Low-stripping-force release film and preparation system thereof

Abstract

The utility model discloses a release film with low stripping force. The release film consists of a PET (Polyethylene Terephthalate) base material, a molybdenum disulfide layer deposited on the surface of the PET base material and a self-repairing coating coated on the outer side of the molybdenum disulfide layer. The utility model further provides a preparation system for the low-stripping-force release film. The preparation system comprises an ultrasonic cleaning machine, a drying machine, a chemical vapor deposition reactor, a mixing machine, a spin-coating machine, a drying box and a curing oven, an outlet of the ultrasonic cleaning machine is connected with the drying machine, an outlet of the drying machine is connected with the chemical vapor deposition reactor, an outlet of the chemical vapor deposition reactor is connected with the spin coater, an outlet of the mixing machine is also connected with the spin coater, an outlet of the spin coater is connected with the drying box, and an outlet of the drying box is connected with the curing oven. Through the combined design of the multi-layer structure of the molybdenum disulfide layer and the self-repairing coating, the release film is easy to strip, adhesion residues are reduced, and the use experience of a product is improved.

Description

Technical Field

[0001] The utility model relates to a low-peeling-force release film and a preparation system thereof. Background Art

[0002] Release films are widely used in adhesive materials, adhesive tapes, and optoelectronic device production. Their primary function is to prevent adhesives or other materials from adhering to the substrate surface during processing, thereby enabling smooth release. However, traditional release films often suffer from excessive peel force, poor abrasion resistance, or surface damage over time, leading to a gradual decline in functionality and failing to meet the demands of long-term, repeated use. Therefore, developing a release film with low peel force, self-healing capabilities, and high durability has become a key issue in this field.

[0003] While existing technologies have made some progress in reducing peel force and enhancing the functionality of release films, many challenges remain in achieving both low peel force and durability in the same release film. Therefore, there is an urgent need to develop a low-peel-force release film with excellent overall performance to meet the demands of higher-end users.

[0004] In addition, the prior art also lacks a preparation system for preparing a release film with low peeling force. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a low peeling force release film and a preparation system thereof, so as to reduce or avoid the above-mentioned problems.

[0006] In order to solve the above technical problems, the utility model proposes a low peeling force release film, which is composed of a PET substrate, a molybdenum disulfide layer deposited on the surface of the PET substrate, and a self-healing coating coated on the outside of the molybdenum disulfide layer; wherein the thickness of the PET substrate is 25μm to 80μm, the thickness of the molybdenum disulfide layer is 5-15 nanometers, and the thickness of the self-healing coating is 10-100 nanometers.

[0007] The utility model also proposes a preparation system for the above-mentioned low peeling force release film, including an ultrasonic cleaner, a dryer, a chemical vapor deposition reactor, a mixer, a spin coater, a drying oven and a curing oven; the outlet of the ultrasonic cleaner is connected to the dryer, the outlet of the dryer is connected to the chemical vapor deposition reactor, the outlet of the chemical vapor deposition reactor is connected to the spin coater, the outlet of the mixer is also connected to the spin coater, the outlet of the spin coater is connected to the drying oven, and the outlet of the drying oven is connected to the curing oven.

[0008] Preferably, the set operating temperature of the chemical vapor deposition reactor is 500°C-600°C.

[0009] Preferably, the setting working temperature of the drying oven is 60° C.-80° C., and the drying time is 30-60 minutes.

[0010] Preferably, the setting working temperature of the curing oven is 120° C.-150° C., and the curing time is 60-90 minutes.

[0011] This new release film utilizes a multi-layered design combining a molybdenum disulfide layer and a self-healing coating, making it easier to peel and reducing residual adhesion, thus enhancing the user experience. This new release film can be precisely and efficiently produced using a dedicated production system. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] The following drawings are only intended to illustrate and explain the present application, and are not intended to limit the scope of the present invention.

[0013] Figure 1 Shown is a schematic structural diagram of a low peeling force release film according to the utility model.

[0014] Figure 2 Shown is a schematic structural diagram of a system for preparing a low peeling force release film according to a specific embodiment of the present invention. DETAILED DESCRIPTION

[0015] In order to have a clearer understanding of the technical features, purpose and effects of the present invention, the specific implementation of the present invention is now described with reference to the accompanying drawings, wherein the same components are marked with the same reference numerals.

