Recovery processing system of mask substrate

Abstract

The utility model belongs to the field of mask substrates, and particularly relates to a recovery processing system of a mask substrate. Comprising a film stripping module, the film stripping module comprises a film stripping container and a clearing container, the clearing container is arranged at the rear end of the film stripping container, film stripping liquid is contained in the film stripping container, and clearing liquid is contained in the clearing container; and the drying module is arranged at the rear end of the film stripping module. The utility model provides a recovery processing system of a mask substrate, and aims to solve the problem of recovery of the mask substrate.

Description

Technical Field

[0001] This utility model belongs to the field of mask substrates, and specifically relates to a mask substrate recycling system. Background Technology

[0002] In many high-tech industries such as semiconductor manufacturing, flat panel displays, and solar cells, photomasks play a crucial role as a core component of photolithography. With the rapid development of technology, the demand for photomasks in these industries continues to rise. However, the large-scale generation of discarded photomasks not only results in a serious waste of resources but also triggers a series of environmental problems.

[0003] During the fabrication, plate-making, and actual use of photomasks, various factors can lead to their scrapping. For example, during manufacturing, if the film thickness is incorrect, there are defects in the substrate film layer, excessive substrate contamination, or too many defects, the photomask will fail to meet the usage requirements. During use, with increased usage, the patterns on the photomask will gradually wear off, or contamination will cause a decrease in lithography accuracy. Furthermore, when technology upgrades and existing photomasks can no longer meet the new process accuracy requirements, they will also be phased out. Statistics show that in semiconductor manufacturing plants, approximately 30%-40% of photomasks are scrapped due to the end of their lifespan or insufficient lithography accuracy; in the flat panel display industry, this proportion is approximately 20%-30%.

[0004] However, the existing technology lacks an effective system for recycling mask substrates, which leads to the waste of discarded mask substrates and causes environmental pollution. Utility Model Content

[0005] This invention provides a mask substrate recycling system, the purpose of which is to solve the problem of mask substrate recycling.

[0006] To achieve the above objectives, this utility model provides a mask substrate recycling system, including...

[0007] include

[0008] A film removal module, comprising a film removal container and a cleaning container, wherein the cleaning container is disposed at the rear end of the film removal container, the film removal container contains film removal liquid, and the cleaning container contains cleaning liquid; and

[0009] A drying module is located at the rear end of the film removal module.

[0010] The stripping module in this solution includes a stripping container and a cleaning container. The stripping container holds stripping solution, and the substrate comes into contact with the solution, causing the film layer on the substrate surface to peel off. The substrate is then placed in the cleaning container to remove any adhering stripping solution, preventing it from being carried into other containers. Finally, the cleaned substrate is dried by a drying module. Through the cooperation of these modules, substrate recycling can be achieved, solving the problems of substrate waste and environmental pollution in existing technologies.

[0011] Preferably, to accommodate substrates coated with multiple film layers, the second embodiment of this scheme provides two or more film removal modules arranged in an orderly manner. This scheme provides two or more film removal modules, each capable of removing different film layers, thereby ensuring that substrates coated with multiple film layers can be recycled.

[0012] Preferably, in order to remove the photoresist film layer, the removal module of this embodiment includes a photoresist film removal module, which includes a photoresist film removal container. This embodiment sets up a photoresist film removal module to remove the photoresist film.

[0013] Preferably, in order to remove the photoresist film layer, the removal module of this embodiment includes a photoresist film removal module, which includes a photoresist film removal container. This embodiment also includes a metal film removal module for removing the metal film.

[0014] Preferably, to achieve better removal of the stripping solution, the cleaning container in this solution is equipped with an ultrasonic cleaner. By incorporating an ultrasonic cleaner into the cleaning container, the cleaning solution vibrates when the substrate is placed inside, resulting in a more effective removal of the stripping solution.

[0015] Preferably, to determine whether the film removal is complete, this solution three further includes a detection module. The detection module includes an ion concentration detector and a controller. The ion concentration detector is disposed in the film removal container and is signal-connected to the controller. This solution configures a detection module in the film removal container to detect the ion concentration in the film removal solution. When the ion concentration in the film removal solution remains unchanged or changes very little, it indicates that the substrate film removal is complete, and the ion concentration detector feeds back the information to the controller.

[0016] Preferably, when the ion concentration in the stripping solution reaches a threshold, it indicates that the stripping solution needs to be replaced. Therefore, the detection module of this scheme three also includes a solution replacement unit, which is signal-connected to the controller. This scheme three uses a solution replacement unit to replace the stripping solution. Therefore, when the ion concentration in the stripping solution reaches a threshold, the solution replacement unit can replace the stripping solution, ensuring that the stripping solution can achieve stripping.

[0017] Preferably, to achieve fluid exchange, the fluid exchange unit of this embodiment includes a discharge device and a replenisher. The discharge device is disposed in the stripping container, and the replenisher is disposed corresponding to the stripping container. In this embodiment, the discharge device discharges the stripping solution from the stripping container, and then the replenisher replenishes the stripping solution into the stripping container. The discharge device and the replenisher work together to complete the fluid exchange.

