Hydrogen plasma generating device
The hydrogen plasma generator, using a multi-stage magnetic field module and a proportional controller, solved the problem of plasma instability caused by discontinuous gas introduction, and achieved stable and efficient generation of hydrogen plasma.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-18
- Publication Date
- 2026-04-14
AI Technical Summary
The poor continuity of gas flow in existing hydrogen plasma generators leads to poor plasma confinement and unstable generated plasma.
Employing a multi-stage magnetic field module and proportional controller, and using a dual-path hydrogen feed mode, combined with a hafnium-tungsten composite cathode and surface wave antenna to excite plasma, the magnetic field strength is enhanced and the hydrogen flow rate and ratio are precisely controlled to ensure the stability of the gas supply.
It improves the stability and quality of plasma, ensures the continuous generation of hydrogen plasma, enhances the confinement and density of plasma, and improves generation efficiency.
Smart Images
Figure CN224124299U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of physical hydrogen production technology, and more specifically, it relates to a hydrogen plasma generating device. Background Technology
[0002] Currently, the demand for plasma is increasing in many fields such as material surface treatment, semiconductor processing, and medical applications. Therefore, hydrogen plasma generators are often used to prepare hydrogen plasma. The generator is equipped with electrodes. By applying high voltage or high frequency electric field, hydrogen molecules are ionized under the action of the electric field. After the hydrogen molecules gain sufficient energy, their electrons are stripped off, forming hydrogen ions and free electrons, thereby generating a plasma state.
[0003] In existing technologies, the plasma generated by ionization inside the generator has poor confinement and is prone to diffusion; in addition, the continuous flow of hydrogen gas in the traditional method is poor, and the purity and ratio of the gas injection are not precisely controlled, resulting in poor quality and low stability of the plasma generated inside the generator. Utility Model Content
[0004] The purpose of this invention is to provide a hydrogen plasma generating device, which aims to solve the technical problem that the gas introduced into the existing plasma generator has poor continuity and the generated plasma has poor confinement, resulting in unstable plasma.
[0005] To achieve the above objectives, the technical solution adopted by this utility model is: to provide a hydrogen plasma generating device, comprising:
[0006] Mounting base with a hydrogen processing system on top;
[0007] A reaction chamber, mounted on the mounting base and spaced apart from the hydrogen processing system, is provided on the top of the reaction chamber with multi-level magnetic field modules spaced vertically, which are used to form a magnetic field region within the reaction chamber. A plasma excitation module is connected to the reaction chamber.
[0008] The delivery module includes a proportional controller and two sets of delivery pipelines supported on the mounting base; the inlet end of each delivery pipeline is connected to the outlet end of the hydrogen processing system; the outlet ends of the two delivery pipelines are respectively connected to the opposite sides of the reaction chamber; the proportional controller is used to adjust the gas flow rate and ratio on the two delivery pipelines through a control valve to establish a dual-feed mode of hydrogen in the reaction chamber.
[0009] In one possible implementation, the multi-level magnetic field module includes:
[0010] A primary field is located above the reaction chamber; the primary field is a superconducting solenoid used to generate a magnetic field.
[0011] A secondary field, connected between the top of the reaction chamber and the primary field, is a Halbach permanent magnet array used to enhance the magnetic field strength.
[0012] In some embodiments, the two sets of delivery pipelines are arranged in parallel and extend along the interval between the hydrogen processing system and the reaction chamber, and are located on both sides of the reaction chamber.
[0013] In one possible implementation, the hydrogen processing system includes:
[0014] The controller is mounted on the mounting base and is spaced apart from the reaction chamber;
[0015] A voltage regulator module is located between the controller and the reaction chamber; the inlet of the voltage regulator module is connected to the hydrogen storage device, and the outlet is connected to the two sets of delivery pipelines respectively.
[0016] The controller is also electrically connected to the voltage regulator module to control the flow rate of hydrogen.
[0017] In some embodiments, the voltage regulator module includes:
[0018] A gas flow meter, the inlet of which is connected to the hydrogen storage device; the gas flow meter is electrically connected to the controller.
[0019] The filter is connected to the outlet end of the gas flow meter; the outlet end of the filter is connected to the inlet ends of the two delivery pipelines respectively.
