Solid feeding device

Abstract

The embodiment of the utility model provides a solid feeding device, which comprises a stock bin, a feeding device and a discharging device, the processing device is used for receiving the solid raw materials; and the rotating disc discharging mechanism is used for controllably conveying the solid raw materials in the stock bin into the processing device. According to the solid feeding device disclosed by the embodiment of the utility model, accurate control of controllable feeding can be realized, the quality of a film layer is improved, and the film thickness is flexibly controlled.

Description

Technical Field

[0001] The utility model relates to the technical field of coating, in particular to a solid feeding device. Background Art

[0002] In current coating equipment, before coating, the feeding method of powder is to put a powder-containing cartridge into the sublimation chamber at one time, and monomer gas is generated by setting the vaporization temperature and cracking temperature for vaporization and cracking. During the vaporization process of the powder, the vaporization rate of the powder is uneven, from slow vaporization to fast vaporization, and then to slow vaporization. In the fast vaporization stage, a large amount of powder vaporizes and enters the cracking tube, resulting in insufficient dimer cracking, excessive reaction gas quantity, and the adsorption of the coating on the substrate surface reaching the upper limit, causing problems such as a large amount of raw material waste, thereby affecting the protection performance of the product. Content of the Utility Model

[0003] In order to solve the above technical problems, an embodiment of the utility model provides a solid feeding device, which can achieve precise control of controllable feeding, improve the film layer quality and flexibly control the film thickness.

[0004] According to an embodiment of the utility model, the solid feeding device includes:

[0005] A storage bin for placing solid raw materials;

[0006] A processing device for receiving the solid raw materials; and

[0007] A rotary table feeding mechanism for controllably conveying the solid raw materials in the storage bin to the processing device.

[0008] In some embodiments, the processing device is a sublimation chamber for heating and sublimating the solid raw materials.

[0009] In some embodiments, the solid raw materials are spherical parylene, sheet parylene or granular parylene.

[0010] In some embodiments, the rotary table feeding mechanism includes:

[0011] A rotary table disposed in the storage bin and capable of rotating around its own central axis. The rotary table has a central convex portion and a plurality of rotary table holes uniformly arranged around the central convex portion. The rotary table holes are used to accommodate the solid raw materials;

[0012] A feeding channel located below the rotary table, connecting the storage bin and the sublimation chamber; and

[0013] The stopper is located above the turntable, allowing the solid raw material in the turntable hole to rotate to the blanking channel and blocking the remaining solid raw materials other than the solid raw material in the turntable hole from rotating to the blanking channel, so that the solid raw material in the turntable hole enters the sublimation chamber through the blanking channel.

[0014] In some embodiments, the turntable blanking mechanism further includes an indexing device for controlling the rotation angle of the turntable.

[0015] In some embodiments, the turntable blanking mechanism further includes a photoelectric detection device for detecting the feeding state of the solid raw material.

[0016] In some embodiments, the turntable is provided with a material waiting position and a blanking position, and the photoelectric detection device includes:

[0017] A first photoelectric switch sensor for detecting whether the solid raw material exists at the material waiting position of the turntable; and

[0018] A second photoelectric switch sensor for detecting whether the solid raw material exists at the blanking position of the turntable.

[0019] In some embodiments, the photoelectric detection device further includes a third photoelectric switch sensor for detecting whether the solid raw material exists at the center of the central convex portion of the turntable.

[0020] In some embodiments, the photoelectric detection device further includes an alarm. When the third photoelectric switch sensor detects that the solid raw material does not exist at the center of the central convex portion of the turntable, the alarm emits an alarm signal.

[0021] In some embodiments, the solid feeding device further includes a control valve assembly for controlling the opening and closing of the blanking channel.

[0022] In some embodiments, the control valve assembly includes at least two control valves, and the at least two control valves are arranged at intervals.

[0023] In some embodiments, each control valve includes a valve core and a heating element, and the heating element is used to adjust the temperature of the position of the valve core.