[0016] like Figure 1 As shown, the utility model proposes a low peeling force release film, which consists of a PET substrate 1, a molybdenum disulfide layer 2 deposited on the surface of the PET substrate 1, and a self-healing coating 3 coated on the outside of the molybdenum disulfide layer 2.

[0017] Unlike existing release films, the release film of this invention does not use commonly used polysiloxane or fluorine-containing release agents. Instead, it uses polyethylene terephthalate (PET) as its substrate. A two-dimensional molybdenum disulfide (MoS2) layer 2 is deposited on the surface of the PET substrate 1 by chemical vapor deposition. A self-healing coating 3 is applied to the surface of the MoS2 layer 2. The low release force is achieved by combining the multi-layer structure of the molybdenum disulfide layer and the self-healing coating, rather than by improving the release agent itself. This excellent low peel force effect can be achieved. The multi-layer structure design of this application not only makes the release film easy to peel, but also reduces adhesion residue, improving the product user experience.

[0018] Molybdenum disulfide (MoS2), a two-dimensional material, possesses excellent mechanical strength, lubricity, and chemical stability. Its lubricating properties help further reduce the release film's coefficient of friction and enhance its durability. The self-healing coating applied to the MoS2 surface bonds with the MoS2 surface, improving its overall stability and making it resilient to surface oxidation and degradation in a variety of chemical environments.

[0019] In a specific embodiment, the self-healing coating can be cured by the following components: isopropyl alcohol; thiol self-assembly molecules; quantum effect particles; polyethyleneimine; and self-healing polymers.

[0020] Among them, isopropyl alcohol (IPA) is a solvent; 1-octanethiol can be selected as the thiol self-assembly molecule; the quantum effect particles are zinc sulfide-coated cadmium selenide nanoparticles; polyethyleneimine (PEI) is used as a dispersant for the quantum effect particles; and the self-healing polymer can be selected from polydimethylsiloxane (PDMS).

[0021] Thiol self-assembling molecules (SAMs) are a class of organic molecules that can spontaneously assemble on specific surfaces through chemical bonding. Their self-assembly process relies primarily on the strong interaction between sulfur atoms and metal surfaces. The sulfur atoms at the end of the thiol molecule (R-SH) have a high affinity for metal surfaces, bonding to the metal atoms through covalent bonds or other strong interactions to form a stable chemically adsorbed layer. This is a key step in self-assembly, ensuring the molecules' strong attachment to the surface. Due to intermolecular van der Waals forces, the organic groups (such as alkyl chains) in the thiol molecules adsorbed on the metal surface tend to form a highly ordered monolayer with a specific orientation. As the adsorption process proceeds, the molecules align to minimize free energy, resulting in a denser and more ordered monolayer. The structural stability of the self-assembled molecular layer stems from two factors: the chemical bond formed between the sulfur atoms and the metal surface and the van der Waals and hydrophobic interactions between the molecular chains. The monolayer is highly stable and remains unchanged in water, air, and certain organic solvents. Thiol self-assembly molecules can reduce surface friction, lower peel force, and reduce the adhesion between adhesives and films. The strong bond between thiol self-assembly molecules and metal surfaces makes them very stable in chemical environments and less susceptible to oxidation or chemical attack, thereby improving the durability of coatings and release films.

[0022] Quantum effect particles, also known as quantum dots (QDs), are nanoscale semiconductor materials with unique optical and electronic properties. In this utility model, the quantum effect particles, through synergistic action with thiol self-assembling molecules and self-healing polymers, not only reduce the surface energy of the release film, thereby reducing the peel force, but also impart unique optical and electronic properties to the film, enhancing its uniformity, durability, and self-healing ability, making it suitable for high-frequency use and complex environments.

[0023] The quantum effect particles in this utility model are nanoparticles of zinc sulfide-coated cadmium selenide, and the ZnS@CdSe quantum dots adopt a core-shell structure, in which CdSe provides quantum effects as the core and ZnS provides protection as the shell, which significantly enhances the chemical stability and mechanical strength of the quantum dots. This core-shell structure can prevent the CdSe core from being subjected to external chemical reactions or mechanical damage, ensuring that the quantum effect particles maintain their optical properties and surface properties after repeated use or in harsh environments. If quantum effect particles of a single material (such as CdSe or ZnO) are used instead, their stability is poor and they are more susceptible to environmental influences, resulting in performance degradation, especially in self-healing coatings where low peeling force and high durability cannot be maintained for a long time.

