Vacuum drying tank and vacuum drying system with same

Abstract

The utility model discloses a vacuum drying tank and a vacuum drying system with the vacuum drying tank. The vacuum drying tank comprises a tank body with an opening in the upper portion, a tank cover arranged above the tank body and capable of turning over relative to the tank body and a turning-over mechanism driving the tank cover to turn over relative to the tank body. A heating device for drying the silicon wafer carrier flower basket is arranged in the tank body, and the tank body is provided with an air inlet interface and an air exhaust interface which are communicated with an inner cavity of the tank body; the turnover mechanism is arranged on the tank body, connected with the tank cover and used for controlling opening and closing of the tank cover. The vacuum drying device has the advantages of being good in sealing performance, small in occupied space, long in service life and capable of creating a vacuum environment to dry materials, preventing other metal ions in air from contaminating the materials and meeting requirements of follow-up production processes.

Description

Technical Field

[0001] This application belongs to the field of vacuum drying technology, specifically relating to a vacuum drying tank and a vacuum drying system having the vacuum drying tank, particularly a vacuum drying tank for drying solar cells and a vacuum drying system having the vacuum drying tank. Background Technology

[0002] In the production process of solar cells, the cleaned cells need to be dried in drying equipment. Currently, most drying equipment for cell cleaning uses a trough structure. For example, Chinese Patent 201210486028.1 discloses a vacuum drying trough for solar photovoltaic cleaning equipment. This application uses a horizontally moving reciprocating mechanism to drive the trough cover to move horizontally back and forth to open and close the cover. However, this opening and closing method leads to the following problems: First, it increases the horizontal dimensions of the entire machine, increasing the machine's footprint, factory construction costs, and secondary equipment costs; Second, during the continuous opening, closing, and horizontal movement of the trough cover, due to inertia, the repeatability of the cover's positioning is difficult to control, easily resulting in repeatability positioning errors. That is, the position where the trough cover stops each time is incorrect. Long-term use will inevitably lead to the trough cover becoming misaligned, thus affecting the vacuum drying efficiency.

[0003] Therefore, there is an urgent need for a vacuum drying chamber that occupies little space, has high positioning accuracy, improves drying efficiency, and extends the service life of the equipment. Utility Model Content

[0004] In view of the shortcomings of the prior art described above, the purpose of this application is to provide a vacuum drying chamber with good sealing, small space occupation, high positioning accuracy, improved drying efficiency and long service life, and a vacuum drying system having the vacuum drying chamber.

[0005] To solve the above problems, the technical solution adopted in this application is:

[0006] A vacuum drying chamber includes a chamber body with an opening at the top and a chamber cover for covering the opening. The chamber body is equipped with a heating device for drying workpieces. The chamber body has an air inlet and an air extraction inlet communicating with the inner cavity of the chamber body. The chamber cover is rotatably connected to the chamber body. The vacuum drying chamber also includes a flipping mechanism for driving the chamber cover to flip relative to the chamber body.

[0007] Existing vacuum drying tanks typically use a horizontally moving lid for opening and closing. This lid needs to move horizontally relative to the tank body under continuous drive from the module, increasing the machine's horizontal dimensions and floor space. Furthermore, due to inertia, its repeatability is difficult to control, leading to repeatability errors—meaning the lid stops at different positions each time. Over time, this horizontal movement can cause the lid to tilt, affecting vacuum drying efficiency. In contrast, the flipping mechanism of this application drives the lid to flip relative to the tank body, resulting in a smaller footprint, higher lid positioning accuracy, and improved drying efficiency.

[0008] Preferably, the flipping mechanism includes a rotating shaft, a flipping connector, and a driving device. The rotating shaft is rotatably mounted on the tank body via a rotating shaft support, and the rotating shaft is fixedly connected to the tank cover. The driving end of the driving device is connected to the end of the rotating shaft via the flipping connector, and is used to drive the rotating shaft to rotate, thereby causing the tank cover to flip relative to the tank body. In the flipping mechanism of this application, the rotating shaft drives the tank cover to flip relative to the tank body. Only the position of the rotating shaft needs to be fixed, ensuring the accuracy of the tank cover's repeatability. The repeatability is high, and the tank cover will not tilt, improving the sealing performance and thus increasing the drying efficiency of the vacuum drying tank.

