Self-cleaning structure of ionization bin

Abstract

The utility model relates to a self-cleaning structure of an ionization chamber, which can enable an ultraviolet light generating interface to be close to or far away from a preset ionization working interface and a preset cleaning interface through a first movement mechanism. The first movement mechanism automatically drives the ultraviolet light generator to enable the ultraviolet light generation interface to move from the preset ionization working interface to the preset cleaning interface, and the second movement mechanism can automatically control the wiping component to swing along the preset cleaning interface in the swing space to wipe and clean the ultraviolet light generation interface. After cleaning, the second movement mechanism swings the wiping component out of the swing space, and the first movement mechanism moves the ultraviolet light generation interface back to the preset ionization working interface; therefore, the high-energy ultraviolet light generated by the light source of the ultraviolet light generation interface can be kept irradiating the gas in the ionization chamber, and the service life is prolonged.

Description

TECHNICAL FIELD

[0001] The utility model relates to ionization bin cleaning technical field, especially relate to a self -cleaning structure of ionization bin. BACKGROUND

[0002] In the working process of PID sensor, with the lapse of time, the interface of ultraviolet light generator is easy to accumulate pollution material mainly with organic matter, the light transmission of interface ultraviolet light is affected, the high-energy ultraviolet light generated by light source is difficult to pass through the organic matter accumulation layer and irradiate to the gas in ionization bin, the ionization effect is attenuated, the sensitivity is reduced, the monitoring data baseline appears drift, and the data consistency is difficult to keep. SUMMARY

[0003] The utility model discloses to overcome the interface of ultraviolet light generator in prior art is easy to accumulate pollution material mainly with organic matter, the high-energy ultraviolet light generated by light source is difficult to pass through the organic matter accumulation layer and irradiate to the gas in ionization bin, the ionization effect is attenuated, the sensitivity is reduced, the monitoring data baseline appears drift, and the data consistency is difficult to keep the insufficient, provide a self -cleaning structure of ionization bin.

[0004] The utility model provides a self -cleaning structure of ionization bin, including first movement mechanism, second movement mechanism and wiping member,

[0005] The first movement mechanism is used for connecting ultraviolet light generator, the ultraviolet light generator has ultraviolet light generator interface, the first movement mechanism can automatically drive the ultraviolet light generator so that the ultraviolet light generator interface moves between the preset ionization working interface and the preset cleaning interface, and the preset ionization working interface and the preset cleaning interface have the swing space of the wiping member;When the ultraviolet light generator interface is in the preset ionization working interface, the ultraviolet light generator interface can emit ultraviolet light into ionization bin.

[0006] The second movement mechanism is connected with the wiping member, and the wiping member is used for wiping one side of the ultraviolet light generator interface and coinciding with the preset cleaning interface, and the second movement mechanism can automatically control the wiping member to swing along the preset cleaning interface between the preset ionization working interface and the preset cleaning interface of the ultraviolet light generator interface.

[0007] In the scheme, the first movement mechanism can automatically drive the ultraviolet light generator to move the ultraviolet light generation interface between the preset ionization working interface and the preset cleaning interface, that is, the first movement mechanism drives the ultraviolet light generator to move, so that the ultraviolet light generation interface is close to or away from the preset ionization working interface and the preset cleaning interface between the preset ionization working interface and the preset cleaning interface. When the ultraviolet light generation interface moves to the preset ionization working interface, the ultraviolet light generation interface can emit ultraviolet light into the ionization chamber, that is, in the ionization working state, when it is necessary to clean the surface of the ultraviolet light generation interface, the first movement mechanism automatically drives the ultraviolet light generator to move the ultraviolet light generation interface to the preset cleaning interface. At this time, the preset ionization working interface and the ultraviolet light generation interface have the swing space of the wiping member, and the second movement mechanism can automatically control the wiping member to swing in the swing space along the preset cleaning interface. The wiping member is used to wipe one side of the ultraviolet light generation interface coinciding with the preset cleaning interface to clean the ultraviolet light generation interface, reduce the accumulated pollutants on the ultraviolet light generation interface, and after cleaning, the second movement mechanism swings the wiping member out of the swing space, so that the ultraviolet light generation interface can be moved back to the preset ionization working interface by the first movement mechanism. In turn, the high-energy ultraviolet light generated by the light source can irradiate the gas in the ionization chamber, so that the ionization effect is reduced, the sensitivity is ensured, the possibility of baseline drift of monitoring data is reduced, the data consistency is maintained, and the service life is improved.