[0024] ZnS@CdSe quantum effect particles have tunable optical properties and can adjust the wavelength of emitted light by changing the core-shell size. This flexibility provides a choice of optical properties for release films, making them suitable for scenarios that require transparency or optical property control (such as optoelectronic devices or high-transmittance films). If other materials, such as ZnO or TiO2, are used, although these quantum dots have similar optical properties in some aspects, their tunability and luminous efficiency are generally lower, and they cannot provide such precise optical control, which may limit the application of release films in specific optical environments.

[0025] The surface of ZnS@CdSe quantum dots has been optimized and combined with thiol self-assembly molecules to significantly reduce the surface energy of the film, reduce adhesion, and thus effectively reduce peel force. Its core-shell structure gives it excellent lubrication properties in a variety of chemical environments, enhancing the ability to control the friction coefficient of the release film. If other quantum effect particles are replaced, such as simple CdSe or PbS quantum dots, although they may also provide certain quantum effects, their surface energy control effect is poor, which easily increases peel force, and their lubrication properties are not as good as ZnS@CdSe quantum dots.

[0026] ZnS@CdSe nanoparticles combined with self-healing polymers promote the self-healing ability of the self-healing coating even after minor damage, extending the lifespan of the release film. Their optical and electronic properties remain stable even when damaged, ensuring long-term reliability. Using other quantum effect particles, particularly those without a core-shell structure, often reduces the self-healing effect due to particle agglomeration or material instability, resulting in reduced durability and inability to achieve long-term reuse.

[0027] This application combines a self-healing polymer with a molybdenum disulfide layer and thiol self-assembly molecules to give the release film the ability to automatically repair itself when it is microscopically damaged, while enhancing the durability and wear resistance of the film, effectively reducing the peeling force and extending its service life, making it suitable for long-term and high-frequency application environments.

[0028] To sum up, the innovation of the present invention lies in the integrated improvement of the layered structure of multiple functional materials, combining two-dimensional materials, self-assembling molecules, quantum effect particles and self-healing polymers, and creatively realizing a release film with low peeling force, self-healing ability and high durability, solving the problems of high peeling force, poor durability and insufficient self-healing performance in the existing technology.

[0029] In a specific embodiment, the thickness of the PET substrate 1 is 25 μm to 80 μm, the thickness of the molybdenum disulfide layer 2 is 5-15 nanometers, and the thickness of the self-healing coating 3 is 10-100 nanometers.

[0030] In a specific embodiment, the weight percentages of the components constituting the self-healing coating of the present invention are: 85wt%-90wt% of isopropyl alcohol, 0.5wt%-1.0wt% of 1-octanethiol, 2.0wt%-5.0wt% of zinc sulfide-coated cadmium selenide nanoparticles, 0.1wt%-0.5wt% of polyethyleneimine (PEI), and 5.0wt%-8.0wt% of polydimethylsiloxane (PDMS).

[0031] Correspondingly, the low peeling force release film of the above specific embodiment of the present application can be prepared by the following process.

[0032] (1) PET substrate pretreatment:

[0033] Cleaning and Drying: Thoroughly clean the PET substrate with deionized water and dry it to remove organic matter and dust on the surface, as well as any residual moisture, ensuring the substrate surface is dry. PET substrate thickness range: 25μm to 80μm.

[0034] (2) Molybdenum disulfide (MoS2) deposition:

[0035] Chemical Vapor Deposition (CVD): A uniform thin film of molybdenum disulfide is deposited on the PET substrate via CVD at high temperatures (500-600°C). The MoS2 deposition thickness is preferably 5-15 nm to ensure a low peel force and smooth surface for the release film.

[0036] Cooling: After deposition, cool to room temperature to avoid cracks or stress in the film.

[0037] (3) Preparation of self-repairing coating solution:

[0038] Solvent preparation: In a clean container, first add 85 wt%-90 wt% of isopropyl alcohol (IPA) as a solvent.

[0039] Add 0.5 wt% to 1.0 wt% of thiol self-assembly molecular material (1-octanethiol) into the container and stir until completely dissolved. Control the stirring speed to prevent the generation of bubbles.

[0040] Continue to add 2.0 wt% to 5.0 wt% of quantum effect particles (zinc sulfide coated cadmium selenide) into the container and keep stirring for 30 to 60 minutes.

