Evaporation device and coating equipment
By setting staggered heating components along the height of the evaporation tank to block and heat large, high-temperature droplets, the problem of coating damage caused by film droplet splashing is solved, achieving efficient coating and cost reduction.
Patent Information
- Application Number
- CN202423296739.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-30
- Publication Date
- 2025-12-19
- Estimated Expiration
- 2034-12-30
AI Technical Summary
In existing technologies, after the film material melts into a liquid, it generates large, high-temperature droplets, which splash onto the substrate surface, causing damage and affecting the coating effect.
At least two sets of heating components are set in the height direction of the evaporation tank. The projections of each set of heating components are staggered to form a hollow part to block large high-temperature liquid droplets. The heating components then heat the liquid droplets a second time to vaporize them into film material gas.
It effectively prevents large, high-temperature droplets from splashing onto the workpiece, reducing coating costs, extending the service life of heating components, and improving coating efficiency.
Smart Images

Figure CN223688421U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of coating, in particular to an evaporation device and a coating equipment. BACKGROUND
[0002] Vacuum coating refers to a process method that under vacuum conditions, particles vaporized after heating and evaporating of coating material (referred to as film material) fly to the surface of a substrate to be coated and condense into a film. The existing problem is that after the film material is melted into a liquid, boiling occurs to generate large particle high temperature droplets, which can splash onto the surface of the substrate (the piece to be coated), so that the heat of the surface of the substrate cannot be dissipated in time, thereby causing damage to the substrate and affecting the coating effect. CONTENT OF THE UTILITY MODEL
[0003] The main purpose of the present application is to provide an evaporation device and a coating equipment to at least solve the problem that large particle high temperature droplets splash onto the piece to be coated, causing damage to the piece to be coated.
[0004] According to one aspect of the present application, an evaporation device is provided, comprising:
[0005] An evaporation assembly, wherein an evaporation pool is arranged on the evaporation assembly, and the evaporation pool is used to carry and evaporate film material;
[0006] A heating assembly, wherein the heating assembly comprises at least two groups, the at least two groups of the heating assembly are sequentially and spacedly arranged at the top of the evaporation pool along the height direction of the evaporation pool, each group of the heating assembly comprises at least one heating piece, the extension direction of the heating piece is perpendicular to the height direction of the evaporation pool, and the projections of the heating pieces of each group of the heating assembly in the height direction of the evaporation pool are staggered.
[0007] Further, each group of the heating assembly comprises a plurality of heating pieces, and the projections of the plurality of heating pieces of each group of the heating assembly in the height direction of the evaporation pool form a hollow part.
[0008] Further, the heating assembly comprises a first heating assembly and a second heating assembly, the plurality of heating pieces of the first heating assembly are spacedly arranged along a first direction, the plurality of heating pieces of the second heating assembly are spacedly arranged along a second direction, the first direction and the second direction are both perpendicular to the height direction of the evaporation pool, and the included angle A between the first direction and the second direction satisfies the relationship: 0°<A<180°.
[0009] Further, the spacing D1 between the adjacent two heating pieces of the first heating assembly satisfies the relationship: 0.1 μm≤D1≤1 cm.
[0010] Further, a distance D2 between two adjacent heating elements of the second heating assembly satisfies a relationship: 0.1 μm≤D2≤1 cm.
[0011] Further, the heating element comprises at least an electric heating rod.
[0012] Further, the evaporation assembly comprises at least one of an evaporation boat and a crucible.
[0013] Further, a distance D3 between two adjacent heating assemblies in a height direction of the evaporation pool satisfies a relationship: 1 μm≤D3≤10 cm.
[0014] Further, the evaporation device further comprises a base, which is arranged at a top of the heating assembly in the height direction of the evaporation pool, and is used for mounting a workpiece to be plated.
[0015] A distance D4 between the base and the heating assembly in the height direction of the evaporation pool satisfies a relationship: 5 cm≤D4≤30 cm.
[0016] In another aspect, the application further provides a coating device, which comprises the evaporation device.
