Semiconductor chip cleaning agent production and impurity removal equipment

Abstract

The utility model relates to the technical field of cleaning agent production, in particular to semiconductor chip cleaning agent production and impurity removal equipment, which not only filters a cleaning agent twice to improve the filtering and impurity removal effect, but also accelerates the filtering and impurity removal speed of the cleaning agent to improve the working efficiency. Comprising a collecting mechanism; the device further comprises a feeding mechanism, a filtering mechanism, an extrusion mechanism and a centrifugal mechanism, the feeding mechanism is installed on the collecting mechanism and facilitates feeding of the cleaning agent, the filtering mechanism is installed on the feeding mechanism and filters the cleaning agent, and the extrusion mechanism is installed on the feeding mechanism and accelerates the cleaning agent to pass through the filtering mechanism. The centrifugal mechanism is installed on the filtering mechanism and conducts secondary filtering on the cleaning agent.

Description

Technical Field

[0001] The utility model relates to the technical field of cleaning agent production, in particular to an impurity removal device for semiconductor chip cleaning agent production. Background Technique

[0002] Semiconductor chip cleaning agents are solvents used to clean stains, organic and inorganic residues between the surfaces of semiconductor chips and devices. When using semiconductor water-based cleaning agents, deionized water can be heated to 40 - 60 °C, and then the cleaning solution can be prepared according to a certain volume ratio.

[0003] Existing impurity removal devices for cleaning agent production, such as a cleaning agent production impurity removal device disclosed in the utility model patent with the application number 202323385724.6, its main structure includes a bottom plate and a machine body. A cleaning agent production impurity removal structure is provided on the bottom plate. The cleaning agent production impurity removal structure includes a first outer shell, the lower surface of the first outer shell is fixedly connected to the upper surface of the bottom plate, one end of a limiting rod is slidably connected to a slideway machined on the inner wall of the first outer shell, and a vertical rod passes through the first outer shell and is sleeved with the first outer shell; during use, the cleaning agent is fed into the machine body through a feed port, impurities are filtered and removed through a filter screen, and at the same time, the external power supply of the motor is connected. When the motor starts, it can drive the first disc to rotate, drive the second disc to rotate in the first outer shell through a belt, drive a driving strip to swing up and down in the first outer shell through a cylinder protruding on the second disc, drive the vertical rod to move up and down in the first outer shell, and at the same time drive the limiting rod to slide up and down on the slideway machined on the inner wall of the first outer shell. When the vertical rod moves up and down, it drives a bent rod to slide up and down on the slideway machined on the machine body to strike the filter screen, causing the filter screen to vibrate and preventing blockage on the filter screen. The impurity-removed cleaning agent is pumped out through a discharge port for collection, and then the door is opened to clean the impurities on the filter screen.

[0004] However, most cleaning agents are relatively viscous, and relying solely on gravity for natural flow results in relatively low filtration efficiency. Moreover, most existing impurity removal devices only perform impurity removal once, and the impurity removal effect is poor. Summary of the Utility Model

[0005] To solve the above technical problems, the utility model provides an impurity removal device for semiconductor chip cleaning agent production that not only filters the cleaning agent twice, improves the impurity removal effect of filtration, but also accelerates the filtration and impurity removal speed of the cleaning agent and improves work efficiency.

[0006] An impurity removal device for the production of a semiconductor chip cleaning agent of the present utility model includes a collection mechanism; it also includes a feeding mechanism, a filtering mechanism, an extrusion mechanism, and a centrifugal mechanism. The feeding mechanism is installed on the collection mechanism to facilitate the feeding of the cleaning agent. The filtering mechanism is installed on the feeding mechanism to filter the cleaning agent. The extrusion mechanism is installed on the feeding mechanism to accelerate the cleaning agent to pass through the filtering mechanism. The centrifugal mechanism is installed on the filtering mechanism to perform secondary filtering on the cleaning agent. The staff adds the cleaning agent to be filtered into the feeding mechanism, starts the extrusion mechanism to make the cleaning agent accelerate through the filtering mechanism. The impurities in the cleaning agent are blocked by the filtering mechanism. The cleaning agent after primary filtering enters the centrifugal mechanism, and the centrifugal mechanism performs secondary centrifugal filtering on the cleaning agent. The flying cleaning agent is collected in the collection mechanism and then discharged.

