Vibration isolation platform equipment
By combining the main base, auxiliary base, locking components, and vibration isolators, the problem of the vibration isolation platform equipment being unable to be transported as a whole is solved, enabling efficient equipment handling and rapid reconfiguration, improving the overall integrity and ease of operation of the equipment, and ensuring high-precision wafer inspection.
Patent Information
- Application Number
- CN202520229205.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-13
- Publication Date
- 2025-11-21
- Estimated Expiration
- 2035-02-13
AI Technical Summary
The existing vibration isolation platform equipment has a single and separate structure, which makes it impossible to transport the equipment as a whole, increasing the inconvenience of handling and the risk of equipment damage. In addition, the vibration isolation performance is insufficient to meet the requirements of high-precision wafer inspection, and the overall integrity and ease of operation of the equipment are poor.
Design a vibration isolation platform device that achieves overall handling and rapid reconfiguration of the equipment through the combination of a main base, auxiliary base, locking components, and vibration isolators, isolates vibration sources, uses a marble platform and air-floating vibration isolators to improve vibration isolation performance, and separates the electrical control box and controller from the detection unit.
It enables the overall relocation and rapid reconfiguration of the equipment, improves production efficiency, reduces floor space, ensures the high precision and stability of the testing unit, simplifies the operation process, and improves the integration and reliability of the equipment.
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Figure CN223579394U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the field of semiconductor wafer detection, especially to a vibration isolation platform equipment. BACKGROUND
[0002] With the rapid development of semiconductor technology, wafer detection plays a crucial role in the semiconductor manufacturing process. Wafer detection equipment uses high-precision optical imaging, electron beam scanning and other technical means to accurately measure and detect the tiny defects, structure size and electrical properties of the wafer surface, thereby ensuring the high performance and high reliability of semiconductor devices. However, wafer detection equipment has very high requirements for the stability of the working environment, especially the sensitivity to vibration. Tiny vibrations can cause blurring of optical imaging, decrease in measurement accuracy and inaccuracy of detection results, thereby affecting the yield and production efficiency of semiconductor manufacturing. Therefore, as a key component of wafer detection equipment, the main function of the vibration isolation platform is to isolate the detection equipment from external vibration sources and provide a stable, low-vibration working environment for the detection unit, thereby ensuring the high precision and high reliability of wafer detection. The performance of the vibration isolation platform directly affects the detection accuracy, repeatability and stability of the wafer detection equipment, and is an indispensable technical guarantee for high-precision wafer detection.
[0003] Currently, the vibration isolation platforms commonly used in wafer detection equipment are mostly single structures. Such single-structure vibration isolation platforms are usually made of a piece of marble or metal material, which can provide support and a certain vibration isolation effect to some extent, but due to their relatively simple structure, the vibration isolation performance often fails to meet the needs of high-precision wafer detection. In addition, the single-structure vibration isolation platform is separate from other structures of the whole machine (such as electrical control boxes, control cabinets, etc.), and there are multiple bases. For example, the detection unit may be installed on a marble base, while the electrical control box and control cabinet are installed on other independent bases. This separate structure design makes the overall equipment less integrated, not only increasing the floor space of the equipment, but also making the assembly, debugging and maintenance process of the equipment complex and cumbersome, reducing the integration and operability of the equipment.
[0004] Due to the single-structure and separate-base design of the current vibration isolation platform, the equipment cannot be moved as a whole. In a semiconductor manufacturing plant, the installation position of the equipment may need to be adjusted according to production needs, or the equipment may need to be moved from one workshop to another. However, due to the multiple base structure of the equipment, it cannot be moved as a whole, which brings great inconvenience to the movement and reinstallation of the equipment. Each time the equipment needs to be moved, it needs to be disassembled into multiple parts and then reassembled, which not only consumes time and effort, but also increases the risk of equipment damage. SUMMARY
[0005] The utility model provides a vibration isolation platform equipment can avoid vibration transmission of vibration source of vibration isolation platform equipment to platform while realizing integral carrying of vibration isolation platform equipment.
