Polishing device
By designing a polishing device that utilizes the counter-rotation of the brush plate and the base plate, as well as the rotation of the download plate, uniform polishing of the outer peripheral wall of a circular product is achieved. This solves the problems of high polishing difficulty and cost, simplifies the process, increases production capacity, and reduces costs.
Patent Information
- Application Number
- CN202520209708.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-10
- Publication Date
- 2026-01-02
- Estimated Expiration
- 2035-02-10
AI Technical Summary
Polishing the surface of round products is difficult and involves many polishing steps, resulting in complex manufacturing processes and high costs.
Design a polishing device, including: 1) By rotating the chassis and the material, combined with the opposite rotation of the brush plate and the chassis, the circular product rotates in the rotating groove, and the outer peripheral wall is polished uniformly by the brush. The rotating groove is designed in the radial direction, the extension direction of the rotating groove is the radial direction of the rotating plate, and the circular product in the rotating groove is subjected to the maximum thrust to achieve one-time polishing.
It simplifies the polishing process, shortens the processing cycle, increases production capacity, saves labor, equipment and auxiliary material costs, and improves polishing quality and efficiency.
Smart Images
Figure CN223749339U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application belongs to the field of polishing equipment, and particularly relates to a polishing device. BACKGROUND
[0002] The appearance surface of a circular product usually comprises a bevel, a chamfer and a straight body, and the material is various, such as a gem, a ceramic and a glass. When the appearance surface of the circular product is polished, the polishing difficulty is relatively large, and in order to ensure the polishing quality, the polishing procedure is usually relatively large, and the production process and production cost are relatively high. SUMMARY
[0003] The present application aims to provide a polishing device, which is beneficial to simplify the process and reduce the production cost.
[0004] In order to achieve the above-mentioned purpose, the present application provides a polishing device, which comprises:
[0005] A bristle disc, wherein a bottom end surface is provided with bristles;
[0006] A bottom disc, which is located below the bristle disc, wherein the bottom disc and at least one of the bristle discs rotate around a first axis, a plurality of download discs are arranged on the bottom disc, the download discs rotate around a second axis, and the first axis and the second axis are arranged in parallel and at intervals;
[0007] A fixed seat, which is located above the download disc and rotates synchronously with the download disc, wherein the fixed seat is provided with a rotating groove with an upward opening, and the extension direction of the rotating groove is the radial direction corresponding to the download disc.
[0008] In some specific embodiments, the polishing device further comprises a toothed plate, the toothed plate is fixed on the download disc and is provided with a fixed cavity, and the fixed seat is arranged in the fixed cavity;
[0009] And / or, the fixed seat comprises a base body and a C-shaped groove plate, the C-shaped groove plate is detachably arranged on the base body, and the rotating groove is formed on the C-shaped groove plate;
[0010] And / or, the cross section of the groove bottom wall of the rotating groove is a circular arc shape matched with the outer contour of the circular product to be polished.
[0011] In some specific embodiments, the polishing device further comprises a plurality of spacers, the plurality of spacers and the plurality of circular products to be polished are staggered and stacked along the extension direction of the rotating groove, and the spacers and the circular products to be polished are placed in the rotating groove and can rotate around the own axis.
[0012] In some specific embodiments, the depth of the rotating groove is greater than the radius of the spacer;
[0013] And / or, the thickness of the gasket is greater than or equal to 2mm and less than or equal to 3mm;
[0014] And / or, the gasket has a hollow part sleeved on the protruding part of the circular product to be polished.
[0015] And / or, the gasket is a circular ring gasket.
[0016] In some embodiments, the outer peripheral wall of the circular product to be polished has a chamfer and a straight body connected to each other, the bristles act on the chamfer and the straight body, the highest point of the gasket is lower than the lowest point of the chamfer, the difference between the highest point of the chamfer and the lowest point of the chamfer is a first difference, the difference between the highest point of the chamfer and the highest point of the gasket is a second difference, the second difference is greater than the first difference and less than 15 times the first difference.
[0017] In some embodiments, the second difference is greater than or equal to 0.4mm and less than or equal to 0.5mm.
[0018] In some embodiments, the circular product to be polished includes a flange connected to the chamfer, the gasket includes a contact point with the highest position in contact with the flange, the spacing between any two adjacent contact points is S, and the S is less than the maximum width of the bristles.
