Turret crane detection mechanism capable of preventing material throwing

Abstract

The utility model relates to the technical field of semiconductor detection, in particular to a turret crane detection mechanism capable of preventing material throwing, a protection mechanism is arranged at the end part of a mounting cantilever, the protection mechanism comprises a connecting arm, a protection plate assembly and an adjusting part, and the adjusting part is arranged at the end part of the connecting arm; the protection plate assembly is arranged at the end, close to the vacuum suction nozzle, of the adjusting part, and the protection plate assembly is in transmission connection with the adjusting part. According to the turret crane detection mechanism capable of preventing material throwing, the vacuum suction nozzle is jacked and pressed through the jacking and pressing mechanism of the turret crane and is matched with the compression spring, so that the vacuum suction nozzle can move up and down in a reciprocating manner to realize adsorption of a semiconductor element; when the vacuum suction nozzle adsorbs the semiconductor element and then drives the semiconductor element to move upwards to the position flush with the protection plate assembly, and when the rotating tower drives the mounting cantilever and the vacuum suction nozzle to rotate to distribute the semiconductor element, the protection plate assembly protects the outer side of the semiconductor element.

Description

TECHNICAL FIELD

[0001] The utility model relates to semiconductor detection technical field especially relates to a prevent material throwing's turret machine detection mechanism. BACKGROUND

[0002] Semiconductor element test is to detect the performance of semiconductor elements with special detection equipment to see whether it meets the required requirements. When detecting semiconductor elements now, turret type test sorting machine is usually needed to send multiple semiconductor elements to each detection station for detection.

[0003] The existing turret type test sorting machine is generally equipped with 16-20 vacuum nozzles, the vacuum nozzles are movably installed on the cantilever on the side of the turret through springs, and the vacuum nozzles are pressed by the pressing mechanism of the turret machine, and the vacuum nozzles can move up and down reciprocally through the cooperation of the springs, so that the semiconductor elements are adsorbed. It mainly adsorbs semiconductor elements through vacuum nozzles to realize the detection of semiconductor elements, but the speed of the turret machine is fast when running, the centrifugal force of the vacuum nozzles is large when driving the semiconductor elements to rotate, which causes the semiconductor elements to easily fall off along the adsorption position of the vacuum nozzles, and the phenomenon of throwing material appears, which affects the normal operation of the semiconductor element detection, and even causes the damage of the semiconductor elements. To solve the above problems, we propose a kind of turret machine detection mechanism for preventing material throwing. SUMMARY

[0004] The utility model aims at solving the shortcomings in the prior art and proposes a kind of turret machine detection mechanism for preventing material throwing.

[0005] In order to achieve the above purpose, the utility model adopts the following technical scheme: a kind of turret machine detection mechanism for preventing material throwing, including installation shaft, the upper portion of the outside of installation shaft is provided with turret and rotary air supply disc, and the side of turret is fixedly installed with several installation cantilevers, the end of installation cantilever is movably installed with vacuum nozzle, and the upper portion of the outside of vacuum nozzle is movably sleeved with compression spring, the end of installation cantilever is provided with protection mechanism, and the protection mechanism includes connecting arm, protection plate assembly and adjusting part, the end of connecting arm is provided with adjusting part, the one end of adjusting part close to vacuum nozzle is provided with protection plate assembly, the protection plate assembly is transmission connection with adjusting part, the protection plate assembly includes a group of protection main plate and two groups of protection side plate, the adjusting part includes adjusting screw rod and adjusting ring, the adjusting screw rod is screw connection with adjusting ring.

[0006] As a further description of the above technical solution: the end of the vacuum nozzle is provided with a vacuum tube, and the vacuum nozzle is fixedly connected to the rotating air supply plate through the vacuum tube. The vacuum nozzle can be controlled along the vacuum tube by the rotating air supply plate to ensure that the air path remains unobstructed when the turret drives the vacuum nozzle to rotate.

