Shielding type focused ion beam scanning electron microscope system

Abstract

The utility model discloses a shielding type focused ion beam scanning electron microscope system. The shielding type focused ion beam scanning electron microscope system comprises a shielding cover, a front device, electron microscope equipment, a manipulator and an interaction device, the front-mounted device is arranged in the shielding cover and comprises a treatment cabin and a cabin door, the treatment cabin is provided with a treatment cavity, a sample injection port, a mounting port and a butt joint port, and the cabin door is movably connected to the treatment cabin and used for shielding or opening the sample injection port; the electron microscope equipment is arranged in the shielding cavity, and the electron microscope equipment is communicated with the docking port; the manipulator penetrates through the mounting opening; the interaction device is connected outside the shielding case and used for adjusting the working state of the electron microscope equipment. Therefore, in the working process, when the shielding type focused ion beam scanning electron microscope system is used for sample detection, an operator can stand outside the shielding cover to operate, so that the safety of the operator is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of radioactive material detection, in particular to a shielded focused ion beam scanning electron microscope system. Background Art

[0002] The focused ion beam scanning electron microscope (SEM-FIB) is a microscopic analysis and processing system that uses a focused ion beam instead of the electron beam used in the SEM as the instrument light source. It can perform nano-processing on the sample surface while imaging the surface. In the field of material research and development, it is usually used for sample preparation of precision equipment such as TEM and APT. With the continuous development of nuclear energy, SEM-FIB has gradually become an irreplaceable experimental equipment for sample preparation in the process of nuclear fuel and nuclear structural material research and development. In the focused ion beam processing system, the ion beam drawn from the ion source can be focused to a few nanometers when it reaches the sample surface after acceleration, mass analysis, shaping and other processing. Among them, since radioactive samples are usually transported in lead cans during detection, pre-operations such as opening the can and sampling are required before detection. However, during the material inspection after irradiation, the sample carries α, γ and other rays, and the human body cannot directly contact the sample for detection. In this regard, in some technologies, for the detection of radioactive materials, a glove hole is set on the equipment, and gloves are set at the glove hole. The operator can put his hand into the equipment through the glove to process the sample. Based on this, the equipment is required to have higher shielding performance. However, since the equipment has multiple functional openings, such as the sample inlet, sample outlet, air inlet and air outlet, etc., there is a risk of leakage of radioactive materials at the openings, resulting in lower safety. Utility Model Content

[0003] The utility model aims to solve at least one of the technical problems existing in the prior art. To this end, the utility model proposes a shielded focused ion beam scanning electron microscope system, which can improve the safety of operators.

[0004] According to the embodiment of the utility model, the shielded focused ion beam scanning electron microscope system includes: a shielding cover, a front device, an electron microscope device, a manipulator and an interactive device.

[0005] The shielding cover is a radiation shielding structure, and the shielding cover has a shielding cavity; the front-end device is disposed in the shielding cavity, and the front-end device includes a processing chamber and a hatch. The processing chamber has a processing cavity, a sample inlet, a mounting port, and a mating port. The sample inlet and the mating port are both communicated with the processing cavity. The sample inlet is used for allowing a sample to enter the processing cavity. The hatch is movably connected to the processing chamber and is used for shielding or opening the sample inlet; the electron microscope device is disposed in the shielding cavity, and the electron microscope device includes a detection chamber, and the detection chamber is communicated with the mating port; a manipulator, including an execution end, the manipulator passes through the mounting port, and the execution end is located in the processing cavity; the interaction device is located outside the shielding cover, and the interaction device includes a plurality of buttons, and the buttons are used for adjusting the working state of the electron microscope device.

[0006] The shielding type focused ion beam scanning electron microscope system according to an embodiment of the present invention has at least the following beneficial effects:

[0007] In this embodiment, the shielding cover is a radiation-proof structure, the front-end device and the electron microscope device are both disposed in the shielding cover. The processing chamber of the front-end device has a mounting port, and the manipulator passes through the mounting port so that the execution end is located in the processing cavity. The interaction device is disposed outside the shielding cover and is used for adjusting the working state of the electron microscope device. During the working process, the manipulator is used to perform pre-operation and transportation on the sample entering the processing cavity, and the working state of the electron microscope device is adjusted by the external interaction device so that the electron microscope device detects the sample. Thus, compared with the traditional technology, when using the shielding type focused ion beam scanning electron microscope system of this embodiment to detect a sample, the operator can operate outside the shielding cover, thereby improving the safety of the operator.

