Photoresistance filtering assembly and gluing developing equipment

Abstract

The utility model discloses a photoresist filtering assembly and gluing and developing equipment, and relates to the technical field of semiconductors. The light resistance filtering assembly comprises a filter, a first bubble discharging valve and a three-way valve. The filter is provided with a cavity as well as an inlet, an outlet and a bubble discharge port which are respectively communicated with the cavity, the inlet is communicated with a photoresist bottle of the gluing and developing equipment, and photoresist liquid in the photoresist bottle flows into the cavity from the inlet; the bubble discharging opening is communicated with the first bubble discharging valve, and the first bubble discharging valve is used for discharging bubbles in the photoresist liquid from the bubble discharging opening; the three-way valve comprises a first interface, a second interface and a third interface; the first interface is communicated with an outlet of the filter; the second interface is communicated with a glue spraying nozzle of gluing and developing equipment; a third connector of the three-way valve is connected with a diaphragm pump, and the diaphragm pump is used for discharging bubbles in the photoresist liquid from the third connector. According to the light resistance filtering assembly, the bubble discharging efficiency is improved, and time and labor cost are saved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, and more specifically, to a photoresist filter component and a coating and developing device. Background Technology

[0002] In photoresist coating and developing equipment, filters are used to remove impurities from the photoresist solution. However, prolonged use of the filters can lead to a decrease in filtration efficiency, resulting in unstable photoresist spray volume and increased impurities. This can ultimately prevent the desired film thickness from being achieved and cause excessive particulate matter on the photoresist surface. Therefore, it is necessary to replace the filters regularly and purge the air from the replaced filters to avoid uneven coating.

[0003] Photoresist filters typically include an inlet, an outlet, and an outlet. Currently, the debubbling process is usually done manually, with bubbles being discharged from the outlet. Debubbling can only be performed on the outlet side during maintenance of the coating and developing equipment, which reduces debubbling efficiency and increases labor and time costs due to manual debubbling. Utility Model Content

[0004] The purpose of this invention is to provide a photoresist filter component and a coating and developing equipment, which can improve defoaming efficiency and save time and labor costs.

[0005] The embodiments of this utility model are implemented as follows:

[0006] In one aspect, this utility model provides a photoresist filter assembly, including a filter, a first defoaming valve, and a three-way valve. The filter has a cavity and an inlet, an outlet, and a defoaming port respectively connected to the cavity. The inlet is connected to a photoresist bottle of a coating and developing equipment, and the photoresist liquid in the photoresist bottle flows into the cavity through the inlet. The defoaming port is connected to the first defoaming valve, which is used to discharge air bubbles in the photoresist liquid through the defoaming port. The three-way valve includes a first interface, a second interface, and a third interface. The first interface is connected to the outlet of the filter. The second interface is connected to the spray nozzle of the coating and developing equipment. The third interface of the three-way valve is connected to a diaphragm pump, which is used to discharge air bubbles in the photoresist liquid through the third interface.

[0007] Optionally, a ball valve is rotatably installed inside the three-way valve. The ball valve includes a first passage, a second passage, and a third passage that are interconnected and have a T-shaped structure. The first passage is connected to the first interface, the second passage is connected to the second interface, and the third passage is connected to the third interface. The ball valve is driven to rotate so that the first interface is connected to the second interface and the third interface is blocked. Alternatively, the ball valve is driven to rotate so that the first interface is connected to the third interface and the second interface is blocked.

[0008] Optionally, a quick-connect interface is provided at the third port of the three-way valve, and the diaphragm pump is connected to the third port through the quick-connect interface.

[0009] Optionally, the photoresist filter assembly also includes a waste liquid tank, which is connected to the bubble discharge port of the filter and the third port of the three-way valve, respectively, and the bubbles discharged from the bubble discharge port and / or the third port are introduced into the waste liquid tank.

[0010] Another aspect of this utility model provides a photoresist coating and developing device, including a photoresist bottle, a spray nozzle, and a photoresist filter assembly; the photoresist filter assembly includes a filter and a three-way valve, the photoresist bottle is connected to the inlet of the filter, and the photoresist bottle is used to contain photoresist liquid; the spray nozzle is connected to the second port of the three-way valve, and the photoresist liquid filtered by the filter is sprayed out from the spray nozzle.

