Diffusion pollution prevention device for plasma
Through the design of anti-diffusion pollution device, the plasma is extracted by using vacuum tubes and guide plates, which solves the problems of contamination caused by plasma drift and loosening of fixed plates, and realizes stable fixation and efficient processing of plasma.
Patent Information
- Application Number
- CN202421705410.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-18
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2034-07-18
AI Technical Summary
Plasma drift in a vacuum environment leads to contamination and loosening of the fixing plate, increasing the risk of plasma leakage and affecting processing efficiency and results.
An anti-proliferation pollution device is used, including a base, a fixed plate, a vacuum tube, a sealing component and a guide plate. The plasma is extracted through the vacuum tube, the sealing component and the fixed component are used to improve the stability of the fixed plate, and the guide plate is used to gather redundant plasma to reduce pollution.
Effectively avoid plasma sputtering of the vacuum chamber, improve the stability of the fixed plate, reduce plasma leakage, reduce contamination risks, and improve processing efficiency.
Smart Images
Figure CN223486990U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of plasma processing technology, specifically a device for preventing the spread and contamination of plasma. Background Technology
[0002] Plasma processing often takes place in a vacuum environment and has high requirements for the vacuum environment. Plasma generating equipment continuously produces plasma, and the continuously output plasma drifts around in the vacuum environment. If the generated plasma is not treated, it will pollute the vacuum environment and affect the processing efficiency and processing effect.
[0003] Current devices, in restricting plasma drift, cause the mounting plate on the base to loosen, leading to a risk of plasma leakage. Utility Model Content
[0004] This application provides a device for preventing the spread and contamination of plasma, which can prevent the generated plasma from sputtering into the vacuum cavity and increase the stability of the fixing plate on the base.
[0005] This application provides a plasma anti-diffusion contamination device, including a base and a fixing plate detachably mounted on the base; the base has a hollow cavity for ion source excitation injection, and the fixing plate has a communication hole communicating with the hollow cavity; a vacuum tube is detachably mounted on one side of the hollow cavity on the base, the chamber of the vacuum tube communicating with the chamber of the hollow cavity, and the base is provided with a sealing assembly for fixing the fixing plate and a fixing assembly for fixing the fixing plate on the base.
[0006] By adopting the above technical solution, the anti-diffusion pollution device in this application is provided with a hollow cavity for ion source excitation injection and a detachable vacuum tube disposed on one side of the hollow cavity. The plasma is extracted from the hollow cavity through the vacuum tube, thereby avoiding the pollution caused by the generated plasma sputtering into the vacuum cavity. Furthermore, the fixing component on the fixing plate helps to fix the fixing plate to the base, and the use of the sealing component helps to reduce the risk of plasma escaping from the gap between the fixing plate and the base, thereby reducing the risk of plasma sputtering out and causing pollution.
[0007] Optionally, the fixing component includes a plurality of connecting blocks extending from the periphery of the fixing plate, and a fixing groove on the base for the plurality of connecting blocks to pass through; the base has a positioning groove on one side of the fixing groove for the connecting blocks to rotate and engage.
[0008] By adopting the above technical solution, the connecting block is inserted into the fixing groove on the base, and the fixing plate is rotated to make the connecting block rotate and snap into the positioning groove, thereby realizing the fixed connection between the fixing plate and the base and improving the stability of the connection between the two.
[0009] Optionally, the connecting block has a first connecting hole, and the base has a second connecting hole that communicates with the first connecting hole. The second connecting hole also communicates with the cavity of the positioning groove. The connecting block is provided with a connecting rod that passes through both the first connecting hole and the second connecting hole.
[0010] By adopting the above technical solution, the connecting rod is simultaneously passed through the first connecting hole and the second connecting hole, thereby enabling the fixing plate to be stably fixed on the base.
[0011] Optionally, the sealing assembly includes a sealing ring disposed between the base and the fixing plate, the base having a sealing groove for the sealing ring to engage, and the upper side of the sealing ring tightly abutting against the lower side of the fixing plate fixed to the base.
[0012] By adopting the above technical solution, the sealing ring on the sealing component is fixed between the fixed plate and the base, thereby reducing the risk of plasma escaping from the gap between the fixed plate and the base, and thus reducing the risk of plasma sputtering out and causing pollution.
[0013] Preferably, the base has a parabolic surface formed on the cavity wall of the hollow cavity for the ion source to operate on; a guide plate is arranged around the bottom of the fixing plate; the guide plate is located inside the hollow cavity and divides the hollow cavity into a first guide cavity and a second guide cavity; the first guide cavity is in communication with the space where the ion source is located, and the bottom of the guide plate is provided with a gap between the cavity wall at the bottom of the hollow cavity and the gap connects the first guide cavity and the second guide cavity.
