Gate valve device and semiconductor processing equipment

Abstract

The utility model discloses a gate valve device and semiconductor processing equipment, and the gate valve device comprises a valve body which is internally provided with a cavity, a first overflowing opening and a second overflowing opening; the first flow channel is located in the valve body, and the first flow channel is connected with the first flow passing opening; the second flow channel is located in the valve body, and the second flow channel is connected with the second overflowing opening; the valve is located in the cavity, the shape of the valve is matched with that of the cavity, the valve rotates and moves in the cavity, and the valve is in the shape of a ball; and the valve cavity is located in the valve, and the valve cavity penetrates through the valve. According to the gate valve device, the spherical valve body and the cavity matched with the spherical valve body in shape are arranged in the valve body, so that the valve body can rotate and move in the cavity, rapid communication or rapid disconnection between the first flow channel and the second flow channel is controlled by the valve body, and the working efficiency of the gate valve device is improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing, and in particular to a gate valve device and semiconductor processing equipment. Background Technology

[0002] The fully automatic gate valve (AGV) consists of two parts: the valve body and the controller. It uses nitrogen (or compressed air) to control the rapid opening and closing of the valve. The AGV is used to automatically close the valve immediately upon receiving a signal when the dry pump stops unexpectedly. This prevents gas backflow, cavity contamination, and reduced product yield caused by unforeseen dry pump shutdowns.

[0003] However, the performance and efficiency of current gate valve devices still need to be improved. Utility Model Content

[0004] The technical problem solved by this utility model is how to improve the performance and working efficiency of gate valve devices.

[0005] To solve the above-mentioned technical problems, this utility model provides a gate valve device, comprising: a valve body having a cavity, a first flow port, and a second flow port; a first flow channel located within the valve body and connected to the first flow port; a second flow channel located within the valve body and connected to the second flow port; a valve located within the cavity, the shape of the valve matching the shape of the cavity, and the valve rotating within the cavity, wherein the shape of the valve is spherical; and a valve cavity located within the valve and extending through the valve.

[0006] Optionally, there is an internal gap between the valve and the inner wall of the cavity.

[0007] Optionally, the internal gap ranges from 0.2 mm to 0.3 mm.

[0008] Optionally, the orifice diameter of the valve cavity is equal to the orifice diameter of the first flow channel and the orifice diameter of the second flow channel.

[0009] Optionally, the orifice diameter of the valve cavity ranges from 10 cm to 11 cm.

[0010] Optionally, when the valve cavity within the valve rotates to a first position, the valve cavity is adapted to connect the first flow channel and the second flow channel, wherein the first position is the position where the valve cavity coincides with the first flow port and the second flow port; when the valve cavity within the valve rotates to a second position, the valve cavity is adapted to connect a portion of the first flow channel and a portion of the second flow channel, wherein the second position is the position where the valve cavity coincides with a portion of the first flow port and a portion of the second flow port; when the valve cavity within the valve rotates to a third position, the valve is adapted to cut off the first flow channel and the second flow channel, wherein the third position is the position where the valve cavity coincides with the valve body.

[0011] Optionally, the first flow channel opening has a first sealing ring, and the second flow channel opening has a second sealing ring.

[0012] Optionally, the gate valve device further includes a control unit adapted to control the rotation of the valve according to the flow rate of the circulating medium in the first flow channel and the second flow channel.

[0013] Optionally, the circulating medium is a gas or a liquid.

[0014] Optionally, the gate valve device further includes a valve stem that passes through the valve body and is connected to the valve.

[0015] Optionally, the valve body and the valve itself are made of stainless steel.

[0016] Accordingly, this utility model also provides a semiconductor processing equipment, including the gate valve device as described above.

[0017] Compared with the prior art, the technical solution of this utility model embodiment has the following beneficial effects:

[0018] In this utility model, by setting a spherical valve and a cavity matching the shape of the spherical valve in the valve body, the valve can rotate within the cavity to achieve rapid connection or disconnection between the first and second flow channels, thereby improving the working efficiency of the gate valve device. Furthermore, the valve's rotation within the cavity controls the connection or disconnection between the first and second flow channels, preventing waste gas from entering the gate valve or flow channels, improving the gate valve's sealing performance, and thus enhancing the performance of the gate valve device. In addition, since both the valve and the cavity are spherical, they can uniformly bear the stress of the first and second flow channels and withstand high pressure differentials when the flow channels are connected or disconnected, ensuring the integrity of the valve and improving the performance of the gate valve device.

