Vertical motion pressure control valve driven by single shaft

Abstract

The utility model discloses a single-shaft-driven vertical movement pressure control valve with a heating function, which is integrated on a bottom mounting plate of a semiconductor process cavity, and is provided with a driving mechanism, a vertical lifting vacuum feed-through connecting shaft, a connecting rod and a valve core plate with a self-adjusting connector, wherein the driving mechanism comprises a stepping motor, a guide rail, a lead screw column and a machine shell, the guide rail is arranged in the height direction of the machine shell, and a sliding table is arranged on the guide rail; the lead screw column is rotationally installed on the inner side of the machine shell and is parallel to the guide rail, and the shaft end of the lower side of the lead screw column is in linkage with the shaft end of the stepping motor through a belt and a belt wheel. According to the utility model, the heating device is arranged on the valve core plate, so that gas reactant coating on the valve plate is reduced, and the service life of the valve is prolonged; and meanwhile, the valve core plate moving vertically is provided with a self-adjusting connector, so that the valve core plate can be automatically adjusted to be horizontal when being in contact with the cavity bottom plate, and the process problem and the equipment performance problem caused by the fact that the valve cannot be closed with the process cavity can be avoided.

Description

Technical Field

[0001] The utility model relates to the field of pressure control valves, in particular to a single-axis driven vertical motion pressure control valve. Background Art

[0002] The more uniform the gas flow around the wafer during etching and cleaning processes in semiconductor production, the smoother and more synchronized the gas reaction on the wafer. The design of the gas outlet location or changes in the flow path during valve operation can cause asymmetric gas distribution, hindering gas exhaust or generating uneven flow rates. Furthermore, the process stages in semiconductor production require that the areas contacted by the gas be maintained at a certain temperature to prevent gas reactants from coating the valve plate. Currently, there are three commonly used cavity pressure control valve solutions:

[0003] The first is to use pendulum motion to adjust the exhaust port size, control the flow resistance of the exhaust channel, and achieve front-end pressure regulation;

[0004] The second method is to adjust the size of the exhaust port by rotating the blade and the valve body angle, control the flow resistance of the exhaust channel, and achieve front-end pressure regulation;

[0005] The two gases flow through irregular openings on the valve plate, resulting in uneven gas distribution and different flow rates, which will affect the reaction of the gases on the wafer surface, ultimately leading to poor quality of the wafers after the reaction, which cannot meet the requirements of use.

[0006] The third type is a pressure control valve that adjusts the opening size vertically. This valve features central symmetry in its exhaust channel, significantly improving the uniformity of the gas flow field. However, this dual-axis lifting requires high synchronization, making it prone to jamming during movement, resulting in low long-term operational reliability. Furthermore, existing products lack a heating function on the valve plate, which leads to increased deposits on the plate, affecting its opening and closing functions and pressure control, potentially causing valve failure.

[0007] Based on the above background, the present invention proposes a single-axis driven vertical motion pressure control valve, which is integrated into a semiconductor process chamber to achieve flow and pressure control within the chamber. The single-side driven symmetrical control valve is driven by a drive mechanism with a closed-loop control stepper motor. The drive mechanism drives the vacuum feedthrough connecting shaft to achieve the vacuum feedthrough connecting shaft lifting function. The vacuum feedthrough connecting shaft is connected to a connecting rod, which is connected to the valve core plate via a self-adjusting connector. The valve core plate can be opened and closed. The valve core plate is equipped with a sealing ring. When the valve core plate is in the closed position, the sealing ring is used to achieve a tight seal with the process chamber. Utility Model Content

[0008] The purpose of the present utility model is to provide a single-axis driven vertical motion pressure control valve to solve the problems raised in the above background technology.

[0009] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a single-axis driven vertical motion pressure control valve, the pressure control valve is integrated on the bottom mounting plate of the semiconductor process chamber, the pressure control valve has a housing, a driving mechanism, a vacuum feedthrough connecting shaft, a connecting rod, a valve core plate and a self-adjusting connecting head, wherein the driving mechanism is installed in the housing, the driving mechanism includes a stepper motor, a guide rail, a slide, a screw sleeve and a screw column, the guide rail is arranged along the height direction of the housing, and a slide is provided on the guide rail; the screw column is rotatably installed on the inner side of the housing and is parallel to the guide rail, the lower shaft end of the screw column is linked to the shaft end of the stepper motor through a belt and a pulley, a screw sleeve is installed on the screw column, the side end of the screw sleeve is connected to the slide, and a vacuum feedthrough connecting shaft is provided on the screw sleeve.

[0010] Preferably, the vacuum feedthrough connecting shaft is arranged vertically and a bellows sleeve is arranged on its outer side, a wire is passed through the inside of the vacuum feedthrough connecting shaft, and the upper end of the vacuum feedthrough connecting shaft is connected to the valve core plate through a connecting rod and a self-adjusting connector.

[0011] Preferably, a heating device is integrated on the valve core plate, and a sealing plug is provided on the outside of the valve core plate.

