Cleaning device and grinding equipment

Abstract

The utility model relates to the technical field of semiconductors, and provides a cleaning device and grinding equipment, and the cleaning device comprises a cleaning part and an adjusting part; a liquid spraying opening is formed in the cleaning piece; the cleaning part is provided with a liquid inlet communicated with the liquid spraying opening, the liquid inlet is connected with the adjusting part, and the adjusting part is connected with a brake air pipe of the grinding frame and used for controlling on-off of the liquid inlet. According to the cleaning device, the rotating mechanism of the grinding frame is utilized, when the grinding frame rotates, the liquid inlet is opened, and the liquid spraying cleaning mechanism of the cleaning piece is triggered, so that the grinding rate in the grinding process is not affected, the cleaning effect can be achieved, the number of times of machine cleaning by personnel and the cleaning time are reduced, and the cleaning efficiency is improved. And the station switching of the grinding frame is linked with cleaning, so that the cleaning control mode is simplified.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, and particularly relates to a cleaning device and a grinding device. Background Art

[0002] Chemical Mechanical Polishing (CMP) is a technology for global surface planarization. It uses chemical oxidation and mechanical grinding to remove the surface material of a device so that the device surface reaches a high flatness.

[0003] Chemical mechanical polishing is widely used in the process of selectively removing materials in semiconductor manufacturing. Existing chemical mechanical polishing devices generally include: a polishing table, a polishing pad, and a polishing head. The polishing pad is arranged on the polishing table, and the polishing head is arranged on a polishing frame. The polishing head is used to adsorb the device to be polished and move relative to the polishing pad to achieve surface planarization of the device to be polished.

[0004] During the polishing process, chemical reaction products and mechanical polishing products will be generated, and the above products are pollutants. Therefore, after polishing, it is necessary to clean the polishing pad and the polishing head. During the cleaning process, a large amount of high-pressure pure water (Highpressure rinse) will be sprayed on the polishing pad and the polishing head. Although this cleaning method can ensure the cleanliness of the polishing pad and the polishing head, during the cleaning process, the polishing head will rotate at a high speed to throw out pollutants and polishing liquid to maintain the initial cleanliness. Therefore, when high-pressure pure water is sprayed on the polishing head, the mixture of high-pressure water, polishing liquid, and pollutants will be centrifugally thrown to the inner wall of the polishing chamber. Over time, it is easy to cause crystallization of the polishing liquid component on the inner wall of the polishing chamber. If this crystallization falls on the polishing pad during the polishing process, it is easy to cause scratches on the wafer and affect the polishing quality.

[0005] In addition, the maturity of existing grinding equipment is relatively high. If a cleaning device is simply added to the existing grinding equipment, additional control components need to be added based on the cleaning requirements to control the action time and cleaning duration of the cleaning device. On the one hand, this results in a complex structure of the cleaning device and a high transformation cost. On the other hand, it also makes the components of the cleaning device more numerous and increases the transformation difficulty.

[0006] Therefore, based on the above technical problems, a cleaning device is needed. This cleaning device is used to clean the inner wall of the polishing chamber to improve the crystallization phenomenon on the inner wall of the polishing chamber. At the same time, the cleaning device is linked with the components of the existing grinding equipment to achieve the action control of the cleaning device. Summary of the Utility Model

[0007] The purpose of the present utility model is to provide a cleaning device and a grinding equipment. The cleaning device is used to clean the inner wall of the grinding cavity to improve the crystallization phenomenon on the inner wall of the grinding cavity. Moreover, the cleaning device is connected to the braking air pipe of the grinding frame of the existing grinding equipment, and the action of the cleaning device is controlled by the high-pressure gas in the braking air pipe, which helps to simplify the control of the entire cleaning device and reduce the difficulty of modifying the existing grinding equipment.

[0008] The present utility model provides a cleaning device, including: a cleaning member and an adjusting member;

[0009] The cleaning member is provided with a liquid spraying port for cleaning the inner wall of the grinding cavity;

[0010] The cleaning member is provided with a liquid inlet communicating with the liquid spraying port. The liquid inlet is connected to the adjusting member, and the adjusting member is connected to the braking air pipe of the grinding frame for controlling the on-off of the liquid inlet.

[0011] Optionally, the adjusting member is a pneumatic valve.

[0012] Optionally, the liquid inlet is connected to the inter-stage cleaning pipe of the grinding equipment through the adjusting member.

[0013] Optionally, the cleaning member includes a pipeline, and one end of the pipeline serves as the liquid inlet.