[0006] The technical scheme of the utility model is as follows:
[0007] The utility model provides a vibration isolation platform equipment, vibration isolation platform equipment includes:
[0008] Main base;
[0009] Platform;
[0010] Vibration isolator, vibration isolator sets up between main base with platform to avoid vibration transmission of main base to platform;
[0011] Auxiliary base, auxiliary base sets up with main base is separated;
[0012] Locking piece, locking piece is used for with main base releasably locked to auxiliary base;
[0013] Vibration source, vibration source sets up on auxiliary base.
[0014] In some optional examples, the vibration isolation platform device further comprises a positioning pin for keeping the relative position relationship between the main base and the auxiliary base fixed.
[0015] In some optional examples, the platform is a marble platform, and the marble platform is used to arrange a detection unit.
[0016] In some optional examples, the vibration source comprises an electric control box and a controller, the electric control box is used to power the detection unit, and the controller is used to process data generated by the detection unit.
[0017] In some optional examples, the vibration isolator is an air floating vibration isolator.
[0018] In some optional examples, the detection unit is used to detect a wafer.
[0019] In some optional examples, the number of air floating vibration isolators is four, and the air floating vibration isolators are arranged at four vertices of a rectangle respectively.
[0020] In some optional examples, the vibration isolation platform device further comprises an air floating locking plate for keeping the platform on the vibration isolator.
[0021] In some optional examples, the main base comprises a body and a bottom plate, and the locking piece locks the bottom plate and the auxiliary base.
[0022] In some alternative examples, the body and the base plate are secured together by welding.
[0023] The utility model provides a kind of vibration isolation platform equipment, and main base and auxiliary base are locked quickly by locking member or release, realize integral handling and quick re-machine.It is locked by locking member when handling, and equipment can be used as a whole with fork truck etc. Easy handling, avoid the cumbersome process of traditional equipment disassembly and reassembly, significantly reduce downtime, improve production efficiency.After handling is completed, release locking member can quickly restore working condition, without complex debugging.In addition, auxiliary base is separated from main base, and vibration source is arranged on auxiliary base, this design effectively isolates vibration, prevents its transmission to platform, ensures the high-precision operation of detection unit.Simultaneously, this design makes that equipment overall structure is compact, reduces floor area, saves workshop space.Operating personnel can easily complete locking and release operation, without complex tool or skill, improve operation convenience and reliability and safety of equipment. BRIEF DESCRIPTION OF DRAWINGS
[0024] Figure 1 It is a front view schematic diagram of vibration isolation platform equipment according to the embodiment of the utility model.
[0025] Figure 2 It is a side view schematic diagram of vibration isolation platform equipment according to the embodiment of the utility model.
[0026] Figure 3 It is a sectional view schematic diagram of vibration isolation platform equipment according to the embodiment of the utility model.
[0027] Figure 4 It is a top view schematic diagram of vibration isolation platform equipment according to the embodiment of the utility model, wherein the platform of vibration isolation platform equipment is not shown. DETAILED DESCRIPTION
[0028] The technical solutions in the utility model will be described clearly and completely in combination with the drawings in the utility model.
[0029] In the field of semiconductor wafer detection, vibration isolation platform is the key component to ensure that detection equipment can be accurately measured.However, the existing vibration isolation platform mostly adopts single body structure, and this structure is usually made of a piece of marble, although it can provide certain support and vibration isolation effect, but its vibration isolation performance is limited, difficult to meet the requirements of high-precision wafer detection.In addition, the vibration isolation platform of this single body structure is separated from other components (such as electric control box and control cabinet) of the equipment, so that the equipment needs multiple bases to support different parts.This separated design not only increases the floor area of the equipment, but also makes the assembly, debugging and maintenance process of the equipment complex and cumbersome, reduces the overall integration and operation convenience of the equipment.
[0030] Further, the existing vibration isolation platform design cannot realize the whole equipment handling. In the actual semiconductor manufacturing environment, the equipment may need to be adjusted in position or transported between different workshops according to production needs. However, due to the multiple base structures of the equipment, it cannot be handled as a whole, which brings great inconvenience to the movement and reinstallation of the equipment. Each time of handling needs to disassemble the equipment into multiple parts and then reassemble, which not only consumes time and effort, but also increases the risk of equipment damage.
