Vapor phase growth apparatus provided with substrate carrier

Abstract

The utility model provides a vapor phase growth apparatus provided with a substrate carrier. The vapor phase growth equipment comprises a substrate carrier, wherein the substrate carrier comprises a bearing groove, a gas guide groove, a gas inlet part and a gas outlet part; the bearing groove is formed in the bearing surface of the substrate carrier and is used for bearing a substrate; the air guide groove is formed in the inner bottom surface of the bearing groove and comprises a first end part close to the center of the inner bottom surface and a second end part far away from the center of the inner bottom surface; the gas inlet part is communicated with the first end part, so that the driving gas provided by the gas inlet part flows towards the corresponding second end part along the extension direction of the gas guide groove so as to drive the substrate to rotate; the exhaust part comprises an exhaust port and an exhaust pipeline which are communicated with each other, the exhaust port is formed in the inner bottom surface of the bearing groove and corresponds to the second end part, and the exhaust pipeline is arranged on the substrate carrier and extends towards the bottom of the substrate carrier, so that the driving gas escaping from the second end part is exhausted towards the bottom of the substrate carrier. According to the invention, the air flotation rotation effect of the substrate is ensured.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing equipment technology, and more particularly to a vapor phase growth apparatus with a substrate carrier. Background Technology

[0002] Chemical vapor deposition (CVD) equipment is a device that uses a gaseous reaction source to deposit solid thin film materials on the surface of a substrate, and it is widely used in the field of semiconductor device fabrication.

[0003] A CVD apparatus includes a substrate carrier that supports the substrate. Process gases are introduced into the substrate area of ​​the substrate carrier, and a deposition reaction occurs under specific temperature and pressure to form a solid film. To improve the temperature uniformity of the substrate and the mixing of the process gases in the vicinity, resulting in a high-quality solid film, spiral-shaped gas guide grooves are provided at the bottom of the recesses on the substrate carrier that support the substrate. Gas channels are provided inside the substrate carrier to introduce driving gases, allowing the driving gases to flow in the gas guide grooves to create an air cushion that supports and rotates the substrate.

[0004] In the prior art, the exhaust port of the driving gas is located on the radial periphery of the spiral gas guide groove. It will exert an attraction on the driving gas in the guide section of the gas guide groove near the exhaust port, thereby causing the driving gas in the gas guide groove to escape. This will cause the airflow in the gas guide groove to be unstable, thus affecting the stability of the substrate rotation and the air-floating rotation effect. Utility Model Content

[0005] The purpose of this application is to provide a vapor phase growth apparatus with a substrate carrier, which is beneficial to ensuring the vapor-floating rotation effect of the substrate.

[0006] To achieve the above objectives, the vapor phase growth apparatus with a substrate carrier provided in this application includes a substrate carrier, which includes a support groove, a gas guide groove, an inlet, and an exhaust section. The support groove is disposed on the support surface of the substrate carrier for supporting the substrate. The gas guide groove is disposed on the inner bottom surface of the support groove and includes a first end near the center of the inner bottom surface and a second end away from the center of the inner bottom surface. The inlet communicates with the first end, allowing the driving gas provided by the inlet to flow along the extension direction of the gas guide groove toward the corresponding second end, thereby driving the substrate to rotate. The exhaust section includes a communicating exhaust port and an exhaust pipe. The exhaust port is disposed on the inner bottom surface of the support groove and corresponds to the second end. The exhaust pipe is disposed on the substrate carrier and extends toward the bottom of the substrate carrier, so that the driving gas escaping from the second end is discharged toward the bottom of the substrate carrier.

[0007] Preferably, the air guide groove further includes a guide section located between the first end and the corresponding second end, defining an airflow vortex extending from the first end to the second end and along the spiral direction of the air guide groove, the exhaust port being located on an extension line of the airflow vortex extending away from the second end, and / or the exhaust port being located in the region between the guide section adjacent to the second end in the radial direction and the extension line.

[0008] Preferably, the air guide groove further includes a flow guide section located between the first end and the corresponding second end, and the distance between the exhaust port and the end face of the second end is less than the distance between the exhaust port and the flow guide section adjacent to the second end in the radial direction.

[0009] Preferably, the air guide groove further includes a guide section located between the first end and the corresponding second end, defining an airflow vortex extending from the first end to the second end and along the spiral direction of the air guide groove, with the end point of the airflow vortex as the center and a first tangent circle tangent to the bottom edge of the bearing groove; when the number of intersections between the guide section adjacent to the second end in the radial direction and the first tangent circle is 0, the exhaust port is located within the area enclosed by the orthographic projection of the first tangent circle onto the inner bottom surface of the bearing groove.

[0010] Preferably, a second tangent circle is defined with the end point of the airflow vortex as the center and tangent to the guide section adjacent to the second end in the radial direction; when the second tangent circle is located within the first tangent circle, the exhaust port is located within the area enclosed by the orthographic projection of the second tangent circle onto the inner bottom surface of the bearing groove.