[0008] Preferably, the first movement mechanism comprises a first motor and a connecting rod mechanism, the connecting rod mechanism connecting a rotating shaft of the first motor and the ultraviolet light generator.

[0009] The second movement mechanism comprises a second motor and a swing rod, the swing rod connecting a rotating shaft of the second motor and the wiping member.

[0010] The motor and the connecting rod mechanism are adopted for control, and the control precision is high.

[0011] Preferably, the ultraviolet light generator is hinged to the base plate through an ultraviolet mounting hinge shaft, the base plate has a through hole, and the through hole is aligned with the ionization chamber.

[0012] The ultraviolet light generator can be installed on the preset ionization working interface by extending into the through hole, and the ultraviolet light generation interface emits ultraviolet light into the ionization chamber.

[0013] Alternatively, the ultraviolet light generation interface and the ionization chamber are located on both sides of the through hole, and the ultraviolet light generation interface can emit ultraviolet light into the ionization chamber through the through hole.

[0014] The first motion mechanism automatically drives the ultraviolet light generator to rotate. Under the constraint of the ultraviolet mounting hinge, the movement trajectory of the ultraviolet light generator can be guaranteed. This facilitates the control of the ultraviolet light generation interface of the ultraviolet light generator between the preset ionization working interface and the preset cleaning interface, which is convenient for positioning and ensures positioning accuracy.

[0015] Preferably, the ultraviolet light generator includes an ultraviolet lamp and an ultraviolet mounting cover, wherein the ultraviolet lamp is embedded in the ultraviolet mounting cover, and the ultraviolet mounting cover is hinged to the substrate via the ultraviolet mounting hinge.

[0016] The ultraviolet light generating interface is located on the ultraviolet lamp, and the ultraviolet lamp can extend into the through hole and be installed on the preset ionization working interface. The ultraviolet light generating interface emits ultraviolet light into the ionization chamber.

[0017] Alternatively, the ultraviolet light generating interface and the ionization chamber are located on opposite sides of the through hole, and the ultraviolet light generating interface can emit ultraviolet light through the through hole into the ionization chamber.

[0018] The ultraviolet lamp is embedded in the ultraviolet mounting cover, which facilitates the hinged installation of the ultraviolet light generator on the substrate.

[0019] Preferably, the substrate is a main PCB board, which is used to electrically connect the ionization chamber.

[0020] The substrate is mainly a PCB board, which facilitates the setting of self-cleaning structures for the ionization chamber, ionization chamber and other structures.

[0021] Preferably, the main PCB board is further provided with a main control board, which is used to control the first motor and the second motor, and can realize automatic control of cleaning.

[0022] Preferably, both the first motor and the second motor are fixed to the main PCB board via a support base. The shaft of the second motor is perpendicular to the main PCB board, and the shaft of the first motor is parallel to the main PCB board. The shaft of the first motor is parallel to the axis of the ultraviolet mounting hinge, and the ultraviolet light generator is located between the first motor and the main PCB board.

[0023] The above-mentioned positional and connection relationships result in a compact structure.

[0024] Preferably, one side of the wiping member is disposed on the substrate, and the substrate has a swing limiting frame for the wiping member.

[0025] By using the base plate and the swing limiting frame on the base plate to limit the swing of the wiping component, the stability and safety of the operation can be guaranteed.

[0026] Preferably, the side of the wiping member used to wipe the ultraviolet light generating interface is matched with the ultraviolet light generating interface, so as to achieve a better wiping effect.

[0027] Preferably, it is located inside the sensor.