[0014] Optionally, the cleaning member further includes a spray head. The spray head is connected to the pipeline and communicates with the inner cavity of the pipeline, and the outlet of the spray head serves as the liquid spraying port.

[0015] Optionally, a plurality of spray heads are arranged on the pipeline, and each spray head is arranged along the axial direction of the pipeline.

[0016] A grinding equipment has a grinding cavity, and the above-mentioned cleaning device is arranged in the grinding cavity, and the liquid spraying port faces the inner wall of the grinding cavity.

[0017] Optionally, the cleaning member is arranged at a position above the middle in the grinding cavity.

[0018] Optionally, when the cleaning member includes a pipeline, the inner wall of the grinding cavity is parallel to the pipeline arranged thereon.

[0019] Optionally, when the cleaning member includes a pipeline, the pipeline is arranged horizontally.

[0020] In summary, the present utility model provides a cleaning device, including: a cleaning member and an adjusting member; the cleaning member is provided with a liquid spraying port; the cleaning member is provided with a liquid inlet communicated with the liquid spraying port, the liquid inlet is connected to the adjusting member, and the adjusting member is connected to the braking air pipe of the grinding frame for controlling the on-off of the liquid inlet.

[0021] With such a configuration, when the grinding frame needs to be driven to rotate, the pneumatic mechanism ventilates through the braking air pipe to drive the brake to act and release the braking of the rotating shaft. At this time, since the braking air pipe is connected to the adjusting member, a part of the compressed air in the braking air pipe is shunted to the adjusting member, and the adjusting member acts to control the liquid inlet of the cleaning member to be opened synchronously. The liquid enters the cleaning member and is sprayed out through the liquid spraying port to clean the inner wall of the grinding cavity, thereby improving the crystallization phenomenon on the inner wall of the grinding cavity. The above cleaning device utilizes the rotation mechanism of the grinding frame. When the grinding frame rotates and switches work positions, the liquid inlet of the cleaning member is opened, triggering the liquid spraying and cleaning mechanism of the cleaning member. In this way, it will neither affect the grinding rate during the grinding process, nor can achieve the cleaning effect, while reducing the number of times of machine cleaning and the cleaning time for personnel, which helps to improve the cleaning efficiency. The rotation and switching of the grinding frame work positions are linked with the cleaning, which is also beneficial to simplifying the cleaning control method and reducing the transformation difficulty and transformation cost of the existing grinding equipment. Description of the Drawings

[0022] Figure 1 is a schematic structural diagram of a cleaning device according to an embodiment of the present utility model;

[0023] Figure 2 is the use state of the inter-stage cleaning area according to an embodiment of the present utility model Figure 1 ;

[0024] Figure 3 is the use state of the inter-stage cleaning area according to an embodiment of the present utility model Figure 2 ;

[0025] Figure 4 is a schematic structural diagram of the braking structure of the grinding frame according to an embodiment of the present utility model;

[0026] Figure 5 is a schematic structural diagram of a cleaning device according to an embodiment of the present utility model;

[0027] Figure 6 is a relative position diagram of a pipeline and the inner wall of the grinding cavity according to an embodiment of the present utility model.

[0028] Among them, in the drawings:

[0029] 10 - cleaning member; 101 - liquid spraying port; 102 - liquid inlet; 11 - pipeline; 12 - nozzle;

[0030] 20 - adjusting member;

[0031] 30 - Grinding chamber; 31 - Inner wall;

[0032] 40 - Grinding table;

[0033] 50 - Grinding pad;

[0034] 60 - Grinding head;

[0035] 70 - Grinding frame; 71 - Rotating shaft; 72 - Brake; 73 - Brake air pipe;

[0036] 80 - Housing;

[0037] 90 - Grinding pad adjuster;

[0038] 100 - Grinding fluid supply unit;

[0039] 110 - Inter - table cleaning pipe;

[0040] 120 - Workpiece to be ground. Detailed implementation mode

[0041] The cleaning device proposed by the present utility model will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. According to the following description, the advantages and features of the present utility model will be clearer. It should be noted that the accompanying drawings are all in a very simplified form and use non - precise scales, only for the purpose of conveniently and clearly assisting in explaining the embodiments of the present utility model.