[0011] Preferably, the radius of the second tangent circle is R, and a positioning circle with a radius of 0.5R is defined with the end point of the airflow vortex as the center. The exhaust port is located in the area enclosed by the orthographic projection of the positioning circle onto the inner bottom surface of the bearing groove.

[0012] Preferably, the airflow vortex is the vortex of the air guide groove, and the endpoint of the airflow vortex is the intersection of the airflow vortex and the end face of the second end.

[0013] Preferably, a tangent to the vortex line that passes through the endpoint of the airflow vortex line, is tangent to the airflow vortex line, and is projected orthogonally onto the inner bottom surface of the bearing groove; and a perpendicular line to the vortex line that passes through the endpoint of the airflow vortex line, is perpendicular to the tangent to the vortex line, and is projected orthogonally onto the inner bottom surface of the bearing groove; the tangent line and the perpendicular line divide the area enclosed by the orthogonal projection of the positioning circle onto the inner bottom surface of the bearing groove into a first quadrant, a second quadrant, a third quadrant, and a fourth quadrant. The first and second quadrants are located on the side of the tangent line near the edge of the bearing groove, the third and fourth quadrants are located on the side of the tangent line away from the edge of the bearing groove, and the first and fourth quadrants are located on the side of the perpendicular line away from the second end; the exhaust port is located within the first quadrant and / or the fourth quadrant.

[0014] Preferably, any one of the first tangent circle, the second tangent circle, and the positioning circle includes an inner exhaust region that overlaps with the air guide groove and an outer exhaust region other than the inner exhaust region, and the exhaust port is disposed in the outer exhaust region and / or the inner exhaust region.

[0015] Preferably, the exhaust port includes an internal exhaust port and an external exhaust port; and the internal exhaust region is provided with at least one internal exhaust port, and / or the external exhaust region is provided with at least one external exhaust port.

[0016] The vapor phase growth apparatus with a substrate support described in this application has the following beneficial effects:

[0017] The air inlet communicates with the first end, allowing the driving gas provided by the air inlet to flow along the extension direction of the air guide groove toward the corresponding second end, thereby driving the substrate to rotate. The exhaust section includes a communicating exhaust pipe and an exhaust port. The exhaust port is located on the inner bottom surface of the bearing groove and is corresponding to the second end. The exhaust pipe is located on the substrate carrier and extends toward the bottom of the substrate carrier, so that the driving gas escaping from the second end is discharged toward the bottom of the substrate carrier. That is, by positioning the exhaust port corresponding to the second end of the air guide groove, the exhaust port is located away from the substrate carrier. The first end, equipped with an air inlet, allows the driving gas, after being input through the air inlet, to flow along the extension direction of the air guide groove towards the corresponding second end, and then exit from the exhaust port. This ensures that the air guide groove corresponding to the exhaust port has a driving gas flow channel as long as possible. This not only facilitates the formation of a support cushion that rotates the substrate, ensuring the substrate's air-floating rotation effect, but also, because the exhaust port is far from other areas of the air guide groove, such as the center, it prevents the driving gas in other areas of the air guide groove from being attracted by the exhaust port and escaping, allowing the air guide groove to maximize its air-floating effect. Conversely, if the exhaust port is positioned close to the center or other areas of the air guide groove, the gas in other areas of the air guide groove is easily attracted by the exhaust port and discharged, thus affecting the substrate's air-floating rotation effect. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the structure of the bearing groove in the substrate carrier according to an embodiment of this application.

[0019] Figure 2 This is a schematic diagram of the structure of the substrate carrier and the substrate according to an embodiment of this application.

[0020] Figure 3 This is a schematic diagram of the substrate carrier in an embodiment of this application.

[0021] Figure 4 This is a schematic diagram of a substrate carrier having one gas guide groove in an embodiment of this application.

[0022] Figure 5 This is a schematic diagram of a substrate carrier with two gas guide grooves in an embodiment of this application.

[0023] Figure 6 This is a schematic diagram of a substrate carrier with four gas guide grooves in an embodiment of this application.

[0024] Figure 7 This is a schematic diagram of a substrate carrier having several gas guide grooves in an embodiment of this application.

[0025] Figure 8This is a schematic diagram of a first arrangement of the exhaust port in the substrate carrier according to an embodiment of this application.

[0026] Figure 9 This is a schematic diagram of a second arrangement of the exhaust port in the substrate carrier according to an embodiment of this application.

[0027] Figure 10 This is a schematic diagram of the structure of the first tangent circle in the substrate carrier according to an embodiment of this application.

[0028] Figure 11 This is a schematic diagram of the structure of the second tangent circle in the substrate carrier according to an embodiment of this application.

[0029] Figure 12 This is a schematic diagram of the positioning circle in the substrate carrier according to an embodiment of this application.

[0030] Figure 13 This is a schematic diagram of a third arrangement of the exhaust port in the substrate carrier according to an embodiment of this application. Detailed Implementation

[0031] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions in the embodiments of this application will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art to which this application pertains. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but does not exclude other elements or objects.

