IBE ion beam etching device convenient to maintain

Abstract

The utility model provides an IBE ion beam etching device convenient to maintain, which comprises a cavity body, a target material is connected in the cavity body, a carrying table mechanism is arranged above the target material, the carrying table mechanism is connected with the cavity body through a rotary driving mechanism, a wafer substrate to be coated is arranged on the carrying table mechanism, one side of the cavity body is connected with a first access door, and the other side of the cavity body is connected with a second access door. The other side of the cavity body is connected with a second access door and located on the opposite side of the first access door, the first access door and the second access door are both hinged to the cavity body through hinges, a first installation opening is formed in the lower portion of the first access door, the first ion source is connected with the first installation opening, and a second installation opening is formed in the upper portion of the second access door. The second ion source is connected with the second mounting port, and when the first ion source or the second ion source breaks down, maintenance is carried out by opening the corresponding first access door or second access door; and by arranging the first access door and the second access door, the maintenance efficiency is greatly improved, and the maintenance is very convenient.

Description

Technical Field

[0001] This utility model belongs to the field of vacuum evaporation equipment technology, and more specifically, relates to an IBE ion beam etching device that is easy to maintain. Background Technology

[0002] Ion beam etching (IBE) is a semiconductor etching process, primarily a physical etching method. Based on the sputtering principle, it uses a low-energy parallel ion beam to bombard the substrate surface, sputtering out the material from areas not covered by the mask, thus achieving the etching purpose. It is mainly used for the fabrication of micro-patterns in integrated circuits, components, and sensors. Conventional ion beam etching uses inert gas ions such as Ar+, which is a purely physical etching process, and therefore can etch any material, transferring 3D mask patterns to the substrate surface with high fidelity. Reactive ion beam etching (RIBE), on the other hand, introduces reactive gases to form reactive ions for etching. Ion beam etching is an atomic-level processing method, especially Ar+ etching, which does not exhibit lateral corrosion and has top-tier etching resolution. Theoretically, it is believed to be able to etch structures at the atomic size and achieve excellent etching uniformity.

[0003] In existing technologies, some devices are equipped with dual ion sources. Due to the limitations of the spatial layout of the device, the ion sources are distributed on the same side or both sides. If they are distributed on both sides, the ion sources will inevitably malfunction and require maintenance after long-term operation. At this time, due to the limited space in the device, maintenance cannot be carried out inconveniently, which presents certain difficulties. Utility Model Content

[0004] Therefore, to solve the above-mentioned technical problems, this utility model proposes an easy-to-maintain IBE ion beam etching device, including a cavity body 10, a target material 20 connected inside the cavity body 10, a stage mechanism 30 above the target material 20, the stage mechanism 30 being connected to the cavity body 10 via a rotation drive mechanism, the rotation drive mechanism driving the stage mechanism 30 to adjust its angle, a wafer substrate to be coated being placed on the stage mechanism 30, a first ion source 40 being provided on one side of the cavity body 10, a second ion source 50 being provided on the other side, a first inspection door 60 being connected to one side of the cavity body 10, and a second inspection door 70 being connected to the other side of the cavity body 10 and located at the first... On opposite sides of the inspection door 60, both the first inspection door 60 and the second inspection door 70 are hinged to the cavity body 10 via hinges 80. The lower part of the first inspection door 60 is provided with a first mounting port 90, and the first ion source 40 is connected to the first mounting port 90. The upper part of the second inspection door 70 is provided with a second mounting port 100, and the second ion source 50 is connected to the second mounting port 100. When the first ion source 40 or the second ion source 50 malfunctions, repairs can be performed by opening the corresponding first inspection door 60 or second inspection door 70. By providing the first inspection door 60 and the second inspection door 70, the efficiency of repairs is greatly improved, saving time and effort, and is also very convenient.

[0005] An easily maintainable IBE (Ion Beam Etching) apparatus includes a cavity body 10, a target 20 connected inside the cavity body 10, a stage mechanism 30 above the target 20, and the stage mechanism 30 connected to the cavity body 10 via a rotation drive mechanism. The rotation drive mechanism adjusts the angle of the stage mechanism 30. A wafer substrate to be coated is placed on the stage mechanism 30. A first ion source 40 is located on one side of the cavity body 10, and a second ion source 50 is located on the other side. A first inspection door 60 is connected to one side of the cavity body 10, and a second inspection door 60 is connected to the other side of the cavity body 10. Two inspection doors 70 are located on the opposite side of the first inspection door 60. Both the first inspection door 60 and the second inspection door 70 are hinged to the cavity body 10 via hinges 80. The lower part of the first inspection door 60 is provided with a first mounting port 90, and the first ion source 40 is connected to the first mounting port 90. The upper part of the second inspection door 70 is provided with a second mounting port 100, and the second ion source 50 is connected to the second mounting port 100. When the first ion source 40 or the second ion source 50 malfunctions, maintenance can be performed by opening the corresponding first inspection door 60 or second inspection door 70.

