Furnace tube
By designing multiple air inlet ports and uniform flow devices in the furnace tube, the process gas is evenly diffused into the reaction chamber, which solves the problem that the furnace tube cannot guarantee the uniformity of the battery sheet coating in the reaction chamber in the prior art, and achieves the uniformity of the coating and the adequacy of the reaction.
Patent Information
- Application Number
- CN202421929359.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-09
- Publication Date
- 2025-06-24
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
In the prior art, the furnace tube cannot guarantee the uniformity of the plating of the battery sheet in the reaction chamber, and the uniformity of the coating is affected mainly due to the inability to uniformly intake air.
A furnace tube is designed, with a plurality of air inlet ports communicating with the reaction chamber at the top or bottom, and is equipped with an air inlet device and a uniform flow device. The uniform flow device includes an annular spray air intake pipe and a spray air intake pipe, and the process gas is uniformly diffused into the reaction chamber through the spray port.
By uniformly diffusing the process gas, the contact efficiency between the battery cell and the process gas is improved, making the reaction more sufficient, and ensuring the uniformity of the battery cell coating placed in the reaction chamber.
Smart Images

Figure CN223016959U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of metallurgy, and particularly relates to a furnace tube. Background Art
[0002] In the field of photovoltaic manufacturing technology, the main process equipment is mainly in a horizontal structure, such as diffusion, annealing, PECVD (Plasma Enhanced Chemical Vapor Deposition), and LPCVD (Low Pressure Chemical Vapor Deposition), etc.; the cross phenomenon of the temperature field and gas field in the conventional horizontal coating equipment is more obvious, and there is a significant difference in the temperature field between the top and bottom of the reaction chamber in the furnace tube.
[0003] To solve the above problems, existing manufacturers set up vertical coating equipment. After the process gas enters the reaction chamber in the vertical furnace tube and is heated and expanded, it will gather at the top of the reaction chamber, and then the gas is discharged after the process reaction is completed. And during the process reaction, it is necessary to ensure that the reaction chamber can intake gas evenly to ensure the uniformity of the coating of the solar cells in the reaction chamber.
[0004] Therefore, in order to ensure that the vertical coating equipment can intake gas evenly, and further ensure the uniformity of the coating of the solar cells, different manufacturers have proposed different design schemes, and the design concepts of different design schemes are different, and the effects produced are also different. Summary of the Utility Model
[0005] In view of this, the utility model provides a furnace tube, which is used to solve the problems that the existing furnace tube cannot ensure that the reaction chamber can intake gas evenly and cannot ensure the uniformity of the coating of the solar cells in the reaction chamber.
[0006] The technical solution of the utility model is a furnace tube, which is internally provided with a reaction chamber for placing a carrier, and a plurality of air inlets communicated with the reaction chamber are arranged at the top or bottom of the furnace tube, and an air inlet device is connected to the end of the air inlet far away from the reaction chamber;
[0007] A flow equalizing device is connected to the other end of the air inlet located in the reaction chamber. The flow equalizing device includes an annular spray inlet pipe and / or a spray inlet pipe, and spray nozzles are arranged on the side of the annular spray inlet pipe and / or the spray inlet pipe facing the carrier;
[0008] Wherein, the annular spray inlet pipe and / or the spray inlet pipe are both used for evenly diffusing the process gas into the reaction chamber.
[0009] Further, an outer ring area and an inner ring area are provided at the top or bottom of the furnace tube, and a plurality of air inlets are circumferentially and uniformly arranged in the outer ring area and / or the inner ring area.
[0010] Further, the flow homogenizing device includes an annular spray inlet pipe, a flow homogenizing layer, and a spray inlet pipe;
[0011] The air inlets located in the inner ring area or the outer ring area are all communicated with the annular spray inlet pipe. The annular spray inlet pipe is located between the air inlets and the carrier. At least one layer of flow homogenizing layer is also arranged between the annular spray inlet pipe and the carrier. The flow homogenizing layer is provided with a plurality of through holes penetrating through the flow homogenizing layer; a plurality of first spray ports are arranged on one side of the annular spray inlet pipe facing the flow homogenizing layer.
[0012] The air inlets located in the outer ring area or the inner ring area are respectively communicated with a spray inlet pipe. The spray inlet pipe is vertically arranged in the reaction chamber, and a plurality of second spray ports are arranged on one side of the spray inlet pipe facing the carrier.
[0013] Further, the flow homogenizing device includes an annular spray inlet pipe, and the annular spray inlet pipe is located on the side of the carrier facing the air inlets;
[0014] The air inlets located in the outer ring area and / or the inner ring area are all communicated with the annular spray inlet pipe, and a plurality of first spray ports are arranged on one side of the annular spray inlet pipe facing the carrier.