[0042] As used in the present utility model, the singular forms "a", "an" and "the" include plural referents, the term "or" is generally used in the sense of including "and / or", the term "several" is generally used in the sense of including "at least one", the term "at least two" or "multiple" is generally used in the sense of including "two or more", in addition, the terms "first", "second", "third" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first", "second", "third" may explicitly or implicitly include one or at least two of such features. In addition, as used in the present utility model, "mounted", "connected", "coupled", an element "disposed" on another element should be understood in a broad sense, and generally only means that there is a connection, coupling, cooperation or transmission relationship between the two elements, and the two elements can be directly or indirectly connected, coupled, cooperated or transmitted through an intermediate element, and cannot be construed as indicating or implying the spatial position relationship between the two elements, that is, an element can be in any position such as inside, outside, above, below or on one side of another element, unless otherwise explicitly stated in the context. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances. In addition, directional terms such as above, below, up, down, upward, downward, left, right, etc. are used relative to the exemplary embodiments as shown in the figures, with the upward or upper direction facing the top of the corresponding figure and the downward or lower direction facing the bottom of the corresponding figure.

[0043] This embodiment provides a grinding device, which is equipped with a cleaning device, and the cleaning device includes: a cleaning member 10 and an adjusting member 20.

[0044] Meanwhile, the grinding device further includes a grinding chamber 30, a grinding table 40, a grinding pad 50, a grinding head 60 and a grinding frame 70. The grinding pad 50 is disposed on the grinding table 40, and the grinding head 60 is disposed on the grinding frame 70.

[0045] As Figure 1 shown, the grinding device has a housing 80, and the interior of the housing 80 serves as the grinding chamber 30, wherein the grinding table 40, the grinding pad 50, the grinding head 60 and the grinding frame 70 are all disposed in the grinding chamber 30.

[0046] In addition, the grinding device further includes a grinding pad adjuster 90, a grinding fluid supply unit 100 and an interplaten clean area.

[0047] Please continue to refer to Figure 1 shown, in this embodiment, the housing 80 has a cuboid structure, and a cuboid-shaped grinding chamber 30 is formed inside it.

[0048] The lapping frame 70 is in the shape of a cross, and a lapping head 60 is installed at each of the four end portions of the lapping frame 70. The lapping head 60 generally includes a carrier head and a driving member. The carrier head is used to hold the device to be lapped (such as a wafer), and the driving member is used to drive the carrier head to rotate self - rotatably, thereby driving the device to be lapped to rotate self - rotatably.

[0049] The middle part of the lapping frame 70 is rotatably installed in the lapping chamber 30, and the rotation axis of the lapping frame 70 extends vertically. The rotation axis of the lapping frame 70 passes through the cross - intersection point of the lapping frame 70. When the lapping frame 70 is driven to rotate, the corresponding four lapping heads 60 will rotate adaptively to switch workstations.

[0050] The lapping pad 50 is arranged on the upper surface of the lapping table 40, and the lapping table 40 is used for fixing the lapping pad 50. In addition, the lapping table 40 is rotatably installed in the lapping chamber 30 through a rotating shaft. Therefore, the lapping pad 50 can rotate self - rotatably along with the lapping table 40. The surface of the lapping pad 50 has countless foamed micropores for carrying a mixed lapping liquid containing an abrasive and a chemical substance. The lapping liquid supply part 100 is arranged above the lapping table 40, and the lapping liquid supply part 100 is used to supply the lapping liquid onto the lapping pad 50.

[0051] The lapping pad regulator 90 is rotatably arranged in the lapping chamber 30. The lapping pad regulator 90 can rotate to directly above the lapping pad 50 or rotate outside the lapping pad 50. The lapping pad regulator 90 is used to finely cut the surface of the lapping pad 50 to adjust the roughness of the lapping pad 50 and ensure a good lapping effect. When the lapping pad regulator 90 rotates to directly above the lapping pad 50, a predetermined pressing force can be applied to the surface of the lapping pad 50 for fine cutting.

[0052] Please continue to refer to Figure 1 As shown, the lapping pad 50 and the lapping table 40 constitute a lapping assembly

[0053] In this embodiment, three lapping assemblies are provided. The three lapping assemblies are circumferentially arranged around the rotation axis of the lapping frame 70, and the three lapping assemblies respectively correspond to three lapping heads 60. The lapping head 60 is located above the lapping pad 50.