[0032] To overcome the problems existing in the prior art, this application provides a vapor phase growth apparatus with a substrate carrier, which is beneficial to ensuring the air-floating rotation effect of the substrate.

[0033] In some embodiments, reference is made to Figures 1 to 3The vapor phase growth apparatus with a substrate carrier includes a substrate carrier 10, which includes a support groove 1, a gas guide groove 2, an air inlet 3, and an exhaust section (not shown in the figure). The support groove 1 is disposed on the support surface of the substrate carrier 10 to support the substrate 20. The gas guide groove 2 is disposed on the inner bottom surface 11 of the support groove 1, and includes a first end 21 near the center 111 of the inner bottom surface 11 and a second end 22 away from the center 111 of the inner bottom surface 11. The air inlet 3 communicates with the first end 21 to allow air to enter. The driving gas provided by part 3 flows along the extension direction of the gas guide groove 2 toward the corresponding second end 22 to drive the substrate 20 to rotate; the exhaust part (not shown in the figure) includes a communicating exhaust pipe (not shown in the figure) and an exhaust port 4. The exhaust port 4 is disposed on the inner bottom surface 11 of the bearing groove 1 and is disposed corresponding to the second end 22. The exhaust pipe (not shown in the figure) is disposed on the substrate carrier 10 and extends toward the bottom of the substrate carrier 10 so that the driving gas escaping from the second end 22 is discharged toward the bottom of the substrate carrier 10.

[0034] In this embodiment, the air inlet 3 communicates with the first end 21, allowing the driving gas provided by the air inlet 3 to flow along the extension direction of the air guide groove 2 toward the corresponding second end 22, thereby driving the substrate 20 to rotate. The exhaust section includes a communicating exhaust pipe and an exhaust port 4. The exhaust port 4 is disposed on the inner bottom surface 11 of the bearing groove 1 and is correspondingly disposed to the second end 22. The exhaust pipe is disposed on the substrate carrier 10 and extends toward the bottom of the substrate carrier 10, so that the driving gas escaping from the second end 22 is discharged toward the bottom of the substrate carrier 10. That is, by having the exhaust port 4 correspondingly disposed at the second end 22 of the air guide groove 2, By positioning the exhaust port 4 away from the first end 21 where the air inlet 3 is located, the driving gas, after being input from the air inlet 3, can flow along the extension direction of the air guide groove 2 towards the corresponding second end 22, and then exit from the exhaust port 4. This ensures that the air guide groove 2 corresponding to the exhaust port 4 has a driving gas flow channel as long as possible. This not only helps to better form an air cushion that supports and rotates the substrate, ensuring the air-floating rotation effect of the substrate 20, but also, because the exhaust port 4 is far away from other areas of the air guide groove 2, such as the middle of the air guide groove 2, it prevents the driving gas in other areas of the air guide groove 2 from being attracted by the exhaust port 4 and escaping, allowing the air guide groove 2 to maximize its good air-floating effect. Conversely, if the exhaust port is positioned close to the middle of the air guide groove 2 or other areas, the gas in other areas of the air guide groove 2 will be easily attracted by the exhaust port 4 and discharged, thus affecting the air-floating rotation effect of the substrate.

[0035] In some embodiments, reference is made to Figure 1 and Figure 3 The air intake 3 includes a driving gas delivery pipe 31 and an air inlet 32 ​​connected to each other. The driving gas delivery pipe 31 is disposed on the substrate carrier 10, and the air inlet 32 ​​is disposed on the inner bottom surface 11 of the bearing groove 1. Specifically, it is disposed at the first end 21 so as to deliver the driving gas to the air guide groove 2.

[0036] In some embodiments, the exhaust conduit is disposed vertically or obliquely through the substrate carrier 10, which helps to reduce gas exhaust flow resistance and reduce or avoid drive gas escaping to the process reaction area above the substrate. In other embodiments, the substrate carrier 10 further includes a radial exhaust conduit communicating with the exhaust conduit. The radial exhaust conduit extends radially along the substrate carrier 10 and penetrates the outer sidewall 101 and / or the inner sidewall 102 of the substrate carrier 10, such as... Figure 2 As shown, the rotary drive device is adapted to be provided at the edge of the substrate carrier 10 or at the center of the substrate carrier 10, so that the exhaust pipes and components in the original vapor phase growth equipment can be used for exhaust, with less modification to the components in the original vapor phase growth equipment and reduced cost.

[0037] In some embodiments, Figure 2 The substrate 20 shown can also be a substrate support, with several support recesses formed on the substrate support to support each substrate. The driving gas enters the gas guide groove 2 through the driving gas delivery pipe 31 and flows along the gas guide groove 2 to form an air cushion that can support the substrate support. The substrate support rotates around the central axis of the inner bottom surface 11 under the buoyancy of the driving gas, thereby driving each substrate to rotate synchronously.

[0038] In some embodiments, at least one bearing groove 1 is provided. For example, several bearing grooves 1 can be provided, or only one bearing groove 1 can be provided; the specific number is set according to the type, purpose, and process requirements of the vapor phase growth equipment. For example, in some embodiments, five bearing grooves 1 are provided. Figure 2 As shown. In other embodiments, the bearing groove 1 has 6, such as... Figure 3 As shown.