[0009] Preferably, the rotating shaft is located on one side or opposite sides of the groove, and a number of groove cover connecting blocks are provided on the rotating shaft at intervals, and the rotating shaft is fixedly connected to the groove cover through the groove cover connecting blocks.

[0010] Preferably, the flip-over connector is a connecting flange, and the end of the rotating shaft is connected to the drive end of the driving device through the connecting flange.

[0011] Alternatively, the flipping connector can be an arc-shaped linkage rod, with its upper end connected to the rotating shaft and its lower end connected to the drive end of the driving device. The arc-shaped design of the flipping connector prevents the slot cover from shifting under force during flipping, ensuring smooth operation of the slot cover throughout the process.

[0012] Preferably, the driving device can be a cylinder, motor, electric cylinder, or other similar device, used to directly or indirectly drive the rotating shaft to rotate and cause the slot cover to flip. The power output by the driving device is transmitted to the rotating shaft through the flipping connector, thereby driving the rotating shaft to flip the slot cover, realizing the stable opening or closing of the slot cover.

[0013] Preferably, the vacuum drying chamber further includes an angle detector, which is disposed on the upper side wall of the chamber and is used to detect the flip angle of the chamber cover. By setting an angle detector on the vacuum drying chamber, it is possible to detect in a timely manner whether the chamber cover is in the correct position. The chamber cover of this application has an open state and a closed state, and the chamber cover switches between the open state and the closed state through the flipping mechanism. When the angle detector detects that the angle between the chamber cover and the plane where the opening is located is 0°, the chamber cover is in the closed state, and the chamber cover presses against the opening of the chamber body to form a drying chamber for drying the silicon wafers in the silicon wafer carrier basket, and the vacuum drying chamber begins to evacuate; when the angle detector detects that the angle between the chamber cover and the plane where the opening is located is 85°~100°, the chamber cover is in the open state, the chamber cover is disengaged from the opening, and the silicon wafer carrier basket can be removed in this state.

[0014] Preferably, the tank cover is provided with a component for completely sealing and covering the opening of the tank body when closed. In the closed state, the tank cover completely seals and covers the opening of the tank body, ensuring the vacuum level within the drying chamber and thus improving vacuum drying efficiency.

[0015] Alternatively, the groove cover may consist of two pieces, with adjacent sides of the two covers forming a stepped structure that fits between them. In the closed state, the two covers interlock to form a panel that covers the opening. By providing a stepped structure on the adjacent edges of the groove covers, the sealing between the cover and the groove body is improved, ensuring the vacuum level within the drying chamber in the closed state, thereby enhancing the vacuum drying efficiency.

[0016] Preferably, the tank body, tank cover, rotating shaft, rotating shaft support base, and tank cover connecting block are made of corrosion-resistant metal material, which can extend the service life of each component and prevent the risk of contamination of the silicon wafer carrier basket.

[0017] More preferably, the surfaces of the rotating shaft, the rotating shaft support, the slot cover connecting block and / or the slot cover are provided with an anti-corrosion layer, which effectively reduces the risk of contamination of the silicon wafer carrier basket due to corrosion of the slot cover and each connecting component.

[0018] Preferably, the slot cover connecting block is strip-shaped and fixed to the slot cover, and the end of the slot cover connecting block near the flipping mechanism is fixedly connected to the rotating shaft.

[0019] Preferably, the surface of the slot cover away from the slot body is provided with a handle to facilitate manual opening or closing of the slot cover in case the flipping mechanism fails.

[0020] Preferably, the air intake interface is located at least one location on the side wall or bottom of the tank.

[0021] Preferably, the air extraction port is located at least one location on the side wall or bottom of the tank.

