Integrally-formed target material structure for preventing abnormal discharge

Abstract

The utility model provides an integrally-formed target material structure for preventing abnormal discharge. The integrally-formed target material structure comprises a first step and a second step which are concentrically arranged in sequence from top to bottom, the diameter of the first step is smaller than that of the second step; the upper surface of the first step is a sputtering surface; grooves with arc-shaped bottom surfaces are symmetrically formed in the two ends of the second step respectively; a mounting groove is formed between the groove and the edge of the second step; the opening diameter of the groove is 10 to 12mm; and the depth of the groove is 5 to 6 mm. According to the integrally-formed target material structure provided by the utility model, the groove with the arc-shaped bottom surface is arranged, so that the distance between the target material and the sputtering machine table part is increased, the contact between the target material and the machine table part caused by edge deformation in the use process of the target material is avoided, and the problem of abnormal discharge is avoided.

Description

Technical Field

[0001] The utility model relates to the field of target materials, in particular to an integrally formed target material structure for preventing abnormal discharge. Background Art

[0002] Magnetron sputtering means that electrons collide with argon atoms during the flight to the substrate under the action of an electric field, causing ionization to produce Ar positive ions and new electrons; the new electrons fly towards the substrate, and the Ar ions are accelerated towards the cathode target under the action of the electric field and bombard the target surface with high energy, causing sputtering of the target material.

[0003] The integrally formed target material is one of the target materials used in magnetron sputtering. It is manufactured in one-time through a specific processing technology and is mainly used in sputtering coating processes that require high purity, high uniformity, and specific surface characteristics. The working temperature of the target material is generally 300 - 600 °C, and one side of the target material is strongly cooled by cooling water, while the other side is in a high-vacuum environment, with a huge pressure difference between the two sides. Therefore, the working environment is relatively harsh.

[0004] Since the integrally formed target material is not welded to a high-strength backplane, the overall anti-deformation ability of the target material is less than that of the welded target material. During magnetron sputtering, since the target material is in a vacuum environment and the cooling surface is cooled by cooling water, the target material usually deforms towards the sputtering surface direction. In addition, the overall strength of the integrally formed target material is relatively small, and there may be a large deformation amount, resulting in contact between the edge of the target material and the machine parts and abnormal discharge (Arcing) phenomenon, or there are particles (Particle) in the coating, which affects the performance of the thin film.

[0005] Therefore, developing an integrally formed target material structure for preventing abnormal discharge is a technical problem to be solved in this field. Summary of the Utility Model

[0006] Aiming at the deficiencies of the existing technology, the purpose of the utility model is to provide an integrally formed target material structure for preventing abnormal discharge. The integrally formed target material structure increases the distance between the target material and the sputtering machine parts by setting a groove with a circular arc bottom surface, avoiding contact between the target material and the machine parts due to edge deformation during the use of the target material, and avoiding abnormal discharge problems.

[0007] To achieve this purpose, the utility model adopts the following technical solutions:

[0008] The utility model provides an integrally formed target material structure for preventing abnormal discharge, which includes a first step and a second step concentrically arranged from top to bottom in sequence;

[0009] The diameter of the first step < the diameter of the second step;

[0010] The upper surface of the first step is the sputtering surface;

[0011] At both ends of the second step, grooves with an arc-shaped bottom surface are symmetrically arranged;

[0012] An installation groove is arranged between the groove and the edge of the second step;

[0013] The opening diameter of the groove is 10 - 12 mm;

[0014] The depth of the groove is 5 - 6 mm.

[0015] In the present utility model, according to the integral formed target structure after the existing client is used, the deformation amount of the target edge is detected by a three-dimensional coordinate measuring instrument (CMM) ≤ 5 mm. According to this deformation amount, the edge of the second step of the target is designed. For the positions where the deformed target and the machine table components may come into contact, grooves with an arc-shaped bottom surface are opened, so as to effectively increase the distance between the target and the machine table components, avoid contact between the deformed target and the machine table components, and effectively solve the abnormal discharge problem caused by the contact between the deformed target and the machine table components.

[0016] The opening diameter of the groove is 10 - 12 mm. For example, it can be 10 mm, 10.2 mm, 10.5 mm, 10.8 mm, 11 mm, 11.2 mm, 11.5 mm, 11.8 mm or 12 mm, but is not limited to the listed values. Other unlisted values within the numerical range are equally applicable.

[0017] The depth of the groove is 5 - 6 mm. For example, it can be 5 mm, 5.2 mm, 5.5 mm, 5.8 mm or 6 mm, but is not limited to the listed values. Other unlisted values within the numerical range are equally applicable.

[0018] Preferably, the diameter of the first step is 440 - 445 mm. For example, it can be 440 mm, 441 mm, 442 mm, 443 mm, 444 mm or 445 mm, but is not limited to the listed values. Other unlisted values within the numerical range are equally applicable.