[0014] By adopting the above technical solution, this application uses the parabolic surface setting on the base and the guiding effect of the guide plate to gather redundant plasma generated by plasma residence during plasma processing, and to carry out convection in the first guide cavity and circulation in the second guide cavity. Then, the gathered plasma is sucked away through the vacuum tube, thereby effectively reducing plasma diffusion pollution.
[0015] Preferably, the guide plate includes an integrally formed first guide portion, a second guide portion, and a third guide portion. The first guide portion is connected to the bottom of the fixed plate. The second guide portion is recessed inward toward the cavity of the first guide cavity. The third guide portion extends toward the cavity wall at the bottom of the hollow cavity, and the gap is located between the third guide portion and the cavity wall at the bottom of the hollow cavity.
[0016] By adopting the above technical solution, the second guide section on the guide plate is recessed inward toward the cavity of the first guide chamber, while the third guide section extends toward the cavity wall at the bottom of the hollow cavity, thereby forming convection between the third guide section and the cavity wall at the bottom of the hollow cavity. In addition, the second guide section forms circulation toward the parabolic cavity wall of the hollow cavity on the base, which helps to accumulate redundant plasma generated by plasma residence, so that the accumulated plasma can be extracted by the vacuum tube.
[0017] Preferably, the base has a suction hole on the side wall of the hollow cavity parabolic surface, and the length direction of the suction hole is parallel to the tangent direction of the curved surface; the vacuum tube is fixed and passes through the suction hole.
[0018] One or more technical solutions provided in this application have at least the following technical effects or advantages:
[0019] 1. The present application uses a fixing component on the fixing plate to help fix the fixing plate to the base, and the use of a sealing component helps to reduce the risk of plasma escaping from the gap between the fixing plate and the base, thereby reducing the risk of plasma sputtering out and causing pollution.
[0020] 2. This application uses the parabolic surface on the base and the guiding effect of the guide plate to gather redundant plasma generated during plasma processing, and to conduct convection in the first guide cavity and circulation in the second guide cavity. Then, the gathered plasma is sucked away through the vacuum tube, thereby effectively reducing plasma diffusion pollution.
[0021] 3. This application adopts a method of simultaneously passing the connecting rod through the first connecting hole and the second connecting hole, so that the fixing plate can be stably fixed on the base, which helps to gather plasma on the base and allow the gathered plasma to be extracted by the vacuum tube. Attached Figure Description
[0022] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0023] Figure 1 This is a schematic diagram of the overall structure of the anti-diffusion contamination device for plasma in the embodiments of this application;
[0024] Figure 2 This is a schematic diagram of the explosion structure of the plasma anti-proliferation contamination device in the embodiments of this application;
[0025] Figure 3This is a schematic diagram of the overall structure of the fixing plate in the embodiment of this application;
[0026] Figure 4 This is a cross-sectional structural schematic diagram of the anti-diffusion contamination device for plasma in an embodiment of this application;
[0027] Figure 5 This is a cross-sectional structural schematic diagram of the anti-diffusion contamination device for plasma in an embodiment of this application;
[0028] Figure 6 This is a schematic diagram of the explosion structure of the anti-proliferation contamination device for plasma in the embodiments of this application.
[0029] Explanation of reference numerals in the attached drawings: 1. Base; 11. Hollow cavity; 111. First guide cavity; 112. Second guide cavity; 113. Gap; 12. Suction hole; 13. Second fixing hole; 14. Second connecting hole; 2. Fixing plate; 21. Connecting hole; 22. Guide plate; 221. First guide section; 222. Second guide section; 223. Third guide section; 23. Connecting block; 231. First connecting hole; 232. Connecting rod; 3. Vacuum tube; 31. First pipe; 32. Second pipe; 33. Fixing block; 331. First fixing hole; 332. Fixing rod; 4. Sealing assembly; 41. Sealing ring; 42. Sealing groove; 5. Fixing assembly; 52. Fixing groove; 53. Positioning groove. Detailed Implementation
[0030] This application provides a device for preventing the spread and contamination of plasma, which can prevent the generated plasma from sputtering into the vacuum cavity and increase the stability of the fixing plate on the base.
[0031] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.
[0032] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or server that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or modules not explicitly listed or inherent to such processes, methods, products, or devices.
[0033] Reference Figure 1 and Figure 2 An embodiment of this application provides a plasma anti-diffusion contamination device, which includes a base 1 and a fixing plate 2 detachably mounted on the base 1.
