Silicon carbide crystal carrier and processing equipment

Abstract

The utility model provides a silicon carbide crystal carrier and processing equipment, belongs to the technical field of silicon carbide crystal processing, and solves the problem of poor positioning stability of the silicon carbide crystal carrier in the prior art. The utility model comprises a body, a bulge and an air passage. The multiple protrusions are arranged on the body, adsorption grooves are formed between the protrusions, and the adsorption grooves are used for adsorbing workpieces; the air channel is arranged in the body and communicated with the adsorption tank. According to the silicon carbide crystal carrier, by arranging the protrusions and the adsorption grooves, the face, bearing the crystals, of the body becomes uneven, when the silicon carbide crystals are placed on the protrusions and the adsorption grooves, the friction force of the face is remarkably increased, the crystals are not prone to sliding and shifting due to stress, and it is guaranteed that the silicon carbide crystal carrier has high positioning stability; the crystal processing quality is improved; the anti-skid pads are arranged on the protrusions, and the rough surfaces of the anti-skid pads abut against the silicon carbide crystals, so that the friction coefficient when the carrier adsorbs the silicon carbide crystals can be further improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of silicon carbide crystal processing, and more specifically, relates to a silicon carbide crystal carrier and processing equipment. Background Art

[0002] The processing of silicon carbide crystals requires multiple processes. In each process, a silicon carbide crystal needs a carrier to provide support and requires a high positioning accuracy to reduce processing errors.

[0003] Existing silicon carbide crystal carriers generally clamp and fix the crystal through clamping parts. However, when the clamping parts fix the rotating crystal for processing, it is necessary to clamp from the outer periphery of the crystal, resulting in a relatively large size of the equipment. In addition to the clamping and fixing method, the prior art also uses ordinary vacuum suction cups with a flat bearing surface and multiple suction holes provided on the bearing surface. A strong vacuum suction force needs to be provided, otherwise problems such as crystal offset or even detachment are likely to occur, thereby reducing the processing quality of the crystal.

[0004] Based on the above, the technical problem to be solved by this application is: how to improve the positioning stability of the silicon carbide crystal carrier. Summary of the Invention

[0005] The purpose of the utility model is to address the above problems existing in the prior art by proposing a silicon carbide crystal carrier and crystal processing equipment, which solves the problem of poor positioning stability of the existing silicon carbide crystal carrier. The technical effect of the solution of this application is: improving the positioning stability of the silicon carbide crystal carrier.

[0006] The purpose of the utility model can be achieved by the following technical solutions: a silicon carbide crystal carrier, comprising: a body; protrusions, a plurality of the protrusions are respectively arranged on the body, and adsorption grooves are formed between the protrusions for adsorbing workpieces; and an air channel arranged in the body and communicating with the adsorption grooves.

[0007] It can be understood that by providing the protrusions and adsorption grooves, the surface of the body for carrying the crystal becomes uneven. When the silicon carbide crystal is placed on the protrusions and adsorption grooves, the friction force on this surface is significantly increased. In particular, during the end face grinding of the crystal, when the grinding head acts on the end face of the crystal, the crystal is not easily affected and slides and offsets, ensuring that the silicon carbide crystal carrier has high positioning stability, thereby improving the crystal processing quality.

[0008] In the above-mentioned silicon carbide crystal carrier, an anti-slip pad is provided on the protrusion, and a rough surface is provided on the anti-slip pad, and the rough surface is used to abut against the workpiece. It can be understood that the workpiece refers to a silicon carbide crystal or an object with a similar size and material to the silicon carbide crystal. Existing silicon carbide crystals are generally 12 inches and below. With the expansion of market demand, it can be further applicable to larger-sized crystals in the future, such as 16 inches, 20 inches, etc. By providing an anti-slip pad on the protrusion and abutting the rough surface of the anti-slip pad against the silicon carbide crystal, the friction coefficient when the carrier adsorbs the silicon carbide crystal can be further increased, thereby improving the positioning stability of the silicon carbide crystal carrier.

[0009] In the above-mentioned silicon carbide crystal carrier, the protrusion and the anti-slip pad are adhesively bonded. It can be understood that by adopting the adhesive bonding method, the protrusion and the anti-slip pad are composed of different components. After the protective pad is used multiple times, it can be disassembled and removed for replacement, thereby avoiding damage to the protrusion and prolonging the overall service life of the silicon carbide crystal carrier. Exemplarily, the anti-slip pad can be connected to the protrusion by curing hot melt adhesive, or can be connected to the protrusion by directly applying an adhesive.