[0008] According to some embodiments of the present invention, the shielding type focused ion beam scanning electron microscope system further includes a filtering component, and the filtering component includes an air outlet filter, and the air outlet filter is communicated with the processing cavity and is used for filtering the radioactive aerosol generated in the processing cavity.

[0009] According to some embodiments of the present invention, the filtering component further includes an extraction air duct, the extraction air duct is communicated with the air outlet filter, the extraction air duct extends into the processing cavity, the extraction air duct has an extraction air opening, and the distance between the extraction air opening and the top wall of the processing cavity is L1, and the distance between the extraction air opening and the bottom wall of the processing cavity is L2, and L1 > L2.

[0010] According to some embodiments of the present invention, the processing chamber further has a sampling port, the sampling port is communicated with the processing cavity, and the sampling port is used for allowing a tool to collect the radioactive aerosol generated in the processing cavity.

[0011] According to some embodiments of the present utility model, the processing chamber includes a first chamber and a second chamber, and a passage connecting the first chamber and the second chamber, the injection port is connected to the first chamber, the docking port is connected to the second chamber, and the front device also includes a shielding door, which is movably connected to the processing chamber and is used to shield or open the passage;

[0012] The filter assembly includes at least two air outlet filters, and the first chamber and the second chamber are both connected to at least one of the air outlet filters.

[0013] According to some embodiments of the present invention, the manipulator is disposed in the shielding cavity, the manipulator is communicatively connected with the interactive device, and the interactive device can adjust the working state of the manipulator; or,

[0014] The end of the manipulator away from the execution end also has an operating end. The manipulator is inserted through the shielding cover and is sealed with the shielding cover. The operating end is located outside the shielding cover and is used for an operator to manipulate the execution end.

[0015] According to some embodiments of the present invention, the shielded focused ion beam scanning electron microscope system further includes a moving mechanism, wherein the moving mechanism includes a moving platform, and the moving platform is capable of moving between the first chamber and the second chamber.

[0016] According to some embodiments of the present invention, the shielding cover has a first visual window, and the processing chamber is provided with a second visual window at a position corresponding to the first visual window, so that personnel can observe the inside of the processing chamber from outside the shielding cover.

[0017] According to some embodiments of the utility model, the processing chamber also has a glove opening, and the shielded focused ion beam scanning electron microscope system also includes gloves, the gloves are made of radiation protection material, the gloves are connected to the glove opening, and can be inserted into the processing chamber.

[0018] According to some embodiments of the utility model, the shielded focused ion beam scanning electron microscope system also includes a seal, which is a radiation-proof flexible structure, and the seal is arranged between the inner wall of the installation port and the manipulator.

[0019] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The present invention is further described below with reference to the accompanying drawings and embodiments, wherein:

[0021] Figure 1 This is a schematic structural diagram of a shielded focused ion beam scanning electron microscope system according to an embodiment of the present invention;

[0022] Figure 2 is Figure 1 a schematic structural diagram after removing the shield in

[0023] Figure 3 is Figure 2 a schematic structural diagram of the front-end device in

[0024] Figure 4 is Figure 3 another perspective;

[0025] Figure 5 is Figure 2 a cross-sectional view of

[0026] Figure 6 is Figure 3 a schematic diagram of another perspective.

[0027] Reference numerals:

[0028] Shield 100, shielding cavity 110, first viewing window 120;

[0029] Front-end device 200, first cabin 201, second cabin 202, processing cabin 210, processing cavity 211, first chamber 2111, second chamber 2112, channel 2113, sample inlet 212, installation port 213, docking port 214, glove port 215, sampling port 216, air inlet 217, air outlet 218, cabin door 220, second viewing window 230, shielding door 240;

[0030] Electron microscope equipment 300, detection chamber 310;

[0031] Manipulator 400, execution end 410, operation end 420;

[0032] Interaction device 500;

[0033] Filter assembly 600, air outlet filter 610, air inlet filter 620, exhaust duct 630, exhaust port 631;

[0034] Lifting device 700, mobile platform 800. Detailed implementation manners

[0035] The embodiments of the present invention will be described in detail below. The examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions from beginning to end. The embodiments described below with reference to the drawings are exemplary and are only used to explain the present invention and should not be construed as a limitation of the present invention.