[0028] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0029] This invention provides a self-cleaning structure for an ionization chamber. A first motion mechanism allows the ultraviolet (UV) light-generating interface to move closer to or further away from a preset ionization working interface and a preset cleaning interface. When the UV light-generating interface moves to the preset ionization working interface, it emits UV light into the ionization chamber, thus entering an ionization working state. When cleaning of the UV light-generating interface surface is required, the first motion mechanism automatically drives the UV light generator, causing the UV light-generating interface to move to the preset cleaning interface. At this time, there is a swing space between the preset ionization working interface and the UV light-generating interface for the wiping component. The second motion mechanism can automatically control... The wiping component swings along the preset cleaning interface in the swing space. The side of the wiping component used to wipe the ultraviolet light generating interface coincides with the preset cleaning interface, wiping and cleaning the ultraviolet light generating interface to reduce the accumulation of pollutants on the ultraviolet light generating interface. After cleaning, the second motion mechanism swings the wiping component outside the swing space, so that the ultraviolet light generating interface can be moved back to the preset ionization working interface by the first motion mechanism. This ensures that the high-energy ultraviolet light generated by the light source of the ultraviolet light generating interface can continue to irradiate the gas in the ionization chamber, reducing the attenuation of the ionization effect, ensuring sensitivity, reducing the possibility of baseline drift in monitoring data, maintaining data consistency, and thus improving service life. Attached Figure Description

[0030] Figure 1 This is a schematic diagram showing the relationship between the self-cleaning mechanism and the ionization chamber.

[0031] Figure 2 Schematic diagram of the self-cleaning mechanism of the ionization chamber Figure One ;

[0032] Figure 3 Schematic diagram of the self-cleaning mechanism of the ionization chamber Figure Two ;

[0033] Figure 4 Schematic diagram of the self-cleaning mechanism of the ionization chamber Figure One ;

[0034] Figure 5 Schematic diagram of the self-cleaning mechanism of the ionization chamber Figure Two ;

[0035] Figure 6 Schematic diagram of the self-cleaning mechanism of the ionization chamber Figure Three ;

[0036] Figure 7 This is a schematic diagram of the self-cleaning mechanism of the ionization chamber. Figure Four .

[0037] Figure 8 This is a front view of the ionization chamber installation.

[0038] Figure 9 for Figure Eight Sectional view at point AA;

[0039] Figure 10 This is a schematic diagram of the ionization chamber setup.

[0040] The diagram shows the following markings: 1. Ionization chamber; 11. Ionization chamber sidewall; 12. Ionization chamber interior space; 13. Inner needle; 111. First hole; 112. Second hole; 21. First air passage; 22. Second air passage; 3. Ultraviolet light generator; 31. Ultraviolet lamp; 311. Ultraviolet light generation interface; 32. Ultraviolet mounting cover; 33. Ultraviolet mounting hinge; 4. Sensor; 421. Main PCB board; 422. First PCB board; 423. Second PCB board; 424. First electrical connection post; 425. Second electrical connection post; 426. Sealing structure; 427. Main control board; 428. Support base; 429. Swing limiting frame; 51. First motor; 52. Second motor; 53. Linkage mechanism; 54. Swing rod; 55. Wiping component. Detailed Implementation

[0041] The present invention will be further described in detail below with reference to specific embodiments. However, it should not be construed as limiting the scope of the present invention to the following embodiments; all technologies implemented based on the content of the present invention fall within the scope of the present invention.

[0042] Unless otherwise specified, the use of terms such as "upper," "lower," "left," "right," "center," "inner," and "outer" to indicate orientation or positional relationships in the description of specific embodiments of this utility model is based on the orientation or positional relationships shown in the accompanying drawings, or the orientation or positional relationship in which the utility model product / equipment / device is typically placed during use. These terms are merely for the purpose of facilitating the description of the utility model solution or simplifying the description in specific embodiments, enabling those skilled in the art to quickly understand the solution, and do not indicate or imply that a specific device / component / element must have a specific orientation, or be constructed and operated in a specific positional relationship. Therefore, they should not be construed as limitations on this utility model.

[0043] Furthermore, the use of terms such as "horizontal," "vertical," "suspended," and "parallel" does not imply that the corresponding device / component / element must be absolutely horizontal, vertical, suspended, or parallel, but rather that it can be slightly tilted or have a deviation. For example, "horizontal" merely means that its direction is more horizontal relative to "vertical," not that the structure must be completely horizontal, but can be slightly tilted. Alternatively, it can be simplified to mean that the corresponding device / component / element, when set in a "horizontal," "vertical," "suspended," or "parallel" direction, can have an error / deviation of ±10% relative to the corresponding direction, more preferably within ±8%, more preferably within ±6%, more preferably within ±5%, and more preferably within ±4%. As long as the corresponding device / component / element is within the error / deviation range, it can still achieve its function in the present invention.