[0006] Furthermore, multiple pressure blocks 110 are provided on both sides of the cavity body 10 at the contact edge with the first inspection door 60 or the second inspection door 70. The pressure blocks 110 are L-shaped, with one end of the pressure block 110 inside fastening to the edge of the first inspection door 60 or the second inspection door 70, and the other end of the pressure block 110 is connected to the side of the cavity body 10 by bolts, so that the cavity body 10 has good sealing performance.

[0007] Furthermore, on both sides of the cavity body 10, at the contact edge with the first inspection door 60 or the second inspection door 70, a switch sensor 120 is provided to monitor the sealing status of the first inspection door 60 or the second inspection door 70.

[0008] Furthermore, the pressure block 110 has a bottom surface 130 on the side near the cavity body 10. The bottom surface 130 is a horizontal plane. At the end of the bottom surface 130 away from the first inspection door 60 or the second inspection door 70, a protrusion 140 extending towards the cavity body 10 is provided. When the first inspection door 60 and the second inspection door 70 are installed and the cavity body 10 is not evacuated, since the first inspection door 60 and the second inspection door 70 are not tightly closed, the bottom surface 130, near the first... One end of the inspection door 60 or the second inspection door 70 is left with a gap from the cavity body 10. After the first inspection door 60 and the second inspection door 70 are installed and the cavity body 10 is evacuated, the first inspection door 60 and the second inspection door 70 are sucked tight. By tightening the pressure block 110 again, the gap between the bottom surface 130 and the cavity body 10 is reduced or eliminated. The remaining amount of the protrusion 140 helps to press the first inspection door 60 or the second inspection door 70 tightly.

[0009] Furthermore, the allowance of the protrusion 140 is 2-3 mm.

[0010] Furthermore, a groove 150 is provided on the bottom plate of the cavity body 10 near the pressure block 110. The groove 150 is used to make way for the pressure block 110 during installation, which facilitates installation.

[0011] Furthermore, the first inspection door 60 and / or the second inspection door 70 are provided with a third mounting port 160 for facilitating the installation or disassembly of components in the future.

[0012] Furthermore, the first inspection door 60 and / or the second inspection door 70 are provided with a fourth installation port 170 for installing an ion source neutralizer. The ion source neutralizer is used to attract and neutralize excess charged ions in the first ion source 40 and the second ion source 50, thereby protecting the stable operation of the equipment.

[0013] Furthermore, the first inspection door 60 and / or the second inspection door 70 are connected to an observation window 180 for observing the coating status. The observation window 180 is provided with a baffle, and the observation window 180 is provided with a first handle 190. One end of the first handle 190 is connected to the baffle. The baffle is used to isolate the coating material and protect the glass of the observation window 180. The baffle is moved by rotating the first handle 190 up and down.

[0014] Furthermore, a second handle 200 is connected to the first inspection door 60 and the second inspection door 70 to facilitate opening or closing the first inspection door 60 and the second inspection door 70.

[0015] The beneficial effects of this utility model are as follows: This utility model proposes an easy-to-maintain IBE ion beam etching device, including a cavity body 10. A target material 20 is connected inside the cavity body 10. A stage mechanism 30 is provided above the target material 20. The stage mechanism 30 is connected to the cavity body 10 through a rotation drive mechanism. The rotation drive mechanism drives the stage mechanism 30 to adjust its angle. A wafer substrate to be coated is provided on the stage mechanism 30. A first ion source 40 is provided on one side of the cavity body 10, and a second ion source 50 is provided on the other side. A first inspection door 60 is connected to one side of the cavity body 10, and a second inspection door 70 is connected to the other side of the cavity body 10 and located at the first inspection door. On opposite sides of door 60, both the first inspection door 60 and the second inspection door 70 are hinged to the cavity body 10 via hinges 80. The lower part of the first inspection door 60 is provided with a first mounting port 90, and the first ion source 40 is connected to the first mounting port 90. The upper part of the second inspection door 70 is provided with a second mounting port 100, and the second ion source 50 is connected to the second mounting port 100. When the first ion source 40 or the second ion source 50 malfunctions, repairs can be performed by opening the corresponding first inspection door 60 or second inspection door 70. By providing the first inspection door 60 and the second inspection door 70, the efficiency of repairs is greatly improved, saving time and effort, and is also very convenient. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the overall structure of an IBE ion beam etching device that is easy to maintain according to this utility model.

[0017] Figure 2 This is a partial structural diagram of an IBE ion beam etching device that is easy to maintain according to this utility model.

[0018] Figure 3 This is a partially enlarged view of an IBE ion beam etching device that is easy to maintain according to this utility model.

[0019] Figure 4 This is a partial structural diagram of an IBE ion beam etching device that is easy to maintain according to this utility model.