[0031] In order to solve the problems existing in the prior art, the utility model provides a novel vibration isolation platform equipment. The equipment improves the vibration isolation performance through innovative design, realizes the whole equipment handling and rapid reinstallation, and significantly improves the integration and operation convenience of the equipment. Specifically, referring to Figure 1 and Figure 2 , the utility model embodiment provides a vibration isolation platform equipment 1, which can include a main base 10, a platform 20, a vibration isolator 30, an auxiliary base 40, a locking piece 50 and a vibration source 60.
[0032] The vibration isolator 30 is arranged between the main base 10 and the platform 20 to avoid the vibration of the main base 10 being transmitted to the platform 20.
[0033] The auxiliary base 40 is arranged to be separated from the main base 10.
[0034] The locking piece 50 is used to releasably lock the main base 10 to the auxiliary base 40.
[0035] The vibration source 60 is arranged on the auxiliary base 40, as shown in Figure 2 .
[0036] When the vibration isolation platform equipment 1 needs to be adjusted in position or transported between different workshops, the locking piece 50 can lock the main base 10 to the auxiliary base 40. This design allows the vibration isolation platform equipment 1 to be handled as a whole, avoiding the cumbersome process of disassembling and reassembling the traditional equipment. For example, in a semiconductor manufacturing plant, the installation position of the vibration isolation platform equipment 1 may need to be adjusted according to production needs, or the vibration isolation platform equipment 1 needs to be transported from one workshop to another. By locking the main base 10 and the auxiliary base 40 with the locking piece 50, the whole vibration isolation platform equipment 1 can be easily transported to the designated position using a forklift or other handling tools, as shown in Figure 2 the fork teeth F of the forklift.
[0037] After the transportation is completed, the locking member 50 can release the main base 10 from the auxiliary base 40, and the vibration isolation platform device 1 can quickly recover to the working state. The ability of quick recovery greatly reduces the downtime and improves the production efficiency. For example, after the device is transported to a new position, the vibration isolation platform device 1 can be put into use again by only loosening the locking member 50, without a complicated reinstallation and debugging process. Moreover, the auxiliary base 40 is arranged to be separated from the main base 10, and the vibration source 60 is arranged on the auxiliary base 40, and the separated design ensures that the vibration generated by the vibration source 60 cannot be transmitted to the platform 20, thereby ensuring the vibration isolation effect. For example, the vibration source 60 can generate certain vibration, and if the vibration is transmitted to the platform 20 where the detection unit is located, the detection accuracy can be reduced. By separating the vibration source 60 from the platform 20, the vibration interference can be effectively avoided, and the high-precision operation of the detection unit is ensured.
[0038] By designing the main base 10 and the auxiliary base 40 to be separable and quickly locked, the overall structure of the vibration isolation platform device 1 is more compact, and the floor area is reduced. For example, the traditional device needs a larger space to arrange various components due to the existence of multiple bases. However, the vibration isolation platform device 1 of the utility model optimizes the structural design, so that the vibration isolation platform device 1 can be placed together compactly when not in use, thereby saving valuable workshop space. The design of the vibration isolation platform device 1 enables the operator to easily perform the transportation and recovery operation. For example, the operation of the locking member 50 is simple and fast, and the operator can complete the locking and releasing without complicated tools or skills. Such a design not only improves the convenience of operation, but also reduces the errors that can occur in the operation process, thereby improving the reliability and safety.
[0039] In some embodiments of the utility model, referring to Figure 3 , the vibration isolation platform device 1 can further include a positioning pin 70, which is used to keep the relative position relationship between the main base 10 and the auxiliary base 40 fixed.