[0044] Furthermore, the use of terms such as "first," "second," and "third" in terminology is merely for distinguishing descriptions of identical or similar components and should not be interpreted as emphasizing or implying the relative importance of a particular component.

[0045] Furthermore, in the description of the embodiments of this utility model, "several", "multiple", and "several" represent at least two. The number can be any number, such as two, three, four, five, six, seven, eight, or nine, and can even exceed nine.

[0046] Furthermore, in the description of the technical solution of this utility model, unless otherwise explicitly specified / limited / restricted, the terms "set up," "install," "connect," "link," "equipped with," "laid out," and "arranged" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to common connection methods in the art, such as welding, riveting, bolting, and threaded connections. Such connections can be mechanical, electrical, or communication connections; they can be direct connections or indirect connections through an intermediate medium; and they can refer to the internal communication between two components.

[0047] Example 1

[0048] like Figures 1-7 As shown, a self-cleaning structure for an ionization chamber includes a first motion mechanism, a second motion mechanism, and a wiping component 55;

[0049] The first motion mechanism is used to connect the ultraviolet light generator 3. The ultraviolet light generator 3 has an ultraviolet light generating interface 311. The first motion mechanism can automatically drive the ultraviolet light generator 3 so that the ultraviolet light generating interface 311 moves between a preset ionization working interface and a preset cleaning interface. There is a swing space for the wiping member 55 between the preset ionization working interface and the preset cleaning interface. When the ultraviolet light generating interface 311 is at the preset ionization working interface, the ultraviolet light generating interface 311 can emit ultraviolet light into the ionization chamber 1.

[0050] The second motion mechanism is connected to the wiping member 55, which is used to wipe one side of the ultraviolet light generating interface 311 and overlap with the preset cleaning interface. The second motion mechanism can automatically control the wiping member 55 to swing along the preset cleaning interface between the preset ionization working interface and the preset cleaning interface of the ultraviolet light generating interface 311.

[0051] In this embodiment, the preset ionization working interface is the working interface of the ultraviolet light generating interface 311 of the ultraviolet light generator 3. Specifically, when the ionization chamber 1 is ionized, the gas inside the ionization chamber needs to be irradiated by the ultraviolet light emitted by the ultraviolet light generating interface 311. After the ultraviolet light generator 3 and the ionization chamber 1 are installed, their relative positions ensure that the ultraviolet light emitted by the ultraviolet light generating interface 311 irradiates the gas inside the ionization chamber, meeting the ionization requirements. The ultraviolet light generating interface 311 at this installation position is the preset ionization working interface. When the ultraviolet light generating interface 311 becomes contaminated and needs cleaning, or when cleaning of the ultraviolet light generating interface 311 is scheduled for a certain period of time, the ultraviolet light generating interface 311 is moved to the preset cleaning interface for cleaning. The preset cleaning interface and the preset ionization working interface are two interfaces for the operation and cleaning of the ultraviolet light generating interface 311, formed according to the structural design. If the preset cleaning interface and the preset ionization working interface are two parallel surfaces at different heights, then the ultraviolet light generating interface 311 needs to be raised and lowered; or if the preset cleaning interface and the preset ionization working interface are two intersecting surfaces, then rotation is required. Therefore, the first motion mechanism can select the motion mode based on the preset cleaning interface and the preset ionization working interface, and then select the transmission mechanism.

