Clamping device for semiconductor silicon epitaxial wafer detection

Abstract

The utility model discloses a clamping device for semiconductor silicon epitaxial wafer detection, which comprises a base and a lifting frame, the top end of the base is provided with the lifting frame, the top end of the lifting frame is provided with a lifting motor, the output end of the lifting motor is provided with a threaded rod, and the threaded rod is movably connected with the lifting frame. The surface of the threaded rod is sleeved with a threaded sleeve, the threaded sleeve is in threaded connection with the threaded rod, the threaded sleeve is slidably connected with the lifting frame, a rotating base is installed on the side wall of the threaded sleeve, a first electric push rod is movably installed in the rotating base, and a first push arm is installed at the output end of the first electric push rod. An integrated frame is mounted at the end, away from the first electric push rod, of the first push arm. According to the utility model, the epitaxial wafers can be conveniently and flexibly clamped and fixed in a centering manner, two groups of epitaxial wafers can be conveniently overturned and clamped to be detected in sequence, and the clamping convenience of the epitaxial wafers is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of clamping devices, in particular to a clamping device for detecting semiconductor silicon epitaxial wafers. Background Technique

[0002] Epitaxy is a process in semiconductor technology. In bipolar technology, the bottom layer of a silicon wafer is a P-type substrate silicon (with some buried layers added), and then a layer of single-crystalline silicon is grown on the substrate. This layer of single-crystalline silicon is called the epitaxial layer. Subsequently, the base region, emitter region, etc. are implanted on the epitaxial layer, and finally, a longitudinal NPN transistor structure is basically formed: the epitaxial layer is the collector region therein, the base region and the emitter region are on the epitaxial layer, and the epitaxial wafer is a silicon wafer with an epitaxial layer made on the substrate. After the production of the epitaxial wafer, it needs to be detected, and only the qualified epitaxial wafers can be shipped out for use. In order to better detect the epitaxial wafers, a clamping device for detecting semiconductor silicon epitaxial wafers is proposed.

[0003] As disclosed in a clamping device for detecting semiconductor epitaxial wafers with the authorization announcement number CN220963291U, it includes a support base and a placement table. The bottom end of the placement table is fixedly connected to the top end of the support base. A fixed ring is provided at the top end of the placement table. One side of the bottom end of the outer ring of the fixed ring is fixedly connected with a lifting device. The bottom ends of the outer ring of the fixed ring are uniformly fixedly connected with telescopic rods. The bottom ends of the telescopic rods are fixedly connected to the upper surface of the support base. A first spring is uniformly provided at the bottom end of the fixed ring. The bottom end of the first spring is fixedly connected with a pressing ring. A first sponge pad is adhered to the bottom end of the pressing ring. Four second chutes are symmetrically provided at the top end of the fixed ring. The inner walls of the second chutes are all slidably connected with displacement plates.

[0004] Although it realizes that a clamping device can be quickly formed by the cooperation of the provided lifting device, fixed ring, first spring, pressing ring, first sponge pad and the placement table, and the provided displacement plates, first rack, first gear, first knob, second spring, fixed piece and second sponge pad greatly enhance the practicability.

[0005] However, it does not solve the problem that the existing clamping device is not convenient for conveniently centering and flexibly clamping and fixing the epitaxial wafer, and is not conducive to flipping and clamping two groups of epitaxial wafers to detect the epitaxial wafers in sequence, which affects the convenience of clamping the epitaxial wafers. Content of the Utility Model

[0006] The purpose of the utility model is to provide a clamping device for detecting semiconductor silicon epitaxial wafers, so as to solve the problems proposed in the above background technique that the clamping device is not convenient for conveniently centering and flexibly clamping and fixing the epitaxial wafer, is not conducive to flipping and clamping two groups of epitaxial wafers to detect the epitaxial wafers in sequence, and affects the convenience of clamping the epitaxial wafers.