[0019] Furthermore, the valve of this invention has an internal gap between itself and the inner wall of the cavity, which reduces friction between the valve and the inner wall of the cavity when the valve rotates within the cavity, thereby ensuring the integrity of the valve and improving the performance of the gate valve device.

[0020] Furthermore, this utility model provides a first sealing ring on the first flow channel opening and a second sealing ring on the second flow channel opening, so that when the valve rotates within the cavity, the valve and the flow channel are isolated by the sealing ring, preventing the flowing medium from entering the gate valve during rotation, thus improving the sealing performance of the gate valve and thereby improving the performance of the gate valve device.

[0021] Furthermore, this utility model achieves two types of control over the gate valve by setting a control unit to automatically control the rotation of the valve and setting a valve stem to manually control the rotation of the valve stem, thereby improving the accuracy of gate valve control. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the gate valve device in one embodiment;

[0023] Figure 2 This is a cross-sectional structural schematic diagram of the gate valve device in an embodiment of this utility model;

[0024] Figure 3 This is a cross-sectional structural diagram of the valve body in an embodiment of this utility model;

[0025] Figure 4 This is a cross-sectional structural diagram of the valve in an embodiment of this utility model;

[0026] Figure 5 This is a cross-sectional structural diagram of the valve cavity in the gate valve device when rotated to the first position in one embodiment of the present invention;

[0027] Figure 6 This is a cross-sectional structural diagram of the gate valve device when the valve cavity is rotated to the second position in one embodiment of the present invention;

[0028] Figure 7 This is a schematic cross-sectional view of the valve chamber in a gate valve device when it is rotated to the third position in one embodiment of the present invention;

[0029] Figure 8 This is a cross-sectional structural schematic diagram of the gate valve device in another embodiment of the present invention;

[0030] Figure 9 This is a three-dimensional structural schematic diagram of the gate valve device in another embodiment of the present invention. Detailed Implementation

[0031] It should be noted that the terms "surface" and "on" in this specification are used to describe the relative spatial position and are not limited to whether there is direct contact.

[0032] For the current structure of gate valve devices, please refer to [reference needed]. Figure 1 Figure (a) Figure 1 Figure (a) is a cross-sectional schematic diagram of the gate valve device, which includes: a valve body, the valve body including a first sub-valve seat 100 and a second sub-valve seat 101; a protective ring 102, the protective ring 102 being mounted on the second sub-valve seat 101 and being retractable between the first sub-valve seat 100 and the second sub-valve seat 101; and a gate 103, the gate 103 being retractable between the first sub-valve seat 100 and the second sub-valve seat 101.

[0033] In this embodiment, the first sub-valve seat 100 is connected to the first flow channel (not shown in the figure), and the second sub-valve seat 101 is connected to the second flow channel (not shown in the figure).

[0034] Figure 1 Figure (a) to Figure 1 Figure (e) is a cross-sectional schematic diagram of the gate valve device.

[0035] The working process of the gate valve device is as follows: Figure 1 In Figure (a), the gate 103 is located outside the valve body, and the protective ring 102 is located on the second sub-valve seat 101; Figure 1 Based on Figure (a) Figure 1 In Figure (b), the gate 103 moves onto the first sub-valve seat 100; Figure 1 Based on the middle (b) diagram, refer to Figure 1 In Figure (c), the protective ring 102 rises to connect with the gate 103 to completely shut off the channel between the first sub-valve seat 100 and the second sub-valve seat 101, thereby achieving the cut-off state of the valve body.

[0036] exist Figure 1 Based on the reference in Figure (c) Figure 1 In Figure (d), the protective ring 102 descends to be flush with the edge of the first sub-valve seat 100; Figure 1 Based on the middle (d) diagram, refer to Figure 1 In Figure (e), the gate 103 moves outside the valve body to fully open the channel between the first sub-valve seat 100 and the second sub-valve seat 101, thereby realizing the connected state of the valve body.

