Tail gas treatment device and system for laser of photoetching machine

Abstract

The utility model discloses a tail gas treatment device for a laser of a photoetching machine. The tail gas treatment device comprises a gas inlet pipeline, two tail gas treatment barrels which are connected in parallel and a gas exhaust pipeline, the utility model further discloses a photoetching machine laser tail gas treatment system which comprises a tail gas treatment device, at least one gas distribution module and at least one laser generator main cavity, the gas distribution module is connected with the corresponding laser generator main cavity, the gas distribution module is provided with a second gas outlet pipeline, and the second gas outlet pipeline is connected with the tail gas treatment device. According to the tail gas treatment device and system for the laser of the photoetching machine, the risk of harmful gas emission can be controlled, and the utilization rate of the photoetching machine can be improved.

Description

Technical Field

[0001] This utility model relates to the field of exhaust gas treatment for lithography machines, and in particular to an exhaust gas treatment device and system for lasers in lithography machines. Background Technology

[0002] In current semiconductor manufacturing, the process of lithography machine lasers generating lasers involves the emission of harmful gases such as F2 (fluorine gas).

[0003] In the lithography process of chip manufacturing, the current method for handling the exhaust gas from lasers in lithography machines is as follows: In each laser, the exhaust gas discharged from the main cavity of the laser generator enters a gas distribution module. Each gas distribution module uses a separate fluorine filter to remove the fluorine gas before it is directly discharged into the exhaust pipeline at the plant end. This type of fluorine filter has a short lifespan, high cost, and requires periodic replacement. During replacement, both the laser and the lithography machine cannot be used, resulting in low continuous operating capability and consequently low utilization of the lithography machine. Utility Model Content

[0004] The purpose of this invention is to provide a laser exhaust gas treatment device and system for lithography machines, which can not only control the risk of harmful gas emissions, but also improve the utilization rate of lithography machines.

[0005] To achieve the above objectives, this utility model provides a laser exhaust gas treatment device for a lithography machine, used to treat fluorine-containing waste gas generated in the laser chamber. The exhaust gas treatment device includes an inlet pipe, at least two parallel exhaust gas treatment tanks, and an exhaust pipe. The inlet pipe is equipped with a first pressure detection device. The exhaust gas treatment tanks contain a solid agent for adsorbing fluorine gas. The exhaust pipe is equipped with a gas detection device and a suction device. The output end of the inlet pipe is connected to the exhaust gas treatment tanks. An exhaust port is provided on the side wall of the exhaust gas treatment tanks and connected to the exhaust pipe. The treated gas in the exhaust gas treatment tanks is discharged through the exhaust port to the exhaust pipe, and after being detected by the gas detection device, it is discharged from the exhaust pipe.

[0006] As a further improvement of this utility model, the parallel exhaust gas treatment tank includes: a first exhaust gas treatment tank and a second exhaust gas treatment tank. The first exhaust gas treatment tank and the second exhaust gas treatment tank are respectively provided with a first branch and a second branch. Both the first branch and the second branch are connected to the air intake pipe. A first isolation valve and a second isolation valve are respectively provided on the first branch and the second branch. The first isolation valve controls the first exhaust gas treatment tank, and the second isolation valve controls the second exhaust gas treatment tank. A first exhaust port is provided on the side wall of the first exhaust gas treatment tank and is connected to the exhaust pipe. A second exhaust port is provided on the side wall of the second exhaust gas treatment tank and is connected to the exhaust pipe.

[0007] As a further improvement of this utility model, both the first exhaust gas treatment tank and the second exhaust gas treatment tank include a tank body and a lid. The tank body contains a solid agent for removing harmful gases, and the lid is connected to the tank body through several flanges.

[0008] As a further improvement of this utility model, the first branch is provided with a first flow meter, the second branch is provided with a second flow meter, the first isolation valve and the second isolation valve are controlled by a control component, and the first flow meter and the second flow meter are signal connected to the control component.

[0009] As a further improvement of this utility model, a first manual valve and a first nitrogen inlet are also provided on the first branch; a second manual valve and a second nitrogen inlet are also provided on the second branch.

[0010] As a further improvement of this utility model, a second pressure detection device is also provided on the exhaust pipe.

[0011] As a further improvement of this utility model, the gas detection device is a fluorine gas detector.