[0007] Preferably, the collection mechanism includes a collection cylinder, a downward slide plate, a discharge pipe, and a valve. The bottom end of the collection cylinder is connected to the ground. There is a cavity inside the collection cylinder, and a sewage extraction port is opened on the collection cylinder. The downward slide plate is installed at the bottom end inside the cavity of the collection cylinder. The top end of the discharge pipe is communicated with the bottom end inside the collection cylinder. The valve is installed on the discharge pipe. The flying cleaning agent after centrifugal filtering by the extrusion mechanism is collected in the cavity of the collection cylinder. Under the action of gravity, the cleaning agent converges into the discharge pipe along the downward slide plate. The valve is opened, and the cleaning agent is discharged from the device through the discharge pipe.

[0008] Preferably, the feeding mechanism includes a storage cylinder, a feeding pipe, a sealing cover, a hinge, a sewage discharge cover, and a handle. The bottom end of the storage cylinder is connected to the top end of the collection cylinder. There is an inner cavity inside the storage cylinder. The inner cavity of the storage cylinder is communicated with the cavity inside the collection cylinder. The bottom end of the feeding pipe is communicated with the top end inside the storage cylinder. The sealing cover is installed on the feeding pipe. There is a sewage discharge port on the storage cylinder. The hinge is installed at the sewage discharge port of the storage cylinder. The sewage discharge cover is installed on the hinge. The handle is installed on the sewage discharge cover. The staff opens the sealing cover and pours the cleaning agent into the inner cavity of the storage cylinder through the feeding pipe. The cleaning agent is filtered by the filtering mechanism and the extrusion mechanism. When the filtering is completed, the staff pulls the handle to open the sewage discharge cover and clears the impurities remaining on the filtering mechanism.

[0009] Preferably, the filtering mechanism includes a filter plate, a funnel 1, a support rod, and multiple groups of sleeves. The filter plate is installed at the connection between the cavity of the collection cylinder and the inner cavity of the storage cylinder. The top end of the funnel 1 is connected to the bottom end of the filter plate. Multiple groups of support rods are all installed inside the cavity of the collection cylinder. The sleeves are installed on multiple groups of support rods and are communicated with the bottom end inside the funnel 1. The cleaning agent in the inner cavity of the storage cylinder flows downward under the action of gravity. The cleaning agent passes through the filter plate and then enters the funnel 1 and the sleeves. By setting multiple groups of support rods, the stability of the sleeves and the funnel 1 is enhanced.

[0010] Preferably, the extrusion mechanism includes a first motor, a first speed reducer, a first transmission shaft, and a spiral blade. The bottom end of the first motor is connected to the top end of the storage cylinder, the bottom end of the first speed reducer is connected to the top end of the storage cylinder, the first transmission shaft is rotatably installed in the inner cavity of the storage cylinder and is longitudinally connected to the first speed reducer, and the spiral blade is installed on the first transmission shaft. When the first motor is started, the first motor drives the first transmission shaft to rotate through the first speed reducer, and the first transmission shaft drives the spiral blade to rotate to pressurize and convey the cleaning agent, accelerating the cleaning agent to pass through the filter plate for filtration, thereby improving the filtration efficiency.

[0011] Preferably, the centrifugal mechanism includes a second motor, a second speed reducer, a second transmission shaft, a centrifugal cylinder, a second funnel, and a baffle. The bottom end of the second motor is connected to the bottom end of the collection cylinder, the bottom end of the second speed reducer is connected to the bottom end of the collection cylinder, the second transmission shaft is rotatably installed on the lower slide plate, the bottom end of the centrifugal cylinder is connected to the top end of the second transmission shaft, the bottom end of the second funnel is connected to the top end of the centrifugal cylinder and is rotationally communicated with the top end of the sleeve, a second sewage extraction port is formed on the second funnel, and the baffle is installed in the cavity of the collection cylinder. The cleaning agent enters the centrifugal cylinder through the first funnel and the sleeve. When the second motor is started, the second motor drives the second transmission shaft and the centrifugal cylinder to rotate through the second speed reducer. The centrifugal cylinder rotates to throw out the cleaning agent, and the impurities remain in the centrifugal cylinder, performing secondary filtration on the cleaning agent. By providing the second funnel and the first funnel, the upward reverse transportation of the cleaning agent is avoided, and by providing the baffle, the splashing of the cleaning agent into the inner cavity of the storage cylinder is avoided.

[0012] Preferably, a ceramic filter membrane is attached to the inner wall of the centrifugal cylinder. The ceramic filter membrane has good mechanical strength and pore stability performance, can withstand high-pressure filtration, ensure the filtration effect and the service life of the membrane, and has a high filtration accuracy and a fast filtration speed, which can facilitate the discharge of the cleaning agent.