[0041] 0.1 wt% to 0.5 wt% of polyethyleneimine (PEI) is then added to the container to improve the dispersion stability of the particles. Stirring is continued for 30 to 60 minutes.

[0042] 5.0 wt% to 8.0 wt% of the self-healing polymer (PDMS) was added to the container and stirred for 30 to 60 minutes until the solution was uniform.

[0043] (4) Coating process:

[0044] Spin coating: The prepared solution is poured onto the PET surface that has been deposited with MoS2. Using a spin coating machine, the solution is evenly coated on the MoS2 surface at a high speed (3000 rpm). The thickness of the applied self-healing coating is 10-100 nanometers.

[0045] (5) Drying and curing:

[0046] Low temperature drying: After coating, place the film in a drying oven at 60°C to 80°C for 30-60 minutes to ensure that the solvent is completely evaporated.

[0047] Subsequent curing: Raise the temperature to 120-150°C to further cure the coating for 60-90 minutes to ensure the mechanical properties and durability of the film.

[0048] In view of the above preparation process, the present invention proposes a preparation system specifically for this low peeling force release film, the specific structure of which is as follows: Figure 2 shown.

[0049] As shown in the figure, the preparation system for low peeling force release film of the present invention includes an ultrasonic cleaning machine 301, a dryer 302, a chemical vapor deposition reactor 303, a mixer 304, a spin coater 305, a drying box 306 and a curing oven 307.

[0050] Among them, the ultrasonic cleaner 301 is used to clean the PET substrate and remove surface dirt and organic matter to ensure the adhesion and performance of subsequent processes. The dryer 302 is used to dry the cleaned PET substrate to remove residual moisture and ensure that the substrate surface is dry. The chemical vapor deposition (CVD) reactor 303 is used to deposit a molybdenum disulfide (MoS2) layer on the surface of the PET substrate; the set operating temperature of the chemical vapor deposition reactor 303 is 500°C-600°C. The mixer 304 is used to mix isopropyl alcohol, thiol self-assembly molecules, quantum effect particles, polyethyleneimine (PEI) and a self-healing polymer (such as PDMS) to prepare a coating solution for the self-healing coating. The spin coater 305 is used to apply the prepared self-healing coating solution to the surface of the molybdenum disulfide layer. The drying oven 306 is used to dry the coated film to evaporate the solvent; the set operating temperature of the drying oven 306 is 60°C-80°C, and the drying time is 30-60 minutes. The curing oven 307 is used to cure the coating to ensure the mechanical properties and durability of the film; the set working temperature of the curing oven 307 is 120° C.-150° C., and the curing time is 60-90 minutes.

[0051] When the preparation system of the present application is working, the PET substrate is first input into the ultrasonic cleaning machine 301, the outlet of the ultrasonic cleaning machine 301 is connected to the dryer 302, and the outlet of the dryer 302 is connected to the chemical vapor deposition reactor 303. The PET substrate is cleaned and dried, and then enters the chemical vapor deposition reactor 303 to deposit a layer of molybdenum disulfide.

[0052] The outlet of the chemical vapor deposition reactor 303 is connected to the spin coater 305, and the PET substrate on which molybdenum disulfide is deposited is further input into the spin coater 305. The outlet of the mixer 304 is also connected to the spin coater 305. The self-repairing coating liquid prepared in the mixer 304 is transported to the spin coater 305, and the self-repairing coating liquid is coated on the outside of the molybdenum disulfide layer through the spin coater 305.

[0053] The outlet of the spin coater 305 is connected to a drying oven 306, and the outlet of the drying oven 306 is connected to a curing oven 307. The coated film is fed from the spin coater 305 into the drying oven 306 for drying, and finally fed into the curing oven 307 for curing to form the low peeling force release film of the present invention.

[0054] The performance parameters of the release film prepared by the preparation system of the present application are as follows.

[0055] Surface testing: The release film's peel force, as measured by a peel force tester, is 5-10g / 25mm. This low peel force eliminates the need for silane release agents, demonstrating its suitability for use in the electronics industry. The surface friction coefficient is 0.2-0.3, demonstrating low friction and low adhesion.

[0056] Optical and Mechanical Properties: The film's light transmittance, thickness, tensile strength, and self-healing ability were tested. The tensile strength was 150-180 MPa, and the elongation at break was 100%-120%, demonstrating good strength and ductility. Optical transparency reached 90% to 95% in the visible light band of 500nm to 800nm.