[0012] To achieve the above objectives, this utility model also provides a laser exhaust gas treatment system for a lithography machine, comprising: an exhaust gas treatment device, at least one gas distribution module, at least one laser generator main cavity, wherein the gas distribution module is connected to the corresponding laser generator main cavity, the gas distribution module is provided with a second exhaust pipe, and the second exhaust pipe is connected to the exhaust gas treatment device.

[0013] As a further improvement of this utility model, the gas distribution module is connected to the reaction gas supply end and delivers gas to the main cavity of the laser generator through the reaction gas delivery pipeline. The main cavity of the laser generator delivers tail gas to the gas distribution module through the reaction tail gas delivery pipeline. The gas distribution module delivers the tail gas to the inlet pipeline of the tail gas treatment device through the second outlet pipeline.

[0014] As a further improvement of this utility model, a second air extraction device and a third pressure detection device are provided on the second air outlet pipe.

[0015] Beneficial effects

[0016] Compared with existing technologies, the advantages of the lithography machine laser exhaust gas treatment device and system of this utility model are as follows:

[0017] In this invention, the laser exhaust gas treatment device for a lithography machine is equipped with an exhaust gas treatment tank, an exhaust pipe, and a gas detection device located on the exhaust pipe. The exhaust gas treatment tank contains a solid agent for removing fluorine gas, which can monitor the fluorine content of the gas emitted after treatment in real time. Furthermore, the exhaust gas treatment tanks and their corresponding branches are connected in parallel, and the switching between the first branch and the second branch can be controlled by a control component. Compared with the periodic replacement of the fluorine filter in the traditional gas distribution module, there is no need to shut down the lithography machine when the fluorine content in the treated gas exceeds the limit, thus improving the utilization rate of the lithography machine and saving costs.

[0018] Furthermore, the exhaust gas treatment device provided in this utility model can simultaneously connect to the laser exhaust gas pipelines of multiple lithography machines, uniformly treating the laser exhaust gas pipelines of multiple lithography machines. It eliminates the need for separate periodic replacement of each lithography machine laser, enabling unified and centralized management of harmful gases, saving costs, reducing lithography machine downtime and maintenance operations, thereby increasing production capacity. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 A schematic diagram of the structure of a laser exhaust gas treatment device for a lithography machine provided in an embodiment of this utility model;

[0021] Figure 2 This is a schematic diagram of the laser exhaust gas treatment system for the lithography machine in this utility model. Detailed Implementation

[0022] The present invention will be further described below with reference to specific embodiments shown in the accompanying drawings.

[0023] The specific embodiments of this utility model are as follows: Figure 1As shown, a laser exhaust gas treatment device for a lithography machine is used to treat fluorine-containing waste gas generated in the laser chamber. The exhaust gas treatment device includes an inlet pipe 6, at least two exhaust gas treatment tanks 7 connected in parallel, and an exhaust pipe 10. The inlet pipe 6 is equipped with a first pressure detection device 9. The exhaust gas treatment tanks 7 contain a solid agent for removing harmful gases. The exhaust pipe 10 is equipped with a gas detection device 14 and a suction device 11, which is a suction motor. The output end of the inlet pipe 6 is connected to the exhaust gas treatment tanks 7. An exhaust port is provided on the side wall of the exhaust gas treatment tanks 7 and is connected to the exhaust pipe 10. The gas treated in the first exhaust gas treatment tank 71 is discharged through the exhaust port to the exhaust pipe 10, and after being detected by the gas detection device 14, it is discharged from the exhaust pipe 10.

[0024] The lithography machine laser exhaust gas treatment device is equipped with an exhaust gas treatment tank 7, an exhaust pipe 10, and a gas detection device 14 located on the exhaust pipe 10. The exhaust gas treatment tank 7 is filled with a solid agent for removing fluorine gas, which can monitor the fluorine content of the gas emitted after treatment in real time. Moreover, the exhaust gas treatment tanks 7 and their corresponding branches are set in parallel. By switching different exhaust gas treatment tanks 7, compared with the periodic replacement of fluorine gas filters in traditional gas distribution modules, there is no need to shut down the lithography machine when the fluorine content in the treated gas exceeds the limit, which improves the utilization rate of the lithography machine and saves costs.

[0025] Specifically, the first pressure detection device 9 is a pressure gauge used to monitor the real-time pressure of the intake pipe 6. The gas detection device 14 is a fluorine gas detector. The fluorine gas detector detects the concentration of fluorine gas in the exhaust pipe 10 at this time. Once the fluorine gas detector detects fluorine gas exceeding the preset concentration, the intake pipe is closed and the solid reagent in the first exhaust gas treatment tank is replaced. The suction device 11 is a suction motor that can cause the exhaust gas to be discharged from the exhaust pipe 10.