[0011] Optionally, the coating and developing equipment also includes a photoresist pump, which is located between the spray nozzle and the second port of the three-way valve.

[0012] Optionally, the coating and developing equipment also includes a back suction valve, which is located between the glue nozzle and the photoresist pump.

[0013] Optionally, the coating and developing equipment also includes a buffer bottle, which is positioned between the photoresist bottle and the filter inlet.

[0014] Optionally, the buffer bottle includes a receiving cavity and a first opening, a second opening, and a third opening respectively connected to the receiving cavity; the receiving cavity is used to contain photoresist liquid, the first opening is connected to the photoresist bottle; the second opening is connected to the inlet of the filter; the third opening is connected to a second degassing valve, which is used to discharge air bubbles in the photoresist liquid in the receiving cavity.

[0015] Optionally, a first sensor is provided between the light resist bottle and the buffer bottle; a second sensor is provided between the buffer bottle and the filter.

[0016] The beneficial effects of this utility model include at least one of the following:

[0017] This application provides a photoresist filter assembly, including a filter, a first debubbling valve, and a three-way valve. The filter has a cavity and an inlet, an outlet, and a debubbling port respectively connected to the cavity. The inlet is connected to the photoresist bottle of a coating and developing equipment, and the photoresist liquid in the photoresist bottle flows into the cavity through the inlet. The debubbling port is connected to the first debubbling valve, which is used to discharge air bubbles in the photoresist liquid through the debubbling port. By setting the first debubbling valve, air bubbles in the filter can be automatically discharged, improving debubbling efficiency and reducing labor and time costs. The three-way valve includes a first interface, a second interface, and a third interface. The first interface is connected to the outlet of the filter; the second interface is connected to the spray nozzle of the coating and developing equipment; the third interface of the three-way valve is connected to a diaphragm pump, which is used to discharge air bubbles in the photoresist liquid through the third interface. The diaphragm pump can change the pump cavity volume through the reciprocating motion of the diaphragm, thereby realizing the automatic intake and discharge of fluid. The three-way valve achieves different functions by controlling the connection and disconnection states between the interfaces. The first port connects to the filter outlet, introducing the filtered photoresist into the three-way valve. The second port connects to the nozzle of the coating and developing equipment, responsible for delivering the photoresist to the coating operation position. The third port is a dedicated air bubble venting channel. When the first and second ports are connected and the third port is blocked, the three-way valve directly delivers the filtered photoresist to the nozzle for normal coating operations. When the first and third ports are connected and the second port is blocked, the three-way valve can de-air the photoresist, venting any air bubbles that may be present through the third port. This flexible switching working mode changes the limitation of traditional filter outlet side air bubble venting only during equipment maintenance, allowing air bubble venting to be performed at any time during equipment operation, further improving de-airing efficiency, ensuring stable photoresist spray volume, effectively avoiding uneven coating caused by air bubbles, and allowing air bubbles to be discharged from the filter outlet and de-airing port, improving de-airing efficiency. When the three-way valve switches to venting mode, air bubbles in the photoresist will enter the third port with the fluid flow. At this time, the diaphragm pump starts working, generating negative pressure in the pump chamber through the reciprocating motion of the diaphragm. This negative pressure allows bubbles to be drawn into the diaphragm pump chamber through the third interface and discharged from the pump body as the diaphragm moves, ultimately entering the waste liquid tank for treatment. The use of a diaphragm pump solves the problem of low efficiency in traditional manual bubble removal methods, further improving the automation and efficiency of bubble removal. The aforementioned photoresist filter component improves bubble removal efficiency, saving time and labor costs.

[0018] This application also provides a photoresist coating and developing apparatus, including a photoresist bottle, a spray nozzle, and a photoresist filter assembly. The photoresist filter assembly includes a filter and a three-way valve. The photoresist bottle is connected to the inlet of the filter and is used to contain the photoresist liquid. The spray nozzle is connected to the second port of the three-way valve, and the photoresist liquid filtered by the filter is sprayed out from the spray nozzle. The above-mentioned photoresist coating and developing apparatus, through the inclusion of the photoresist filter assembly, improves the uniformity of photoresist coating and the product yield. Attached Figure Description

[0019] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is one of the structural schematic diagrams of the coating and developing equipment provided in the embodiments of this utility model;

[0021] Figure 2 This is the second schematic diagram of the structure of the coating and developing equipment provided in the embodiment of this utility model;

[0022] Figure 3 This is the third structural schematic diagram of the coating and developing equipment provided in the embodiments of this utility model;

[0023] Figure 4 A schematic diagram showing the connection between the first and third ports of the three-way valve provided in this embodiment of the utility model;

[0024] Figure 5 A schematic diagram showing the connection between the first and second ports of the three-way valve provided in this embodiment of the utility model.