[0024] In the solid feeding device according to the embodiments of the present invention, the turntable blanking mechanism can control the feeding rate, so that the density and rate of the monomer gas entering the coating chamber are controllable, greatly accelerating the coating rate, improving the protection quality of the film layer, increasing the powder utilization rate in the coating process, and solving the problems of one-time feeding, uncontrollable coating process, limited deposition rate, low powder utilization rate, poor protection effect, etc. in the prior art. Description of the Drawings

[0025] Other features and advantages of the present utility model will be better understood through the following alternative embodiments described in detail in conjunction with the accompanying drawings, where the same reference numerals in the drawings represent the same or similar components, among which:

[0026] Figure 1 FIG. shows a schematic structural diagram of a coating device according to an embodiment of the present utility model;

[0027] Figure 2 FIG. shows Figure 1 a schematic structural diagram of a solid feeding device of the coating device in;

[0028] Figure 3 FIG. shows Figure 2 a schematic structural diagram of a rotary table blanking mechanism of the solid feeding device in;

[0029] Figure 4 FIG. shows Figure 2 a schematic cross-sectional view of a rotary table blanking mechanism of the solid feeding device in;

[0030] Figure 5 FIG. shows Figure 2 a schematic structural diagram of a photoelectric detection device of the solid feeding device in;

[0031] Figure 6 FIG. shows Figure 1 a schematic structural diagram of a cracking furnace of the coating device in;

[0032] Figure 7 FIG. shows Figure 1 a schematic cross-sectional view of a cracking furnace of the coating device in;

[0033] Figure 8A FIG. shows Figure 1 a schematic structural diagram of a coating cavity of the coating device in;

[0034] Figure 8B FIG. shows Figure 1 a schematic structural diagram of another coating cavity of the coating device in;

[0035] Figure 9 FIG. shows Figure 1 a schematic structural diagram of a flow equalizing component of the coating device in;

[0036] Figure 10 FIG. shows Figure 1 a schematic structural diagram of an external plasma discharge mechanism of the coating device in;

[0037] Figure 11 FIG. shows Figure 1 a schematic structural diagram of an internal plasma discharge mechanism of the coating device in. Detailed embodiments

[0038] The implementation and use of the embodiments will be discussed in detail below. However, it should be understood that the specific embodiments discussed are merely exemplary illustrations of specific ways of implementing and using the present utility model, rather than limiting the scope of the present utility model. The descriptions of the structural positions of various components, such as directions like up, down, top, bottom, etc., are not absolute but relative. When the components are arranged as shown in the figures, these direction descriptions are appropriate, but when the positions of the components in the figures change, these direction descriptions also change accordingly.

[0039] As Figure 1 shown in the figure, the coating device 100 includes a coating cavity 10, a gas feeding device 20 (see Figure 7 ), a liquid feeding device 30, and a solid feeding device 40. The coating cavity 10 includes a coating chamber 11 for placing a substrate to be coated. The liquid feeding device 30 is connected to the coating chamber 11 and is used to transport the first gas raw material after vaporization of the liquid raw material into the coating chamber 11. The solid feeding device 40 is connected to the coating chamber 11 and is used to transport the second gas raw material after sublimation and cracking of the solid raw material into the coating chamber 11. The gas feeding device 20 is connected to the coating chamber 11 and is used to transport the third gas raw material into the coating chamber 11. In some embodiments, the coating device 100 may not include the gas feeding device 20 and only includes the liquid feeding device 30 and the solid feeding device 40.

[0040] Combined with Figures 2 to 4 shown in the figure, the solid feeding device 40 includes: a material bin 41, a sublimation chamber 42, a rotary table feeding mechanism 43, and a cracking furnace 44. The material bin 41 is used to place a plurality of solid raw materials. For example, the solid raw material is spherical parylene, sheet parylene, or granular parylene, which can be hereinafter simply referred to as material pellets. The material bin 41 can accommodate thousands of material pellets. A end cover (not shown in the figure) is provided at the top of the material bin 41, and a sealing ring is provided between the end cover and the material bin 41 to achieve the sealing of the material bin 41. The end cover can be opened through a flip mechanism, and the flip mechanism is composed of a shaft, a spring, and a plain bearing. When the material bin 41 is in an atmospheric pressure state, remove the handle on the material bin 41, and the spring in the flip mechanism can overcome the gravity of the end cover, causing the end cover to bounce upward. The end cover can then easily rotate horizontally around the shaft, thereby opening the material bin 41. A plurality of glass windows are installed on the end cover of the material bin 41 for detecting the remaining material in the material bin and the feeding state of the material pellets.