[0022] Preferably, the vacuum drying chamber further includes a suction mechanism, which includes an electromagnetic strip and a controller connected to the electromagnetic strip. The electromagnetic strip is disposed on one side of the chamber cover, and the controller controls the magnetic attraction action of the electromagnetic strip to achieve attraction between the chamber cover and the chamber cover and / or the chamber body. If the chamber cover is a single piece, the controller controls the magnetic attraction action to achieve attraction between the chamber cover and the chamber body. If the chamber cover is two pieces, the controller controls the magnetic attraction action not only to achieve attraction between the chamber cover and the chamber body, but also to achieve attraction between the chamber covers. By adding a suction mechanism, the sealing performance of the vacuum drying chamber during vacuuming is improved, thereby increasing the drying efficiency.

[0023] Preferably, the vacuum drying tank further includes a vacuum pumping device connected to the inner cavity of the tank for creating a vacuum environment inside the tank, and a vacuum breaking device connected to the inner cavity of the tank for breaking the vacuum environment inside the tank. The vacuum pumping device is connected to the air extraction port pipeline, and the vacuum breaking device is connected to the air inlet port pipeline.

[0024] Preferably, the end face of the tank cover facing the tank body is provided with a flexible buffer pad. The buffer pad can not only buffer the opening and closing of the tank cover to prevent excessive impact from damaging the tank body or internal components, such as excessive impact causing some components to shake and shift, but also prevent gaps from easily formed during hard spraying and hard suction. It also plays a sealing role during vacuuming, thereby improving drying efficiency.

[0025] This utility model also provides a vacuum drying system, including an equipment frame and a picking and conveying mechanism disposed within the equipment frame, and a vacuum drying tank, which is housed within the equipment frame and used for drying silicon wafer carrier baskets.

[0026] Preferably, the picking and delivering mechanism is located above the vacuum drying tank and is used to place the silicon wafer carrier basket into the tank or remove the silicon wafer carrier basket from the tank.

[0027] Preferably, the delivery mechanism includes a transplanting robot that can conveniently place the silicon wafer carrier basket or silicon wafer carrier basket into the inner cavity of the tank through the opening above the tank.

[0028] Compared with the prior art, the beneficial effects of this application are:

[0029] 1. The tank cover was changed from a sliding type to a flip-top type, which reduced the horizontal dimensions between vacuum drying tanks and the floor space occupied by the machine, greatly reducing the floor space occupied by the vacuum drying tank.

[0030] 2. The flipping mechanism and the suction mechanism work together to ensure that the tank cover can fit tightly with the tank body when closed, ensuring the sealing of the equipment and effectively reducing the risk of silicon wafer carrier baskets being contaminated due to corrosion of the tank cover. It can create a vacuum environment to dry materials, which can prevent other metal ions in the air from contaminating the materials and meet the needs of subsequent production processes.

[0031] 3. The surfaces of the rotating shaft, the rotating shaft support, the slot cover connecting block and / or the slot cover are provided with an anti-corrosion layer, which effectively increases the risk of silicon wafer carrier basket being contaminated due to corrosion of the slot cover and each connecting component.

[0032] 4. The tank is connected to both an exhaust port and an intake port. The exhaust port is connected to a vacuum pump, which can create a vacuum environment inside the tank to dry the material. This not only prevents other metal ions in the air from contaminating the material and meeting the requirements of subsequent production processes, but also facilitates the rapid removal of moisture, shortens the drying time of the silicon wafer carrier basket, and reduces energy consumption. During the drying process, pure gas can be supplied into the tank through the intake port to form thermal convection inside the tank, thereby improving the drying effect. Attached Figure Description

[0033] Figure 1 This is a structural diagram of a double-opening vacuum drying tank according to an embodiment of this application.

[0034] Figure 2 This is a front view of a double-opening vacuum drying chamber in one embodiment of this application.

[0035] Figure 3 for Figure 2 AA sectional view.

[0036] Figure 4 This is a structural diagram of a double-opening vacuum drying tank in another embodiment of this application.

[0037] Figure 5 A structural diagram of a single-opening vacuum drying tank in another embodiment of this application.