[0007] As a further description of the above technical solution: the cross-sectional shape of the part of the vacuum nozzle that mates with the mounting cantilever is hexagonal, and the compression spring is movably fitted on the upper part of the vacuum nozzle to restrict the vacuum nozzle, ensuring that the vacuum nozzle can move downward under the push of the turret crane's own top pressure mechanism, while preventing the vacuum nozzle from rotating axially.

[0008] As a further description of the above technical solution: the connecting arm is L-shaped and is fixedly installed on the end of the mounting cantilever by screws. The lower end of the connecting arm has a through hole that cooperates with the adjusting screw, and a positioning slider is provided on the through hole. The adjusting screw is auxiliaryly restricted through the through hole to ensure the stability of the adjusting screw when it moves.

[0009] As a further description of the above technical solution: the adjustment component also includes a mounting plate, a positioning slide groove, and a return spring. The mounting plate is fitted onto the outside of the adjustment ring and is fixedly mounted on the connecting arm by screws. The mounting plate restricts the position of the adjustment ring, ensuring that the adjustment ring is firmly mounted on the connecting arm and can rotate stably.

[0010] As a further description of the above technical solution: the adjusting screw is provided with a positioning groove that cooperates with the positioning slider, and a return spring is movably fitted on the end of the adjusting screw near the adjusting ring. The return spring applies elastic force to the adjusting ring to ensure the stability of the adjusting ring and the adjusting screw after adjustment.

[0011] As a further description of the above technical solution: the protective plate assembly is located 1-2cm from the bottom of the vacuum nozzle. The protective plate assembly also includes a locking knob. The main protective plate is fixedly connected to the adjusting screw. A rotating shaft is provided on the protective side plate, and the protective side plate is hinged to the side of the main protective plate through the rotating shaft. The locking knob is threaded to one end of the rotating shaft. Rotating the locking knob releases the restriction on the protective side plate. The deflection angle of the protective side plate can be adjusted according to the size of the semiconductor component.

[0012] This utility model has the following beneficial effects:

[0013] The turret crane detection mechanism designed in this utility model prevents material spillage. The turret crane's built-in pressing mechanism presses down on the vacuum nozzle and works in conjunction with a compression spring, allowing the vacuum nozzle to move up and down to adsorb semiconductor components. After the vacuum nozzle adsorbs the semiconductor component, it moves the semiconductor component upward to a position flush with the protective plate assembly. When the turret drives the mounting cantilever and the vacuum nozzle to distribute the semiconductor components, the protective plate assembly protects the outside of the semiconductor components, preventing them from being spilled due to centrifugal force during rotation, thus ensuring the stability of the turret crane when distributing semiconductor components.

[0014] This utility model designs a turret crane detection mechanism to prevent material spillage. Rotating the adjusting ring drives the adjusting screw and the protective plate assembly to move. The position of the protective plate assembly can be adjusted according to the size of the semiconductor components, so as to protect semiconductor components of different sizes and increase the applicability. At the same time, protective side plates are set on both sides of the protective main plate. In addition to protecting the semiconductor components on the side away from the center of the turret, they can also restrict the semiconductor components on the left and right sides, improving the protection effect of the semiconductor components and preventing the semiconductor components from being spilled during dispensing. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the overall assembly of this utility model;

[0016] Figure 2 This is a structural diagram showing the cantilever mounting position of this utility model;

[0017] Figure 3 This is a structural diagram showing the installation location of the protective mechanism of this utility model;

[0018] Figure 4 This is a schematic diagram of the protective mechanism of this utility model;

[0019] Figure 5 This is a schematic diagram of the structure of the protective plate assembly of this utility model;

[0020] Figure 6 This is a schematic diagram of the structure of the adjusting component of this utility model.

