation pipe is snap-connected to an input end of the gas circulation pump.

[0007] Preferably, the connecting pipe passes through the top end of the chlorine gas inlet pipe, a check valve is installed at the junction of the connecting pipe and the chlorine gas inlet pipe, and a first valve is installed at the other end of the chlorine gas inlet pipe.

[0008] Preferably, the chlorine gas inlet pipe is connected through the outer shell, and the interior of the chlorine gas inlet pipe is communicated with the interior of the cover tube.

[0009] Preferably, an opening is provided at the bottom end of the cover tube, and the cover tube is communicated with the interior of the cavity through the opening.

[0010] Preferably, the opening is located directly above the flat plate, and the flat plate is fixedly connected to the bottom of the inner side of the cavity by means of a vertical rod.

[0011] Preferably, a clamping rod is fixedly connected to the middle portion of the inner wall of the cover tube, the impeller is movably sleeved and connected to the clamping rod, and the impeller is movably connected to the cover tube via the clamping rod.

[0012] Compared with the prior art, the beneficial effects of the utility model are:

[0013] 1. The deep impurity removal device for metal silicon smelting, through the cover tube, coke rod, impeller and flat plate, allows the chlorine gas entering the device to enter the cover tube from bottom to top, and fully contact with the silicon dioxide powder sliding down from the cover tube from top to bottom, and react under the catalysis of coke and the high temperature and high pressure environment inside the shell, thereby improving the reaction efficiency of metal silicon purification, which is more conducive to the purification of metal silicon.

[0014] 2. The deep impurity removal device for metallic silicon smelting uses a wire mesh, catching powder, a circulation pipe and a gas circulation pump to allow the unreacted chlorine in the device to re-enter the device through the circulation pipe for reaction, and the carbon monoxide generated during the reaction can be eliminated by the corresponding catching powder to generate less harmful carbon dioxide gas, thereby protecting the chlorine during the circulation process, allowing the unreacted chlorine to be recycled, reducing unnecessary waste of chlorine, and thus saving the cost of purification and impurity removal of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0016] Figure 2 It is a schematic diagram of the structure of the wire mesh and the powder catching and eliminating device of the utility model;

[0017] Figure 3 This is a schematic diagram of the structure of the circulation pipe and gas circulation pump of the utility model;

[0018] Figure 4 This is a schematic diagram of the cover tube and impeller structure of the utility model.

[0019] In the figure: 1, outer shell; 2, circulation pipe; 3, gas circulation pump; 4, connecting pipe; 5, chlorine gas inlet pipe; 6, first valve; 7, liquid outlet pipe; 8, second valve; 9, check valve; 10, cavity; 11, cover tube; 12, flat plate; 13, opening; 14, impeller; 15, clamping rod; 16, coke rod; 17, discharge pipe; 18, wire mesh; 19, catch powder. DETAILED DESCRIPTION

[0020] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0021] In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "front end", "rear end", "two ends", "one end", "the other end" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0022] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "provided with", "connected", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0023] like Figures 1 to 4As shown, the deep impurity removal device for metallic silicon smelting in this embodiment comprises a shell 1, a circulation pipe 2 is penetrated through the top of the shell 1, a gas circulation pump 3 is arranged at the bottom of the circulation pipe 2, a connecting pipe 4 is clamped on the output end of the gas circulation pump 3, a chlorine gas inlet pipe 5 is arranged at the bottom of the connecting pipe 4, a cover cylinder 11 is fixedly connected to one end of the chlorine gas inlet pipe 5, a fan impeller 14 is arranged in the middle of the inner side of the cover cylinder 11, a coke rod 16 is fixedly connected to the top of the inner side of the cover cylinder 11, a feed pipe 17 is penetrated through the top of one side wall of the cover cylinder 11, a flat plate 12 is arranged at the bottom of the cover cylinder 11, a cavity 10 is opened inside the shell 1, a wire mesh 18 is clamped on the top of the inner side of the cavity 10, and a catcher powder 19 is laid on the top of the wire mesh 18, a liquid outlet pipe 7 is penetrated through the bottom of the shell 1, and a second valve 8 is fixedly installed in the middle of the liquid outlet pipe 7.

