Vapor deposition furnace with gas supply function
By setting up an external gas supply pipe and an inlet gas mixing chamber in the chemical vapor deposition furnace, the airflow direction was optimized, the problem of uneven gas distribution was solved, and uniform deposition of coatings on the inner and outer walls of the workpiece was achieved, thus improving deposition efficiency and coating quality.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-15
- Publication Date
- 2026-04-03
AI Technical Summary
In existing chemical vapor deposition furnaces, the gas supply system of the deposition chamber is relatively simple, making it difficult to uniformly blow gas onto the workpiece surface, resulting in low deposition efficiency. In particular, when processing cylindrical workpieces with asymmetrical openings, the coating growth rate on the inner wall is slow.
A vapor deposition furnace with gas replenishment function is designed. By setting multiple gas replenishment pipes on the outside of the workpiece and a gas mixing chamber inside the furnace, the gas is uniformly distributed in the deposition chamber, ensuring that the gas can flow evenly into the outside and inside of the workpiece. The gas replenishment holes and gas distribution pipes are arranged in a ring array to optimize the airflow direction and improve gas permeability.
It significantly improves the deposition quality and uniformity of the coating on the workpiece surface, is suitable for simultaneous deposition of multiple workpieces, improves production efficiency and furnace loading capacity, and ensures the adhesion and uniformity of the coating on the inner wall.
Smart Images

Figure CN224077532U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of chemical vapor deposition, specifically relating to a vapor deposition furnace with a gas replenishment function. Background Technology
[0002] Chemical vapor deposition (CVD) is a key technology for surface coating. Its principle is to form a dense coating on the substrate surface by chemically reacting a gaseous precursor under thermodynamic drive.
[0003] Most current industrial CVD equipment adopts a unidirectional linear gas path design (as shown in the attached image). Figure 5 As shown, the reactive gas is injected into the deposition chamber through the inlet pipe at the top of the furnace. Under the suction of the vacuum pump, it forms a unidirectional flow from the inlet end to the outlet end, and the gas is finally discharged through the outlet pipe. This traditional gas path layout is prone to forming an axial concentration gradient during long-term deposition. Specifically, when the carrier gas carries the precursor and flows over the surface of the workpiece, the concentration of the active component decreases exponentially along the airflow direction due to continuous consumption, ultimately resulting in an axial coating thickness difference of more than 30% on the workpiece.
[0004] To address the aforementioned issues, the industry has attempted to introduce a multi-stage air replenishment system (as shown in the attached document). Figure 6 As shown, the required gas is introduced through the inlet pipe at the top of the furnace body, and gas path compensation is achieved by adding a lateral gas supply pipe in the middle section of the deposition chamber inside the furnace body. This scheme can improve coating uniformity in flat workpiece applications. However, when processing workpieces with special structures—especially cylindrical crucibles with asymmetrical openings—due to the Bernoulli effect and boundary layer separation, most of the supplied gas passes quickly along the annular gap formed by the outer wall of the crucible and the inner wall of the furnace, and only a small amount of gas can penetrate the internal cavity of the crucible, resulting in a slower coating growth rate on the inner wall.
[0005] In summary, in existing chemical vapor deposition furnaces, the gas replenishment system of the deposition chamber is relatively simple, making it difficult to uniformly purge the gas onto the surface of the workpiece, resulting in low deposition efficiency. Therefore, there is an urgent need to propose a chemical vapor deposition furnace with a gas replenishment function to solve the problems existing in the chemical vapor deposition of cylindrical workpieces with open ends in the current technology. Utility Model Content
[0006] To address the issue of low deposition efficiency caused by the simple gas replenishment system in existing chemical vapor deposition (CVD) furnaces and deposition systems, which makes it difficult to evenly purge gas onto the workpiece surface, this paper proposes a novel CVD furnace with a gas replenishment function to solve the problem of low deposition efficiency in existing technologies.
[0007] The technical solution adopted in this utility model is as follows:
[0008] A vapor deposition furnace with gas replenishment function includes a furnace body, a gas inlet structure, a gas replenishment structure, and a gas outlet pipe;
[0009] The furnace body is provided with a deposition chamber for placing the workpiece to be deposited. An air intake structure is fixedly connected to the upper part of the furnace body. The air intake structure includes an air intake mixing chamber. Multiple air intake pipes are uniformly inserted through the side wall of the air intake mixing chamber in the circumferential direction. Multiple air distribution pipes are inserted through the connection between the top of the deposition chamber and the bottom of the air intake mixing chamber.