[0041] The rotary table feeding mechanism 43 is located inside the material bin 41 and is used to transport the solid raw material in the material bin 41 into the sublimation chamber 42. The sublimation chamber 42 is used to heat and sublime the solid raw material. The cracking furnace 44 is used to crack the gas after sublimation of the solid raw material into the second gas raw material and transport the second gas raw material into the coating chamber 11.

[0042] The rotary table blanking mechanism 43 controllably conveys solid raw materials into the sublimation chamber 42 at a set feeding rate. Specifically, the rotary table blanking mechanism 43 includes a rotary table 431, a blanking channel 432, and a stopper 433. The rotary table 431 is disposed in the silo 41 and can rotate around its own central axis. The rotary table 431 has a central convex portion 4311 and a plurality of rotary table holes 4312 uniformly arranged around the central convex portion 4311. The size of the rotary table holes 4312 corresponds to the size of the solid raw materials or pellets. One rotary table hole 4312 is used to accommodate one solid raw material or pellet. A magneto - hydrodynamic seal drive device 434 is provided below the rotary table 431. The magneto - hydrodynamic seal drive device 434 is driven to rotate by a servo motor outside the silo through a pulley, thereby driving the rotary table 431 to rotate. The blanking channel 432 is located below the rotary table 431 and communicates the silo 41 and the sublimation chamber 42. The stopper 433 can be one, two, or more. It is located above the rotary table 431, allowing the solid raw materials or pellets in the rotary table holes 4312 to rotate to the blanking channel 432 and blocking the remaining solid raw materials other than the solid raw materials or pellets in the rotary table holes 4312 from rotating to the blanking channel 432. The solid raw materials or pellets in the blanking channel 432 continue to enter the sublimation chamber 42.

[0043] According to an embodiment of the present invention, the feeding system of the coating device can simultaneously achieve gas feeding, liquid feeding, and solid feeding. The multi - functional feeding method provides conditions for the coating device to deposit different film layers. By matching different types and kinds of raw materials, the coating device can deposit multi - functional composite film layers successively or simultaneously, integrating ordinary CVD, PECVD, and ICVD technologies, and solving the problems of existing coating devices that can only implement a single CVD deposition technology, that is, only a single type of raw material can be introduced, and only one film layer can be deposited at a time. To complete the composite film layer, the equipment needs to be started and stopped and fed multiple times, resulting in poor film layer quality and long coating cycle.

[0044] In some embodiments, the rotary table blanking mechanism 43 further includes an indexing device for controlling the rotation angle of the rotary table 431. For example, when there are 6 rotary table holes 4312, the angle between two adjacent rotary table holes 4312 is 60°. The indexing device can control the rotary table 431 to rotate 60° each time, so that the solid raw materials or pellets in the rotary table holes 4312 can fall into the blanking channel 432 and then be conveyed to the sublimation chamber 42. The indexing device can be an optoelectronic indexing mechanism, thereby improving the accuracy of the rotation of the rotary table 431 and solving the problems of synchronous pulley slipping and errors in the rotation of the servo motor.

[0045] Combined Figure 5 As shown in

[0046] In some embodiments, the turntable 431 is provided with a material waiting position and a material discharging position, and the material waiting position and the material discharging position respectively correspond to two adjacent turntable holes 4312 of the turntable 431. The photoelectric detection device 435 includes a first photoelectric switch sensor 4351 and a second photoelectric switch sensor 4352. The first photoelectric switch sensor 4351 is used to detect whether there is solid raw material at the material waiting position of the turntable 431, and the second photoelectric switch sensor 4352 is used to detect whether there is solid raw material at the material discharging position of the turntable 431. The stopper 433 is provided with a first channel 4331 corresponding to the material waiting position and a second channel 4332 corresponding to the material discharging position. The first photoelectric switch sensor 4351 is installed in the first channel 4331, and the second photoelectric switch sensor 4352 is installed in the second channel 4332.