[0036] In the description of the present invention, it should be understood that descriptions involving orientation, such as up, down, front, back, left, right, etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0037] In the description of the present utility model, "several" means more than one, "many" means more than two, "greater than", "less than", "exceed" etc. are understood to exclude the number itself, and "above", "below", "within" etc. are understood to include the number itself. If there is a description of "first" or "second", it is only used to distinguish the technical features, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0038] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0039] The focused ion beam scanning electron microscope (SEM-FIB) is a microscopic analysis and processing system that uses a focused ion beam instead of the electron beam used in the SEM as the instrument light source. It can perform nano-processing on the sample surface while imaging the surface. In the field of material research and development, it is usually used for sample preparation of precision equipment such as TEM and APT. With the continuous development of nuclear energy, SEM-FIB has gradually become an irreplaceable experimental equipment for sample preparation in the process of nuclear fuel and nuclear structural material research and development. In the focused ion beam processing system, the ion beam drawn from the ion source can be focused to a few nanometers when it reaches the sample surface after acceleration, mass analysis, shaping and other processing. Among them, since radioactive samples are usually tested in lead cans, pre-operations such as opening the can and sampling are required before testing. However, since the samples carry α, γ and other rays during the material inspection after irradiation, the human body cannot directly contact the samples for testing. In this regard, in some technologies, for the detection of radioactive materials, glove holes are set on the equipment, and gloves are set at the glove holes. The operator can put his hand into the equipment through the gloves to process the sample. Based on this, the equipment is required to have higher shielding performance. However, since the equipment has multiple functional openings, such as the sample inlet, sample outlet, air inlet and air outlet, etc., there is a risk of leakage of radioactive materials at the openings, resulting in lower safety.

[0040] Based on the above problems, the present utility model proposes a shielded focused ion beam scanning electron microscope system that can reduce the risk to operators. Refer to Figures 1 to 5 , Figure 1 which is a schematic structural diagram of the shielded focused ion beam scanning electron microscope system according to an embodiment of the present utility model. Figure 2 is Figure 1 a schematic structural diagram after removing the shield cover in Figure 3 is Figure 2 a schematic structural diagram of the front-end device in Figure 4 is Figure 3 another perspective. Figure 5 is Figure 2 a cross-sectional view of . The shielded focused ion beam scanning electron microscope system of this embodiment includes: a shield cover 100, a front-end device 200, an electron microscope device 300, a manipulator 400, and an interaction device 500.

[0041] Among them, the shield cover 100 is a radiation shielding structure. The shield cover 100 is made of materials such as lead and concrete, and the shield cover 100 has a shielding cavity 110. The shield cover 100 also includes an inlet / outlet and a movable door body. The inlet / outlet is used for employees or equipment to enter and exit the shielding cavity 110, and the door body shields or opens the inlet / outlet by moving or rotating. The front-end device 200 is arranged in the shielding cavity 110. The front-end device 200 includes a processing chamber 210 and a chamber door 220 (as shown in Figure 4 ). The processing chamber 210 has a processing cavity 211, a sample inlet 212, an installation port 213, and a docking port 214 (as shown in Figure 3 and Figure 4 ). The sample inlet 212 and the docking port 214 are both communicated with the processing cavity 211. The sample inlet 212 is used for samples to enter the processing cavity 211. The chamber door 220 is movably connected to the processing chamber 210 and is used to shield or open the sample inlet 212. The electron microscope device 300 is arranged in the shielding cavity 110. The electron microscope device 300 includes a detection chamber 310, and the detection chamber 310 is communicated with the docking port 214. The interaction device 500 is connected to the shield cover 100 and is located outside the shield cover 100. The interaction device 500 includes a number of buttons. The buttons can be physical mechanical buttons or virtual buttons on a touch screen. For example, the interaction device 500 includes a controller and a touch module. Both the touch module and the electron microscope device 300 are communicatively connected to the controller. The touch module has a number of touch buttons, and the corresponding touch buttons can correspondingly adjust different working states of the electron microscope device 300, including but not limited to starting and stopping the electron microscope device 300.