[0025] Icons: 110-Filter; 111-Inlet; 112-Outlet; 113-Defoaming port; 120-First defoaming valve; 130-Three-way valve; 131-First interface; 132-Second interface; 133-Third interface; 134-Ball valve; 1341-First passage; 1342-Second passage; 1343-Third passage; 140-Diaphragm pump; 150-Quick-connect interface; 160-Waste liquid tank; 161-Central waste liquid tank; 162-Local waste liquid tank; 200-Coating and developing equipment; 210-Photoresist bottle; 220-Spray nozzle; 230-Photoresist pump; 240-Back suction valve; 250-Buffer bottle; 251-First opening; 252-Second opening; 253-Third opening; 260-First sensor; 270-Second sensor; 280-Second defoaming valve. Detailed Implementation

[0026] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. The components of the embodiments of this utility model described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0027] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0028] In the description of this utility model, the indicated orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, or the orientations or positional relationships in which the utility model product is conventionally placed during use. These are used solely for the convenience of describing the utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0029] Furthermore, terms such as "horizontal" and "vertical" do not imply that components must be absolutely horizontal or suspended, but rather that they can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," not that the structure must be completely horizontal, but can be slightly tilted.

[0030] In the description of this utility model, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0031] Please refer to Figure 1 and Figure 2This embodiment provides a photoresist filter assembly, including a filter 110, a first defoaming valve 120, and a three-way valve 130. The filter 110 has a cavity and an inlet 111, an outlet 112, and a defoaming port 113 respectively connected to the cavity. The inlet 111 is connected to the photoresist bottle 210 of the coating and developing equipment 200, and the photoresist liquid in the photoresist bottle 210 flows into the cavity through the inlet 111. The defoaming port 113 is connected to the first defoaming valve 120, which is used to discharge air bubbles in the photoresist liquid through the defoaming port 113. The three-way valve 130 includes a first interface 131, a second interface 132, and a third interface 133. The first interface 131 is connected to the outlet 112 of the filter 110. The second interface 132 is connected to the spray nozzle 220 of the coating and developing equipment 200. The third interface 133 of the three-way valve 130 is connected to a diaphragm pump 140, which is used to discharge air bubbles in the photoresist liquid through the third interface 133.

[0032] Specifically, in view of the problems of low bubble removal efficiency and high cost of existing filters, this embodiment proposes a light-blocking filter assembly. The assembly mainly consists of a filter 110, a first bubble removal valve 120, and a three-way valve 130.

[0033] like Figure 1 and Figure 2 As shown, the filter 110 has an internal cavity for filtering the photoresist. The inlet 111, outlet 112, and degassing port 113 are all connected to the cavity, forming a flow channel for the photoresist. The inlet 111 is connected to the photoresist bottle 210 of the coating and developing equipment 200, and its function is to introduce the photoresist from the bottle 210 into the cavity of the filter 110. The filter 110 filters impurities in the photoresist, preventing them from affecting parameters such as the spray volume and film thickness. After the photoresist flows from the bottle 210 into the cavity through the inlet 111, it completes the impurity filtration process within the cavity, providing pure photoresist for subsequent coating operations.

[0034] like Figure 1 As shown, the bubble removal port 113 is connected to the first bubble removal valve 120, forming a channel for removing air bubbles from the photoresist. During the transport and filtration of the photoresist, air bubbles inevitably get mixed in. If these bubbles are not removed in time, it will lead to uneven coating and affect the working effect of the coating and developing equipment 200. The first bubble removal valve 120 can effectively and promptly remove air bubbles from the photoresist through the bubble removal port 113. Compared with the traditional manual bubble removal method, it has a higher degree of automation, greatly improves the bubble removal efficiency, and reduces the time and labor costs associated with manual operation.

