Alumina polishing solution circulating filtration device

Abstract

The utility model discloses an aluminum oxide polishing solution circulating filtering device which comprises a raw material tank, an electric pump, a filter and a connecting pipe used for conveying liquid which are sequentially arranged in the liquid circulating conveying direction, and the raw material tank is provided with a first raw material liquid inlet, a stirrer, a first liquid outlet and a first filtering material liquid inlet. The filter is provided with a second liquid inlet, a barrel body, a filter element and a second liquid outlet, the first liquid outlet is communicated with the second liquid inlet through an electric pump, the second liquid outlet is communicated with the first filter material liquid inlet, a circulating filtration structure is adopted, the device is simple in overall structure and convenient to operate and install, and the filtering effect is good. Large-particle abrasives in the polishing solution can be quickly and effectively filtered; the liquid is conveyed through the filter pump, extrusion type filtration is formed, the liquid flowing impact force is high, and the filter screen is not prone to being blocked.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing liquid preparation devices, and particularly relates to a circulating filtration device for alumina polishing liquid. Background Technique

[0002] Power semiconductor devices play a key role in the development of power electronics technology. Today, with the rapid development of the national economy, the processing precision of electronic devices faces new challenges. Especially, silicon carbide (SiC), as the third-generation semiconductor material, due to its high hardness, structural stability and chemical inertness, for a long time, when pursuing a high-precision and high-quality SiC surface for electronic applications, the processing of the Si surface has always been a challenge in the industry.

[0003] Chemical mechanical polishing (CMP) technology is an essential planarization process in the manufacturing of current integrated circuit products due to its effective performance in thinning or planarizing thin films. CMP is a process in which chemical and mechanical actions complement each other to improve the material removal rate (MRR). By removing micro, nano or atomic materials, global and local planar surfaces can be fabricated on the wafer surface, thus meeting the flatness limitations of current advanced lithography processes. The polishing liquid is one of the dominant factors affecting the polishing quality. The residue of large particle abrasives in the polishing process reduces the surface quality of SiC. Therefore, it is crucial to keep the particle size distribution of the polishing liquid uniform and effectively filter large particle abrasives.

[0004] The prior art proposes a polishing liquid filtration device (CN 208287615 U), which includes a support frame, a telescopic component, and a primary coarse filtration component and a secondary fine filtration component that are successively hung on the support frame from top to bottom; a first liquid outlet is arranged at the bottom of the primary coarse filtration component; a second liquid outlet is arranged at the bottom of the secondary fine filtration component; the telescopic component is arranged on one side of the support frame and can vibrate the filtrate of the primary coarse filtration component and the secondary fine filtration component respectively.

[0005] Although the solution of the prior art can achieve the effect of polishing liquid filtration, the prior art has the following problems: 1. The filter screen is small, the effective contact area is small, and the filtration efficiency is low; 2. There is no extrusion filtration by a filtration pump, which is easy to cause the filter screen to be blocked; 3. For products with high particle precision requirements and requiring multiple filtrations, such as alumina polishing liquid, it cannot be circularly filtered, and the multiple filtration operation process is cumbersome. Content of the Utility Model

[0006] Purpose of the Utility Model:

[0007] In order to overcome the problems existing in the prior art, the utility model provides a circulating filtration device for alumina polishing liquid, which solves the problems of low filtration efficiency, easy blockage of the filter screen, and cumbersome multiple filtration processes existing in the prior art.

[0008] In order to solve the above problems, the utility model adopts the following technical solutions:

[0009] An aluminum oxide polishing liquid circulation and filtration device comprises a raw material tank, an electric pump, a filter and a connecting pipe for conveying liquid, which are arranged in sequence along the liquid circulation conveying direction; the raw material tank is provided with a first raw material liquid inlet, an agitator, a first liquid outlet and a first filter material liquid inlet; the filter is provided with a second liquid inlet, a cylinder, a filter element and a second liquid outlet; the first liquid outlet is connected to the second liquid inlet through the electric pump, and the second liquid outlet is connected to the first filter material liquid inlet.

[0010] Preferably, the filter also includes a cylinder cover snap-connected to the cylinder, a first annular mounting block fixedly arranged at the bottom of the cylinder for mounting the filter element, a second liquid inlet is arranged in the middle of the cylinder cover, and the cylinder cover also extends into the interior of the cylinder and is provided with a second annular mounting block larger than the second liquid inlet.

[0011] Preferably, the filter element is a pleated filter element.

[0012] Preferably, the stirrer is a corrugated polyurethane high-dispersibility stirrer.

[0013] Preferably, the corrugated polyurethane high-dispersibility agitator comprises a control motor, a stirring shaft connected to the control motor, and a dispersion plate fixedly arranged at the bottom of the stirring shaft, wherein the top and bottom surfaces of the dispersion plate are equidistantly inwardly recessed with corrugated grooves.

