Liquid water quality adjusting device for solid nuclear track etching experiment
By installing a conductivity sensor and multiple water pipes at the top of the etching tank to regulate the liquid water quality, the problem of etching solution concentration measurement error was solved, achieving precise control of etching solution concentration and improving experimental efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- GUANGXI ZHUANG AUTONOMOUS REGION CENT FOR DISEASE CONTROL & PREVENTION
- Filing Date
- 2025-04-16
- Publication Date
- 2026-05-01
AI Technical Summary
In existing solid nuclear track etching experiments, the measurement error of the etching solution concentration is large, resulting in inaccurate experimental results. The operation is complicated and time-consuming. Furthermore, traditional densitometers are not suitable for high-temperature and strong alkaline environments, and manual detection is inefficient.
Design a liquid water quality adjustment device, installed at the top of the etching tank, equipped with a conductivity sensor and multiple water pumping pipes. The conductivity sensor detects the etching solution concentration in real time, and the water pumping and replenishing pipes automatically adjust the etching solution concentration to ensure stability.
It enables precise control of etching solution concentration, improves experimental efficiency and stability, simplifies operation procedures, reduces human detection errors, and enhances experimental safety and convenience.
Smart Images
Figure CN224185871U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of etching experiment technology, specifically to a liquid water quality adjustment device for solid nuclear track etching experiments. Background Technology
[0002] Solid-state nuclear track detectors are a detection technique based on the radiation damage tracks created by high-energy particles in solid materials. When charged particles (such as alpha particles, protons, or heavy ions) pass through the detector material, they leave damage tracks in their path. These tracks can be magnified by chemical or physical etching methods to form observable holes or etching cones.
[0003] Solid-state nuclear track etching is a technique that amplifies damage tracks formed by high-energy particles in solid-state detector materials through chemical etching. In practice, the etching process is typically carried out in a heated water bath to ensure a stable temperature of the etching solution and thus consistent etching results. However, prolonged heating can cause water evaporation, altering the concentration of the etching solution and affecting the etching height, track clarity, and accuracy, leading to measurement errors. Therefore, in solid-state nuclear track etching experiments, it is usually necessary to periodically replenish water to strictly control the concentration of the etching solution and ensure consistent and accurate etching results. Existing methods for measuring etching solution concentration typically involve using a hydrometer to measure the density of water to determine whether replenishment is needed. However, traditional hydrometers are often too long, making measurement inconvenient and unsuitable for operation in high-temperature, highly alkaline, or confined spaces. Furthermore, manually measuring water density during experiments is inefficient and prone to measurement errors, leading to inaccurate results. Frequent water density measurements are necessary for replenishment, but this increases both the workload for operators and the complexity of the experiment. Utility Model Content
[0004] The purpose of this invention is to provide a liquid water quality adjustment device for solid nuclear track etching experiments that can accurately detect the concentration of etching solution, facilitate water replenishment, effectively improve experimental efficiency and stability, enhance experimental safety and convenience, and is easy to operate. This device aims to solve the technical problems of existing measurement methods, which are prone to measurement errors, resulting in inaccurate experimental results, cumbersome operation, and time and effort.
[0005] To solve the above technical problems, the solution adopted by this utility model is as follows:
[0006] A liquid water quality conditioning device for solid nuclear track etching experiments is installed at the top of an etching tank, the top of which is equipped with a tank cover. The device includes a measuring tank, a T-shaped bracket, a conductivity sensor, a tank fixing plate, a water supply pipe, and a water extraction pipe. The measuring tank is installed above the middle of the tank fixing plate. The tank fixing plate is installed on one side of the tank cover at the top of the etching tank. The T-shaped bracket is connected to the top of the measuring tank, with its lower end extending into the measuring tank. The conductivity sensor is fixedly installed inside the lower end of the T-shaped bracket. One end of the water supply pipe is connected to a water source, and the other end extends into the etching tank. One end of the water extraction pipe passes through the tank fixing plate and extends into the etching tank, while the other end is connected to the measuring tank. After the measuring water tank is installed on the water tank fixing plate, it is sealed together with the water tank cover to cover the etching water tank. The water in the etching water tank is pumped out through the water pipe. The conductivity of the water sample is measured by the conductivity sensor inside the "T"-shaped fixing frame. The detected conductivity is compared with the conductivity at the beginning of the experiment to calculate the amount of pure water that needs to be added. The water supply pipe is turned on to add water to the etching water tank to ensure the concentration of the etching solution and to ensure the normal operation of the experiment. The whole system is powered by an external power supply.