[0024] Specifically, the top of the shell 1 is an arc top, which is conducive to the gathering of gas in the device, so as to facilitate the gas to enter the circulation pipe 2 for subsequent circulation. The function of the circulation pipe 2 is to allow the carbon dioxide gas generated in the device and the unreacted chlorine to circulate and re-enter the device to react with the silicon dioxide powder, thereby reducing unnecessary waste of chlorine. At the same time, a heater and a temperature control system are also installed inside the shell 1, so that the silicon dioxide powder, chlorine and coke rods 16 can be processed in a high temperature environment, which is conducive to the reduction and purification of silicon dioxide. The function of the gas circulation pump 3 is to allow the chlorine to be re-introduced into the chlorine inlet pipe 5, so that the unreacted chlorine in the device can be recycled. The top of the cover tube 11 is closed and the bottom is provided with an opening 13, so that the chlorine gas entering the cover tube 11 through the chlorine inlet pipe 5 can return from the cover tube 11 to the opening 13 at the bottom after flowing upward, and then react with the silicon dioxide powder falling on the flat plate 12 for a secondary reaction, which is conducive to the full contact between the chlorine and the silicon dioxide. The impeller 14 can rotate in the cover tube 11 under the blowing of chlorine gas, so that the chlorine gas can be evenly dispersed in the cover tube 11, and contact and react with the coke rod 16 in the cover tube 11 and the silicon dioxide powder entering the cover tube 11. The top of the feed pipe 17 is engaged with a card cover for closing the feed pipe 17. At the same time, a one-way valve is installed at the connection between the feed pipe 17 and the cover tube 11 to prevent chlorine gas from overflowing out of the device through the feed pipe 17, thereby reducing unnecessary waste of chlorine gas. The function of the plate 12 is to support the silicon dioxide powder so that the silicon dioxide powder has sufficient time to contact and react with the chlorine gas. At the same time, a cooling structure is installed inside the plate 12, which is conducive to the generated silicon tetrachloride liquid to remain in liquid state and flow into the cavity 10. The capture and elimination powder 19 is a powder specially used to capture and eliminate the carbon monoxide gas generated in the reaction, which can quickly oxidize the carbon monoxide gas into carbon dioxide to reduce the generation of toxic gases in the device. The function of the liquid outlet pipe 7 is to facilitate the generated silicon tetrachloride liquid to be discharged from the device for subsequent purification and separation.

[0025] Furthermore, the gas circulation pump 3 is fixedly mounted on the outer wall of one side of the outer shell 1, and the circulation pipe 2 is snap-connected with the input end of the gas circulation pump 3. The circulation pipe 2 passes the unreacted chlorine in the device into the connecting pipe 4 through the gas circulation pump 3, so that the chlorine can be recycled.

[0026] Furthermore, the connecting pipe 4 passes through the top end of the chlorine inlet pipe 5, and a check valve 9 is installed at the junction of the connecting pipe 4 and the chlorine inlet pipe 5. A first valve 6 is installed at the other end of the chlorine inlet pipe 5. The check valve 9 can prevent the chlorine entering from the chlorine inlet pipe 5 from entering the connecting pipe 4, thereby ensuring that the chlorine directly enters the cover tube 11. The function of the first valve 6 is to keep the chlorine inlet pipe 5 in a closed state when chlorine is not introduced, so that the chlorine in the connecting pipe 4 can form a microcirculation inside the shell 1, thereby facilitating the recycling of chlorine.

[0027] Furthermore, the chlorine inlet pipe 5 is connected to the outer shell 1, and the interior of the chlorine inlet pipe 5 is communicated with the interior of the cover tube 11. The chlorine is circulated through the connecting pipe 4 and the chlorine inlet pipe 5, thereby reducing unnecessary waste of chlorine and saving the cost required for purification and impurity removal of the device.

[0028] Furthermore, an opening 13 is provided at the bottom end of the cover tube 11, and the cover tube 11 is connected to the interior of the cavity 10 through the opening 13. The opening 13 at the bottom of the cover tube 11 allows the silicon dioxide powder to fall smoothly onto the flat plate 12, and at the same time allows the chlorine gas entering the cover tube 11 to return and re-contact the silicon dioxide on the flat plate 12, thereby helping to accelerate the purification efficiency of metallic silicon.

[0029] Furthermore, the opening 13 is located directly above the flat plate 12, and the flat plate 12 is fixedly connected to the bottom of the inner side of the cavity 10 by means of a vertical rod. A cooling structure is installed inside the flat plate 12 so that the flat plate 12 can maintain a low temperature, thereby facilitating the generated silicon tetrachloride to remain in liquid form and flow into the cavity 10.

[0030] Furthermore, a clamping rod 15 is fixedly connected to the middle of the inner wall of the cover tube 11, and the impeller 14 is movably connected to the clamping rod 15. The impeller 14 is movably connected to the cover tube 11 through the clamping rod 15. The impeller 14 can rotate when blown by chlorine gas, so that the chlorine gas is evenly dispersed in the cover tube 11. At the same time, the rotating impeller 14 is conducive to breaking up the silicon dioxide powder, thereby facilitating the contact reaction between the silicon dioxide powder and the chlorine gas.