[0014] Preferably, the electric pump is a polytetrafluoroethylene self-priming electric diaphragm pump.

[0015] Preferably, the first raw material liquid inlet is connected to a PVC straight rigid pipe, a connecting pipe is inserted into the PVC straight rigid pipe, and the PVC straight rigid pipe is fixedly installed on a pipe fixing seat.

[0016] Preferably, the connecting pipe is a PP pipe.

[0017] Beneficial effects: Compared with the prior art, the utility model has the following advantages: it adopts a circulating filtration structure, the overall structure of the device is simple, the operation and installation are convenient, and it can quickly and effectively filter large-particle abrasives in the polishing liquid; it is transported by a filter pump to form an extrusion filtration, the liquid flow impact force is strong, and it is not easy to clog the filter screen. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a cross-sectional view of the utility model;

[0019] Figure 2 It is a three-dimensional diagram of the raw material tank of the utility model;

[0020] Figure 3It is a perspective view of the stirrer of the present utility model;

[0021] Figure 4 It is a perspective view of the filter of the present utility model;

[0022] Figure 5 It is an internal structure diagram of the filter of the present utility model;

[0023] Explanation of reference numerals:

[0024] 1. Raw material tank; 11. First raw material inlet; 12. Stirrer; 13. First outlet; 14. First filtered material inlet; 15. Straight hard pipe; 16. Pipeline fixing seat; 2. Electric pump; 3. Filter; 31. Second inlet; 32. Cylinder body; 33. Filter element; 34. Second outlet; 35. Cylinder cover; 36. First annular mounting block; 37. Second annular mounting block; 4. Connecting pipe; 51. Control motor; 52. Stirring shaft; 53. Dispersion disc; 54. Corrugated groove. Detailed implementation manners

[0025] All features disclosed in this specification, or all steps in the disclosed methods or processes, except for mutually exclusive features and / or steps, can be combined in any way.

[0026] Any feature disclosed in this specification (including any additional claims, abstract, and drawings), unless specifically stated, can be replaced by other equivalent or similar-purpose alternative features. That is, unless specifically stated, each feature is only an example of a series of equivalent or similar features.

[0027] To make the above objects, features, and advantages of the present utility model more obvious and understandable, the following detailed description of the specific implementation manners of the present utility model will be given in conjunction with the accompanying drawings.

[0028] As Figures 1-5 shown, an alumina polishing liquid circulation filtration device includes a raw material tank 1, an electric pump 2, a filter 3, and a connecting pipe 4 for transporting liquid, which are arranged in sequence along the liquid circulation and transportation direction. The raw material tank 1 is provided with a first raw material inlet 11, a stirrer 12, a first outlet 13, and a first filtered material inlet 14. The filter 3 is provided with a second inlet 31, a cylinder body 32, a filter element 33, and a second outlet 34. The first outlet 13 is connected to the second inlet 31 through the electric pump 2, and the second outlet 34 is connected to the first filtered material inlet 14.

[0029] Adopting a circulating filtration structure, the overall structure of the device is simple, the operation and installation are convenient, and it can quickly and effectively filter large particle abrasives in the polishing liquid; it is transported through a filtration pump to form a squeezing filtration, the liquid flow impact force is strong, and the filter screen is not easily blocked.

[0030] In this embodiment, the filter 3 also includes a cylinder cover 35 snap-connected to the cylinder, a first annular mounting block 36 fixedly arranged at the bottom of the cylinder for mounting the filter element, a second liquid inlet 31 is opened in the middle of the cylinder cover, and the cylinder cover also extends toward the inside of the cylinder and is provided with a second annular mounting block 37 larger than the second liquid inlet 31.

[0031] This structure makes it easy to install and remove the filter screen, and to open the cylinder cover to clean the inside.

[0032] In this embodiment, the filter element 33 is a pleated filter element with a large effective contact surface for filtration and a good filtration effect. Specifically, a 3um pleated filter element is used.

[0033] In this embodiment, the stirrer 12 is a corrugated polyurethane high-dispersibility stirrer.

[0034] In this embodiment, the corrugated polyurethane high-dispersibility agitator includes a control motor 51, a stirring shaft 52 connected to the control motor, and a dispersion plate 53 fixedly arranged at the bottom of the stirring shaft. The top and bottom surfaces of the dispersion plate are equidistantly inwardly recessed with corrugated grooves 54.

[0035] In this embodiment, the electric pump 2 is a polytetrafluoroethylene self-priming electric diaphragm pump.

