Washing tower

Abstract

The utility model provides a washing tower, and relates to the technical field of polycrystalline silicon tail gas dedusting, according to the washing tower, a separator is arranged in a washing cavity of a tower body, so that the lower part of the washing cavity is divided into a first area and a second area, in addition, a washing solution sprayed by a spraying head in a spraying device is guided in a guiding device, and meanwhile, the washing solution is sprayed out by the spraying head in the spraying device. The tail gas conveying pipeline is used for conveying the polycrystalline silicon tail gas, the polycrystalline silicon tail gas conveyed by the tail gas conveying pipeline is washed, silicon powder particles in the polycrystalline silicon tail gas are cleaned out, after washing, a washing solution containing the silicon powder particles is drained to the first area through the drainage pipe and naturally settles in the first area, and in the settling process, the washing solution floats above the silicon powder; and the silicon powder overflows to the second area, so that the silicon powder and the washing solution are separated, and the content of silicon powder particles in the separated washing solution is greatly reduced, so that the abrasion of pipelines in a subsequent filtering system is reduced, the failure rate of equipment is reduced, and the stability of the filtering system is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of polycrystalline silicon tail gas dust removal, and particularly relates to a washing tower. BACKGROUND

[0002] In the field of polycrystalline silicon preparation, part of the prepared polycrystalline silicon is not deposited on the core rod for collecting silicon powder, but is carried out by reduction tail gas generated in the process of preparing polycrystalline silicon in the form of silicon powder, and is transported to a subsequent recovery system, but the silicon powder will be deposited in each conveying pipeline, causing the blockage of the pipeline and equipment, and affecting the normal operation of the recovery system.

[0003] In the related art, the silicon powder carried out by the reduction tail gas is recovered by the way of dust removal of the polycrystalline silicon tail gas, so as to avoid the deposition of the silicon powder in the subsequent pipelines and equipment, wherein in the process of dust removal of the polycrystalline silicon tail gas, the polycrystalline silicon tail gas is transported to a washing tower, and the polycrystalline silicon tail gas is washed by using a washing solution to carry away the silicon powder in the polycrystalline silicon tail gas.

[0004] However, after the washing tower is washed, the washing solution containing the silicon powder is transported from the washing tower to a filtering system to separate the washing solution and the silicon powder particles and recover them respectively, and because the washing solution contains the silicon powder, the equipment and the pipeline in the filtering system are prone to blockage, and there are technical problems of high failure rate and poor stability. CONTENT OF THE UTILITY MODEL

[0005] The present application provides a washing tower, which aims to solve the technical problems of easy blockage of the equipment and the pipeline in the filtering system, high failure rate and poor stability when filtering the washing solution containing the silicon powder, so as to reduce the abrasion of the pipeline, reduce the failure rate of the equipment and improve the stability of the filtering system in the subsequent filtering system.

[0006] In order to achieve the above-mentioned purpose, the present application adopts the following technical scheme:

[0007] The present application provides a washing tower, which is suitable for washing polycrystalline silicon tail gas and comprises:

[0008] The tower body has a washing cavity;

[0009] The isolation piece is arranged in the washing cavity and is fixedly connected with the bottom wall and the side wall of the washing cavity, and the isolation piece and the bottom wall of the washing cavity form an included angle, so as to divide the washing cavity into a first area and a second area;

[0010] The tail gas conveying pipeline has an input end and an output end, the input end is located outside the washing cavity and communicates with a tail gas source, and the output end is located in the washing cavity and is located above the first area and the isolation piece;

[0011] A spray device has a spray head located at the top of the washing cavity and above the tail gas conveying pipeline, and the spray head is configured to spray washing solution into the washing cavity;

[0012] A guide device is fixedly arranged in the washing cavity and is arranged between the tail gas conveying pipeline and the spray head in the vertical direction, and the guide device is configured to guide the washing solution sprayed by the spray head;

[0013] A drain pipe is fixedly arranged in the washing cavity, and a first end of the drain pipe is in communication with the guide device, and a second end of the drain pipe is located in the first region.

[0014] In some embodiments, the cross-sectional dimension of the first region near the top is greater than or equal to the cross-sectional dimension of the second region near the top.

[0015] In some embodiments, the cross-sectional dimension of the first region increases or remains unchanged in the vertical direction from bottom to top.