[0010] The upper part of the air intake structure is fixedly connected to the air replenishment structure, which includes an air replenishment mixing chamber. The top of the air replenishment mixing chamber is fixedly connected to the air intake mixing chamber. The upper end of the air replenishment mixing chamber is provided with an air replenishment inlet pipe that communicates with the air replenishment mixing chamber. The bottom of the air replenishment mixing chamber is provided with multiple round holes. The round holes are connected to an external air replenishment pipe of the workpiece through threads. One end of the external air replenishment pipe of the workpiece communicates with the air replenishment mixing chamber, and the other end passes through the air intake mixing chamber and extends to the deposition chamber.
[0011] The gas outlet pipe is located on the lower part of the side wall of the furnace body and communicates with the deposition chamber, and is used to discharge excess deposition gas from the deposition chamber.
[0012] Preferably, a workpiece support frame is fixedly installed at the bottom of the deposition chamber to support the workpiece to be deposited.
[0013] Preferably, the outer gas supply pipe of the workpiece is arranged vertically and is evenly distributed along the outer periphery of the workpiece support frame and the inner periphery of the furnace body; one end of the outer gas supply pipe of the workpiece extends to the deposition chamber and is sealed, and the side wall of the outer gas supply pipe of the workpiece extending to the deposition chamber is provided with a gas supply hole for conveying gas to the bottom of the workpiece to be deposited.
[0014] Preferably, multiple air supply holes are provided along the side wall of the air supply pipe on the outer side of the workpiece, and the initial gas outflow direction of the multiple air supply holes is horizontal; the air supply holes form a straight line along the air supply pipe on the outer side of the workpiece, and the opening of the air supply holes faces the workpiece to be deposited.
[0015] Preferably, the gas distribution pipes are arranged in a circular array or symmetrically around the vertical axis of the furnace body, and are used to uniformly disperse the gas in the gas mixing chamber onto the workpiece to be deposited in the deposition chamber.
[0016] Preferably, the area of the pattern formed by the outermost gas pipes arranged in a circular array or symmetrically arranged along the vertical axis of the furnace body is larger than the projected area of the workpiece to be deposited in the vertical direction.
[0017] Compared with the prior art, the beneficial effects of this utility model are as follows:
[0018] The gas replenishment device provided by this invention achieves uniform gas distribution within the deposition chamber by setting a gas replenishment pipe on the outside of the workpiece, thereby significantly improving the deposition quality of the coating on the surface of the workpiece. Specifically, the design of the gas replenishment pipe allows the gas to flow evenly into the deposition chamber, avoiding problems such as inconsistent coating thickness or unstable quality caused by uneven gas distribution.
[0019] Furthermore, this gas replenishment device can effectively ensure the deposition quality of the coating on the inner wall surface of the workpiece. In traditional vapor deposition processes, the coating quality on the inner wall of the workpiece is often difficult to control. However, this invention optimizes the position of the gas replenishment pipe and the airflow direction to ensure that the gas can fully penetrate into the interior of the workpiece, thereby significantly improving the uniformity and adhesion of the inner wall coating.
[0020] This gas replenishment device is also suitable for stacking multiple workpieces to be deposited in the furnace for vapor deposition. It not only increases the furnace loading capacity but also improves deposition efficiency. When multiple workpieces are deposited simultaneously, the gas replenishment device ensures that each workpiece receives a uniform gas supply, thereby improving production efficiency without affecting coating quality.
[0021] In summary, the gas replenishment device of this utility model not only improves the coating quality of a single workpiece by optimizing gas distribution, but is also suitable for simultaneous deposition of multiple workpieces, thereby increasing production efficiency and furnace loading capacity. Attached Figure Description
[0022] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. In all the drawings, similar elements or parts are generally identified by similar reference numerals. In the drawings, the elements or parts are not necessarily drawn to scale.
[0023] Appendix Figure 1 This is a schematic diagram of the structure of this utility model;
[0024] Appendix Figure 2 This is a schematic diagram of the structure after the workpiece to be deposited is installed in this utility model. The arrows in the diagram indicate the direction of gas flow.
[0025] Appendix Figure 3 This is a schematic diagram showing the connection between the outer air supply pipe of the workpiece, the air supply mixing chamber, and the air supply inlet pipe in this utility model.
[0026] Appendix Figure 4 This is a schematic diagram of the air supply pipe on the outer side of the workpiece in this utility model;
[0027] Appendix Figure 5 A schematic diagram of a single-inlet vapor deposition furnace;
[0028] Appendix Figure 6 A schematic diagram of a vapor deposition furnace with a gas replenishment system.