[0039] In some embodiments, at least one air guide groove 2 is provided, and the air guide groove 2 is arranged in a spiral around the center 111 of the inner bottom surface 11.

[0040] The gas guide groove 2 can be provided in one or more forms. The specific number depends on the type, purpose, and process requirements of the vapor phase growth equipment. Its shape, size, and arrangement can be selected according to the process requirements. The goal is to ensure that the driving gas entering the gas guide groove 2 at a certain rate flows within the gas guide groove 2 to form an air cushion, thereby enabling the substrate 20 above it to float and rotate smoothly. The specific implementation method is a conventional technique in the art. For example, in some embodiments, three gas guide grooves 2 are provided on the inner bottom surface 11 of the bearing groove 1. Figure 1 and Figure 3 As shown. In other embodiments, the inner bottom surface 11 of the bearing groove 1 is provided with one, two, four, or several air guide grooves 2, respectively as shown. Figure 4 , Figure 5 , Figure 6 and Figure 7 As shown.

[0041] In some embodiments, reference is made to Figures 1 to 3 , Figures 5 to 7 The air guide groove 2 is provided with at least two, and the first ends 21 of the at least two air guide grooves 2 are evenly distributed circumferentially with the center 111 of the inner bottom surface 11 as the center, and the second ends 22 of the at least two air guide grooves 2 are evenly distributed circumferentially with the center 111 of the inner bottom surface 11 as the center.

[0042] In some embodiments, reference is made to Figures 8 to 12 The air guide groove 2 further includes a flow guide section located between the first end 21 and the corresponding second end 22, defining an airflow vortex 5 extending from the first end 21 to the second end 22 and along the rotation direction of the air guide groove 2.

[0043] In some embodiments, reference is made to Figures 8 to 12 The airflow vortex line 5 is the vortex line of the air guide groove 2. Specifically, the airflow vortex line 5 is the orthographic projection of the vortex line of the air guide groove 2 onto the bottom surface of the bearing groove 1.

[0044] In the embodiments of this application, the vortex line of the air guide groove 2 refers to the characteristic line extending from the first end 21 to the second end 22 of the air guide groove 2 along the extending direction of the air guide groove 2. In some specific embodiments, such as Figure 4 As shown, the air guide groove 2 is spiral-shaped, and its vortex line is its helix. In some specific embodiments, such as Figure 7 As shown, the air guide groove 2 is straight, and its vortex line is a straight line.

[0045] In the embodiments of this application, the air guide groove 2 has several vortex lines, all extending along the extension direction of the air guide groove 2, and the several vortex lines of the air guide groove 2 are arranged parallel to each other within the air guide groove 2. The airflow vortex line 5 can be... Figure 10Any one of the several vortex lines of the air guide groove 2 shown, specifically selected according to the process requirements of the air cushion. In some embodiments, the airflow vortex line 5 is the orthographic projection of the central axis of the air guide groove 2 from the first end 21 to the second end 22 onto the bottom surface of the bearing groove 1, such as... Figure 8 , Figure 9 , Figure 11 and Figure 12 As shown.

[0046] In some embodiments, the endpoint 52 of the airflow vortex 5 is the intersection of the airflow vortex 5 and the end face of the second end 22.

[0047] In the embodiments of this application, since the air guide groove 2 has several vortex lines, the intersection point of the airflow vortex line 5 and the end face of the second end 22, that is, the endpoint 52, also has several.

[0048] In some embodiments, reference is made to Figure 8 and Figure 9 The exhaust port 4 is located on the extension line 51 of the airflow vortex 5 extending away from the second end 22, and / or the exhaust port 4 is located in the region between the guide section adjacent to the second end 22 in the radial direction and the extension line 51. This reduces or prevents the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. At the same time, it ensures that the exhaust port 4 is far away from other areas of the air guide groove 2, such as the middle of the air guide groove 2, preventing the driving gas in other areas of the air guide groove 2 from being attracted by the exhaust port 4 and escaping. It also ensures that the corresponding air guide groove 2 has a driving airflow channel as long as possible, so that the air guide groove 2 can maximize the good air flotation effect. Moreover, it is beneficial to ensure that the gas flowing in each air guide groove 2 is discharged from its corresponding exhaust port 4, avoiding the driving gas being attracted by the exhaust port 4 of other air guide groove 2, which would reduce the air flotation rotation effect.

[0049] In this embodiment, the radially adjacent guide section to the second end 22 is the guide section closest to the second end 22 of the air guide groove 2. Since the air guide groove 2 is arranged in a spiral shape around the center 111 of the inner bottom surface 11, the radially adjacent guide section to the second end 22 can be a guide section of the air guide groove 2 itself, or a guide section of another air guide groove 2. Figure 4 As shown, when an air guide groove 2 is provided on the inner bottom surface 11 of the bearing groove 1, the guide section adjacent to the second end 22 in the radial direction is the guide section that is closer to the second end 22 than the air guide groove 2 itself. Figure 1As shown, when the inner bottom surface 11 of the bearing groove 1 is provided with three air guide grooves 2, which are respectively the first air guide groove 201, the second air guide groove 202 and the third air guide groove 203, the guide section of the first air guide groove 201 that is adjacent to the second end 22 in the radial direction is the guide section of the second air guide groove 202 that is closer to the second end 22 of the first air guide groove 201.

