Accurate distribution device for reaction gas in CVD (chemical vapor deposition) process cavity

Abstract

The utility model discloses a CVD (chemical vapor deposition) process cavity reaction gas accurate distribution device, which belongs to the technical field of gas distribution devices, and comprises an upper cover plate, a gas regulating valve is arranged in the middle of the upper end of the upper cover plate, a flow guide pipe is fixedly mounted in the upper side of the upper cover plate, and a gas outlet is formed in the upper side of the flow guide pipe. A mounting plate is fixedly mounted on the lower side of the upper cover plate, a plurality of nozzle bases are fixedly mounted on the lower side of the mounting plate, atomizing nozzles are fixedly mounted in the middles of the nozzle bases, and the upper ends of the atomizing nozzles are connected with flow guide pipes. The electric switch valves on the upper sides of the atomization nozzles at the positions where spraying is not needed are closed through the switch buttons, the areas are isolated through the isolation devices, spraying reaction can be conducted on workpieces on the lower side, production steps are reduced, and the machining efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of gas distribution devices, and more specifically, to a precise distribution device for reaction gases in a CVD process chamber. Background Art

[0002] The CVD process exposes a substrate to one or more volatile gases, which react or decompose on the surface of the substrate to form a desired thin film deposit. The CVD (Chemical Vapor Deposition) process has wide applications in the spraying process on the surface of articles.

[0003] A Chinese patent discloses a device for the reaction gas distribution flow field in a CVD process chamber (the inner cavity upper side inner wall of the lower composite plate (2) at the position of the exhaust groove (18) is fixedly installed with a metal mesh plate (19), and a plurality of threaded mounting grooves (20) are opened at the bottom of the inner cavity of the lower composite plate (2)), including a spray head. An inner ring gas distribution plate and an outer ring gas distribution plate are arranged in the spray head. The outer ring gas distribution plate is located outside the inner ring gas distribution plate. A top cover is arranged above the spray head. The upper part of the inner ring gas distribution plate is connected with an inner ring air inlet pipe wall. An inner ring air inlet is arranged inside the inner ring air inlet pipe wall. Gas enters the inner ring gas distribution plate through the inner ring air inlet. An outer ring air inlet is arranged between the inner ring air inlet pipe wall and the top cover. Gas enters the outer ring gas distribution plate through the outer ring air inlet. The gas flow field distribution in the inner ring gas distribution plate and the outer ring gas distribution plate is adjusted by changing the air intake amount entering the inner ring gas distribution plate and the outer ring gas distribution plate. This application adjusts the gas flow field distribution of the inner and outer rings by changing the air intake amount entering the inner ring gas distribution plate and the outer ring gas distribution plate, so as to flexibly adjust the film formation uniformity on the surface of the silicon wafer. However, this device can only perform integral spraying on the lower side, and now different spraying materials are required for different positions on the surface of many articles. Therefore, when using the above spraying device, different parts of the article need to be separately wrapped, and only the positions to be sprayed are exposed. Therefore, there are many spraying steps and the spraying is relatively inconvenient. Summary of the Invention

[0004] The purpose of the utility model is to provide a precise distribution device for reaction gases in a CVD process chamber to solve the problems put forward in the above background art.

[0005] A precise distribution device for reaction gases in a CVD process chamber, including an upper cover plate. In the middle of the upper end of the upper cover plate, a gas regulating valve is provided. Inside the upper side of the upper cover plate, a diversion pipe is fixedly installed. The lower side of the upper cover plate is fixedly installed with a mounting plate. On the lower side of the mounting plate, a number of nozzle bases are fixedly installed. In the middle of the nozzle base, an atomizing nozzle is fixedly installed. The upper end of the atomizing nozzle is connected to the diversion pipe. In the middle of the upper side of the atomizing nozzle, an electric switch valve is fixedly installed. On the upper side of the upper cover plate, a switch button corresponding to the atomizing nozzle is fixedly installed. On the lower side of the mounting plate, an isolation device is arranged at equal intervals;

[0006] On the lower side of the upper cover plate, a lower combined plate is provided. On both sides of the lower combined plate, exhaust connection plates are fixedly installed. On the inner cavity side wall of the lower combined plate, exhaust grooves are opened.