[0037] In the above schemes, during the process of connecting and disconnecting the valve body, the two sealing surfaces of the gate 103 and the first sub-valve seat 100 in contact with each other rub against each other, which can easily cause damage. At high temperatures, this may cause scratches, affecting the sealing performance and service life of the valve body. At the same time, the maintenance of the valve body is also relatively difficult. Therefore, the service life of the valve body in the above schemes is relatively short.

[0038] Furthermore, in the above scheme, the connection and disconnection process of the valve body requires the simultaneous movement of the protective ring 102 and the gate 103 to ensure the complete opening or closing of the valve body. The connection and disconnection process takes about 0.2 seconds, resulting in a long connection and disconnection time, which affects the working efficiency of the gate valve. Moreover, the connection and disconnection in the above scheme requires the cooperation of both the protective ring 102 and the gate 103, but the protective ring 102 is prone to sealing problems during its extension and retraction movement, allowing exhaust gas to enter the valve body, causing cavity contamination and reducing the yield rate.

[0039] To address the aforementioned technical problems, this utility model provides a gate valve device. By incorporating a spherical valve and a cavity matching the shape of the spherical valve within the valve body, the valve can rotate within the cavity, enabling rapid connection or disconnection between the first and second flow channels, thus improving the working efficiency of the gate valve device. Furthermore, the valve's rotation within the cavity controls the connection or disconnection between the first and second flow channels, preventing waste gas from entering the gate valve or flow channels, improving the gate valve's sealing performance, and consequently enhancing the performance of the gate valve device. In addition, the spherical shape of both the valve and the cavity allows for uniform stress distribution between the first and second flow channels, and enables the device to withstand high pressure differentials when the flow channels are connected or disconnected, ensuring valve integrity and further improving the performance of the gate valve device.

[0040] To make the above-mentioned objectives, features and beneficial effects of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings.

[0041] Please refer to Figures 2 to 4This utility model provides a gate valve device, comprising: a valve body 200, wherein the valve body 200 has a cavity 2001, a first flow port 2004, and a second flow port 2005; a first flow channel 201, wherein the first flow channel 201 is located within the valve body 200 and is connected to the first flow port 2004; a second flow channel 202, wherein the second flow channel 202 is located within the valve body 200 and is connected to the second flow port 2005; a valve 203, wherein the valve 203 is located within the cavity 2001, the shape of the valve 203 matches the shape of the cavity 2001, and the valve 203 rotates within the cavity 2001, wherein the shape of the valve 203 is spherical; and a valve cavity 2031, wherein the valve cavity 2031 is located within the valve 203 and extends through the valve 203.

[0042] The gate valve device is used to control the flow of the medium in the flow channel, ensuring that the medium can be supplied quickly and accurately when needed, and to close quickly when not needed to prevent leakage of the medium; in CVD (chemical vapor deposition) and ETCH (etching) processes, it prevents the backflow of the medium and contamination of the cavity.

[0043] The valve 203 and the inner wall of the cavity 2001 form an internal gap.

[0044] In a specific embodiment of this utility model, the range of the internal gap is 0.2mm to 0.3mm.

[0045] This invention provides an internal gap between the valve 203 and the inner wall of the cavity 2001, thereby reducing friction between the valve 203 and the inner wall of the cavity 2001 when the valve 203 rotates within the cavity 2001, thus ensuring the integrity of the valve 203 and improving the performance of the gate valve device.

[0046] In some embodiments of this utility model, the orifice diameter of the valve cavity 2031 is equal to the orifice diameter of the first flow channel 201 and the orifice diameter of the second flow channel 202.

[0047] In a specific embodiment of this utility model, the orifice diameter of the valve cavity 2031 ranges from 10 cm to 11 cm.

[0048] In some embodiments of this utility model, the first flow channel 201 port has a first sealing ring 2002, and the second flow channel 202 port has a second sealing ring 2003.

[0049] In a specific embodiment of this utility model, the first sealing ring 2002 and the second sealing ring 2003 are made of elastic material, such as PTFE (polytetrafluoroethylene).

