Device for removing bubbles from photoresist

Abstract

The utility model discloses a photoresist bubble removing device which comprises a cylinder body, the right side of the cylinder body is fixedly connected with a feeding pipe communicated with the cylinder body, the feeding pipe is communicated with a charging pipe, the left side of the cylinder body is communicated with a discharging pipe, the feeding pipe and the discharging pipe are respectively provided with a first electromagnetic valve, and a second electromagnetic valve is arranged on the discharging pipe. A vacuum pipe is communicated with the left side of the cylinder body, a vacuum pump is mounted on the vacuum pipe, a rotating rod is rotatably connected to the inner wall of the cylinder body, and stirring rods which are uniformly distributed are fixedly connected to the rotating rod. According to the utility model, when the photoresist is subjected to vacuum defoaming, the photoresist can be stirred, and bubbles in the photoresist can be promoted to move to the surface of a photoresist solution more quickly by stirring, so that the photoresist can be expanded and broken more easily in a vacuum environment, the defoaming efficiency is improved, the photoresist can be uniformly distributed in a container by stirring, local bubble aggregation is avoided, and the defoaming efficiency is improved. And the defoaming effect is more thorough.

Description

Technical Field

[0001] This utility model relates to the field of photoresist processing technology, and more specifically, to a device for removing air bubbles from photoresist. Background Technology

[0002] The device used to remove air bubbles from photoresist is usually called a debubbler or degasser. It is mainly used to remove air bubbles in the photoresist solution during the photoresist coating process to ensure that the photoresist is evenly distributed on the wafer surface and avoid defects in subsequent photolithography processes.

[0003] The two most common methods for removing bubbles from photoresist are vacuum degassing and centrifugal degassing. Vacuum degassing involves placing a container of photoresist into a vacuum chamber and reducing the air pressure inside the chamber by drawing a vacuum. This causes the bubbles in the photoresist to expand and burst due to the pressure difference, thus removing the bubbles. However, this method of removing bubbles is inefficient, and prolonged exposure of the photoresist to a vacuum environment can easily affect its performance. Utility Model Content

[0004] In view of the problems existing in the prior art, the purpose of this utility model is to provide a device for removing bubbles from photoresist, thereby solving the problems in the background art.

[0005] To achieve the above objectives, the present invention adopts the following technical solution;

[0006] A device for removing air bubbles from photoresist includes a cylindrical body. A feed pipe is fixedly connected to the right side of the cylindrical body and communicates with it. A feeding pipe is connected to the feed pipe. A discharge pipe is connected to the left side of the cylindrical body. A solenoid valve is installed on both the feed pipe and the discharge pipe. A vacuum tube is connected to the left side of the cylindrical body, and a vacuum pump is installed on the vacuum tube. A rotating rod is rotatably connected to the inner wall of the cylindrical body. A uniformly distributed stirring rod is fixedly connected to the rotating rod. A motor is fixedly connected to the top of the cylindrical body. The output shaft of the motor passes through the cylindrical body and is fixedly connected to the rotating rod.

[0007] As a further description of the above technical solution:

[0008] Two scrapers are fixedly connected to the rotating rod. Both scrapers are C-shaped, and the outer sides of both scrapers are in contact with the inner wall of the cylinder.

[0009] As a further description of the above technical solution:

[0010] A shaft seal is embedded in the inner wall of the cylinder, and the inner ring of the shaft seal is fixedly connected to the rotating rod.

[0011] As a further description of the above technical solution:

[0012] A filter plate is fixedly connected to the inner wall of the feed pipe, and the filter plate is located to the right of the right solenoid valve.

[0013] As a further description of the above technical solution:

[0014] The top of the feed pipe is connected to a cleaning pipe, and the bottom of the feed pipe is connected to a drain pipe. The cleaning pipe is located on the left side of the filter plate. A solenoid valve is installed on the cleaning pipe, the drain pipe, and the feed pipe.

[0015] As a further description of the above technical solution:

[0016] The front of the cylinder is fixedly connected to a controller that controls the opening and closing of solenoid valve one, vacuum pump, motor, and solenoid valve two.

