Cleaning device for precision quartz plate before polishing

Abstract

The utility model relates to a precision quartz plate pre-polishing cleaning device which comprises a cleaning box, a control panel is embedded and installed on the lower side of the surface of the cleaning box, a hydraulic cylinder is fixedly connected to the middle of the upper side of the cleaning box, the output end of the hydraulic cylinder is fixedly connected with a containing box, and partition nets are fixedly connected to the upper side and the lower side of the interior of the containing box. A plurality of baffles are fixedly connected to the interior of the containing box, an air blower is fixedly installed at the upper end of the left side of the cleaning box, and a cleaning assembly is fixedly connected to the inner bottom wall of the cleaning box; the cleaning assembly comprises a cleaning cabinet, and a first through hole is formed in the middle of the upper side of the cleaning cabinet. According to the cleaning device for the precision quartz plate before polishing, impurities attached to the interior of water for cleaning the quartz plate are filtered through a filter screen arranged in a filter box through a circulating pipe and are discharged into a water tank to be continuously discharged into a cleaning cabinet to clean the surface of the quartz plate, so that repeated utilization is achieved, and resource waste is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of precision quartz wafer processing, in particular to a cleaning device for precision quartz wafers before grinding. Background Art

[0002] Quartz is a mineral resource with very stable physical and chemical properties. It is a short name for the quartz stone plates produced by current quartz stone plate manufacturers. Since the main component of its plates, quartz, has a content of over 93%, it is called quartz stone. After the quartz stone is cut into quartz wafers according to requirements, the quartz wafers need to be ground and polished.

[0003] In the process of quartz wafer production, a cleaning device is required. Chinese Patent CN 218049368U discloses a quartz wafer cleaning device that is convenient for loading and unloading materials, including a cleaning device body. An anti-collision pad is arranged at the outer side position of the cleaning device body. A quartz wafer placement layer is arranged at the inner position of the cleaning device body. A lifting baffle is arranged at the position near the rear end of the cleaning device body. An air outlet is arranged at the rear end position of the lifting baffle. Connecting strip blocks are arranged at the positions of the left and right inner walls in the middle of the cleaning device body. A cover plate is arranged at the right end position of the cleaning device body. A fan is arranged at the rear end position of the cleaning device body. The cleaning device body is electrically connected to an external power supply. The utility model adds a fan and a lifting baffle, which can effectively increase the air-drying speed of the quartz wafers after cleaning, thereby greatly improving work efficiency. By adding an anti-collision pad, it can effectively avoid the phenomenon that the staff accidentally touches the corner position of the cleaning device body and gets injured during work.

[0004] However, the cleaning device of this utility model cannot reuse the water discharged during the cleaning of quartz wafers, resulting in waste of resources and not meeting the usage requirements. Therefore, a cleaning device for precision quartz wafers before grinding is proposed to solve the problems raised above. Content of the Utility Model

[0005] Aiming at the deficiencies of the prior art, the utility model provides a cleaning device for precision quartz wafers before grinding, which has the advantages of reusing the water after cleaning, etc., and solves the problem of waste of resources caused by the inability to reuse the water discharged during the cleaning of quartz wafers.

[0006] In order to achieve the above-mentioned purpose of reusing the water after cleaning, the utility model provides the following technical solutions: a device for cleaning precision quartz plates before polishing, comprising a cleaning box, a control panel is embedded on the lower side of the surface of the cleaning box, a hydraulic cylinder is fixedly connected to the middle of the upper side of the cleaning box, the output end of the hydraulic cylinder is fixedly connected to a placement box, the upper and lower sides of the placement box are fixedly connected to a partition net, a plurality of baffles are fixedly connected to the placement box, a hair dryer is fixedly installed on the upper end of the left side of the cleaning box, and a cleaning component is fixedly connected to the bottom wall of the cleaning box.

[0007] The cleaning assembly includes a cleaning cabinet, a first through hole is opened in the middle of the upper side of the cleaning cabinet, three ultrasonic cleaners are fixedly connected to the left and right sides of the inner wall of the cleaning cabinet, the lower side of the cleaning cabinet is connected to a circulation pipe, the right end of the circulation pipe is fixedly connected to a filter box, three filters are fixedly connected inside the filter box, the right end of the upper side of the cleaning cabinet is connected to a water pump, and the lower side of the water pump is connected to a water tank.

[0008] Furthermore, four supporting legs are fixedly connected to the lower surface of the cleaning box, and the four supporting legs are respectively fixed at the four corners of the lower surface of the cleaning box.

[0009] Furthermore, a door is rotatably connected to the surface of the cleaning box, an observation window is embedded on the left side of the surface of the door, and a third through hole is opened inside the right side of the cleaning box.

[0010] Furthermore, a heating plate is fixedly connected to the left side of the inner wall of the cleaning box, and the output end of the hair dryer is fixedly connected to the left side of the heating plate.