[0010] In the above-mentioned silicon carbide crystal carrier, the anti-slip pad is made of polyurethane or silica gel. It can be understood that by using materials such as polyurethane or silica gel, not only can a relatively large friction coefficient be ensured during adsorption, but the deformation amount during stress is not too large, and the influence on the processing accuracy can be ignored.

[0011] In the above-mentioned silicon carbide crystal carrier, at least one of the protrusions is annular, and the adsorption grooves between the protrusions are annular. It can be understood that by configuring at least one protrusion to be annular, it can be adapted to the outer circular contour of the crystal, and the adsorption grooves are configured to be annular, so that the force on the crystal is more uniform and the provided adsorption stability is better.

[0012] In the above-mentioned silicon carbide crystal carrier, the protrusions include one or more of annular, disc-shaped, strip-shaped, and block-shaped. It can be understood that by providing protrusions of various shapes, silicon carbide crystals with various morphologies and plane inclinations can be adapted.

[0013] In the above-mentioned silicon carbide crystal carrier, the adsorption groove is provided with through holes, and the through holes communicate with the air ducts. It can be understood that by providing through holes to communicate with the air ducts, the gas in the adsorption groove is evacuated to the air ducts to form a vacuum, so that the adsorption groove has a negative pressure adsorption force to adsorb the silicon carbide crystal. Exemplarily, the number of through holes is at least 1. Appropriately increasing the number of through holes can improve the vacuum pumping / breaking efficiency, but too many through holes or too large through hole sizes will affect the magnitude of the negative pressure adsorption force.

[0014] In the above-mentioned silicon carbide crystal carrier, at least one of the side wall and the bottom of the main body has an opening, and the opening communicates with the air duct. The opening is used for vacuum pumping / breaking vacuum. It can be understood that when there are 2 openings, that is, openings are provided on both the side wall and the bottom, one of the openings needs to be blocked, and the other needs to be connected to an external vacuum mechanism for vacuum pumping / breaking vacuum. When there is 1 opening, it only needs to be connected to an external vacuum mechanism to perform the vacuum pumping / breaking vacuum operation.

[0015] In the above-mentioned silicon carbide crystal carrier, a quick connector is provided on the opening, and the quick connector is detachably connected to the opening. It can be understood that by providing a detachable quick connector, it can be quickly and conveniently connected to the vacuum mechanism.

[0016] Another object of the present invention is also to provide a silicon carbide crystal processing device, including the above-mentioned silicon carbide crystal carrier. Exemplarily, the silicon carbide crystal processing device can be a grinding device, or a cutting device, a cleaning device, a polishing device, etc. Specifically, the silicon carbide crystal carrier of the present application can be applied to the conveying process or the processing process of various devices.

[0017] Compared with the prior art, the present invention has the following beneficial effects:

[0018] 1. By setting the protrusions and the adsorption grooves in the present application, the surface of the main body for carrying the crystal can be made uneven. When the silicon carbide crystal is placed on the protrusions and the adsorption grooves, the friction force on this surface is significantly increased. In particular, when the end face of the crystal is ground, the grinding head acts on the end face of the crystal, and the crystal is not easily affected and slides and shifts, ensuring that the silicon carbide crystal carrier has high positioning stability, thereby improving the crystal processing quality.

[0019] 2. By providing an anti-slip pad on the protrusions and abutting the rough surface of the anti-slip pad against the silicon carbide crystal in the present application, the friction coefficient when the carrier adsorbs the silicon carbide crystal can be further increased, thereby improving the positioning stability of the silicon carbide crystal carrier.

[0020] 3. By configuring at least 1 protrusion to be annular in the present application, it can be adapted to the outer circle contour of the crystal, and the adsorption groove is configured to be annular, so that the force on the crystal is more uniform and the provided adsorption stability is better. Description of the Drawings

[0021] Figure 1 is a structural schematic diagram of the silicon carbide crystal carrier of the present application Figure 1 ;

[0022] Figure 2 is Figure 1 a cross-sectional structural schematic diagram of the structure shown;

[0023] Figure 3Schematic structure of the silicon carbide crystal carrier of the present application Figure 2 ;

[0024] Figure 4 is Figure 3 Schematic cross-sectional structure diagram of the shown structure;

[0025] In the figure, 100 is the main body; 110 is the opening; 120 is the quick-insert joint; 130 is the plugging member; 200 is the protrusion; 210 is the adsorption groove; 211 is the through hole; 220 is the anti-slip pad; 221 is the rough surface; 300 is the air duct. Detailed implementation manners

[0026] In order to make the above objects, features and advantages of the present utility model more obvious and understandable, the following will describe the detailed implementation manners of the present utility model in conjunction with the accompanying drawings. Many specific details are set forth in the following description in order to fully understand the present utility model. However, the present utility model can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present utility model. Therefore, the present utility model is not limited by the specific embodiments disclosed below.