[0021] Legend:

[0022] 1. Mounting shaft; 2. Turret; 3. Rotary air supply plate; 4. Mounting cantilever; 5. Vacuum nozzle; 6. Compression spring; 7. Vacuum tube; 8. Protective mechanism; 81. Connecting arm; 82. Protective plate assembly; 821. Protective main plate; 822. Protective side plate; 823. Locking knob; 83. Adjusting component; 831. Adjusting screw; 832. Adjusting ring; 833. Mounting pressure plate; 834. Positioning slide; 835. Return spring. Detailed Implementation

[0023] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0024] Please refer to Figures 1 to 6 This utility model provides a technical solution: a turret crane detection mechanism to prevent material spillage, including a mounting shaft 1, a turret 2 and a rotating air supply plate 3 arranged above the outside of the mounting shaft 1. The rotating air supply plate 3 can control the vacuum nozzle 5 along the vacuum tube 7 to ensure that the air passage remains unobstructed when the turret 2 drives the vacuum nozzle 5 to rotate. Several mounting cantilever arms 4 are fixedly installed on the periphery of the turret 2. The vacuum nozzle 5 is movably installed at the end of the mounting cantilever arm 4, and a compression spring 6 is movably fitted above the outside of the vacuum nozzle 5. The turret crane's own pressing mechanism presses the vacuum nozzle 5 and cooperates with the compression spring 6 to enable the vacuum nozzle 5 to move up and down to adsorb semiconductor components. A protective mechanism 8 is provided at the end of the mounting cantilever arm 4, and the protective mechanism 8 includes a connecting arm 81, a protective plate assembly 82 and an adjusting component 83. When the vacuum nozzle 5 adsorbs the semiconductor component, it drives the semiconductor component to move upward to a position flush with the protective plate assembly 82. The protective plate assembly 82 protects the outside of the semiconductor element to prevent it from being thrown out due to centrifugal force during rotation. The adjusting component 83 is located at the end of the connecting arm 81, and the protective plate assembly 82 is located at the end of the adjusting component 83 near the vacuum nozzle 5. The protective plate assembly 82 is connected to the adjusting component 83 by transmission. The protective plate assembly 82 includes a set of protective main plates 821 and two sets of protective side plates 822. Protective side plates 822 are provided on both sides of the protective main plate 821. In addition to protecting the semiconductor element on the side away from the center of the turret, it can also restrict the semiconductor element on the left and right sides. The adjusting component 83 includes an adjusting screw 831 and an adjusting ring 832. The adjusting screw 831 and the adjusting ring 832 are threadedly connected. Rotating the adjusting ring 832 drives the adjusting screw 831 and the protective plate assembly 82 to move. The position of the protective plate assembly 82 can be adjusted according to the size of the semiconductor element to protect semiconductor elements of different sizes.

[0025] As a further implementation of the above technical solution: the end of the vacuum nozzle 5 is provided with a vacuum tube 7, and the vacuum nozzle 5 is fixedly connected to the rotating air supply plate 3 through the vacuum tube 7. The rotating air supply plate 3 is existing technology. The vacuum nozzle 5 can be controlled along the vacuum tube 7 through the rotating air supply plate 3 to ensure that the turret 2 remains in a smooth air passage when it drives the vacuum nozzle 5 to rotate.

[0026] As a further implementation of the above technical solution: the cross-sectional shape of the part where the vacuum nozzle 5 and the mounting cantilever 4 cooperate is hexagonal, which restricts the vacuum nozzle 5 and ensures that the vacuum nozzle 5 can move downward under the push of the top pressure mechanism of the turret machine. At the same time, it prevents the axial rotation of the vacuum nozzle 5 from causing the position of the adsorbed semiconductor element to change. The compression spring 6 is movably mounted on the upper part of the vacuum nozzle 5. The compression spring 6 applies elastic force to the vacuum nozzle 5, which facilitates the vacuum nozzle 5 to reset after adsorbing the semiconductor element.

[0027] As a further implementation of the above technical solution: the connecting arm 81 is L-shaped and is fixedly installed on the end of the mounting cantilever 4 by screws to ensure the stability of the connecting arm 81 after installation and facilitate disassembly. The lower end of the connecting arm 81 is provided with a through hole that cooperates with the adjusting screw 831. The adjusting screw 831 is further restricted by the through hole to ensure the stability of the adjusting screw 831 when it moves. A positioning slider is provided on the through hole. The positioning slider and the positioning groove 834 cooperate with each other to restrict the adjusting screw 831 and prevent the adjusting screw 831 from rotating axially.

