Circulating uniformly-distributed turntable structure for chemical vapor deposition equipment

Abstract

The utility model belongs to the technical field of chemical vapor deposition, and particularly relates to a circular uniform distribution turntable structure for chemical vapor deposition equipment, which comprises a main turntable arranged in a deposition chamber and a plurality of rotatable net disc brackets arranged on the main turntable. Compared with the prior art, through the ingenious structural design, the net disc bracket can rotate along with the revolution of the main rotating disc, so that the substrate can be continuously switched from the center to the edge, the problem of non-uniform film thickness caused by limited molecular escape distance of a coupling agent or a coating material is prevented, and the service life of the net disc bracket is prolonged. Therefore, each substrate can receive materials uniformly, so that a deposited film layer is more uniform, and the yield is improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of chemical vapor deposition, and particularly relates to a circulating and evenly distributing turntable structure for a chemical vapor deposition device. Background Art

[0002] CVD (Chemical Vapor Deposition), also known as chemical vapor deposition, is a chemical reaction process. It decomposes one or more gases (called precursors) by heating, generates a polymerization reaction, and deposits on the surface of the substrate to form the required thin film. CVD has the characteristics of low deposition temperature, easy control of film composition, proportionality between film thickness and deposition time, good uniformity, good repeatability, and excellent step coverage.

[0003] In the CVD process, it is necessary to first coat the substrate with a coupling agent layer for improving adhesion, and then coat a waterproof, insulating, high-temperature resistant, and salt spray resistant coating on the coupling agent layer. In the prior art, in order to coat the above two-layer structure, a turntable rack is arranged in the deposition chamber, and several substrates are arranged on the turntable rack, so that the substrates can move together with the turntable rack. However, due to the limited molecular escape distance of the coupling agent and the coating material, during the film coating process, the coating on the substrates at the edge is thicker, and the coating on the substrates in the middle is thinner. Even the coating thickness at different places on the same substrate is not uniform, resulting in low yield and material waste.

[0004] In view of this, the utility model aims to provide a circulating and evenly distributing turntable structure for a chemical vapor deposition device, which adopts a combination of revolution and rotation, so that each substrate can receive materials evenly, and thus the deposited film layer is more uniform, improving the yield. Content of the Utility Model

[0005] The purpose of the utility model is to provide, in view of the deficiencies of the prior art, a circulating and evenly distributing turntable structure for a chemical vapor deposition device, which adopts a combination of revolution and rotation, so that each substrate can receive materials evenly, and thus the deposited film layer is more uniform, improving the yield.

[0006] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0007] A circulating and evenly distributing turntable structure for a chemical vapor deposition device includes a main turntable arranged in a deposition chamber and a plurality of rotatable mesh disk brackets arranged on the main turntable.

[0008] As an improvement of the circulating and evenly distributing turntable structure for the chemical vapor deposition device of the utility model, the main turntable is driven by a motor.

[0009] As an improvement to the circulating and evenly distributing turntable structure for the chemical vapor deposition equipment of the present utility model, an installation post extends downward from the lower surface of the main turntable, and a driving gear is arranged on the installation post.

[0010] As an improvement to the circulating and evenly distributing turntable structure for the chemical vapor deposition equipment of the present utility model, a rotating shaft is connected to the bottom of the mesh plate bracket, one end of the rotating shaft is arranged inside the driven gear, and the driving gear meshes with the driven gear.

[0011] As an improvement to the circulating and evenly distributing turntable structure for the chemical vapor deposition equipment of the present utility model, a supporting wheel is arranged below the main turntable.

[0012] As an improvement to the circulating and evenly distributing turntable structure for the chemical vapor deposition equipment of the present utility model, the mesh plate bracket includes a bottom plate and a plurality of support rods extending upward from the bottom plate, and a plurality of support frames for placing substrates are arranged between the support rods.

[0013] As an improvement to the circulating and evenly distributing turntable structure for the chemical vapor deposition equipment of the present utility model, the outer peripheral edge of the main turntable is circular, and a plurality of the mesh plate brackets are evenly arranged in the circumferential direction of the main turntable.

[0014] As an improvement to the circulating and evenly distributing turntable structure for the chemical vapor deposition equipment of the present utility model, the main turntable includes an annular main plate, a central plate arranged at the central part, and a plurality of connecting rods for connecting the annular main plate and the central plate.

[0015] Compared with the prior art, through the ingenious structural design of the present utility model, the mesh plate bracket can rotate itself while "revolving" with the main turntable, enabling the substrates to continuously switch from the center to the edge, preventing the problem of uneven film thickness caused by the limited molecular escape distance of the coupling agent or coating material, enabling each substrate to receive materials evenly, so that the deposited film layer is more uniform and the yield is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is one of the three-dimensional structural schematic diagrams of the present utility model.

[0017] Figure 2 It is one of the exploded structural schematic diagrams of the present utility model.

[0018] Figure 3 It is the second exploded structural schematic diagram of the present utility model.