[0007] Furthermore, in the middle of the upper side of the gas regulating valve, a ventilation pipe is fixedly installed. In the middle of the upper side of the upper cover plate, a diversion connection head is fixedly installed. The diversion connection head is clamped and connected with the gas regulating valve.

[0008] By adopting the above technical solution, the gas regulating valve can adjust the amount of intake gas. By connecting the ventilation pipe with the jetting device, the reaction gas can be transported from the ventilation pipe to the inside of the diversion connection head, so as to spray the workpiece on the lower side.

[0009] Furthermore, the lower side of the nozzle base is an arc-shaped grooved structure. A vacuum rubber ring is fixedly installed between the lower side of the nozzle base and the periphery of the atomizing nozzle.

[0010] By adopting the above technical solution, the vacuum rubber ring can play a certain protective role for the internal atomizing nozzle. The arc-shaped structure opened on the lower side of the nozzle base will not affect the atomizing effect of the atomizing nozzle, and it is convenient for the uniform dispersion of the reaction gas.

[0011] Furthermore, an LED lighting unit is arranged inside the switch button.

[0012] By adopting the above technical solution, when the switch button is powered on, the electric switch valve is closed. At this time, the lighting structure in the switch button will emit light, and the operator can understand the spraying range through the lighting state of the switch button on the upper side.

[0013] Furthermore, the isolation device includes an isolation base fixedly installed on the lower side of the mounting plate. At the lower end of the isolation base, a magnetic part is fixedly installed. Below the magnetic part, a metal plate is arranged. On the lower side of the metal plate, a separation gasket is fixedly installed.

[0014] By adopting the above technical solution, a metal plate is arranged on the upper side of the separation gasket. The metal plate is magnetically connected with the magnetic part. The operator can set the separation gasket according to needs, which is convenient for isolating the reaction space on the lower side.

[0015] Further, the interior of the exhaust groove communicates with the middle part of the exhaust connection plate.

[0016] By adopting the above technical solution, after the lower composite plate and the upper cover plate are combined, and reaction gas is injected into the interior through the atomizing nozzle, an exhaust gas recovery device can be connected to both sides of the exhaust connection plate. Thus, when the air pressure is too high, the excess reaction gas can be discharged from the position of the diversion connector.

[0017] Further, a metal mesh plate is fixedly installed on the inner wall of the upper side of the inner cavity of the lower composite plate at the position of the exhaust groove, and a plurality of threaded mounting grooves are formed at the bottom of the inner cavity of the lower composite plate.

[0018] By adopting the above technical solution, the metal mesh plate can isolate larger foreign objects to prevent foreign objects from entering the interior of the exhaust groove, and the threaded mounting grooves can facilitate the fixed installation of workpieces, thus facilitating spraying.

[0019] Compared with the prior art, the advantages of the present utility model are as follows:

[0020] In the present utility model, by providing the structure of the switch button and the atomizing nozzle, the operator can, as needed, use the switch button to close the electric switch valve on the upper side of the atomizing nozzle at the position where spraying is not required, and isolate the area through the isolation device, and can perform spraying reaction on the workpiece below, reducing the production steps and improving the processing efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 is a schematic diagram of the overall structure of the present utility model;

[0022] Figure 2 is a schematic diagram of the structure of the mounting plate of the present utility model;

[0023] Figure 3 is a sectional view of the structure of the mounting plate of the present utility model;

[0024] Figure 4 is a schematic diagram of the structure of the lower composite plate of the present utility model.

[0025] Explanation of the reference numerals in the drawings: 1. upper cover plate; 2. lower composite plate; 3. exhaust connection plate; 4. switch button; 5. gas regulating valve; 6. ventilation pipe; 7. mounting plate; 8. vacuum rubber ring; 9. atomizing nozzle; 10. nozzle base; 11. separation gasket; 12. diversion pipe; 13. diversion connector; 14. electric switch valve; 15. isolation base; 16. magnetic part; 17. metal plate; 18. exhaust groove; 19. metal mesh plate; 20. threaded mounting groove. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0026] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0027] As Figure 1 - Figure 4 shown, the embodiments of the present invention provide: including an upper cover plate 1, a gas regulating valve 5 is arranged in the middle of the upper end of the upper cover plate 1, a diversion pipe 12 is fixedly installed inside the upper side of the upper cover plate 1, a mounting plate 7 is fixedly installed on the lower side of the upper cover plate 1, several nozzle bases 10 are fixedly installed on the lower side of the mounting plate 7, an atomizing nozzle 9 is fixedly installed in the middle of the nozzle base 10, the upper end of the atomizing nozzle 9 is connected to the diversion pipe 12, an electric switch valve 14 is fixedly installed in the middle of the upper side of the atomizing nozzle 9, a switch button 4 corresponding to the atomizing nozzle 9 is fixedly installed on the upper side of the upper cover plate 1, and an isolation device is arranged at equal intervals on the lower side of the mounting plate 7;