[0054] The lapping head 60 is arranged on the lapping frame 70 in a liftable manner or the lapping frame 70 is arranged in the lapping chamber 30 in a liftable manner. During the lapping process of the above - mentioned lapping equipment, the lapping head 60 first holds the device to be lapped and rotates to directly above the lapping pad 50 of a lapping assembly. The lapping head 60 rotates self - rotatably and descends, so that the device to be lapped contacts the lapping pad 50, and the device to be lapped rotates self - rotatably along with the lapping head 60. At the same time, the lapping table 40 drives the lapping pad 50 to rotate self - rotatably, and the rotation direction of the lapping head 60 is opposite to the rotation direction of the lapping table 40. Lapping is achieved through the relative movement between the device to be lapped and the lapping pad 50.

[0055] For some devices to be ground, the grinding accuracy requirements are relatively high. During the grinding process, rough grinding, semi-finishing grinding, and finishing grinding are involved. Therefore, in this embodiment, four grinding heads 60 cooperate with three grinding assemblies (one grinding pad 50 and one grinding table 40 constitute one grinding assembly) to achieve the above-mentioned various grinding processes. As Figure 1 shown, one of the grinding heads 60 is located outside the three grinding assemblies. This grinding head 60 is used for discharging materials after grinding and loading materials before grinding. The other three grinding heads 60 respectively correspond to the three grinding assemblies. Taking the counterclockwise circumferential direction as an example, the three grinding assemblies respectively correspond to rough grinding, semi-finishing grinding, and finishing grinding. After each grinding process is completed, the grinding frame 70 is driven to rotate counterclockwise by 90°, so that each grinding head 60 rotates to the next working station. This structure can realize the synchronous progress of loading, unloading, rough grinding, semi-finishing grinding, and finishing grinding, which is beneficial to improving the grinding efficiency.

[0056] The grinding equipment in this embodiment adopts the structure of a cross-shaped grinding frame 70 cooperating with four grinding heads 60 and three grinding assemblies. In other alternative embodiments, the grinding frame 70 can also adopt a multi-degree-of-freedom robotic arm structure, and the numbers of the grinding heads 60 and the grinding assemblies can be adjusted adaptively based on the grinding requirements.

[0057] Components such as the grinding table 40, the grinding pad 50, the grinding head 60, the grinding frame 70, the grinding pad adjuster 90, and the grinding fluid supply unit 100 in the grinding equipment are all applied in existing grinding equipment, and will not be elaborated here.

[0058] Please continue to refer to Figures 1 to 3 shown. In this embodiment, three inter-station cleaning areas are provided. The inter-station cleaning areas are arranged between adjacent grinding tables 40. The inter-station cleaning area includes an inter-station cleaning pipe 110. The inter-station cleaning pipe 110 has upward spray holes, and its function is to clean the devices to be ground and the grinding pad adjuster 90. As Figure 2 shown, when a grinding head 60 completes the current grinding process and switches the working station as the grinding frame 70 rotates, it will pass above the inter-station cleaning pipe 110, and the device to be ground 120 is cleaned by the liquid sprayed upward. In addition, as Figure 3 shown, when the adjustment work of the grinding pad adjuster 90 is completed, particulate matter will adhere to it. At this time, the grinding pad adjuster 90 can rotate above the inter-station cleaning pipe 110 to be cleaned. The inter-station cleaning area is equipped in existing grinding equipment, and its structure belongs to the prior art, and will not be elaborated here.

[0059] Please refer to Figure 4As shown, a rotating shaft 71 is provided at the lower part of the grinding frame 70, and the rotating shaft 71 is connected to an external driving device to drive the rotation. The rotating shaft 71 is also equipped with a brake 72, and the brake 72 is driven to move by a pneumatic mechanism (such as a cylinder). When the grinding frame 70 needs to be driven to rotate, the brake air pipe 73 ventilates the pneumatic mechanism, and the pneumatic mechanism is actuated to drive the brake 72 to release the brake on the rotating shaft 71. The brake 71 is, for example, a shoe brake, a disc brake, etc. The brake and the pneumatic mechanism of the brake are both used in existing grinding equipment, which belongs to the prior art and will not be repeated here.

[0060] Combine the following Figure 1 , Figure 5 and Figure 6 The structure of the cleaning device is introduced.

[0061] Please refer to Figure 5 and Figure 6 As shown, the cleaning element 10 includes a pipeline 11 , and the pipeline 11 is arranged on the inner wall of the grinding chamber 30 .

[0062] The pipeline 11 has a liquid spraying port 101, and the liquid spraying port 101 faces the inner wall of the grinding chamber 30. The pipeline 11 is externally connected to a liquid supply device, and liquid is sprayed to the inner wall of the grinding chamber 30 through the liquid spraying port 101 to clean the attachments on the inner wall.