[0050] In some embodiments, reference is made to Figure 8 The exhaust port 4 is located in the region between the guide section adjacent to the second end 22 in the radial direction and the extension line 51, reducing or preventing the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, thus avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. At the same time, since the exhaust port 4 is far away from other areas of the air guide groove 2, such as the middle of the air guide groove 2, it prevents the driving gas in other areas of the air guide groove 2 from being attracted by the exhaust port 4 and escaping, so that the air guide groove 2 can maximize the good air flotation effect.

[0051] In some embodiments, reference is made to Figure 9 The exhaust port 4 includes a first exhaust port 401 and a second exhaust port 402. The first exhaust port 401 is located in the region between the guide section adjacent to the second end 22 in the radial direction and the airflow vortex 5, reducing or preventing the driving gas from overflowing toward the guide section adjacent to the second end 22 in the radial direction, and avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. The second exhaust port 402 is located on the extension line 51 of the airflow vortex 5 extending away from the second end 22. This reduces or prevents the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. Furthermore, it reduces the amount of driving gas escaping through the gap between the outer radial edge of the substrate and the inner wall of the substrate carrier 10, i.e., the bearing groove 1. This reduces or prevents the driving gas from escaping through this gap into the process reaction area above the substrate carrier 10, reducing or preventing the driving gas from disrupting the flow curve of the process gas flow and causing dilution of the process gas, thus improving the stability and uniformity of the process. Simultaneously, it ensures that the gas flowing in each gas guide groove 2 is discharged from its corresponding exhaust port 4, preventing the driving gas from being attracted and affected by the exhaust ports 4 of other gas guide grooves 2, which would reduce the air flotation rotation effect.

[0052] In some embodiments, reference is made to Figure 10A first tangent circle 6, centered on the endpoint 52 of the airflow vortex 5 and tangent to the bottom edge of the bearing groove 1, is provided. When the number of intersections between the guide section adjacent to the second end 22 radially and the first tangent circle 6 is zero, the exhaust port 4 is located within the area enclosed by the orthographic projection of the first tangent circle 6 onto the inner bottom surface 11 of the bearing groove 1. This reduces the amount of driving gas escaping through the gap between the outer radial edge of the substrate and the inner wall of the substrate carrier 10 (i.e., the bearing groove 1), thereby reducing or avoiding the problem of driving gas escaping above the substrate and disrupting the process gas flow field and causing dilution of the process gas. This improves the quality and uniformity of the film formed on the substrate.

[0053] In some embodiments, reference is made to Figure 11 A second tangent circle 7 is defined with the endpoint 52 of the airflow vortex 5 as its center and tangent to the guide section adjacent to the second end 22 in the radial direction. When the second tangent circle 7 is located within the first tangent circle 6, the exhaust port 4 is located within the area enclosed by the orthographic projection of the second tangent circle 7 onto the inner bottom surface 11 of the bearing groove 1. This reduces or prevents the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. Furthermore, it ensures that the gas flowing in each air guide groove 2 is discharged from its corresponding exhaust port 4, preventing the driving gas from being attracted and affected by the exhaust ports 4 of other air guide grooves 2, thus avoiding a reduction in the air flotation rotation effect.

[0054] In some specific embodiments, the air guide groove 2 includes a first air guide groove and a second air guide groove. The airflow vortex 5 of the first air guide groove includes a first airflow vortex, a second airflow vortex, and a third airflow vortex. The endpoints 52 of the first airflow vortex, the second airflow vortex, and the third airflow vortex located on the end face of the second end 22 are respectively the first endpoint, the second endpoint, and the third endpoint. A second tangent circle A is formed with the first endpoint as the center and the distance between the first endpoint and the guide section of the second air guide groove as the radius; a second tangent circle B is formed with the second endpoint as the center and the distance between the second endpoint and the guide section of the second air guide groove as the radius; and a second tangent circle C is formed with the third endpoint as the center and the distance between the third endpoint and the guide section of the second air guide groove as the radius. The exhaust port 4 can then be selected to be located within any one of the second tangent circles A, B, and C, according to the process requirements for the air cushion.

[0055] In some other embodiments, reference is made to Figure 12The radius of the second tangent circle 7 is R. A positioning circle 8 with a radius of 0.5R is defined with the end point 52 of the airflow vortex 5 as the center. The exhaust port 4 is located within the area enclosed by the orthographic projection of the positioning circle 8 onto the inner bottom surface 11 of the bearing groove 1. This reduces or prevents the outflow of driving gas toward the guide section adjacent to the second end 22 in the radial direction, avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. Moreover, it ensures that the gas flowing in each air guide groove 2 is discharged from its corresponding exhaust port 4, which can guarantee that the air guide groove 2 corresponding to the exhaust port 4 has a driving airflow channel as long as possible, avoiding the driving gas being attracted and affected by the exhaust ports 4 corresponding to other air guide grooves 2, thus reducing the air flotation rotation effect.

