Chemical vapor infiltration reactor convenient for continuously conveying silane

Abstract

The utility model discloses a chemical vapor infiltration reactor convenient for continuously conveying silane. The chemical vapor infiltration reactor comprises a reactor body, the conveying assembly comprises a mounting pipe which is fixedly inserted into the bottom of the device body, and a plurality of groups of mounting cavities are formed in the mounting pipe; the device comprises a plurality of mounting cavities, a plurality of groups of heating pipes and a plurality of groups of heating pipes, the plurality of groups of heating pipes are arranged in the mounting cavities in a one-to-one correspondence manner, fixed pipes are coaxially inserted into the heating pipes, and spiral heating sheets are arranged on the circumferential surfaces of the fixed pipes. The problem of local overheating or insufficient heating possibly caused by centralized heating is avoided, a spiral channel formed by the spiral heating pieces enables silane to make full contact with a heating component, the retention time is prolonged, it is guaranteed that the silane is evenly heated in the heating cavity and preheated, the situation that the internal temperature is reduced after the silane enters the device body is avoided, and the service life of the device is prolonged. A stable reaction environment in the reactor body is maintained, and the reaction stability and the product quality are guaranteed.