[0027] In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present utility model.

[0028] In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present utility model, the meaning of "a plurality" is at least two, such as two, three, etc., unless otherwise specifically defined.

[0029] In the present utility model, unless otherwise clearly defined and limited, terms such as "installation", "connection", "attachment", "fixation", etc. shall be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral one; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal communication of two components or the interaction relationship between two components, unless otherwise clearly defined. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0030] In the present utility model, unless otherwise clearly defined and limited, the first feature being "on" or "under" the second feature can be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature can be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature is at a higher horizontal level than the second feature. The first feature being "under", "beneath" and "underneath" the second feature can be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature is at a lower horizontal level than the second feature.

[0031] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or there can also be an intermediate element. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there may be an intermediate element at the same time. The terms "vertical", "horizontal", "up", "down", "left", "right" and similar expressions used herein are only for illustrative purposes and do not represent the only implementation.

[0032] Please refer to the Figure 1 and Figure 2 of the specification drawings. The present application includes a main body 100, protrusions 200 and an air passage 300. There are multiple protrusions 200 which are respectively disposed on the main body 100, and adsorption grooves 210 are formed between the protrusions 200 for adsorbing workpieces; the air passage 300 is disposed inside the main body 100 and communicates with the adsorption grooves 210.

[0033] It can be understood that by providing the protrusions 200 and the adsorption grooves 210, the surface of the main body 100 for carrying the crystal can be made uneven. When the silicon carbide crystal is placed on the protrusions 200 and the adsorption grooves 210, the friction force of this surface is significantly increased. In particular, during the end face grinding process of the crystal, when the grinding head acts on the end face of the crystal, the crystal is not easily affected and slides or shifts, ensuring that the silicon carbide crystal carrier has high positioning stability, thereby improving the quality of crystal processing.

[0034] In some embodiments, such as Figure 1and Figure 2 As shown, an anti-slip pad 220 is provided on the protrusion 200, and a rough surface 221 is provided on the anti-slip pad 220 for abutting against the workpiece. It can be understood that the workpiece refers to a silicon carbide crystal or an object with a similar size and material to the silicon carbide crystal. Existing silicon carbide crystals are generally 12 inches or less. With the expansion of market demand, it can be applicable to larger-sized crystals in the future, such as 16 inches, 20 inches, etc. By providing the anti-slip pad 220 on the protrusion 200 and abutting the rough surface 221 of the anti-slip pad 220 against the silicon carbide crystal, the friction coefficient when the carrier adsorbs the silicon carbide crystal can be further increased, thereby improving the positioning stability of the silicon carbide crystal carrier.

[0035] In some embodiments, the protrusion 200 and the anti-slip pad 220 are adhesively bonded. It can be understood that by adopting the adhesive bonding method, the protrusion 200 and the anti-slip pad 220 are composed of different components. After the protective pad is used multiple times, it can be disassembled and removed for replacement, thereby avoiding damage to the protrusion 200 and extending the overall service life of the silicon carbide crystal carrier. Exemplarily, the anti-slip pad 220 can be connected to the protrusion 200 by curing hot melt adhesive, or can be connected to the protrusion 200 by directly applying an adhesive.

[0036] In some embodiments, the anti-slip pad 220 is made of polyurethane or silica gel. It can be understood that by using materials such as polyurethane or silica gel, it can not only ensure a large friction coefficient during adsorption, but also the deformation amount during force application is not too large, and the influence on the processing accuracy can be ignored.

[0037] In some embodiments, such as Figure 1 As shown, at least one protrusion 200 is annular, and the adsorption grooves 210 between the protrusions 200 are annular. It can be understood that by configuring at least one protrusion 200 to be annular, it can be adapted to the outer circle contour of the crystal. The adsorption grooves 210 are configured to be annular, and the force on the crystal is more uniform, providing better adsorption stability.

[0038] In some embodiments, the protrusion 200 includes one or more of annular, disc-shaped, strip-shaped, and block-shaped. It can be understood that by providing protrusions 200 in various shapes, silicon carbide crystals with various morphologies and plane inclinations can be adapted.

[0039] In some embodiments, the adsorption tank 210 is provided with a through hole 211, and the through hole 211 communicates with the air duct 300. It can be understood that by setting the through hole 211 to communicate with the air duct 300, the gas in the adsorption tank 210 is evacuated to the air duct 300 to form a vacuum, so that the adsorption tank 210 has a negative pressure adsorption force to adsorb the silicon carbide crystal. Exemplarily, the number of the through holes 211 is at least one. Appropriately increasing the number of the through holes 211 can improve the vacuum pumping / vacuum breaking efficiency, but too many through holes 211 or too large a size of the through holes 211 will affect the magnitude of the negative pressure adsorption force.