[0057] Stability and Durability: Operates within temperatures between 120°C and 150°C without significant deformation or degradation. Self-healing at room temperature or under heating after minor mechanical damage. Durable over extended use, resists aging or degradation.

[0058] Example 1:

[0059] Raw material composition:

[0060] PET substrate thickness: 25μm; MoS2 layer thickness: 5nm; self-healing coating thickness: 10nm.

[0061] Self-healing coating components: isopropyl alcohol: 85wt%; 1-octanethiol: 0.5wt%; zinc sulfide-coated cadmium selenide nanoparticles: 2wt%; polyethyleneimine (PEI): 0.1wt%; PDMS: 5wt%.

[0062] Preparation conditions:

[0063] CVD deposition temperature: 500°C, time: 30 minutes; coating curing temperature: 120°C, time: 60 minutes.

[0064] Surface peel force tests showed a value of 5g / 25mm, with a coefficient of friction of 0.2, demonstrating low peel force and excellent anti-stick properties. Furthermore, the product boasts a tensile strength of 150MPa and an elongation at break of 100%, demonstrating excellent mechanical strength and flexibility. Its transmittance reaches 95% in the visible light band from 500nm to 800nm, making it particularly suitable for applications requiring high transparency.

[0065] Example 2:

[0066] Raw material composition:

[0067] PET substrate thickness: 50 μm; MoS2 layer thickness: 10 nm; Self-healing coating thickness: 50 nm.

[0068] Self-healing coating components: isopropyl alcohol: 87wt%; 1-octanethiol: 0.7wt%; zinc sulfide-coated cadmium selenide nanoparticles: 3wt%; polyethyleneimine (PEI): 0.3wt%; PDMS: 6wt%.

[0069] Preparation conditions:

[0070] CVD deposition temperature: 550°C, time: 45 minutes; coating curing temperature: 130°C, time: 75 minutes.

[0071] The peel force is 7g / 25mm and the coefficient of friction is 0.25, maintaining a low peel force and good abrasion resistance. Its tensile strength is 165MPa and its elongation at break reaches 110%, demonstrating its excellent mechanical properties and suitability for use under conditions of high mechanical stress. Its light transmittance remains around 90% in the visible light band, meeting the standards required by most industries.

[0072] Example 3:

[0073] Raw material composition:

[0074] PET substrate thickness: 80 μm; MoS2 layer thickness: 15 nm; Self-healing coating thickness: 100 nm.

[0075] Self-healing coating components:

[0076] Isopropyl alcohol: 90 wt %; 1-octanethiol: 1 wt %; zinc sulfide-coated cadmium selenide nanoparticles: 5 wt %; polyethyleneimine (PEI): 0.5 wt %; PDMS: 8 wt %.

[0077] Preparation conditions:

[0078] CVD deposition temperature: 600°C, time: 60 minutes; coating curing temperature: 150°C, time: 90 minutes.

[0079] With a peel force of 10g / 25mm and a coefficient of friction of 0.3, it offers enhanced durability and abrasion resistance. With a tensile strength of 180MPa and an elongation at break of 120%, it exhibits excellent strength and ductility under high loads. Its light transmittance reaches 90%, making it particularly suitable for applications subject to high frequency use or extreme environments.

[0080] Comparative Example 1

[0081] Based on Examples 1-3, zinc sulfide-coated cadmium selenide nanoparticles were replaced with zinc sulfide particles, while keeping other conditions unchanged. Test results showed that the quantum effect of zinc sulfide particles was weak and could not significantly reduce the surface energy, resulting in increased peel force and decreased optical and electronic properties of the film.

[0082] Comparative Example 2

[0083] Based on Examples 1-3, the CVD deposition temperature was lowered from 500°C to 400°C, while other conditions remained unchanged. Test results showed that low-temperature deposition resulted in an incomplete molybdenum disulfide layer structure, poor film crystal quality, decreased film friction coefficient and durability, and an inability to effectively achieve low peel force.

[0084] Comparative Example 3

[0085] Based on Example 3, the PDMS content in the self-healing coating was reduced from 8wt% to 2wt%, while keeping all other conditions unchanged. Test results showed that insufficient PDMS significantly reduced the self-healing effect, preventing the film from repairing itself in time when it sustained minor damage, thus reducing the durability and service life of the release film.