[0063] In this embodiment, the cleaning element 10 further includes a nozzle 12 , which is connected to the pipeline 11 and communicates with the inner cavity of the pipeline 11 , and an outlet of the nozzle 12 serves as the liquid spraying port 101 .

[0064] Combination Figure 5 and Figure 6 As shown, the pipeline 11 is disposed on an inner wall 31 of the grinding chamber 30, and the pipeline 11 is at a certain distance from the inner wall 31. The pipeline 11 can be connected to the inner wall of the grinding chamber 30 through a clamp or other connector. The nozzle 12 is roughly connected to the side of the pipeline 11 close to the inner wall of the grinding chamber 30 and at a lower position, and the nozzle 12 is obliquely downward to the inner wall 31.

[0065] Combination Figure 5 and Figure 6 As shown, a plurality of nozzles 12 are provided, and each of the nozzles 12 is arranged at equal intervals along the axial direction of the pipeline 11. For example, the spacing between each nozzle 12 is 200 mm. Of course, in other alternative embodiments, the arrangement of the nozzles 12 can be adjusted based on the cleaning requirements of the inner wall of the grinding chamber 30. For example, at a position where the inner wall of the grinding chamber is difficult to clean, the nozzles 12 can be appropriately densely arranged (i.e., the spacing between adjacent nozzles is small), and at a position where the inner wall of the grinding chamber is relatively easy to clean, the nozzles 12 can be appropriately sparsely arranged (i.e., the spacing between adjacent nozzles is large).

[0066] In this embodiment, the number of the nozzles 12 is not particularly limited and can be adaptively adjusted based on the cleaning requirements.

[0067] The nozzle 12 is preferably a wide-angle nozzle, such as a C-series fan-shaped nozzle. In addition, the nozzle 12 can be a direct spray nozzle, a rotary nozzle, or a pressurized nozzle. The nozzle 12 can be selected based on the cleaning requirements, and its structure is prior art and will not be elaborated here.

[0068] In this embodiment, the outlet of the nozzle 12 serves as the liquid spraying port 101, which can be flexibly selected based on requirements such as the spraying range and spraying pressure. In other alternative embodiments, a through hole can also be directly formed in the pipeline 11 to form the liquid spraying port 101.

[0069] Please continue to refer to Figure 5 As shown, one end of the pipeline 11 serves as the liquid inlet 102, and the liquid inlet 102 is communicated with the liquid spraying port 101 through the inner cavity of the pipeline 11. The liquid inlet 102 is connected to the inter-stage cleaning pipe 110 of the grinding equipment through the adjusting member 20, and the adjusting member 20 is connected to the braking air pipe 73 of the grinding frame 70 for controlling the on / off of the liquid inlet 102.

[0070] In this embodiment, the adjusting member 20 is a pneumatic valve. A pneumatic valve is a valve that uses compressed air to push the actuator to move to control the opening and closing of the valve core. It uses compressed air to push the pneumatic piston in the actuator to move, and then drives the valve core to move. In this embodiment, the pneumatic valve is a two-way valve, its liquid inlet is connected to the inter-stage cleaning pipe 110, its liquid outlet is connected to the liquid inlet 102 of the pipeline 11, and the air inlet of the pneumatic valve is connected to the braking air pipe 73.

[0071] Combined with Figure 1 and Figure 4As shown, when the grinding frame 70 needs to be driven to rotate, the pneumatic mechanism ventilates through the brake air pipe 73 to drive the brake 72 to act and release the braking of the rotating shaft 71. At this time, since the brake air pipe 73 is connected to the pneumatic valve, a part of the compressed gas in the brake air pipe 73 is diverted to the pneumatic valve, so that the valve core of the pneumatic valve is driven to open synchronously. The pipeline 11 is communicated with the inter-stage cleaning pipe 110, and the liquid in the inter-stage cleaning pipe 110 flows into the pipeline 11 and is sprayed out through the liquid spraying port 101 to clean the inner wall of the grinding cavity 30, so as to improve the crystallization phenomenon on the inner wall of the grinding cavity 30. The above cleaning device utilizes the rotation mechanism of the grinding frame 70. When the grinding frame 70 rotates and switches work positions, the pipeline 11 is communicated with the inter-stage cleaning pipe 110, triggering the liquid spraying and cleaning mechanism of the pipeline 11. In this way, it will neither affect the grinding rate during the grinding process nor achieve the cleaning effect, reduce the number of times of machine cleaning by personnel and the cleaning time, and contribute to improving the cleaning efficiency. The rotation and switching of the grinding frame 70 and the cleaning form a linkage, which is also conducive to simplifying the cleaning control method. Moreover, the cleaning device utilizes the liquid in the existing inter-stage cleaning pipe 110 in the grinding equipment, which helps to utilize the existing grinding equipment, reduce the impact of the setting of the cleaning device on the overall structure of the existing grinding equipment, and reduce the modification difficulty and modification cost of the existing grinding equipment.