[0047] When the first photoelectric switch sensor 4351 at the material waiting position detects that there are material pills and the second photoelectric switch sensor 4352 at the material discharging position does not detect material pills, it is recorded as having material once; when the first photoelectric switch sensor 4351 at the material waiting position detects that there are material pills and the second photoelectric switch sensor 4352 at the material discharging position detects material pills, it is recorded as jamming once; when the first photoelectric switch sensor 4351 at the material waiting position does not detect material pills and the second photoelectric switch sensor 4352 at the material discharging position does not detect material pills, it is recorded as being empty of material once. After detecting that there are material pills, the control valve valve acts, and the material pills enter the sublimation chamber 42, and the system feeding times increase by 1 time; after detecting jamming and being empty of material, the control valve valve does not act, the system feeding times do not increase, and the turntable 431 continues to rotate for the next feeding.

[0048] In some embodiments, the photoelectric detection device 435 further includes a third photoelectric switch sensor 4353. The third photoelectric switch sensor 4353 is disposed above the center of the central convex portion 4311 and is used to detect whether there is solid raw material or material pills at the center of the central convex portion 4311 of the turntable 431.

[0049] In some embodiments, the photoelectric detection device 435 further includes an alarm (not shown in the figure). When the third photoelectric switch sensor 4353 detects that there is no solid raw material or material pills at the center of the central convex portion 4311 of the turntable 431, the alarm emits an alarm signal.

[0050] Specifically, when the solid raw material or material pills remain to a certain quantity, the screw at the center of the turntable 431 leaks out, triggering the material pill remaining quantity alarm wire, and the alarm is used to alarm and remind that the material bin is out of stock.

[0051] In some embodiments, a groove (not shown in the figure) is further provided below the turntable 431, and the groove can solve the problem of broken materials caused by half a pellet in the turntable 431. During normal operation, the storage bin 41 is filled with pellets, and the pellets enter the turntable holes 4312 on the outer ring of the turntable 431 and rotate with the rotation of the turntable 431. When rotating to the waiting position, the stopper 433 blocks the remaining pellets on the turntable 431, and only the pellets in the turntable holes 4312 can enter the waiting position, and then continue to rotate to the discharging position for discharging. When incomplete or broken pellets enter the turntable holes 4312, if the size of the incomplete pellet is small, as the turntable 431 rotates, the pellet will fall into the groove below the turntable 431, and the next pellet will continue to enter the turntable holes 431. The pellets in the groove will rotate synchronously with the groove, which does not affect the rotation of other pellets. When passing through the discharging position, the pellets in the turntable holes 431 are discharged; if the size of the incomplete pellet is large, the pellet rotates with the turntable 431, and there will be a complete pellet above the pellet. When reaching the position of the stopper 433, the complete pellet will be pushed out of the turntable holes 431, and only the pellets in the turntable holes 431 will be discharged.

[0052] In some embodiments, the sublimation chamber 42 includes a sublimation cavity 421 and an outlet 422. A quick-change receiving tray 423 is provided in the sublimation cavity 421 for receiving solid raw materials. The outlet 422 is communicated with the sublimation cavity 421 for discharging the gas after sublimation of the solid raw materials into the cracking furnace 44. The heating method of the sublimation cavity 421 is heating of the cavity wall. The pellets are discharged into the quick-change receiving tray 423, and the quick-change receiving tray 423 can be quickly replaced according to process requirements, which is convenient for equipment maintenance and beneficial to the cleanliness of the sublimation cavity 421.

[0053] In some embodiments, the sublimation chamber 42 further includes a flip end cover 424 for sealing the sublimation cavity 421. The slope of the flip end cover 424 is less than 90°, and the sealing of the sublimation cavity 421 is achieved through the gravity of the flip end cover 424 itself and the negative pressure in the sublimation cavity 421.

[0054] In some embodiments, the sublimation chamber 42 further includes a control valve assembly 425 for controlling the delivery of solid raw materials into the sublimation cavity 421. The control valve assembly 425 includes a first control valve and a second control valve. The first control valve and the second control valve are arranged at intervals to respectively control the opening and closing of the feeding channel 432.

[0055] The first control valve and the second control valve can be gate valves, ball valves, plug valves, etc., as long as they can achieve the opening and closing of the feeding channel 432, and the embodiments of the present invention are not limited thereto.