[0052] In this solution, the first motion mechanism can automatically drive the ultraviolet light generator 3 to move the ultraviolet light generating interface 311 between a preset ionization working interface and a preset cleaning interface. That is, the first motion mechanism drives the ultraviolet light generator 3 to move, causing the ultraviolet light generating interface 311 to move closer to or further away from the preset ionization working interface and the preset cleaning interface. When the ultraviolet light generating interface 311 moves to the preset ionization working interface, it can emit ultraviolet light into the ionization chamber, i.e., it is in an ionization working state. When it is necessary to clean the surface of the ultraviolet light generating interface 311, the first motion mechanism automatically drives the ultraviolet light generator 3 to move the ultraviolet light generating interface 311 to the preset cleaning interface. Figures 4-7 As shown, at this time, there is a swing space for the wiping member 55 between the preset ionization working interface and the ultraviolet light generating interface 311, and the second motion mechanism can automatically control the wiping member 55 to swing along the preset cleaning interface in the swing space, such as... Figures 4-7 As shown, the wiping component 55 is used to wipe one side of the ultraviolet light generating interface 311, which overlaps with the preset cleaning interface. This wipes and cleans the ultraviolet light generating interface 311, reducing the accumulation of pollutants on the interface. After cleaning, the second motion mechanism swings the wiping component 55 outside the swing space. Figure Three As shown, this allows the ultraviolet light generating interface 311 to be moved back to the preset ionization working interface via the first motion mechanism, as... Figure Two As shown, this ensures that the high-energy ultraviolet light generated by the light source can continue to irradiate the gas in the ionization chamber, thereby reducing the attenuation of the ionization effect, ensuring sensitivity, reducing the possibility of baseline drift in monitoring data, maintaining data consistency, and thus improving service life.

[0053] Optional, such as Figure One and Figure Two As shown, the first motion mechanism includes a first motor 51 and a linkage mechanism 53, wherein the linkage mechanism 53 connects the rotating shaft of the first motor 51 and the ultraviolet light generator 3;

[0054] The second motion mechanism includes a second motor 52 and a swing arm 54, the swing arm 54 connecting the rotating shaft of the second motor 52 and the wiping member 55. Both the first and second motion mechanisms are controlled by motors and linkage mechanisms, resulting in high control precision.

[0055] Optionally, the first motor 51 and the second motor 52 are servo motors.

[0056] Optional, such as Figures 3-4 As shown, the ultraviolet light generator 3 is hinged to the substrate via an ultraviolet mounting hinge 33. The substrate has a through hole, which is aligned with the ionization chamber.

[0057] The ultraviolet light generator 3 can extend into the through hole and be installed on the preset ionization working interface. The ultraviolet light generating interface 311 emits ultraviolet light into the ionization chamber. The structure of the ultraviolet light generator 3 can be selected, such as using an ultraviolet lamp 31 and an ultraviolet mounting cover 32. The ultraviolet lamp 31 is embedded in the ultraviolet mounting cover 32, and the ultraviolet mounting cover 32 is hinged to the substrate through the ultraviolet mounting hinge 33. The ultraviolet light generating interface 311 is located on the ultraviolet lamp 31, so that the ultraviolet lamp 31 can extend into the through hole and be installed on the preset ionization working interface. The ultraviolet light generating interface 311 emits ultraviolet light into the ionization chamber, while ensuring that the ultraviolet mounting cover 32 is outside the ultraviolet lamp 31 and does not pass through the through hole.

[0058] Alternatively, the ultraviolet light generating interface 311 and the ionization chamber are located on opposite sides of the through hole. The ultraviolet light generating interface 311 can emit ultraviolet light through the through hole and enter the ionization chamber. In this way, the ultraviolet light generator 3 can also be an ultraviolet lamp 31 embedded in an ultraviolet mounting cover 32. Embedding the ultraviolet lamp 31 in the ultraviolet mounting cover 32 facilitates the hinged installation of the ultraviolet light generator 3 on the substrate and can protect the ultraviolet lamp 31.

[0059] In the above configuration, the first motion mechanism automatically drives the ultraviolet light generator 3 to rotate. Under the constraint of the ultraviolet mounting hinge 33, the motion trajectory of the ultraviolet light generator 3 can be guaranteed, which makes it easy to control the ultraviolet light generation interface 311 of the ultraviolet light generator 3 to move back and forth between the preset ionization working interface and the preset cleaning interface, which facilitates positioning and ensures positioning accuracy.

[0060] In this application, the substrate may be a board used only for mounting. Further, the substrate is a main PCB board 421, which is used to electrically connect the ionization chamber. The substrate, being a main PCB board 421, facilitates the setting of structures such as the self-cleaning structure and the ionization chamber itself, serving both as a mounting component and an electrical connection structure.

[0061] Furthermore, the main PCB board 421 is also provided with a main control board 427, which is used to control the first motor 51 and the second motor 52, and can realize automatic control of cleaning.