[0019] In some embodiments, the maximum width of the bristles is greater than or equal to 2mm and less than or equal to 4mm.
[0020] In some embodiments, the maximum width of the bristles is greater than or equal to 2.5mm and less than or equal to 3.5mm.
[0021] In some embodiments, the spacing between the end wall of the rotating groove along the axis of the gasket and the gasket is greater than or equal to 1.1mm and less than or equal to 3.1mm.
[0022] Through the above technical solution, when the polishing device polishes the circular product, at least one of the bristle disc and the polishing base disc can rotate, the disc itself can also rotate, and the circular product placed in the rotating groove can rotate under the action of the bristles. In this way, the bristles can fully and uniformly polish the outer peripheral wall of the circular product, without the need for multiple step polishing of the outer peripheral wall of the circular product, reducing the processing procedure, shortening the processing period, increasing the production capacity, and saving labor, equipment and auxiliary material costs. Moreover, the extension direction of the rotating groove is the radial direction corresponding to the disc, so that the circular product in the rotating groove can receive the maximum thrust force, so that the circular product can rotate more smoothly in the rotating groove, thereby making the polishing effect of the circular product more uniform.
[0023] Other features and advantages of the present application will be explained in the following detailed description of the embodiments. BRIEF DESCRIPTION OF DRAWINGS
[0024] The accompanying drawings are included to provide a further understanding of the present application and are incorporated in and constitute a part of this specification, illustrate embodiments of the present application and together with the description serve to explain the principles of the present application. Other embodiments of the present application will be apparent to those skilled in the art from consideration of the specification and practice of the present application disclosed herein. Aspects of the present application can be modified, and other aspects can be derived, such that structural changes can be made without departing from the scope of the present application. The drawings provided are intended to be illustrative, rather than restrictive, of the present application.
[0025] Figure 1 FIG. 1 shows a schematic view of a polishing device according to an embodiment of the present application;
[0026] Figure 2 FIG. 2 shows a partial schematic view of the polishing device according to an embodiment of the present application; Figure 1
[0027] Figure 3 FIG. 4 shows a schematic view of the bristle disc according to an embodiment of the present application; Figure 2
[0028] Figure 4 FIG. 6 shows a top view of the base plate, the tooth plate and the fixing seat according to an embodiment of the present application;
[0029] Figure 5 FIG. 7 shows a schematic view of the tooth plate according to an embodiment of the present application; Figure 4
[0030] Figure 6 FIG. 9 shows a perspective schematic view of the base plate, the tooth plate and the fixing seat according to an embodiment of the present application; Figure 4
[0031] Figure 7 FIG. 11 shows a perspective schematic view of the fixing seat according to an embodiment of the present application; Figure 6
[0032] Figure 8 FIG. 13 shows a top view of the fixing seat according to an embodiment of the present application; Figure 6
[0033] Figure 9 FIG. 15 shows a schematic view of the bristle disc and the fixing seat according to an embodiment of the present application;
[0034] Figure 10 FIG. 17 shows an enlarged schematic view of the I position according to an embodiment of the present application; Figure 9
[0035] FIG. 19 shows a schematic view of the base body according to an embodiment of the present application; Figure 11
[0036] Figure 12 A structural schematic diagram of a C-shaped groove plate of one specific embodiment of the present application is shown.
[0037] Figure 13 A structural schematic diagram of a gasket of one specific embodiment of the present application is shown.
[0038] Legend of reference signs
[0039] 1 bristle disc 11 bristle
[0040] 2 base disc 21 download disc
[0041] 3 fixing seat 31 rotating groove
[0042] 32 base body 33 C-shaped groove plate
[0043] 4 gasket 41 contact point
[0044] 5 round product 51 chamfer
[0045] 52 straight body position 53 flange table
[0046] 6 tooth plate 61 fixed cavity DETAILED DESCRIPTION
[0047] The specific embodiments of the present application are described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are merely intended to illustrate and explain the present application, and are not intended to limit the present application.
[0048] In order to simplify the process, shorten the processing period, increase the production capacity, save manpower, equipment and auxiliary material costs, the present application provides a new polishing device, which can realize one polishing process to uniformly polish the outer peripheral wall (including chamfer and straight body position) of a round product.