[0031] The method of using the present embodiment is as follows: before using the present deep impurity removal device for metal silicon smelting, the present device needs to be connected to an external power supply first, and then silicon dioxide powder is poured into the lower feed pipe 17, and chlorine gas is introduced into the chlorine gas inlet pipe 5 at the same time, so that the chlorine gas enters the cover tube 11 from bottom to top, and blows the impeller 14 in the cover tube 11 to rotate, and the silicon dioxide powder will slide into the cover tube 11 along the lower feed pipe 17, and slide down along the cover tube 11 from top to bottom, and then fall on the surface of the impeller 14, and react chemically with the chlorine gas and the coke rod 16 under the high temperature environment in the cover tube 11, and then the silicon tetrachloride liquid generated by the reaction will fall onto the flat plate 12 through the opening 13 at the bottom of the cover tube 11, so that the lower The warm plate 12 keeps the silicon tetrachloride in a liquid state, so that the silicon tetrachloride liquid flows along the plate 12 into the cavity 10, and then is discharged from the liquid outlet pipe 7 opened by the second valve 8, while the carbon monoxide generated by the reaction of the silicon dioxide powder and the chlorine and the unreacted chlorine will enter the cavity 10 through the opening 13, then float upward along the cavity 10 and pass through the wire mesh 18, at which time the carbon monoxide will react with the capture powder 19 on the wire mesh 18 and be converted into carbon dioxide, and then enter the circulation pipe 2 at the same time as the unreacted chlorine, and then enter the connecting pipe 4 through the gas circulation pump 3, and then re-enter the housing 1 through the chlorine inlet pipe 5 closed by the first valve 6 for subsequent recycling.

[0032] Finally, it should be noted that the above description is only a preferred embodiment of the utility model and is not intended to limit the utility model. Although the utility model is described in detail with reference to the above embodiments, those skilled in the art can still modify the technical solutions recorded in the above embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.

Claims

1. A deep impurity removal device for metal silicon smelting, comprising a housing (1), characterized in that: A circulation pipe (2) passes through the top of the housing (1), a gas circulation pump (3) is provided at the bottom of the circulation pipe (2), a connecting pipe (4) is engaged with the output end of the gas circulation pump (3), a chlorine gas inlet pipe (5) is provided at the bottom of the connecting pipe (4), one end of the chlorine gas inlet pipe (5) is fixedly connected to a cover tube (11), a fan wheel (14) is provided at the middle of the inner side of the cover tube (11), and a coke rod (14) is fixedly connected to the top of the inner side of the cover tube (11). 16), a feed pipe (17) is passed through the top of one side wall of the cover tube (11), a flat plate (12) is provided at the bottom of the cover tube (11), a cavity (10) is opened inside the shell (1), a wire mesh (18) is engaged at the top of the inner side of the cavity (10), and the top of the wire mesh (18) is flatly paved with catching powder (19), a liquid outlet pipe (7) is passed through the bottom of the shell (1), and a second valve (8) is fixedly installed in the middle of the liquid outlet pipe (7).

2. The deep impurity removal device for metal silicon smelting according to claim 1 is characterized in that: The gas circulation pump (3) is fixedly mounted on the outer wall of one side of the housing (1), and the circulation pipe (2) is snap-fitted and connected to the input end of the gas circulation pump (3).

3. The deep impurity removal device for metal silicon smelting according to claim 1 is characterized in that: The connecting pipe (4) passes through the top end of the chlorine gas inlet pipe (5), a check valve (9) is installed at the junction of the connecting pipe (4) and the chlorine gas inlet pipe (5), and a first valve (6) is installed at the other end of the chlorine gas inlet pipe (5).

4. The deep impurity removal device for metal silicon smelting according to claim 1 is characterized in that: The chlorine gas inlet pipe (5) is connected to the outer shell (1) through the inside of the chlorine gas inlet pipe (5) and the inside of the cover tube (11).

5. The deep impurity removal device for metal silicon smelting according to claim 1 is characterized in that: An opening (13) is provided at the bottom end of the cover tube (11), and the cover tube (11) is communicated with the interior of the cavity (10) through the opening (13).

6. The deep impurity removal device for metal silicon smelting according to claim 5 is characterized by: The opening (13) is located directly above the flat plate (12), and the flat plate (12) is fixedly connected to the bottom of the inner side of the cavity (10) by means of a vertical rod fixed thereon.

7. The deep impurity removal device for metal silicon smelting according to claim 1 is characterized by: A clamping rod (15) is fixedly connected to the middle of the inner wall of the cover tube (11), the impeller (14) is movably sleeved and connected to the clamping rod (15), and the impeller (14) is movably connected to the cover tube (11) via the clamping rod (15).

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