[0056] The first control valve and the second control valve are in a normally closed state. After the material pellets are discharged, the first control valve opens, and the material pellets are discharged through the discharge channel 432 to the middle of the first control valve and the second control valve. Then the first control valve closes, the second control valve opens, and the material pellets are discharged into the sublimation chamber 421, and the second control valve closes. By means of the normally closed first control valve and the second control valve, the material bin 41 and the sublimation chamber 421 are separated, which is beneficial to the pressure stability of the material bin 41. At the same time, it can prevent the deposition of dust in other areas and improve the service life of the first control valve and the second control valve.

[0057] In some embodiments, each control valve includes a valve core and a heating element. The valve core can move back and forth or rotate to open and close the discharge channel 432, and the heating element is used to adjust the temperature of the position of the valve core. The temperature control of the valve core position can be realized through the heating element to prevent the deposition and jamming failure of valve core dust.

[0058] As Figure 6 and Figure 7 As shown in

[0059] According to an embodiment of the present invention, the upper part of the solid feeding device 40 is a material bin 41, and the material bin 41 is filled with material pellets of the same size. When the turntable 431 rotates to a specific position, the material pellets in the material bin 41 are discharged. The material pellets enter the sublimation chamber 42 through the control valve assembly 425 and are vaporized into gas, and then are cracked into monomer gas in the cracking chamber 44, and then enter the coating chamber 11. The solid feeding device 40 can control the feeding rate by controlling the time interval of the rotation and discharge of the turntable 431, and control the vaporization and cracking rates by controlling the temperatures of the sublimation chamber 42 and the cracking chamber 44, so that the density and rate of the monomer gas entering the coating chamber 11 are controllable, greatly accelerating the coating rate, improving the protection quality of the film layer, increasing the powder utilization rate in the coating process, and solving the problems of one-time feeding, uncontrollable coating process, limited deposition rate, low powder utilization rate, and poor protection effect in the prior art.

[0060] As Figure 8A and 8BAs shown in the figure, a rotating bracket 111 for placing a substrate is provided inside the coating chamber 11. A motor 112 at the bottom of the coating chamber 10 drives the rotation of the magneto-fluid seal drive device, and the magneto-fluid seal drive device drives the rotation of the rotating bracket 111 through a transmission mechanism. The rotating bracket 111 can be a circular turntable, and the circular turntable can have various structures, including a sector turntable or a large flat turntable. The layer spacing of the sector turntable can be adjusted through a support plate, and the layer spacing of the large flat turntable can be adjusted through spacer columns. Driving the substrate 80 to rotate through the rotating bracket 111 can improve the uniformity of the film layer.

[0061] In other embodiments, a fixed bracket for placing a substrate is provided inside the coating chamber 11. The fixed bracket can achieve higher production efficiency when the film layer has better uniformity.

[0062] In some embodiments, a flow homogenization component 12 for homogenizing the second gas raw material is provided inside the coating chamber 11.

[0063] As Figure 9 shown in the figure, the flow homogenization component 12 includes a primary flow homogenization plate 121 and a secondary flow homogenization plate 122. The primary flow homogenization plate 121 is used to diffuse the second gas raw material in all directions. The secondary flow homogenization plate 122 is located downstream of the primary flow homogenization plate 121 along the gas flow direction of the second gas raw material, and the secondary flow homogenization plate 122 is provided with a plurality of first ventilation holes 1221.

[0064] In some embodiments, the flow homogenization component 12 further includes a tertiary flow homogenization plate 123. The tertiary flow homogenization plate 123 is located downstream of the secondary flow homogenization plate 122 along the gas flow direction of the second gas raw material.

[0065] In some embodiments, the tertiary flow homogenization plate 123 is provided with a plurality of second ventilation holes.

[0066] In some embodiments, the tertiary flow homogenization plate 123 includes multiple layers of slotted plates arranged in a staggered manner.

[0067] In some embodiments, the tertiary flow homogenization plate 123 includes a plurality of convection structures 1231. The convection structure 1231 includes two convection plates 12311, and the two convection plates 12311 are arranged oppositely to form a V-shaped structure, and the top of the V-shaped structure is directly facing the gas flow direction of the second gas raw material.