[0015] Further, the flow homogenizing device further includes a flow homogenizing layer that is matched with the annular spray inlet pipe;
[0016] At least one layer of flow homogenizing layer is arranged between the annular spray inlet pipe and the carrier. The flow homogenizing layer is provided with a plurality of through holes penetrating through the flow homogenizing layer; the flow homogenizing layer is used for uniformly distributing the process gas on the cross section of the reaction chamber.
[0017] Further, the flow homogenizing device includes a spray inlet pipe; the spray inlet pipe is vertically arranged in the reaction chamber;
[0018] Each air inlet is communicated with a spray inlet pipe, and a plurality of second spray ports are arranged on one side of the spray inlet pipe facing the carrier.
[0019] Further, the air inlet device includes an inlet pipe, an adjusting needle valve, a pneumatic valve, a flow meter, and a stop valve;
[0020] Each air inlet is connected with an inlet pipe, and an adjusting needle valve, a pneumatic valve, a flow meter, and a stop valve are sequentially arranged on each inlet pipe along its extending direction.
[0021] Further, the intake device includes an intake pipe, a regulating needle valve, a pneumatic valve, a flow meter, and a stop valve;
[0022] Each intake port is connected to an intake pipe, and each intake pipe is provided with a regulating needle valve;
[0023] At least two of the intake pipes communicate with the pneumatic valve, and the pneumatic valve also communicates with the flow meter and the stop valve in sequence through the intake pipe.
[0024] Further, a plurality of exhaust ports communicating with the reaction chamber are circumferentially provided at the bottom of the furnace tube, and one end of the exhaust port extending out of the bottom of the furnace tube is connected to an exhaust device; the exhaust device includes an exhaust pipe, a flow rate detection device, a cooling device, a regulating valve, a filtering device, a control valve, and a vacuum pump;
[0025] Each exhaust port is communicated with an exhaust pipe, and a flow rate detection device, a cooling device, a regulating valve, and a filtering device are sequentially arranged along the extending direction of each exhaust pipe;
[0026] At least one of the filtering devices communicates with the control valve through the exhaust pipe, and the control valve also communicates with the vacuum pump through the exhaust pipe.
[0027] Further, a plurality of exhaust ports communicating with the reaction chamber are circumferentially provided at the bottom of the side wall of the furnace tube, and one end of the exhaust port extending out of the bottom of the furnace tube is connected to an exhaust device; the exhaust device includes an exhaust pipe, a flow rate detection device, a cooling device, a regulating valve, a filtering device, a control valve, and a vacuum pump;
[0028] Each exhaust port is communicated with an exhaust pipe, and a flow rate detection device, a cooling device, a regulating valve, and a filtering device are sequentially arranged along the extending direction of each exhaust pipe;
[0029] At least one of the filtering devices communicates with the control valve through the exhaust pipe, and the control valve also communicates with the vacuum pump through the exhaust pipe.
[0030] Compared with the prior art, the present utility model has at least the following beneficial effects:
[0031] The present utility model transports process gas to the intake port through the intake device, and then sprays it onto the carrier through the annular spray intake pipe and / or the spray ports of the spray intake pipe, and then uniformly diffuses it into the entire reaction chamber, so as to improve the contact efficiency between the battery wafer and the process gas, make the reaction between the two more sufficient, and ensure the uniformity of the coating of the battery wafer placed in the reaction chamber. Description of the Drawings
[0032] Unless otherwise defined, all technical and scientific terms used herein shall have the same meaning as commonly understood by those of ordinary skill in the technical field to which this utility model pertains; the terms used in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this utility model; the terms "comprising" and "having" and any variations thereof in the specification and claims of this utility model and the above drawings are intended to cover non-exclusive inclusion. The terms "first", "second", etc. in the specification and claims of this utility model or the above drawings are used to distinguish different objects and not to describe a specific order.
[0033] To more clearly illustrate the technical solutions in the embodiments of this utility model, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the following drawings are only some embodiments of this utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.
[0034] Figure 1 The first cross-sectional view of the furnace tube of this utility model;
[0035] Figure 2 is Figure 1 an enlarged schematic view of the reference numeral A in
[0036] Figure 3 is Figure 1 an enlarged schematic view of the reference numeral B in
[0037] Figure 4 The first structural schematic view of the air inlet device of this utility model;
[0038] Figure 5 The second structural schematic view of the air inlet device of this utility model;
[0039] Figure 6 The second cross-sectional view of the furnace tube of this utility model;
[0040] Figure 7 The third cross-sectional view of the furnace tube of this utility model;
[0041] Figure 8 The first structural schematic view of the exhaust device of this utility model;
[0042] Figure 9 The second structural schematic view of the exhaust device of this utility model;
[0043] Figure 10 The partial structural schematic view of the furnace tube of this utility model.