[0016] In some embodiments, the top of the partition and the tail gas conveying pipeline have an overflow channel in the vertical direction, so that the first region and the second region are in communication through the overflow channel.

[0017] In some embodiments, the guide device includes at least two guide plates, and the at least two guide plates are arranged in the vertical direction with a flow passage formed between any two adjacent guide plates, and one end of each guide plate is connected to the cavity wall of the washing cavity, and the other end has a gap in communication with the flow passage, wherein the gaps between the adjacent guide plates and the cavity wall of the washing cavity are located on different sides.

[0018] In some embodiments, each guide plate has a plurality of screen holes, so that the polysilicon tail gas can move from below the guide plate to above the guide plate through the plurality of screen holes.

[0019] In some embodiments, the washing tower further includes a flow guide member connected between the guide device and the drain pipe to guide the washing solution output by the guide device into the drain pipe.

[0020] In some embodiments, the washing tower further includes a liquid holding tray fixedly arranged at the top of the drain pipe and in communication with the drain pipe, and in the vertical direction, the projection area of the liquid holding tray covers the projection areas of the drain pipe and the flow guide member, respectively.

[0021] In some embodiments, the washing tower further comprises a liquid seal disc, which is located between the flow guide and the liquid containing disc in the vertical direction, the projected area of the liquid containing disc covers the projected area of the liquid seal disc, and the projected area of the liquid seal disc covers the projected area of the flow guide.

[0022] In some embodiments, in the horizontal direction, the projection of the side wall of the liquid seal disc at least partially overlaps the projection of the flow guide.

[0023] In some embodiments, the washing tower further comprises a first output pipeline and a second output pipeline, both of which are located outside the washing cavity, the first output pipeline is in communication with the bottom of the first region and is configured to output silicon powder residue slurry from the first region, and the second output pipeline is in communication with the bottom of the second region and is configured to output washing solution from the second region.

[0024] The washing tower provided by the embodiments of the present application separates the lower part of the washing cavity into a first region and a second region by arranging a partition in the washing cavity of the tower body. In addition, the washing solution sprayed by the spray head in the spraying device is guided in the guiding device while washing the polysilicon tail gas transported by the tail gas transportation pipeline to clean the silicon powder particles in the polysilicon tail gas. After washing, the washing solution containing silicon powder particles is guided to the first region by the drainage pipe and is naturally precipitated in the first region. During the precipitation process, the silicon powder is deposited below the washing solution level due to the action of gravity, and the washing solution floats above the silicon powder. When the height of the washing solution in the first region is higher than the height of the partition, the washing solution above the height of the partition will overflow into the second region, and the silicon powder will be retained in the first region, so as to separate the washing solution and the silicon powder particles for subsequent recycling and reuse. In this process, the content of silicon powder particles in the separated washing solution is greatly reduced, so as to reduce the depositable amount of silicon powder in the pipeline and equipment of the subsequent filtration system during the transportation of the washing solution in the second region to the filtration system, thereby reducing the abrasion of the pipeline and reducing the failure rate of the equipment, and improving the stability of the filtration system.

[0025] In addition to the technical problems solved by the embodiments of the present application described above, the technical features constituting the technical solutions and the beneficial effects brought by these technical features, other technical problems solved by the washing tower provided by the embodiments of the present application, other technical features included in the technical solutions and the beneficial effects brought by these technical features will be further described in detail in the specific embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings described below are some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained without creative labor on the basis of these drawings.

[0027] Figure 1 A structural schematic diagram of a washing tower provided by the embodiments of the present application;

[0028] Figure 2 Another structural schematic diagram of a washing tower provided by the embodiments of the present application.

[0029] Explanation of reference signs:

[0030] 10 - washing tower;

[0031] 100 - tower body; 110 - washing cavity; 111 - first region; 112 - second region; 113 - first door body; 114 - second door body;

[0032] 200 - isolation piece; 210 - overflow channel;

[0033] 300 - tail gas conveying pipeline; 310 - input end; 320 - output end;

[0034] 400 - guiding device; 410 - guiding plate; 420 - flow-through channel; 430 - gap;

[0035] 500 - flow guide pipe; 510 - first end; 520 - second end;

[0036] 600 - flow guide piece;

[0037] 700 - liquid holding tray;

[0038] 800 - liquid seal tray;

[0039] 900 - first output pipeline; 910 - second output pipeline. DETAILED DESCRIPTION

[0040] In order to make the purpose, technical solutions and advantages of the embodiments of the present application more clear, the following will combine the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the protection scope of the present application. In the case of no conflict, the following embodiments and features in the embodiments can be combined with each other.