[0029] Explanation of reference numerals in the attached diagram: 1. Air inlet pipe; 2. Air inlet mixing chamber; 3. Air inlet mixing chamber; 4. Air distribution pipe; 5. Air inlet pipe; 6. Air inlet pipe on the outside of the workpiece; 7. Workpiece to be deposited; 8. Furnace body; 9. Air inlet hole; 10. Air outlet pipe.
[0030] 13. Inlet pipe; 14. Furnace body; 15. Outlet pipe.
[0031] 16. Inlet pipe; 17. Furnace body; 18. Gas supply pipe; 19. Outlet pipe. Detailed Implementation
[0032] To further illustrate the technical means and effects adopted by this utility model in order to achieve the intended utility model purpose, the following detailed description of the specific implementation methods, structure, features and functions of this utility model is provided in conjunction with the accompanying drawings and preferred embodiments.
[0033] Attached Figure 1-4 As shown, this utility model provides a gas replenishment device, including a furnace body 8, an air inlet structure fixedly connected to the upper part of the furnace body 8, a gas replenishment structure fixedly connected to the upper part of the air inlet structure, and an air outlet pipe 10 located on the lower part of the side wall of the furnace body 8.
[0034] The furnace body 8 is equipped with a deposition chamber 11 for chemical vapor deposition (CVD) reactions. A workpiece support frame 12 is fixedly installed at the bottom of the deposition chamber 11 to support the workpiece 7 to be deposited. The gas inlet structure and gas replenishment structure are used to introduce the required gas into the furnace body 8, so that the gas in the deposition chamber 11 in the furnace body 8 undergoes a chemical reaction and generates a solid substance that is deposited on the surface of the workpiece 7, thereby forming a coating on the surface of the workpiece 7. The gas outlet pipe 10 is connected to the deposition chamber 11 to remove excess gas and to keep the deposition chamber 11 under the pressure required by the process.
[0035] The air intake structure and the air replenishment structure are set above the deposition chamber 11, and the air outlet pipe 10 is set below the deposition chamber 11. This relative arrangement allows the gas to circulate throughout the entire deposition chamber 11 space, thereby increasing the degree of contact with the workpiece 7 to be deposited, and also makes it easier to recover excess gas.
[0036] The air intake structure includes an air intake mixing chamber 3, multiple air intake pipes 5 evenly arranged along the circumference of the side wall of the air intake mixing chamber 3, and multiple gas distribution pipes 4 connected at the top of the deposition chamber 11 and the bottom of the air intake mixing chamber 3. The outermost gas distribution pipes 4 are arranged in a ring array or symmetrically around the vertical axis of the furnace body 8, and the area of the graphic formed by the outermost gas distribution pipes 4 is larger than the vertical projection area of the workpiece 7 to be deposited. This design ensures that the gas blown out from the gas distribution pipes 4 completely surrounds the workpiece 7 to be deposited in the vertical direction, thereby increasing the contact area and improving the deposition efficiency. The air intake pipes 5 are used to send the required gas into the air intake mixing chamber 3, and the gas distribution pipes 4 are used to transport the gas to the upper part of the workpiece 7 to be deposited, so that the gas is deposited from top to bottom.
[0037] The gas replenishment structure includes a gas replenishment mixing chamber 2 fixedly connected to the top of the gas inlet mixing chamber, a gas replenishment inlet pipe 1 located at the upper end of the gas replenishment mixing chamber 2 and communicating with the gas replenishment mixing chamber 2, and a workpiece outer gas replenishment pipe 6 located at the bottom of the gas replenishment mixing chamber 2. The gas replenishment mixing chamber 2 has two circular holes along its circumference, which are rotatably connected to the workpiece outer gas replenishment pipe 6 adapted to the holes. One end of the workpiece outer gas replenishment pipe 6 communicates with the gas inlet mixing chamber 3, and the other end passes through the gas inlet mixing chamber 3 and extends to the deposition chamber 11 without being sealed. The workpiece outer gas replenishment pipe 6 is parallel to the vertical axis of the furnace body 8, and several gas replenishment holes 9 are arranged along the vertical axis of the workpiece outer gas replenishment pipe 6. The required gas is output to the lower half of the outer wall of the workpiece 7 to be deposited through the gas replenishment holes 9 on the side wall of the workpiece outer gas replenishment pipe 6; thereby depositing a coating on the inner wall of the workpiece 7. This arrangement allows for a larger coating deposition effect on both the upper and lower sides of the workpiece 7 to be deposited.