[0044] Reference numerals:
[0045] 10. Reaction chamber; 101. Limit collar;
[0046] 20. Carrier;
[0047] 30. Air inlet;
[0048] 40. Air inlet device; 401. Air inlet pipe; 402. Adjusting needle valve; 403. Pneumatic valve; 404. Flowmeter; 405. Stop valve;
[0049] 50. Flow equalizing device; 501. Annular spray air inlet pipe; 5011. First spray opening; 502. Flow equalizing layer; 5021. Through hole; 503. Spray air inlet pipe; 5031. Second spray opening;
[0050] 60. Outer ring area;
[0051] 70. Inner ring area;
[0052] 80. Exhaust port;
[0053] 90. Exhaust device; 901. Exhaust pipe; 902. Flow rate detection device; 903. Cooling device; 904. Regulating valve; 905. Filter device; 906. Control valve; 907. Vacuum pump; 9071. Air outlet;
[0054] 100. Internal thermocouple;
[0055] 110. Sealing plug. Detailed implementation mode
[0056] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present utility model clearer, the present utility model will be further described in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present utility model and are not used to limit the present utility model. Thus, a feature pointed out in this specification will be used to illustrate one feature of one embodiment of the present utility model, rather than implying that each embodiment of the present utility model must have the feature described. In addition, it should be noted that this specification describes many features. Although some features may be combined together to show possible system designs, these features may also be used in other combinations not explicitly described. Thus, unless otherwise stated, the described combinations are not intended to be limiting.
[0057] The principle and structure of the present utility model will be described in detail below with reference to the drawings and embodiments.
[0058] In one embodiment, to ensure uniform air intake in the reaction chamber 10 and thus ensure the uniformity of the coating of the battery cells placed in the reaction chamber 10, refer to the attached Figure 1 and the attachedFigures 4 - 5 , the present utility model provides a furnace tube, which is internally provided with a reaction chamber 10 for placing a carrier 20. A plurality of air inlets 30 communicating with the reaction chamber 10 are provided at the top or bottom of the furnace tube, and an air inlet device 40 is connected to one end of the air inlet 30 away from the reaction chamber 10;
[0059] The other end of the air inlet 30 located in the reaction chamber 10 is connected with a flow equalizing device 50. The flow equalizing device 50 includes an annular spray inlet pipe 501 and / or a spray inlet pipe 503, and spray ports are provided on one side of the annular spray inlet pipe 501 and / or the spray inlet pipe 503 facing the carrier 20;
[0060] Wherein, the annular spray inlet pipe 501 and / or the spray inlet pipe 503 are both used to uniformly diffuse the process gas flowing into the air inlet 30 into the reaction chamber 10.
[0061] Wherein, the furnace tube in this embodiment is one of the components of a vertical coating device, and the carrier 20 is used to place battery wafers (also called silicon wafers). And this embodiment takes the top of the furnace tube being provided with a plurality of air inlets 30 communicating with the reaction chamber 10 as an example for illustration.
[0062] It should be noted that the furnace tube further includes a control unit (not shown, the same throughout the text), and the control unit is electrically connected to the air inlet device 40. And the furnace tube is one of the components of a vertical coating device, so the furnace tube in this embodiment is illustrated with a vertical structure.
[0063] In this way, the process gas enters the air inlet 30 through the air inlet device 40, and then is sprayed onto the carrier 20 through the spray ports of the annular spray inlet pipe 501 and / or the spray inlet pipe 503, and then uniformly diffuses into the entire reaction chamber 10, so as to improve the contact efficiency between the battery wafer and the process gas, make the reaction between the two more sufficient, and ensure the uniformity of the coating of the battery wafer placed in the reaction chamber 10.
[0064] Wherein, referring to the attached Figure 4 , an outer ring area 60 and an inner ring area 70 are provided at the top or bottom of the furnace tube, and a plurality of air inlets 30 are circumferentially and uniformly provided in the outer ring area 60 and / or the inner ring area 70, so as to increase the total amount of the process gas entering the reaction chamber 10 through the air inlets 30 at the same time.
[0065] Therefore, there are the following several arrangement ways at the top or bottom of the furnace tube:
[0066] Firstly, only a plurality of air inlets 30 are circumferentially and uniformly provided in the outer ring area 60 at the top or bottom of the furnace tube.
[0067] Secondly, only a plurality of air inlets 30 are circumferentially and uniformly provided in the inner ring area 70 at the top or bottom of the furnace tube.
[0068] Thirdly, a plurality of air inlets 30 are circumferentially and uniformly arranged at the top or bottom of the furnace tube in both the outer ring area 60 and the inner ring area 70.
[0069] In this embodiment, it is exemplified that the outer ring area 60 and the inner ring area 70 are arranged at the top of the furnace tube, and four air inlets 30 are circumferentially and uniformly arranged in both the outer ring area 60 and the inner ring area 70.
[0070] Specifically, referring to the appendix Figure 4 , the air inlet device 40 includes an air inlet pipe 401, an adjusting needle valve 402, a pneumatic valve 403, a flowmeter 404 and a stop valve 405; the control unit is electrically connected to the adjusting needle valve 402, the pneumatic valve 403, the flowmeter 404 and the stop valve 405 respectively.