[0007] Furthermore, the measuring water tank has five openings, three of which are installed side-by-side on the upper side of one side of the measuring water tank, and the remaining two openings are installed on the upper middle and lower parts of the other side of the measuring water tank, respectively. Each opening is equipped with a matching flat straight-through head. Three water suction pipes are provided, one end of which is connected to each of the three openings, and the other end extends into the etching water tank. The three water suction pipes extend into the etching water tank to different depths. One end of the water replenishment pipe is connected to the upper middle and lower openings on the other side of the measuring water tank. Water samples are extracted from three detection points through the three water pipes extending to different depths in the etching water tank. Each extraction of water samples from the three detection points constitutes one cycle. The conductivity values of the three water samples are compared. The cycle continues until the measured values of the three water sample detection points are consistent. Comparing the values at the beginning of the experiment, the required amount of pure water is added through the water replenishment pipe to adjust the concentration of the etching solution. The flat straight-through head ensures that the pipes are connected to the holes in the measuring water tank, ensuring overall sealing.
[0008] Furthermore, the water supply pipe includes an inlet pipe, an overflow pipe, a drain pipe, a filling pipe, and a four-way pipe; one end of the inlet pipe is connected to an external water source; one end of the overflow pipe and the drain pipe are respectively connected to the flat straight-through head above and below the measuring water tank; the other ends of the inlet pipe, overflow pipe, and drain pipe are connected to the four-way pipe; one end of the filling pipe is connected to the four-way pipe, and the other end passes through the water tank fixing plate and extends into the etching water tank; the filling pipe is connected to an external water source through the four-way pipe and the inlet pipe. The measuring water tank discharges excess water sample through the overflow pipe, and the drain pipe can discharge all water sample after the water sample testing of the measuring water tank is completed. The inlet pipe is connected to an external water source, and the water from the inlet pipe, overflow pipe, and drain pipe is collected through the four-way pipe and transported to the filling pipe, circulating back into the etching water tank.
[0009] Furthermore, the etching tank is equipped with magnetically attached water pipe holders; four water pipe holders are provided, each connected to one of the three water pumping pipes and one water filling pipe. The water pumping pipes can be firmly attached to the tank wall of the etching tank via the water pipe holders, and the position and depth of the water sample taken from the detection point can be adjusted at will, making the whole process convenient for installation and disassembly.
[0010] Furthermore, the water tank fixing plate is equipped with a fixing box; the fixing box is equipped with four electric water pumps; the electric water pumps are respectively installed in the middle of the three water suction pipes and the water inlet pipe; a miniature water pump is installed at the connection end of the drain pipe and the measuring water tank. The electric water pumps are fixed in place, allowing for convenient extraction of etching solution from the etching water tank into the measuring water tank, and can accurately deliver water to the etching water tank for replenishment. The miniature water pump is installed at the connection end of the drain pipe and the measuring water tank, enabling precise drainage of the etching solution. The electric water pumps and the miniature water pump are intelligently controlled by an external controller, facilitating the measurement of etching solution and water replenishment.
[0011] All water pipes are flexible hoses.