[0042] The manipulator 400 includes an execution end 410 (as shown in Figure 5As shown), the manipulator 400 is inserted into the installation port 213, and the execution end 410 is located in the processing chamber 211. For example, the manipulator 400 is arranged in the shielding chamber 110, and the manipulator 400 is connected to the interactive device 500 for communication. The interactive device 500 can adjust the working state of the manipulator 400, and the engineer can stand outside the shielding cover 100 to control the action of the manipulator 400 through the interactive device 500 to complete the action corresponding to the pre-operation. In addition, the interactive device 500 can also include two operating modules, and the two operating modules are used to control the manipulator 400 and the electron microscope device 300 respectively. The operating module is not limited to a touch module, and can also be a keyboard or a dial button. Or, for example, in some embodiments, the end of the manipulator 400 that is away from the execution end 410 also has an operating end 420, the manipulator 400 is inserted into the shielding cover 100, and is sealed with the shielding cover 100, and the operating end 420 is located outside the shielding cover 100, and the operating end 420 is used for the operator to control the execution end 410. This allows an engineer to stand outside the shielding cover 100 and control the action of the execution end 410 through the operation end 420. For example, the execution end 410 is a clamp, and the operation end 420 drives the movement and opening and closing of the clamp through a mechanical transmission mechanism formed by one or a combination of connecting rods, belts or gears. Furthermore, in some embodiments, the manipulator 400 is connected to the interactive device 500 in communication and also includes the operation end 420. Therefore, during use, the manipulator action can be controlled by both the operation end 420 and the interactive device 500, thereby improving the practicality of this embodiment.

[0043] Specifically, during the working process, the lead can containing the sample is placed into the processing chamber 211 through the sample inlet 212 by automatic equipment or manually, and the lead can is opened by the manipulator 400 or other devices. For example, a lifting device 700 (such as Figure 5 As shown), the lifting device 700 has a sling, and the top cover of the lead can has a hook. The sling hooks the hook, and the top cover is opened by moving the sling upward. Specifically, the lifting device 700 is, for example, connected to the controller for communication, and the engineer can adjust the movement of the lifting device 700 through the interactive device 500 to open the top cover, and the top cover is connected to the sample. After the top cover is opened, the sample is automatically taken out. Thereafter, the manipulator 400 is used to place the sample on the conveyor table through the docking port 214, and then sent to the electron microscope equipment 300 for detection and analysis. It can be known that when using the shielded focused ion beam scanning electron microscope system of this embodiment to perform sample detection, the engineer can stand outside the shielding cover 100 to operate the manipulator 400 and the electron microscope equipment 300, thereby improving the safety of the operator.

[0044] Based on the above embodiments, in order to achieve visualization inside the processing chamber 211, in some embodiments, the shielded focused ion beam scanning electron microscope system further includes a camera. The camera is disposed inside the processing chamber 211 for real-time transmission of the image inside the processing chamber 211. Or, as in some embodiments, the shield 100 has a first viewing window 120 (such as Figure 1 shown), and the processing cabin 210 is provided with a second viewing window 230 corresponding to the position of the first viewing window 120 for personnel to observe the inside of the processing chamber 211 outside the shield 100. Taking the first viewing window 120 as an example, the first viewing window 120 includes components such as an outer frame, a middle frame, a lead glass frame, a lead glass pressing frame, lead glass, an inner lead chamber pressing cover, an inner bracket, and an outer lead chamber pressing cover. Among them, the lead glass frame, the lead glass pressing frame, and the lead glass are overlapped in a stepped manner to prevent radiation from leaking from the joints.