[0026] Preferably, a second pressure detection device 13 is also provided on the exhaust pipe 10. The second pressure detection device is a pressure gauge, used to detect the pressure in the exhaust pipe. If an abnormal pressure is detected in the pipe, the exhaust device can be used to extract air and increase the exhaust rate.

[0027] In one specific embodiment, such as Figure 1As shown, the parallel exhaust gas treatment device includes a first exhaust gas treatment tank 71 and a second exhaust gas treatment tank 72. The first exhaust gas treatment tank 71 and the second exhaust gas treatment tank 72 are respectively provided with a first branch 81 and a second branch 82. Both the first branch 81 and the second branch 82 are connected to the intake pipe 6. A first isolation valve 151 and a second isolation valve 152 are respectively installed on the first branch 81 and the second branch 82. The first isolation valve 151 controls the first exhaust gas treatment tank 71, and the second isolation valve 152 controls the second exhaust gas treatment tank 72. A first exhaust port is provided on the side wall of the first exhaust gas treatment tank 71, and the first exhaust port is connected to the exhaust pipe 10. The second exhaust gas treatment tank 72 is provided on the side wall, and the second exhaust port is connected to the exhaust pipe 10. The first exhaust gas treatment tank 71 is the main exhaust gas treatment tank, and the second exhaust gas treatment tank 72 is the backup exhaust gas treatment tank.

[0028] The number of exhaust gas treatment tanks can be 2, 3, 4, etc. Multiple exhaust gas treatment tanks are connected in parallel and have their corresponding branches, ensuring that when one exhaust gas treatment tank needs maintenance, it can be switched to another exhaust gas treatment tank for exhaust gas treatment. There is no limit to this, and it can be set according to specific usage requirements.

[0029] Preferably, the exhaust gas treatment tank contains a solid particulate agent for adsorbing and removing fluorine gas, such as Ca(OH)2 (calcium hydroxide), and the agent particles contain water molecules.

[0030] The adsorption chemical reaction process is as follows:

[0031] 2F₂ + 2H₂O = 4HF + O₂

[0032] HF + M(OH)₂ → MF₂ + H₂O

[0033] Wherein, "M" represents a chemical element such as Ca. The above-described adsorption chemical reaction process can achieve a removal efficiency of over 99.5% for fluorine (F2). This invention does not impose specific limitations on the composition of the solid reagent, which can be set according to specific usage requirements. Since the TLV (Threshold Limit Value, an indicator of the toxicity of gases to the human body) of fluorine is 1 ppm, the emission concentration of fluorine should be less than 1 ppm. When the fluorine detector detects fluorine exceeding the preset concentration by 1 ppm, the exhaust gas treatment device needs to be maintained and the internal solid reagent replaced.

[0034] Preferably, since the solid reagent in the exhaust gas treatment tank 7 needs to be replaced when it can no longer adsorb fluorine gas, both the first exhaust gas treatment tank 71 and the second exhaust gas treatment tank 72 include a tank body and a lid. The tank body contains a solid reagent for removing harmful gases, and the lid is connected to the tank body via several flanges (not shown in the figure). The solid reagent can be replaced by disassembling the flanges connecting the tank body and the lid, and then the tank body and lid can be fixed by the flanges again, ensuring the airtightness of the exhaust gas treatment tank. Furthermore, the first exhaust gas treatment tank 71 and the second exhaust gas treatment tank 72 can be removed from the lithography machine laser exhaust gas treatment device. When the reagent needs to be replaced, a new exhaust gas treatment tank can be directly used on the machine.

[0035] Preferably, a first flow meter 181 is provided on the first branch 81, and a second flow meter 182 is provided on the second branch 82. The first isolation valve 151 and the second isolation valve 152 are controlled by a control component, and the first flow meter 181 and the second flow meter 182 are signal-connected to the control component. Specifically, both the first isolation valve 151 and the second isolation valve 152 are gas valves, and the control component is a solenoid valve 19. The first isolation valve 151 and the second isolation valve 152 are controlled by the solenoid valve 19, which is signal-connected to the first flow meter 181 and the second flow meter 182. The first isolation valve 151 and the second isolation valve 152 can be operated independently to control the inlet and outlet of gas respectively. The solenoid valve 19, through signal connection with the first flow meter and the second flow meter, can simultaneously control the first isolation valve 151 and the second isolation valve 152. When the first isolation valve 151 opens, it simultaneously controls the second isolation valve 152 to close. The types of the first isolation valve 151 and the second isolation valve 152 are not limited and can be set according to specific usage requirements.