[0017] Compared with existing technologies, the advantages of this utility model are:

[0018] This solution allows for stirring of the photoresist during vacuum degassing. Stirring promotes faster movement of air bubbles to the surface of the photoresist, making them easier to expand and burst in a vacuum environment, thus improving degassing efficiency. Furthermore, stirring helps the photoresist to distribute evenly within the container, preventing localized bubble aggregation and ensuring a more thorough degassing effect. Attached Figure Description

[0019] Figure 1 One of the perspective views of this utility model;

[0020] Figure 2 This is a second perspective view of the present utility model;

[0021] Figure 3 This is a cross-sectional view of the present invention;

[0022] Figure 4 This is a perspective view of the scraper in this utility model.

[0023] Explanation of the labels in the diagram:

[0024] 1. Cylinder; 2. Feed pipe; 3. Feeding pipe; 4. Discharge pipe; 5. Solenoid valve one; 6. Vacuum pipe; 7. Vacuum pump; 8. Rotating rod; 9. Stirring rod; 10. Motor; 11. Scraper; 12. Shaft seal; 13. Filter plate; 14. Cleaning pipe; 15. Drain pipe; 16. Solenoid valve two; 17. Controller. Detailed Implementation

[0025] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model;

[0026] Please see Figure 1-4In this utility model: a device for removing air bubbles from photoresist includes a cylinder 1. A feed pipe 2 is fixedly connected to the right side of the cylinder 1 and communicates with it. A feeding pipe 3 is connected to the feed pipe 2. A discharge pipe 4 is connected to the left side of the cylinder 1. Solenoid valves 5 are installed on both the feed pipe 2 and the discharge pipe 4. A vacuum pipe 6 is connected to the left side of the cylinder 1. A vacuum pump 7 is installed on the vacuum pipe 6. A rotating rod 8 is rotatably connected to the inner wall of the cylinder 1. A uniformly distributed stirring rod 9 is fixedly connected to the rotating rod 8. A motor 10 is fixedly connected to the top of the cylinder 1. The output shaft of the motor 10 passes through the cylinder 1 and is fixedly connected to the rotating rod 8.

[0027] In this invention, when degassing photoresist, the photoresist is first added through the feeding pipe 3, and then flows into the cylinder 1 through the feeding pipe 2. At this time, the two solenoid valves 5 are closed, and then the vacuum pump 7 is turned on to evacuate the inside of the cylinder 1. Evacuation reduces the air pressure inside the cylinder 1, causing the bubbles in the photoresist to expand and burst due to the pressure difference, thereby removing the bubbles. During the degassing process, the user turns on the motor 10, which drives the rotating rod 8 to rotate. Then, the stirring rod 9 stirs the photoresist. Stirring can make the bubbles in the photoresist move to the surface of the photoresist more quickly, so that they can expand and burst more easily in a vacuum environment, improving the degassing efficiency. Stirring helps the photoresist to be evenly distributed in the cylinder 1, avoiding local bubble aggregation and ensuring a more thorough degassing effect. Stirring can break the tiny bubbles in the photoresist, making them easier to remove by vacuum, thereby improving the overall degassing effect. After the photoresist has been degassed, the air pressure inside the cylinder 1 is restored, and the solenoid valve 5 on the left is opened, allowing the photoresist inside the cylinder 1 to flow out, completing the degassing process of the photoresist.

[0028] Please see Figure 3 Two scrapers 11 are fixedly connected to the rotating rod 8. Both scrapers 11 are C-shaped and their outer sides are in contact with the inner wall of the cylinder 1.

[0029] In this invention, the two scrapers 11 fixedly connected to the rotating rod 8 can scrape off the photoresist adhering to the inner wall of the cylinder 1, improving the effect of removing air bubbles from the photoresist and preventing the photoresist from adhering to the inner wall of the cylinder 1, thus improving the practicality of the device.

[0030] Please see Figure 3 The inner wall of the cylinder 1 is fitted with a shaft seal 12, and the inner ring of the shaft seal 12 is fixedly connected to the rotating rod 8.

[0031] In this invention, the shaft seal 12 can seal the rotating rod 8 and the cylinder 1, thereby improving the practicality of the device.

[0032] Please see Figure 3Among them, a filter plate 13 is fixedly connected to the inner wall of the feed pipe 2, and the filter plate 13 is located to the right of the right solenoid valve 5.