[0035] like Figure 2As shown, the three-way valve 130 has three ports, which achieve different functions by controlling the connection and disconnection states of the ports. The first port 131 is connected to the outlet 112 of the filter 110, introducing the filtered photoresist liquid into the three-way valve 130; the second port 132 is connected to the nozzle 220 of the coating and developing equipment 200, responsible for delivering the photoresist liquid to the coating operation position; the third port 133 is a dedicated air bubble venting channel. When the first port 131 and the second port 132 are connected and the third port 133 is disconnected, the three-way valve 130 directly delivers the filtered photoresist liquid to the nozzle 220 for normal coating operation; when the first port 131 and the third port 133 are connected and the second port 132 is disconnected, the three-way valve 130 can perform air bubble removal treatment on the photoresist liquid, discharging any possible air bubbles from the third port 133. This flexible switching working mode changes the limitation of the traditional filter 110 outlet 112 side only being able to remove air bubbles during equipment maintenance, allowing the air bubble removal operation to be performed at any time during equipment operation, further improving the air bubble removal efficiency, ensuring stable photoresist liquid spray volume, and effectively avoiding the problem of uneven coating caused by air bubbles.

[0036] like Figure 1 As shown, the diaphragm pump 140 provides power for the degassing process of the third port 133. The diaphragm pump 140 can change the pump chamber volume through the reciprocating motion of the diaphragm, thereby realizing the intake and discharge of fluid. In this photoresist filter assembly, the inlet 111 of the diaphragm pump 140 is connected to the third port 133 of the three-way valve 130, and the outlet 112 leads to the waste liquid pool 160, forming a complete bubble transport path.

[0037] When the three-way valve 130 switches to venting mode, air bubbles in the photoresist fluid enter the third port 133 with the fluid flow. At this time, the diaphragm pump 140 starts working, generating negative pressure in the pump chamber through the reciprocating motion of the diaphragm. This negative pressure allows air bubbles to be drawn into the pump chamber of the diaphragm pump 140 from the third port 133 and discharged from the pump body with the movement of the diaphragm, eventually entering the waste liquid tank 160 for treatment. The use of the diaphragm pump 140 solves the problem of low efficiency in traditional manual degassing methods, further improving the automation and efficiency of air bubble removal.

[0038] It should be noted that, in one possible implementation of this application, firstly, as... Figure 4 and Figure 5As shown, a ball valve 134 is rotatably disposed inside the three-way valve 130. The ball valve 134 includes a first passage 1341, a second passage 1342, and a third passage 1343 that are interconnected and have a T-shaped structure. The first passage 1341 is connected to the first interface 131, the second passage 1342 is connected to the second interface 132, and the third passage 1343 is connected to the third interface 133. The ball valve 134 can be driven to rotate so that the first interface 131 is connected to the second interface 132 and the third interface 133 is blocked; or, the ball valve 134 can be driven to rotate so that the first interface 131 is connected to the third interface 133 and the second interface 132 is blocked.

[0039] Specifically, the ball valve 134, which is rotatably mounted inside the three-way valve 130, has a T-shaped structure in the middle, giving it three interconnected passages. The first passage 1341 is connected to the first port 131 of the three-way valve 130, the second passage 1342 is connected to the second port 132, and the third passage 1343 is connected to the third port 133. This connection method provides a basis for controlling the flow direction of the photoresist and bubbles.

[0040] By driving the ball valve 134 to rotate, two different working states can be achieved: such as Figure 5 As shown, when normal coating operation is required, the ball valve 134 is rotated to connect the first port 131 and the second port 132, while blocking the third port 133. At this time, the filtered photoresist can be smoothly transported from the filter 110 outlet 112 through the first port 131, the first passage 1341, the second passage 1342, and the second port 132 to the coating and developing equipment 200 nozzle 220; Figure 4 As shown, when it is necessary to remove air bubbles from the photoresist, the ball valve 134 is driven to rotate again, connecting the first interface 131 and the third interface 133, while blocking the second interface 132. The air bubbles in the photoresist can then be discharged from the filter 110 outlet 112 through the first interface 131, the first passage 1341, the third passage 1343, and the third interface 133. This design overcomes the limitation that traditional filter 110 outlet 112 can only be de-bubbled during equipment maintenance, enabling de-bubbling at any time during equipment operation. This significantly improves de-bubbling efficiency, ensures stable photoresist spray volume, effectively avoids uneven coating caused by air bubbles, and further enhances the working performance and production efficiency of the coating and developing equipment 200.