[0038] Figure 6 This is a front view of a vacuum drying tank in one embodiment of this application.

[0039] Figure 7 for Figure 6 BB cross-sectional view.

[0040] Figure 8 This is a structural diagram of the vacuum drying system of this application.

[0041] In the attached image:

[0042] 1-Tank body;

[0043] 2-Slot cover; 21-Stepped structure; 22-Anti-corrosion layer;

[0044] 3-Tilting mechanism; 31-Rotating shaft; 32-Rotating shaft support; 33-Drive device; 34-Slot cover connecting block; 35-Connecting flange; 36-Linkage rod;

[0045] 4-Actuating mechanism; 41-Electromagnetic strip; 42-Controller;

[0046] 5-Equipment frame;

[0047] 6-Transplanting robot;

[0048] 7-Silicon wafer carrier basket. Detailed Implementation

[0049] The following specific examples illustrate the implementation of this application. Those skilled in the art can easily understand other advantages and effects of this application from the content disclosed in this specification. This application can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this application.

[0050] It should be noted that the process equipment or apparatus not specifically mentioned in the following embodiments are all conventional equipment or apparatus in the art.

[0051] Furthermore, it should be understood that the existence of other method steps before or after the combined steps, or the insertion of other method steps between these explicitly mentioned steps, does not preclude the existence of other method steps before or after the combined steps, or the insertion of other method steps between these explicitly mentioned steps, unless otherwise stated. It should also be understood that the combined connection relationship between one or more devices / apparatus mentioned in this application does not preclude the existence of other devices / apparatus before or after the combined devices / apparatus, or the insertion of other devices / apparatus between these explicitly mentioned devices / apparatus, unless otherwise stated. Moreover, unless otherwise stated, the numbering of each method step is merely a convenient tool for identifying each method step, and not for limiting the order of the method steps or limiting the scope of implementation of this application. Changes or adjustments to their relative relationships, without substantially altering the technical content, should also be considered within the scope of implementation of this application.

[0052] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0053] In the description of this application, it should be understood that the terms "upper," "lower," "left," "right," "inner," "outer," "axial," and "circumferential," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Furthermore, features defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0054] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0055] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0056] The present application will be further described below with reference to specific embodiments, but the scope of protection of the present application is not limited thereto.

[0057] like Figure 1 and Figure 5 As shown, the vacuum drying tank includes a tank body 1 with an opening at the top and a tank cover 2 for covering the opening. The tank body 1 is equipped with a heating device for drying the workpiece. The tank body 1 is provided with an air inlet and an air extraction port that communicate with the inner cavity of the tank body 1. The tank cover 2 is rotatably connected to the tank body 1. This type of vacuum drying tank also includes a flipping mechanism that drives the tank cover 2 to flip relative to the tank body 1.

[0058] like Figures 1-4As shown, the flipping mechanism 3 includes a rotating shaft 31, a flipping connector, and a driving device 33. The rotating shaft 31 is rotatably mounted on the groove 1 via a rotating shaft support 32, and the rotating shaft 31 is fixedly connected to the groove cover 2. The driving end of the driving device 33 is connected to the end of the rotating shaft 31 via the flipping connector, and is used to drive the rotating shaft 31 to rotate so as to flip the groove cover 2 relative to the groove 1.

[0059] like Figure 2 and Figure 5 As shown, the rotating shaft 31 is located on one side or opposite sides of the groove 1, and several groove cover connecting blocks 34 are provided on the rotating shaft 31 at intervals. The rotating shaft 31 is fixedly connected to the groove cover 2 through the groove cover connecting blocks 34.

[0060] like Figure 5 and Figure 6 The flip-over connector shown is a connecting flange 35, and the end of the rotating shaft 31 is connected to the driving end of the driving device 33 through the connecting flange 35. In some embodiments of this utility model, the flip-over connector is an arc-shaped linkage rod 36, the upper end of the linkage rod 36 is connected to the rotating shaft 31, and the lower end of the linkage rod 36 is connected to the driving end of the driving device 33.

