Target material positioning and supplying assembly and RPD equipment

Abstract

The utility model discloses a target material positioning and supplying assembly and RPD equipment. The target material positioning and supplying assembly comprises a target material bearing disc, a plurality of crucibles used for loading different types of target materials respectively and a jacking device, the target material bearing disc can rotate around the circle center direction of the target material bearing disc, containing groove holes used for bearing the crucible are formed in the edge position of the target material bearing disc, and the multiple containing groove holes can move to the position under a magnetic field cavity of coating equipment under the rotation effect of the target material bearing disc; the jacking device is used for jacking the crucible into the magnetic field cavity or moving the crucible back into the containing groove hole from the magnetic field cavity, and the jacking device and the target material bearing disc are both arranged on the same base. Through the arrangement, the RPD equipment can be compatible with different types of target materials, meanwhile, the influence between the different types of target materials is effectively avoided, and high-speed switching and stable use of the target materials can be achieved under the condition that the equipment is not stopped.

Description

Technical Field

[0001] This utility model relates to the field of solar photovoltaic coating, and in particular to a target positioning and supply component and RPD equipment. Background Technology

[0002] In the fabrication of HJT and perovskite solar cells, the deposition quality of the TCO (transparent conductive oxide) thin film directly determines the photoelectric conversion efficiency of the cell. Currently, mainstream RPD (reactive plasma deposition) equipment generally employs a multi-layer target stacking method in TCO coating, using a lifting assembly to achieve continuous target consumption. Specifically, the equipment typically has a multi-layer target stack structure, and mechanical lifting action causes the multi-layer targets to be consumed step-by-step. That is, the continuous feeding of the lifting action drives the target movement, achieving a dynamic balance between target consumption and supply, thereby maintaining the effective interaction distance between the target and the plasma.

[0003] However, actual research has revealed certain limitations in the above-mentioned equipment for target supply:

[0004] First, traditional stacked structures require the current layer of target material to be completely consumed before the next layer can be applied. This "layer-by-layer consumption" mechanism makes it impossible to flexibly switch target types according to actual needs during production. For example, in scenarios where different components or functions of target materials need to be frequently changed, the above method requires shutdown before replacement, which is very inconvenient.

[0005] Secondly, during long-term use, residual debris or sputtering products from the upper target layer can easily deposit onto the surface of the lower target layer to be used. This contamination is particularly problematic when metal and oxide targets are used together, as it can lead to a decrease in the electrical properties of the subsequently deposited film and affect product yield.

[0006] To address the aforementioned shortcomings, existing improvement solutions mainly focus on optimizing the target fixing structure, such as using spring pre-tightening devices or magnetic adsorption structures. However, these improvements still fail to overcome the inherent limitations of stacked supply, and cannot achieve rapid switching between multiple types of targets or stable use of low-melting-point materials.

[0007] Therefore, a target positioning and supply component and an RPD device are needed to solve the above problems. Utility Model Content

[0008] The purpose of this invention is to provide a target positioning and supply component and an RPD device that can be compatible with different types of target applications, effectively avoid the influence between different types of target, and enable high-speed switching and stable use of target without stopping the equipment.

[0009] To solve the above-mentioned technical problems, this utility model provides a target material positioning and supply assembly, including a target material bearing plate, multiple crucibles for loading different types of targets, and a lifting device;

[0010] The target support plate can rotate around its center, and its edge is provided with receiving slots for supporting the crucible. The multiple receiving slots can move to the position directly below the magnetic field chamber of the coating equipment under the rotation of the target support plate.

[0011] The lifting device is used to lift the crucible into the magnetic field chamber or to move the crucible from the magnetic field chamber back into the receiving slot.

[0012] The lifting device and the target material support plate are both mounted on the same base.

[0013] Furthermore, the receiving slot is configured as a stepped structure, and the cross-sectional area decreases from top to bottom.

[0014] Furthermore, the plurality of the receiving slots are arranged in a ring at equal intervals at the edge of the target material bearing plate.

[0015] Furthermore, a driving component is provided at the center of the target material support disk, and the driving component is configured as a stepper motor.

[0016] Furthermore, a sleeve connected to the receiving slot is provided at the edge of the target material support plate for positioning the crucible, and is located below the magnetic field chamber.

[0017] Furthermore, the inner wall of the sleeve is flush with the inner wall of the receiving slot.

[0018] Furthermore, the sleeve and the target material support plate are integrally formed.

[0019] Furthermore, the lifting device includes a cylinder and a lifting block connected to the output end of the cylinder;

[0020] The lifting block is adapted to the receiving slot.