[0041] Second, such as Figure 1As shown, the photoresist filter assembly also includes a waste liquid tank 160. The waste liquid tank 160 is connected to the bubble discharge port 113 of the filter 110 and the third port 133 of the three-way valve 130, respectively. Bubbles discharged from the bubble discharge port 113 and / or the third port 133 are introduced into the waste liquid tank 160. The waste liquid tank 160 is used to collect the photoresist liquid containing bubbles or simple bubbles discharged during the treatment process, preventing these substances from being randomly discharged and polluting the equipment environment. It also provides a centralized location for possible subsequent waste liquid recycling and treatment. Preferably, the waste liquid tank 160 can be divided into a central waste liquid tank 161 and a local waste liquid tank 162.

[0042] The photoresist filter assembly provided in this application includes a filter 110, a first defoaming valve 120, and a three-way valve 130. The filter 110 has a cavity and an inlet 111, an outlet 112, and a defoaming port 113 respectively connected to the cavity. The inlet 111 is connected to the photoresist bottle 210 of the coating and developing equipment 200, and the photoresist liquid in the photoresist bottle 210 flows into the cavity through the inlet 111. The defoaming port 113 is connected to the first defoaming valve 120, and the first defoaming valve 120 is used to discharge air bubbles in the photoresist liquid through the defoaming port 113. The valve 120 allows for the automatic removal of air bubbles from the filter 110, improving defoaming efficiency and reducing labor and time costs. The three-way valve 130 includes a first port 131, a second port 132, and a third port 133. The first port 131 connects to the outlet 112 of the filter 110; the second port 132 connects to the nozzle 220 of the coating and developing equipment 200; and the third port 133 of the three-way valve 130 is connected to a diaphragm pump 140, which removes air bubbles from the photoresist liquid through the third port 133. The diaphragm pump 140 provides power for the defoaming process at the third port 133. The diaphragm pump 140 changes the pump chamber volume through the reciprocating motion of the diaphragm, thereby achieving automatic fluid intake and discharge. The three-way valve 130 achieves different functions by controlling the connection and disconnection states between the ports. The first port 131 is connected to the outlet 112 of the filter 110, introducing the filtered photoresist into the three-way valve 130; the second port 132 is connected to the nozzle 220 of the coating and developing equipment 200, responsible for delivering the photoresist to the coating operation position; the third port 133 is a dedicated air bubble removal channel. When the first port 131 and the second port 132 are connected and the third port 133 is blocked, the three-way valve 130 directly delivers the filtered photoresist to the nozzle 220 for normal coating operations; when the first port 131 and the third port 133 are connected and the second port 132 is blocked, the three-way valve 130 can remove air bubbles from the photoresist, discharging any existing air bubbles from the third port 133. This flexible switching operating mode changes the limitation of traditional filter 110 outlet 112, which can only remove air bubbles during equipment maintenance. It allows air bubble removal to be performed at any time during equipment operation, further improving removal efficiency, ensuring stable photoresist liquid spray volume, and effectively avoiding uneven coating caused by air bubbles. Simultaneously, it allows air bubbles to be discharged from the photoresist outlet 112 and the air vent 113, improving removal efficiency. When the three-way valve 130 switches to venting mode, air bubbles in the photoresist liquid enter the third port 133 with the fluid flow. At this time, the diaphragm pump 140 starts working, generating negative pressure in the pump chamber through the reciprocating motion of the diaphragm. This negative pressure allows air bubbles to be drawn into the pump chamber of the diaphragm pump 140 from the third port 133 and discharged from the pump body with the movement of the diaphragm, ultimately entering the waste liquid tank 160 for treatment.The use of the diaphragm pump 140 solves the problem of low efficiency in traditional manual bubble removal methods, further improving the automation and efficiency of bubble removal. The aforementioned photoresist filter assembly improves bubble removal efficiency, saving time and labor costs.