[0061] like Figure 5 ` Figure 7 As shown, the groove cover 2 is provided with a piece for completely sealing and covering the opening of the groove body 1 when closed.

[0062] like Figure 1 ` Figure 4 As shown, the slot cover 2 consists of two pieces, with adjacent sides of the two slot covers 2 forming a stepped structure 21 that fits between them. In the closed state, the two slot covers 2, through the overlapping and mating stepped structure 21, form a panel for covering the opening. The stepped structure here can be a simple L-shaped structure.

[0063] like Figure 4 As shown, the surfaces of the rotating shaft 31, the rotating shaft support 32, the groove cover connecting block 34 and / or the groove cover 2 are provided with an anti-corrosion layer 22.

[0064] In some embodiments of this utility model, the surface of the groove cover 2 away from the groove body 1 is provided with a handle.

[0065] In some embodiments of this utility model, the vacuum drying tank further includes a suction mechanism 4, which includes an electromagnetic strip 41 and a controller 42 connected to the electromagnetic strip 41. The electromagnetic strip 41 is disposed on one side of the tank cover 2, and the electromagnetic strip 41 is controlled by the controller 42 to perform magnetic attraction to achieve attraction between the tank cover 2 and between the tank cover 2 and the tank body 1.

[0066] like Figure 4 As shown, the controller 42 is an electricity meter. As a common control tool, the electricity meter will not be elaborated or limited here.

[0067] like Figure 4 As shown, the electromagnetic strip 41 can be set at the bottom joint of the groove cover 2.

[0068] In some embodiments of this utility model, the vacuum drying tank further includes a vacuum pumping device communicating with the inner cavity of the tank body 1 for forming a vacuum environment in the tank body 1, and a vacuum breaking device communicating with the inner cavity of the tank body 1 for breaking the vacuum environment in the inner cavity of the tank body 1. The vacuum pumping device is connected to the air extraction interface pipeline, and the vacuum breaking device is connected to the air inlet interface pipeline.

[0069] In some embodiments of this utility model, a buffer pad is provided on the end face of the groove cover 2 facing the groove body 1. The buffer pad can buffer the opening and closing of the groove cover to prevent excessive impact from damaging the groove body or internal components, such as excessive impact causing some components to shake and shift. It can also prevent gaps from easily forming during hard spraying and hard suction, and play a sealing role during vacuuming to improve drying efficiency.

[0070] like Figure 8 As shown, this utility model also provides a vacuum drying system, including an equipment frame 5 and a pick-and-place mechanism disposed within the equipment frame 5, and a vacuum drying tank, which is housed within the equipment frame 5 and is used to house a silicon wafer carrier basket.

[0071] like Figure 8 As shown, the picking and feeding mechanism is located above the vacuum drying tank and is used to put the silicon wafer carrier basket into the tank or take the silicon wafer carrier basket out of the tank.

[0072] like Figure 8 As shown, the picking and delivering mechanism includes a transplanting robot 6, which can conveniently place the silicon wafer carrier basket or silicon wafer carrier basket 7 into the inner cavity of the tank through the opening above the tank.

[0073] Taking one type of double-slotted cover as an example, the working process of the vacuum drying system is as follows:

[0074] Step 1: The silicon wafer carrier basket 7 is moved to the top of the vacuum drying tank by the transplanting robot 6. The flipping mechanism 3 is activated, driving both tank covers 2 to flip outward. After the tank covers 2 are flipped to the open state, the transplanting robot 6 moves the silicon wafer carrier basket 7 downward and places it inside the tank body 1. Then, the flipping mechanism 3 is activated, driving the tank covers 2 to flip inward until the tank covers 2 are pressed tightly against the tank body. At this time, the tank covers 2 change from the open state to the closed state.

[0075] Step 2: The vacuum equipment starts running, creating a vacuum environment in the drying chamber formed by the tank cover 2 and the tank body. The heating device performs vacuum drying on the silicon wafers in the silicon wafer carrier basket 7.