[0068] The monomer gas after cracking in the cracking furnace enters the coating chamber 11 through the air inlet 113 of the coating cavity 10, forms a trend of diffusing horizontally from the center to the entire plane along the primary flow homogenization plate 121, and then further diffuses uniformly after passing through the secondary flow homogenization plate 122 and the tertiary flow homogenization plate 123.

[0069] In Figure 8AIn the illustrated embodiment, the second gaseous raw material adopts an upper and lower air inlet mode. The air inlet 113 is located above and is connected to the solid feeding device 40. The air extraction port 114 is located below and is connected to the air extraction pipeline 51. The primary flow equalizing plate 121 is a disc, which converts the airflow flowing in the vertical direction into the airflow flowing in the horizontal direction and can rapidly diffuse in the horizontal direction. The secondary flow equalizing plate 122 is provided with a plurality of first ventilation holes 1221, which increases the uniformity of the airflow. The tertiary flow equalizing plate 123 can further increase the uniformity and at the same time slow down the airflow velocity by increasing the airflow path.

[0070] In Figure 8B In the illustrated embodiment, the second gaseous raw material adopts a side-in and side-out air inlet mode. The air inlet 113 is located on one side and is connected to the solid feeding device 40. The air extraction port 114 is located on the other side and is connected to the air extraction pipeline 51. In the side-in and side-out air inlet mode, the uniformity of the airflow is easier to control without relying on the upper and lower temperatures of the cavity to regulate. At the same time, it can also avoid the large particles from settling downward under the dual action of gravity and suction force, thereby affecting the film layer quality. In addition, the uniformity of the film layer in the side-in and side-out air inlet mode can be achieved by the rotation of the bracket, and the vertical uniformity mainly depends on the air equalizing component to make the air inlet evenly distributed in the vertical direction.

[0071] In some embodiments, a flow equalizing component for the first gaseous raw material and / or a flow equalizing component for the third gaseous raw material are also provided in the coating chamber 11. The flow equalizing component may include a single flow equalizing plate, and the single flow equalizing plate may be a short baffle or a long strip opening baffle covering a plurality of single air inlets. The single gas enters the cavity and is evenly dispersed through the single flow equalizing plate, thereby improving the film layer uniformity between the upper and lower layers.

[0072] In some embodiments, a temperature control device is provided on the cavity wall of the coating cavity 10, which can realize multi-region regulation of the cavity wall temperature. By adjusting the temperature of the cavity wall of the coating cavity 10, the deposition rates of the upper and lower layer single gases are made consistent under the combined influence of the density and temperature of the single gas, so that the thickness of the upper and lower layer coating film layers is uniform.

[0073] According to an embodiment of the present utility model, a flow homogenization component is provided in the coating chamber, which optimizes and improves the uniformity of gas deposition, including three optimization methods: adding a flow homogenization component between the air inlet and the rotating turntable, controlling and adjusting the temperature of the chamber wall at multiple points, and using the rotating turntable. The monomer gas after cracking in the cracking furnace enters the coating chamber through the air inlet of the coating chamber, forms a trend of spreading horizontally from the center to the entire plane along the first-stage flow homogenization plate, and then spreads more uniformly after passing through the second-stage flow homogenization plate and the third-stage flow homogenization plate; adjusting the temperature of the chamber wall of the coating chamber enables the deposition rates of the upper and lower layer monomer gases to be the same under the combined influence of the monomer gas density and temperature, making the coating film thickness of the upper and lower layers uniform; at the same time, during the coating process, the substrate revolves around the central rotation axis, avoiding the phenomenon of uneven coating film thickness of the substrate in a fixed area caused by uneven chemical monomer gas density in each area.

[0074] Combined with Figure 1 As shown in, the coating equipment 100 further includes a vacuum system 50 for evacuating the coating chamber 11.

[0075] The vacuum system 50 includes an exhaust pipeline 51, and the exhaust pipeline 51 is provided with a pump set for extracting the air in the coating chamber 11. The exhaust pipeline 51 includes a rough pumping pipeline and a fine pumping pipeline. The rough pumping pipeline is communicated with the coating chamber 11, and the fine pumping pipeline is communicated with the coating chamber 11 through a cold trap 52. The cold trap 52 is used to trap the condensable gases in the extracted air. Before coating, the chamber is evacuated. First, the chamber is roughly pumped, and after reaching a certain vacuum degree, the chamber is finely pumped.