[0043] Optionally, such as Figure 1 As shown, a quick-connect interface 150 is provided at the third port 133 of the three-way valve 130, through which the diaphragm pump 140 is connected to the third port 133. The quick-connect interface 150 allows for more flexible configuration of the diaphragm pump 140, ensuring that air bubbles are smoothly and stably transported from the third port 133 to the diaphragm pump 140 during operation, guaranteeing normal exhaust operation. During equipment maintenance or repair, when the diaphragm pump 140 needs to be disassembled, it can be easily separated from the third port 133 via the quick-connect interface 150, significantly saving disassembly time and improving maintenance efficiency. The disassembled diaphragm pump 140 can be cleaned to prevent pipeline blockage and improve the reliability of the light-blocking filter.

[0044] Another aspect of the embodiments of this application, such as Figure 1 As shown, a photoresist coating and developing apparatus 200 is provided, including a photoresist bottle 210, a spray nozzle 220, and a photoresist filter assembly; the photoresist filter assembly includes a filter 110 and a three-way valve 130, the photoresist bottle 210 is connected to the inlet 111 of the filter 110, and the photoresist bottle 210 is used to contain photoresist liquid; the spray nozzle 220 is connected to the second port 132 of the three-way valve 130, and the photoresist liquid filtered by the filter 110 is sprayed out from the spray nozzle 220.

[0045] Specifically, such as Figure 1 As shown, the photoresist bottle 210 is a storage container for the photoresist liquid and is connected to the inlet 111 of the filter 110. Its function is to provide the filter 110 with the photoresist liquid to be processed. Impurities in the photoresist liquid can cause problems such as unstable spray volume, failure to achieve the required film thickness, and excessive particulate matter on the photoresist surface. Through effective filtration by the filter 110, a pure and stable quality photoresist liquid can be provided for subsequent coating operations. The three-way valve 130 is designed to enable flexible delivery of the photoresist liquid and de-air bubble function. It works in conjunction with the filter 110 to ensure the efficient operation of the photoresist liquid processing stage.

[0046] The spray nozzle 220, as the executing component of the coating and developing equipment 200, is connected to the second port 132 of the three-way valve 130. The photoresist liquid, filtered by the filter 110, enters the three-way valve 130 through the first port 131. When the three-way valve 130 is in normal operation, i.e., the first port 131 is connected to the second port 132 and the third port 133 is blocked, the filtered photoresist liquid can flow smoothly from the second port 132 to the spray nozzle 220. The spray nozzle 220 can uniformly and accurately spray the photoresist liquid onto the target substrate. Due to the presence of the photoresist filter assembly, it is ensured that the photoresist liquid entering the spray nozzle 220 is free of impurities and air bubbles, avoiding defects such as uneven coating and inconsistent film thickness caused by photoresist liquid issues. The specific structure and beneficial effects of the photoresist filter assembly have been described in detail above and will not be repeated here.

[0047] The aforementioned coating and developing equipment 200 improves coating uniformity and product yield by incorporating a photoresist filter component.

[0048] For example, such as Figure 3 As shown, the coating and developing equipment 200 also includes a photoresist pump 230, which is located between the spray nozzle 220 and the second port 132 of the three-way valve 130.

[0049] Specifically, in order to further optimize the delivery process of photoresist and ensure the stability and accuracy of the coating and developing process, the coating and developing equipment 200 is specially equipped with a photoresist pump 230, which can provide stable power for the transmission of photoresist.

[0050] The photoresist liquid, after being filtered by filter 110, enters the three-way valve 130 through its first port 131. When the three-way valve 130 is in normal working condition, i.e., when the first port 131 and the second port 132 are connected and the third port 133 is blocked, the photoresist liquid flows out from the second port 132 and directly into the photoresist pump 230. The photoresist pump 230 pressurizes the incoming photoresist liquid, ensuring that it is delivered to the nozzle 220 at a stable pressure and flow rate. This configuration effectively avoids problems such as uneven film thickness and poor coating quality caused by insufficient or unstable photoresist delivery power, which could result in inconsistent amounts of photoresist liquid sprayed from the nozzle 220.

[0051] Optionally, such as Figure 3 As shown, the coating and developing equipment 200 also includes a back suction valve 240, which is located between the spray nozzle 220 and the photoresist pump 230.

[0052] Specifically, the back suction valve 240 can reverse the flow of photoresist. During the coating process, the photoresist pump 230 pressurizes and delivers the photoresist, after being processed by the three-way valve 130 and the filter 110, to the nozzle 220. At this time, the back suction valve 240 is in the normal open state, and the photoresist can flow through the back suction valve 240 to the nozzle 220 to complete the coating process. When the coating process is finished, the back suction valve 240 can reverse the flow of residual photoresist inside the nozzle 220, quickly drawing any residual photoresist that may drip back into the photoresist delivery pipeline, thus preventing the photoresist from dripping onto the substrate and causing problems such as uneven coating and excessive film thickness.