[0034] The base 1 has a hollow cavity 11 for ion source excitation, and the fixing plate 2 has a connecting hole 21 that communicates with the hollow cavity 11. The plasma excited by the ion source enters the hollow cavity 11 through the connecting hole 21 on the fixing plate 2.
[0035] In addition, a vacuum tube 3 is detachably installed on one side of the hollow cavity 11, and the chamber of the vacuum tube 3 is connected to the chamber of the hollow cavity 11. The plasma is extracted from the hollow cavity 11 through the vacuum tube 3, thereby avoiding contamination caused by the generated plasma sputtering into the vacuum cavity.
[0036] Combine Figure 1 and Figure 2 The base 1 is provided with a sealing assembly 4 to seal the fixing plate 2 to the base 1, and a fixing assembly 5 to fix the fixing plate 2 to the base 1. Specifically, the fixing assembly 5 includes four connecting blocks 23 extending from the periphery of the fixing plate 2 and a fixing groove 52 on the base 1 for the multiple connecting blocks 23 to pass through. The four connecting blocks 23 are arranged perpendicularly to each other. Furthermore, the base 1 has a positioning groove 53 on one side of the fixing groove 52 for the connecting blocks 23 to rotate and engage. By passing the connecting blocks 23 through the fixing groove 52 on the base 1 and rotating the fixing plate 2 to make the connecting blocks 23 rotate and engage in the positioning groove 53, a fixed connection between the fixing plate 2 and the base 1 is achieved, improving the stability of the connection.
[0037] In addition, the connecting block 23 has a first connecting hole 231, and the base 1 has a second connecting hole 14 that communicates with the first connecting hole 231. The second connecting hole 14 also communicates with the cavity of the positioning groove 53. A connecting rod 232 is provided on the connecting block 23, and the connecting rod 232 passes through both the first connecting hole 231 and the second connecting hole 14. By passing the connecting rod 232 through both the first connecting hole 231 and the second connecting hole 14, the fixing plate 2 can be stably fixed on the base 1.
[0038] In addition, the sealing assembly 4 includes a sealing ring 41 disposed between the base 1 and the fixing plate 2. The base 1 has a sealing groove 42 for the sealing ring 41 to engage. The upper side of the sealing ring 41 is tightly abutted against the lower side of the fixing plate 2 fixed on the base 1, thereby reducing the risk of plasma escaping from the gap between the fixing plate 2 and the base 1.
[0039] Reference Figure 3 and Figure 4 The base 1 has a parabolic surface formed on the cavity wall of the hollow cavity 11 for the ion source to operate on. Furthermore, a guide plate 22 is arranged around the bottom of the fixing plate 2; the guide plate 22 is located inside the hollow cavity 11 and divides the hollow cavity 11 into a first guide cavity 111 and a second guide cavity 112. The first guide cavity 111 communicates with the space where the ion source is located, and a gap 113 is provided between the bottom of the guide plate 22 and the bottom cavity wall of the hollow cavity 11, the gap 113 connecting the first guide cavity 111 and the second guide cavity 112.
[0040] Combine Figure 5 Furthermore, the guide plate 22 includes an integrally formed first guide portion 221, a second guide portion 222, and a third guide portion 223. The first guide portion 221 is integrally connected to the bottom of the fixed plate 2. The second guide portion 222 is recessed inward toward the chamber of the first guide cavity 111, and the third guide portion 223 extends toward the cavity wall at the bottom of the hollow cavity 11. A gap 113 is located between the third guide portion 223 and the cavity wall at the bottom of the hollow cavity 11. Therefore, plasma flows from the first guide cavity 111 to the second guide cavity 112 through the gap 113, and convection is formed between the second guide portion 222, the third guide portion 223, and the bottom of the hollow cavity 11 on the guide plate 22. Due to the function of the vacuum tube 3, the pressure in the second hollow cavity 11 changes, and the second guide section 222 forms a circulation towards the parabolic cavity wall of the hollow cavity 11 on the base 1, which helps to accumulate redundant plasma generated by plasma residence, so that the accumulated plasma can be extracted by the vacuum tube 3, thereby effectively reducing plasma diffusion pollution.
[0041] Reference Figure 6The base 1 has a suction hole 12 on the parabolic side wall of the hollow cavity 11. The length direction of the suction hole 12 is parallel to the tangent direction of the curved surface, which helps to form a circulation in the second guide cavity 112.