[0013] Compared with the prior art, the beneficial effects of the present utility model are as follows: The staff adds the cleaning agent to be filtered into the feeding mechanism, starts the extrusion mechanism to accelerate the cleaning agent to pass through the filtering mechanism, the impurities in the cleaning agent are blocked by the filtering mechanism, the cleaning agent after the first filtration enters the centrifugal mechanism, and the centrifugal mechanism performs secondary centrifugal filtration on the cleaning agent. The flying cleaning agent is collected and discharged in the collection mechanism. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 is the front sectional structure schematic diagram of the present utility model;

[0015] Figure 2 is the partial enlarged sectional axonometric structure schematic diagram of the collection mechanism and the extrusion mechanism of the present utility model;

[0016] Figure 3 is the partial enlarged axonometric structure schematic diagram of the feeding mechanism of the present utility model;

[0017] Figure 4 It is a schematic axonometric sectional view of the filtering mechanism and the extrusion mechanism of the present utility model.

[0018] Reference signs in the drawings: 01, collection mechanism; 11, collection cylinder; 12, downward slide plate; 13, discharge pipe; 14, valve; 02, feeding mechanism; 21, storage cylinder; 22, feeding pipe; 23, sealing cover; 24, hinge; 25, sewage discharge cover; 26, handle; 03, filtering mechanism; 31, filter plate; 32, funnel 1; 33, support rod; 34, sleeve; 04, extrusion mechanism; 41, motor 1; 42, speed reducer 1; 43, transmission shaft 1; 44, spiral blade; 05, centrifugal mechanism; 51, motor 2; 52, speed reducer 2; 53, transmission shaft 2; 54, centrifugal cylinder; 55, funnel 2; 56, baffle plate. Detailed implementation manners

[0019] For ease of understanding the present utility model, the present utility model will be described more comprehensively below with reference to the relevant drawings. The present utility model can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, these embodiments are provided so that the disclosure of the present utility model is more thorough and comprehensive.

[0020] Embodiment 1

[0021] An impurity removal device for the production of a semiconductor chip cleaning agent of the present utility model includes a collection mechanism 01; it further includes a feeding mechanism 02, a filtering mechanism 03, an extrusion mechanism 04, and a centrifugal mechanism 05. The feeding mechanism 02 is installed on the collection mechanism 01 to facilitate the feeding of the cleaning agent. The filtering mechanism 03 is installed on the feeding mechanism 02 to filter the cleaning agent. The extrusion mechanism 04 is installed on the feeding mechanism 02 to accelerate the cleaning agent to pass through the filtering mechanism 03. The centrifugal mechanism 05 is installed on the filtering mechanism 03 to perform secondary filtering on the cleaning agent; the collection mechanism 01 includes a collection cylinder 11, a downward sliding plate 12, a discharge pipe 13, and a valve 14. The bottom end of the collection cylinder 11 is connected to the ground. There is a cavity inside the collection cylinder 11, and a sewage extraction port is opened on the collection cylinder 11. The downward sliding plate 12 is installed at the bottom end inside the cavity of the collection cylinder 11. The top end of the discharge pipe 13 is connected to the bottom end inside the collection cylinder 11. The valve 14 is installed on the discharge pipe 13; the feeding mechanism 02 includes a storage cylinder 21, a feeding pipe 22, a sealing cover 23, a hinge 24, a sewage discharge cover 25, and a handle 26. The bottom end of the storage cylinder 21 is connected to the top end of the collection cylinder 11. There is an inner cavity inside the storage cylinder 21. The inner cavity of the storage cylinder 21 is connected to the cavity inside the collection cylinder 11. The bottom end of the feeding pipe 22 is connected to the top end inside the storage cylinder 21. The sealing cover 23 is installed on the feeding pipe 22. There is a sewage discharge port on the storage cylinder 21. The hinge 24 is installed at the sewage discharge port of the storage cylinder 21. The sewage discharge cover 25 is installed on the hinge 24. The handle 26 is installed on the sewage discharge cover 25; the filtering mechanism 03 includes a filter plate 31, a funnel 32, a support rod 33, and multiple sets of sleeves 34. The filter plate 31 is installed at the connection between the cavity of the collection cylinder 11 and the inner cavity of the storage cylinder 21. The top end of the funnel 32 is connected to the bottom end of the filter plate 31. Multiple sets of support rods 33 are all installed inside the cavity of the collection cylinder 11. The sleeve 34 is installed on multiple sets of support rods 33 and is connected to the bottom end inside the funnel 32; the extrusion mechanism 04 includes a motor 41, a speed reducer 42, a transmission shaft 43, and a spiral blade 44. The bottom end of the motor 41 is connected to the top end of the storage cylinder 21. The bottom end of the speed reducer 42 is connected to the top end of the storage cylinder 21. The transmission shaft 43 is rotatably installed inside the inner cavity of the storage cylinder 21 and is longitudinally connected to the speed reducer 42. The spiral blade 44 is installed on the transmission shaft 43;When it is working, first, the staff member opens the sealing cover 23, pours the cleaning agent into the inner cavity of the storage barrel 21 through the feeding pipe 22, starts the first motor 41, the first motor 41 drives the first transmission shaft 43 to rotate through the first speed reducer 42, the first transmission shaft 43 drives the spiral blade 44 to rotate to pressurize and convey the cleaning agent, accelerates the cleaning agent to pass through the filter plate 31 for filtration, improves the filtration efficiency, the cleaning agent in the inner cavity of the storage barrel 21 flows downward under the action of gravity and the extrusion of the spiral blade 44, the cleaning agent enters the first funnel 32 and the sleeve 34 after being filtered by the filter plate 31, the stability of the sleeve 34 and the first funnel 32 is enhanced by arranging multiple groups of support rods 33, the cleaning agent enters the cavity of the collection barrel 11 for collection, under the action of gravity, the cleaning agent converges into the discharge pipe 13 along the sliding plate 12, the valve 14 is opened, and the cleaning agent is discharged from the device through the discharge pipe 13. When the filtration is completed, the staff member pulls the handle 26 to open the sewage discharge cover 25, and clears the impurities remaining on the filtration mechanism 03.