[0011] Furthermore, the output end of the hydraulic cylinder passes through the cleaning box and extends into the interior thereof, and a plurality of fourth through holes are opened inside the baffle.

[0012] Furthermore, second through holes are provided on both the left and right sides of the placement box, and the lower end of the left side of the water tank is connected to the flow pipe.

[0013] Furthermore, the filter screen is vertically fixedly connected to the inner wall surface of the filter box.

[0014] Compared with the prior art, the present invention provides a device for cleaning a precision quartz plate before polishing, which has the following beneficial effects:

[0015] 1. The device for cleaning the precision quartz plate before polishing uses a flow pipe to pass the cleaning water through the filter screen set inside the filter box to filter the impurities attached to the clean quartz plate water and discharge it into the water tank and then into the cleaning cabinet to clean the surface of the quartz plate to achieve multiple utilization and reduce resource waste.

[0016] 2. The cleaning device for precision quartz wafers before grinding fixes the quartz wafers between multiple baffles in sequence, and controls the hydraulic cylinder to drive the placement box to move into the cleaning cabinet through the control board, solving the problem of resource waste caused by the inability to reuse the water discharged during the cleaning of quartz wafers. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is the front view of the structure of the present utility model;

[0018] Figure 2 is the sectional view of the structure of the present utility model.

[0019] In the figure: 1 cleaning box, 2 box door, 3 observation window, 4 circulation pipe, 5 ultrasonic cleaner, 6 first through hole, 7 control board, 8 filter box, 9 water tank, 10 water pump, 11 hydraulic cylinder, 12 hair dryer, 13 support feet, 14 heating plate, 15 placement box, 16 partition net, 17 second through hole, 18 baffle, 19 third through hole, 20 cleaning cabinet, 21 filter net. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0020] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0021] Please refer to Figure 1-2 , a cleaning device for precision quartz wafers before grinding, including a cleaning box 1, a heating plate 14 is fixedly connected to the left side of the inner wall of the cleaning box 1, four support feet 13 are fixedly connected to the lower surface of the cleaning box 1, and the four support feet 13 are respectively fixed at the four corners of the lower surface of the cleaning box 1. A box door 2 is rotatably connected to the surface of the cleaning box 1, an observation window 3 is inlaid on the left side of the surface of the box door 2, a third through hole 19 is opened inside the right side of the cleaning box 1, a control board 7 is inlaid and installed on the lower side of the surface of the cleaning box 1, a hydraulic cylinder 11 is fixedly connected to the middle of the upper side of the cleaning box 1, the output end of the hydraulic cylinder 11 penetrates through the cleaning box 1 and extends to its inside, the output end of the hydraulic cylinder 11 is fixedly connected to a placement box 15, second through holes 17 are opened on both the left and right sides of the placement box 15, partition nets 16 are fixedly connected to both the upper and lower sides inside the placement box 15, a plurality of baffles 18 are fixedly connected inside the placement box 15, a plurality of fourth through holes are opened inside the baffles 18, a hair dryer 12 is fixedly installed on the upper end of the left side of the cleaning box 1, the output end of the hair dryer 12 is fixedly connected to the left side of the heating plate 14, and a cleaning component is fixedly connected to the inner bottom wall of the cleaning box 1.

[0022] The cleaning component includes a cleaning cabinet 20. A first through hole 6 is opened in the middle of the upper side of the cleaning cabinet 20. Three ultrasonic cleaners 5 are fixedly connected to both the left and right sides of the inner wall of the cleaning cabinet 20. A flow pipe 4 is communicated with the lower side of the cleaning cabinet 20. The right end of the flow pipe 4 is fixedly connected to a filter box 8. Three filter nets 21 are fixedly connected inside the filter box 8. The filter nets 21 are vertically fixedly connected to the inner wall surface of the filter box 8. A water pump 10 is communicated with the right end of the upper side of the cleaning cabinet 20. The lower side of the water pump 10 is communicated with a water tank 9. The lower end on the left side of the water tank 9 is communicated with the flow pipe 4.

[0023] In this embodiment, after the placement box 15 is removed from the inside of the cleaning cabinet 20, the gas discharged by the hair dryer 12 is mixed with the heat energy generated by the heating plate 14 and blown into the inside of the placement box 15 through the second through hole 17 to play a role in drying and heating the surface of the quartz wafer, accelerating the drying of the surface of the quartz wafer.