[0042] Additionally, the vacuum tube 3 includes an integrally connected first pipe 31 and a second pipe 32 perpendicularly connected to the first pipe 31. The first pipe 31 has a suction hole 12, and the second pipe 32 has a fixing block 33 with a first fixing hole 331. The side wall of the base 1 has a second fixing hole 13 communicating with the first fixing hole 331. The fixing block 33 has a fixing rod 332 that passes through both the first fixing hole 331 and the second fixing hole 13. In this embodiment, the fixing rod 332 is a bolt, which passes through both the first fixing hole 331 and the second fixing hole 13, using a threaded connection, so that the second pipe 32 connected to the fixing block 33 can be fixed to the base 1.
[0043] It should be noted that the order of the embodiments described above is merely for descriptive purposes and does not represent the superiority or inferiority of the embodiments. Furthermore, specific embodiments have been described above. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps described in the claims can be performed in a different order than that shown in the embodiments and still achieve the desired result. Additionally, the processes depicted in the drawings do not necessarily require a specific or sequential order to achieve the desired result. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.
[0044] The above description is only a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.
[0045] This specification and accompanying drawings are merely illustrative examples of this application and are intended to cover any and all modifications, variations, combinations, or equivalents within the scope of this application. Clearly, those skilled in the art can make various alterations and modifications to this application without departing from its scope. Therefore, if such modifications and modifications fall within the scope of this application and its equivalents, this application intends to include such modifications and modifications.
Claims
1. A device for preventing the spread and contamination of plasma, characterized in that, The device includes a base (1) and a fixing plate (2) detachably mounted on the base (1); the base (1) has a hollow cavity (11) for ion source excitation injection, and the fixing plate (2) has a communication hole (21) communicating with the hollow cavity (11); a vacuum tube (3) is detachably mounted on one side of the hollow cavity (11) on the base (1), and the chamber of the vacuum tube (3) communicates with the chamber of the hollow cavity (11); the base (1) is provided with a sealing assembly (4) for sealing the fixing plate (2) and the base (1) and a fixing assembly (5) for fixing the fixing plate (2) on the base (1).
2. The anti-diffusion contamination device for plasma as described in claim 1, characterized in that, The fixing component (5) includes a plurality of connecting blocks (23) extending from the periphery of the fixing plate (2), and a fixing groove (52) on the base (1) for the plurality of connecting blocks (23) to pass through; the base (1) has a positioning groove (53) on one side of the fixing groove (52) for the connecting blocks (23) to be rotated and inserted.
3. The anti-diffusion contamination device for plasma as described in claim 2, characterized in that, The connecting block (23) has a first connecting hole (231), and the base (1) has a second connecting hole (14) that communicates with the first connecting hole (231). The second connecting hole (14) also communicates with the cavity of the positioning groove (53). The connecting block (23) is provided with a connecting rod (232), which passes through both the first connecting hole (231) and the second connecting hole (14).
4. The anti-diffusion contamination device for plasma as described in claim 1, characterized in that, The sealing assembly (4) includes a sealing ring (41) disposed between the base (1) and the fixing plate (2). The base (1) has a sealing groove (42) for the sealing ring (41) to engage. The upper side of the sealing ring (41) is tightly abutted against the lower side of the fixing plate (2) fixed on the base (1).
5. The anti-diffusion contamination device for plasma as described in claim 1, characterized in that, The base (1) is located on the cavity wall of the hollow cavity (11) and forms a parabolic surface for the ion source to run on. The bottom of the fixing plate (2) is surrounded by a flow guide plate (22). The flow guide plate (22) is located inside the hollow cavity (11) and divides the hollow cavity (11) into a first flow guide cavity (111) and a second flow guide cavity (112). The first flow guide cavity (111) is connected to the space where the ion source is located. The bottom of the flow guide plate (22) and the cavity wall at the bottom of the hollow cavity (11) are provided with a gap (113). The gap (113) connects the first flow guide cavity (111) and the second flow guide cavity (112).
6. The anti-diffusion contamination device for plasma as described in claim 5, characterized in that, The guide plate (22) includes an integrally formed first guide portion (221), a second guide portion (222), and a third guide portion (223). The first guide portion (221) is connected to the bottom of the fixed plate (2). The second guide portion (222) is recessed inward toward the chamber of the first guide cavity (111). The third guide portion (223) extends toward the cavity wall at the bottom of the hollow cavity (11). The gap (113) is located between the third guide portion (223) and the cavity wall at the bottom of the hollow cavity (11).
7. The anti-diffusion contamination device for plasma as described in claim 5, characterized in that, The base (1) is provided with a suction hole (12) on the side wall of the parabolic surface of the hollow cavity (11), and the length direction of the suction hole (12) is parallel to the tangent direction of the curved surface; the vacuum tube (3) is fixed and passes through the suction hole (12).