[0056] In the embodiments of this application, since there are several vortex lines in the air guide groove 2 and several endpoints 52, there are also several first tangent circles 6, second tangent circles 7, and positioning circles 8 centered on the endpoints 52. Specifically, according to the process requirements for the air cushion, any one of the several vortex lines in the air guide groove 2 is selected as the airflow vortex line 5, thereby defining the specific positions of the first tangent circle 6, the second tangent circle 7, and the positioning circle 8.

[0057] In some embodiments, reference is made to Figure 12 Define a vortex tangent 91 that passes through the endpoint 52, is tangent to the airflow vortex 5, and is orthogonally projected onto the inner bottom surface 11 of the bearing groove 1; and a vortex perpendicular 92 that passes through the endpoint 52, is perpendicular to the vortex tangent 91, and is orthogonally projected onto the inner bottom surface 11 of the bearing groove 1. The vortex tangent 91 and the vortex perpendicular 92 divide the area enclosed by the orthogonal projection of the positioning circle 8 onto the inner bottom surface 11 of the bearing groove 1 into a first quadrant region 801, a second quadrant region 802, a third quadrant region 803, and a fourth quadrant region 804. Furthermore, the first quadrant region 801 and the second quadrant region 802 are located on the side of the vortex tangent 91 near the edge of the bearing groove 1, and the third quadrant region 803 and the fourth quadrant region 804 are located on the side of the vortex tangent 91 away from the edge of the bearing groove 1. The first quadrant region 801 and the fourth quadrant region 804 are located on the side of the vortex perpendicular 92 away from the second end 22. The exhaust port 4 is located within the first quadrant region 801 and / or the fourth quadrant region 804. This design ensures that the air guide groove 2 corresponding to the exhaust port 4 has a sufficiently long driving airflow channel, thereby ensuring the air flotation rotation effect while reducing or preventing the driving gas from overflowing towards the radially adjacent guide section of the second end 22, thus avoiding interference with the driving gas in the radially adjacent guide section of the second end 22.

[0058] In some specific embodiments, reference is made to Figure 12The circular structural area enclosed by the positioning circle 8 and its projection onto the inner bottom surface 11 of the bearing groove 1 is divided into four fan-shaped structural areas by the tangent line 91 and the perpendicular line 92 of the vortex line. Two fan-shaped structural areas located away from the second end 22 are respectively situated in the first quadrant 801 and the fourth quadrant 804. The exhaust port 4 is located in at least one of the two fan-shaped areas away from the second end 22.

[0059] In some embodiments, reference is made to Figures 10 to 12 Each of the first tangent circle 6, the second tangent circle 7, and the positioning circle 8 includes an inner exhaust region overlapping with the air guide groove 2 and an outer exhaust region other than the inner exhaust region. The exhaust port 4 is disposed in the outer exhaust region and / or the inner exhaust region. That is, the exhaust port 4 can be located in the inner exhaust region within the air guide groove 2 or in the outer exhaust region, depending on the process requirements and exhaust efficiency needs. This satisfies various usage requirements and helps improve exhaust efficiency. It can also reduce or prevent the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. Moreover, it ensures that the gas flowing in each air guide groove 2 is discharged from its corresponding exhaust port 4, preventing the driving gas from being attracted and affected by the exhaust ports 4 of other air guide grooves 2, thus avoiding a reduction in the air flotation rotation effect.

[0060] In some specific embodiments, reference is made to Figure 10 The first tangent circle 6 includes a first internal exhaust region 61 and a first external exhaust region 62. The first internal exhaust region 61 is the region where the first tangent circle 6 overlaps with the air guide groove 2, and the first external exhaust region 62 is the region of the first tangent circle 6 excluding the first internal exhaust region 61. The exhaust port 4 is disposed in the first external exhaust region 62 and the first internal exhaust region 61.

[0061] In other specific embodiments, reference is made to... Figure 11 The second tangent circle 7 includes a second internal exhaust region 71 and a second external exhaust region 72. The second internal exhaust region 71 is the region where the second tangent circle 7 overlaps with the air guide groove 2. The second external exhaust region 72 is the region of the second tangent circle 7 other than the second internal exhaust region 71. The exhaust port 4 is disposed in the second external exhaust region 72 and the second internal exhaust region 71.

[0062] In some other specific embodiments, reference is made to Figure 12The positioning circle 8 includes a third internal exhaust region 81 and a third external exhaust region 82. The third internal exhaust region 81 is the area where the positioning circle 8 overlaps with the air guide groove 2, and the third external exhaust region 82 is the area of ​​the positioning circle 8 other than the third internal exhaust region 81. The exhaust port 4 is located in the third external exhaust region 82.