[0033] In this invention, the filter plate 13 can filter the photoresist entering the cylinder 1. The filter plate 13 can intercept large particulate impurities (such as dust, fibers, etc.) in the photoresist, preventing these impurities from entering the photoresist and affecting the coating quality and subsequent processes. The filter plate 13 can prevent large particulate impurities from forming bubble nuclei in the photoresist, thereby reducing bubble formation. The filter plate 13 can ensure the purity of the photoresist and avoid impurities from negatively affecting the performance of the photoresist (such as adhesion, uniformity, etc.).

[0034] Please see Figure 1-3 The feed pipe 2 is connected to a cleaning pipe 14 at the top and a drain pipe 15 at the bottom. The cleaning pipe 14 is located on the left side of the filter plate 13. Solenoid valve 2 16 is installed on the cleaning pipe 14, the drain pipe 15 and the feed pipe 3.

[0035] In this invention, particulate impurities will adhere to the surface of the filter plate 13 after photoresist filtration. At this time, the user closes the right solenoid valve 5 and the solenoid valve 16 on the feeding pipe 3, and opens the remaining solenoid valves 16. The cleaning solution is then added to the feed pipe 2 through the cleaning pipe 14. The cleaning solution will pass through the filter plate 13 in the reverse direction. When the cleaning solution passes through the filter plate 13, it will backwash and clean the filter plate 13. The cleaning solution will carry away the filtered particles and discharge them through the drain pipe 15, thereby completing the cleaning task of the filter plate 13 and improving the practicality of the device.

[0036] Please see Figure 1 and 2 Among them, the front of the cylinder 1 is fixedly connected to a controller 17 that controls the opening and closing of solenoid valve 5, vacuum pump 7, motor 10 and solenoid valve 16.

[0037] In this invention, the controller 17 facilitates the user's control of the opening and closing of the solenoid valve 5, vacuum pump 7, motor 10, and solenoid valve 16, thereby improving the practicality of the device.

[0038] The above are merely preferred embodiments of this utility model; however, the scope of protection of this utility model is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in this utility model, based on the technical solution and its improved concept, should be included within the scope of protection of this utility model.

Claims

1. An apparatus for removing air bubbles from photoresist, comprising a cylindrical body (1), characterized in that: The right side of the cylinder (1) is fixedly connected to a feed pipe (2), and a feeding pipe (3) is connected to the feed pipe (2). The left side of the cylinder (1) is connected to a discharge pipe (4). Solenoid valves (5) are installed on both the feed pipe (2) and the discharge pipe (4). The left side of the cylinder (1) is connected to a vacuum pipe (6), and a vacuum pump (7) is installed on the vacuum pipe (6). A rotating rod (8) is rotatably connected to the inner wall of the cylinder (1). A uniformly distributed stirring rod (9) is fixedly connected to the rotating rod (8). A motor (10) is fixedly connected to the top of the cylinder (1). The output shaft of the motor (10) passes through the cylinder (1) and is fixedly connected to the rotating rod (8). A filter plate (13) is fixedly connected to the inner wall of the feed pipe (2), and the filter plate (13) is located to the right of the right solenoid valve (5). The top of the feed pipe (2) is connected to the cleaning pipe (14), and the bottom of the feed pipe (2) is connected to the drain pipe (15). The cleaning pipe (14) is located on the left side of the filter plate (13). Solenoid valve 2 (16) is installed on the cleaning pipe (14), the drain pipe (15) and the feed pipe (3).

2. The apparatus for removing air bubbles from photoresist according to claim 1, characterized in that: Two scrapers (11) are fixedly connected to the rotating rod (8). Both scrapers (11) are C-shaped and their outer sides are in contact with the inner wall of the cylinder (1).

3. The apparatus for removing air bubbles from photoresist according to claim 1, characterized in that: The inner wall of the cylinder (1) is fitted with a shaft seal (12), and the inner ring of the shaft seal (12) is fixedly connected to the rotating rod (8).

4. The apparatus for removing air bubbles from photoresist according to claim 1, characterized in that: The front of the cylinder (1) is fixedly connected to a controller (17) that controls the opening and closing of solenoid valve one (5), vacuum pump (7), motor (10) and solenoid valve two (16).

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