Clamp of brush roller for cleaning semiconductor wafer

Abstract

The utility model discloses a clamp for cleaning a brush roll of a semiconductor wafer, which comprises an annular clamp body formed by a plurality of main frames and a connecting frame, a plurality of guide grooves are annularly arranged on the inner side of the annular clamp body at equal intervals, and each guide groove comprises two frame plates which are arranged at an included angle. The frame plates are respectively a first frame plate and a second frame plate, the frame plates of the adjacent guide grooves are connected through a connecting plate, the guide grooves and the connecting plate are integrally formed, and the cross sections of the guide grooves and the connecting plate are polygonal. The clamp of the brush roller for cleaning the semiconductor wafer is integrally formed, the mold opening cost is low, the clamp and the PVA sponge can be integrally formed, the PVA sponge is supported, deformation of the PVA sponge is prevented, meanwhile, the inner rod can be conveniently inserted into and separated from the clamp, the stability between the clamp and the inner rod is improved, and idling during rotation is prevented.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor wafer cleaning, and particularly relates to a fixture for a brush roll used for cleaning a semiconductor wafer. Background Art

[0002] After the CMP process, a post CMP cleaning step is required to remove particulate or organic residue on the wafer surface. Usually, a PVA (Polyvinyl Alcohol) brush roll is used for cleaning.

[0003] In the prior art, the brush roll for cleaning a semiconductor wafer only has a sponge and a core. The sponge is prone to idle rotation and distortion, resulting in poor cleaning effect and the sponge breaking. Summary of the Utility Model

[0004] In view of this, the purpose of the utility model is to provide a fixture for a brush roll used for cleaning a semiconductor wafer to solve one or more of the above-mentioned prior art problems.

[0005] To achieve the above purpose, the utility model provides a fixture for a brush roll used for cleaning a semiconductor wafer, which includes an annular fixture body composed of multiple main frames and connecting frames. A plurality of guide grooves are equidistantly arranged circumferentially on the inner side of the annular fixture body. The guide groove includes two frame plates arranged at an angle, namely a first frame plate and a second frame plate. The frame plates of adjacent guide grooves are connected by a connecting plate. The guide groove and the connecting plate are integrally formed and have a polygonal cross-section.

[0006] In some embodiments, the plate body of the frame plate constituting the guide groove is a plane or a curved surface, and a number of convex points can be arranged on the plate body.

[0007] In some embodiments, the guide groove corresponds to the main frame one by one and is connected by a connecting piece.

[0008] In some embodiments, the connecting frame is a net structure composed of a transverse connecting piece and a longitudinal connecting piece connecting the main frames.

[0009] In some embodiments, the connecting frame further includes a number of reinforcing ribs. The reinforcing ribs are connected to at least two of the main frame, the transverse connecting piece, and the longitudinal connecting piece, and the reinforcing ribs can be arranged horizontally, longitudinally, or obliquely.

[0010] In some embodiments, the longitudinal connecting piece is connected to the connecting plate.

[0011] In some embodiments, the connecting frame, the main frame, and the guide groove have the same length.

[0012] In some embodiments, the angle between the first frame plate and the second frame plate of the same guiding groove is an obtuse angle.

[0013] In some embodiments, the number of the main frames is at least 8 and is an even number.

[0014] In some embodiments, the entire fixture is an integrally formed structure.

[0015] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0016] The fixture for the brush roll used for cleaning semiconductor wafers provided by the present utility model is integrally formed, with low mold opening cost, and can also be integrally formed with a PVA sponge, providing a supporting effect on the PVA sponge, preventing it from deforming, facilitating the insertion and removal of the inner rod, and increasing the stability with the inner rod, preventing idling during rotation. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a schematic structural view of the fixture for the brush roll used for cleaning semiconductor wafers in an embodiment of the present utility model;

[0018] Figure 2 is a top view of the fixture for the brush roll used for cleaning semiconductor wafers in an embodiment of the present utility model. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0019] The present utility model will be described in detail below with reference to the drawings and specific embodiments.

[0020] Embodiment: As Figure 1 and 2 shown:

[0021] The fixture for the brush roll used for cleaning semiconductor wafers includes an annular fixture body composed of 8 main frames 10 made of soft synthetic resin and connecting frames. 8 guiding grooves 20 are equidistantly circumferentially arranged inside the annular fixture body. The guiding grooves 20 correspond to the main frames 10 one by one and are connected by connecting members 40. The connecting frames are a net-like structure composed of transverse connecting members 11 and longitudinal connecting members 12 connecting the main frames 10. The guiding grooves 20 include two frame plates arranged at an angle, namely a first frame plate 21 and a second frame plate 22. The frame plates between adjacent guiding grooves 20 are connected by connecting plates 30. The longitudinal connecting members 12 are connected to the connecting plates 30. The connecting frames, main frames 10, and guiding grooves 20 have the same length. The cross-sections of the guiding grooves 20 and the connecting plates 30 are octagons. The entire fixture and the PVA sponge are an integrally formed structure, which can provide a supporting effect on the PVA sponge, effectively prevent it from deforming, facilitate the cleaning process, and there is no need to worry about damage and breakage of the PVA sponge.