[0076] In some embodiments, the coating equipment 100 further includes an exhaust gas treatment device 60. The exhaust gas treatment device 60 is communicated with the exhaust pipeline 51 and is used to treat the gas extracted through the exhaust pipeline 51 and discharge it. The exhaust gas treatment device 60 includes, but is not limited to, recovering or pollution-free treating reaction raw materials, process gases, or auxiliary gases such as doping elements such as nitrogen, inert gases, hydrogen, and hydrocarbon gases, and then discharging them to the outside to prevent environmental pollution and enable recycling.

[0077] According to an embodiment of the present utility model, the coating chamber 11 is connected to the pump set through two pipelines, namely a rough pumping pipeline and a fine pumping pipeline. The rough pumping pipeline is directly connected to the coating chamber 11. A cold trap 52 is added between the fine pumping pipeline and the coating chamber 11. During the vacuum pumping stage, the rough pumping pipeline is first opened to quickly pump out most of the air in the coating chamber 11. After reaching a certain pressure, the fine pumping pipeline is opened. The low-temperature condensation and adsorption effects of the cold trap 52 can accelerate the vacuum pumping rate and enable the coating chamber 11 to obtain a lower ultimate vacuum degree. During the coating process, the fine pumping pipeline is used. The process mixed gas extracted from the coating chamber 11 is cooled and adsorbed at low temperature by the cold trap 52 and then pumped away by the pump set, and is discharged after passing through the tail gas treatment device 60, greatly reducing the impurities entering the pump set, extending the service life of the pump set, and effectively filtering the tail gas, making the equipment more environmentally friendly.

[0078] In some embodiments, the vacuum system 50 further includes a valve 53 with adjustable opening degree, which is used to adjust the pumping speed of the pumping pipeline 51 to control the stability of the vacuum pressure in the coating chamber 11.

[0079] In some embodiments, the vacuum system 50 further includes a first vacuum pressure sensor 54 for detecting the pressure in the pumping pipeline 51.

[0080] In some embodiments, the sublimation chamber 42 includes a second vacuum pressure sensor 426 for detecting the pressure in the sublimation chamber 42.

[0081] In some embodiments, as Figure 8A shown, the coating equipment 100 further includes a plasma discharge device 70. The plasma discharge device 70 includes an external plasma discharge mechanism or an internal plasma discharge mechanism.

[0082] In some embodiments, as Figure 8A shown, the coating equipment 100 further includes a real-time film thickness monitoring system 90. The thickness of the film layer on the substrate 80 is monitored through the real-time film thickness monitoring system. When the thickness of the film layer reaches a predetermined thickness, the gas feeding device, the liquid feeding device, and / or the solid feeding device are closed.

[0083] As Figure 10 and 11As shown in the figure, the plasma discharge device 70 includes an external plasma discharge mechanism 71 and / or an internal plasma discharge mechanism 72. In the external plasma discharge mechanism, the plasma discharge device is installed on the outer wall of the cavity to perform plasma treatment on the substrate inside the cavity. The plasma discharge device may include a plasma excitation power supply, a matcher, a discharge coil or electrode, a quartz / ceramic plate, a glass cover plate, and a gas distribution flange; through the plasma excitation power supply and the matcher, the discharge coil or electrode generates glow discharge in the coating cavity; the cavity wall is connected and sealed with the quartz / ceramic plate through the gas distribution flange, the gas distribution flange is connected with a plurality of air inlets, and the side connected to the cavity is densely distributed with air outlets, which can realize the function of uniformly introducing gas into the cavity; the glass cover plate can prevent the film layer from depositing on the quartz / ceramic plate. In the internal plasma discharge mechanism, the plasma excitation power supply applies voltage to the loading shelf, so that the loading shelf acts as an electrode to discharge and generate plasma. The plasma excitation power supply can be a radio frequency, intermediate frequency or pulse power supply. The plasma excitation power supply generates high-energy plasma in the coating chamber 11, excites the raw material gas to generate active groups, and deposits on the surface of the substrate 80 to form a cross-linked structure, thereby forming a film layer on the surface of the substrate 80. On the other hand, the bombardment of the high-energy ions and electrons in the plasma on the film layer can make the film layer dense and improve the film layer quality.