[0076] Step 3: After vacuum drying is completed, the flipping mechanism 3 is restarted, driving the tank cover 2 to flip outward. After the tank cover 2 is flipped to the open state, the transfer robot 6 moves the silicon wafer carrier basket 7 to the next tank or unloading platform.

[0077] Taking another type of double-slotted cover as an example, the working process of the vacuum drying system is as follows:

[0078] Step 1: The silicon wafer carrier basket 7 is moved to the top of the vacuum drying tank by the transplanting robot 6. The flipping mechanism 3 is activated, driving the tank cover 2 to flip outward. After the tank cover 2 is flipped to the open state, the transplanting robot 6 moves the silicon wafer carrier basket 7 downward and places it inside the tank body 1. Then, the flipping mechanism 3 is activated, driving the tank cover 2 to flip inward. Then, the suction mechanism is activated. The electromagnetic strip controls the magnetic suction action through the controller to achieve the suction between the tank covers and between the tank cover and the tank body until the stepped structure at the end of the tank cover 2 is engaged with each other. In the closed state, the two tank covers are overlapped and closed. At the same time, the tank cover 2 is pressed against the tank body. At this time, the tank cover 2 changes from the open state to the closed state.

[0079] Step 2: The vacuum equipment starts running, creating a vacuum environment in the drying chamber formed by the tank cover 2 and the tank body. The heating device performs vacuum drying on the silicon wafers in the silicon wafer carrier basket 7.

[0080] Step 3: After vacuum drying is completed, the flipping mechanism 3 is restarted, driving the tank cover 2 to flip outward. After the tank cover 2 is flipped to the open state, the transfer robot 6 moves the silicon wafer carrier basket 7 to the next tank or unloading platform.

[0081] Taking a single-slot cover as an example, the working process of a vacuum drying system is as follows:

[0082] Step 1: The silicon wafer carrier basket 7 is moved to the top of the vacuum drying tank by the transfer robot 6. The flipping mechanism 3 is activated, driving the tank cover 2 to flip outward. After the tank cover 2 is flipped to the open state, the transfer robot 6 moves the silicon wafer carrier basket 7 downward and places it inside the tank body 1. Then, the flipping mechanism 3 is activated, driving the tank cover 2 to flip inward until the tank cover 2 is pressed tightly against the tank body. At this time, the tank cover 2 changes from the open state to the closed state.

[0083] Step 2: The vacuum equipment starts running, creating a vacuum environment in the drying chamber formed by the tank cover 2 and the tank body. The heating device performs vacuum drying on the silicon wafers in the silicon wafer carrier basket 7.

[0084] Step 3: After vacuum drying is completed, the flipping mechanism 3 is restarted, driving the tank cover 2 to flip outward. After the tank cover 2 is flipped to the open state, the transfer robot 6 moves the silicon wafer carrier basket 7 to the next tank or unloading platform.

[0085] The vacuum drying tank of this application features a new opening and closing mechanism. The tank cover has been changed from a sliding type to a flip-top type, making the distance between vacuum drying tanks more compact and greatly reducing the floor space required. Furthermore, the large opening angle of the tank cover does not obstruct the placement of workpieces. The tank cover minimizes contact with the tank body during opening and closing, effectively preventing friction and wear, and extending the equipment's service life. The flipping mechanism works in conjunction with the suction mechanism, ensuring a tight seal between the tank cover and the tank body when closed, guaranteeing the equipment's airtightness and effectively reducing the risk of contamination of the silicon wafer carrier basket due to corrosion. It can create a vacuum environment for drying materials, preventing contamination from other metal ions in the air and meeting the requirements of subsequent production processes. An anti-corrosion layer is applied to the surface of the tank cover, effectively increasing the equipment's lifespan and strength. The tank body is connected to both an exhaust port and an intake port. The exhaust port is connected to a vacuum pump, creating a vacuum environment within the tank, facilitating rapid moisture removal, shortening the drying time of the silicon wafer carrier basket, and reducing energy consumption. During drying, gas can be supplied into the tank through the intake port, creating thermal convection within the tank and improving the drying effect.