[0022] Embodiment 2

[0023] As Figures 1 to 4As shown in the figure, an impurity removal device for the production of a semiconductor chip cleaning agent according to the present utility model is based on Embodiment 1; the centrifugal mechanism 05 includes a second motor 51, a second speed reducer 52, a second transmission shaft 53, a centrifugal cylinder 54, a second funnel 55 and a baffle 56. The bottom end of the second motor 51 is connected to the bottom end of the collection cylinder 11, and the bottom end of the second speed reducer 52 is connected to the bottom end of the collection cylinder 11. The second transmission shaft 53 is rotatably installed on the lower slide plate 12. The bottom end of the centrifugal cylinder 54 is connected to the top end of the second transmission shaft 53. The bottom end of the second funnel 55 is connected to the top end of the centrifugal cylinder 54 and is rotationally communicated with the top end of the second funnel 55 and the sleeve 34. A second sewage extraction port is opened on the second funnel. The baffle 56 is installed in the cavity of the collection cylinder 11; it also includes that a ceramic filter membrane is attached inside the centrifugal cylinder 54; when it works, first, the staff opens the sealing cover 23 and pours the cleaning agent into the inner cavity of the storage cylinder 21 through the feeding pipe 22. Then, the first motor 41 is started. The first motor 41 drives the first transmission shaft 43 to rotate through the first speed reducer 42. The first transmission shaft 43 drives the spiral blade 44 to rotate to pressurize and convey the cleaning agent, accelerating the cleaning agent to pass through the filter plate 31 for filtration, improving the filtration efficiency. The cleaning agent in the inner cavity of the storage cylinder 21 flows downward under the action of gravity and the extrusion of the spiral blade 44. After being filtered by the filter plate 31, the cleaning agent enters the first funnel 32 and the sleeve 34. By setting multiple groups of support rods 33, the stability of the sleeve 34 and the first funnel 32 is enhanced. The cleaning agent enters the centrifugal cylinder 54 through the first funnel 32 and the sleeve 34. Then, the second motor 51 is started. The second motor 51 drives the second transmission shaft 53 and the centrifugal cylinder 54 to rotate through the second speed reducer 52. The centrifugal cylinder 54 rotates to throw out the cleaning agent, and the impurities remain in the centrifugal cylinder 54 for secondary filtration of the cleaning agent. By setting the second funnel 55 and the first funnel 32, the reverse transportation of the cleaning agent upward is avoided. By setting the baffle 56, the splashing of the cleaning agent into the inner cavity of the storage cylinder 21 is avoided. The cleaning agent enters the cavity of the collection cylinder 11 for collection. Under the action of gravity, the cleaning agent converges along the lower slide plate 12 into the discharge pipe 13. The valve 14 is opened, and the cleaning agent is discharged from the device through the discharge pipe 13. When the filtration is completed, the staff pulls the handle 26 to open the sewage discharge cover 25, clears the impurities remaining on the filtration mechanism 03, and then inserts the sewage extraction hose into the centrifugal cylinder through the sewage extraction port of the collection cylinder 11 and the second sewage extraction port of the second funnel 55 to extract the impurities remaining in the centrifugal cylinder.