[0028] A lower cover plate 2 is arranged on the lower side of the upper cover plate 1, exhaust connection plates 3 are fixedly installed on both sides of the lower cover plate 2, and exhaust grooves 18 are formed on the inner cavity side wall of the lower cover plate 2;

[0029] A ventilation pipe 6 is fixedly installed in the middle of the upper side of the gas regulating valve 5, a diversion connection head 13 is fixedly installed in the middle of the upper side of the upper cover plate 1, the diversion connection head 13 is clamped and connected to the gas regulating valve 5, the gas regulating valve 5 can adjust the size of the intake air volume, and by connecting the ventilation pipe 6 to the jetting device, the reaction gas can be transported from the ventilation pipe 6 to the inside of the diversion connection head 13, so as to spray the workpiece on the lower side;

[0030] The lower side of the nozzle base 10 is an arc-shaped grooved structure, a vacuum rubber ring 8 is fixedly installed between the lower side of the nozzle base 10 and the periphery of the atomizing nozzle 9, the vacuum rubber ring 8 can play a certain protective role for the internal atomizing nozzle 9, and the arc-shaped structure formed on the lower side of the nozzle base 10 will not affect the atomizing effect of the atomizing nozzle 9, which is convenient for the uniform dissipation of the reaction gas;

[0031] An LED light-emitting unit is arranged inside the switch button 4. When the switch button 4 is powered on, the electric switch valve 14 is closed, and at this time, the light-emitting structure in the switch button 4 will emit light, and the operator can understand the spraying range through the light-emitting state of the switch button 4 on the upper side;

[0032] The isolation device includes an isolation base 15 fixedly installed on the lower side of the mounting plate 7. A magnetic part 16 is fixedly installed at the lower end of the isolation base 15. A metal plate 17 is arranged on the lower side of the magnetic part 16. A separation gasket 11 is fixedly installed on the lower side of the metal plate 17. The metal plate 17 is arranged on the upper side of the separation gasket 11. The metal plate 17 is magnetically connected to the magnetic part 16. The operator can set the separation gasket 11 as needed to facilitate the isolation of the reaction space below.

[0033] The inside of the exhaust groove 18 is communicated with the middle part of the exhaust connection plate 3. After the lower combination plate 2 and the upper cover plate 1 are combined, after injecting reaction gas into the inside through the atomizing nozzle 9, an exhaust gas recovery device can be connected to both sides of the exhaust connection plate 3. Thus, when the air pressure is too high, the excess reaction gas can be discharged from the position of the diversion connection head 13.

[0034] A metal mesh plate 19 is fixedly installed on the inner wall of the upper side of the inner cavity of the lower combination plate 2 at the position of the exhaust groove 18. A number of threaded installation grooves 20 are opened at the bottom of the inner cavity of the lower combination plate 2. The metal mesh plate 19 can isolate larger foreign objects to prevent foreign objects from entering the inside of the exhaust groove 18. The threaded installation grooves 20 can facilitate the fixed installation of workpieces, thus facilitating spraying.