[0071] Each of the air inlets 30 is connected to an air inlet pipe 401, and an adjusting needle valve 402, a pneumatic valve 403, a flowmeter 404 and a stop valve 405 are sequentially arranged on each air inlet pipe 401 along its extending direction.
[0072] In this way, each air inlet 30 is provided with an air inlet device 40, ensuring that when one of the air inlet devices 40 fails, there is still an air inlet device 40 to supply process gas to the air inlet 30, so as to ensure the uniformity of the coating of the battery wafers placed in the reaction chamber 10.
[0073] Of course, in other embodiments, to save costs, referring to the appendix Figure 5 , the air inlet device 40 includes an air inlet pipe 401, an adjusting needle valve 402, a pneumatic valve 403, a flowmeter 404 and a stop valve 405; the control unit is electrically connected to the adjusting needle valve 402, the pneumatic valve 403, the flowmeter 404 and the stop valve 405 respectively.
[0074] Each of the air inlets 30 is connected to an air inlet pipe 401, and an adjusting needle valve 402 is arranged on each air inlet pipe 401;
[0075] All the air inlet pipes 401 are communicated with the pneumatic valve 403, and the pneumatic valve 403 is also sequentially communicated with the flowmeter 404 and the stop valve 405 through the air inlet pipe 401.
[0076] Of course, it is also possible that two air inlet pipes 401 are both communicated with the pneumatic valve 403, or three air inlet pipes 401 are both communicated with the pneumatic valve 403, which is not limited here.
[0077] It should be noted that the regulating needle valve 402 is used to receive the control signal of the control unit to finely regulate the flow rate of the process gas flowing into the air inlet 30, and can achieve continuous regulation from a tiny flow rate to a fully open state; the pneumatic valve 403 is a device that controls the opening and closing of the valve by using compressed air as the power source, and it is used to receive the control signal of the control unit to quickly cut off or open the process gas; the flow meter 404 is used to measure the gas flow rate through the intake pipe 401 and upload the measurement data to the control unit; the stop valve 405 is used to receive the control signal of the control unit to completely close or open the gas flow in the intake pipe 401, and is usually not used to regulate the gas flow rate.
[0078] Among them, referring to the attached Figures 1 - 3 , the flow equalizing device 50 includes an annular spray intake pipe 501, a flow equalizing layer 502, and a spray intake pipe 503;
[0079] The air inlets 30 located in the inner ring area 70 or the outer ring area 60 are all communicated with the annular spray intake pipe 501. The annular spray intake pipe 501 is located between the air inlet 30 and the carrier 20. At least one flow equalizing layer 502 is also provided in a matching manner between the annular spray intake pipe 501 and the carrier 20. The flow equalizing layer 502 is provided with a plurality of through holes 5021 penetrating through the flow equalizing layer 502; a plurality of first spray ports 5011 are provided on one side of the annular spray intake pipe 501 facing the flow equalizing layer 502;
[0080] The air inlets 30 located in the outer ring area 60 or the inner ring area 70 are respectively communicated with a spray intake pipe 503. The spray intake pipe 503 is vertically arranged in the reaction chamber 10. A plurality of second spray ports 5031 are provided on one side of the spray intake pipe 503 facing the carrier 20.
[0081] It should be noted that in this embodiment, the air inlets 30 located in the inner ring area 70 are all communicated with the annular spray intake pipe 501, and the air inlets 30 located in the outer ring area 60 are respectively communicated with a spray intake pipe 503 as an example. Of course, according to the actual situation, the air inlets 30 located in the inner ring area 70 can be respectively communicated with a spray intake pipe 503, and the air inlets 30 located in the outer ring area 60 can be all communicated with the annular spray intake pipe 501, which is not limited herein.
[0082] Moreover, the annular spray inlet pipe 501 is arranged around the central axis of the reaction chamber 10. Process gas can be annularly sprayed towards the carrier 20 through the first spray openings 5011, covering the entire surface of the carrier 20, thus ensuring the uniformity of the contact between the process gas and the battery wafers, and further guaranteeing the uniformity of the coating on the battery wafers. The flow equalizing layer 502 is also arranged around the central axis of the reaction chamber 10 and is disposed opposite to the annular spray inlet pipe 501. The process gas annularly sprayed from the first spray openings 5011 will first pass through the flow equalizing layer 502 and then further cover the entire surface of the carrier 20 through the through holes 5021, further ensuring the uniformity of the coating on the battery wafers. The vertically arranged spray inlet pipe 503 can achieve the uniform distribution of the process gas along the longitudinal direction of the reaction chamber 10 through the second spray openings 5031, ensuring that all the battery wafers on the carrier 20 can come into contact with the process gas under the same conditions, and further guaranteeing the uniformity of the coating on the battery wafers.