[0086] Comparative Example 4

[0087] Based on Examples 1-3, the thickness of the molybdenum disulfide layer was reduced to 2nm, the thickness of the self-healing coating was increased to 150nm, and the PDMS content was reduced to 3wt%, while other conditions remained unchanged. Test results showed that an overly thin molybdenum disulfide layer resulted in insufficient structural integrity of the membrane, failing to effectively reduce the surface friction coefficient, and the peel force increased to 15g / 25mm. Furthermore, an overly thick self-healing coating compromised the membrane's optical properties, reducing its transmittance to 80%. The self-healing ability was also significantly reduced due to insufficient PDMS content, making it impossible to recover after repeated damage.

[0088] Comparative Example 5

[0089] Based on Examples 1-3, the CVD deposition temperature was increased to 700°C, and the thiol self-assembling molecules in the self-healing coating component were reduced to 0.3wt%, while other conditions remained unchanged. Test results showed that excessively high deposition temperatures led to a decrease in the crystalline quality of the molybdenum disulfide layer, resulting in cracks, an increase in the friction coefficient to 0.5, and a peel force of 20g / 25mm. Furthermore, the reduction in the number of thiol self-assembling molecules resulted in poor surface self-assembly, reduced chemical stability and durability of the film, and increased surface energy, resulting in a shortened service life.

[0090] Comparative Example 6

[0091] Based on Examples 1-3, the substrate was changed to a 100μm-thick polycarbonate (PC), while other conditions remained unchanged. Test results showed that the PC substrate had poor flexibility and low compatibility with the molybdenum disulfide layer, resulting in decreased coating adhesion and an increase in peel force to 25g / 25mm. The increased PC substrate thickness also further reduced the film's transmittance to 70%. At the same time, the tensile strength dropped to 130MPa, and the elongation at break was only 80%, significantly affecting the film's mechanical properties and durability.

[0092] Comparative Example 7

[0093] Based on Examples 1-3, the self-healing coating thickness was reduced to 5nm, the quantum effect particle content was increased to 7wt%, and all other conditions remained unchanged. When the self-healing coating was too thin, it was easily abraded and unable to effectively repair itself upon damage, significantly reducing the durability and self-healing ability of the film. Furthermore, when the quantum effect particle content was too high, particle agglomeration occurred, resulting in poor surface uniformity and an increase in peel force to 18g / 25mm. This compromised optical properties and reduced transmittance to 85%, affecting overall performance.

[0094] In summary, adjusting multiple parameters in the comparative examples above, such as coating thickness, material ratio, and deposition conditions, resulted in a significant decrease in the release film's technical performance, including peel force, friction coefficient, optical clarity, and self-healing ability. In contrast, the present invention, through a rational combination design, effectively controls peel force, providing excellent durability, self-healing performance, and optical clarity, demonstrating its significant innovation in the field of release films.

[0095] As mentioned above, the quantum effect particles of cadmium selenide coated with zinc sulfide in the present invention can provide excellent optical properties, mechanical strength, low peeling force and self-healing ability. Replacing with other quantum effect particles may lead to a significant decrease in stability, durability, self-healing and peeling force control effects, affecting the overall performance and application range of the release film.

[0096] Those skilled in the art can purchase existing zinc sulfide-coated cadmium selenide for use as the quantum effect particles in the present invention, or can prepare zinc sulfide-coated cadmium selenide suitable for the present invention by the following method.

[0097] Furthermore, the quantum effect particles of zinc sulfide-coated cadmium selenide can be prepared by the following process:

[0098] 1. Preparation of CdSe core:

[0099] Cadmium source: Cadmium oxide (CdO): 0.04-0.07 parts by weight

[0100] Selenium source: Selenium powder (Se): 0.03-0.06 parts by weight

[0101] Ligand: 8-12 parts by weight of octadecene (ODE), 1-4 parts by weight of oleylamine (OLA), 1.5-3 parts by weight of oleic acid (OA)

[0102] Solvent: n-octane (for cleaning): 50-100 parts by weight

[0103] Process steps:

[0104] Step 1:

[0105] In a three-necked flask, add 0.04-0.07 parts by weight of CdO, 1.5-3 parts by weight of oleic acid, and 8-12 parts by weight of octadecene (ODE). Heat to 150°C under a nitrogen atmosphere and react until CdO is completely dissolved to form a Cd oleate solution.