[0063] In some embodiments, reference is made to Figure 10 and Figure 11 The exhaust port 4 includes an inner exhaust port 41 and an outer exhaust port 42; and the inner exhaust region is provided with at least one inner exhaust port 41, and / or the outer exhaust region is provided with at least one outer exhaust port 42. This satisfies various usage requirements, helps improve exhaust efficiency, and ensures that the gas flowing in each air guide groove 2 is discharged from its corresponding exhaust port 4, avoiding the driving gas being attracted and affected by the exhaust ports 4 of other air guide grooves 2, thus preventing a reduction in the air flotation rotation effect.

[0064] In some embodiments, the external exhaust region is provided with at least one external exhaust port 42, which ensures that the corresponding air guide groove 2 has a driving airflow channel as long as possible, which is beneficial to better forming an air cushion that supports and rotates the substrate, thus ensuring the air-floating rotation effect of the substrate 20. For example, in some specific embodiments, such as Figure 11 As shown, the second external exhaust region 72 is provided with one external exhaust port 42. In other specific embodiments, such as Figure 10 As shown, the first external exhaust area 62 is provided with a plurality of external exhaust ports 42.

[0065] In other embodiments, the internal exhaust region 42 is provided with at least one internal exhaust port 41, which can reduce or prevent the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, thus avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. For example, in some specific embodiments, such as Figure 10 As shown, the first internal exhaust region 61 is provided with one internal exhaust port 41. In other specific embodiments, such as Figure 11 As shown, the second internal exhaust region 72 is provided with a plurality of internal exhaust ports 41.

[0066] In some embodiments, the exhaust port 4 is, but is not limited to, at least one of a circular structure, an arc-shaped structure, a fan-shaped structure, and a square structure. For example, in some specific embodiments, refer to... Figures 1 to 3 , Figures 5 to 12 The exhaust port 4 has a circular exhaust hole structure. In other specific embodiments, the exhaust port 4 has an arc-shaped structure and is arranged with a certain arc around the second end 22, such as... Figure 12 As shown.

[0067] In some embodiments, the shape and size of the plurality of exhaust ports 4 may be the same or different, depending on the type, purpose, and process requirements of the vapor phase growth equipment. The shape, size, number, and arrangement of the exhaust ports 4 can be selected according to process requirements to improve exhaust efficiency, prevent the escape of driving gas from the gas guide groove 2, and maximize the flotation effect of the gas guide groove 2. For example, in some specific embodiments, refer to Figure 10 The internal exhaust port 41 in the first internal exhaust region 61 and the external exhaust port 42 in the first external exhaust region 62 are of different sizes. In other specific embodiments, see reference... Figure 12 The exhaust port 4 provided in the third external exhaust region 82 includes a first external exhaust port 411 and a second external exhaust port 412. The first external exhaust port 411 and the second external exhaust port 412 have different shapes. The first external exhaust port 411 has an arc-shaped structure, and the second external exhaust port 412 has a circular structure.

[0068] In some embodiments, reference is made to Figure 8 and Figure 13 The distance d1 between the exhaust port 4 and the end face of the second end 22 is less than the distance d2 between the exhaust port 4 and the guide section adjacent to the second end 22 in the radial direction. This reduces or prevents the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. Furthermore, it ensures that the gas flowing in each air guide groove 2 is discharged from its corresponding exhaust port 4, preventing the driving gas from being attracted and affected by the exhaust ports 4 of other air guide grooves 2, thus avoiding a reduction in the air flotation rotation effect.

[0069] In this embodiment, the distance d1 between the exhaust port 4 and the end face of the second end 22 is the shortest distance between the center of the exhaust port 4 and the end face of the second end 22 closest to the exhaust port 4. The distance d2 between the exhaust port 4 and the guide section adjacent to the second end 22 in the radial direction is the shortest distance between the center of the exhaust port 4 and the guide section closest to the exhaust port 4.

[0070] In some embodiments, reference is made to Figure 8When the exhaust port 4 is an external exhaust port, that is, the distance d1 between the external exhaust port and the end face of the second end 22 is less than the distance d2 between the external exhaust port and the guide section adjacent to the second end 22 in the radial direction. Even though the external exhaust port is set close to the end face of the second end 22, it reduces or prevents the driving gas from overflowing towards the guide section adjacent to the second end 22 in the radial direction, avoiding interference with the driving gas in the guide section adjacent to the second end 22 in the radial direction. Moreover, it ensures that the gas flowing in each air guide groove 2 is discharged from its corresponding exhaust port 4, avoiding the driving gas being attracted and affected by the exhaust ports 4 corresponding to other air guide grooves 2, which would reduce the air flotation rotation effect.