[0053] The coating and developing equipment 200, through the setting of the back suction valve 240, significantly improves the accuracy and quality stability of coating, and reduces the possibility of product quality problems caused by uneven coating.

[0054] For example, such as Figure 3 As shown, the coating and developing apparatus 200 also includes a buffer bottle 250, which is disposed between the photoresist bottle 210 and the inlet 111 of the filter 110.

[0055] Specifically, to avoid the problem of unstable photoresist supply caused by fluctuations in the supply of photoresist directly from the photoresist bottle 210 to the filter 110, the coating and developing equipment 200 is also equipped with a buffer bottle 250, which can temporarily store and regulate the photoresist. The photoresist in the photoresist bottle 210 first flows into the buffer bottle 250, which can stably and evenly supply photoresist to the filter 110 according to the actual needs of the filter 110. When the filtration efficiency of the filter 110 decreases due to long-term use, and the demand for the flow rate and volume of photoresist changes, the photoresist temporarily stored in the buffer bottle 250 can be replenished in time, avoiding equipment operation interruption or uneven coating due to insufficient photoresist supply.

[0056] It should be noted that, in one possible implementation of this application, such as Figure 3 As shown, the buffer bottle 250 includes a receiving cavity and a first opening 251, a second opening 252 and a third opening 253 respectively communicating with the receiving cavity; the receiving cavity is used to contain photoresist liquid, the first opening 251 is connected to the photoresist bottle 210; the second opening 252 is connected to the inlet 111 of the filter 110; the third opening 253 is connected to a second defoaming valve 280, which is used to discharge air bubbles in the photoresist liquid in the receiving cavity.

[0057] During the operation of the coating and developing equipment 200, the photoresist liquid in the photoresist bottle 210 flows into the receiving cavity through the first opening 251. The photoresist liquid output from the photoresist bottle 210 is temporarily stored after entering the receiving cavity to ensure a stable and uniform supply of photoresist liquid according to the actual needs of the filter 110. Simultaneously, the receiving cavity also acts as a buffer; when fluctuations occur in the supply of photoresist liquid to the photoresist bottle 210, the photoresist liquid stored in the receiving cavity can be adjusted, preventing unstable photoresist liquid supply from affecting the filter 110 and the entire coating and developing process, thus ensuring the continuity and stability of the photoresist liquid supply.

[0058] The photoresist, after being temporarily stored and preliminarily regulated in the receiving cavity, flows stably to the filter 110 through the second opening 252. The third opening 253 is connected to the second degassing valve 280, forming a path for the removal of air bubbles from the photoresist within the buffer bottle 250. During the flow of the photoresist from the photoresist bottle 210 into the buffer bottle 250, air bubbles inevitably mix in. The second degassing valve 280 allows these bubbles to be expelled from the buffer bottle 250 through the third opening 253. Compared to traditional manual degassing methods, the second degassing valve 280 achieves automated degassing, significantly improving degassing efficiency, reducing the time and labor costs associated with manual operation, further enhancing the quality of the photoresist, and ensuring the stable operation of the coating and developing equipment 200 and the high-quality output of products.

[0059] In addition, such as Figure 3 As shown, in one possible embodiment of this application, a first sensor 260 is provided between the photoresist bottle 210 and the buffer bottle 250. The first sensor 260 is used to detect whether the photoresist bottle 210 contains photoresist liquid. Once it is detected that the photoresist liquid in the photoresist bottle 210 is about to be exhausted or there is no photoresist, the first sensor 260 will transmit a signal to the control system of the device, thereby reminding the operator to replace the photoresist bottle 210 in time.

[0060] A second sensor 270 is installed between the buffer bottle 250 and the filter 110. The second sensor 270 is used to detect whether the buffer bottle 250 contains photoresist. When the photoresist level in the buffer bottle 250 is detected to be lower than a preset threshold, the second sensor 270 quickly feeds the information back to the equipment control system, which facilitates maintenance personnel to quickly locate the problem and ensures the efficient and stable operation of the coating and developing equipment 200.