[0012] Preferably, the pressure control valve also has a valve exhaust port, the valve core plate and the valve exhaust port are both circular, the valve core plate and the circular exhaust port are concentric, the valve core plate is located above the exhaust port, and the valve core plate adjusts the distance between the valve core plate and the exhaust port by moving up and down, thereby adjusting the size of the exhaust channel.

[0013] Preferably, a hollow through-hole is provided inside the connecting rod, an annular groove is provided at the end of the hollow through-hole, the wire extends along the hollow through-hole and the annular groove and is electrically connected to the heating device on the valve core plate through a self-adjusting connector;

[0014] Preferably, the self-adjusting connector includes a connector body, a sealing ring and an elastic pin, wherein the connector body can cooperate with the annular groove of the connecting rod, the inner side of the connector body is provided with a channel docking with the hollow perforation, and the outer periphery of the connector body is provided with an elastic sealing ring and an elastic pin for locking with the annular groove.

[0015] Compared with the prior art, the beneficial effects of the present invention are:

[0016] 1. The control valve of the utility model is driven by a single-arm drive mechanism with a closed-loop control stepper motor, saving maintenance space.

[0017] 2. The utility model provides a heating device on the valve core plate to reduce the coating (adhesion) of gas reactants on the valve plate and extend the service life of the valve.

[0018] 3. The utility model is provided with a self-adjusting connector, which enables the valve core plate sealing performance to be self-adjusted, thereby avoiding process problems and equipment safety issues caused by the valve being unable to close with the process cavity, improving reliability and reducing particle contamination. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the three-dimensional structure of the utility model;

[0020] Figure 2 This is the cross section of the utility model Figure 1 ;

[0021] Figure 3 This is the cross section of the utility model Figure 2 ;

[0022] Figure 4 This is a schematic diagram of the utility model being applied to a semiconductor process chamber in a pressure-controlled (open) state;

[0023] Figure 5 This is a schematic diagram of the utility model being applied to a semiconductor process chamber in a closed state.

[0024] In the figure: 1. Bottom mounting plate; 2. Casing; 3. Stepper motor; 4. Guide rail; 5. Slide; 6. Screw sleeve; 7. Screw column; 8. Vacuum feedthrough connecting shaft; 9. Connecting rod; 10. Valve core plate; 11. Self-adjusting connector; 111. Connector body; 112. Sealing ring; 113. Elastic pin; 12. Heating device; 13. Wire. DETAILED DESCRIPTION

[0025] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0026] In the description of the present invention, it should be noted that the terms "vertical", "up", "down", "horizontal", etc. indicating orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on the present invention.

[0027] It should also be noted that, in the description of this utility model, unless otherwise expressly specified or limited, the terms "disposed," "installed," "connected," and "connected" should be understood in a broad sense. For example, they may refer to fixed connections, detachable connections, or integral connections; they may refer to mechanical connections or electrical connections; they may refer to direct connections or indirect connections through an intermediate medium; and they may refer to internal communication between two components. Those skilled in the art will be able to understand the specific meanings of the above terms in this utility model based on specific circumstances.

[0028] See also Figure 1-5 The utility model provides a technical solution: a single-axis driven vertical motion pressure control valve, the pressure control valve is integrated on the bottom mounting plate 1 of the semiconductor process chamber, the pressure control valve has a casing 2, a driving mechanism, a vacuum feedthrough connecting shaft 8, a connecting rod 9, a valve core plate 10 and a self-adjusting connecting head 11, wherein the driving mechanism is installed in the casing 2, the driving mechanism includes a stepping motor 3, a guide rail 4, a slide 5, a screw sleeve 6 and a screw column 7, the stepping motor 3 is a stepping motor with closed-loop control and is fixed in the casing 2, the guide rail 4 is arranged along the height direction of the casing 2, and a slide 5 is provided on the guide rail 4; the screw column 7 is rotatably installed on the inner side of the casing 2 and is parallel to the guide rail 4, the lower side shaft end of the screw column 7 is linked to the shaft end of the stepping motor 3 through a belt and a pulley, a screw sleeve 6 is provided on the screw column 7, the side end of the screw sleeve 6 is connected to the slide 5, and a vacuum feedthrough connecting shaft 8 is provided on the screw sleeve 6.

[0029] In this embodiment, the driving mechanism is driven on one side, that is, there is only one driving mechanism, and the movement control of the valve core plate 10 is realized through single-side support, including switching and closing, which saves maintenance space.

[0030] In this embodiment, the vacuum feedthrough connecting shaft 8 is arranged vertically and a bellows sleeve is arranged on its outside. A wire 13 is passed through the inside of the vacuum feedthrough connecting shaft 8. The upper end of the vacuum feedthrough connecting shaft 8 is connected to the valve core plate 10 through a connecting rod 9 and a self-adjusting connector 11.

[0031] In this embodiment, a heating device 12 is integrated on the valve core plate 10 , and a sealing plug is provided on the outer side of the valve core plate 10 .

[0032] In this embodiment, the pressure control valve also has a valve exhaust port. Both the valve core plate 10 and the valve exhaust port are circular. The valve core plate 10 is located above and concentric with the valve exhaust port. The valve core plate 10 moves up and down to adjust the distance between the valve core plate 10 and the exhaust port, thereby adjusting the size of the exhaust passage.