[0041] In the field of polysilicon preparation, part of the prepared polysilicon is not deposited on the core rod for collecting silicon powder, but is carried out by the reducing tail gas generated in the polysilicon preparation process in the form of silicon powder, and is transported to the subsequent recovery system, but the silicon powder will be deposited in the pipeline, causing the pipeline and equipment to be blocked, affecting the normal operation of the recovery system. Exemplarily, the reducing tail gas contains hydrogen, hydrogen chloride, trichlorosilane, silicon tetrachloride, dichlorodisilane and the like.

[0042] The embodiment of the present application provides a washing tower, which uses a washing solution to carry away silicon powder particles in polysilicon tail gas by a washing method, and transports the washing solution containing silicon powder particles to a liquid phase filtering system to separate the silicon powder particles and the washing solution, but in the liquid phase filtering system, the silicon powder particles will be deposited in the pipeline and equipment, so that the equipment and pipeline in the liquid phase filtering system are prone to be blocked, and the liquid phase filtering system has the technical problems of high failure rate and poor stability.

[0043] In order to overcome the defects in the above embodiments, the washing tower 10 is further improved in the embodiment of the present application, and the washing tower 10 is suitable for washing of polysilicon tail gas. The washing tower 10 in the embodiment of the present application will be described in detail below in combination with the drawings, so that those skilled in the art can more clearly and specifically understand the content of the present application.

[0044] Figure 1 A structural schematic diagram of the washing tower 10 provided by the embodiment of the present application is shown in the figure. Figure 1 As shown in the figure, the washing tower 10 comprises a tower body 100, a tail gas conveying pipeline 300, a spraying device and a guide device 400.

[0045] The tower body 100 has a washing cavity 110; the tail gas conveying pipeline 300 has an input end 310 and an output end 320, the input end 310 is located outside the washing cavity 110 and communicates with a tail gas source, and the output end 320 is located inside the washing cavity 110 to convey the polysilicon tail gas into the washing cavity 110; the spraying device has a spraying head, the spraying head is located at the top of the washing cavity 110 and above the tail gas conveying pipeline 300, and the spraying head is configured to spray the washing solution into the washing cavity 110. In the washing cavity 110, the polysilicon tail gas flows from bottom to top, and the washing solution flows from top to bottom in the vertical direction, so that the washing solution carries away the silicon powder particles in the polysilicon tail gas to the bottom of the washing cavity 110.

[0046] In some embodiments, the spraying device further comprises a liquid storage tank, a filter, a valve, a conveying pump and a conveying pipeline, etc., for spraying the washing solution from the spraying head into the washing cavity 110 with a certain power, wherein exemplarily, the washing solution can be chlorosilane solution.

[0047] In addition, the guide device 400 is fixedly arranged in the washing cavity 110, and is arranged between the tail gas conveying pipeline 300 and the spray head in the vertical direction. The guide device 400 is configured to guide the washing solution sprayed by the spray head, so as to guide the washing solution and increase the contact area of the washing solution and the polysilicon tail gas in the washing cavity 110, thereby improving the cleaning degree of the polysilicon tail gas.

[0048] Specifically, as shown in Figure 1 The guide device 400 includes at least two guide plates 410, which are arranged in the vertical direction at intervals. For example, the number of guide plates 410 in the washing cavity 110 is two, three, four, five or the like, so as to further increase the contact area of the washing solution and the polysilicon tail gas. Any two adjacent guide plates 410 form a flow channel 420, so that the washing solution sprayed from the spray head falls on the uppermost guide plate 410 and then flows to the lowermost guide plate 410 through the guide plates 410. One end of each guide plate 410 is connected to the cavity wall of the washing cavity 110, and the other end has a gap 430 communicating with the flow channel 420, so that the washing solution forms an uninterrupted flow path between the guide plates 410 through the gap 430 between the guide plates 410, and the gaps 430 between the adjacent two guide plates 410 and the cavity wall of the washing cavity 110 are located on different sides, so that the flow path between the guide plates 410 is in the shape of “S”, thereby maximizing the contact area of the guide plates 410 and the polysilicon tail gas, and further increasing the contact area of the washing solution and the polysilicon tail gas, and improving the cleaning degree of the silicon powder particles in the polysilicon tail gas. For example, one end of the guide plate 410 is fixedly connected to the cavity wall of the washing cavity 110, and the fixed connection can be welding, bolt and hole connection, bonding, buckle connection or the like.