[0050] This invention provides a first sealing ring 2002 at the opening of the first flow channel 201 and a second sealing ring 2003 at the opening of the second flow channel 202. This ensures that when the valve 203 rotates within the cavity 2001, the valve 203 is isolated from the flow channel by the sealing ring, preventing the flowing medium from entering the gate valve during rotation. This improves the sealing performance of the gate valve and thus enhances the performance of the gate valve device.

[0051] In some embodiments of this utility model, the valve body 200 and the valve 203 are made of stainless steel.

[0052] In some embodiments of this utility model, the opening and closing time of the gate valve device ranges from 0.05s to 0.1s.

[0053] The valve 203 is spherical in shape, that is, the valve is a ball valve. The ball valve bears the pressure of the first flow channel and the second flow channel more evenly in the valve body, ensuring the stability and reliability of the ball valve.

[0054] In the above solution, this utility model provides a spherical valve 203 and a cavity 2001 matching the shape of the spherical valve 203 within the valve body 200. This allows the valve 203 to rotate within the cavity 2001, enabling rapid connection or disconnection between the first flow channel 201 and the second flow channel 202, thereby improving the working efficiency of the gate valve device. Furthermore, the valve 203's rotation within the cavity 2001 controls the connection or disconnection between the first flow channel 201 and the second flow channel 202, preventing exhaust gas from entering the gate valve or flow channels, improving the gate valve's sealing performance, and thus enhancing the performance of the gate valve device. In addition, both the valve 203 and the cavity 2001 are spherical, allowing for uniform stress distribution between the first flow channel 201 and the second flow channel 202, and the ability to withstand high pressure differentials when the flow channels are connected or disconnected, ensuring the integrity of the valve 203 and improving the performance of the gate valve device.

[0055] Please refer to Figure 5 The gate valve device further includes a control unit 204, which is adapted to control the rotation of the valve 203 according to the flow rate of the medium flowing in the first flow channel 201 and the second flow channel 202.

[0056] In some embodiments of this utility model, the control unit 204 is a PLC system.

[0057] In some embodiments of this utility model, the PLC system includes: a central processing unit (CPU) for executing control programs, processing input signals, and outputting control commands; an input module for receiving signals from sensors and external devices, such as pressure sensor signals, flow sensor signals, and pump status signals; an output module for sending processed control commands to actuators, such as drive devices and solenoid valves; a power supply module for providing a stable power supply to the PLC system to ensure its normal operation; and a communication module for exchanging data and communicating with other devices or systems, such as communicating with a host computer or a remote monitoring system.

[0058] In a specific embodiment of this utility model, the pump status signal is characterized as follows: when the pump stops abnormally, the pump will send a signal to the PLC system; the pressure sensor signal is used to monitor the pressure change in the flow channel to ensure that the pressure is within a safe range; the flow sensor signal is used to monitor the gas flow rate to ensure that the flow rate meets the process requirements.

[0059] In a specific embodiment of this utility model, the working process of the PLC system is as follows: receiving the pressure sensor signal, the flow sensor signal, and the pump status signal; when the PLC receives a signal of abnormal pump shutdown, it will immediately issue a command to close the gate valve device to prevent gas backflow; when the PLC detects abnormal pressure in the flow channel, it will adjust the opening of the gate valve device or close the gate valve device according to a preset program to maintain the stability of the pressure in the flow channel; when the PLC detects abnormal gas flow, it will issue an alarm signal or adjust the opening of the gate valve device to ensure the normal operation of the process; the PLC system sends the processed control commands to the actuator through the output module. For example, the commands issued by the PLC system are transmitted to the drive device, and the drive device drives the valve 203 to rotate to the corresponding position according to the commands.

[0060] In this embodiment, the PLC system has a fast response capability, capable of processing input signals and issuing control commands within milliseconds to ensure rapid opening and closing and precise control of the gate valve device; the PLC system also has high reliability, capable of stable operation in various harsh environments; and the PLC system also has fault handling capability, capable of detecting abnormal conditions in the system and taking corresponding measures.