[0038] The gas replenishment device provided by this utility model can effectively deposit coatings on the inner and outer walls of the workpiece 7 to be deposited. Specifically, the gas replenishment pipe 6 on the outer side of the workpiece is arranged along the stacking direction of multiple workpieces 7 to be deposited. In order to improve the deposition efficiency, multiple workpieces 7 to be deposited are generally stacked, and the openings of multiple workpieces 7 to be deposited are connected in a straight line along the vertical axis of the furnace body 8. At this time, the gas replenishment pipe 6 on the outer side of the workpiece passes through the openings of multiple workpieces 7 to be deposited, that is, the gas replenishment pipe 6 on the outer side of multiple workpieces 7 to be deposited in a group is arranged through the side. At this time, the gas replenishment pipe 6 on the outer side of the workpiece has several gas replenishment holes 9 arranged along the axial direction. The gas replenishment holes 9 are used to output gas to the inner wall of the workpiece 7 to be deposited, and then directly blow gas out of the bottom of the workpiece 7 to be deposited to ensure the deposition effect.
[0039] The gas replenishment device provided by this utility model is particularly suitable for vapor phase deposition of workpiece 7 with openings at both ends. By setting up the gas inlet pipe 5 and the gas replenishment pipe 6 on the outside of the workpiece, the uniformity of gas in the deposition chamber is high, which can effectively improve the quality of the coating deposition on the surface of the workpiece 7. On the other hand, it can also ensure the quality of the coating deposition on the inner wall surface of the workpiece 7. Moreover, it is also suitable for multiple workpieces 7 to be deposited to be stacked in the furnace body 8 for vapor phase deposition, thereby increasing the furnace loading capacity, and improving the deposition efficiency without affecting the coating quality.
[0040] Implementation principle of the device:
[0041] Before use, ensure that the furnace body 8, the air intake structure (including the air intake mixing chamber 3, the air intake pipe 5, and the air distribution pipe 4), the air replenishment structure (including the air replenishment mixing chamber 2, the air replenishment intake pipe 1, the air replenishment pipe 6 on the outside of the workpiece and the air replenishment hole 9 on it), the air outlet pipe 10, the sedimentation chamber 11, the workpiece support frame 12 and other components are intact, the connections are firm, and there is no risk of leakage.
[0042] The workpiece 7 to be deposited is placed on the workpiece support frame 12. The required gas is sent into the gas mixing chamber 3 through the gas inlet pipe 5. After the gas is mixed evenly in the gas mixing chamber 3, it is transported to the upper part of the workpiece 7 to be deposited through the gas distribution pipe 4, surrounding the workpiece 7 from the vertical direction and starting the top-down deposition process. At this time, the gas in the deposition chamber 11 undergoes a chemical reaction to generate solid substances that are deposited on the surface of the workpiece 7. At the same time, the required gas enters the gas mixing chamber 2 through the gas supply pipe 1, and then is output to the lower half of the outer wall of the workpiece 7 through the gas supply hole 9 on the side wall of the gas supply pipe 6 on the outer side of the workpiece, thereby depositing a coating on the inner wall of the workpiece 7.
[0043] During the gas introduction and deposition process, the gas outlet pipe 10 is connected to the deposition chamber 11, continuously removing excess gas from the deposition chamber 11, so that the deposition chamber 11 is under the pressure required by the process, ensuring that the chemical vapor deposition reaction can proceed smoothly.
[0044] Example 2
[0045] In this embodiment, multiple air supply pipes 6 on the outer side of the workpiece are evenly arranged around the axis of the outer side of the workpiece in a circumferential manner. That is, the air supply pipes 6 on the outer side of the workpiece can blow air in various directions toward the inner wall of the workpiece 7 to be deposited, so as to ensure the uniformity of gas on the inner wall of the workpiece 7 to be deposited.
[0046] Example 3
[0047] In this embodiment, the end of the outer gas supply pipe 6 is sealed to effectively prevent gas from directly leaking out from the inner side of the workpiece. Through this sealing, the gas can only be uniformly released into the inner wall of the workpiece 7 through the gas supply holes 9, ensuring a stable and controllable gas output from the gas supply holes 9. This not only effectively avoids gas waste but also optimizes the uniformity of gas distribution on the inner wall of the workpiece, providing a crucial guarantee for uniform coating deposition. Specifically, after entering from the outer gas supply pipe 6, the gas can only flow out through the pre-set gas supply holes 9, preventing disordered diffusion of gas inside the workpiece. This control method ensures that the gas can uniformly cover every area of the inner wall of the workpiece, thus avoiding inconsistent coating thickness caused by uneven gas distribution. This design not only improves gas utilization and reduces gas consumption but also ensures the uniformity of coating thickness on the inner wall of the workpiece, improving the overall quality and performance of the coating.