[0083] In this way, when the gas inlet device 40 transports the process gas to the gas inlet 30, a part of the process gas is sprayed towards the flow equalizing layer 502 through the first spray openings 5011 of the annular spray inlet pipe 501, and then the flow equalizing layer 502 evenly distributes the process gas over the entire cross-section of the reaction chamber 10 through its through holes 5021; another part of the process gas will be longitudinally and evenly sprayed towards the carrier 20 through the second spray openings 5031 of the vertically arranged spray inlet pipe 503. Such uniform distribution of the process gas can avoid local over-concentration or over-dilution, thus ensuring the consistency of the reaction or heating process; and it helps to maintain the uniformity of the temperature in the reaction chamber 10, preventing local overheating or overcooling; it can also improve the contact efficiency between the reactants, making the reaction more complete, thereby increasing the yield and selectivity.
[0084] In other embodiments, referring to the attached Figure 6 figure, the flow equalizing device 50 only includes the annular spray inlet pipe 501 arranged around the central axis of the reaction chamber 10, and the annular spray inlet pipe 501 is located on the side of the carrier 20 facing the gas inlet 30;
[0085] The gas inlets 30 located in the outer ring region 60 and / or the inner ring region 70 are all communicated with the annular spray inlet pipe 501, and a plurality of first spray openings 5011 are provided on the side of the annular spray inlet pipe 501 facing the carrier 20.
[0086] In this way, after the gas inlet device 40 transports the process gas to the gas inlet 30, the process gas will be annularly sprayed towards the carrier 20 through the first spray openings 5011 of the annular spray inlet pipe 501, covering the entire surface of the carrier 20, thus ensuring the uniformity of the contact between the process gas and the battery wafers, and further guaranteeing the uniformity of the coating on the battery wafers.
[0087] And there are the following several arrangement modes at this time:
[0088] First, the air inlets 30 located in the outer ring area 60 and the inner ring area 70 are respectively connected to a ring-shaped spray inlet pipe 501. And at this time, the control unit can control the cut-off or closure of the air inlet device 40, and only supply the process gas to the air inlet 30 located in the outer ring area 60. That is, at this time, only the ring-shaped spray inlet pipe 501 communicated with the air inlet 30 located in the outer ring area 60 sprays the process gas. Of course, the control unit can also control the air inlet device 40 to only supply the process gas to the air inlet 30 located in the inner ring area 70. That is, at this time, only the ring-shaped spray inlet pipe 501 communicated with the air inlet 30 located in the inner ring area 70 sprays the process gas.
[0089] Second, the air inlets 30 located in the outer ring area 60 and the inner ring area 70 are both connected to the same ring-shaped spray inlet pipe 501.
[0090] Third, only the air inlets 30 located in the inner ring area 70 are both connected to the same ring-shaped spray inlet pipe 501, and the air inlets 30 located in the outer ring area 60 are not connected to the ring-shaped spray inlet pipe 501.
[0091] Fourth, only the air inlets 30 located in the outer ring area 60 are both connected to the same ring-shaped spray inlet pipe 501, and the air inlets 30 located in the inner ring area 70 are not connected to the ring-shaped spray inlet pipe 501.
[0092] To further ensure the uniformity of the contact between the process gas and the battery cells, and thus ensure the uniformity of the coating on the battery cells, referring to the attached Figure 6 , the flow equalizing device 50 further includes a flow equalizing layer 502 corresponding to the ring-shaped spray inlet pipe 501. That is, the flow equalizing layer 502 is disposed opposite to the ring-shaped spray inlet pipe 501, and the process gas sprayed annularly from the first spray port 5011 will first pass through the flow equalizing layer 502.
[0093] At least one layer of flow equalizing layer 502 is provided between the ring-shaped spray inlet pipe 501 and the carrier 20. The flow equalizing layer 502 is provided with a plurality of through holes 5021 penetrating through the flow equalizing layer 502; the flow equalizing layer 502 is used to uniformly distribute the process gas on the cross section of the reaction chamber 10.
[0094] It should be noted that the flow equalizing layer 502 in this embodiment is described by setting two layers of distance.
[0095] In this way, the flow equalizing layer 502 will further uniformly distribute the process gas on the reaction chamber 10 through the through holes 5021, that is, cover the surface of the entire carrier 20, and further ensure the uniformity of the coating on the battery cells.
[0096] In other embodiments, referring to the attached Figure 7, the uniform flow device 50 only includes a spray inlet pipe 503; the spray inlet pipe 503 is vertically arranged in the reaction chamber 10;
[0097] Each air inlet 30 is communicated with a spray inlet pipe 503, and a plurality of second spray nozzles 5031 are arranged on one side of the spray inlet pipe 503 facing the carrier 20.
[0098] In this way, the spray inlet pipe 503 can realize the uniform distribution of the process gas along the longitudinal direction of the reaction chamber 10 through the second spray nozzles 5031, ensuring that all the battery wafers on the carrier 20 can contact the process gas under the same conditions, thereby guaranteeing the uniformity of the battery wafer coating.