[0007] To achieve the above object, the present utility model provides the following technical solutions: A clamping device for detecting semiconductor silicon epitaxial wafers, comprising a base and a lifting frame. The lifting frame is installed at the top of the base. A lifting motor is installed at the top of the lifting frame. The output end of the lifting motor is installed with a threaded rod, and the threaded rod is movably connected to the lifting frame. A threaded sleeve is sleeved on the surface of the threaded rod, and the threaded sleeve is threadedly connected to the threaded rod and is slidably connected to the lifting frame. A rotating seat is installed on the side wall of the threaded sleeve. A first electric push rod is movably installed inside the rotating seat. The output end of the first electric push rod is installed with a first push arm. The end of the first push arm away from the first electric push rod is installed with an integrated frame. Fixed rings are installed at both the upper and lower ends of the integrated frame. A rotating gear is sleeved on the surface of the first electric push rod. A second electric push rod is installed at the top of the rotating seat. The output end of the second electric push rod is installed with a second push arm. A rack is installed at the bottom of the second push arm, and the rack meshes with the rotating gear.

[0008] Preferably, three groups of support blocks are symmetrically installed inside the integrated frame, and the support blocks are fixedly connected to the integrated frame.

[0009] Preferably, clamping jaws are provided inside the support blocks. Moving shafts are installed on the side walls of the clamping jaws, and the clamping jaws are movably connected to the support blocks through the moving shafts.

[0010] Preferably, reset springs are installed at the bottom ends of the clamping jaws, and the reset springs are fixedly connected to the integrated frame.

[0011] Preferably, moving rings are movably installed on the inner walls of the fixed rings, and three groups of eccentric blocks are installed at equal intervals on the inner walls of the moving rings.

[0012] Preferably, toothed rings are installed at the top ends of the moving rings, and driving motors are installed on the side walls of the fixed rings.

[0013] Preferably, driving shafts are installed at the output ends of the driving motors. Clamping gears are sleeved on the surfaces of the driving shafts, and the clamping gears mesh with the toothed rings.

[0014] Preferably, clamping blocks are slidably installed at the top ends of the clamping jaws. Support springs are installed on the side walls of the clamping blocks, and the support springs are connected to the clamping jaws.

[0015] Compared with the prior art, the beneficial effects of the present utility model are: This clamping device not only realizes convenient centering and flexible clamping and fixing of the epitaxial wafer, facilitates flipping and clamping two groups of epitaxial wafers for sequential detection of the epitaxial wafers, but also improves the convenience of clamping the epitaxial wafer;

[0016] (1) The lifting motor drives the threaded rod to rotate. The threaded rod drives the threaded sleeve to move downward. The threaded sleeve drives the rotating seat, the integrated frame, and the clamping jaws to move downward, so as to move the clamping jaws around the epitaxial wafer. The driving motor drives the clamping gear to rotate through the driving shaft. The clamping gear drives the movable ring to rotate inside the fixed ring through the toothed ring. The movable ring drives the eccentric block to turn from the gentle slope to the steep slope. The eccentric block drives the clamping jaws to rotate with the movable shaft as the axis, so that the clamping jaws rotate towards the central position. The clamping jaws drive the clamping blocks to contact the outer wall of the epitaxial wafer. The support spring provides elastic support for the clamping blocks to prevent rigid clamping from damaging the epitaxial wafer. When clamping is not required, the return spring can drive the clamping jaws to reset. After the epitaxial wafer is clamped, the lifting motor is turned on in reverse. The lifting motor drives the rotating seat and the integrated frame to reset. The second electric push rod drives the second push arm to move. The second push arm drives the rack to move. The rack drives the rotating gear to rotate. The rotating gear drives the first electric push rod to rotate. The first electric push rod drives the integrated frame to rotate through the first push arm, so as to rotate another set of clamping jaws downward. Then, repeat the above operations to complete the clamping work on another set of epitaxial wafers, which facilitates clamping and fixing two sets of epitaxial wafers at the same time and performing inspections, realizes convenient centering and flexible clamping and fixing of the epitaxial wafer, facilitates flipping and clamping two sets of epitaxial wafers to perform sequential inspections on the epitaxial wafers, and improves the convenience of clamping the epitaxial wafer;