[0049] Each guide plate 410 has a plurality of screen holes, so that the polysilicon tail gas can move from the lower side of the guide plate 410 to the upper side of the guide plate 410 through the screen holes. The cleaning principle is that the washing solution flows on the guide plates 410 to form a flow layer, the polysilicon tail gas contacts the flow layer on the guide plates 410 through the screen holes of the guide plates 410 by using the upward force, and passes through the flow layer. The silicon powder particles in the polysilicon tail gas are blocked by the flow layer, so that the washing solution flowing on the guide plates 410 contains silicon powder particles, and other gases in the polysilicon tail gas continue to rise until passing through the plurality of guide plates 410 to the upper part of the washing cavity 110. The upper part of the washing cavity 110 also has a polysilicon tail gas outlet and an output pipeline, so as to output the polysilicon tail gas after removing the silicon powder particles to the outside of the washing cavity 110.

[0050] In addition, as shown in Figure 1As shown, the washing tower 10 further comprises a partition 200 and a flow guide pipe 500. The partition 200 is arranged in the washing cavity 110 and fixedly connected with the bottom wall and the side wall of the washing cavity 110. The partition 200 forms an angle with the bottom wall of the washing cavity 110 to divide the washing cavity 110 into a first region 111 and a second region 112. The flow guide pipe 500 is fixedly arranged in the washing cavity 110. The first end 510 of the flow guide pipe 500 is in communication with the guide device 400. The second end 520 of the flow guide pipe 500 is located in the first region 111. The washing solution containing silicon powder particles is transported to the first region 111 through the flow guide pipe 500 and naturally settled in the first region 111. Thus, the silicon powder is deposited below the washing solution. The washing solution floats above the silicon powder. When the height of the washing solution floating above is higher than the height of the partition 200, the washing solution overflows through the partition 200 to the second region 112. Thus, the content of silicon powder particles in the washing solution overflowing to the second region 112 is greatly reduced. Through the natural settlement and the overflow process, the silicon powder particles and the washing solution in the washing solution containing silicon powder particles are separated through the first region 111 and the second region 112.

[0051] For example, the partition 200 is a partition plate. The cross-sectional shape of the flow guide pipe 500 in the vertical direction includes but is not limited to a circle, a square, a polygon, etc. The fixed connection between the partition 200 and the bottom wall and the side wall of the washing cavity 110 and the fixed connection between the flow guide pipe 500 and the cavity wall of the washing cavity 110 can be welding, bolt and hole connection, bonding, buckle connection, etc. In addition, a plurality of fixed supports can be arranged on the cavity wall of the washing cavity 110. The flow guide pipe 500 is fixedly arranged on the cavity wall of the washing cavity 110 through the plurality of fixed supports to facilitate the maintenance and replacement of the flow guide pipe 500.

[0052] It should be noted that, as shown in Figure 1 The output end 320 of the tail gas conveying pipeline 300 is located above the first region 111 and the partition 200 to avoid that the silicon powder particles in the polysilicon tail gas directly fall to the second region 112 through the output end 320 of the tail gas conveying pipeline 300. In addition, the second end 520 of the flow guide pipe 500 is arranged at a lower position of the bottom of the first region 111 to avoid the disturbance of the washing solution containing silicon powder particles flowing out of the second end 520, which affects the clarity of the washing solution floating above the silicon powder in the first region 111.