[0045] Referring to Figure 2 , in some embodiments, the shielded focused ion beam scanning electron microscope system further includes a filtering assembly 600. The filtering assembly 600 includes an air outlet filter 610. The air outlet filter 610 is communicated with the processing chamber 211 and is used for filtering radioactive aerosol generated inside the processing chamber 211. Specifically, the processing cabin 210 has an air inlet 217 and an air outlet 218 communicated with the processing chamber 211. The filtering assembly 600 includes an air inlet filter 620 and an air outlet filter 610. The air inlet filter 620 is disposed outside the processing cabin 210 and is communicated with the air inlet 217, and the air outlet filter 610 is disposed outside the processing cabin 210 and is communicated with the air outlet 218. Thus, the filtering assembly 600 can be used to perform air change processing on the inside of the processing chamber 211, thereby filtering the radioactive aerosol generated by the sample, and further reducing the influence (including but not limited to damage to electronic components and interference with detection signals) caused by the radiation generated by the radioactive aerosol on the electron microscope device 300, the processing cabin 210, the manipulator 400, etc.

[0046] Referring to Figure 5, in some embodiments, the filtering assembly 600 further includes an air extraction pipe 630. The air extraction pipe 630 is communicated with the air outlet filter 610. The air extraction pipe 630 extends into the processing chamber 211. The air extraction pipe 630 has an air extraction port 631. The distance between the air extraction port 631 and the top wall of the processing chamber 211 is L1, and the distance between the air extraction port 631 and the bottom wall of the processing chamber 211 is L2, and L1 > L2. Specifically, since the density of the radioactive aerosol is greater than that of air, in the processing chamber 211, the radioactive aerosol is located at the bottom of the processing chamber 211. Based on this, in this embodiment, the air extraction pipe 630 is used to extend into the processing chamber 211. The distance between the air extraction port 631 and the top wall of the processing chamber 211 is L1, which is greater than the distance between the air extraction port 631 and the bottom wall of the processing chamber 211, that is, the air extraction port 631 is closer to the bottom wall of the processing chamber 211, so as to facilitate the extraction and filtration of the aerosol in the processing chamber 211.

[0047] Referring to Figure 4 , in some embodiments, the processing chamber 210 further has a sampling port 216. The sampling port 216 is communicated with the processing chamber 311. The sampling port 216 is used for sampling the radioactive aerosol generated in the processing chamber 211 to detect the concentration of the aerosol in the processing chamber 211. Specifically, it can be understood that whether it is the electron microscope device 300, the manipulator 400 or the processing chamber 210, their radiation resistance capabilities all have certain limits. If the concentration of the aerosol in the processing chamber 211 is too high, it will damage the electron microscope device 300, the manipulator 400 and even the processing chamber 210. Based on this, this embodiment also provides a sampling port 216 to detect the concentration of the radioactive aerosol in the processing chamber 211 through the sampling port 216. When the detected concentration of the radioactive aerosol is too high, the filtering ability of the filtering assembly 600 can be increased, or the operation can be stopped and the filtering assembly 600 can be maintained at the same time, so as to reduce the impact of high radiation on the equipment. In addition, when the engineer maintains the equipment, it is also possible to detect whether the concentration of the radioactive aerosol in the processing chamber 211 meets the standard based on this, thereby avoiding damage to the engineer. Further, in some embodiments, the sampling port 216 is located at the corresponding air extraction port 631 of the processing chamber 210. Specifically, because the area near the air extraction port 631 is where the aerosol accumulates, as long as the concentration of the radioactive aerosol at this location is lower than the safety value, the concentration of the aerosol at other positions will also be lower than the safety value. Therefore, the sampling port 216 is arranged at the position of the processing chamber 210 corresponding to the air extraction port 631 to improve the detection accuracy of the aerosol concentration, thereby improving the safety of the equipment and the engineer.

[0048] In some embodiments, the processing chamber 211 includes a first chamber 2111 and a second chamber 2112, as well as a channel 2113 connecting the first chamber 2111 and the second chamber 2112. The sample inlet 212 communicates with the first chamber 2111, and the docking port 214 communicates with the second chamber 3112. The pre-device 200 further includes a shielding door 240, which is movably connected to the processing chamber 210 and is used to shield or open the channel 2113. The filtering assembly 600 includes at least two air outlet filters 610, and both the first chamber 2111 and the second chamber 2112 are connected to at least one air outlet filter 610. Correspondingly, the filtering assembly 600 includes at least two air inlet filters 620, and the at least two air inlet filters 620 are respectively connected to the first chamber 2111 and the second chamber 2112. Thus, during the working process, the lead canister is placed into the first chamber 2111 through the sample inlet 212, the channel 2113 is shielded by the shielding door 240, the top cover of the lead canister is opened to take out the sample, and the aerosol in the first chamber 2111 is filtered by the filtering assembly 600. After a certain period of time, the channel 2113 is opened, and the sample is moved to the second chamber 2112, thereby greatly reducing the concentration of the aerosol in the second chamber 2112 and reducing the impact of radiation on the electron microscope device 300. Specifically, for example, sampling ports 216 are provided in both the first chamber 2111 and the second chamber 2112, and the concentrations of the aerosol in the first chamber 2111 and the second chamber 2112 can be independently detected through the two sampling ports 216. After the concentration of the aerosol in the first chamber 2111 is lower than the safety value, the channel 2113 is opened.