[0017] Compared with the prior art, the application is provided with at least two heating assemblies in the height direction of the evaporation pool, so that the high-temperature droplets of large particles generated by the film material during heating can be sequentially blocked by the heating elements of the at least two heating assemblies when splashing to the workpiece to be plated, thereby avoiding the high-temperature droplets of large particles from splashing to the workpiece to be plated and causing damage to the workpiece. Meanwhile, the heating elements can perform secondary heating on the high-temperature droplets of large particles, so that the high-temperature droplets of large particles are gasified into film gas, thereby reducing the coating cost and prolonging the service life of the heating assembly. BRIEF DESCRIPTION OF DRAWINGS
[0018] The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiments of the application and serve to explain the principles of the application, and do not limit the application in any way. In the drawings:
[0019] Figure 1 FIG. 1 is a structural schematic view of an evaporation device disclosed by the application;
[0020] Figure 2 FIG. 2 is a labeled schematic view of the evaporation device disclosed by the application;
[0021] Figure 3 FIG. 3 is a structural schematic view of a heating assembly disclosed by the application in a first perspective view;
[0022] Figure 4 FIG. 4 is a structural schematic view of the heating assembly disclosed by the application in a second perspective view.
[0023] Figure 5 Structure diagram of the evaporation assembly disclosed in the present application.
[0024] In the above drawings, the following reference signs are used:
[0025] 10, evaporation assembly; 20, heating assembly; 21, first heating assembly; 22, second heating assembly; 30, workpiece; 40, vacuum chamber; 101, evaporation pool; 201, heating element. DETAILED DESCRIPTION
[0026] It should be noted that the embodiments and features in the embodiments of the present application can be combined with each other without conflict. The present application will be described in detail below with reference to the drawings and in combination with the embodiments.
[0027] It should be noted that the terms used herein are only intended to describe specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, the singular form is intended to include the plural form, unless the context clearly indicates otherwise, and it should also be understood that the terms "comprise" and / or "include" as used in the specification indicate the presence of features, steps, operations, devices, components and / or combinations thereof.
[0028] The relative arrangement, numerical expressions and values of the components and steps set forth in the embodiments are not intended to limit the scope of the present application, unless otherwise specifically stated. At the same time, it should be understood that the sizes of the various parts shown in the drawings are not drawn in proportion to the actual proportions. Techniques, methods and devices known to those of ordinary skill in the relevant art can not be discussed in detail, but in appropriate cases, the techniques, methods and devices should be considered as part of the authorized specification. In all examples shown and discussed herein, any specific value should be interpreted as merely exemplary, and not as a limitation. Therefore, other examples of exemplary embodiments can have different values. It should be noted that similar reference numbers and letters represent similar items in the following drawings, and therefore, once an item is defined in one drawing, it need not be further discussed in subsequent drawings.
[0029] Referring to Figures 1 to 5 As shown, according to the embodiments of the present application, an evaporation device is provided, which comprises an evaporation assembly 10 and a heating assembly 20. The evaporation assembly 10 is provided with an evaporation pool 101 for carrying and evaporating film material. The heating assembly 20 comprises at least two groups, and the at least two groups of heating assemblies 20 are arranged along the height direction of the evaporation pool 101 (as shown in FIG. 1). Figure 1The heating assemblies 20 are arranged in sequence and at intervals in the height direction of the evaporation pool 101, and each heating assembly 20 comprises at least one heating element 201, the extending direction of the heating element 201 being perpendicular to the height direction of the evaporation pool 101, and the projections of the heating elements 201 of each heating assembly 20 in the height direction of the evaporation pool 101 are arranged in staggered manner.
[0030] Specifically, during the coating, the workpiece 30 is arranged on the top of the evaporation pool 101, and the film material is placed in the evaporation pool 101. Under the heating of the evaporation assembly 10, the film material evaporates into film material gas and rises along the height direction of the evaporation pool 101 to adhere to the workpiece 30, so as to complete the coating of the workpiece 30. Compared with the prior art, at least two groups of heating assemblies 20 are arranged in the height direction of the evaporation pool 101, and when the large-particle high-temperature droplets generated by the heating of the film material splash towards the workpiece 30, they can be sequentially blocked by the heating elements 201 of the at least two groups of heating assemblies 20, so as to avoid the large-particle high-temperature droplets from splashing onto the workpiece 30 and causing damage to the workpiece 30. At the same time, the heating elements 201 can perform secondary heating on the large-particle high-temperature droplets, so as to gasify the large-particle high-temperature droplets into film material gas, thereby reducing the coating cost and prolonging the service life of the heating assembly 20.