[0020] For example, the voltage stabilizing module further includes an electromagnetic mechanism, which is located between the connection end of the filter and the delivery pipeline, and is used to initially magnetize the delivered hydrogen.
[0021] For example, the filter is provided with a nanoporous palladium permeation membrane for filtering hydrogen, and the pore size of the nanoporous palladium permeation membrane is no greater than 5 nm.
[0022] In one possible implementation, the plasma excitation module includes:
[0023] A hafnium-tungsten composite cathode is connected to the upper side of the reaction chamber and is used to emit electrons into the reaction chamber to excite and maintain the generation of plasma;
[0024] A surface wave antenna, spaced vertically above and below the hafnium-tungsten composite cathode, is used to emit electromagnetic waves into the reaction chamber to excite plasma.
[0025] In some embodiments, the mounting base is further provided with a cooling module, which is connected to the bottom of the reaction chamber and is used to absorb heat inside the reaction chamber.
[0026] For example, the bottom of the reaction chamber is provided with a shock-absorbing seat, and the reaction chamber is connected to the mounting base through the shock-absorbing seat.
[0027] Compared with the prior art, the solution shown in this application uses a multi-level magnetic field module to constrain and guide the movement of the plasma in the reaction chamber, so as to keep the plasma stable in the reaction chamber. Furthermore, this application uses a proportional controller to realize dual-path hydrogen feeding, which provides the required gas raw materials for plasma generation while avoiding the gas supply interruption problem caused by single-path supply. That is, dual-path feeding ensures a continuous gas supply, thereby ensuring a stable pressure of the transported gas, and thus ensuring the continuous generation of hydrogen plasma and maintaining the stability of plasma generation. Attached Figure Description
[0028] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0029] Figure 1 A schematic diagram of the structure of the hydrogen plasma generating device provided in this embodiment of the utility model;
[0030] Figure 2 A schematic diagram of the hydrogen flow path structure of the hydrogen plasma generator provided in this embodiment of the utility model.
[0031] In the diagram: 1. Mounting base; 11. Vibration-proof base; 2. Reaction chamber; 3. Plasma excitation module; 31. Hafnium-tungsten composite cathode; 32. Surface wave antenna; 4. Conveying module; 41. Conveying pipeline; 5. Magnetic field module; 51. Primary field; 52. Secondary field; 6. Controller; 7. Voltage stabilizing module; 71. Gas flow meter; 72. Filter; 73. Electromagnetic mechanism; 8. Hydrogen storage device; 9. Cooling module. Detailed Implementation
[0032] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.
[0033] It should be noted that when an element is referred to as being "set on" another element, it can be directly on or indirectly on that other element. It should be understood that the terms "length," "width," "upper," "lower," "front," "rear," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0034] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a number" means two or more, unless otherwise explicitly specified.
[0035] Please refer to the following: Figure 1 and Figure 2 The hydrogen plasma generating device provided by this utility model will now be described. The hydrogen plasma generating device includes a mounting base 1, a reaction chamber 2, and a delivery module 4; a hydrogen treatment system is provided on the top of the mounting base 1; the reaction chamber 2 is located on the mounting base 1 and is spaced apart from the hydrogen treatment system; a multi-level magnetic field module 5 is provided on the top of the reaction chamber 2 at intervals, which is used to form a magnetic field region in the reaction chamber 2; a plasma excitation module 3 is connected to the reaction chamber 2; the delivery module 4 includes a proportional controller 6 and two sets of delivery pipes 41 supported on the mounting base 1; the inlet end of each delivery pipe 41 is connected to the outlet end of the hydrogen treatment system; the outlet ends of the two delivery pipes 41 are respectively connected to the opposite sides of the reaction chamber 2; the proportional controller 6 is used to adjust the gas flow rate and ratio on the two delivery pipes 41 through a control valve to establish a dual-path hydrogen supply mode in the reaction chamber 2.
[0036] It should be understood that the dual-feed mode established in this application can more precisely control the flow rate and proportion of hydrogen entering the reaction chamber 2, which can greatly improve the accuracy of hydrogen supply, help stabilize the reaction process in the reaction chamber 2, and improve the stability and quality of plasma generation.
[0037] In addition, the reaction chamber 2 and the hydrogen processing system are separated in this application, so that the components are independent of each other but interconnected, which facilitates the assembly, maintenance and coordinated operation of the device.