[0012] The working principle of this utility model is as follows:
[0013] In operation, an electric water pump draws water samples from one detection point into a measuring tank. Excess water overflows from the overflow pipe and circulates back into the etching tank. After sampling, the conductivity of the water sample is detected by a conductivity sensor. After detection, a miniature water pump drains the water sample from the measuring tank. After emptying the measuring tank, the miniature water pump is turned off. The electric water pumps at three different depths are used to draw water samples from the detection points for testing. When the measured values of the three detection points are consistent, the obtained values are compared with the conductivity values of the water samples at the beginning of the experiment. The required amount of pure water is calculated, and the electric water pump in the inlet pipe is turned on to draw external water to the water supply pipe to add water and adjust the concentration of the etching solution. When the measured data are inconsistent, the etching solution in the etching tank is allowed to settle before sampling and measurement is repeated until the measured values of the three water sample points are consistent. The water supply pipe guides the water samples overflowing from the overflow pipe, the water samples discharged from the drain pipe, and the water added from the inlet pipe into the etching solution in the etching tank.
[0014] The beneficial effects of this utility model are as follows:
[0015] 1. This utility model uses a water pipe to draw the etching solution into a measuring tank. The conductivity sensor inside the measuring tank can detect the conductivity of the etching solution in the etching tank in real time. By comparing the conductivity at the beginning of the experiment, the required amount of water can be accurately calculated to ensure the stability of the etching solution concentration in the etching tank, thereby ensuring the accuracy of the etching experiment. The overall operation is convenient.
[0016] 2. This utility model uses multiple different water pipes to extract etching solution at different depth detection points, which can comprehensively detect the concentration of etching solution. Combined with the operation of electric water pump and micro water pump, the etching solution can be accurately extracted for detection. At the same time, it is convenient and accurate to replenish the etching solution, saving time and effort, effectively reducing the error of manual detection, and improving the efficiency and stability of the experiment. Attached Figure Description
[0017] Figure 1 This is a schematic diagram of the main structure of this utility model;
[0018] Figure 2 This is a schematic diagram of the right-side cross-sectional structure of this utility model;
[0019] Figure 3 This is a top view of the water tank fixing plate of this utility model;
[0020] Figure 4 for Figure 3 Right view structural schematic diagram of the water tank fixing plate.
[0021] In the diagram: 1. Measuring water tank; 2. "T" shaped bracket; 3. Miniature water pump; 4. Flat straight connector; 5. Electric water pump; 6. Four-way water pipe; 7. Conductivity sensor; 8. Water pipe holder; 9. Fixing box; 10. Opening; 11. Water tank fixing plate; 12. Etched water tank; 13. Water supply pipe; 131. Water inlet pipe; 132. Overflow pipe; 133. Drain pipe; 134. Water filling pipe; 14. Water pumping pipe; 15. Water tank cover. Detailed Implementation
[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0023] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model; the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In addition, unless otherwise explicitly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. For those skilled in the art, the specific meaning of the above terms in this utility model can be understood according to the specific circumstances.
[0024] The following is a detailed description of a liquid water quality conditioning device for solid nuclear track etching experiments according to the present invention, with reference to the accompanying drawings: Example
[0025] A liquid water quality conditioning device for solid nuclear track etching experiments is installed at the top of an etching tank 12, the top of which is provided with a tank cover 15. The device includes a measuring tank 1, a "T"-shaped fixing frame 2, a conductivity sensor 7, a tank fixing plate 11, a water supply pipe 13, and a water extraction pipe 14. The measuring tank 1 is installed above the middle of the tank fixing plate 11. The tank fixing plate 11 is installed on one side of the tank cover 15 at the top of the etching tank 12. The "T"-shaped fixing frame 2 is connected to the top of the measuring tank 1, and its lower end extends into the measuring tank 1. The conductivity sensor 7 is fixedly installed inside the lower end of the "T"-shaped fixing frame 2. One end of the water supply pipe 13 is connected to a water source, and the other end extends into the etching tank 12. One end of the water extraction pipe 14 passes through the tank fixing plate 11 and extends into the etching tank 12, and the other end is connected to the measuring tank 1.