[0019] Preferably, the diameter of the second step is 520 - 525 mm. For example, it can be 520 mm, 521 mm, 522 mm, 523 mm, 524 mm or 525 mm, but is not limited to the listed values. Other unlisted values within the numerical range are equally applicable.

[0020] Preferably, the height of the first step is 10 - 15 mm. For example, it can be 10 mm, 11 mm, 12 mm, 13 mm, 14 mm or 15 mm, but is not limited to the listed values. Other unlisted values within the numerical range are equally applicable.

[0021] Preferably, the surface roughness Ra of the bottom surface of the groove is less than 0.4 μm, for example, it can be 0.38 μm, 0.35 μm, 0.32 μm or 0.30 μm, but is not limited to the listed values, and other unlisted values within the numerical range are equally applicable.

[0022] Preferably, the shortest distance between the edge of the second step and the edge of the groove is 24 - 26 mm, for example, it can be 24 mm, 24.5 mm, 25 mm, 25.5 mm or 26 mm, but is not limited to the listed values, and other unlisted values within the numerical range are equally applicable.

[0023] Preferably, the mounting grooves are symmetrically arranged at both ends of the second step.

[0024] Preferably, the longitudinal cross-sectional shape of the mounting groove is trapezoidal.

[0025] Preferably, the opening diameter of the mounting groove is 2 - 7 mm, for example, it can be 2 mm, 3 mm, 4 mm, 5 mm, 6 mm or 7 mm, but is not limited to the listed values, and other unlisted values within the numerical range are equally applicable.

[0026] Preferably, the depth of the mounting groove is 2 - 7 mm, for example, it can be 2 mm, 3 mm, 4 mm, 5 mm, 6 mm or 7 mm, but is not limited to the listed values, and other unlisted values within the numerical range are equally applicable.

[0027] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0028] Aiming at the problem that the integrally formed target is prone to deformation in the direction towards the sputtering surface, on the premise of ensuring the strength of the target, a groove with a circular arc bottom surface is opened at the second step of the target, thereby effectively increasing the distance between the target and the machine table components, avoiding contact between the deformed target and the machine table components, and effectively solving the abnormal discharge problem caused by the contact between the deformed target and the machine table components. Description of the Drawings

[0029] Figure 1 is a schematic diagram of the structure of the integrally formed target according to Embodiment 1 of the present utility model;

[0030] Figure 2 is a schematic diagram of the structure of the deformed integrally formed target in Comparative Example 1 of the present utility model;

[0031] In the figure: 1 - first step; 2 - second step; 3 - mounting groove; 4 - groove; 5 - sealing ring; 6 - contact point between the target and the machine table components. Detailed Embodiments

[0032] The technical solution of the present utility model will be further described below in conjunction with the accompanying drawings and through specific embodiments.

[0033] The present utility model will be further described in detail below. However, the following examples are only simple examples of the present utility model and do not represent or limit the scope of protection of the present utility model. The scope of protection of the present utility model shall be subject to the claims.

[0034] It should be understood that in the description of the present utility model, the orientation or positional relationship indicated by the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the accompanying drawings. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present utility model. In addition, the terms "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features. Thus, the features defined with "first", "second", etc. may explicitly or implicitly include one or more of such features. In the description of the present utility model, unless otherwise specified, the meaning of "plurality" is two or more.

[0035] It should be noted that in the description of the present utility model, unless otherwise clearly defined and limited, the terms "set", "connected", "connected to" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood through specific situations.

[0036] Those skilled in the art should understand that the present utility model necessarily includes the necessary pipelines, conventional valves and general pump equipment for realizing the complete process. However, the above contents do not belong to the main inventive points of the present utility model. Those skilled in the art can add and layout them by themselves based on the process flow and equipment structure selection. The present utility model has no special requirements and specific limitations on this.

[0037] Embodiment 1

[0038] This embodiment provides an integrally formed target structure for preventing abnormal discharge, as Figure 1As shown, the integrally formed target structure includes a first step 1 and a second step 2 that are concentrically arranged from top to bottom in sequence. The diameter of the first step 1 < the diameter of the second step 2. The upper surface of the first step 1 is the sputtering surface. At both ends of the second step 2, grooves 4 with an arc-shaped bottom surface are symmetrically arranged respectively. An installation groove 3 is arranged between the groove 4 and the edge of the second step 2. The opening diameter of the groove 4 is 11 mm, the depth of the groove 4 is 5.5 mm, the diameter of the first step 1 is 442 mm, the diameter of the second step 2 is 522 mm, the height of the first step 1 is 12 mm, the surface roughness Ra of the bottom surface of the groove 4 is 0.3 μm, the shortest distance between the edge of the second step 2 and the edge of the groove 4 is 25 mm. The installation grooves 3 are symmetrically arranged at both ends of the second step 2. The longitudinal cross-sectional shape of the installation groove 3 is trapezoidal. The opening diameter of the installation groove 3 is 5 mm, and the depth of the installation groove 3 is 5 mm.