[0062] like Figures 2-7As shown, both the first motor 51 and the second motor 52 are fixed to the main PCB board 421 via a support base 428. The rotation shaft of the second motor 52 is perpendicular to the main PCB board 421, enabling rotation in a plane. The rotation shaft of the first motor 51 is parallel to the main PCB board 421, enabling rotation in a vertical plane. The rotation shaft of the first motor 51 is parallel to the axis of the ultraviolet mounting hinge shaft 33, making the linkage mechanism 53 for controlling the rotation of the ultraviolet light generator 3 by the first motor 51 simpler and enabling rotational control on the same vertical plane. Figure Two As shown, the linkage mechanism 53 includes a first link and a second link. One end of the first link is hinged to one end of the second link, and the other end of the first link is fixedly connected to a first motor 51. The first motor 51's shaft rotates, causing the first link to rotate. The other end of the second link is fixedly connected to an ultraviolet (UV) light generator 3. During the rotation of the first link, the second link and the UV light generator 3 are pulled to rotate as a whole, thereby changing the position of the UV light generating interface 311. The UV light generator 3 is located between the first motor 51 and the main PCB board 421, which reduces the length of the link, making the structure compact and facilitating control of the rotation of the UV light generating interface 311.

[0063] Optional, such as Figures 2-5 As shown, one side of the wiping member 55 is disposed on the substrate, and the substrate has a swing limiting frame 429 for the wiping member 55. By limiting the swing of the wiping member 55 through the substrate and the swing limiting frame 429 on the substrate, the stability and safety of the operation can be guaranteed.

[0064] Optionally, the wiping member 55 is used to wipe one side of the ultraviolet light generating interface 311, which matches the ultraviolet light generating interface 311, so that the wiping effect is better.

[0065] like Figures 1-10 As shown, the self-cleaning structure of the ionization chamber in this embodiment is disposed within the sensor 4, corresponding to the ionization chamber. The ionization chamber 1 is disposed on one side of the main PCB board 421, and the self-cleaning structure of the ionization chamber is disposed on the other side of the main PCB board 421. For example, the ionization chamber 1 has an ionization chamber sidewall 11, an ionization chamber internal space 12, an ionization chamber gas inlet, and an ionization chamber gas outlet. The inner cross-section of the ionization chamber sidewall is circular. The ionization chamber gas inlet and the ionization chamber gas outlet are respectively the first hole 111 and the second hole 112 on opposite sides of the ionization chamber sidewall. The ionization chamber internal space 12 is located within the ionization chamber sidewall 11. The ionization chamber 1 also includes an inner needle 13, which is disposed in the radial center of the ionization chamber internal space 12. The inner needle 13 and the ionization chamber sidewall 11 form a high-low potential. Figure TenAs shown, the ionization chamber gas inlet is used to connect the first gas channel 21 and the ionization chamber internal space 12, and the ionization chamber gas outlet is used to connect the second gas channel 22 and the ionization chamber internal space 12, so that the ionization chamber 1 is connected to the first gas channel 21 and the second gas channel 22.

[0066] The ionization chamber space 12 is used to generate ionization. The gas entering the ionization chamber space 12 through the first gas passage 21 can be ionized. Ionization can be achieved by ultraviolet light irradiation, such as by setting an ultraviolet light generator 3. The ultraviolet light generator 3 can emit ultraviolet light into the ionization chamber space 12, so that the gas can be ionized in the ionization chamber space 12. At the same time, the positively charged ions after ionization adhere to the low potential component under the influence of the high and low potentials in the ionization chamber space 12, which is used for subsequent detection and judgment.