[0038] It should be noted that the multi-level magnetic field set in this application can enhance the magnetic field strength to achieve effective confinement of the plasma and maintain its stability.
[0039] It should be noted that the proportional controller 6 mainly achieves precise control of the dual-path hydrogen feed mode in the reaction chamber 2 by adjusting the proportional flow rate of the gas on the two delivery pipelines 41. Furthermore, the connection method, working principle, and specific details of the proportional controller 6 are existing technologies and will not be elaborated upon here.
[0040] Compared with the prior art, the hydrogen plasma generating device provided by this utility model uses a multi-level magnetic field module 5 to constrain and guide the movement of plasma in the reaction chamber 2, so as to keep the plasma stable in the reaction chamber 2. In addition, the proportional controller 6 realizes the dual-path feeding of hydrogen gas, which not only provides the gas raw materials required for plasma generation, but also avoids the gas supply interruption problem caused by single-path supply. The dual-path feeding ensures the continuous supply of gas, thereby ensuring the stable pressure of the transported gas, and thus ensuring the continuous generation of hydrogen plasma and maintaining the stability of plasma generation.
[0041] Please see Figure 1 In some possible embodiments, the multi-stage magnetic field module 5 includes a primary field 51 and a secondary field 52; the primary field 51 is located above the reaction chamber 2; the primary field 51 is a superconducting solenoid used to generate a magnetic field; the secondary field 52 is connected between the top of the reaction chamber 2 and the primary field 51, and the secondary field 52 is a Halbach permanent magnet array used to enhance the magnetic field strength.
[0042] In this application, the primary field 51 and the secondary field 52 work together to enhance the magnetic field strength. Furthermore, when multiple magnetic field levels are set, if the number of levels is too large, the magnetic field distribution at the outer edge within the reaction chamber 2 will be relatively weakened. Therefore, the number of magnetic field levels should not be too large. In this application, the primary field 51 generates a magnetic field with a strength of 0.5T ± 0.05T, and the secondary field 52 generates a magnetic field of 1.2T on its surface to further enhance the magnetic field strength. This allows for more efficient confinement and guidance of the plasma movement within the reaction chamber 2, preventing plasma diffusion and thereby improving plasma density and stability, which is beneficial for improving the generation efficiency and quality of hydrogen plasma.
[0043] Please see Figure 1 In some embodiments, two sets of delivery pipelines 41 are arranged in parallel and extend along the interval between the hydrogen processing system and the reaction chamber 2, and are located on both sides of the reaction chamber 2.
[0044] By rationally arranging the location of the delivery pipeline 41, the space within the device can be effectively utilized, while reducing mutual interference between components and improving the reliability and service life of the entire device.
[0045] Specifically, the delivery pipeline 41 is arranged on both sides so that hydrogen can enter the reaction chamber 2 evenly from both sides, which is conducive to the uniform distribution of hydrogen in the reaction chamber 2 and avoids the situation of excessively high or low local hydrogen concentration, thereby improving the uniformity and stability of plasma generation.
[0046] Please see Figure 1 In some possible embodiments, the hydrogen processing system includes a controller 6 mounted on the mounting base 1 and spaced apart from the reaction chamber 2; a pressure stabilizing module 7 is located between the controller 6 and the reaction chamber 2; the inlet of the pressure stabilizing module 7 is connected to the hydrogen storage device 8, and the outlet is connected to two sets of delivery pipelines 41 respectively; wherein the controller 6 is electrically connected to the pressure stabilizing module 7 to control the flow rate of the delivered hydrogen.
[0047] By electrically connecting the controller 6 and the voltage regulator module 7, the pressure of the transported hydrogen can be effectively controlled. Specifically, the pressure of the transported hydrogen can be controlled and adjusted by regulating the flow rate of the transported hydrogen. In this application, by setting the controller 6 and the voltage regulator module 7, the flow rate during the hydrogen transport process is precisely regulated, which helps to improve the stability and quality of plasma generation, and the hydrogen supply parameters can be flexibly adjusted according to actual needs.