[0099] It should be noted that a limiting collar 101 is correspondingly arranged at the bottom of the reaction chamber 10 corresponding to each spray inlet pipe 503, and the bottom of the spray inlet pipe 503 can be correspondingly sleeved into the limiting collar 101 to prevent the spray inlet pipe 503 from swinging, thereby affecting the uniform jetting of the spray inlet pipe 503 and further affecting the uniformity of the battery wafer coating; and the limiting collar 101 is made of a high-temperature resistant material.
[0100] Moreover, the carrier 20 is located between the spray inlet pipes 503 communicated with the air inlets 30 in the outer ring area 60 and the spray inlet pipes 503 communicated with the air inlets 30 in the inner ring area 70.
[0101] Among them, referring to the appendix Figures 4 - 7 , a thermal couple 100 is vertically arranged in the reaction chamber 10 corresponding to each air inlet 30, or a thermal couple 100 is vertically arranged between two adjacent air inlets 30. The thermal couple 100 is a temperature measuring device, which is formed by welding two different metal wires together to form a thermocouple junction. When this junction is heated, due to the different thermoelectric properties of the two metals, a small voltage difference, that is, a thermal electromotive force, will be generated at both ends. This voltage difference is in a certain proportional relationship with the temperature, so it can be used to measure the temperature and upload the measured temperature data to the control unit, so that the control unit can control the flow rate of the process gas conveyed by the air inlet device 40 in real time according to the temperature.
[0102] It should be noted that both the spray inlet pipe 503 and the thermal couple 100 are vertically arranged in the reaction chamber 10. Therefore, their arrangement methods need to avoid the carrier 20 and can both extend to the bottom of the reaction chamber 10.
[0103] Among them, when the battery cells are coated in the reaction chamber 10, in order to ensure the smooth progress of the coating, maintain appropriate reaction conditions, and ensure safety, not only continuous and uniform gas intake is required, but also exhaust is needed to maintain a suitable pressure environment inside the reaction chamber 10; exhaust can also prevent gas accumulation, ensure heat transfer efficiency and reaction uniformity; exhaust can also remove harmful gases, avoid damage to the equipment, reduce safety hazards, and protect the health of operators. Therefore, referring to the appendix Figure 8 At the bottom of the furnace tube, a plurality of exhaust ports 80 communicating with the reaction chamber 10 are circumferentially provided, and one end of the exhaust port 80 extending out of the bottom of the furnace tube is connected to an exhaust device 90.
[0104] The exhaust device 90 includes an exhaust pipe 901, a flow rate detection device 902, a cooling device 903, a regulating valve 904, a filtering device 905, a control valve 906, and a vacuum pump 907 to jointly ensure the efficiency, safety, and environmental protection of the exhaust process. And the flow rate detection device 902, the cooling device 903, the regulating valve 904, the filtering device 905, the control valve 906, and the vacuum pump 907 are all electrically connected to the control unit.
[0105] Each exhaust port 80 is communicated with an exhaust pipe 901, and along the extending direction of each exhaust pipe 901, a flow rate detection device 902, a cooling device 903, a regulating valve 904, and a filtering device 905 are sequentially provided; and the flow rate detection device 902 can be installed on the cooling device 903 to detect the flow rate of the gas cooled by the cooling device 903.
[0106] All the filtering devices 905 communicate with the control valve 906 through the exhaust pipe 901, the control valve 906 also communicates with the vacuum pump 907 through the exhaust pipe 901, and an air outlet 9071 is further provided on the vacuum pump 907, and the vacuum pump 907 discharges the extracted gas to the outside or into a collection tank through the air outlet 9071.
[0107] It should be noted that in this embodiment, taking the setting of four exhaust ports 80 as an example for illustration.
[0108] In other embodiments, since the furnace tube is one of the components of the vertical coating equipment, the furnace tube is also correspondingly of a vertical structure. In order to save the vertical space of the furnace tube, that is, without occupying the vertical space of the furnace tube, referring to the appendix Figure 9 At the bottom of the side wall of the furnace tube, exhaust ports 80 communicating with the reaction chamber 10 are circumferentially provided, one end of the exhaust port 80 extending out of the bottom of the furnace tube is connected to an exhaust device 90, and the exhaust device 90 includes an exhaust pipe 901, a flow rate detection device 902, a cooling device 903, a regulating valve 904, a filtering device 905, a control valve 906, and a vacuum pump 907.
[0109] Each of the exhaust ports 80 is communicated with an exhaust pipe 901. Along the extending direction of each exhaust pipe 901, a flow velocity detection device 902, a cooling device 903, a regulating valve 904 and a filtering device 905 are sequentially arranged; and the flow velocity detection device 902 can be installed on the cooling device 903 for detecting the flow velocity of the gas cooled by the cooling device 903.