[0033] In this embodiment, a hollow through-hole is provided inside the connecting rod 9 , and an annular groove is provided at the end of the hollow through-hole. The wire 13 extends along the hollow through-hole and the annular groove and is electrically connected to the heating device 12 on the valve core plate 10 through the self-adjusting connector 11 .

[0034] In this embodiment, the self-adjusting connector 11 includes a connector body 111, a sealing ring 112 and an elastic pin 113, wherein the connector body 111 can cooperate with the annular groove of the connecting rod 9, and the inner side of the connector body 111 is provided with a channel docking with the hollow perforation, and the outer periphery of the connector body 111 is provided with an elastic sealing ring 112 and an elastic pin 113 for locking with the annular groove.

[0035] In this embodiment, the sealing performance of the valve core plate 10 is self-adjusting, and the valve core plate 10 is provided with an elastic sealing ring 112 on the periphery thereof, which can achieve sealing with the process chamber. The sealing performance can be adjusted by controlling the torque of the stepper motor 3 through a closed loop in the driving mechanism.

[0036] In this embodiment, the self-adjusting connector 11 is provided with a sealing ring 112 to achieve sealing between the vacuum and atmospheric sides; the bottom is provided with a chamfer that cooperates with the connecting rod 9 to achieve self-positioning; the self-adjusting connector 11 is provided with an elastic pin 113, which realizes the self-adjusting function of the self-adjusting connector 11 and the connecting rod 9 through the annular groove on the connecting rod 9 to ensure that the valve core plate 10 and the process chamber achieve the best sealing effect.

[0037] In this embodiment, the self-adjusting functions of the self-adjusting connector 11 and the connecting rod 9 are both on the atmosphere side, which can reduce corrosion of the process gas, improve reliability and reduce particle size pollution.

[0038] In this embodiment, the wire 13 of the heating device 12 is located on the atmosphere side, which can reduce corrosion from process gases, improve reliability, and reduce particle size contamination.

[0039] It is worth noting that the entire device is controlled by a general control system. Since the equipment matched with the control system is commonly used equipment and belongs to existing mature technology, its electrical connection relationship and specific circuit structure will not be described in detail here.

[0040] Although the embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. Single-axis driven vertical motion pressure control valve, characterized in that: The pressure control valve is integrated on the bottom mounting plate (1) of the semiconductor process chamber. The pressure control valve comprises a housing (2), a driving mechanism, a vacuum feedthrough connecting shaft (8), a connecting rod (9), a valve core plate (10) and a self-adjusting connecting head (11). The driving mechanism is installed in the housing (2). The driving mechanism comprises a stepping motor (3), a guide rail (4), a slide (5), a screw sleeve (6) and a screw column (7). The guide rail (4) is arranged along the height direction of the housing (2). The slide (5) is provided on the guide rail (4). The screw column (7) is rotatably installed on the inner side of the housing (2) and is parallel to the guide rail (4). The lower side shaft end of the screw column (7) is linked to the shaft end of the stepping motor (3) through a belt and a pulley. The screw sleeve (6) is sleeved on the screw column (7). The side end of the screw sleeve (6) is connected to the slide (5). The vacuum feedthrough connecting shaft (8) is provided on the screw sleeve (6).

2. The single-axis driven vertical motion pressure control valve according to claim 1, characterized in that: A heating device (12) is integrated on the valve core plate (10), and a sealing plug is provided on the outside of the valve core plate (10).

3. The single-axis driven vertical motion pressure control valve according to claim 1, characterized in that: The pressure control valve has a valve exhaust port, the valve core plate (10) and the valve exhaust port are both circular, and the valve core plate (10) is located above the valve exhaust port and is concentric with the valve exhaust port.

4. The single-axis driven vertical motion pressure control valve according to claim 1, characterized in that: The vacuum feedthrough connecting shaft (8) is arranged vertically and a bellows sleeve is arranged on the outside thereof. A wire (13) is passed through the inside of the vacuum feedthrough connecting shaft (8). The upper end of the vacuum feedthrough connecting shaft (8) is connected to the valve core plate (10) through a connecting rod (9) and a self-adjusting connector (11).

5. The single-axis driven vertical motion pressure control valve according to claim 4, characterized in that: The connecting rod (9) is provided with a hollow through-hole inside, and an annular groove is provided at the end of the hollow through-hole. The wire (13) extends along the hollow through-hole and the annular groove and is electrically connected to the heating device (12) on the valve core plate (10) through the self-adjusting connector (11).

6. The single-axis driven vertical motion pressure control valve according to claim 1, characterized in that: The self-adjusting connector (11) comprises a connector body (111), a sealing ring (112) and an elastic pin (113), wherein the connector body (111) can cooperate with the annular groove of the connecting rod (9), the inner side of the connector body (111) is provided with a channel that docks with the hollow perforation, and the outer periphery of the connector body (111) is provided with an elastic sealing ring (112) and an elastic pin (113) for locking with the annular groove.

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