[0048] In addition, the controller 6 and the reaction chamber 2 are spaced apart, and the voltage regulator module 7 is located between the controller 6 and the reaction chamber 2. This facilitates signal transmission and functional coordination between the controller 6 and the voltage regulator module 7, and does not interfere with the hydrogen delivery between the voltage regulator and the reaction chamber 2, thereby improving the working efficiency and reliability of the entire hydrogen processing system.
[0049] Please see Figure 1 In some embodiments, the voltage stabilizing module 7 includes a gas flow meter 71 and a filter 72; the inlet of the gas flow meter 71 is connected to the hydrogen storage device 8; the gas flow meter 71 is electrically connected to the controller 6; the filter 72 is connected to the outlet of the gas flow meter 71; and the outlet of the filter 72 is connected to the inlet of the two delivery pipelines 41 respectively.
[0050] The gas flow meter 71 accurately measures the flow rate of hydrogen, providing accurate data support for the flow control of the controller 6. The filter 72 filters the hydrogen, removing impurities and increasing the purity of the hydrogen entering the reaction chamber 2. This helps to improve the quality of plasma generation, reduce the interference of impurities on the plasma generation process, and improve the stability of the plasma.
[0051] Please see Figure 1 For example, the voltage regulator module 7 also includes an electromagnetic mechanism 73, which is located between the filter 72 and the connection end of the delivery pipeline 41. The electromagnetic mechanism 73 is used to initially magnetize the delivered hydrogen.
[0052] After the hydrogen gas is initially magnetized by the electromagnetic mechanism 73, it enters the reaction chamber 2 to form plasma. This makes it easier to confine the plasma through a multi-level magnetic field, which can further improve the stability of the plasma in the magnetic field.
[0053] Please see Figure 1 For example, the filter 72 is provided with a nanoporous palladium permeation membrane for filtering hydrogen, and the pore size of the nanoporous palladium permeation membrane is not greater than 5 nm.
[0054] The nanoporous palladium permeation membrane can effectively filter out tiny impurities in hydrogen gas, ensuring that the hydrogen gas entering reaction chamber 2 has extremely high purity, providing a good foundation for the generation of high-quality hydrogen plasma and reducing the adverse effects of impurities on processes such as ionization during plasma generation.
[0055] Please see Figure 1 In some possible embodiments, the plasma excitation module 3 includes a hafnium-tungsten composite cathode 31 and a surface wave antenna 32; the hafnium-tungsten composite cathode 31 is connected to the upper side of the reaction chamber 2 and is used to emit electrons into the reaction chamber 2 to excite and maintain the generation of plasma; the surface wave antenna 32 is arranged vertically and vertically at intervals with the hafnium-tungsten composite cathode 31 and is used to emit electromagnetic waves into the reaction chamber 2 to excite plasma.
[0056] Among them, the hafnium-tungsten composite cathode 31 serves as the main source of plasma excitation, with a work function of 2.8 eV, and excites and maintains plasma generation by emitting electrons; the surface wave antenna 32 serves as the auxiliary source of plasma excitation, and excites plasma by emitting electromagnetic waves with a frequency of 2.45 GHz and a power of 500-800 W, thereby enhancing the plasma generation efficiency; the two work together to more efficiently excite and maintain plasma generation in the reaction chamber 2, thereby improving the efficiency and stability of plasma generation.
[0057] Please see Figure 1 In some embodiments, the mounting base 1 is also provided with a cooling module 9, which is connected to the bottom of the reaction chamber 2 and is used to absorb the heat in the reaction chamber 2.
[0058] During the plasma generation process, a large amount of heat is generated in the reaction chamber 2. The cooling module 9 is used to absorb and remove this heat, which can effectively control the temperature of the reaction chamber 2, prevent the temperature of the reaction chamber 2 from becoming too high, avoid damage to the device due to excessive temperature, and also help maintain the stability of the reaction conditions in the reaction chamber 2, thereby improving the stability and reliability of plasma generation.
[0059] Please see Figure 1 For example, the bottom of the reaction chamber 2 is provided with a shock-absorbing seat 11, and the reaction chamber 2 is connected to the mounting base 1 through the shock-absorbing seat 11.
[0060] During the plasma generation process, the reaction chamber 2 may vibrate. Vibration not only causes noise pollution but also affects the subsequent plasma generation process. The anti-vibration seat 11 provided in this application can effectively reduce the impact of vibration on the reaction chamber 2, ensure that the reaction process in the reaction chamber 2 is not disturbed by vibration, and improve the stability of plasma generation.