[0071] In some embodiments, reference is made to Figure 13 When the exhaust port 4 is an internal exhaust port, the distance d1 between the internal exhaust port and the end face of the second end 22 is less than the distance d2 between the internal exhaust port and the guide section adjacent to the second end 22 in the radial direction. Even if the internal exhaust port is set close to the end face of the second end 22, it can ensure that the corresponding air guide groove 2 has a driving airflow channel as long as possible. This not only helps to better form an air cushion that supports and rotates the substrate, ensuring the air-floating rotation effect of the substrate 20; at the same time, since the exhaust port 4 is far away from other areas of the air guide groove 2, such as the middle of the air guide groove 2, it avoids the driving gas in other areas of the air guide groove 2 being attracted by the exhaust port 4 and escaping, so that the air guide groove 2 can maximize the good air-floating effect.

[0072] While the embodiments of this application have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of this application as set forth in the claims. Furthermore, the application described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A vapor phase growth apparatus with a substrate support, characterized in that, Includes a substrate carrier, the substrate carrier comprising: A bearing groove is provided on the bearing surface of the substrate carrier to support the substrate; An air guide groove is disposed on the inner bottom surface of the bearing groove, the air guide groove including a first end near the center of the inner bottom surface and a second end away from the center of the inner bottom surface; An air inlet is connected to the first end, so that the driving gas provided by the air inlet flows along the extension direction of the air guide groove toward the corresponding second end, thereby driving the substrate to rotate. The exhaust section includes a communicating exhaust port and an exhaust pipe. The exhaust port is disposed on the inner bottom surface of the bearing groove and is corresponding to the second end. The exhaust pipe is disposed on the substrate carrier and extends toward the bottom of the substrate carrier so that the driving gas escaping from the second end is discharged toward the bottom of the substrate carrier.

2. The vapor phase growth apparatus according to claim 1, wherein The air guide groove further includes a guide section located between the first end and the corresponding second end, defining an airflow vortex extending from the first end to the second end and along the spiral direction of the air guide groove, the exhaust port being located on an extension line of the airflow vortex extending away from the second end, and / or the exhaust port being located in the region between the guide section adjacent to the second end in the radial direction and the extension line.

3. The vapor phase growth apparatus according to claim 1, wherein The air guide groove further includes a flow guide section located between the first end and the corresponding second end, and the distance between the exhaust port and the end face of the second end is less than the distance between the exhaust port and the flow guide section adjacent to the second end in the radial direction.

4. The vapor phase growth apparatus according to claim 1, wherein The air guide groove also includes a flow guide section located between the first end and the corresponding second end, defining an airflow vortex line extending from the first end to the second end and along the spiral direction of the air guide groove, with the end point of the airflow vortex line as the center and a first tangent circle tangent to the bottom edge of the bearing groove. When the number of intersections between the guide section adjacent to the second end in the radial direction and the first tangent circle is 0, the exhaust port is located within the area enclosed by the orthographic projection of the first tangent circle onto the inner bottom surface of the bearing groove.

5. The vapor phase growth apparatus according to claim 4, wherein Define a second tangent circle centered at the end of the airflow vortex and tangent to the guide section adjacent to the second end in the radial direction; When the second tangent circle is located within the first tangent circle, the vent is located within the area enclosed by the orthographic projection of the second tangent circle onto the inner bottom surface of the bearing groove.

6. The vapor phase growth apparatus according to claim 5, wherein The radius of the second tangent circle is R. A positioning circle with a radius of 0.5R is defined with the end point of the airflow vortex as the center. The exhaust port is located in the area enclosed by the orthographic projection of the positioning circle onto the inner bottom surface of the bearing groove.

7. The vapor phase growth apparatus according to claim 2 or 4, wherein The airflow vortex is the vortex of the air guide groove, and the endpoint of the airflow vortex is the intersection of the airflow vortex and the end face of the second end.

8. The vapor phase growth apparatus according to claim 6, wherein Define the vortex tangent that passes through the endpoint of the airflow vortex, is tangent to the airflow vortex, and is orthogonally projected onto the inner bottom surface of the bearing groove; and the vortex perpendicular that passes through the endpoint of the airflow vortex, is perpendicular to the vortex tangent, and is orthogonally projected onto the inner bottom surface of the bearing groove. The tangent and perpendicular of the vortex line divide the area enclosed by the orthographic projection of the positioning circle onto the inner bottom surface of the bearing groove into a first quadrant, a second quadrant, a third quadrant, and a fourth quadrant. The first and second quadrants are located on the side of the tangent line closer to the edge of the bearing groove, the third and fourth quadrants are located on the side of the tangent line away from the edge of the bearing groove, and the first and fourth quadrants are located on the side of the perpendicular line away from the second end. The exhaust port is located in the first quadrant and / or the fourth quadrant.

9. The vapor phase growth apparatus according to claim 6, wherein Each of the first tangent circle, the second tangent circle, and the positioning circle includes an inner exhaust region that overlaps with the air guide groove and an outer exhaust region other than the inner exhaust region, and the exhaust port is disposed in the outer exhaust region and / or the inner exhaust region.

10. The vapor phase growth apparatus according to claim 9, wherein The exhaust port includes an internal exhaust port and an external exhaust port; and the internal exhaust region is provided with at least one internal exhaust port, and / or the external exhaust region is provided with at least one external exhaust port.

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