[0053] In the embodiment of the present application, the scrubbing tower 10 is provided with a partition 200 in the scrubbing cavity 110 of the tower body 100, so that the lower part of the scrubbing cavity 110 is divided into a first region 111 and a second region 112. In addition, the scrubbing solution sprayed by the spray head in the spraying device is guided in the guiding device 400 while scrubbing the polysilicon tail gas delivered by the tail gas delivery pipeline 300, so as to clean the silicon powder particles in the polysilicon tail gas. After cleaning, the scrubbing solution containing silicon powder particles is guided to the first region 111 by the drainage pipe 500 and is naturally precipitated in the first region 111. During the precipitation process, the silicon powder is deposited below the scrubbing solution due to the action of gravity, and the scrubbing solution is floated above the silicon powder. When the height of the scrubbing solution in the first region 111 is higher than the height of the partition 200, the scrubbing solution higher than the height of the partition 200 will overflow into the second region 112, and the silicon powder will be retained in the first region 111, so as to separate the scrubbing solution and the silicon powder particles, so as to facilitate the subsequent recycling and reuse of the scrubbing solution and the silicon powder. In this process, the content of silicon powder in the separated scrubbing solution is greatly reduced, so that the deposition amount of silicon powder in the pipeline and equipment of the subsequent filtration system is reduced during the delivery of the scrubbing solution in the second region 112 to the filtration system, thereby reducing the abrasion of the pipeline and reducing the failure rate of the equipment, and improving the stability of the filtration system.

[0054] Further, the cross-sectional dimension of the first region 111 near the top is greater than or equal to the cross-sectional dimension of the second region 112 near the top, so as to avoid that the cross-sectional dimension of the first region 111 near the top is too small. So that the polysilicon tail gas particles and dust output by the output end 320 of the tail gas delivery pipeline 300 arranged above the first region 111 directly fall into the first region 111, so as to avoid that the polysilicon tail gas particles enter the second region 112 through the output end 320 of the tail gas delivery pipeline 300, which affects the clarity of the scrubbing solution formed in the second region 112.

[0055] Further, the cross-sectional dimension of the first region 111 increases or remains unchanged along the vertical direction from bottom to top. For example, as shown in Figure 1 The cross-sectional dimension of the first region 111 remains unchanged along the vertical direction from bottom to top, and the partition 200 is vertically arranged in the center of the scrubbing cavity 110.

[0056] Another example is shown in Figure 2As shown, the partition 200 is arranged in the washing cavity 110 in an inclined manner, and the cross-sectional size of the first region 111 increases in sequence from bottom to top in the vertical direction. In this way, while satisfying the condition that the cross-sectional size of the first region 111 near the top is greater than that of the second region 112 near the top, the volume of the second region 112 can be ensured, and the volume of the second region 112 is prevented from being too small, which affects the uninterrupted collection of the washing solution.

[0057] As shown, the partition 200 is arranged in the washing cavity 110 in an inclined manner, and the cross-sectional size of the first region 111 increases in sequence from bottom to top in the vertical direction. In this way, while satisfying the condition that the cross-sectional size of the first region 111 near the top is greater than that of the second region 112 near the top, the volume of the second region 112 can be ensured, and the volume of the second region 112 is prevented from being too small, which affects the uninterrupted collection of the washing solution. Figure 1 As shown, the partition 200 has an overflow passage 210 between the top of the partition 200 and the tail gas conveying pipeline 300, so that the first region 111 and the second region 112 are connected through the overflow passage 210. Thus, in the first region 111, the washing solution containing silicon powder is settled by gravity, and the washing solution floating above the silicon powder flows into the second region 112 through the overflow passage 210, so that the washing solution with a large amount of silicon powder particles is obtained.

[0058] For example, the overflow passage 210 can be formed by designing the height of the partition 200, so that there is a gap 430 between the top of the partition 200 and the tail gas conveying pipeline 300, and the overflow passage 210 is formed. Alternatively, the partition 200 can have a hole below the tail gas conveying pipeline 300, and the hole is the overflow passage 210.

[0059] In addition, as shown, Figure 1 As shown, the washing tower 10 further comprises a flow guide 600 connected between the guide device 400 and the flow guide pipe 500, so as to guide the washing solution output by the guide device 400 into the flow guide pipe 500, and improve the guidance and constraint of the washing solution, so that the washing solution enters the first region 111 for precipitation.

[0060] For example, the flow guide 600 can be a flow guide plate extending in the vertical direction, and is fixedly connected to one end of the lowermost guide plate 410 near the gap 430, so that the washing solution flowing through the guide plate 410 flows into the flow guide pipe 500 through the gap 430 under the guidance of the flow guide 600. The fixed connection between the flow guide 600 and the guide plate 410 can be welding, bolt hole connection, bonding, buckle connection, etc.