[0086] The above embodiments are for illustrating the implementation schemes disclosed in this application and should not be construed as limiting this application. Furthermore, various modifications listed herein, as well as variations in methods and compositions of the utility model, will be apparent to those skilled in the art without departing from the scope and spirit of this application. Although this application has been specifically described in conjunction with various specific preferred embodiments, it should be understood that this application should not be limited to these specific embodiments. In fact, various modifications as described above that are obvious to those skilled in the art to obtain the utility model should be included within the scope of this application.

Claims

1. A vacuum drying tank, comprising a tank body (1) with an upper opening and a tank cover (2) for covering the opening, a heating device for drying workpieces is arranged inside the tank body (1), the tank body (1) is provided with an air inlet interface and an air outlet interface which communicate with the inner cavity of the tank body (1); characterized in that: The groove cover (2) is rotationally connected with the groove body (1); the vacuum drying groove further comprises a turnover mechanism for driving the groove cover (2) to overturn relative to the groove body (1).

2. A vacuum drying tunnel according to claim 1, characterized in that: The turnover mechanism (3) comprises a rotating shaft (31), a turnover connecting piece and a driving device (33), the rotating shaft (31) is rotationally arranged on the groove body (1) through a rotating shaft support seat (32), and the rotating shaft (31) is fixedly connected with the groove cover (2); the driving end of the driving device (33) is connected with the end of the rotating shaft (31) through the turnover connecting piece, for driving the rotating shaft (31) to rotate to drive the groove cover (2) to overturn relative to the groove body (1).

3. A vacuum drying cabinet as claimed in claim 2, wherein: The rotating shaft (31) is located on one side or opposite sides of the groove body (1), and a plurality of groove cover connecting blocks (34) are arranged on the rotating shaft (31) at intervals, and the rotating shaft (31) is fixedly connected with the groove cover (2) through the groove cover connecting blocks (34).

4. A vacuum drying cabinet as claimed in claim 2, wherein: The turnover connecting piece is a connecting flange (35), and the end of the rotating shaft (31) is connected with the driving end of the driving device (33) through the connecting flange (35).

5. A vacuum drying cabinet as claimed in claim 2, wherein: The turnover connecting piece is an arc-shaped linkage rod (36), the upper end of the linkage rod (36) is connected with the rotating shaft (31), and the lower end of the linkage rod (36) is connected with the driving end of the driving device (33).

6. A vacuum drying cabinet as claimed in claim 4, wherein: The groove cover (2) is provided with one piece for completely sealing and covering the opening of the groove body (1) in the closed state.

7. A vacuum drying cabinet as claimed in claim 5, wherein: The groove cover (2) is provided with two pieces, and the sides of the two groove covers (2) close to each other are step-shaped structures (21) matched with each other, and in the closed state, the two groove covers (2) form a panel for sealing and covering the opening through the step-shaped structures (21) matched with each other.

8. A vacuum drying cabinet as claimed in claim 3, wherein: The surfaces of the rotating shaft (31), the rotating shaft support seat (32), the groove cover connecting block (34) and / or the groove cover (2) are provided with a corrosion-resistant layer (22).

9. A vacuum drying cabinet as claimed in claim 1, wherein: The vacuum drying groove further comprises a vacuum pumping device communicated with the inner cavity of the groove body (1) for forming a vacuum environment in the groove body (1) and a vacuum breaking device communicated with the inner cavity of the groove body (1) for breaking the vacuum environment in the inner cavity of the groove body (1), the vacuum pumping device is communicated with the air exhaust interface pipeline, and the vacuum breaking device is communicated with the air inlet interface pipeline.

10. A vacuum drying system comprising a machine frame (5) and a pick-and-place mechanism arranged within the machine frame (5), characterized in that: Further comprising the vacuum drying groove according to any one of claims 1-9, the vacuum drying groove is accommodated in the equipment frame (5) and used for drying a silicon wafer carrier basket (7).

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