[0106] Step 2:

[0107] 0.03-0.06 parts by weight of selenium powder and 1-4 parts by weight of oleylamine (OLA) were mixed and heated to 120° C. in another flask to form a Se precursor solution.

[0108] Step 3:

[0109] The selenium precursor solution is injected into the Cd oleate solution and the temperature is immediately raised to 300°C. The reaction is maintained for one hour. This process forms CdSe quantum dot cores. After cooling to room temperature using a cooling system, the CdSe cores are then cleaned and precipitated using 50-100 parts by weight of n-octane.

[0110] 2. ZnS shell coating:

[0111] Zinc source: zinc acetate (Zn(OAc)2): 0.08-0.12 parts by weight

[0112] Sulfur source: H2S gas: 0.015-0.03 parts by weight

[0113] Solvent: Isopropyl alcohol: 50-100 parts by weight

[0114] Redispersion solvent: octadecene: 10-15 parts by weight

[0115] Process steps:

[0116] Step 1:

[0117] The cleaned CdSe cores prepared above were redispersed in 10-15 parts by weight of octadecene, heated to 80° C., and maintained in a nitrogen atmosphere.

[0118] Step 2:

[0119] At 80°C, 0.08-0.12 parts by weight of zinc acetate (Zn(OAc)2) was added and stirred for 30-60 minutes to evenly distribute the zinc ions. The temperature was then raised to 100°C to promote the adsorption of Zn.

[0120] Step 3:

[0121] 0.015-0.03 parts by weight of H2S gas is introduced. When H2S reacts with zinc ions to generate ZnS, a ZnS shell is deposited on the surface of the CdSe quantum dots.

[0122] Step 4:

[0123] The reaction was heated for 2 hours to ensure the formation of the ZnS shell (maintaining the temperature at 100° C.), then cooled to room temperature, and the product was washed and separated with 20-50 parts by weight of isopropanol to obtain ZnS@CdSe nanoparticles.

[0124] 5. Cleaning and drying:

[0125] Step 1:

[0126] The prepared ZnS@CdSe nanoparticles were centrifuged and repeatedly washed with 30-50 parts by weight of isopropyl alcohol to remove any unreacted residues.

[0127] Step 2:

[0128] After cleaning, vacuum dry the ZnS@CdSe nanoparticles and store them for future use. Drying temperature: 40°C-60°C; drying time: 4-8 hours; pressure: 0.1 mbar to 0.5 mbar. This ensures efficient and uniform drying while ensuring particle integrity and functionality. Try to keep the temperature below 60°C to avoid thermal damage.

[0129] Notes:

[0130] During the entire synthesis process, nitrogen protection was used to prevent oxidation of CdSe quantum dots.

[0131] Temperature control is crucial to the core-shell structure of quantum dots. The formation of CdSe core requires a high temperature environment, while the coating of ZnS shell is usually carried out at a lower temperature.

[0132] The washing process is important to remove unreacted impurities, precursors, and excess ligands to ensure the purity and dispersion of the final product.

[0133] Through the above steps, ZnS@CdSe nanoparticles with excellent optical and electrical properties can be prepared, while ensuring their stability and uniform dispersion. These nanoparticles can be used for surface functionalization of release films, while also ensuring the optical, electrical properties and durability of core-shell quantum dots.

[0134] Example 4

[0135] In a three-necked flask, 0.05 parts by weight of CdO, 1.5 parts by weight of oleic acid, and 10 parts by weight of octadecene were added and heated to 150°C under nitrogen to form a Cd oleate solution. In another flask, 0.04 parts by weight of selenium powder and 2 parts by weight of oleylamine were mixed and heated to 120°C to form a Se precursor solution. The Se precursor solution was injected into the Cd oleate solution, and the temperature was immediately raised to 300°C. The reaction was maintained for 1 hour. After cooling, the CdSe cores were washed. The CdSe cores were dispersed in 12 parts by weight of octadecene, heated to 80°C, and 0.1 parts by weight of zinc acetate was added and stirred for 30 minutes. 0.02 parts by weight of H2S gas was introduced and the reaction was maintained at 100°C for 2 hours to obtain ZnS@CdSe nanoparticles.

[0136] Test: Particle size: about 8 nm; Optical absorption peak: 520 nm; Luminescence intensity (PL): 80%.