[0061] In some embodiments of this utility model, when the valve cavity 2031 in the valve 203 is rotated to the first position, the valve cavity 2031 is adapted to connect the first flow channel 201 and the second flow channel 202, wherein the first position is the position where the valve cavity 2031 coincides with the first flow port 2004 and the second flow port 2005.

[0062] The medium in question is either a gas or a liquid.

[0063] In a specific embodiment of this utility model, when the extension direction of the valve cavity 2031 is parallel to the extension direction of the first flow channel 201 and the extension direction of the second flow channel 202, the gate valve device is in the open state, that is, the first flow channel 201 and the second flow channel 202 are connected, and the circulating medium can flow from the first flow channel 201 to the second flow channel 202 through the valve cavity 2031.

[0064] Please Figure 5 Based on reference Figure 6 When the valve cavity 2031 in the valve 203 is rotated to the second position, the valve cavity 2031 is adapted to connect a portion of the first flow channel 201 and a portion of the second flow channel 202, wherein the second position is the position where the valve cavity 2031 coincides with a portion of the first flow port 2004 and a portion of the second flow port 2005.

[0065] In a specific embodiment of this utility model, the flow rate of the circulating medium from the first flow channel 201 to the second flow channel 202 is controlled by controlling the size of the overlapping portion of the valve cavity 2031 with a portion of the first flow port 2004 and a portion of the second flow port 2005. Specifically, the larger the overlapping portion of the valve cavity 2031 with a portion of the first flow port 2004 and a portion of the second flow port 2005, the larger the flow rate of the circulating medium from the first flow channel 201 to the second flow channel 202; conversely, the smaller the overlapping portion of the valve cavity 2031 with a portion of the first flow port 2004 and a portion of the second flow port 2005, the smaller the flow rate of the circulating medium from the first flow channel 201 to the second flow channel 202.

[0066] Please Figure 6 Based on reference Figure 7 When the valve cavity 2031 inside the valve 203 rotates to the third position, the valve 203 is adapted to cut off the first flow channel 201 and the second flow channel 202, wherein the third position is the position where the valve cavity 2031 coincides with the valve body 200.

[0067] In a specific embodiment of this utility model, when the valve cavity 2031 is in complete contact with the inner surface of the valve body 200, the channel inside the valve cavity 2031 is closed, and the gate valve device is in a closed state. That is, the first flow channel 201 and the second flow channel 202 are cut off by the valve 203, the flowing medium cannot pass through the valve cavity 2031, and the flowing medium in the first flow channel 201 cannot flow into the second flow channel 202, thereby achieving isolation between the first flow channel 201 and the second flow channel 202.

[0068] Please refer to Figure 8 as well as Figure 9 The gate valve device further includes a valve stem 304, which passes through the valve body 200 and is connected to the valve 203.

[0069] In some embodiments of this utility model, the valve stem 304 is used to transmit external rotational motion to the valve 203, causing the valve 203 to rotate; the valve stem 304 also includes a handwheel (not shown in the figure), which is a manually operated device, and the rotation of the valve stem 304 and the ball is driven by rotating the handwheel.

[0070] In a specific embodiment, the valve stem 304 is moved by rotating the handwheel, thereby driving the valve stem 304 and its rotation to open and close the gate valve device.

[0071] In this embodiment, the gate valve device can be opened and closed by rotating the handwheel, which is simple and convenient to operate. The manually operated gate valve device has a simple structure and low cost, making it suitable for some occasions with low automation requirements. In addition, the manually operated gate valve device does not have complex electronic components and control systems, so it has high reliability and is easy to maintain.

[0072] In other embodiments of this utility model, the gate valve device has a control unit 204 and a gate lever. The two control methods are interlocked and cannot be operated simultaneously, thereby protecting the gate valve device and preventing damage to the valve 203 inside the gate valve device from simultaneous operation.

[0073] In the above scheme, this utility model automatically controls the rotation of the valve 203 by setting a control unit 204, and manually controls the rotation of the valve stem 304 by setting the valve stem 304, thereby achieving two types of control of the gate valve and improving the accuracy of gate valve control.

[0074] Accordingly, this utility model also provides a semiconductor processing equipment, including the gate valve device described above.