[0040] The positioning pin 70 is used to keep the relative position relationship between the main base 10 and the auxiliary base 40 fixed. Through the precise positioning pin design, it can ensure that the main base 10 and the auxiliary base 40 always maintain the correct relative position before and during the locking of the locking member 50. This precise position relationship is crucial for the overall stability and vibration isolation effect of the device. Due to the presence of the positioning pin 70, the locking member 50 can more accurately align the locking point when locking the main base 10 and the auxiliary base 40, thereby improving the reliability and safety of the locking. For example, during the handling process, the device may be affected by external forces, and if there is no precise positioning, the locking member 50 may be loose or misaligned, and the positioning pin 70 can effectively avoid these problems. The design of the positioning pin 70 allows the main base 10 and the auxiliary base 40 to be quickly aligned and fixed before handling, greatly simplifying the locking operation. The operator does not need to spend a lot of time adjusting the position of the two bases, thereby improving the overall handling efficiency. For example, in a production environment where the device needs to be frequently handled, the positioning pin 70 can significantly reduce the device preparation time and improve production efficiency. By ensuring the correct position relationship between the main base 10 and the auxiliary base 40, the positioning pin 70 can reduce the risks that may occur during handling. For example, if the two bases are not properly aligned before handling, it may cause the device to shake or tilt during handling, thereby increasing the risk of device damage. The positioning pin 70 can effectively avoid this situation and ensure the stability of the device during handling.
[0041] In some embodiments of the present application, the platform 20 can be a marble platform, which can be used to arrange a detection unit not shown in the drawings.
[0042] The marble platform has a very low thermal expansion coefficient, which means that the size of the platform 20 changes very little when the temperature changes. This stability is crucial for detection units that require high precision detection. For example, in a semiconductor manufacturing environment, temperature fluctuations can cause small deformations in metal platforms, affecting detection accuracy, while marble platforms can effectively avoid this situation, ensuring that detection units maintain high accuracy at different environmental temperatures. Marble platforms generally have very high flatness and surface smoothness, which can provide an ideal support surface for detection units. This high-precision support surface can ensure that the detection unit remains stable during operation, reducing vibrations or errors caused by uneven platforms. For example, in optical detection, the flatness of the platform directly affects the imaging quality of the optical system, and the marble platform can provide a stable optical reference surface. Marble is a natural high-density, high-hardness material with good vibration isolation performance. The platform 20 uses marble material, which can effectively absorb and isolate external vibrations, reducing the impact of vibrations on the detection unit. For example, when there are other vibration sources (such as mechanical processing equipment) near the device, the marble platform can effectively isolate these vibrations, ensuring the high-precision operation of the detection unit. The marble platform is combined with the vibration isolator 30, further enhancing the vibration isolation effect. The vibration isolator 30 is arranged between the main base 10 and the marble platform, which can effectively isolate the vibration transmitted by the main base 10, and the vibration isolation characteristics of the marble platform itself can further reduce the transmission of vibration, ensuring that the detection unit is not disturbed by external vibrations during operation.
[0043] In some embodiments of the present application, referring to Figure 2 , the vibration source 60 can include an electric control box 61 and a controller 62, the electric control box 61 is used to power the detection unit, and the controller 62 is used to process data generated by the detection unit.