[0019] Figure 4 It is the third exploded structural schematic diagram of the present utility model.

[0020] Figure 5This is one of the structural schematic diagrams of the main turntable in the present utility model.

[0021] Figure 6 This is the second structural schematic diagram of the main turntable in the present utility model. Specific embodiments

[0022] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without making creative efforts belong to the scope of protection of the present utility model.

[0023] It should be noted that all directional indications (such as up, down, left, right, front, back...) in the embodiments of the present utility model are only used to explain the relative positional relationship and movement conditions between components in a specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indications will also change accordingly.

[0024] In addition, the descriptions involving "first", "second", etc. in the present utility model are only for descriptive purposes, and cannot be understood as indicating or implying their relative importance or implicitly indicating the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In addition, the technical solutions between various embodiments can be combined with each other, but it must be based on the fact that those of ordinary skill in the art can implement it. When the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection required by the present utility model.

[0025] As Figures 1 to 6 shown, the present utility model provides a circulating and evenly distributing turntable structure for a chemical vapor deposition device, including a main turntable 2 arranged in a deposition chamber 1 and a plurality of rotatable mesh plate brackets 3 arranged on the main turntable 2. In this embodiment, the number of mesh plate brackets 3 is three. Through a clever structural design, the present utility model enables the mesh plate brackets 3 to "rotate around the sun" while the main turntable 2 is "revolving", and at the same time, the mesh plate brackets 3 can "rotate on their own axes", so that the substrates can be continuously switched from the center to the edge, preventing the problem of uneven film thickness caused by the limited molecular escape distance of the coupling agent or the coating material, enabling each substrate to receive materials evenly, so that the deposited film layer is more uniform and the yield is improved.

[0026] The main turntable 2 is driven by a motor, and the main turntable 2 rotates at a constant speed during the film coating process.

[0027] The lower surface of the main turntable 2 extends downward to form mounting posts 21, and a driving gear 4 is arranged on the mounting posts 21. A rotating shaft 30 is connected to the bottom of the web plate bracket 3, and one end of the rotating shaft 30 is arranged inside the driven gear 5. The driving gear 4 meshes with the driven gear 5. During the rotation (revolution) of the main turntable 2 driven by the motor, the driving gear 4 can be driven to rotate, and then the driven gear 5 can be driven to rotate. The rotation of the driven gear 5 can drive the rotation (rotation) of the web plate bracket 3. The transmission structure of the present invention is simple, energy-saving and environment-friendly, and only one motor is needed to realize "revolution" and "rotation".

[0028] Support wheels 22 are arranged below the main turntable 2 to facilitate the movement of the whole structure.

[0029] The web plate bracket 3 includes a bottom plate 31 and a plurality of support rods 32 extending upward from the bottom plate 31. A plurality of support frames 33 for placing substrates are arranged between the support rods 32. A web plate bracket 3 can place a lot of substrates at the same time, so as to improve the coating efficiency.

[0030] The outer peripheral edge of the main turntable 2 is circular, and a plurality of web plate brackets 3 are evenly arranged in the circumferential direction of the main turntable 2. The main turntable 2 includes an annular main plate 23, a central plate 24 arranged at the central part, and a plurality of connecting rods 25 for connecting the annular main plate 23 and the central plate 24, so that the whole rotating structure is in a "planetary" form, making the product receive materials more evenly and the deposited film layer thickness more uniform.

[0031] According to the disclosure and teaching of the above specification, those skilled in the art to which the present invention pertains can also make changes and modifications to the above embodiments. Therefore, the present invention is not limited to the specific embodiments disclosed and described above, and some modifications and changes to the present invention should also fall within the protection scope of the claims of the present invention. In addition, although some specific terms are used in this specification, these terms are only for convenience of description and do not constitute any limitation to the present invention.

Claims

1. A circulating uniform distribution turntable structure for chemical vapor deposition equipment, characterized in that: It includes a main turntable arranged in a deposition chamber, and a plurality of rotatable net disk brackets arranged on the main turntable; A mounting column is extended downward from the lower surface of the main turntable, and a driving gear is arranged on the mounting column; The bottom of the net disk bracket is connected with a rotating shaft, one end of which is arranged in a driven gear, and the driving gear is meshed with the driven gear; The net disk bracket comprises a bottom plate, a plurality of support rods extending upward from the bottom plate, and a plurality of support frames for placing the substrate are arranged between the support rods; The outer periphery of the main turntable is circular, and a plurality of the net disk brackets are evenly arranged in the circumferential direction of the main turntable; The main turntable includes a ring-shaped main disk, a center disk arranged at the center, and a plurality of connecting rods for connecting the ring-shaped main disk and the center disk.

2. The circulating uniform distribution turntable structure for chemical vapor deposition equipment according to claim 1, characterized in that: The main turntable is driven by a motor.

3. The circulating uniform distribution turntable structure for chemical vapor deposition equipment according to claim 1, characterized in that: A supporting wheel is arranged below the main turntable.

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