[0049] As shown in Figure 1 , Figure 2 , Figure 3 and Figure 4 , the polishing device of the present application comprises a bristle disc 1, a base disc 2 and a fixing seat 3. The bottom end surface of the bristle disc 1 is provided with bristles 11, the base disc 2 is located below the bristle disc 1, the base disc 2 and at least one of the bristle disc 1 revolve around a first axis, a plurality of download discs 21 are arranged on the base disc 2, the download discs 21 revolve around a second axis, at the same time, the download discs 21 revolve around the first axis, and the first axis and the second axis are arranged in parallel and at intervals. The second axis is the central axis of the download disc 21, the number of the second axes corresponds to the number of the download discs 21, and each download disc 21 revolves around its own second axis. The fixing seat 3 is located above the download disc 21, and the fixing seat 3 rotates synchronously with the download disc 21, that is, the fixing seat 3 rotates around the second axis. The fixing seat 3 is provided with a rotating groove 31 with an opening facing upward, and the extension direction of the rotating groove 31 is the radial direction corresponding to the download disc 21.
[0050] It should be noted that the structure of the bottom disc 2 and at least one of the bristle disc 1 rotating around the first axis can also be various, which can be set according to actual design requirements. For example, a driving mechanism can be drivingly connected with the bristle disc 1 and / or the bottom disc 2 to drive the bottom disc 2 and the bristle disc 1 to rotate around the first axis. The bottom disc 2 and the bristle disc 1 can be driven to rotate by the driving mechanism respectively. The bottom disc 2 can be driven to rotate by the driving mechanism, and the bristle disc 1 is stationary. The bristle disc 1 can be driven to rotate by the driving mechanism, and the bottom disc 2 is stationary. These structure forms should also belong to the protection scope of the present application. The specific rotating driving structure of the bristle disc 1, the bottom disc 2 and the download disc 21 is well known to those skilled in the art, and does not belong to the core improvement part of the present application, so it is not repeated here.
[0051] For the convenience of understanding, an example of a working process is as follows. When the polishing device of the present application polishes the circular product 5, the bristle disc 1 and the bottom disc 2 rotate in opposite directions, the download disc 21 is arranged on the bottom disc 2 to revolve with the rotation of the bottom disc 2, and the download disc 21 can also rotate by itself. The circular product 5 is placed in the rotating groove 31 for limiting, and the circular product 5 can rotate under the action of the bristles 11. It can be seen that the circular product 5 can perform multidimensional rotating motion under the joint action of the bristle disc 1, the bottom disc 2, the download disc 21 and the fixed seat 3. In this way, the bristles 11 can fully and uniformly polish the outer peripheral wall of the circular product 5, without the need to polish the outer peripheral wall of the circular product 5 in multiple steps, thereby reducing the processing procedure, being beneficial to shorten the processing period, increasing the production capacity, and saving the cost of manpower, equipment and auxiliary materials. Moreover, the extension direction of the rotating groove 31 is the radial direction corresponding to the download disc 21, so that the circular product 5 in the rotating groove 31 can receive the maximum thrust force, so as to facilitate the smooth rotation of the circular product 5 in the rotating groove 31, thereby making the polishing effect of the circular product 5 more uniform and the polishing quality better.
[0052] Optionally, the rotating direction of the download disc 21 can be set according to actual needs. For example, the rotating direction of the download disc 21 can be opposite to that of the bristle disc 1, or the rotating direction of the download disc 21 can be the same as that of the bristle disc 1. In the polishing device of the present application, the rotating direction of the download disc 21 can be opposite to that of the bristle disc 1, so that the polishing effect of the circular product 5 is better and the polishing efficiency is higher.
[0053] In the prior art, when the appearance surface of the circular product to be polished includes a connected chamfer and a straight body position, if the chamfer of the circular product is exposed, the chamfer will be collapsed after polishing, and if the chamfer of the circular product is shielded, the chamfer cannot be polished, and the chamfer after polishing is not transparent, and a separate process is required to process the chamfer of the product, which increases the process and the manufacturing cost. "Collapse" refers to the change from an angle to a round angle by polishing; "not transparent" refers to the surface being not bright or the surface roughness not meeting the requirements.