[0075] In some embodiments of this utility model, the semiconductor processing equipment is a dry etching equipment. Specifically, the flow medium in the gate valve device is a volatile byproduct generated by the chemical reaction between the reactive gas and the silicon wafer material during the plasma etching process. The components of the flow medium include one or more combinations of fluorine / chlorine compounds (such as CF4, SF6, Cl2, BCl3) and acidic gases (HF, HCl).

[0076] In some other embodiments of this utility model, the semiconductor processing equipment is a chemical vapor deposition equipment. Specifically, the flow medium in the gate valve device is gas and byproducts that have not fully reacted during the CVD deposition process. The components of the flow medium include one or more combinations of unreacted silicon source gases (such as SiH4, TEOS), greenhouse gases (NF3, CF4), and particulate matter (nanoscale dust).

[0077] In some other embodiments of this utility model, the semiconductor processing equipment is an ion implanter. Specifically, the composition of the circulating medium in the gate valve device includes one or more combinations of dopant gases (such as BF3, AsH3, PH3), fluorides, and hydrides.

[0078] In summary, the present invention, by incorporating a spherical valve and a cavity matching the shape of the spherical valve within the valve body, allows the valve to rotate within the cavity, enabling rapid connection or disconnection between the first and second flow channels, thereby improving the working efficiency of the gate valve device. Furthermore, the valve's rotation within the cavity controls the connection or disconnection between the first and second flow channels, preventing waste gas from entering the gate valve or flow channels, improving the gate valve's sealing performance, and thus enhancing the performance of the gate valve device. In addition, the spherical shape of both the valve and the cavity allows for uniform stress distribution between the first and second flow channels, and enables the valve to withstand high pressure differentials during flow channel connection or disconnection, ensuring valve integrity and improving the performance of the gate valve device.

[0079] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A gate valve apparatus, characterized by, include: The valve body has a cavity, a first flow port, and a second flow port. The first flow channel is located within the valve body and is connected to the first flow port; The second flow channel is located inside the valve body and is connected to the second flow port; A valve located within the cavity, the shape of the valve matching the shape of the cavity, and the valve rotating within the cavity, wherein the shape of the valve is spherical; A valve cavity, which is located inside the valve and extends through the valve.

2. The gate valve apparatus of claim 1, wherein, There is an internal gap between the valve and the inner wall of the cavity.

3. The gate valve apparatus of claim 2, wherein, The range of the internal gap is 0.2 mm to 0.3 mm.

4. The gate valve apparatus of claim 1, wherein, The orifice diameter of the valve cavity is equal to the orifice diameter of the first flow channel and the orifice diameter of the second flow channel.

5. The gate valve apparatus of claim 1, wherein, The orifice diameter of the valve cavity ranges from 10cm to 11cm.

6. The gate valve apparatus of claim 1, wherein, When the valve cavity inside the valve is rotated to the first position, the valve cavity is adapted to connect the first flow channel and the second flow channel, wherein the first position is the position where the valve cavity coincides with the first flow port and the second flow port; When the valve cavity inside the valve is rotated to the second position, the valve cavity is adapted to connect a portion of the first flow channel and a portion of the second flow channel, wherein the second position is the position where the valve cavity coincides with a portion of the first flow port and a portion of the second flow port; When the valve cavity inside the valve is rotated to the third position, the valve is adapted to cut off the first flow channel and the second flow channel, wherein the third position is the position where the valve cavity and the valve body coincide.

7. The gate valve apparatus of claim 1, wherein, The first flow channel opening has a first sealing ring, and the second flow channel opening has a second sealing ring.

8. The gate valve apparatus of claim 1, wherein, Also includes: A control unit, adapted to control the rotation of the valve based on the flow rate of the medium flowing in the first and second flow channels.

9. The gate valve apparatus of claim 8, wherein, The circulating medium is a gas or a liquid.

10. The gate valve device as claimed in claim 8, characterized in that, Also includes: A valve stem that extends through the valve body and is connected to the valve.

11. The gate valve apparatus of claim 1, wherein, The valve body and the valve itself are made of stainless steel.

12. A semiconductor processing apparatus, characterized by comprising: Includes the gate valve device as described in any one of claims 1 to 11.

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