[0028] As a further implementation of the above technical solution: the adjusting component 83 also includes a mounting plate 833, a positioning groove 834, and a return spring 835. The mounting plate 833 is fitted onto the outside of the adjusting ring 832 and is fixedly mounted on the connecting arm 81 by screws. The mounting plate 833 restricts the position of the adjusting ring 832, ensuring that the adjusting ring 832 is firmly mounted on the connecting arm 81 and can rotate stably.

[0029] As a further implementation of the above technical solution: the adjusting screw 831 is provided with a positioning groove 834 that cooperates with the positioning slider. The positioning slider and the positioning groove 834 can restrict the adjusting screw 831, so that the adjusting screw 831 can only move along the axis and prevent it from rotating along the axis, thereby achieving stable adjustment of the protective plate assembly 82. A return spring 835 is movably fitted on the end of the adjusting screw 831 near the adjusting ring 832. The return spring 835 applies elastic force to the adjusting ring 832 to ensure the stability of the adjusting ring 832 after adjustment, thereby ensuring the stability of the adjusting screw 831 and the protective plate assembly 82 after adjustment, and achieving precise protection of the semiconductor components by the protective plate assembly 82.

[0030] As a further implementation of the above technical solution: the protective plate assembly 82 is located 1-2 cm below the bottom of the vacuum nozzle 5. When the vacuum nozzle 5 adsorbs the semiconductor element, it moves the semiconductor element upward to a position flush with the protective plate assembly 82. The protective plate assembly 82 protects the outside of the semiconductor element, preventing the semiconductor element from being thrown out due to centrifugal force during rotation. The protective plate assembly 82 also includes a locking knob 823. The protective main plate 821 is fixedly connected to the adjusting screw 831. Protective side plates 822 are provided on both sides of the protective main plate 821. In addition to protecting the semiconductor element on the side away from the center of the turret, they can also restrict the semiconductor element on the left and right sides. The protective side plate 822 is provided with a rotating shaft, and the protective side plate 822 is hinged to the side of the protective main plate 821 through the rotating shaft. The locking knob 823 is threaded to one end of the rotating shaft. Rotating the locking knob 823 releases the restriction on the protective side plate 822. The deflection angle of the protective side plate 822 can be adjusted according to the size of the semiconductor element, increasing the applicability.

[0031] Working principle:

[0032] When using this invention, the position of the protective plate assembly 82 is pre-adjusted according to the size of the semiconductor element. Rotating the adjusting ring 832 moves the adjusting screw 831. Since the adjusting screw 831 and the adjusting ring 832 are threadedly connected, and the adjusting screw 831 is restricted by the positioning groove 834 and the positioning slider, when the adjusting ring 832 rotates, the adjusting screw 831 can only move along the axis and cannot rotate. A return spring 835 applies elastic force to the adjusting ring 832 to ensure the stability of the adjusting ring 832 and the adjusting screw 831 after adjustment. The adjusting screw 831 moves the protective plate assembly 82 to adaptively adjust according to the size of the semiconductor element. Rotating the locking knob 823 releases the restriction on the protective side plate 822, and the deflection angle of the protective side plate 822 is adjusted according to the size of the semiconductor element. After adjustment, rotating the locking knob 823 locks the protective side plate 822, completing the protection... The overall adjustment of the protective plate assembly 82 ensures that after the vacuum nozzle 5 adsorbs and moves the semiconductor element upward, the semiconductor element can move to the side of the protective plate assembly 82 close to the center of the turret 2. When distributing semiconductor elements, the turret 2 drives the mounting cantilever 4 and the vacuum nozzle 5 to rotate intermittently. The turret machine's own top pressure mechanism pushes the vacuum nozzle 5 downward, so that the vacuum nozzle 5 adsorbs the semiconductor element at the detection position. It works with the compression spring 6 to reset the vacuum nozzle 5. After the vacuum nozzle 5 adsorbs and resets the semiconductor element, the vacuum nozzle 5 moves the adsorbed semiconductor element upward to a position flush with the protective plate assembly 82. When the turret 2 drives the mounting cantilever 4 and the vacuum nozzle 5 to rotate and distribute semiconductor elements, the protective main plate 821 and the protective side plate 822 restrict the position of the semiconductor element to prevent the semiconductor element from falling off the bottom of the vacuum nozzle 5 due to excessive centrifugal force, thus avoiding material spillage.