[0044] The control box 61 is responsible for providing stable power support for the detection unit. Stable power supply is the basis to ensure the normal operation of the detection unit, and the control box 61 can effectively manage power distribution to ensure that each component obtains the required voltage and current. For example, during high-precision detection, any power fluctuations can lead to inaccurate detection results, and the control box 61 ensures efficient operation of the detection unit by providing a stable power supply. The control box 61 usually has functions such as overload protection and short circuit protection, which can effectively prevent damage to the detection unit caused by power system failures. This protection mechanism can extend the service life of the equipment and reduce maintenance costs. For example, in the case of current overload, the control box 61 can automatically cut off the power supply to protect the detection unit from damage. The controller 62 is used to process data generated by the detection unit and can analyze and process data from sensors or detection devices in real time. This real-time data processing capability is crucial for high-precision detection. For example, the controller 62 can quickly process optical imaging data and provide timely feedback on detection results to ensure the efficiency of the production process. The controller 62 is not only responsible for data processing, but also has data storage and management functions. By storing detection data in the controller 62, operators can access historical data at any time for analysis and comparison. This data management capability helps improve production efficiency and product quality. For example, operators can analyze trends based on historical data to identify potential problems in a timely manner. The control box 61 and the controller 62 are arranged on the auxiliary base 40 and are physically separated from the detection unit. This design ensures that the vibrations and noise generated by the control box 61 and the controller 62 during operation do not affect the operation of the detection unit. For example, the control box 61 may generate some heat and noise when supplying power, but due to its separation from the detection unit, it can effectively avoid the impact of these factors on detection accuracy. Through reasonable layout, the control box 61 and the controller 62 can provide necessary support without interfering with the detection unit. This optimized layout design not only improves the overall integration of the equipment, but also ensures the stability and reliability of the detection unit during operation. For example, the installation position of the control box 61 and the controller 62 is carefully designed to ensure that operators can easily operate and maintain the equipment without affecting the normal operation of the detection unit.
[0045] In some embodiments of the present application, the vibration isolator 30 can be an air floating vibration isolator.
[0046] The air floating vibration isolator has excellent low-frequency vibration isolation capability and can effectively isolate low-frequency vibrations. In semiconductor wafer detection, low-frequency vibrations (such as ground vibrations, slight vibrations of buildings, etc.) have a particularly significant impact on detection accuracy. The air floating vibration isolator can effectively absorb and isolate these low-frequency vibrations through the compressibility of air, ensuring that the detection unit operates stably in a high-precision environment without being disturbed by external vibrations. The air floating vibration isolator has a much higher isolation efficiency than traditional mechanical vibration isolators (such as spring isolators, rubber isolators, etc.). For example, the air floating vibration isolator can achieve an isolation efficiency of over 90%, while traditional vibration isolators usually only achieve 60%-70%. This high isolation efficiency enables the detection unit to operate in an extremely stable environment, significantly improving detection accuracy. The air floating vibration isolator can automatically adjust the isolation effect according to changes in the load. For example, when the weight of the detection unit changes (such as replacing a detection module with a different weight), the air floating vibration isolator can automatically adjust the air pressure to maintain the isolation effect. This adaptive adjustment capability ensures the stability and reliability of the device under different working conditions. The air floating vibration isolator can achieve dynamic balance through the flow and pressure adjustment of air. During device operation, even if subjected to external impacts or vibrations, the air floating vibration isolator can quickly restore balance, reducing the transmission of vibrations. This dynamic balance capability significantly improves the operating stability of the detection unit, ensuring the consistency and repeatability of detection results. The air floating vibration isolator uses air as the isolation medium and has no mechanical contact components, so there is no mechanical wear. Compared with traditional mechanical vibration isolators (such as springs, rubbers, etc.), the air floating vibration isolator has a longer service life and lower maintenance cost. For example, spring isolators are prone to fatigue fracture after long-term use, and rubber isolators may lose elasticity due to aging, while the air floating vibration isolator hardly needs to replace components, greatly reducing maintenance costs. The maintenance of the air floating vibration isolator is relatively simple, mainly involving cleaning and checking of the air system. Due to its simple structure, maintenance personnel can quickly complete cleaning and checking work to ensure normal operation of the device. This low-maintenance design makes the device more economical and practical in long-term use. The air floating vibration isolator has strong adaptability to environmental temperature. In a semiconductor manufacturing environment, the device may operate under different temperature conditions, and the air floating vibration isolator can maintain stable isolation performance within a wide temperature range. For example, in high-temperature or low-temperature environments, the isolation effect of the air floating vibration isolator will not decrease significantly, while traditional rubber isolators may lose elasticity due to temperature changes. The air floating vibration isolator also has strong adaptability to environmental humidity. In high-humidity or humid environments, the air floating vibration isolator will not age or deform as easily as rubber isolators, ensuring stable operation of the device under various environmental conditions.
[0047] In some embodiments of the present application, the detection unit can be used to detect wafers.