[0036] Preferably, the first branch 81 is further provided with a first manual valve 161 and a first nitrogen inlet 171. The second branch 82 is further provided with a second manual valve 162 and a second nitrogen inlet 172.

[0037] The working process of the laser exhaust gas treatment device for lithography machines is as follows:

[0038] 1) Under normal operating conditions, the exhaust gas treatment device is automatically controlled by solenoid valve 19, first isolation valve 151 and its corresponding first flow meter 181, second isolation valve 152 and its corresponding second flow meter 182. If the first exhaust gas treatment tank 71 is working normally as the main exhaust gas treatment tank, the solenoid valve 19 controls the first isolation valve 151 to be in the open state, and the second isolation valve 152 corresponding to the second exhaust gas treatment tank 72 is in the closed state. The exhaust gas enters the first exhaust gas treatment tank 71 through the first branch 81. The fixed agent in the tank adsorbs fluorine gas. The treated gas without fluorine or with a fluorine concentration of less than 1 pmm is discharged from the exhaust pipe 10. The gas detection device 14 in the exhaust pipe 10 will detect the fluorine content of the discharged gas in real time to ensure that the discharged gas does not contain fluorine gas or has a fluorine concentration of less than 1 pmm. When the first flow meter 181 malfunctions, it sends a signal to the solenoid valve 19. The solenoid valve 19 controls the switching between the first isolation valve 151 and the second isolation valve 152, switching the first isolation valve 151 to the closed state and the second isolation valve 152 to the open state. The exhaust gas enters the second exhaust gas treatment tank 72 from the second branch 82. The second exhaust gas treatment tank 72 is also equipped with solid reagents.

[0039] 2) When the exhaust gas treatment device is not in operation, the solenoid valve 19 no longer controls the first isolation valve 151 and the second isolation valve 152. If the first exhaust gas treatment tank 71 is to be maintained, the first manual valve 161 on the first branch 81 is closed, and nitrogen is introduced from the first nitrogen inlet 171 for cleaning and purification. The fixed agent in the first exhaust gas treatment tank 71 is replaced. The same operation is performed if the second exhaust gas treatment tank 72 is to be maintained.

[0040] See Figure 2 In one embodiment of this utility model, a laser exhaust gas treatment system for a lithography machine is also provided, which includes: an exhaust gas treatment device, at least one gas distribution module 2, at least one laser generator main cavity 1, the gas distribution module 2 being connected to the corresponding laser generator main cavity 1, the gas distribution module 2 being provided with a second exhaust pipe 5, and the second exhaust pipe 5 being connected to the exhaust gas treatment device.

[0041] Preferably, the gas distribution module 2 is connected to the reaction gas supply end 21, and the gas is delivered to the main cavity 1 of the laser generator through the reaction gas delivery pipeline 22. The main cavity 1 of the laser generator delivers the exhaust gas to the gas distribution module 2 through the reaction exhaust gas delivery pipeline 23. The pipeline 24 inside the gas distribution module 2 delivers the exhaust gas to the inlet pipeline 6 of the exhaust gas treatment device through the second exhaust pipeline 5.

[0042] The second exhaust pipe 5 is equipped with a second air extraction device 3 and a third pressure detection device 4. The second air extraction device 3 is a corrosion-resistant pump.

[0043] In actual use, the input end of one air inlet pipe 6 can be connected to multiple gas distribution modules 2 at the same time to process the exhaust gas of multiple lithography machine lasers.

[0044] The first exhaust gas treatment tank 71 and the second exhaust gas treatment tank 72 monitor the flow rate through the first flow meter 181 and the second flow meter 182, respectively. The flow rate signal is fed back to the control component, and automatic switching occurs when the flow rate is abnormal. The first manual valve 161 and the second manual valve 162 are manually switched periodically to facilitate maintenance of individual exhaust gas treatment tanks. When maintaining the first exhaust gas treatment tank 71 and the second exhaust gas treatment tank 72, nitrogen is injected into the exhaust gas treatment tank through the first nitrogen inlet 171 and the second nitrogen inlet 172, respectively. The nitrogen is used to clean and purify the exhaust gas treatment tank, thereby enabling the simultaneous treatment of exhaust gas from multiple machines. Furthermore, when the flow rate of the branch corresponding to a single exhaust gas treatment tank is abnormal, there is no need to stop the machine for treatment, reducing the number of downtimes and maintenance, saving costs, and increasing production capacity.