[0024] The first motor 41, the first speed reducer 42, the second motor 51 and the second speed reducer 52 of the present utility model are purchased on the market. Those skilled in the art only need to install and operate according to the attached user manual without the need for creative labor by those skilled in the art.

[0025] The above are only the preferred embodiments of the present utility model. It should be noted that for those of ordinary skill in the art, without departing from the technical principle of the present utility model, several improvements and modifications can be made, and these improvements and modifications should also be regarded as the protection scope of the present utility model.

Claims

1. An impurity removal device for the production of a semiconductor chip cleaning agent, comprising a collection mechanism (01); characterized in that, It also includes a feeding mechanism (02), a filtering mechanism (03), an extrusion mechanism (04) and a centrifugal mechanism (05). The feeding mechanism (02) is installed on the collecting mechanism (01) to facilitate the feeding of the cleaning agent. The filtering mechanism (03) is installed on the feeding mechanism (02) to filter the cleaning agent. The extrusion mechanism (04) is installed on the feeding mechanism (02) to accelerate the cleaning agent to pass through the filtering mechanism (03). The centrifugal mechanism (05) is installed on the filtering mechanism (03) to perform secondary filtration on the cleaning agent. The collecting mechanism (01) includes a collecting cylinder (11), a downward sliding plate (12), a discharge pipe (13) and a valve (14). The bottom end of the collecting cylinder (11) is connected to the ground. A cavity is formed inside the collecting cylinder (11), and a sewage extraction port is formed on the collecting cylinder (11). The downward sliding plate (12) is installed at the bottom end inside the cavity of the collecting cylinder (11). The top end of the discharge pipe (13) is internally communicated with the bottom end inside the collecting cylinder (11). The valve (14) is installed on the discharge pipe (13). The feeding mechanism (02) includes a storage cylinder (21), a feeding pipe (22), a sealing cover (23), a hinge (24), a sewage discharge cover (25) and a handle (26). The bottom end of the storage cylinder (21) is connected to the top end of the collecting cylinder (11). An inner cavity is formed inside the storage cylinder (21). The inner cavity of the storage cylinder (21) is internally communicated with the cavity inside the collecting cylinder (11). The bottom end of the feeding pipe (22) is internally communicated with the top end inside the storage cylinder (21). The sealing cover (23) is installed on the feeding pipe (22). A sewage discharge port is formed on the storage cylinder (21). The hinge (24) is installed at the sewage discharge port of the storage cylinder (21). The sewage discharge cover (25) is installed on the hinge (24). The handle (26) is installed on the sewage discharge cover (25). The filtering mechanism (03) includes a filter plate (31), a first funnel (32), a support rod (33) and multiple sets of sleeves (34). The filter plate (31) is installed at the connection between the cavity of the collecting cylinder (11) and the inner cavity of the storage cylinder (21). The top end of the first funnel (32) is connected to the bottom end of the filter plate (31). Multiple sets of support rods (33) are all installed inside the cavity of the collecting cylinder (11). The sleeves (34) are installed on the multiple sets of support rods (33) and are internally communicated with the bottom end inside the first funnel (32). The extrusion mechanism (04) includes a first motor (41), a first speed reducer (42), a first transmission shaft (43) and a spiral blade (44). The bottom end of the first motor (41) is connected to the top end of the storage cylinder (21). The bottom end of the first speed reducer (42) is connected to the top end of the storage cylinder (21). The first transmission shaft (43) is rotatably installed inside the inner cavity of the storage cylinder (21) and is longitudinally connected to the first speed reducer (42). The spiral blade (44) is installed on the first transmission shaft (43).

2. The impurity removal device for producing a semiconductor chip cleaning agent according to claim 1, wherein, The centrifugal mechanism (05) includes a second motor (51), a second speed reducer (52), a second transmission shaft (53), a centrifugal cylinder (54), a second funnel (55) and a baffle (56). The bottom end of the second motor (51) is connected to the bottom end of the collection cylinder (11), and the bottom end of the second speed reducer (52) is connected to the bottom end of the collection cylinder (11). The second transmission shaft (53) is rotatably installed on the lower slide plate (12). The bottom end of the centrifugal cylinder (54) is connected to the top end of the second transmission shaft (53). The bottom end of the second funnel (55) is connected to the top end of the centrifugal cylinder (54) and is rotatably communicated with the top end of the second funnel (55) and the sleeve (34). A second sewage extraction port is formed on the second funnel (55), and the baffle (56) is installed in the cavity of the collection cylinder (11).

3. The impurity removal device for the production of a semiconductor chip cleaning agent according to claim 2, characterized in that, It further includes that a ceramic filter membrane is attached to the inside of the centrifugal cylinder (54).

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