[0048] Example 4
[0049] In this embodiment, the workpiece 7 to be deposited is a cylindrical structure with a large difference in opening diameter between its upper and lower parts (the difference in opening diameter exceeds 3 cm), such as a circular plate structure. This design allows multiple workpieces 7 to be deposited to be arranged with their larger ends facing downwards, and to maintain stability through appropriate spacing. In specific operation, the air inlet pipe 5 extends from the top into one of the workpieces 7 to be deposited, and excess gas flows out from the gap below and enters the outer wall of the next workpiece 7 to be deposited for deposition. At the same time, the external air supply pipe 6 of the workpiece introduces air from the side of the workpiece, ensuring that the side also receives sufficient gas replenishment during the deposition process, thereby improving gas utilization. This arrangement not only optimizes the gas flow path but also enhances the uniformity of the coating and the deposition effect. By rationally designing the gas flow direction, the gas can more effectively cover the workpiece surface, reduce gas waste, and improve deposition efficiency. In addition, the side air supply design further ensures the uniformity of the coating on the side of the workpiece, avoiding coating defects caused by uneven gas distribution.
[0050] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any way. Although the present utility model has been disclosed above with reference to a preferred embodiment, it is not intended to limit the present utility model. Any person skilled in the art can make some modifications or alterations to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the present utility model. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present utility model without departing from the scope of the present utility model shall still fall within the scope of the present utility model.
Claims
1. A vapor deposition furnace with gas replenishment function, characterized in that, It includes the furnace body (8), the air intake structure, the air replenishment structure, and the air outlet pipe (10); The furnace body (8) is provided with a deposition chamber (11) for placing the workpiece (7) to be deposited. An air intake structure is fixedly connected to the upper part of the furnace body (8). The air intake structure includes an air intake mixing chamber (3). Multiple air intake pipes (5) are uniformly provided through the side wall of the air intake mixing chamber (3) in the circumferential direction. Multiple air distribution pipes (4) are provided through the connection between the top of the deposition chamber and the bottom of the air intake mixing chamber (3). The upper part of the air intake structure is fixedly connected to the air replenishment structure. The air replenishment structure includes an air replenishment mixing chamber (2). The top of the air replenishment mixing chamber (2) is fixedly connected to the air intake mixing chamber (3). The upper end of the air replenishment mixing chamber (2) is provided with an air replenishment inlet pipe (1) that communicates with the air replenishment mixing chamber (2). The bottom of the air replenishment mixing chamber (2) is provided with multiple round holes. The round holes are connected to the workpiece outer air replenishment pipe (6) by thread. One end of the workpiece outer air replenishment pipe (6) communicates with the air replenishment mixing chamber (2), and the other end passes through the air intake mixing chamber (3) and extends to the deposition chamber (11). The gas outlet pipe (10) is located on the lower part of the side wall of the furnace body (8) and communicates with the deposition chamber (11) to discharge excess deposition gas from the deposition chamber (11).
2. A vapor deposition furnace with gas replenishment function according to claim 1, characterized in that, The bottom of the deposition chamber (11) is fixedly provided with a workpiece support frame (12) for supporting the workpiece (7) to be deposited.
3. A vapor deposition furnace with gas replenishment function according to claim 2, characterized in that, The outer gas supply pipe (6) of the workpiece is set vertically and is evenly distributed along the outer periphery of the workpiece support frame (12) and the inner periphery of the furnace body (8); the outer gas supply pipe (6) of the workpiece extends to the deposition chamber (11) and is sealed at one end, and the side wall of the outer gas supply pipe (6) of the workpiece extending to the deposition chamber (11) is provided with a gas supply hole (9) for conveying gas to the workpiece (7) to be deposited.
4. A vapor deposition furnace with gas replenishment function according to claim 3, characterized in that, Multiple air supply holes (9) are provided along the side wall of the air supply pipe (6) on the outside of the workpiece, and the initial gas outflow direction of the multiple air supply holes (9) is horizontal; the air supply holes (9) form a straight line along the air supply pipe (6) on the outside of the workpiece, and the opening of the air supply holes (9) faces the workpiece (7) to be deposited.
5. A vapor deposition furnace with gas replenishment function according to claim 1, characterized in that, The gas distribution pipe (4) is arranged in a ring array or symmetrically with the vertical axis of the furnace body (8) as the center, and is used to evenly disperse the gas in the gas mixing chamber (3) onto the workpiece (7) to be deposited in the deposition chamber (11).
6. A vapor deposition furnace with gas replenishment function according to claim 5, characterized in that, The area of the pattern formed by the vertical axis of the furnace body (8) arranged in a ring array or symmetrically arranged with the outermost gas distribution pipes (4) is larger than the vertical projection area of the workpiece (7) to be deposited.