[0035] The working principle of the present utility model: The operator fixes the workpiece that needs atomization reaction on the threaded installation groove 20 with bolts, connects the exhaust connection plate 3 to the exhaust gas collection device, and then connects the ventilation pipe 6 to the output device of the reaction gas. A magnetic part 16 is fixedly installed at the lower end of the isolation base 15. A metal plate 17 is arranged on the lower side of the magnetic part 16. A separation gasket 11 is fixedly installed on the lower side of the metal plate 17. The metal plate 17 is arranged on the upper side of the separation gasket 11. The metal plate 17 is magnetically connected to the magnetic part 16. The operator can set the separation gasket 11 as needed to divide the reaction space below. The operator can press the switch button 4 on the upper side of the isolated reaction space that is not needed as needed. When the switch button 4 is pressed, the switch button 4 controls the electric switch valve 14 to close, and the corresponding atomizing nozzle 9 is disconnected from the diversion pipe 12. At this time, reaction gas is injected into the lower diversion pipe 12 through the diversion connection head 13. The gas will only react or decompose on the surface of the lower workpiece through the connected atomizing nozzle 9, thereby forming the required thin film deposit. This device can isolate the area through the isolation device, can perform spraying reaction on the lower workpiece, reduce the production steps, and improve the processing efficiency.

[0036] The foregoing has shown and described the basic principles, main features and advantages of the present utility model. Those skilled in the art should understand that the present utility model is not limited by the above-mentioned embodiments. The above-mentioned embodiments and the descriptions in the specification are only preferred examples of the present utility model and are not used to limit the present utility model. Without departing from the spirit and scope of the present utility model, the present utility model will have various changes and improvements, and all these changes and improvements fall within the scope of the present utility model claimed.

Claims

1. A CVD process chamber reaction gas precision distribution device, comprising an upper cover plate (1), characterized in that: A gas regulating valve (5) is provided at the middle of the upper end of the upper cover plate (1); a flow guide tube (12) is fixedly installed inside the upper side of the upper cover plate (1); a mounting plate (7) is fixedly installed at the lower side of the upper cover plate (1); a plurality of nozzle bases (10) are fixedly installed at the lower side of the mounting plate (7); an atomizing nozzle (9) is fixedly installed at the middle of the nozzle base (10); the upper end of the atomizing nozzle (9) is connected to the flow guide tube (12); an electric switch valve (14) is fixedly installed at the middle of the upper side of the atomizing nozzle (9); a switch button (4) corresponding to the atomizing nozzle (9) is fixedly installed at the upper side of the upper cover plate (1); and an isolation device is equidistantly provided at the lower side of the mounting plate (7); A lower closing plate (2) is provided on the lower side of the upper cover plate (1), exhaust connection plates (3) are fixedly mounted on both sides of the lower closing plate (2), and an exhaust groove (18) is provided on the inner cavity side wall of the lower closing plate (2).

2. The device for accurately distributing reactive gases in a CVD process chamber according to claim 1, characterized in that: A vent pipe (6) is fixedly mounted on the middle part of the upper side of the gas regulating valve (5), and a flow guide connector (13) is fixedly mounted on the middle part of the upper side of the upper cover plate (1), and the flow guide connector (13) is snap-fittedly connected to the gas regulating valve (5).

3. The device for accurately distributing reactive gases in a CVD process chamber according to claim 1, characterized in that: The lower side of the nozzle base (10) is an arc-shaped slotted structure, and a vacuum rubber ring (8) is fixedly installed on the lower side of the nozzle base (10) and the periphery of the atomizing nozzle (9).

4. The device for accurately distributing reactive gases in a CVD process chamber according to claim 1, characterized in that: An LED light emitting unit is arranged inside the switch button (4).

5. The device for accurately distributing reactive gases in a CVD process chamber according to claim 1, characterized in that: The isolation device comprises an isolation base (15) fixedly mounted on the lower side of the mounting plate (7), a magnetic attraction component (16) fixedly mounted on the lower end of the isolation base (15), a metal plate (17) provided on the lower side of the magnetic attraction component (16), and a separation gasket (11) fixedly mounted on the lower side of the metal plate (17).

6. The device for accurately distributing reactive gases in a CVD process chamber according to claim 1, characterized in that: The interior of the exhaust groove (18) is communicated with the middle of the exhaust connection plate (3).

7. The device for accurately distributing reactive gases in a CVD process chamber according to claim 1, characterized in that: A metal mesh plate (19) is fixedly mounted on the upper inner wall of the inner cavity of the lower closing plate (2) at the position of the exhaust groove (18), and a plurality of threaded mounting grooves (20) are provided at the bottom of the inner cavity of the lower closing plate (2).

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