[0026] The working principle of this embodiment is as follows:
[0027] In use, the etching solution in the etching tank 12 is drawn into the measuring tank 1 through the water pipe 14. After the water sample is drawn, the conductivity value of the water sample is detected by the conductivity sensor 7 at the bottom of the "T"-shaped bracket 2. The obtained value is compared with the conductivity value of the water sample at the beginning of the experiment. The amount of pure water that needs to be added is calculated. The external water source is drawn into the etching tank 12 through the water supply pipe 13 to adjust the concentration of the etching solution and ensure the stability of the etching solution concentration in the etching tank 12, thereby ensuring the accuracy of the etching experiment. Example
[0028] The difference from Embodiment 1 is that the measuring water tank 1 has five openings 10, three of which are installed side by side on the upper side of one side of the measuring water tank 1, and the remaining two openings 10 are installed on the upper middle and lower middle of the other side of the measuring water tank 1, respectively; and each opening 10 is provided with a matching flat straight-through head 4; there are three water suction pipes 14, one end of which is connected to the three side by side openings 10, and the other end extends into the etching water tank 12; the three water suction pipes 14 extend into the etching water tank 12 to different depths; one end of the water replenishment pipe is connected to the upper middle and lower middle openings 10 on the other side of the measuring water tank 1; the water replenishment pipe 13 includes a water inlet pipe 131, an overflow pipe 132, a drain pipe 133, a water supply pipe 134, and a four-way water pipe 6; one end of the water inlet pipe 131 is connected to an external water source; one end of the overflow pipe 132 and the drain pipe 133... The flat straight-through head 4 is connected to the upper and lower parts of the measuring water tank 1, respectively; the other end of the water inlet pipe 131, overflow pipe 132 and drain pipe 133 is connected to the four-way water pipe 6; one end of the water filling pipe 134 is connected to the four-way water pipe 6, and the other end passes through the water tank fixing plate 11 and extends into the etching water tank 12; the water filling pipe 134 is connected to an external water source through the four-way water pipe 6 and the water inlet pipe 131; the etching water tank 12 is provided with a magnetically adsorbed water pipe holder 8; there are four water pipe holders 8, which are respectively connected to three of the water pumping pipes 14 and the water filling pipe 134; the water tank fixing plate 11 is provided with a fixing box 9; four electric water pumps 5 are provided on the fixing box 9; the electric water pumps 5 are respectively installed in the middle of the three water pumping pipes 14 and the water inlet pipe 131; a miniature water pump 3 is provided at the connection end of the drain pipe 133 and the measuring water tank 1.
[0029] After the measuring water tank 1 is installed on the water tank fixing plate 11, it is sealed together with the water tank cover 15 to cover the etching water tank 12. The measuring water tank 1 is pumped into the measuring water tank 1 by electric water pumps 5 through three water pipes 14 that extend into the etching water tank 12 at different depths. The conductivity of the water sample is measured by the conductivity sensor 7 inside the "T"-shaped fixing bracket 2. After the measurement is completed, the micro water pump 3 is turned on to empty the water sample in the measuring water tank 1, and then the water sample is pumped into the next monitoring point for testing. Each time the water sample is pumped from three monitoring points, it is counted as one cycle. The conductivity values of the three water sample values are compared. When the measured values of the three water sample monitoring points are consistent, the detected conductivity is compared with the conductivity at the beginning of the experiment to calculate the amount of pure water that needs to be added. The electric water pump 5 of the water inlet pipe 131 is turned on to deliver water to the water source. Water replenishment is performed in etching tank 12 to ensure the concentration of the etching solution and guarantee the normal progress of the experiment. The entire system is powered by an external power supply. During the detection process, excess water sample in measuring tank 1 is discharged through overflow pipe 132. Drain pipe 133 can drain all water sample after the water sample detection in measuring tank 1 is completed. Water from inlet pipe 131, overflow pipe 132, and drain pipe 133 is collected through four-way water pipe 6 and transported to water supply pipe 134, circulating back into etching tank 12. Water pumping pipe 14 can be firmly attached to the tank wall of etching tank 12 through water pipe fixing device 8, and the position and depth of the water sample extracted from the detection point can be adjusted at will. The entire system is easy to install and disassemble. Electric water pump 5 and micro water pump 3 are intelligently controlled by an external controller, which facilitates operation for measuring etching solution and replenishing water.