[0049] Based on the above embodiments, in order to make the manufacturing of the processing chamber 210 simpler, the processing chamber 210 includes a first chamber body 201 and a second chamber body 202. The first chamber body 201 has a first chamber 2111, as well as a sample inlet 212 and a first communication port communicating with the first chamber 2111. The second chamber body 202 has a second chamber 2112, as well as a docking port 214 and a second communication port communicating with the second chamber 2112. The outer wall of the first chamber body 201 is connected to the outer wall of the second chamber body 202, and the first communication port is docked with the second communication port to form the channel 2113. The shielding door 240 is connected to either the first chamber body 201 or the second chamber body 202 through a movable connection such as a movable connection or a rotational connection.

[0050] Refer to Figure 6 , Figure 6 For Figure 3Schematic diagram of another perspective. On the basis of the above embodiments, the shielded focused ion beam scanning electron microscope system further includes a moving mechanism. The moving mechanism includes a moving platform 800, which is movably connected to the processing chamber 210 and can move between the first chamber 2111 and the second chamber 2112. Thus, during the working process, the moving platform 800 can be used to transport the sample, without using the manipulator 400 to pass through the channel 2113, thereby reducing the movement radius of the manipulator 400. As a result, the volume of the first chamber 2111 can be reduced, and then the structure of the first chamber 201 can be made more compact, so as to save the manufacturing cost and floor area of the first chamber 201. Specifically, the shielded focused ion beam scanning electron microscope system includes two manipulators 400, which respectively pass through the first chamber 201 and the second chamber 202. During the working process, the sample is placed on the moving platform 800 by the manipulator 400 in the first chamber. The moving platform 800 can be driven by a driving device, or the manipulator can be used to push the moving platform 800 to move the sample from the first chamber 2111 to the second chamber 2112, and then the manipulator 400 in the second chamber 2112 is used to place the sample into the electron microscope device 300.

[0051] Referring to Figure 4 , in some embodiments, the processing chamber 210 further has a glove port 215. The shielded focused ion beam scanning electron microscope system further includes gloves, which are made of radiation-proof rubber material. The gloves are connected to the glove port 215 and can extend into the processing cavity 211. Thus, during the maintenance of the equipment, engineers can use the protective gloves to extend their hands into the processing cavity 211 for maintenance, thereby improving the safety during maintenance.

[0052] In some embodiments, the shielded focused ion beam scanning electron microscope system further includes a seal. The seal is a radiation-proof structure and is arranged between the inner wall of the mounting port 213 and the manipulator 400, so as to prevent radioactive aerosol from flowing out of the processing cavity 211 through the gap between the manipulator 400 and the inner wall of the mounting port 213, and then reduce the concentration of aerosol in the shielding cavity 110. Specifically, it can be understood that if the aerosol in the processing cavity 211 leaks into the shielding cavity 110, in order to ensure the safety of engineers and equipment, it is necessary to perform radiation elimination treatment on the shielding cavity 110, thereby increasing the use cost of the equipment. In this embodiment, a seal is arranged between the manipulator 400 and the inner wall of the reserved hole, which can effectively reduce the risk of aerosol leakage in the processing cavity 211, thus reducing the use cost.

[0053] On the basis of the above embodiments, the seal is a flexible structure, for example, made of flexible graphite or a flexible graphite composite material, so that the seal has a certain flexibility. Therefore, during the operation of the manipulator 400, the flexible seal can effectively absorb the vibration generated by the manipulator 400, which can not only reduce the damage to the manipulator 400 and the processing chamber 210, but also effectively maintain the sealing performance between the inner wall of the mounting port 213 and the manipulator 400.