[0024] When this embodiment is in use, the quartz wafers are sequentially fixed between multiple baffles 18. The control board 7 is used to control the hydraulic cylinder 11 to drive the placement box 15 to move into the cleaning cabinet 20. The water pump 10 drains the water inside the water tank 9 into the cleaning cabinet 20 to cooperate with the ultrasonic cleaner 5 to clean the surface of the quartz wafer. The water inside the cleaning cabinet 20 will enter the inside of the placement box 15 through the partition nets 16 and the second through hole 17 provided on the upper, lower, left, and right sides of the placement box 15, realizing the cleaning of the quartz wafer. At the same time, the water flow discharged into the cleaning cabinet 20 for cleaning will flow back into the water tank 9 through the flow pipe 4 again for multiple recycling. During this period, it will pass through the inside of the filter box 8, and the multiple filter nets 21 will filter the impurities attached to the surface of the cleaned quartz wafer, thereby reducing the waste of resources.

[0025] The beneficial effects of the above embodiment are as follows:

[0026] For this precision quartz wafer pre-grinding cleaning device, the water for cleaning is filtered through the 23 provided inside the filter box 8 through the flow pipe 4 to filter the impurities attached to the water for cleaning the quartz wafer and drain it into the water tank 9, and then continue to drain it into the cleaning cabinet 20 to clean the surface of the quartz wafer, achieving multiple uses and reducing resource waste.

[0027] For this precision quartz wafer pre-grinding cleaning device, the quartz wafers are sequentially fixed between multiple baffles 18, and the control board 7 is used to control the hydraulic cylinder 11 to drive the placement box 15 to move into the cleaning cabinet 20, solving the problem of resource waste caused by the inability to reuse the water discharged during the cleaning of the quartz wafer.

[0028] All the electrical components mentioned in the text are electrically connected to the main controller and the power supply. The main controller can be a conventional known device such as a computer for control, and the existing publicly disclosed electrical connection technology will not be elaborated in the text.

[0029] It should be noted that, in this text, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprising", "including" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements not only includes those elements, but also includes other elements not expressly listed, or elements inherent to such process, method, article or device. Without further limitation, an element defined by the phrase "comprising an..." does not exclude the presence of additional identical elements in the process, method, article or device comprising said element.

[0030] Although the embodiments of the present utility model have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principle and spirit of the present utility model. The scope of the present utility model is defined by the appended claims and their equivalents.

Claims

1. A cleaning device for a precision quartz wafer before polishing, comprising a cleaning tank (1), characterized in that: A control panel (7) is inlaid and installed on the lower side of the surface of the cleaning tank (1). In the middle of the upper side of the cleaning tank (1), a hydraulic cylinder (11) is fixedly connected. The output end of the hydraulic cylinder (11) is fixedly connected with a placement box (15). On the upper and lower sides inside the placement box (15), partition nets (16) are fixedly connected. Inside the placement box (15), a plurality of baffles (18) are fixedly connected. At the upper end of the left side of the cleaning tank (1), a hair dryer (12) is fixedly installed. On the inner bottom wall of the cleaning tank (1), a cleaning component is fixedly connected; The cleaning component includes a cleaning cabinet (20). In the middle of the upper side of the cleaning cabinet (20), a first through hole (6) is opened. On the left and right sides of the inner wall of the cleaning cabinet (20), three ultrasonic cleaners (5) are fixedly connected. The lower side of the cleaning cabinet (20) communicates with a circulation pipe (4). The right end of the circulation pipe (4) is fixedly connected with a filter box (8). Inside the filter box (8), three filter nets (21) are fixedly connected. The right end of the upper side of the cleaning cabinet (20) communicates with a water pump (10). The lower side of the water pump (10) communicates with a water tank (9).

2. The cleaning device for a precision quartz wafer before grinding according to claim 1, wherein: Four support feet (13) are fixedly connected to the lower surface of the cleaning tank (1), and the four support feet (13) are respectively fixed at the four corners of the lower surface of the cleaning tank (1).

3. The cleaning device for a precision quartz wafer before grinding according to claim 2, characterized in that: A box door (2) is rotatably connected to the surface of the cleaning tank (1). An observation window (3) is inlaid on the left side of the surface of the box door (2). A third through hole (19) is opened inside the right side of the cleaning tank (1).

4. The cleaning device for a precision quartz wafer before grinding according to claim 3, characterized in that: A heating plate (14) is fixedly connected to the left side of the inner wall of the cleaning tank (1), and the output end of the hair dryer (12) is fixedly connected to the left side of the heating plate (14).

5. The cleaning device for a precision quartz wafer before grinding according to claim 4, wherein: The output end of the hydraulic cylinder (11) penetrates through the cleaning tank (1) and extends to its interior. A plurality of fourth through holes are opened inside the baffle (18).

6. The cleaning device for a precision quartz wafer before grinding according to claim 1, characterized in that: Second through holes (17) are opened on both the left and right sides of the placement box (15), and the lower end of the left side of the water tank (9) communicates with the circulation pipe (4).

7. The cleaning device for a precision quartz wafer before grinding according to claim 1, characterized in that: The filter net (21) is vertically and fixedly connected to the inner wall surface of the filter box (8).

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