[0067] like Figures 8-9 As shown, the upper end of the ionization chamber sidewall 11 is embedded in the mounting hole of the first PCB board 422, and the ionization chamber sidewall 11 is electrically connected to the first PCB board 422. The lower end of the ionization chamber sidewall 11 is embedded in the mounting groove of the second PCB board 423. The ionization chamber sidewall 11 and the second PCB board 423 are insulated. The inner needle 13 is located at the axis of the ionization chamber internal space 12 inside the ionization chamber sidewall 11, and its lower end passes through the fourth hole of the ionization chamber sidewall 11 and is fixed on the second PCB board 423, forming an electrical connection with the second PCB board 423. The second PCB board 423 seals the fourth hole. The main PCB board 421 is located above the first PCB board 422. The first PCB board 422 and the second PCB board 423 are connected on both sides by the first electrical connection post 424 and the second electrical connection post 425 to form a whole. The first electrical connection post 424 and the second electrical connection post 425 extend to the main PCB board 421. The first electrical connection post 424 electrically connects the first PCB board 422 and the main PCB board 421, and the second electrical connection post 425 electrically connects the second PCB board 423 and the main PCB board 421, so that a potential difference is formed between the side wall 11 of the ionization chamber and the inner needle 13 on the inner side. The main PCB board 421 has mounting holes that allow the ultraviolet lamp 31 of the ultraviolet light generator 3 to pass through, so that the ultraviolet light generating interface of the ultraviolet lamp 31 can be aligned with the third hole at the upper end of the side wall 11 of the ionization chamber. A sealing structure 426 is provided on the outer side of the connection between the ultraviolet lamp 31 and the first PCB board 422 facing the main PCB board 421. The sealing structure 426 is used to seal the contact position between the ultraviolet light generating interface 311 of the ultraviolet light generator 3 and the side wall 11 of the ionization chamber, so as to prevent the detection gas from escaping from the space 12 inside the ionization chamber. The sealing structure 426 can be a sealing ring or sealing ring, etc.

[0068] like Figure OneAs shown, the ionization chamber is located on the underside of the main PCB board 421, and the self-cleaning mechanism of the ionization chamber is also located on the underside of the main PCB board 421. Regarding the self-cleaning mechanism of the ionization chamber, as follows... Figures 4-7 Its first motion mechanism includes a first motor 51 and a linkage mechanism 53. The first motor 51 is mounted on the main PCB board 421. The linkage mechanism 53 connects the ultraviolet light generator 3 and the rotating shaft of the first motor 51. The rotation of the first motor 51 drives the linkage mechanism 53 to rotate, thereby driving the ultraviolet light generator 3 to move away from or near the side wall 11 of the ionization chamber. The ultraviolet (UV) light generator 3 moves away from or near the ionization chamber sidewall 11 by rotation. The UV light generator 3 includes a UV lamp 31 and a UV mounting cover 32. The UV lamp 31 is embedded in the UV mounting cover 32. One side of the UV mounting cover 32 is hinged to the main PCB board 421 via a UV mounting hinge 33. The first motor 51 rotates, driving the linkage mechanism 53 to rotate, which in turn drives the UV light generator 3 to rotate along the UV mounting hinge 33, so that the UV light generator 3 moves away from or near the ionization chamber sidewall 11, that is, it moves between the preset ionization working interface and the preset cleaning interface. This control method can ensure the consistency of the movement of the UV light generator 3 away from or near the ionization chamber sidewall 11, and thus ensure that the UV light generation interface 311 of the UV light generator 3 can be installed in place after cleaning, aligned with the third hole, and can ensure sealing.

[0069] The second motion mechanism includes a second motor 52, a swing arm 54, and a wiping component 55. The second motor 52 is mounted on the main PCB board 421. The swing arm 54 connects the rotating shaft of the second motor 52 and the wiping component 55. After the first motion mechanism controls the ultraviolet light generator 3 to move away from the side wall 11 of the ionization chamber, the second motor 52 controls the swing arm 54 and the wiping component 55 to swing back and forth, wiping the ultraviolet light generating interface 311 of the ultraviolet light generator 3. The side of the wiping component 55 that wipes the ultraviolet light generating interface 311 is adapted to the shape of the ultraviolet light generating interface 311 after rotation, thereby ensuring the cleanliness and safety of wiping and avoiding damage to the ultraviolet light generating interface 311. By setting the ionization chamber 1 in the necessary path of the air duct, a cleaning mechanism is provided to simultaneously achieve the two goals of maintaining the cleaning performance of the components inside the ionization chamber and ensuring sufficient air intake and high sensitivity and accuracy of the ionization chamber.

[0070] The self-cleaning mechanism of the ionization chamber provided in this embodiment adopts a precise micro-motion mechanical structure and uses physical wiping to periodically clean the ultraviolet light generation interface of the ultraviolet lamp. It has the advantages of low energy consumption, high motion consistency, and good cleaning effect, and can also improve the service life of the sensor and reduce the replacement frequency of the sensor.