[0048] The combination design of the marble platform and the air floating vibration isolator can meet the high precision requirement of wafer detection. The high flatness and low thermal expansion coefficient of the marble platform, combined with the high vibration isolation efficiency and dynamic stability of the air floating vibration isolator, ensure that the detection unit always maintains high precision and high stability during operation. This design not only improves the detection precision, but also reduces the detection time and improves the production efficiency.
[0049] In some embodiments of the present utility model, referring to Figure 4 , the number of air floating vibration isolators can be four, and they can be arranged at the four vertices of the rectangle respectively.
[0050] By arranging four air floating vibration isolators at the four vertices of the rectangle, it can ensure that the platform 20 is uniformly supported in all directions. This uniform distribution of support force can effectively avoid the tilting or deformation of the platform 20 due to uneven force, thereby improving the stability of the platform 20. For example, even if unevenly distributed loads are placed on the platform 20, the four air floating vibration isolators can maintain the horizontal state of the platform 20 by automatically adjusting the air pressure. The uniform layout of the four air floating vibration isolators can ensure that the platform 20 maintains high precision flatness on the entire surface. This is particularly important for high-precision wafer detection, as any slight platform deformation can cause detection errors. For example, in optical detection, the high flatness of the platform 20 can ensure the imaging quality of the optical system, thereby improving the detection precision. The layout of the four air floating vibration isolators can provide multi-point vibration isolation, effectively isolating vibrations from different directions. This multi-point vibration isolation design can significantly improve the vibration isolation effect, especially in low-frequency vibration isolation. For example, the platform 20 can effectively isolate the micro-vibration of the ground or the low-frequency vibration of the building, ensuring that the detection unit is not disturbed by external vibrations during high-precision operation. By arranging four air floating vibration isolators at the four vertices of the rectangle, more efficient air pressure management can be achieved. This layout reduces the amount of air required while still providing stable support force. For example, compared with a single large air floating vibration isolator, four small air floating vibration isolators can use less air to provide the same support force, thereby reducing energy consumption and operating costs.
[0051] In some embodiments of the present utility model, referring to Figure 1 , the vibration isolation platform device 1 can further include an air floating locking plate 80 for maintaining the platform 20 on the vibration isolator 30.
[0052] The air floating locking plate 80 is used to accurately hold the platform 20 on the vibration isolator 30, ensuring that the platform 20 always maintains a stable position during operation. This design can effectively prevent the platform 20 from shifting or swaying due to external forces or vibrations, thereby improving the operational stability of the detection unit. For example, in high-precision wafer detection, a slight displacement of the platform 20 can cause detection errors, and the air floating locking plate 80 can effectively prevent this. By firmly holding the platform 20 on the vibration isolator 30, the air floating locking plate 80 further reduces the possibility of vibrations being transmitted from the main base 10 to the platform 20. This design ensures that the vibration isolation effect of the vibration isolator 30 can be fully utilized, thereby improving the detection accuracy of the detection unit. For example, in terms of low-frequency vibration isolation, the air floating locking plate 80 can ensure the vibration isolation effect between the platform 20 and the main base 10, reducing the impact of external vibrations on the detection unit.
[0053] In some embodiments of the present application, referring to Figure 1 , the main base 10 can include a body 11 and a bottom plate 12, and the locking member 50 locks the bottom plate 12 and the auxiliary base 40.