[0054] To simplify the process, shorten the processing period, increase the production capacity, save manpower, equipment and auxiliary material costs, the present application provides a new type of polishing device, which can simultaneously process the straight body position and the chamfer of the product in one polishing process. The polishing device of the present application can also include a plurality of gaskets 4, which are interleaved and stacked with the circular product 5 to be polished and placed in the rotating groove 31 around the axis of the circular product 5 to be polished, the axis of the gasket 4 coincides with the axis of the circular product 5 to be polished, and the axis of the gasket 4 is perpendicular to the second axis. In this way, the bristles 11 can fully and uniformly polish multiple parts on the outer peripheral wall of the circular product 5 at one time, without the need to polish each part on the outer peripheral wall of the circular product 5 one by one in multiple times, further reducing the processing procedure, which is beneficial to shorten the processing period, increase the production capacity, save manpower, equipment and auxiliary material costs.
[0055] Optionally, as shown in Figure 4 , Figure 5 and Figure 6 , the polishing device can also include a tooth plate 6 fixed on the lower disc 21 and provided with a fixed cavity 61, and the fixed seat 3 is arranged in the fixed cavity 61, that is, the fixed seat 3 is arranged above the lower disc 21 through the tooth plate 6 and rotates synchronously with the lower disc 21 through the tooth plate 6. Specifically, as shown in Figure 4 , a plurality of lower discs 21 capable of rotating are mounted on the bottom disc 2, and the plurality of lower discs 21 are arranged at equal intervals along the circumference of the bottom disc 2. One tooth plate 6 is arranged on each lower disc 21, and the material of the tooth plate 6 can be PVC. A plurality of fixed cavities 61 are arranged on each tooth plate 6, and one fixed seat 3 is arranged in each fixed cavity 61. As shown in Figure 7 , Figure 8 and Figure 9 , when the plurality of circular products 5 to be polished are clamped with the plurality of gaskets 4, the circular products 5 and the gaskets 4 are arranged in turn and interleaved and stacked, that is, one circular product 5, one gasket 4, one circular product 5, one gasket 4, and so on, and the clamping is repeated. After the clamping of each fixed seat 3 is completed, the circular product 5 cannot be inclined, and if it is inclined, another gasket 4 needs to be added for adjustment.
[0056] Optionally, in order to make the rotation of the circular product 5 more smooth, the cross section of the bottom wall of the rotating groove 31 is a circular arc matching the outer contour of the circular product 5 to be polished. In addition, in order to make the rotation of the circular product 5 more stable and reliable, the depth of the rotating groove 31 is greater than the radius of the gasket 4. In this way, the circular product 5 is not easy to fall out when rotating. During a processing cycle, the circular product 5 is constantly rotating and revolving, which can ensure that the bristles 11 can fully and uniformly polish all the straight body positions 52 and the chamfers 51 of the circular product 5.
[0057] Optionally, as shown in Figure 11 and Figure 12 , the fixed seat 3 can include a base body 32 and a C-shaped groove plate 33, the C-shaped groove plate 33 is detachably arranged on the base body 32, and the rotating groove 31 is formed on the C-shaped groove plate 33. In this way, when the circular product 5 of different diameters needs to be polished, and when the groove wall of the rotating groove 31 is worn and deformed and needs to be replaced, the C-shaped groove plate 33 can be directly taken out and replaced, which is convenient to operate. Moreover, when the groove wall of the rotating groove 31 is worn and deformed and needs to be replaced, only the C-shaped groove plate 33 needs to be replaced, and the entire fixed seat 3 does not need to be replaced, which is beneficial to further reduce the manufacturing cost.
[0058] Optionally, in order to facilitate the rotation of the circular product 5 by the bristles 11 when the bristle disc 1 and the base disc 2 rotate in opposite directions, the rotating groove 31 is arranged to extend along a third axis intersecting the second axis, and the gaskets 4 and the circular products 5 to be polished are staggered and stacked along the third axis. In this way, the rotation of the bristle disc 1 and the revolution and rotation of the base disc 21 make each circular product 5 always rotate at a relatively uniform speed in the rotating groove 31, so that the bristles 11 can fully and uniformly process the straight body positions 52 and the chamfers 51 of the circular product 5.
[0059] Optionally, the material of the gasket 4 can be a hard non-metallic material such as nylon or plastic. The thickness of the gasket 4 is greater than or equal to 1.5 mm and less than or equal to 3.5 mm, and preferably the thickness of the gasket 4 is greater than or equal to 2 mm and less than or equal to 3 mm. The gasket with the thickness range can accommodate a relatively large number of circular products in the rotating groove 31, and can reduce the contact between adjacent two circular products 5 after the gasket 4 is worn.