[0071] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A self-cleaning structure for an ionization chamber, characterized in that, It includes a first motion mechanism, a second motion mechanism, and a wiping component (55); The first motion mechanism is used to connect the ultraviolet light generator (3), the ultraviolet light generator (3) has an ultraviolet light generating interface (311), the first motion mechanism can automatically drive the ultraviolet light generator (3) so that the ultraviolet light generating interface (311) moves between a preset ionization working interface and a preset cleaning interface, and there is a swing space for the wiping member (55) between the preset ionization working interface and the preset cleaning interface. When the ultraviolet light generating interface (311) is at the preset ionization working interface, the ultraviolet light generating interface (311) can emit ultraviolet light into the ionization chamber (1); The second motion mechanism is connected to the wiping member (55), which is used to wipe one side of the ultraviolet light generating interface (311) and overlap with the preset cleaning interface. The second motion mechanism can automatically control the wiping member (55) to swing along the preset cleaning interface between the preset ionization working interface and the preset cleaning interface of the ultraviolet light generating interface (311).

2. The self-cleaning structure of an ionization chamber according to claim 1, characterized in that, The first motion mechanism includes a first motor (51) and a linkage mechanism (53), wherein the linkage mechanism (53) connects the rotating shaft of the first motor (51) and the ultraviolet light generator (3); The second motion mechanism includes a second motor (52) and a swing arm (54), the swing arm (54) connecting the shaft of the second motor (52) and the wiping member (55).

3. The self-cleaning structure of an ionization chamber according to claim 2, characterized in that, The ultraviolet light generator (3) is hinged to the substrate via an ultraviolet mounting hinge (33), the substrate having a through hole aligned with the ionization chamber (1); The ultraviolet light generator (3) can extend into the through hole and be installed on the preset ionization working interface. The ultraviolet light generating interface (311) emits ultraviolet light into the ionization chamber (1). Alternatively, the ultraviolet light generating interface (311) and the ionization chamber (1) are located on both sides of the through hole, and the ultraviolet light generating interface (311) can emit ultraviolet light through the through hole and enter the ionization chamber (1).

4. The self-cleaning structure of an ionization chamber according to claim 3, characterized in that, The ultraviolet light generator (3) includes an ultraviolet lamp (31) and an ultraviolet mounting cover (32). The ultraviolet lamp (31) is embedded in the ultraviolet mounting cover (32), and the ultraviolet mounting cover (32) is hinged to the substrate through the ultraviolet mounting hinge (33). The ultraviolet light generating interface (311) is located on the ultraviolet lamp (31). The ultraviolet lamp (31) can extend into the through hole and be installed on the preset ionization working interface. The ultraviolet light generating interface (311) emits ultraviolet light into the ionization chamber (1). Alternatively, the ultraviolet light generating interface (311) and the ionization chamber (1) are located on both sides of the through hole, and the ultraviolet light generating interface (311) can emit ultraviolet light through the through hole and enter the ionization chamber (1).

5. The self-cleaning structure of an ionization chamber according to claim 3, characterized in that, The substrate is a main PCB board (421), which is used to electrically connect the ionization chamber (1).

6. The self-cleaning structure of an ionization chamber according to claim 5, characterized in that, The main PCB board (421) is also provided with a main control board (427), which is used to control the first motor (51) and the second motor (52).

7. The self-cleaning structure of an ionization chamber according to claim 6, characterized in that, The first motor (51) and the second motor (52) are both fixed to the main PCB board (421) by a support base (428). The rotating shaft of the second motor (52) is perpendicular to the main PCB board (421), and the rotating shaft of the first motor (51) is parallel to the main PCB board (421). The rotating shaft of the first motor (51) is parallel to the axis of the ultraviolet mounting hinge (33). The ultraviolet light generator (3) is located between the first motor (51) and the main PCB board (421).

8. The self-cleaning structure of an ionization chamber according to claim 7, characterized in that, One side of the wiping member (55) is disposed on the substrate, and the substrate has a swing limiting frame (429) for the wiping member (55).

9. A self-cleaning structure for an ionization chamber according to any one of claims 1-8, characterized in that, The wiping member (55) is used to wipe one side of the ultraviolet light generating interface (311) and matches the ultraviolet light generating interface (311).

10. A self-cleaning structure for an ionization chamber according to any one of claims 1-8, characterized in that, It is installed inside the sensor (4).

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