[0030] The working principle of this embodiment is the same as that of Embodiment 1.
[0031] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A liquid water quality conditioning device for solid nuclear track etching experiments, installed at the top of an etching tank (12), wherein the top of the etching tank (12) is provided with a tank cover (15); characterized in that: The device includes a measuring water tank (1), a "T"-shaped fixing bracket (2), a conductivity sensor (7), a water tank fixing plate (11), a water supply pipe (13), and a water pumping pipe (14). The measuring water tank (1) is installed above the middle part of the water tank fixing plate (11). The water tank fixing plate (11) is installed on one side of the water tank cover (15) at the top of the etching water tank (12). The "T"-shaped fixing bracket (2) is connected to the top of the measuring water tank (1), and its lower end extends into the measuring water tank (1). The conductivity sensor (7) is fixedly installed inside the lower end of the "T"-shaped fixing bracket (2). One end of the water supply pipe (13) is connected to a water source, and the other end extends into the etching water tank (12). One end of the water pumping pipe (14) passes through the water tank fixing plate (11) and extends into the etching water tank (12), and the other end is connected to the measuring water tank (1).
2. The liquid water quality conditioning device for solid nuclear track etching experiments according to claim 1, characterized in that: The measuring water tank (1) has five openings (10), three of which are installed side by side on the upper side of one side of the measuring water tank (1), and the remaining two openings (10) are installed on the upper middle and lower sides of the other side of the measuring water tank (1), respectively; and each opening (10) is provided with a matching flat straight head (4); there are three water pumping pipes (14), one end of which is connected to the three side by side openings (10), and the other end extends into the etching water tank (12); the three water pumping pipes (14) extend into the etching water tank (12) to different depths; one end of the water replenishment pipe is connected to the openings (10) on the upper middle and lower sides of the other side of the measuring water tank (1).
3. The liquid water quality conditioning device for solid nuclear track etching experiments according to claim 2, characterized in that: The water supply pipe (13) includes an inlet pipe (131), an overflow pipe (132), a drain pipe (133), a water filling pipe (134), and a four-way water pipe (6); one end of the inlet pipe (131) is connected to an external water source; one end of the overflow pipe (132) and the drain pipe (133) are respectively connected to the flat straight head (4) above and below the measuring water tank (1); the other end of the inlet pipe (131), the overflow pipe (132), and the drain pipe (133) is connected to the four-way water pipe (6); one end of the water filling pipe (134) is connected to the four-way water pipe (6), and the other end passes through the water tank fixing plate (11) and extends into the etching water tank (12); the water filling pipe (134) is connected to an external water source through the four-way water pipe (6) and the inlet pipe (131).
4. The liquid water quality conditioning device for solid nucleus track etching experiments according to claim 3, characterized in that: The etching tank (12) is equipped with a magnetically adsorbed water pipe holder (8); there are four water pipe holders (8), which are respectively connected to three of the pumping water pipes (14) and the water supply pipes (134).
5. The liquid water quality conditioning device for solid nuclear track etching experiments according to claim 4, characterized in that: The water tank fixing plate (11) is provided with a fixing box (9); the fixing box (9) is provided with four electric water pumps (5); the electric water pumps (5) are respectively installed in the middle of the three water pumping pipes (14) and the water inlet pipe (131); the drain pipe (133) is provided with a micro water pump (3) at the connection end with the measuring water tank (1).