[0018] Preferably, to ensure timely replenishment of the stripping solution, the liquid exchange unit in this embodiment three further includes a level detector, which is installed in the stripping container and used to detect the liquid level. This embodiment three uses a level detector to detect the level of the stripping solution. Therefore, when the discharge device discharges the stripping solution and the liquid level is below a certain threshold, the replenisher can add the stripping solution into the stripping container.

[0019] Preferably, to achieve substrate movement, this solution further includes a mechanical gripper arm, which is configured corresponding to the film removal module and the drying module, and is used to drive the substrate movement. This solution uses a mechanical gripper arm to drive the substrate movement, resulting in higher substrate movement efficiency.

[0020] The beneficial effects of this invention are as follows: The film removal module in this solution includes a film removal container and a cleaning container. The film removal container contains film removal liquid, and the substrate comes into contact with the film removal liquid, causing the film layer on the substrate surface to be removed. The substrate is then placed in the cleaning container to remove any adhering film removal liquid, preventing the liquid from being carried into other containers. Finally, the cleaned substrate is dried by the drying module. Through the cooperation of the above modules, substrate recycling can be achieved, solving the problems of substrate waste and environmental pollution in the prior art. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the mask substrate recycling system in Example 1.

[0022] Figure 2 This is a schematic diagram of the mask substrate recycling system in Example 2.

[0023] Figure 3 This is a schematic diagram of the mask substrate recycling system in Example 3.

[0024] Figure 4 This is a schematic diagram of the film removal container and detection module in Example 3.

[0025] The reference numerals include: film removal module 1, film removal container 11, cleaning container 12, drying module 2, detection module 3, ion concentration detector 31, liquid exchange unit 32, discharge device 321, replenisher 322, and liquid level detector 323. Detailed Implementation

[0026] To make the objectives, technical solutions, and advantages of the embodiments clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. When the following description refers to the accompanying drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this disclosure. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this disclosure as detailed in the appended claims.

[0027] In this disclosure, unless otherwise stated, directional terms such as "inner" and "outer" are defined based on the contours of the corresponding components. Terms such as "first" and "second" used in this disclosure are for distinguishing one element from another and do not imply sequence or importance.

[0028] Example 1

[0029] The basics are as follows: Figure 1 As shown, a mask substrate recycling system includes a mechanical gripper, a film removal module 1, a drying module 2, and a detection module 3.

[0030] The mechanical gripper in this embodiment is a conventional robotic arm equipped with a gripper mechanism. This gripper mechanism can grasp the fixture containing the substrate and move the fixture. As the fixture moves, the substrate located inside the fixture moves accordingly.

[0031] The stripping module 1 of this embodiment includes a stripping container 11 and a cleaning container 12, both of which can be tanks. The stripping container 11 is positioned at the front end of the cleaning container 12. The substrate first enters the stripping container 11 and then enters the cleaning container 12. The stripping container 11 contains stripping solution, and the cleaning container 12 contains cleaning solution. When the substrate enters the stripping container 11, the coating on the substrate surface is removed by the stripping solution. The substrate then enters the cleaning container 12, where the adhering stripping solution is removed. In this embodiment, the type of stripping solution is specifically adapted to the type of film layer, enabling the stripping solution to remove the coating on the substrate surface. The cleaning solution is specifically water, which contacts the substrate to remove the stripping solution from its surface. To ensure better cleaning results, the cleaning container 12 is equipped with an ultrasonic cleaner. The ultrasonic cleaner causes the cleaning solution to vibrate, resulting in more thorough and effective stripping.

[0032] To ensure timely movement of the substrate from the stripping container 11 to the cleaning container 12, a detection module 3 is provided in the stripping container 11 in this embodiment. The detection module 3 includes an ion concentration detector 31 and a controller. The ion concentration detector 31 is used to detect the ion concentration in the stripping solution inside the stripping container 11. When the ion concentration in the stripping solution stops changing or the change is too small, the ion concentration detector 31 feeds back the information to the controller. The controller is in a signal connection state with the mechanical gripper, and the controller can control the mechanical gripper to remove the substrate from the stripping container 11, and the stripping container 11 enters the cleaning container 12 for stripping solution cleaning. The ion concentration detector 31 can be any detector used in the prior art for detecting ion concentration, while the controller can be a PLC control module, a microcontroller control module, or an industrial control computer control module, etc.

[0033] In this embodiment, the drying module 2 is located at the rear end of the film removal module 1, specifically at the rear end of the cleaning container 12. The drying module 2 is used to remove residual liquid from the substrate surface. The drying module 2 can be a fan, which dries the substrate. Alternatively, the drying module 2 can be a dryer, which dries the substrate.

[0034] The following detailed description illustrates the specific implementation method: During substrate recycling, a mechanical gripper pulls the substrate into the stripping container 11, where the stripping solution removes the film layer from the substrate surface. Afterward, when the ion concentration in the stripping solution stops changing or changes too little, the controller controls the mechanical gripper to remove the substrate from the stripping container 11. The substrate then enters the cleaning container 12, where it is cleaned by the stripping solution. Once the substrate has been cleaned in the cleaning container 12, it is again moved by the mechanical gripper until it reaches the drying module 2, where it is dried.