[0045] The present invention has been described above in conjunction with the preferred embodiments, but the present invention is not limited to the embodiments disclosed above, but should cover various modifications and equivalent combinations made in accordance with the essence of the present invention.

Claims

1. A laser exhaust gas treatment device for a lithography machine, used to treat fluorine-containing waste gas generated in the laser chamber, characterized in that, The exhaust gas treatment device includes an intake pipe (6), at least two exhaust gas treatment tanks (7) connected in parallel, and an exhaust pipe (10). The intake pipe (6) is equipped with a first pressure detection device (9). The exhaust gas treatment tank (7) contains a solid agent for adsorbing fluorine gas. The exhaust pipe (10) is equipped with a gas detection device (14) and a gas extraction device (11). The output end of the intake pipe (6) is connected to the exhaust gas treatment tank (7). The exhaust gas treatment tank (7) has an exhaust port on its side wall. The exhaust port is connected to the exhaust pipe (10). The gas treated in the exhaust gas treatment tank (7) is discharged to the exhaust pipe (10) through the exhaust port and discharged from the exhaust pipe (10) after being detected by the gas detection device (14).

2. The laser exhaust gas treatment device for a lithography machine according to claim 1, characterized in that, The parallel exhaust gas treatment tank (7) includes: a first exhaust gas treatment tank (71) and a second exhaust gas treatment tank (72). The first exhaust gas treatment tank (71) and the second exhaust gas treatment tank (72) are respectively provided with a first branch (81) and a second branch (82). The first branch (81) and the second branch (82) are both connected to the intake pipe (6). The first branch (81) and the second branch (82) are respectively provided with a first isolation valve (151) and a second isolation valve (152). The first isolation valve (151) controls the first exhaust gas treatment tank (71), and the second isolation valve (152) controls the second exhaust gas treatment tank (72). The first exhaust gas treatment tank (71) has a first exhaust port on its side wall, which is connected to the exhaust pipe (10). The second exhaust gas treatment tank (72) has a second exhaust port on its side wall, which is connected to the exhaust pipe (10).

3. The laser exhaust gas treatment device for a lithography machine according to claim 2, characterized in that, Both the first exhaust gas treatment tank (71) and the second exhaust gas treatment tank (72) include a tank body and a lid. The tank body contains a solid agent for removing harmful gases. The lid is connected to the tank body through several flanges.

4. The laser exhaust gas treatment device for a lithography machine according to claim 2, characterized in that, The first branch (81) is equipped with a first flow meter (181), and the second branch (82) is equipped with a second flow meter (182). The first isolation valve (151) and the second isolation valve (152) are controlled by a control component, and the first flow meter (181) and the second flow meter (182) are signal connected to the control component.

5. The laser exhaust gas treatment device for a lithography machine according to claim 4, characterized in that, The first branch (81) is also provided with a first manual valve (161) and a first nitrogen inlet (171); the second branch (82) is also provided with a second manual valve (162) and a second nitrogen inlet (172).

6. The laser exhaust gas treatment device for a lithography machine according to claim 1, characterized in that, A second pressure detection device (13) is also provided on the exhaust pipe (10).

7. The laser exhaust gas treatment device for a lithography machine according to claim 1, characterized in that, The gas detection device (14) is a fluorine gas detector.

8. A laser exhaust gas treatment system for a lithography machine, characterized in that, include: The exhaust gas treatment device according to any one of claims 1 to 7 includes at least one gas distribution module (2) and at least one laser generator main cavity (1), wherein the gas distribution module (2) is connected to the corresponding laser generator main cavity (1), and the gas distribution module (2) is provided with a second exhaust pipe (5), which is connected to the exhaust gas treatment device.

9. A laser exhaust gas treatment system for a lithography machine according to claim 8, characterized in that, The gas distribution module (2) is connected to the reaction gas supply end (21) and delivers gas to the main cavity (1) of the laser generator through the reaction gas delivery pipeline (22). The main cavity (1) of the laser generator delivers tail gas to the gas distribution module (2) through the reaction tail gas delivery pipeline (23). The gas distribution module (2) delivers the tail gas to the inlet pipeline (6) of the tail gas treatment device through the second outlet pipeline (5).

10. A laser exhaust gas treatment system for a lithography machine according to claim 9, characterized in that, The second air outlet pipe (5) is equipped with a second air extraction device (3) and a third pressure detection device (4).

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