[0060] Optionally, in order to ensure that the circular product 5 can rotate smoothly in the rotating groove 31, the spacing between the end wall of the rotating groove 31 along the axis of the gasket 4 and the gasket 4 is greater than or equal to 1.1 mm and less than or equal to 3.1 mm.
[0061] Optionally, as shown in Figure 9As shown, when the circular product 5 has a circular protrusion along its own axial direction, the gasket 4 has a hollowed part capable of being sleeved on the protrusion of the circular product 5 to be polished, so that the protrusion of the circular product 5 can be clamped in the hollowed part, thereby enabling the gasket 4 to have a better fixing and clamping effect on the circular product 5. The hollowed part can be a through hole or a blind hole. Specifically, as shown, Figure 13 As shown, the gasket 4 can be a circular ring gasket, so that the weight of the gasket 4 can be reduced, the rotation of the circular product 5 is smoother, the manufacturing cost of the gasket 4 is reduced, and the adaptability of the gasket 4 is better.
[0062] Optionally, the outer peripheral wall of the circular product 5 to be polished has a chamfer 51 and a straight body portion 52 connected to each other, as shown, Figure 9 and Figure 10 As shown, the outer peripheral wall of the circular product 5 includes the straight body portion 52, and the end face of one end of the circular product 5 is connected to the straight body portion 52 through the chamfer 51. The bristles 11 act on the chamfer 51 and the straight body portion 52, and the highest point of the gasket 4 is lower than the lowest point of the chamfer 51, so that the chamfer 51 can be processed. The difference between the highest point of the chamfer 51 and the lowest point of the chamfer 51 is a first difference, and the difference between the highest point of the chamfer 51 and the highest point of the gasket 4 is a second difference, the second difference is greater than the first difference and less than 15 times the first difference.
[0063] In this embodiment, the second difference is greater than the first difference and less than 15 times the first difference, which can ensure that the circular product 5 can be polished sufficiently to the straight body portion 52 and the chamfer 51 during processing, and can also avoid polishing collapse.
[0064] Optionally, since the diameter of the gasket 4 will become smaller after grinding, the second difference can be greater than or equal to 0.4 mm and less than or equal to 0.5 mm.
[0065] Optionally, the circular product 5 to be polished includes a flange table 53 connected to the chamfer 51, the gasket 4 includes a contact point 41 with the highest position in contact with the flange table 53, and the spacing S between any two adjacent contact points 41 is less than the maximum width of the bristles 11, so that the bristles 11 are not easy to insert into the gap between any two adjacent circular products 5 to be polished, thereby avoiding the problem of polishing collapse of the chamfer 51.
[0066] Optionally, the maximum width of the bristles 11 is greater than or equal to 2 mm and less than or equal to 4 mm. When the width of the bristles 11 is greater than or equal to 2 mm and less than or equal to 4 mm, the width of the bristles 11 is moderate, and the appearance of the processed circular product 5 can meet the relatively good requirements, and the roughness is within 40 nm. Therefore, the maximum width of the bristles 11 can be greater than or equal to 2 mm and less than or equal to 4 mm, preferably, the maximum width of the bristles 11 is greater than or equal to 2.5 mm and less than or equal to 3.5 mm, so that the polishing quality and processing cost of the product can be balanced.
[0067] Optionally, the material composition of the bristles 11 includes polyurethane and polyester.
[0068] In summary, the polishing device provided by the present application can rotate the brush disc and the polishing disc in opposite directions when polishing the circular product, so that the disc can also rotate by itself. The circular product is placed in the rotating groove and axially limited by the gasket. The circular product can rotate under the action of the bristles. Therefore, the bristles can uniformly polish multiple parts on the outer peripheral wall of the circular product at one time, without the need to polish each part on the outer peripheral wall of the circular product one by one, thereby reducing the processing procedure, shortening the processing period, increasing the production capacity, and saving labor, equipment and auxiliary material costs.
[0069] In the description of the present application, it should be understood that the terms "first", "second" are used only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise specifically limited.
[0070] In the present application, unless otherwise specifically defined and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected or in communication with each other; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise specifically limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.