[0017] (2) By turning on the first electric push rod, the first electric push rod drives the first push arm to move. The first push arm drives the integrated frame and the epitaxial wafer to move, so as to move and adjust the position of the epitaxial wafer, which facilitates inspecting the epitaxial wafer from different positions. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 is a three-dimensional structure schematic diagram of the present utility model;

[0019] Figure 2 is a top view structure schematic diagram of the present utility model;

[0020] Figure 3 is a front view sectional structure schematic diagram of the lifting frame of the present utility model;

[0021] Figure 4 is a front view sectional structure schematic diagram of the integrated frame of the present utility model;

[0022] Figure 5 is a side view sectional structure schematic diagram of the rotating seat of the present utility model;

[0023] Figure 6 is a three-dimensional structure schematic diagram of the integrated frame of the present utility model.

[0024] In the figure: 1. Base; 2. Lifting frame; 3. Rotating seat; 4. Integrated frame; 5. First electric push rod; 6. First push arm; 7. Clamping gear; 8. Tooth ring; 9. Fixed ring; 10. Movable ring; 11. Eccentric block; 12. Threaded rod; 13. Threaded sleeve; 14. Lifting motor; 15. Rotating gear; 16. Support block; 17. Return spring; 18. Movable shaft; 19. Jaw; 20. Second electric push rod; 21. Second push arm; 22. Rack; 23. Clamping block; 24. Support spring; 25. Drive shaft; 26. Drive motor. Detailed implementation manner

[0025] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0026] Please refer to Figures 1-6 , an embodiment provided by the present invention: A clamping device for detecting semiconductor silicon epitaxial wafers, including a base 1 and a lifting frame 2. A lifting frame 2 is installed at the top of the base 1. A lifting motor 14 is installed at the top of the lifting frame 2, and the lifting motor 14 plays a role in power driving. A threaded rod 12 is installed at the output end of the lifting motor 14, and the threaded rod 12 is movably connected to the lifting frame 2. A threaded sleeve 13 is sleeved on the surface of the threaded rod 12, and the threaded sleeve 13 is threadedly connected to the threaded rod 12, and the threaded sleeve 13 is slidably connected to the lifting frame 2. A rotating seat 3 is installed on the side wall of the threaded sleeve 13. A first electric push rod 5 is movably installed inside the rotating seat 3, and the first electric push rod 5 plays a role in power driving. A first push arm 6 is installed at the output end of the first electric push rod 5. An integrated frame 4 is installed at the end of the first push arm 6 away from the first electric push rod 5. Fixed rings 9 are installed at both the upper and lower ends of the integrated frame 4. A rotating gear 15 is sleeved on the surface of the first electric push rod 5. A second electric push rod 20 is installed at the top of the rotating seat 3, and the second electric push rod 20 plays a role in power driving. A second push arm 21 is installed at the output end of the second electric push rod 20. A rack 22 is installed at the bottom end of the second push arm 21, and the rack 22 meshes with the rotating gear 15;