[0031] As shown in FIGS. 1 and 2, the evaporation assembly 10 comprises a plurality of heating assemblies 20 arranged in sequence and at intervals in the height direction of the evaporation pool 101. Figure 3 and FIGS. 3 and 4. Figure 4 As shown in FIGS. 1 and 2, the evaporation assembly 10 comprises a plurality of heating assemblies 20 arranged in sequence and at intervals in the height direction of the evaporation pool 101.
[0032] Specifically, the arrangement of the plurality of heating elements 201 in each heating assembly 20 can block the large-particle high-temperature droplets from splashing onto the workpiece 30 in a wider range. In addition, the projections of the plurality of heating elements 201 of each heating assembly 20 in the height direction of the evaporation pool 101 form a hollow part, which is a gas passage in the present embodiment. The gas passage is arranged to allow the film material gas to pass through, so as to avoid the film material gas from being blocked by the plurality of heating elements 201 and reduce the coating efficiency.
[0033] Further, the heating assembly 20 comprises a first heating assembly 21 and a second heating assembly 22, the plurality of heating elements 201 of the first heating assembly 21 are arranged at intervals in a first direction, the plurality of heating elements 201 of the second heating assembly 22 are arranged at intervals in a second direction, the first direction and the second direction are both perpendicular to the height direction of the evaporation pool 101, and the included angle A between the first direction and the second direction satisfies the relationship: 0°<A<180°.
[0034] Specifically, in order to reduce the manufacturing cost of the evaporation device and to have a good blocking effect on the large particle high-temperature droplets of the film material, two groups of heating assemblies 20 are arranged in the height direction of the evaporation pool 101, and each group of heating assemblies 20 includes a plurality of heating pieces 201. Each heating piece 201 in the first heating assembly 21 is in a first plane in space, each heating piece 201 in the second heating assembly 22 is in a second plane in space, and the first plane and the second plane are arranged in different planes to avoid contact between the first heating assembly 21 and the second heating assembly 22, thereby excessively increasing the blocking range and making it difficult for the film material gas to pass through the first heating assembly 21 and the second heating assembly 22. In addition, in order to form a gas passage in space for the first heating assembly 21 and the second heating assembly 22, the first direction and the second direction cannot be arranged in parallel, and the included angle A can be 10°, 20°, 30°, 40°, 50°, 60°, 70°, 80°, 90°, 100°, 110°, 120°, 130°, 140°, 150°, 160°, and 170°. In a specific embodiment, the angle of the included angle A is 90°, and in this embodiment, the first direction is the X direction, and the second direction is the Y direction. Figure 3 In a specific embodiment, the angle of the included angle A is 90°, and in this embodiment, the first direction is the X direction, and the second direction is the Y direction. Figure 3 In a specific embodiment, the angle of the included angle A is 90°, and in this embodiment, the first direction is the X direction, and the second direction is the Y direction.
[0035] Further, the spacing D1 between the adjacent two heating pieces 201 of the first heating assembly 21 satisfies the relationship: 0.1 μm≤D1≤1 cm. When the adjacent two heating pieces 201 of the first heating assembly 21 satisfy the above relationship, the gap between the adjacent two heating pieces 201 is not too large, which cannot block the large particle high-temperature droplets of the film material, and the gap is not too small, which makes it difficult for the film material gas to pass through the gap. On the contrary, when D1 is less than 0.1 μm, the gap between the adjacent two heating pieces 201 of the first heating assembly 21 is small, and the film material gas is difficult to pass through the gap, which reduces the film coating efficiency. When D1 is greater than 1 cm, the gap between the adjacent two heating pieces 201 of the first heating assembly 21 is too large, and the heating piece 201 cannot block the large particle high-temperature droplets of the film material from splashing onto the workpiece 30. Similarly, the spacing D2 between the adjacent two heating pieces 201 of the second heating assembly 22 satisfies the relationship: 0.1 μm≤D2≤1 cm. The values of D1 and D2 can be 0.1 μm, 1 μm, 5 μm, 10 μm, 50 μm, 100 μm, 500 μm, 1 mm, 5 mm, and 1 cm
[0036] Further, the heating member 201 at least comprises an electric heating rod. Specifically, the electric heating rod can block the large high-temperature liquid droplets of the film material and heat the large high-temperature liquid droplets again, so that the large high-temperature liquid droplets are gasified into film material gas, thereby ensuring the efficiency of film plating and reducing the cost of film plating. In addition, in the embodiment, each electric heating rod is connected to a power supply, which means that when each electric heating rod exchanges heat with the outside, each electric heating rod can maintain a high temperature at each position, thereby avoiding the situation that the low-temperature part of the electric heating rod contacts the film material gas, so that the film material gas is solidified or liquefied. In a specific embodiment, the film material is aluminum, and the electric heating rod is a tungsten electric heating rod. Generally, the melting point of aluminum is 660°C, and the heating temperature of the tungsten electric heating rod is above 1000°C. After the tungsten electric heating rod exchanges heat with the outside, the temperature of the lowest part of the surface of the tungsten electric heating rod can still be maintained above 800°C, thereby avoiding the situation that the aluminum gas contacts the tungsten electric heating rod and adheres to the tungsten electric heating rod.