[0071] In the description of the specification, the description using the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" etc. means that the particular feature, structure, material or characteristic being described is included in at least one embodiment or example of the present application. The illustrative appearances of the above-mentioned terms in various places in the specification are not necessarily referred to the same embodiment or example. Moreover, the particular features, structures, materials, or characteristics can be combined in any suitable manner in one or more embodiments or examples. Furthermore, the terms "comprise", "comprising", "include", "including", "contain", "containing" or variations thereof are used inclusively and do not exclude the additional inclusion of unrecited features, structures, materials, or characteristics. In addition, it is understood that the description of the present application is not intended to limit the application to the particular form and embodiment disclosed herein; the application extends as broadly as the claims below will allow.
[0072] Although the embodiments of the present application have been shown and described above, it is understood that the above-described embodiments are exemplary and are not to be taken as limiting the present application, and that within the scope of the present application, changes, modifications, replacements and variations of the above-described embodiments can be made by those skilled in the art.
Claims
1. A polishing apparatus characterized by comprising: The polishing device comprises: a bristle disc (1) provided with bristles (11) on a bottom end face; a bottom disc (2) located below the bristle disc (1), the bottom disc (2) rotates around a first axis with at least one of the bristle disc (1), the bottom disc (2) is provided with a plurality of download discs (21) that rotate around a second axis, the first axis and the second axis are parallel and arranged at intervals; a fixed seat (3) located above the download disc (21) and rotates synchronously with the download disc (21), the fixed seat (3) is provided with a rotating groove (31) with an opening facing upward, the extension direction of the rotating groove (31) is the radial direction corresponding to the download disc (21).
2. The polishing apparatus according to claim 1, wherein The polishing device further comprises a tooth plate (6) fixed on the download disc (21) and provided with a fixed cavity (61), the fixed seat (3) is arranged in the fixed cavity (61); And / or, the fixed seat (3) comprises a base body (32) and a C-shaped groove plate (33), the C-shaped groove plate (33) is detachably arranged on the base body (32), the rotating groove (31) is formed on the C-shaped groove plate (33); And / or, the cross section of the groove bottom wall of the rotating groove (31) is a circular arc shape matched with the outer contour of the circular product (5) to be polished.
3. The polishing apparatus according to claim 1, wherein The polishing device further comprises a plurality of spacers (4), a plurality of the spacers (4) and a plurality of circular products (5) to be polished are staggered and stacked along the extension direction of the rotating groove (31), the spacer (4) and the circular product (5) to be polished are placed in the rotating groove (31) and can rotate around the axis.
4. The polishing apparatus according to claim 3, wherein The depth of the rotating groove (31) is greater than the radius of the spacer (4); And / or, the thickness of the spacer (4) is greater than or equal to 2mm and less than or equal to 3mm; And / or, the spacer (4) has a hollow part sleeved on the protruding part of the circular product (5) to be polished; And / or, the spacer (4) is a circular ring gasket.
5. The polishing apparatus according to any one of claims 3 or 4, wherein The outer peripheral wall of the circular product (5) to be polished has a chamfer (51) and a straight body position (52) connected to each other, the bristles (11) act on the chamfer (51) and the straight body position (52), the highest point of the spacer (4) is lower than the lowest point of the chamfer (51), the difference between the highest point of the chamfer (51) and the lowest point of the chamfer (51) is a first difference, the difference between the highest point of the chamfer (51) and the highest point of the spacer (4) is a second difference, the second difference is greater than the first difference and less than 15 times the first difference.
6. The polishing apparatus according to claim 5, wherein The second difference is greater than or equal to 0.4mm and less than or equal to 0.5mm.
7. The polishing apparatus according to claim 5, wherein The circular product (5) to be polished comprises a flange table (53) connected to the chamfer (51), the spacer (4) comprises a contact point (41) with the highest position in contact with the flange table (53), the distance between any two adjacent contact points (41) is S, and the S is less than the maximum width of the bristle (11).
8. The polishing apparatus according to claim 1, wherein The maximum width of the bristle (11) is greater than or equal to 2mm and less than or equal to 4mm.
9. The polishing apparatus according to claim 8, wherein The maximum width of the bristles (11) is greater than or equal to 2.5 mm and less than or equal to 3.5 mm.
10. The polishing apparatus according to claim 3, wherein The spacing between the end wall along the axis of the gasket (4) and the gasket (4) of the rotation groove (31) is greater than or equal to 1.1 mm and less than or equal to 3.1 mm.