[0061] In some embodiments, as shown, Figure 1As shown, the washing tower 10 further comprises a liquid container 700, which is fixedly arranged at the top of the flow guide pipe 500 and communicates with the flow guide pipe 500. The projection area of the liquid container 700 covers the projection area of the flow guide pipe 500 and the flow guide member 600 in the vertical direction, so that the washing solution containing silicon powder particles guided by the flow guide member 600 can be completely guided into the liquid container 700 and then enter the flow guide pipe 500, thereby improving the conveying efficiency of the washing solution after washing between the flow guide pipe 500 and the flow guide member 600.

[0062] For example, the shape of the liquid container 700 can be funnel-shaped. Figure 1 As shown, the liquid container 700 can also be a box-shaped structure with an opening facing the flow guide member 600. The bottom wall of the liquid container 700 has an opening hole fixedly connected with the first end 510 of the flow guide pipe 500. In the horizontal direction, one side of the liquid container 700 close to the cavity wall of the washing cavity 110 is fixedly connected with the cavity wall of the washing cavity 110, and the other side away from the cavity wall of the washing cavity 110 has a side wall, so that the bottom wall, the side wall of the liquid container 700 and the cavity wall of the washing cavity 110 together form a liquid containing space.

[0063] In addition, as shown, Figure 1 In some embodiments, the washing tower 10 further comprises a liquid seal plate 800, which is arranged between the flow guide member 600 and the liquid container 700. In the vertical direction, the projection area of the liquid container 700 covers the projection area of the liquid seal plate 800, and the projection area of the liquid seal plate 800 covers the projection area of the flow guide member 600. The liquid seal plate 800 has the function of guiding the washing solution containing silicon powder particles from the flow guide member 600 to the liquid seal plate 800, and then overflowing from the liquid seal plate 800 to the liquid container 700.

[0064] For example, in the vertical direction, the cross-sectional shape of the liquid seal plate 800 is consistent with that of the liquid container 700, and in the horizontal direction, the size of the liquid seal plate 800 is smaller than that of the liquid container 700. In the horizontal direction, the projection of the side wall of the liquid seal plate 800 at least partially overlaps with the projection of the flow guide member 600, so that the liquid seal height of the washing solution guided by the flow guide member 600 to the liquid seal plate 800 is higher than the outlet height of the flow guide member 600, that is, the liquid surface of the washing solution in the liquid seal plate 800 can cover the outlet of the flow guide member 600, thereby avoiding the polycrystalline silicon tail gas transported into the washing cavity 110 by the tail gas conveying pipeline 300 from flowing upward through the corresponding gap 430 of the lowermost guide plate 410, and improving the guiding and cleaning performance of each guide plate 410.

[0065] In addition, as shown in Figure 1 In some embodiments, the washing tower 10 further comprises a first output pipeline 900 and a second output pipeline 910, both of which are located outside the washing cavity 110, the first output pipeline 900 communicates with the bottom of the first area 111 and is configured to output the silicon powder slurry from the first area 111, and the second output pipeline 910 communicates with the bottom of the second area 112 and is configured to output the washing solution from the second area 112, so that the silicon powder particles separated in the washing cavity 110 and the washing solution can be recovered through the first output pipeline 900 and the second output pipeline 910 for subsequent reuse, thereby saving resources and reducing the production cost of polysilicon. The first output pipeline 900 can deliver the silicon powder slurry to a slurry treatment system for dewatering, drying, and recycling, etc., and the second output pipeline 910 can deliver the washing solution to a subsequent filtration system, for example, a liquid phase filter in the filtration system, for further filtration and recovery.

[0066] For example, as shown in Figure 1 The first output pipeline 900 and the second output pipeline 910 can be connected by multiple pipeline segments and elbows according to the delivery direction and line planning.