[0061] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A hydrogen plasma generating apparatus, characterized in that, include: Mounting base (1), with a hydrogen treatment system on top; A reaction chamber (2) is mounted on the mounting base (1) and spaced apart from the hydrogen processing system; the top of the reaction chamber (2) is provided with multi-level magnetic field modules (5) spaced vertically, which are used to form a magnetic field region within the reaction chamber (2); a plasma excitation module (3) is connected to the reaction chamber (2); and The delivery module (4) includes a proportional controller (6) and two sets of delivery pipelines (41) supported on the mounting base (1); the inlet end of each delivery pipeline (41) is connected to the outlet end of the hydrogen processing system; the outlet ends of the two delivery pipelines (41) are respectively connected to the opposite sides of the reaction chamber (2); the proportional controller (6) is used to adjust the gas flow rate and ratio on the two delivery pipelines (41) through the control valve to establish a dual-path hydrogen feeding mode in the reaction chamber (2).
2. The hydrogen plasma generating device as described in claim 1, characterized in that, The multi-level magnetic field module (5) includes: A primary field (51) is located above the reaction chamber (2); the primary field (51) is a superconducting solenoid used to generate a magnetic field; A secondary field (52) is connected between the top of the reaction chamber (2) and the primary field (51). The secondary field (52) is a Halbach permanent magnet array, which is used to enhance the magnetic field strength.
3. The hydrogen plasma generating device as described in claim 1, characterized in that, The two sets of delivery pipelines (41) are arranged in parallel and extend along the interval between the hydrogen processing system and the reaction chamber (2), and are located on both sides of the reaction chamber (2).
4. The hydrogen plasma generating apparatus as described in claim 1, characterized in that, The hydrogen processing system includes: The controller (6) is mounted on the mounting base (1) and spaced apart from the reaction chamber (2); A voltage regulator module (7) is located between the controller (6) and the reaction chamber (2); the inlet of the voltage regulator module (7) is connected to the hydrogen storage device (8), and the outlet is connected to the two sets of the delivery pipelines (41) respectively. The controller (6) is also electrically connected to the voltage regulator module (7) to control the flow rate of hydrogen.
5. The hydrogen plasma generating apparatus as described in claim 4, characterized in that, The voltage regulator module (7) includes: The gas flow meter (71) is connected to the hydrogen storage device (8) at its inlet end; the gas flow meter (71) is electrically connected to the controller (6); The filter (72) is connected to the outlet end of the gas flow meter (71); the outlet end of the filter (72) is connected to the inlet ends of the two delivery pipelines (41) respectively.
6. The hydrogen plasma generating apparatus as described in claim 5, characterized in that, The voltage stabilizing module (7) also includes an electromagnetic mechanism (73), which is located between the filter (72) and the connection end of the delivery pipeline (41). The electromagnetic mechanism (73) is used to initially magnetize the delivered hydrogen.
7. The hydrogen plasma generating apparatus as described in claim 5 or 6, characterized in that, The filter (72) is provided with a nanoporous palladium permeation membrane for filtering hydrogen, and the pore size of the nanoporous palladium permeation membrane is no greater than 5 nm.
8. The hydrogen plasma generating apparatus as described in claim 1, characterized in that, The plasma excitation module (3) includes: A hafnium-tungsten composite cathode (31) is connected to the upper side of the reaction chamber (2) and is used to emit electrons into the reaction chamber (2) to excite and maintain the generation of plasma; A surface wave antenna (32) is arranged vertically and vertically with the hafnium-tungsten composite cathode (31) to emit electromagnetic waves into the reaction chamber (2) to excite plasma.
9. The hydrogen plasma generating apparatus as described in claim 1, characterized in that, The mounting base (1) is also provided with a cooling module (9), which is connected to the bottom of the reaction chamber (2) and is used to absorb the heat in the reaction chamber (2).
10. The hydrogen plasma generating apparatus as described in claim 1, characterized in that, The bottom of the reaction chamber (2) is provided with a shock-absorbing seat (11), and the reaction chamber (2) is connected to the mounting base (1) through the shock-absorbing seat (11).