[0110] At least one of the filtering devices 905 is communicated with the control valve 906 through the exhaust pipe 901, and the control valve 906 is also communicated with the vacuum pump 907 through the exhaust pipe 901; and an air outlet 9071 is further arranged on the vacuum pump 907, and the vacuum pump 907 discharges the extracted gas to the outside or into a collection tank through the air outlet 9071.
[0111] In other embodiments (not shown in the figure), each filtering device 905 is communicated with a vacuum pump 907 through an exhaust pipe 901, and a control valve 906 is arranged on the exhaust pipe 901 between each vacuum pump 907 and the filtering device 905. In this way, when a vacuum pump 907 fails and stops operating, there are other vacuum pumps 907 that continue to operate to ensure that the gas in the reaction chamber 10 can be discharged, so as to maintain a suitable pressure environment in the reaction chamber 10; it can also prevent gas accumulation, ensure the heat transfer efficiency and reaction uniformity. The exhaust can also remove harmful gases, avoid damage to the equipment, reduce potential safety hazards, and protect the health of operators at the same time.
[0112] It should be noted that the flow velocity detection device 902 is used to monitor the flow velocity of the gas in the exhaust pipe 901 to timely detect abnormal conditions such as blockage or leakage and make necessary adjustments; the cooling device 903 is used to reduce the temperature of the gas in the exhaust pipe 901; the regulating valve 904 is used to control the flow rate and pressure of the gas in the exhaust pipe 901 to ensure the stability of the exhaust process; the filtering device 905 is used to filter dust, particulate matter or harmful gases contained in the gas in the exhaust pipe 901 to prevent them from being discharged into the atmosphere, thereby protecting the environment and the health of employees; the vacuum pump 907 is used to extract gas and generate negative pressure to accelerate the discharge of gas or maintain the vacuum degree in the furnace tube reaction chamber 10; the control valve 906 is used to control the start or stop of the vacuum pump 907.
[0113] In other embodiments, refer to the attached Figure 10, the air inlet 30 and the exhaust port 80 communicating with the reaction chamber 10 can also be arranged at the bottom of the furnace tube, and a thermal couple 100 is vertically arranged corresponding to the air inlet 30 in the reaction chamber 10. At this time, only one of the air inlet device 40 and the exhaust device 90 can be started at the same time to prevent the simultaneous intake and exhaust from affecting the uniformity of the coating. At this time, if it is necessary to reduce the number of the air inlet 30 and / or the thermal couple 100, the air inlet 30 and / or the thermal couple 100 to be reduced are taken out of the reaction chamber 10. Then, a hole (not shown, the same throughout the text) will be left at the bottom of the furnace tube after taking out the air inlet 30 and / or the thermal couple 100, and then the hole is blocked with a sealing plug 110 to prevent air leakage. When it is necessary to increase the air inlet 30 and / or the thermal couple 100, the sealing plug 110 is removed and the air inlet 30 and / or the thermal couple 100 are reinstalled.
[0114] Obviously, the embodiments described above are only a part of the embodiments of the present invention, rather than all of them. The preferred embodiments of the present invention are shown in the drawings, but do not limit the patent scope of the present invention. The present invention can be implemented in many different forms. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present invention more thorough and comprehensive. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing specific embodiments, or perform equivalent replacements on some of the technical features. Any equivalent structure using the specification and drawings of the present invention, directly or indirectly applied in other related technical fields, is similarly within the scope of the patent protection of the present invention.
Claims
1. A furnace tube, wherein a reaction chamber (10) is provided inside which a carrier (20) is placed, characterized in that: A plurality of air inlets (30) communicating with the reaction chamber (10) are provided at the top or bottom of the furnace tube, and an air inlet device (40) is connected to one end of the air inlet (30) away from the reaction chamber (10); The air inlet (30) is located at the other end of the reaction chamber (10) and is connected to a flow homogenizing device (50), wherein the flow homogenizing device (50) comprises an annular spray air inlet pipe (501) and / or a spray air inlet pipe (503), and a spray port is provided on a side of the annular spray air inlet pipe (501) and / or the spray air inlet pipe (503) facing the carrier (20); Wherein, the annular spray air inlet pipe (501) and / or the spray air inlet pipe (503) are both used to evenly diffuse the process gas into the reaction chamber (10).
2. The furnace tube according to claim 1, characterized in that The top or bottom of the furnace tube is provided with an outer ring area (60) and an inner ring area (70), and the outer ring area (60) and / or the inner ring area (70) are both uniformly provided with a plurality of air inlets (30) in the circumferential direction.