[0072] In addition, the above cleaning device realizes liquid spraying and cleaning when the grinding frame 70 rotates and switches work positions. The liquid spraying and cleaning time can be controlled by controlling the time for the grinding frame 70 to rotate and switch work positions. For example, the time for the grinding frame 70 to rotate and switch work positions is set to be greater than 5 s, so that the liquid spraying time of the nozzle 12 is greater than 5 s, and the sprayed liquid can cover the inner wall of the grinding cavity 30.

[0073] In this embodiment, the cleaning part 10 adopts a tubular structure. In other alternative embodiments, the cleaning part 10 can also be set as a non-tubular structure, such as a box structure, etc.

[0074] In this embodiment, the pipeline 11 is arranged at a position in the middle and upper part of the grinding cavity 30, for example, at a position 100 mm away from the top of the grinding cavity 30, so that the sprayed liquid can clean a higher position on the inner wall of the grinding cavity 30, which helps to improve the cleaning effect.

[0075] In this embodiment, the grinding cavity 30 has a cuboid structure, and the pipeline 11 can be arranged on one or more of the four side walls based on the cleaning requirements. For example, the pipeline 11 is arranged on the inner side of the door panel of the housing 80 to achieve the purpose of cleaning the door panel.

[0076] The inner wall of the grinding cavity 30 is parallel to the pipeline 11 arranged thereon. The pipeline 11 is arranged horizontally. In this way, each nozzle 12 of the pipeline 11 can cover a larger range, and the liquid can be evenly sprayed on the inner wall of the grinding cavity 30, and at the same time, it is also convenient for the layout of the pipeline 11.

[0077] In other alternative embodiments, the pipeline 11 can also be arranged obliquely or vertically. For example, the pipeline 11 is arranged in a vertical structure, and a plurality of liquid spraying ports can be formed in its circumferential direction to spray liquid in different directions for cleaning purposes.

[0078] In this specification, the various embodiments are described in a progressive manner. Each embodiment focuses on the differences from other embodiments. For the same or similar parts among the various embodiments, reference can be made to each other.

[0079] The above description is only a description of the preferred embodiments of the present invention, and does not limit the scope of the present invention in any way. Any changes and modifications made by those of ordinary skill in the art of the present invention based on the above disclosure are within the scope of protection of the claims.

Claims

1. A cleaning device, characterized in that: include: Cleaning and adjustment parts; The cleaning element is provided with a liquid spraying port for cleaning the inner wall of the grinding chamber; The cleaning part is provided with a liquid inlet communicated with the liquid spray port, the liquid inlet is connected to the adjusting part, and the adjusting part is connected to the brake air pipe of the grinding frame for controlling the opening and closing of the liquid inlet.

2. The cleaning device according to claim 1, characterized in that: The regulating member is a pneumatic valve.

3. The cleaning device according to claim 1, characterized in that: The liquid inlet is connected to the inter-station cleaning pipe of the grinding equipment through the adjusting member.

4. The cleaning device according to claim 1, characterized in that: The cleaning component comprises a pipeline, one end of which serves as the liquid inlet.

5. The cleaning device according to claim 4, characterized in that: The cleaning component further comprises a nozzle, which is connected to the pipeline and communicates with the inner cavity of the pipeline, and the outlet of the nozzle serves as the liquid spraying port.

6. The cleaning device according to claim 5, characterized in that: A plurality of nozzles are arranged on the pipeline, and each of the nozzles is arranged along the axial direction of the pipeline.

7. A grinding device, characterized in that: The grinding equipment has a grinding chamber, in which a cleaning device as claimed in any one of claims 1 to 6 is arranged, and the liquid spray port faces the inner wall of the grinding chamber.

8. The grinding device according to claim 7, characterized in that The cleaning component is arranged at an upper position in the middle of the grinding chamber.

9. The grinding device according to claim 7, characterized in that When the cleaning member includes a pipeline, the inner wall of the grinding chamber is parallel to the pipeline arranged thereon.

10. The grinding device according to claim 7, characterized in that When the cleaning component includes a pipeline, the pipeline is arranged horizontally.

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