[0037] To reduce the manufacturing cost of the evaporation device, in the embodiment, the evaporation assembly 10 at least comprises one of an evaporation boat and a crucible, that is, the evaporation assembly 10 can directly select an evaporation boat or a crucible that is suitable for the workpiece 30, without manufacturing a specific evaporation structure in the evaporation device. In a preferred embodiment, the evaporation assembly 10 is a tungsten evaporation boat, so as to improve the service life of the evaporation assembly 10.
[0038] Further, the distance D3 between the two adjacent groups of heating assemblies 20 along the height direction of the evaporation pool 101 satisfies the relationship: 1 μm≤D3≤10 cm. When D3 satisfies the above relationship, the heating range of each heating member 201 in the two adjacent groups of heating assemblies 20 can better heat the large high-temperature liquid droplets of the film material in the splashing, and at the same time, the film material gas will not be excessively blocked.
[0039] Specifically, since the heating member 201 is an electric heating rod, the temperature of the electric heating rod is high, and the multiple electric heating rods radiate heat outward, so that the temperature between the multiple electric heating rods is also high. If part of the large-particle high-temperature droplets of the film material are not blocked by the heating assembly 20 and still fly towards the direction of the plated member 30, the large-particle high-temperature droplets gradually vaporize when passing through the heating area of the electric heating rod during the flight process. If the distance between the two adjacent heating assemblies 20 is large, that is, D3 is greater than 10 cm, the temperature of the heating area formed by the multiple electric heating rods is low, and the large-particle high-temperature droplets may be difficult to vaporize. When D3 is less than 1 μm, the two adjacent heating assemblies 20 are arranged too close, and the heating area formed between the multiple heating assemblies 20 in the height direction is reduced, which may make it difficult to completely vaporize the large-particle high-temperature droplets in the splashing. The value of D3 can be 1 μm, 5 μm, 10 μm, 50 μm, 100 μm, 500 μm, 1 mm, 5 mm, 1 cm, 5 cm, and 10 cm. In the embodiment, the plated member 30 is a base film, and the projection plane of the evaporation assembly 10 in the height direction is located in the projection plane of the base film in the height direction, so as to improve the evaporation area.
[0040] Further, the evaporation device further comprises a base (not shown in the figure), which is arranged on the top of the heating assembly 20 along the height direction of the evaporation pool 101, and is used for mounting the plated member 30. The distance D4 between the base and the heating assembly 20 along the height direction of the evaporation pool 101 satisfies the relationship: 5 cm≤D4≤30 cm.
[0041] Specifically, the value of D4 can be 5 cm, 10 cm, 15 cm, 20 cm, 25 cm, and 30 cm. When D4 satisfies the above range, the base and the heating assembly 20 have a proper distance, which can avoid the large-particle droplets from splashing onto the plated member 30 to a certain extent. At the same time, the distance is not too large, which causes part of the film material gas to not be able to adhere to the plated member 30. If D4 is less than 5 cm, the distance between the base and the heating assembly 20 is too close, which may cause the large-particle high-temperature droplets that have not been vaporized to still splash onto the plated film under the action of gravity. When D4 is greater than 30 cm, part of the film material gas may fly into other areas of the evaporation device when rising, and cannot adhere to the plated member 30, which reduces the plating film efficiency.