[0137] Example 5

[0138] In a three-necked flask, 0.04 parts by weight of CdO, 1.8 parts by weight of oleic acid, and 9 parts by weight of octadecene were added and heated to 160°C under nitrogen to form a Cd oleate solution. In another flask, 0.05 parts by weight of selenium powder and 2.5 parts by weight of oleylamine were mixed and heated to 125°C to form a Se precursor solution. The Se precursor solution was injected into the Cd oleate solution, and the temperature was immediately raised to 320°C. The reaction was maintained for 1 hour. After cooling, the CdSe cores were washed. The CdSe cores were dispersed in 15 parts by weight of octadecene, heated to 85°C, and 0.12 parts by weight of zinc acetate was added and stirred for 30 minutes. 0.025 parts by weight of H2S gas was then introduced and the reaction was maintained at 105°C for 2 hours to obtain ZnS@CdSe nanoparticles.

[0139] Test: Particle size: about 10 nm; Optical absorption peak: 530 nm; Luminescence intensity (PL): 85%.

[0140] Example 6

[0141] In a three-necked flask, 0.06 parts by weight of CdO, 1.3 parts by weight of oleic acid, and 8 parts by weight of octadecene were added and heated to 140°C under nitrogen to form a Cd oleate solution. In another flask, 0.06 parts by weight of selenium powder and 2 parts by weight of oleylamine were mixed and heated to 130°C to form a Se precursor solution. The Se precursor solution was injected into the Cd oleate solution, and the temperature was immediately raised to 310°C. The reaction was maintained for 1 hour. After cooling, the CdSe cores were washed. The CdSe cores were dispersed in 14 parts by weight of octadecene, heated to 90°C, and 0.15 parts by weight of zinc acetate was added and stirred for 30 minutes. 0.03 parts by weight of H2S gas was introduced, and the reaction was maintained at 110°C for 2 hours to obtain ZnS@CdSe nanoparticles.

[0142] Test: Particle size: about 12 nm; Optical absorption peak: 540 nm; Luminescence intensity (PL): 78%.

[0143] The ZnS@CdSe particles of Examples 4-6 were applied to Examples 1-3, and comparative experiments were conducted by replacing them with ZnO quantum dots, TiO2 quantum dots, and PbS quantum dots. The results showed that quantum effect particles of cadmium selenide coated with zinc sulfide can significantly provide excellent optical properties, mechanical strength, low peeling force, and self-healing ability.

[0144] The above description is only an illustrative embodiment of the present invention and is not intended to limit the scope of the present invention. Any equivalent changes, modifications and combinations made by any person skilled in the art without departing from the concept and principle of the present invention shall fall within the scope of protection of the present invention.

Claims

1. A low peeling force release film, comprising a PET substrate (1), a molybdenum disulfide layer (2) deposited on the surface of the PET substrate (1), and a self-repairing coating (3) coated on the outer side of the molybdenum disulfide layer (2); characterized in that: The thickness of the PET substrate (1) is 25 μm to 80 μm, the thickness of the molybdenum disulfide layer (2) is 5-15 nanometers, and the thickness of the self-repairing coating (3) is 10-100 nanometers.

2. A system for preparing the low peeling force release film according to claim 1, characterized in that: The preparation system comprises an ultrasonic cleaning machine (301), a dryer (302), a chemical vapor deposition reactor (303), a mixer (304), a spin coater (305), a drying oven (306) and a curing oven (307); the outlet of the ultrasonic cleaning machine (301) is connected to the dryer (302), the outlet of the dryer (302) is connected to the chemical vapor deposition reactor (303), the outlet of the chemical vapor deposition reactor (303) is connected to the spin coater (305), the outlet of the mixer (304) is also connected to the spin coater (305), the outlet of the spin coater (305) is connected to the drying oven (306), and the outlet of the drying oven (306) is connected to the curing oven (307).

3. A system for preparing the low peeling force release film according to claim 2, characterized in that: The set working temperature of the chemical vapor deposition reactor (303) is 500°C-600°C.

4. A system for preparing the low peeling force release film according to claim 2, characterized in that: The setting working temperature of the drying box (306) is 60-80°C, and the drying time is 30-60 minutes.

5. A system for preparing the low peeling force release film according to claim 2, characterized in that: The setting working temperature of the curing oven (307) is 120-150°C, and the curing time is 60-90 minutes.

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