[0022] As a variation of this embodiment, the plate body of the frame plate constituting the guiding groove 20 is a plane or a curved surface. In order to increase the friction force, a number of bumps can be arranged on the plate body.

[0023] As a variation of this embodiment, the connecting frame further includes a number of reinforcing ribs, and the reinforcing ribs are connected to at least two of the main frame 10, the transverse connecting member 11, and the longitudinal connecting member 12. The reinforcing ribs can be arranged horizontally, vertically, or obliquely.

[0024] The overall structure of the fixture in this embodiment adopts a mesh connecting frame design, which can ensure the uniform distribution of water flow to the PVA sponge and ensure the wafer cleaning effect. At the same time, the two frame plates on the inner side of the main frame form a guiding groove, and the inner cross-section is a polygonal structure, which can fit with the polygonal inner rod, ensure the stability with the inner rod, prevent idling during rotation, and facilitate the insertion and removal of the inner rod.

[0025] Compared with the prior art, the fixture of the present utility model is integrally formed, with low mold opening cost. The overall mesh connecting frame can achieve the uniform distribution of cleaning water flow, facilitate the insertion and removal of the inner rod, increase the stability with the inner rod, and prevent idling during rotation.

[0026] Finally, it should be noted that those skilled in the art should understand that the present utility model is not limited by the above-mentioned embodiments. The above embodiments and the description in the specification only illustrate the principle of the present utility model. Without departing from the spirit and scope of the present utility model, the present utility model will have various changes and improvements, and these changes and improvements all fall within the scope of the present utility model claimed. The scope of protection claimed by the present utility model is defined by the appended claims and their equivalents.

Claims

1. Fixture for a brush roll used to clean a semiconductor wafer, characterized in that, It includes an annular fixture body composed of multiple main frames (10) and connecting frames. A plurality of guide grooves (20) are circumferentially arranged at equal intervals inside the annular fixture body. The guide grooves (20) include two frame plates arranged at an angle, namely a first frame plate (21) and a second frame plate (22). The frame plates between adjacent guide grooves (20) are connected by a connecting plate (30). The guide grooves (20) and the connecting plate (30) are integrally formed and have a polygonal cross-section.

2. The fixture for the brush roll used to clean a semiconductor wafer as claimed in claim 1, wherein, The plate bodies of the frame plates constituting the guide grooves (20) are flat or arc-shaped, and several convex points can be arranged on the plate bodies.

3. The fixture for the brush roll used for cleaning a semiconductor wafer according to claim 1, characterized in that, The guide grooves (20) correspond to the main frames (10) one by one and are connected by connecting pieces (40).

4. The fixture for the brush roll used to clean a semiconductor wafer according to claim 1, wherein, The connecting frame is a net structure composed of transverse connecting pieces (11) and longitudinal connecting pieces (12) connecting the main frames (10).

5. The fixture for the brush roll used for cleaning a semiconductor wafer according to claim 1, characterized in that, The connecting frame further includes several reinforcing ribs. The reinforcing ribs are connected to at least two of the main frames (10), transverse connecting pieces (11), and longitudinal connecting pieces (12), and the reinforcing ribs can be arranged horizontally, vertically, or obliquely.

6. The fixture for the brush roll used for cleaning a semiconductor wafer as described in claim 5, characterized in that, The longitudinal connecting piece (12) is connected to the connecting plate (30).

7. The fixture for the brush roll used for cleaning a semiconductor wafer according to claim 2, characterized in that, The connecting frame, the main frame (10), and the guide grooves (20) have the same length.

8. The fixture for the brush roll used to clean a semiconductor wafer according to claim 1, characterized in that, The angle between the first frame plate (21) and the second frame plate (22) of the same guide groove (20) is an obtuse angle.

9. The fixture for the brush roll used for cleaning semiconductor wafers according to claim 1, wherein, The number of the main frames (10) is at least 8 and is an even number.

10. The fixture for the brush roll used for cleaning a semiconductor wafer according to any one of claims 1 to 7, characterized in that, The whole fixture is an integrally formed structure.

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