[0027] Turn on the lifting motor 14. The lifting motor 14 drives the threaded rod 12 to rotate. Under the threaded connection between the threaded rod 12 and the threaded sleeve 13, and the sliding fit between the threaded sleeve 13 and the lifting frame 2, the threaded rod 12 drives the threaded sleeve 13 to move downward. The threaded sleeve 13 drives the rotating seat 3, the integrated frame 4, and the clamping jaws 19 to move downward, so as to move the clamping jaws 19 around the epitaxial wafer. Turn on the drive motor 26. The drive motor 26 drives the clamping gear 7 to rotate through the drive shaft 25. Under the movable fit between the movable ring 10 and the fixed ring 9, and the mutual meshing between the clamping gear 7 and the toothed ring 8, the clamping gear 7 drives the movable ring 10 to rotate inside the fixed ring 9 through the toothed ring 8. The movable ring 10 drives the eccentric block 11 to turn from the gentle slope to the steep slope. Under the support of the support block 16, the eccentric block 11 drives the clamping jaws 19 to rotate around the movable shaft 18, so that the clamping jaws 19 rotate towards the central position. The clamping jaws 19 drive the clamping blocks 23 to contact the outer wall of the epitaxial wafer. The support spring 24 provides elastic support for the clamping blocks 23 to prevent rigid clamping from damaging the epitaxial wafer. When clamping is not required, the return spring 17 can drive the clamping jaws 19 to reset. When the epitaxial wafer clamping is completed, reverse turn on the lifting motor 14. The lifting motor 14 drives the rotating seat 3 and the integrated frame 4 to reset. Then turn on the second electric push rod 20. The second electric push rod 20 drives the second push arm 21 to move. The second push arm 21 drives the rack 22 to move. Under the mutual meshing between the rack 22 and the rotating gear 15, the rack 22 drives the rotating gear 15 to rotate. The rotating gear 15 drives the first electric push rod 5 to rotate. The first electric push rod 5 drives the integrated frame 4 to rotate through the first push arm 6, so as to rotate another set of clamping jaws to the lower part. Then repeat the above operations to complete the clamping work of another set of epitaxial wafers, which facilitates clamping and fixing two groups of epitaxial wafers at the same time and performing detection, realizes convenient centering and flexible clamping and fixing of the epitaxial wafer, facilitates flipping and clamping two groups of epitaxial wafers to detect the epitaxial wafers in turn, and improves the convenience of clamping the epitaxial wafer;

[0028] Three groups of support blocks 16 are symmetrically installed inside the integrated frame 4, and the support blocks 16 are fixedly connected to the integrated frame 4. Clamping jaws 19 are arranged inside the support blocks 16. Movable shafts 18 are installed on the side walls of the clamping jaws 19, and the clamping jaws 19 are movably connected to the support blocks 16 through the movable shafts 18;

[0029] Return springs 17 are installed at the bottom ends of the clamping jaws 19, and the return springs 17 are fixedly connected to the integrated frame 4. Movable rings 10 are movably installed on the inner walls of the fixed rings 9, and three groups of eccentric blocks 11 are installed at equal intervals on the inner walls of the movable rings 10;

[0030] At the top of the movable ring 10, a toothed ring 8 is installed. On the side wall of the fixed ring 9, a driving motor 26 is installed. The driving motor 26 plays a role in power driving. At the output end of the driving motor 26, a driving shaft 25 is installed. A clamping gear 7 is sleeved on the surface of the driving shaft 25, and the clamping gear 7 meshes with the toothed ring 8;

[0031] At the top of the clamping jaw 19, a clamping block 23 is slidably installed. On the side wall of the clamping block 23, a support spring 24 is installed, and the support spring 24 is connected to the clamping jaw 19;

[0032] Open the first electric push rod 5. The first electric push rod 5 drives the first push arm 6 to move. The first push arm 6 drives the integrated frame 4 and the epitaxial wafer to move, so as to move and adjust the position of the epitaxial wafer, and to facilitate the detection of the epitaxial wafer from different positions.

[0033] Working principle: Open the lifting motor 14. The lifting motor 14 drives the threaded rod 12 to rotate. The threaded rod 12 drives the threaded sleeve 13 to move downward. The threaded sleeve 13 drives the rotating seat 3, the integrated frame 4 and the clamping jaw 19 to move downward, so as to move the clamping jaw 19 to the periphery of the epitaxial wafer. The driving motor 26 drives the clamping gear 7 to rotate through the driving shaft 25. The clamping gear 7 drives the movable ring 10 to rotate inside the fixed ring 9 through the toothed ring 8. The movable ring 10 drives the eccentric block 11 to turn from a gentle slope to a steep slope. The eccentric block 11 drives the clamping jaw 19 to rotate around the movable shaft 18, so that the clamping jaw 19 rotates towards the central position. The clamping jaw 19 drives the clamping block 23 to contact the outer wall of the epitaxial wafer. The support spring 24 provides elastic support for the clamping block 23 to prevent the rigid clamping from damaging the epitaxial wafer. When clamping is not required, the return spring 17 can drive the clamping jaw 19 to reset. After the epitaxial wafer is clamped, reverse the lifting motor 14. The lifting motor 14 drives the rotating seat 3 and the integrated frame 4 to reset. The second electric push rod 20 drives the second push arm 21 to move. The second push arm 21 drives the rack 22 to move. The rack 22 drives the rotating gear 15 to rotate. The rotating gear 15 drives the first electric push rod 5 to rotate. The first electric push rod 5 drives the integrated frame 4 to rotate through the first push arm 6, so as to rotate another set of clamping jaws to the lower part. Then repeat the above operations to complete the clamping work of another set of epitaxial wafers, so as to facilitate the simultaneous clamping and fixing of two sets of epitaxial wafers and detection. The first electric push rod 5 drives the first push arm 6 to move. The first push arm 6 drives the integrated frame 4 and the epitaxial wafer to move, so as to move and adjust the position of the epitaxial wafer, and to facilitate the detection of the epitaxial wafer from different positions, so as to complete the use work of the clamping device for semiconductor silicon epitaxial wafer detection.