[0084] In other embodiments, in the internal plasma discharge mechanism, the plasma excitation power supply (such as a radio frequency power supply) generates a radio frequency electric field in the coating chamber 11 of the coating cavity 10 by directly loading on the electrode plate in the cavity, so as to act on the gas in the coating chamber 11. Specifically, during coating, the radio frequency power supply discharges the gas in the coating chamber 11, such as nitrogen or inert gas and reaction raw material gas, through the provided radio frequency electric field, so that the coating chamber 11 is in a plasma environment and the reaction gas raw material is in a high-energy state.

[0085] According to an embodiment of the present invention, the side wall discharge coil of the coating chamber is connected to a matcher and a radio frequency power supply. After the coating chamber is evacuated, through the alternating current of the radio frequency power supply, the introduced argon / helium / oxygen and other gases are excited to generate plasma, which acts on the surface of the substrate to perform surface treatment on the substrate, solving the cumbersome processing steps of the existing process that require using a plasma device to perform surface treatment on the substrate before coating and then coating.

[0086] The technical content and technical features of the present invention have been disclosed above. However, it can be understood that under the creative concept of the present invention, those skilled in the art can make various changes and improvements to the above disclosed concept, but all belong to the protection scope of the present invention. The description of the above embodiments is illustrative rather than restrictive, and the protection scope of the present invention is determined by the claims.

Claims

1. A solid feeding device, characterized in that: include: Silos, used to store solid raw materials; a processing device for receiving the solid raw material; as well as The turntable unloading mechanism is used to controllably transport the solid raw materials in the silo to the processing device.

2. The solid feed device according to claim 1, characterized in that: The processing device is a sublimation chamber, which is used to heat and sublime the solid raw material.

3. The solid feed device according to claim 2, characterized in that: The solid raw material is pellet-shaped parylene, sheet-shaped parylene or granular parylene.

4. The solid feed device according to claim 2, characterized in that: The turntable unloading mechanism comprises: A turntable is arranged in the silo and can rotate around its own central axis, the turntable has a central protrusion and a plurality of turntable holes evenly arranged around the central protrusion, and the turntable holes are used to accommodate the solid raw materials; A material discharge channel, located below the turntable and connected to the material bin and the sublimation chamber; and The stopper is located above the turntable, allowing the solid raw material in the turntable hole to rotate to the feed channel and blocking the remaining solid raw materials except the solid raw material in the turntable hole from rotating to the feed channel, so that the solid raw material in the turntable hole enters the sublimation chamber through the feed channel.

5. The solid feed device according to claim 4, characterized in that: The turntable unloading mechanism also includes a dividing device for controlling the rotation angle of the turntable.

6. The solid feed device according to claim 4, characterized in that: The turntable unloading mechanism also includes a photoelectric detection device for detecting the feeding state of the solid raw material.

7. The solid feed device according to claim 6, characterized in that: The turntable is provided with a waiting position and a material discharge position, and the photoelectric detection device comprises: A first photoelectric switch sensor is used to detect whether the solid raw material exists at the material position of the turntable; and The second photoelectric switch sensor is used to detect whether the solid raw material exists at the lower material position of the turntable.

8. The solid feed device according to claim 7, characterized in that: The photoelectric detection device further includes a third photoelectric switch sensor for detecting whether the solid raw material exists at the center of the central protrusion of the turntable.

9. The solid feed device according to claim 8, characterized in that: The photoelectric detection device further comprises an alarm, and when the third photoelectric switch sensor detects that the solid raw material does not exist at the center of the central protrusion of the turntable, the alarm sends out an alarm signal.

10. The solid feed device according to any one of claims 4 to 9, characterized in that: The solid feeding device further comprises a control valve assembly for controlling the opening and closing of the feeding channel.

11. The solid feed device according to claim 10, characterized in that: The control valve assembly includes at least two control valves, and the at least two control valves are arranged at intervals from each other.

12. The solid feed device according to claim 11, characterized in that: Each control valve includes a valve core and a heating element for adjusting the temperature of the position of the valve core.

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