[0042] Further, the evaporation device further comprises a vacuum chamber 40, wherein the evaporation assembly 10 and the heating assembly 20 are arranged in the vacuum chamber 40. The vacuum chamber 40 can avoid the influence of external gas on the film material, the evaporation assembly 10, and the heating assembly 20, thereby improving the plating film efficiency and the plating film quality.
[0043] In another aspect, the present application also provides a coating equipment, which comprises the evaporation device in the above-mentioned embodiments, and therefore, the coating equipment comprises all the technical effects of the evaporation device in the above-mentioned embodiments. Since the technical effects of the evaporation device have been described in detail above, no further description is given here.
[0044] For the convenience of description, spatial relative terms such as "above", "upper", "top", "top surface", "upper surface", etc. can be used herein to describe the spatial positional relationship of one device or feature with respect to other devices or features as shown in the drawings. It should be understood that the spatial relative terms are intended to include different orientations of the device in use or operation in addition to the orientation of the device described in the drawings. For example, if the device in the drawings is inverted, the device described as "above" or "on" other devices or structures will be positioned "below" or "under" the other devices or structures. Thus, the exemplary term "above" can include both "above" and "below" orientations. The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein are interpreted accordingly.
[0045] In addition, it should be noted that the use of the terms "first", "second", etc. to define parts is only for the convenience of distinguishing the corresponding parts, and the above terms have no special meaning unless otherwise stated, and therefore cannot be understood as a limitation on the scope of protection of the present application.
[0046] The above is only the preferred embodiment of the present application and is not intended to limit the present application. The present application can have various modifications and changes for those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the scope of protection of the present application.
Claims
1. An evaporation device, characterized by The application relates to a coating device. The evaporation assembly (10) is provided with an evaporation pool (101) for carrying and evaporating film materials. The heating assembly (20) comprises at least two groups of heating components (201) arranged on the top of the evaporation pool (101) along the height direction of the evaporation pool (101), and the projection of the heating components (201) of each group of heating assemblies (20) on the height direction of the evaporation pool (101) is staggered.
2. The evaporation device of claim 1, wherein Each heating assembly (20) comprises a plurality of heating components (201), and the projection of the plurality of heating components (201) of each heating assembly (20) on the height direction of the evaporation pool (101) forms a hollow part.
3. The evaporation device of claim 2, wherein The heating assembly (20) comprises a first heating assembly (21) and a second heating assembly (22), the plurality of heating components (201) of the first heating assembly (21) are arranged in a first direction, the plurality of heating components (201) of the second heating assembly (22) are arranged in a second direction, the first direction and the second direction are perpendicular to the height direction of the evaporation pool (101), and the included angle A between the first direction and the second direction satisfies the relationship: 0° < A < 180°.
4. The evaporation device according to claim 3, characterized in that The distance D1 between the adjacent two heating components (201) of the first heating assembly (21) satisfies the relationship: 0.1 mu m <= D1 <= 1 cm.
5. The evaporation device of claim 3, wherein The distance D2 between the adjacent two heating components (201) of the second heating assembly (22) satisfies the relationship: 0.1 mu m <= D2 <= 1 cm.
6. The evaporation device according to any of claims 1 to 5, wherein The heating component (201) at least comprises an electric heating rod.
7. The evaporation device according to any of claims 1 to 5, wherein The evaporation assembly (10) at least comprises one of an evaporation boat and a crucible.
8. The evaporation device according to any of claims 1 to 5, wherein The distance D3 between the adjacent two groups of heating assemblies (20) along the height direction of the evaporation pool (101) satisfies the relationship: 1 mu m <= D3 <= 10 cm.
9. The evaporation apparatus according to any one of claims 1 to 5, wherein The coating device further comprises a base station arranged on the top of the heating assembly (20) along the height direction of the evaporation pool (101), and the base station is used for mounting a to-be-coated component (30). The distance D4 between the base station and the heating assembly (20) along the height direction of the evaporation pool (101) satisfies the relationship: 5 cm <= D4 <= 30 cm.
10. A coating apparatus, characterized by comprising: The coating device comprises the evaporation device according to any one of claims 1 to 9.