[0054] The embodiments of the present invention have been described in detail above in conjunction with the accompanying drawings. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those of ordinary skill in the art, various changes can be made without departing from the gist of the present invention. In addition, in the description of the present invention, the descriptions with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples", etc. mean that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

Claims

1. A shielded focused ion beam scanning electron microscope system, characterized in that include: The shielding cover is a radiation shielding structure, and the shielding cover has a shielding cavity; A front device is arranged in the shielding chamber, the front device includes a processing chamber and a door, the processing chamber has a processing chamber, an injection port, a mounting port and a docking port, the injection port and the docking port are both connected to the processing chamber, the injection port is used for allowing samples to enter the processing chamber, and the door is movably connected to the processing chamber, and is used to cover or open the injection port; An electron microscope device is arranged in the shielding cavity, and the electron microscope device includes a detection chamber, and the detection chamber is communicated with the docking port; A manipulator, comprising an execution end, the manipulator is inserted through the installation opening, and the execution end is located in the processing chamber; The interactive device is located outside the shielding cover, and the interactive device includes a plurality of buttons, and the buttons are used to adjust the working state of the electron microscope equipment.

2. The shielded focused ion beam scanning electron microscope system according to claim 1, wherein The shielded focused ion beam scanning electron microscope system also includes a filter assembly, which includes an air outlet filter. The air outlet filter is connected to the processing chamber and is used to filter the radioactive aerosol generated in the processing chamber.

3. The shielded focused ion beam scanning electron microscope system according to claim 2, wherein The filter assembly also includes an exhaust pipe, which is connected to the air outlet filter and extends into the processing chamber. The exhaust pipe has an exhaust port, and the distance between the exhaust port and the top wall of the processing chamber is L1, and the distance between the exhaust port and the bottom wall of the processing chamber is L2, L1>L2.

4. The shielded focused ion beam scanning electron microscope system according to claim 3, wherein The processing chamber also has a sampling port, which is communicated with the processing chamber and is used for a tool to collect radioactive aerosols generated in the processing chamber.

5. The shielded focused ion beam scanning electron microscope system according to claim 2, characterized in that, The processing chamber includes a first chamber and a second chamber, and a passage connecting the first chamber and the second chamber, the injection port is connected to the first chamber, the docking port is connected to the second chamber, and the front device also includes a shielding door, which is movably connected to the processing chamber and is used to shield or open the passage; The filter assembly includes at least two air outlet filters, and the first chamber and the second chamber are both connected to at least one of the air outlet filters.

6. The shielded focused ion beam scanning electron microscope system according to claim 5, characterized in that, The shielded focused ion beam scanning electron microscope system further includes a moving mechanism, wherein the moving mechanism includes a moving platform, and the moving platform is capable of moving between the first chamber and the second chamber.

7. The shielded focused ion beam scanning electron microscope system according to claim 1, wherein, The shielding cover has a first visual window, and the processing chamber is provided with a second visual window at a position corresponding to the first visual window, so that personnel can observe the processing chamber from outside the shielding cover.

8. The shielded focused ion beam scanning electron microscope system according to claim 7, characterized in that The processing chamber also has a glove opening, and the shielded focused ion beam scanning electron microscope system also includes gloves, which are made of radiation-proof material. The gloves are connected to the glove opening and can be inserted into the processing chamber.

9. The shielded focused ion beam scanning electron microscope system according to claim 1, characterized in that, The manipulator is disposed in the shielding chamber, the manipulator is communicatively connected with the interaction device, and the interaction device can adjust the working state of the manipulator; and / or, The end of the manipulator away from the execution end also has an operating end. The manipulator is inserted through the shielding cover and is sealed with the shielding cover. The operating end is located outside the shielding cover and is used for an operator to manipulate the execution end.

10. The shielded focused ion beam scanning electron microscope system according to claim 1, wherein The shielded focused ion beam scanning electron microscope system further includes a seal, the seal is a radiation-proof flexible structure, and the seal is arranged between the inner wall of the mounting opening and the manipulator.

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