[0040] See Figure 2 , in some embodiments, at least one of the side wall and the bottom of the main body 100 has an opening 110, and the opening 110 communicates with the air duct 300. The opening 110 is used for vacuum pumping / vacuum breaking. It can be understood that when there are two openings 110, that is, openings 110 are provided on both the side wall and the bottom, one of the openings 110 needs to be blocked by a blocking member 130, as Figure 3 and Figure 4 shown, the other needs to be connected to an external vacuum mechanism for vacuum pumping / vacuum breaking. When there is one opening 110, it only needs to be connected to an external vacuum mechanism (not shown in the figure) to perform the vacuum pumping / vacuum breaking operation.

[0041] See Figure 3 and Figure 4 , in some embodiments, a quick connector 120 is provided on the opening 110, and the quick connector 120 is detachably connected to the opening 110. It can be understood that by providing the detachable quick connector 120, it can be quickly and conveniently connected to the vacuum mechanism.

[0042] Another object of the present invention is also to provide a silicon carbide crystal processing device (not shown in the figure), including a silicon carbide crystal carrier. Exemplarily, the silicon carbide crystal processing device can be a grinding device, or a cutting device, a cleaning device, a polishing device, etc. Specifically, the silicon carbide crystal carrier of the present application can be applied to the conveying process or the processing process of various devices.

[0043] Beneficial effects:

[0044] In this application, by providing the protrusions 200 and the adsorption grooves 210, the surface of the main body 100 for carrying the crystal can be made uneven. When the silicon carbide crystal is placed on the protrusions 200 and the adsorption grooves 210, the friction force on this surface is significantly increased. In particular, during the end face grinding process of the crystal, when the grinding head acts on the end face of the crystal, the crystal is not easily affected and slides or shifts, ensuring that the silicon carbide crystal carrier has high positioning stability, thereby improving the crystal processing quality. By providing the anti-slip pads 220 on the protrusions 200 and bringing the rough surfaces 221 of the anti-slip pads 220 into contact with the silicon carbide crystal, the friction coefficient when the carrier adsorbs the silicon carbide crystal can be further increased, thereby improving the positioning stability of the silicon carbide crystal carrier. By configuring at least one of the protrusions 200 to be annular, it can be adapted to the outer circle contour of the crystal, and the adsorption grooves 210 are configured to be annular, so that the force on the crystal is more uniform and the provided adsorption stability is better.

[0045] The specific embodiments described herein are merely illustrative of the spirit of the present invention. Those skilled in the art of the present invention can make various modifications or supplements to the described specific embodiments or use similar methods for substitution, but will not deviate from the spirit of the present invention or exceed the scope defined by the appended claims.

Claims

1. A silicon carbide crystal carrier, characterized in that, Comprising: A body (100); Protrusions (200), multiple of which are respectively arranged on the body (100), and adsorption grooves (210) are formed between the protrusions (200), and the adsorption grooves (210) are used for adsorbing workpieces; And An air passage (300) which is arranged inside the body (100) and communicates with the adsorption grooves (210).

2. The silicon carbide crystal carrier according to claim 1, wherein, An anti-slip pad (220) is provided on the protrusion (200), and a rough surface (221) is provided on the anti-slip pad (220), and the rough surface (221) is used for abutting against the workpiece.

3. The silicon carbide crystal carrier according to claim 2, characterized in that, The protrusion (200) and the anti-slip pad (220) are adhesively bonded.

4. The silicon carbide crystal carrier according to claim 2, wherein The anti-slip pad (220) is made of polyurethane or silica gel.

5. The silicon carbide crystal carrier according to claim 1, wherein At least one of the protrusions (200) is annular, and the adsorption grooves (210) between the protrusions (200) are annular.

6. The silicon carbide crystal carrier according to claim 1, wherein The protrusions (200) include one or more of annular, disc-shaped, strip-shaped and block-shaped.

7. The silicon carbide crystal carrier according to claim 1, characterized in that The adsorption groove (210) is provided with a through hole (211), and the through hole (211) communicates with the air passage (300).

8. The silicon carbide crystal carrier according to claim 1, characterized in that, At least one of the side wall and the bottom of the body (100) has an opening (110), and the opening (110) communicates with the air passage (300), and the opening (110) is used for vacuum pumping / breaking vacuum.

9. The silicon carbide crystal carrier according to claim 8, characterized in that, A quick connector (120) is provided on the opening (110), and the quick connector (120) is detachably connected to the opening (110).

10. A silicon carbide crystal processing device, characterized in that, Comprising the silicon carbide crystal carrier according to any one of claims 1-9.

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