[0061] The above description is merely an optional embodiment of this utility model and is not intended to limit the utility model. Various modifications and variations can be made to this utility model by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

[0062] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable way without contradiction. In order to avoid unnecessary repetition, this utility model will not describe the various possible combinations separately.

Claims

1. A light blocking filter assembly, comprising: The system includes a filter (110), a first defoaming valve (120), and a three-way valve (130). The filter (110) has a cavity and an inlet (111), an outlet (112), and a defoaming port (113) respectively connected to the cavity. The inlet (111) is connected to a photoresist bottle (210) of a coating and developing device (200), and the photoresist liquid in the photoresist bottle (210) flows into the cavity through the inlet (111). The defoaming port (113) is connected to the first defoaming valve (120), which is used to defoam the photoresist liquid. The bubbles are discharged from the bubble outlet (113); the three-way valve (130) includes a first port (131), a second port (132) and a third port (133), the first port (131) is connected to the outlet (112) of the filter (110); the second port (132) is connected to the nozzle (220) of the coating and developing equipment (200); the third port (133) of the three-way valve (130) is connected to a diaphragm pump (140), the diaphragm pump (140) is used to discharge the bubbles in the photoresist liquid through the third port (133).

2. The optical blocking filter assembly of claim 1, wherein, A ball valve (134) is rotatably disposed inside the three-way valve (130). The ball valve (134) includes a first passage (1341), a second passage (1342), and a third passage (1343) that are interconnected and have a T-shaped structure. The first passage (1341) is connected to the first interface (131), the second passage (1342) is connected to the second interface (132), and the third passage (1343) is connected to the third interface (133). The ball valve (134) can be driven to rotate so that the first interface (131) is connected to the second interface (132) and the third interface (133) is blocked; or, the ball valve (134) can be driven to rotate so that the first interface (131) is connected to the third interface (133) and the second interface (132) is blocked.

3. The optical blocking filter assembly of claim 1, wherein, The three-way valve (130) has a quick-connect port (150) at its third port (133), and the diaphragm pump (140) is connected to the third port (133) through the quick-connect port (150).

4. The optical blocking filter assembly of claim 1, wherein, The photoresist filter assembly also includes a waste liquid tank (160), which is connected to the bubble discharge port (113) of the filter (110) and the third port (133) of the three-way valve (130), respectively. The bubbles discharged from the bubble discharge port (113) and / or the third port (133) are introduced into the waste liquid tank (160).

5. A gumming and developing apparatus characterized by comprising: The device includes a photoresist bottle (210), a spray nozzle (220), and a photoresist filter assembly as described in any one of claims 1-4. The photoresist filter assembly includes a filter (110) and a three-way valve (130). The photoresist bottle (210) is connected to the inlet (111) of the filter (110), and the photoresist bottle (210) is used to contain photoresist liquid. The spray nozzle (220) is connected to the second port (132) of the three-way valve (130), and the photoresist liquid filtered by the filter (110) is sprayed out from the spray nozzle (220).

6. The gumming and developing apparatus according to claim 5, wherein The coating and developing equipment (200) also includes a photoresist pump (230), which is located between the glue spray nozzle (220) and the second port (132) of the three-way valve (130).

7. The coating and developing equipment according to claim 6, characterized in that, The coating and developing equipment (200) also includes a back suction valve (240), which is disposed between the glue nozzle (220) and the photoresist pump (230).

8. The gumming and developing apparatus according to claim 7, wherein The coating and developing equipment (200) also includes a buffer bottle (250), which is disposed between the photoresist bottle (210) and the inlet (111) of the filter (110).

9. The gumming and developing apparatus according to claim 8, wherein The buffer bottle (250) includes a receiving cavity and a first opening (251), a second opening (252), and a third opening (253) respectively communicating with the receiving cavity; the receiving cavity is used to contain photoresist liquid, the first opening (251) is connected to the photoresist bottle (210); the second opening (252) is connected to the inlet (111) of the filter (110); the third opening (253) is connected to a second degassing valve (280), which is used to discharge air bubbles in the photoresist liquid in the receiving cavity.

10. The gumming and developing apparatus according to claim 8, wherein A first sensor (260) is disposed between the photoresist bottle (210) and the buffer bottle (250); a second sensor (270) is disposed between the buffer bottle (250) and the filter (110).

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