[0033] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model; the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In addition, unless otherwise explicitly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. For those skilled in the art, the specific meaning of the above terms in this utility model can be understood according to the specific circumstances. Moreover, the terms “comprising,” “including,” or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0034] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A turret crane detection mechanism for preventing material spillage, comprising a mounting shaft (1), a turret (2) and a rotating air supply plate (3) being disposed above the outside of the mounting shaft (1), and a plurality of mounting cantilever arms (4) being fixedly mounted on the periphery of the turret (2), a vacuum nozzle (5) being movably mounted at the end of the mounting cantilever arm (4), and a compression spring (6) being movably fitted above the outside of the vacuum nozzle (5), characterized in that: The end of the mounting cantilever (4) is provided with a protective mechanism (8), and the protective mechanism (8) includes a connecting arm (81), a protective plate assembly (82), and an adjusting component (83). The adjusting component (83) is located at the end of the connecting arm (81), and the protective plate assembly (82) is located at the end of the adjusting component (83) near the vacuum nozzle (5). The protective plate assembly (82) and the adjusting component (83) are connected in a transmission manner. The protective plate assembly (82) includes a set of protective main plates (821) and two sets of protective side plates (822). The adjusting component (83) includes an adjusting screw (831) and an adjusting ring (832). The adjusting screw (831) and the adjusting ring (832) are threadedly connected.

2. The turret crane detection mechanism for preventing material spillage according to claim 1, characterized in that: The vacuum nozzle (5) is provided with a vacuum tube (7) at its end, and the vacuum nozzle (5) is fixedly connected to the rotating air supply plate (3) through the vacuum tube (7).

3. The turret crane detection mechanism for preventing material spillage according to claim 1, characterized in that: The cross-sectional shape of the part where the vacuum nozzle (5) and the mounting cantilever (4) meet is hexagonal, and the compression spring (6) is movably mounted on the upper part of the vacuum nozzle (5).

4. The turret crane detection mechanism for preventing material spillage according to claim 1, characterized in that: The connecting arm (81) is L-shaped and is fixedly installed on the end of the mounting cantilever (4) by screws. The lower end of the connecting arm (81) is provided with a through hole that cooperates with the adjusting screw (831), and a positioning slider is provided on the through hole.

5. The turret crane detection mechanism for preventing material spillage according to claim 1, characterized in that: The adjustment component (83) also includes a mounting plate (833), a positioning slide (834), and a return spring (835). The mounting plate (833) is fitted onto the outside of the adjustment ring (832) and is fixedly mounted on the connecting arm (81) by screws.

6. A turret crane detection mechanism for preventing material spillage according to claim 4 or 5, characterized in that: The adjusting screw (831) is provided with a positioning groove (834) that cooperates with the positioning slider, and a return spring (835) is movably fitted on one end of the adjusting screw (831) near the adjusting ring (832).

7. The turret crane detection mechanism for preventing material spillage according to claim 1, characterized in that: The protective plate assembly (82) is located 1-2 cm from the bottom of the vacuum nozzle (5). The protective plate assembly (82) also includes a locking knob (823). The protective main plate (821) is fixedly connected to the adjusting screw (831). The protective side plate (822) is provided with a rotating shaft, and the protective side plate (822) is hinged to the side of the protective main plate (821) through the rotating shaft. The locking knob (823) is threaded to one end of the rotating shaft.

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