[0067] It should be noted that the silicon powder output by the first output pipeline 900 in the first area 111 contains a small amount of washing solution, which is called silicon powder slurry; the washing solution output by the second output pipeline 910 in the second area 112 contains a small amount of silicon powder particles. The delivery mode of the silicon powder slurry in the first area 111 through the first output pipeline 900 can be pressure delivery or pumping. For pressure delivery, the pressure of the output port of the first output pipeline 900 is controlled to form a pressure difference between the pressure of the output port and the pressure of the first area 111, and the silicon powder slurry flows from the first area 111 to the output port of the first output pipeline 900 under the action of the pressure difference. The delivery mode of the washing solution in the second area 112 through the second output pipeline 910 can be pumping, which can be achieved by installing a pump in the flow direction of the second output pipeline 910. By separating the washing solution containing silicon powder particles into the second area, the abrasion of the pipeline is reduced, the failure rate of the equipment is reduced, the stability of the filtration system is improved, and the operating load of the delivery pump in the filtration system is also reduced.

[0068] The conveying frequency of the silicon powder residue slurry in the first region 111 can be set according to the deposition efficiency of the washing solution containing silicon powder particles in the first region 111, so as to avoid the situation that the washing solution containing silicon powder particles is conveyed without being completely deposited, and the situation that silicon powder particles are deposited in large quantities in the first region 111 but are not timely conveyed. The conveying frequency of the washing solution in the second region 112 can be set according to the liquid level of the washing solution in the second region 112, so as to avoid the situation that the liquid level of the washing solution in the second region 112 is higher than the height of the isolation piece 200, which affects the overflow efficiency of the first region 111 to the second region 112. Herein, the conveying frequency of the silicon powder residue slurry in the first region 111 and the conveying frequency of the washing solution in the second region 112 are not further limited.

[0069] In addition, the washing tower 10 further comprises a first liquid level detection device and a second liquid level detection device. The first liquid level detection device is used to detect the liquid level of the first region 111, and the second liquid level detection device is used to detect the liquid level of the second region 112, so as to monitor the liquid levels in the first region 111 and the second region 112, and provide data support for the conveying frequency of the silicon powder residue slurry in the first region 111 and the conveying frequency of the washing solution in the second region 112.

[0070] For example, the first liquid level detection device and the second liquid level detection device can be a float ball liquid level meter, a float cylinder liquid level meter, a sensor type liquid level meter, an ultrasonic liquid level meter, etc.

[0071] In some embodiments, as shown in Figure 1 The washing tower 10 further comprises a first door body 113 and a second door body 114. The first door body 113 is arranged on the tower body 100 corresponding to the first region 111 and is pivotally connected to the tower body 100. The first door body 113 is turned to open or close the first region 111, so that the maintenance personnel can enter the first region 111 by opening the first door body 113 during the period when the washing tower 10 stops working. The second door body 114 can be arranged on the tower body 100 corresponding to the second region 112 and is pivotally connected to the tower body 100, or can be arranged on the isolation piece 200 and is pivotally connected to the isolation piece 200. The second door body 114 is turned to open or close the second region 112. If the second door body 114 is arranged on the isolation piece 200, the maintenance personnel need to enter the first region 111 by opening the first door body 113 first, and then enter the second region 112 by opening the second door body 114, so as to maintain the second region 112.

[0072] It should be noted that a reference to "one embodiment," "an embodiment," "example embodiment," "some embodiments," etc., means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment.

[0073] In general, terminology can be understood at least in part from usage in context. For example, terms, such as "one or more" as used herein, can be understood as describing any feature, structure, or characteristic in a singular or multiple sense, depending at least in part on the context in which the term is used. Similarly, terms, such as "a," "an," or "the," again can be understood as describing either a singular or plural number of any feature, structure, or characteristic, depending at least in part on the context in which the term is used.

[0074] It will be readily understood that the terms "on," "above," and "over," as used herein, should not be construed as each being limited to a direct, adjacent arrangement. Rather, "on," "above," and "over," can each include two or more intervening features or layers when the objects or features are in contact with each other, and "above" or "over" can each include no intervening features or layers (i.e., directly on) when the objects or features are in contact with each other.

[0075] Furthermore, spatially relative terms, such as "beneath," "below," "lower," "above," "upper," and the like, can be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientations depicted in the figures. The devices can be otherwise oriented (rotated 90° or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

[0076] Finally, it should be noted that the various embodiments described herein can be carried out by way of a computer system. However, those skilled in the art will recognize that the embodiments described herein can be carried out in a variety of different computer systems and that the described embodiments can be implemented using one or more computers or server systems operating together. Therefore, the embodiments described herein can be carried out in a variety of different ways, and the described embodiments are not intended to limit the scope of the present application.