[0021] Furthermore, it includes the device body and the target positioning and supply assembly as described in the above embodiments;

[0022] The device body has a built-in magnetic field control component for forming the magnetic field chamber.

[0023] Compared with the prior art, the present invention has at least the following beneficial effects:

[0024] By setting up multiple crucibles to load different types of targets, the mutual interference between different types of targets during use is avoided, thereby achieving compatibility with different types of target applications. Furthermore, by setting up a target carrier plate with receiving slots at the edge, and ensuring that multiple receiving slots can be rotated to directly below the magnetic field chamber of the coating equipment under the rotational power of the target carrier plate, when coating operations are required, the crucible located below the magnetic field chamber can be gradually lifted into the magnetic field chamber by the lifting device to complete the target supply function. When it is necessary to switch between different types of targets, the target supply can also be switched by the contraction of the lifting device and the rotation of the target carrier plate, thereby achieving the goal of high-speed target switching and stable use without stopping the equipment. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the target positioning and supply assembly in Embodiment 1 of this utility model;

[0026] Figure 2 This utility model Figure 1 Sectional view at point AA;

[0027] Figure 3 This is a cross-sectional view of the RPD device in the second embodiment of this utility model.

[0028] Reference numerals: 1. Target support plate; 11. Receiving slot; 12. Driving component; 13. Sleeve; 2. Crucible; 3. Lifting device; 31. Cylinder; 32. Lifting block; 4. Equipment body; 41. Magnetic field control component; 5. Magnetic field chamber. Detailed Implementation

[0029] The target positioning and supply assembly and RPD device of this utility model will be described in more detail below with reference to the schematic diagrams, which illustrate preferred embodiments of this utility model. It should be understood that those skilled in the art can modify the utility model described herein while still achieving the advantageous effects of this utility model. Therefore, the following description should be understood as being of general knowledge to those skilled in the art and is not intended to limit this utility model.

[0030] The present invention will be described in more detail below by way of example with reference to the accompanying drawings. The advantages and features of the present invention will become clearer from the following description. It should be noted that the drawings are in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of the present invention.

[0031] Example 1

[0032] like Figures 1 to 3As shown in the figure, this utility model embodiment proposes a target positioning and supply component, including a target support plate 1, multiple crucibles 2 for loading different types of targets, and a lifting device 3. By setting multiple crucibles 2 to load different types of targets respectively, compared with the stacked structure supply method in the prior art, the RPD equipment can flexibly switch between multiple target types in photovoltaic cell preparation, thereby meeting the process requirements of TCO thin film multilayer deposition. Furthermore, using independent crucibles 2 to load different targets can avoid the contamination of the lower target by upper target debris / sputtering products in the traditional stacked structure. Especially when metal targets and oxide targets are used in combination, it effectively prevents the problem of thin film electrical performance degradation caused by target surface contamination, improves product yield, and correspondingly achieves the purpose of being compatible with the application of different types of targets.

[0033] The target support plate 1 is rotatable around its center and has a receiving slot 11 for supporting the crucible 2 at its edge. The multiple receiving slots 11 can move to the magnetic field chamber 5 of the coating equipment under the rotation of the target support plate 1.

[0034] The lifting device 3 is used to lift the crucible 2 into the magnetic field chamber 5 or move the crucible 2 from the magnetic field chamber 5 back into the receiving slot 11. That is, by setting the target material support plate 1, multiple crucibles 2 are driven to rotate and move synchronously, so that different types of targets can be circulated and moved to the bottom of the magnetic field chamber 5, and with the cooperation of the lifting device 3, the target material is supplied and applied.

[0035] It should be noted that the lifting device 3 and the target material support plate 1 are both mounted on the same base (not labeled in the figure).

[0036] This device uses multiple crucibles 2 to load different types of targets, thus avoiding mutual interference between different types of targets during use and achieving compatibility with different types of target applications. Furthermore, by setting a target carrier plate 1 with receiving slots 11 at its edge, and ensuring that all receiving slots 11 can rotate to directly below the magnetic field chamber 5 of the coating equipment under the rotational power of the target carrier plate 1, the device allows the crucibles 2 located below the magnetic field chamber 5 to be gradually lifted into the magnetic field chamber 5 by the lifting device 3 when coating operations are required, thus completing the target supply function. When switching between different types of targets is needed, the target supply can be switched by retracting the lifting device 3 and rotating the target carrier plate 1, thereby achieving high-speed target switching and stable use without stopping the equipment.