[0054] By designing the main base 10 to include a body 11 and a bottom plate 12, the locking member 50 can be specifically designed to lock the bottom plate 12 and the auxiliary base 40. This specialized component design makes the locking process more reliable and can effectively prevent equipment from loosening or shifting due to insecure locking. For example, during transportation, the equipment may be subjected to a large external force impact, and the specialized locking member 50 and bottom plate 12 design can ensure that the connection between the main base 10 and the auxiliary base 40 is more stable, reducing the risk of equipment damage. The design of the bottom plate 12 allows the locking member 50 to be evenly distributed between the main base 10 and the auxiliary base 40, thereby achieving uniform locking force distribution. This uniform locking force distribution not only improves the reliability of the locking, but also reduces the risk of component damage due to excessive local locking force. For example, by reasonably designing the structure of the bottom plate 12 and the layout of the locking member 50, the main base 10 and the auxiliary base 40 can be ensured to receive uniform locking force in all directions, thereby improving the overall stability of the equipment. Through the design of the bottom plate 12 and the locking member 50, the locking and releasing processes become more simple and fast. The operator can complete the locking and releasing of the main base 10 and the auxiliary base 40 without the need for complex tools or steps. For example, when the equipment needs to be transported, the operator can quickly use the locking member 50 to lock the main base 10 and the auxiliary base 40, forming a whole; after the equipment arrives at the destination, the locking member 50 can also be quickly released, allowing the equipment to return to the working state. This rapid locking and releasing capability significantly improves the transportation efficiency of the equipment and reduces downtime.
[0055] In some embodiments of the present application, the body 11 and the bottom plate 12 can be fixed together by welding.
[0056] The body 11 and the bottom plate 12 are fixed together by welding to form an integrated main base 10. This integrated structure significantly enhances the overall strength and stability of the main base 10. For example, during transportation, the main base 10 needs to withstand a large external force impact, and the welded main base 10 can effectively resist these external forces, reducing equipment damage caused by structural loosening or deformation. Reduce component loosening: welded connections are more secure than traditional bolt connections or mechanical fixation methods, effectively reducing component loosening and displacement. This design ensures that the main base 10 maintains stable performance during long-term operation, reducing vibration transmission caused by component loosening. For example, in high-precision wafer detection, any slight vibration can cause detection errors, and the welded main base 10 can effectively reduce vibration transmission, improving detection accuracy. The welded main base 10 can effectively reduce the possibility of vibration from the main base 10 to the platform 20. Due to the strong rigidity of the welded connection, it can better isolate the vibration generated by the vibration source 60, thereby improving the vibration isolation effect of the vibration isolator 30. For example, in terms of low-frequency vibration isolation, the welded main base 10 can ensure that the vibration isolation effect of the vibration isolator 30 is fully realized, reducing the impact of external vibrations on the detection unit.
[0057] It should be noted that the technical solutions disclosed in the present application can be combined arbitrarily without conflict.
[0058] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any skilled person in the art can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be covered within the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.
Claims
1. A vibration isolation platform device, characterized in that, The vibration isolation platform equipment includes: Main base; platform; A vibration isolator is disposed between the main base and the platform to prevent vibrations of the main base from being transmitted to the platform; An auxiliary base, wherein the auxiliary base is configured to be separated from the main base; A locking element for releasably locking the main base to the auxiliary base; A vibration source is provided on the auxiliary base.
2. The vibration isolation platform equipment according to claim 1, characterized in that, The vibration isolation platform device also includes positioning pins, which are used to keep the relative positional relationship between the main base and the auxiliary base fixed.
3. The vibration isolation platform equipment according to claim 1 or 2, characterized in that, The platform is a marble platform, which is used to arrange the detection unit.
4. The vibration isolation platform equipment according to claim 3, characterized in that, The vibration source includes an electrical control box and a controller. The electrical control box is used to supply power to the detection unit, and the controller is used to process the data generated by the detection unit.
5. The vibration isolation platform equipment according to claim 3, characterized in that, The vibration isolator is an air-floating vibration isolator.
6. The vibration isolation platform equipment according to claim 5, characterized in that, The detection unit is used to detect wafers.
7. The vibration isolation platform equipment according to claim 6, characterized in that, The number of air-bearing vibration isolators is four, and they are arranged at the four vertices of the rectangle.
8. The vibration isolation platform equipment according to claim 1 or 2, characterized in that, The vibration isolation platform equipment also includes an air-float locking plate, which is used to hold the platform on the vibration isolator.
9. The vibration isolation platform equipment according to claim 1 or 2, characterized in that, The main base includes a body and a base plate, and the locking member locks the base plate and the auxiliary base together.
10. The vibration isolation platform equipment according to claim 9, characterized in that, The body and the base plate are fixed together by welding.