Claims

1. A scrubbing column suitable for scrubbing of polysilicon off-gas, characterized in that, The application relates to a tower body (100) with a washing cavity (110), a partition (200) arranged in the washing cavity (110) and fixedly connected with the bottom wall and the side wall of the washing cavity (110), the partition (200) and the bottom wall of the washing cavity (110) form an included angle, the washing cavity (110) is divided into a first area (111) and a second area (112), a tail gas conveying pipeline (300) with an input end (310) and an output end (320), the input end (310) is located outside the washing cavity (110) and communicates with a tail gas source, the output end (320) is located in the washing cavity (110) and above the first area (111) and the partition (200), a spraying device with a spraying head, the spraying head is located at the top of the washing cavity (110) and above the tail gas conveying pipeline (300), the spraying head is configured to spray washing solution into the washing cavity (110), a guide device (400) fixedly arranged in the washing cavity (110) and arranged in a vertical direction, the guide device (400) is arranged between the tail gas conveying pipeline (300) and the spraying head, the guide device (400) is configured to guide the washing solution sprayed by the spraying head, a drainage pipe (500) fixedly arranged in the washing cavity (110), a first end (510) of the drainage pipe (500) communicates with the guide device (400), and a second end (520) of the drainage pipe (500) is located in the first area (111). The cross-sectional dimension of the first area (111) near the top is greater than or equal to the cross-sectional dimension of the second area (112) near the top. In a vertical direction and from bottom to top, the cross-sectional dimension of the first area (111) gradually increases or remains unchanged. In a vertical direction, the top of the partition (200) and the tail gas conveying pipeline (300) have an overflow channel (210) to communicate the first area (111) and the second area (112). The guide device (400) comprises at least two guide plates (410), the at least two guide plates (410) are arranged in a vertical direction, any two adjacent guide plates (410) form a flow channel (420), one end of each guide plate (410) is connected with the cavity wall of the washing cavity (110), and the other end of each guide plate (410) and the cavity wall of the washing cavity (110) have a gap (430) communicating with the flow channel (420), wherein the gaps (430) formed between the two adjacent guide plates (410) and the cavity wall of the washing cavity (110) are located at different sides. Each guide plate (410) has a plurality of screen holes, so that the polysilicon tail gas can move from below the guide plate (410) to above the guide plate (410) through the screen holes. ​ 2. The scrubbing column of claim 1, wherein, ​ 3. The scrubbing column of claim 2, wherein, ​ 4. The scrubbing column according to any one of claims 1-3, characterized in that, ​ 5. The scrubbing column of claim 4, wherein, ​ 6. The scrubbing column of claim 5, wherein, ​ 7. The scrubbing column of claim 1 wherein, The washing tower (10) further comprises a flow guide (600) connected between the guide device (400) and the flow guide pipe (500) to guide the washing solution output by the guide device (400) into the flow guide pipe (500).

8. The scrubbing column of claim 7, wherein, The washing tower (10) further comprises a liquid containing disc (700) fixed on the top of the flow guide pipe (500) and in communication with the flow guide pipe (500), and the projection area of the liquid containing disc (700) covers the projection area of the flow guide pipe (500) and the flow guide (600) respectively.

9. The scrubbing column of claim 8, wherein, The washing tower (10) further comprises a liquid sealing disc (800) between the flow guide (600) and the liquid containing disc (700), and the projection area of the liquid containing disc (700) covers the projection area of the liquid sealing disc (800), and the projection area of the liquid sealing disc (800) covers the projection area of the flow guide (600).

10. The scrubbing column of claim 9, wherein, In the horizontal direction, the projection of the side wall of the liquid sealing disc (800) at least partially overlaps the projection of the flow guide (600).

11. The scrubbing column according to any one of claims 1-3, characterized in that, The washing tower (10) further comprises a first output pipe (900) and a second output pipe (910), both of which are located outside the washing cavity (110), the first output pipe (900) is in communication with the bottom of the first area (111), and the first output pipe (900) is configured to output silicon powder residue slurry from the first area (111), the second output pipe (910) is in communication with the bottom of the second area (112), and the second output pipe (910) is configured to output washing solution from the second area (112).

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