[0036] In this embodiment, the first raw material liquid inlet 11 is connected to a PVC straight hard pipe 15 , a connecting pipe 4 is inserted into the PVC straight hard pipe 15 , and the PVC straight hard pipe 15 is fixedly mounted on a pipe fixing seat 16 .

[0037] In this embodiment, the connecting pipe 4 is a PP pipe.

[0038] Working principle: Raw material tank 1, electric pump 2, filter 3, and raw material tank 1 are connected in sequence through connecting pipes. 100Kg of alumina polishing liquid to be filtered is placed in the raw material tank, the agitator is turned on, the folded filter element is installed in the filter, and the electric pump is turned on to form a closed-loop filtration system. The timing is 20 minutes, and the filtration is stopped after 20 minutes. After the circulation filtration, the large particles of abrasive in the polishing liquid are effectively removed. The particle size distribution data of the polishing liquid before and after filtration are as follows:

[0039]

[0040] The comparison between this device and the common filtering device, the detailed results of filtering 100Kg of alumina polishing liquid are as follows: 3μm cycle filtration particle size distribution data monitoring:

[0041]

[0042] 3μm ordinary filter bag filtration particle size distribution data monitoring:

[0043]

[0044] When filtering the polishing liquid with a large amount of 100 Kg coarse abrasive, there are still coarse particles remaining after filtering three times with a common filter bag device, and the filter mesh is easily blocked after multiple filtrations, resulting in a slow filtration speed. The three-time filtration not only has a cumbersome operation process but also a poor filtration effect. However, for the circulating filtration device equipped with a folded filter element, the effective filtration contact surface is large, the filtration pump connected to the self-priming electric diaphragm pump is not easily blocked, the operation is simple, and the filtration efficiency is high and the effect is good.

[0045] The purpose of the above embodiments is to exemplarily reproduce and deduce the technical solutions of the present utility model, and to completely describe the technical solutions, purposes and effects of the present utility model. The purpose is to enable the public to understand the disclosed content of the present utility model more thoroughly and comprehensively, and it does not limit the protection scope of the present utility model.

[0046] The above embodiments are not an exhaustive list based on the present utility model. In addition, there may be multiple other embodiments not listed. Any substitution and improvement made on the basis of not violating the concept of the present utility model fall within the protection scope of the present utility model.

Claims

1. A circulating filtration device for alumina polishing liquid, characterized in that: The invention comprises a raw material tank (1), an electric pump (2), a filter (3) and a connecting pipe (4) for conveying liquid, which are arranged in sequence along the liquid circulation conveying direction; the raw material tank (1) is provided with a first raw material liquid inlet (11), a stirrer (12), a first liquid outlet (13) and a first filter material liquid inlet (14); the filter (3) is provided with a second liquid inlet (31), a cylinder (32), a filter element (33) and a second liquid outlet (34); the first liquid outlet (13) is connected to the second liquid inlet (31) through the electric pump (2); and the second liquid outlet (34) is connected to the first filter material liquid inlet (14).

2. The circulating filtration device for alumina polishing liquid according to claim 1, characterized in that: The filter (3) further comprises a cylinder cover (35) snap-connected to the cylinder, a first annular mounting block (36) fixedly arranged at the bottom of the cylinder for mounting a filter element, a second liquid inlet (31) being arranged in the middle of the cylinder cover, and a second annular mounting block (37) which is larger than the second liquid inlet (31) and extends toward the inside of the cylinder.

3. The alumina polishing liquid circulation filtration device according to claim 1 or 2, characterized in that: The filter element (33) is a folded filter element.

4. The alumina polishing liquid circulating and filtering device according to claim 1, characterized in that: The stirrer (12) is a corrugated polyurethane high-dispersibility stirrer.

5. The alumina polishing liquid circulation filtration device according to claim 4, characterized in that: The corrugated polyurethane high-dispersibility stirrer comprises a control motor (51), a stirring shaft (52) connected to the control motor for transmission, and a dispersion plate (53) fixedly arranged at the bottom of the stirring shaft, wherein the top surface and the bottom surface of the dispersion plate are both equidistantly inwardly concavely provided with corrugated grooves (54).

6. The circulating filtration device for alumina polishing liquid according to claim 1, wherein: The electric pump (2) is a polytetrafluoroethylene self-priming electric diaphragm pump.

7. The alumina polishing liquid circulation filtration device according to claim 1, characterized in that: The first raw material liquid inlet (11) is connected to a PVC straight rigid pipe (15), a connecting pipe (4) is inserted into the PVC straight rigid pipe (15), and the PVC straight rigid pipe (15) is fixedly mounted on a pipe fixing seat (16).

8. The alumina polishing liquid circulation filtration device according to claim 1 or 5, characterized in that: The connecting pipe (4) is a PP pipe.

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