3. The furnace tube according to claim 2, characterized in that The flow homogenizing device (50) comprises an annular spray air inlet pipe (501), a flow homogenizing layer (502) and a spray air inlet pipe (503); The air inlet (30) located in the inner ring area (70) or the outer ring area (60) is communicated with the annular spray air inlet pipe (501); the annular spray air inlet pipe (501) is located between the air inlet (30) and the carrier (20); at least one uniform flow layer (502) is matched between the annular spray air inlet pipe (501) and the carrier (20); the uniform flow layer (502) is provided with a plurality of through holes (5021) penetrating the uniform flow layer (502); a plurality of first spray ports (5011) are provided on a side of the annular spray air inlet pipe (501) facing the uniform flow layer (502); The air inlet (30) located in the outer ring area (60) or the inner ring area (70) is respectively connected to a spray air inlet pipe (503), and the spray air inlet pipe (503) is vertically arranged in the reaction chamber (10). A plurality of second spray ports (5031) are provided on a side of the spray air inlet pipe (503) facing the carrier (20).
4. The furnace tube according to claim 2, characterized in that: The flow homogenizing device (50) comprises an annular spray air inlet pipe (501), and the annular spray air inlet pipe (501) is located on a side of the carrier (20) facing the air inlet (30); The air inlets (30) located in the outer ring area (60) and / or the inner ring area (70) are both in communication with the annular spray air inlet pipe (501), and a plurality of first spray ports (5011) are provided on a side of the annular spray air inlet pipe (501) facing the carrier (20).
5. The furnace tube according to claim 4, characterized in that The flow-leveling device (50) further comprises a flow-leveling layer (502) that matches and corresponds to the annular spray air inlet pipe (501); At least one uniform flow layer (502) is provided between the annular spray air inlet pipe (501) and the carrier (20), and the uniform flow layer (502) is provided with a plurality of through holes (5021) penetrating the uniform flow layer (502); the uniform flow layer (502) is used to evenly distribute the process gas on the cross section of the reaction chamber (10).
6. The furnace tube according to claim 1 or 2, characterized in that: The flow homogenizing device (50) comprises a spray air inlet pipe (503); the spray air inlet pipe (503) is vertically arranged in the reaction chamber (10); Each of the air inlets (30) is connected to a spray air inlet pipe (503), and a plurality of second spray ports (5031) are provided on a side of the spray air inlet pipe (503) facing the carrier (20).
7. The furnace tube according to claim 1 or 2, characterized in that: The air intake device (40) comprises an air intake pipe (401), a regulating needle valve (402), a pneumatic valve (403), a flow meter (404) and a stop valve (405); Each of the air inlets (30) is connected to an air inlet pipe (401), and each of the air inlet pipes (401) is provided with a regulating needle valve (402), a pneumatic valve (403), a flow meter (404) and a stop valve (405) in sequence along its extension direction.
8. The furnace tube according to claim 1 or 2, characterized in that: The air intake device (40) comprises an air intake pipe (401), a regulating needle valve (402), a pneumatic valve (403), a flow meter (404) and a stop valve (405); Each of the air inlets (30) is connected to an air inlet pipe (401), and each of the air inlet pipes (401) is provided with a regulating needle valve (402); At least two of the air inlet pipes (401) are in communication with the pneumatic valve (403), and the pneumatic valve (403) is also in communication with the flow meter (404) and the stop valve (405) in sequence through the air inlet pipe (401).
9. The furnace tube according to claim 1 or 2, characterized in that: A plurality of exhaust ports (80) communicating with the reaction chamber (10) are provided around the bottom of the furnace tube, and one end of the exhaust port (80) extending out of the bottom of the furnace tube is connected to an exhaust device (90); the exhaust device (90) comprises an exhaust pipe (901), a flow rate detection device (902), a cooling device (903), a regulating valve (904), a filtering device (905), a control valve (906) and a vacuum pump (907); Each of the exhaust ports (80) is connected to an exhaust pipe (901), and each of the exhaust pipes (901) is provided with a flow rate detection device (902), a cooling device (903), a regulating valve (904) and a filtering device (905) in sequence along its extension direction; At least one of the filtering devices (905) is in communication with the control valve (906) via the exhaust pipe (901), and the control valve (906) is also in communication with the vacuum pump (907) via the exhaust pipe (901).
10. The furnace tube according to claim 1 or 2, characterized in that: A plurality of exhaust ports (80) communicating with the reaction chamber (10) are provided in the circumferential direction of the bottom of the furnace tube side wall, and one end of the exhaust port (80) extending out of the bottom of the furnace tube is connected to an exhaust device (90); the exhaust device (90) comprises an exhaust pipe (901), a flow rate detection device (902), a cooling device (903), a regulating valve (904), a filtering device (905), a control valve (906) and a vacuum pump (907); Each of the exhaust ports (80) is connected to an exhaust pipe (901), and each of the exhaust pipes (901) is provided with a flow rate detection device (902), a cooling device (903), a regulating valve (904) and a filtering device (905) in sequence along its extension direction; At least one of the filtering devices (905) is in communication with the control valve (906) via the exhaust pipe (901), and the control valve (906) is also in communication with the vacuum pump (907) via the exhaust pipe (901).
Citation Information
Cited By
Furnace tube
CN118957536A
A furnace tube
CN118957536B