[0035] Example 2

[0036] This embodiment is an improvement on embodiment 1, such as... Figure 2 As shown, in this embodiment, two stripping modules 1 are configured, namely a photoresist stripping module and a metal film stripping module. The photoresist stripping module is located at the front end of the metal film stripping module. The photoresist stripping module includes a photoresist stripping container and a cleaning container 12. The photoresist stripping container contains a stripping solution, which is a mixture of 96% concentrated sulfuric acid and 31% hydrogen peroxide, and the solution temperature is 120-140°C. The mixture of 96% concentrated sulfuric acid and 31% hydrogen peroxide can achieve the stripping of the photoresist. The cleaning container 12 is located at the rear end of the photoresist stripping container, and the cleaning container 12 also contains water for cleaning the substrate.

[0037] The metal film stripping module is located at the rear end of the photoresist stripping module. The metal film stripping module includes a metal film stripping container and a cleaning container 12. The metal film stripping container contains a stripping solution, which is an ammonium nitrate-cerium composite solution used to strip the metal film. The cleaning container 12 is located at the rear end of the metal film stripping container and also contains clean water for removing the stripping solution.

[0038] Example 3

[0039] This embodiment is an improvement on embodiment 1 or embodiment 2, such as... Figure 3 and Figure 4 As shown, in this embodiment, the detection module also includes a liquid replacement unit 32, which is signal-connected to the controller. When the ion concentration detector 31 detects that the ion concentration in the stripping solution reaches a threshold, the controller controls the liquid replacement unit 32 to replace the stripping solution inside the stripping container 11. The liquid replacement unit 32 in this embodiment includes a discharge device 321, a replenisher 322, and a level detector 323. The discharge device 321 is specifically a discharge valve, which can be a solenoid valve. The discharge valve is located at the lower end of the stripping container 11 and is used to discharge the stripping solution inside the stripping container 11 to the outside. Preferably, there are two level detectors 323, which are located inside the stripping container 11 and are used to detect the upper and lower limits of the stripping solution, respectively. The replenisher 322 is specifically a replenishment valve, which can also be a solenoid valve. The replenishment valve is connected to the stripping solution storage container; when the replenishment valve is open, the stripping solution can flow into the stripping container 11.

[0040] The specific workflow of the liquid exchange unit 32 is described below: When the ion concentration detector 31 detects that the ion concentration in the stripping solution has reached the threshold, the controller controls the discharge valve to operate, discharging the stripping solution inside the stripping container 11 to the outside. Subsequently, when the liquid level inside the stripping container 11 is lower than the threshold, the controller controls the replenishment valve to open, allowing the stripping solution to flow into the stripping container 11. When the liquid level inside the stripping container 11 is higher than the threshold, the controller controls the replenishment valve to close, preventing the stripping solution from overflowing.

[0041] The above descriptions are merely embodiments of this utility model, and common knowledge regarding specific structures and characteristics is not elaborated upon here. It should be noted that those skilled in the art can make various modifications and improvements without departing from the structure of this utility model, and these should also be considered within the scope of protection of this utility model. These modifications will not affect the effectiveness of the implementation of this utility model or the practicality of the patent. The scope of protection claimed in this application shall be determined by the content of its claims, and the specific embodiments described in the specification can be used to interpret the content of the claims.

Claims

1. A mask substrate recycling system, characterized in that: include A film removal module, comprising a film removal container and a cleaning container, wherein the cleaning container is disposed at the rear end of the film removal container, the film removal container contains film removal liquid, and the cleaning container contains cleaning liquid; and A drying module is located at the rear end of the film removal module.

2. The recycling system of claim 1, wherein: The film removal module is configured in two or more ways, and the film removal modules are arranged in an orderly manner.

3. The recycling system of claim 2, wherein: The film removal module includes a photoresist film removal module, which in turn includes a photoresist film removal container.

4. The recycling system of claim 2, wherein: The film removal module includes a metal film removal module, which in turn includes a metal film removal container.

5. The recycling system according to claim 1, characterized in that: The cleaning container is equipped with an ultrasonic cleaner.

6. The recycling system of claim 1, wherein: It also includes a detection module, which includes an ion concentration detector and a controller. The ion concentration detector is disposed in the film removal container and is signal-connected to the controller.

7. The recycling system of claim 6, wherein: The detection module also includes a liquid replacement unit, which is signal-connected to the controller.

8. The recycling system of claim 7, wherein: The liquid exchange unit includes a drainer and a replenisher. The drainer is located in the film removal container, and the replenisher is located in the film removal container.

9. The recycling system of claim 8, wherein: The liquid exchange unit also includes a liquid level detector, which is installed in the film removal container and is used to detect the liquid level height.

10. The recycling system according to any one of claims 1 to 9, characterized in that: It also includes a mechanical gripper, which is configured to correspond to the film removal module and the drying module, and is used to move the substrate.

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