[0039] Example 2

[0040] This example provides an integrally formed target structure for preventing abnormal discharge. The integrally formed target structure includes a first step and a second step that are concentrically arranged from top to bottom in sequence. The diameter of the first step < the diameter of the second step. The upper surface of the first step is the sputtering surface. At both ends of the second step, grooves with an arc-shaped bottom surface are symmetrically arranged respectively. An installation groove is arranged between the groove and the edge of the second step. The opening diameter of the groove is 10 mm, the depth of the groove is 5 mm, the diameter of the first step is 440 mm, the diameter of the second step is 520 mm, the height of the first step is 10 mm, the surface roughness Ra of the bottom surface of the groove is 0.2 μm, the shortest distance between the edge of the second step and the edge of the groove is 24 mm. The installation grooves are symmetrically arranged at both ends of the second step. The longitudinal cross-sectional shape of the installation groove is trapezoidal. The opening diameter of the installation groove is 2 mm, and the depth of the installation groove is 2 mm.

[0041] Example 3

[0042] This embodiment provides a one-piece formed target structure for preventing abnormal discharge. The one-piece formed target structure includes a first step and a second step that are concentrically arranged from top to bottom in sequence. The diameter of the first step < the diameter of the second step. The upper surface of the first step is the sputtering surface. At both ends of the second step, grooves with an arc-shaped bottom surface are symmetrically arranged. An installation groove is arranged between the groove and the edge of the second step. The opening diameter of the groove is 12 mm, the depth of the groove is 6 mm, the diameter of the first step is 445 mm, the diameter of the second step is 525 mm, the height of the first step is 15 mm, the surface roughness Ra of the bottom surface of the groove is 0.25 μm, the shortest distance between the edge of the second step and the edge of the groove is 26 mm. The installation grooves are symmetrically arranged at both ends of the second step. The longitudinal cross-sectional shape of the installation groove is trapezoidal. The opening diameter of the installation groove is 7 mm, and the depth of the installation groove is 7 mm.

[0043] Comparative Example 1

[0044] This comparative example provides a one-piece formed target structure. The one-piece formed target structure includes a first step 1, a second step 2, and an installation groove 3. The difference between the one-piece formed target structure and that in Example 1 is only that the groove with an arc-shaped bottom surface is not provided.

[0045] Seal rings 5 are filled in the installation grooves of the one-piece formed target structures provided in Example 1 and Comparative Example 1, and then the targets are fixed on the sputtering machine table. After sputtering for a period of time, it is found that the one-piece formed target structure provided in Comparative Example 1 is deformed in the direction towards the sputtering surface. As Figure 2 shown, abnormal discharge occurs at the contact 6 between the target and the machine table components, and particulate matter is introduced into the thin film. In Example 1, due to the provision of the groove with an arc-shaped bottom surface and the control of the opening diameter and depth of the groove according to the deformation amount of the target edge of the client, while ensuring the strength of the target, the contact between the target and the machine table components can be avoided, and abnormal discharge can be avoided.

[0046] In summary, the one-piece formed target structure provided by the present invention increases the distance between the target and the sputtering machine table parts by providing the groove with an arc-shaped bottom surface, avoiding the contact between the target and the machine table parts due to edge deformation during the use of the target, and avoiding the problem of abnormal discharge.

[0047] The applicant declares that the above description is only the specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention fall within the protection scope and the disclosure scope of the present invention.

Claims

1. An integrally formed target structure for preventing abnormal discharge, characterized in that: The one-piece target structure comprises a first step and a second step which are concentrically arranged from top to bottom; The diameter of the first step is less than the diameter of the second step; The upper surface of the first step is a sputtering surface; The two ends of the second step are symmetrically provided with grooves with arc-shaped bottom surfaces; A mounting groove is provided between the groove and the edge of the second step; The opening diameter of the groove is 10-12 mm; The depth of the groove is 5-6 mm.

2. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The diameter of the first step is 440-445 mm.

3. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The diameter of the second step is 520-525 mm.

4. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The height of the first step is 10-15 mm.

5. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The bottom surface roughness of the groove Ra is less than 0.4 μm.

6. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The shortest distance between the edge of the second step and the edge of the groove is 24-26 mm.

7. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The mounting grooves are symmetrically arranged at two ends of the second step.

8. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The longitudinal cross-section of the mounting groove is trapezoidal.

9. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The opening diameter of the mounting groove is 2-7 mm.

10. The one-piece target structure for preventing abnormal discharge according to claim 1, characterized in that: The depth of the mounting groove is 2-7 mm.

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