Claims

1. A clamping device for detecting a semiconductor silicon epitaxial wafer, comprising a base (1) and a lifting frame (2), characterized in that: A lifting frame (2) is installed at the top of the base (1). A lifting motor (14) is installed at the top of the lifting frame (2). An output end of the lifting motor (14) is installed with a threaded rod (12), and the threaded rod (12) is movably connected with the lifting frame (2). A thread sleeve (13) is sleeved on the surface of the threaded rod (12), and the thread sleeve (13) is in threaded connection with the threaded rod (12), and the thread sleeve (13) is slidably connected with the lifting frame (2). A rotating seat (3) is installed on a side wall of the thread sleeve (13). A first electric push rod (5) is movably installed inside the rotating seat (3). An output end of the first electric push rod (5) is installed with a first push arm (6). An integrated frame (4) is installed at an end of the first push arm (6) away from the first electric push rod (5). Fixed rings (9) are installed at upper and lower ends of the integrated frame (4). A rotating gear (15) is sleeved on the surface of the first electric push rod (5). A second electric push rod (20) is installed at the top of the rotating seat (3). An output end of the second electric push rod (20) is installed with a second push arm (21). A rack (22) is installed at a bottom end of the second push arm (21), and the rack (22) is meshed with the rotating gear (15).

2. The clamping device for detecting a semiconductor silicon epitaxial wafer according to claim 1, wherein: Three groups of support blocks (16) are symmetrically installed inside the integrated frame (4), and the support blocks (16) are fixedly connected with the integrated frame (4).

3. The clamping device for detecting a semiconductor silicon epitaxial wafer according to claim 2, wherein: Claw jaws (19) are arranged inside the support blocks (16). Moving shafts (18) are installed on side walls of the claw jaws (19), and the claw jaws (19) are movably connected with the support blocks (16) through the moving shafts (18).

4. A clamping device for detecting a semiconductor silicon epitaxial wafer according to claim 3, characterized in that: Reset springs (17) are installed at bottom ends of the claw jaws (19), and the reset springs (17) are fixedly connected with the integrated frame (4).

5. A clamping device for detecting a semiconductor silicon epitaxial wafer according to claim 1, characterized in that: Moving rings (10) are movably installed on inner walls of the fixed rings (9). Three groups of eccentric blocks (11) at equal intervals are installed on inner walls of the moving rings (10).

6. The clamping device for detecting a semiconductor silicon epitaxial wafer according to claim 5, wherein: Tooth rings (8) are installed at top ends of the moving rings (10). Driving motors (26) are installed on side walls of the fixed rings (9).

7. A clamping device for detecting a semiconductor silicon epitaxial wafer according to claim 6, characterized in that: Driving shafts (25) are installed at output ends of the driving motors (26). Clamping gears (7) are sleeved on surfaces of the driving shafts (25), and the clamping gears (7) are meshed with the tooth rings (8).

8. The clamping device for detecting a semiconductor silicon epitaxial wafer according to claim 3, wherein: Clamping blocks (23) are slidably installed at top ends of the claw jaws (19). Support springs (24) are installed on side walls of the clamping blocks (23), and the support springs (24) are connected with the claw jaws (19).

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