[0037] In this embodiment, the shape of the receiving slot 11 is further defined to better support the crucible 2. Specifically, the receiving slot 11 is configured as a stepped structure with a cross-sectional area decreasing from top to bottom. That is, by utilizing the stepped structure, the crucible 2 can be supported while also being radially limited to prevent it from being misaligned or detached under the rotational force of the target material support plate 1.

[0038] It should be noted that the plurality of the receiving slots 11 are arranged in a ring at equal intervals at the edge of the target material carrier plate 1, so that the target material carrier plate 1 can switch the crucible 2 located below the magnetic field chamber 5 by rotating at a predetermined angle.

[0039] The target material carrier disk 1 has a driving component 12 at its center. The driving component 12 is a stepper motor. By setting the driving component 12 as a stepper motor, the requirement of switching between predetermined angles can be met.

[0040] In other embodiments, to further improve the stability of the crucible 2 during use, a sleeve 13 communicating with the receiving slot 11 is provided at the edge of the target support plate 1 for positioning the crucible 2, and is located below the magnetic field chamber 5. By providing the sleeve 13 to form an axial positioning with the communicating structure of the receiving slot 11, the stability of the crucible 2 during rotation is further improved, avoiding the risk of target material displacement or collision due to shaking.

[0041] Furthermore, the inner wall of the sleeve 13 is flush with the inner wall of the receiving slot 11 to prevent the subsequent lifting device 3 from getting stuck during the lifting process due to the step surface between the sleeve 13 and the receiving slot 11.

[0042] In this embodiment, the sleeve 13 and the target material bearing plate 1 are integrally formed.

[0043] like Figure 2 As shown, in a further embodiment, the lifting device 3 is further defined to better realize the lifting operation of the crucible 2.

[0044] Specifically, the lifting device 3 includes a cylinder 31 and a lifting block 32 connected to the output end of the cylinder 31, the lifting block 32 being adapted to the receiving slot 11.

[0045] Example 2

[0046] like Figure 3 As shown, this embodiment two proposes an RPD device based on embodiment one, including the device body 4 and the target positioning and supply component as described in embodiment one.

[0047] The device body 4 has a built-in magnetic field control component 41 for forming the magnetic field chamber 5.

[0048] By setting multiple crucibles 2 to load different types of targets for supply, compared with the stacked supply method in the prior art, it can effectively avoid the mutual influence between different types of targets during use, and achieve the purpose of being compatible with the application of different types of targets. Furthermore, by setting the target support plate 1 and the lifting device 3, the target can be stably supplied while also achieving the function of rapid switching between different types of targets, meeting the process requirements of TCO thin film multilayer deposition, and achieving the purpose of high-speed switching and stable use of targets without stopping the equipment.

[0049] Obviously, those skilled in the art can make various modifications and variations to this utility model without departing from its spirit and scope. Therefore, if these modifications and variations fall within the scope of the claims of this utility model and their equivalents, this utility model also intends to include these modifications and variations.

Claims

1. A target positioning and supply assembly, characterized in that, It includes a target support plate, multiple crucibles for loading different types of targets, and a lifting device; The target support plate can rotate around its center, and its edge is provided with receiving slots for supporting the crucible. The multiple receiving slots can move to the position directly below the magnetic field chamber of the coating equipment under the rotation of the target support plate. The lifting device is used to lift the crucible into the magnetic field chamber or to move the crucible from the magnetic field chamber back into the receiving slot. The lifting device and the target material support plate are both mounted on the same base.

2. The target positioning and supply assembly as described in claim 1, characterized in that, The receiving slot is configured as a stepped structure, and the cross-sectional area decreases from top to bottom.

3. The target positioning and supply assembly as described in claim 1, characterized in that, Multiple receiving slots are arranged in a ring at equal intervals at the edge of the target material bearing plate.

4. The target positioning and supply assembly as described in claim 1, characterized in that, A driving component is provided at the center of the target material support plate, and the driving component is a stepper motor.

5. The target positioning and supply assembly as described in claim 1, characterized in that, A sleeve connected to the receiving slot is provided at the edge of the target material support plate for positioning the crucible, and is located below the magnetic field chamber.

6. The target positioning and supply assembly as described in claim 5, characterized in that, The inner wall of the sleeve is flush with the inner wall of the receiving slot.

7. The target positioning and supply assembly as described in claim 5, characterized in that, The sleeve and the target material support plate are integrally formed.

8. The target positioning and supply assembly as described in claim 1, characterized in that, The lifting device includes a cylinder and a lifting block connected to the output end of the cylinder. The lifting block is adapted to the receiving slot.

9. An RPD device, characterized in that, Includes the device body and the target positioning and supply assembly as described in any one of claims 1-8; The device body has a built-in magnetic field control component for forming the magnetic field chamber.

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