[0020] Explanation of key component symbols:

[0021] The cavity body 10, target material 20, stage mechanism 30, first ion source 40, second ion source 50, first inspection door 60, second inspection door 70, hinge 80, first mounting port 90, second mounting port 100, pressure block 110, switch sensor 120, bottom surface 130, protrusion 140, groove 150, third mounting port 160, fourth mounting port 170, observation window 180, first handle 190, second handle 200.

[0022] The following detailed description, in conjunction with the accompanying drawings, will further illustrate this utility model. Detailed Implementation

[0023] The following embodiments are described to aid in understanding this application. These embodiments are not, and should not be, construed in any way as limiting the scope of protection of this application.

[0024] In the following description, those skilled in the art will recognize that throughout this discussion, components may be described as individual functional units (which may include subunits), but those skilled in the art will recognize that various components or portions thereof may be divided into individual components or may be integrated together (including integrated within a single system or component).

[0025] Furthermore, the connection between components or systems is not intended to be limited to a direct connection; on the contrary, data between these components may be modified, reformatted, or otherwise altered by intermediate components. Additionally, other or fewer connections may be used. It should also be noted that the terms "connection," "link," or "input" should be understood to include direct connections, indirect connections via one or more intermediate devices, and wireless connections. Example 1:

[0026] like Figure 1 The diagram shown is a schematic representation of the overall structure of an IBE ion beam etching apparatus for easy maintenance according to this invention; Figure 2 The diagram shown is a partial structural schematic of an IBE ion beam etching apparatus for easy maintenance according to this utility model; Figure 3 The image shown is a partially enlarged view of an IBE ion beam etching apparatus for easy maintenance according to this utility model; Figure 4 The diagram shown is a partial structural schematic of an IBE ion beam etching device that is easy to maintain according to this utility model.

[0027] An easily maintainable IBE (Ion Beam Etching) apparatus includes a cavity body 10, a target 20 connected inside the cavity body 10, a stage mechanism 30 above the target 20, and the stage mechanism 30 connected to the cavity body 10 via a rotation drive mechanism. The rotation drive mechanism adjusts the angle of the stage mechanism 30. A wafer substrate to be coated is placed on the stage mechanism 30. A first ion source 40 is located on one side of the cavity body 10, and a second ion source 50 is located on the other side. A first inspection door 60 is connected to one side of the cavity body 10, and a second inspection door 60 is connected to the other side of the cavity body 10. Two inspection doors 70 are located on the opposite side of the first inspection door 60. Both the first inspection door 60 and the second inspection door 70 are hinged to the cavity body 10 via hinges 80. The lower part of the first inspection door 60 is provided with a first mounting port 90, and the first ion source 40 is connected to the first mounting port 90. The upper part of the second inspection door 70 is provided with a second mounting port 100, and the second ion source 50 is connected to the second mounting port 100. When the first ion source 40 or the second ion source 50 malfunctions, maintenance can be performed by opening the corresponding first inspection door 60 or second inspection door 70.

[0028] Multiple pressure blocks 110 are provided on both sides of the cavity body 10 at the abutment edges of the first inspection door 60 or the second inspection door 70. The pressure blocks 110 are L-shaped. The inner side of one end of the pressure block 110 fastens to the edge of the first inspection door 60 or the second inspection door 70. The other end of the pressure block 110 is connected to the side of the cavity body 10 by bolts, so that the cavity body 10 has good sealing performance. Switch sensors 120 are also provided on both sides of the cavity body 10 at the abutment edges of the first inspection door 60 or the second inspection door 70 to monitor the sealing status of the first inspection door 60 or the second inspection door 70.

[0029] The pressure block 110 has a bottom surface 130 on the side near the cavity body 10. The bottom surface 130 is a horizontal plane. At the end of the bottom surface 130 away from the first inspection door 60 or the second inspection door 70, a protrusion 140 extending towards the cavity body 10 is provided. When the first inspection door 60 and the second inspection door 70 are installed and the cavity body 10 is not evacuated, because the first inspection door 60 and the second inspection door 70 are not tightly closed, the bottom surface 130 near the first inspection door 60 or the second inspection door 70... One end of the door 70 has a gap with the cavity body 10. After the first inspection door 60 and the second inspection door 70 are installed and the cavity body 10 is evacuated, the first inspection door 60 and the second inspection door 70 are sucked tight. By tightening the pressure block 110 again, the gap between the bottom surface 130 and the cavity body 10 is reduced or eliminated. The allowance of the protrusion 140 helps to press the first inspection door 60 or the second inspection door 70. The allowance of the protrusion 140 is 2-3mm.

[0030] The bottom plate of the cavity body 10 is provided with a groove 150 near the pressure block 110. The groove 150 is used to make way for the pressure block 110 during installation, so as to facilitate installation.

[0031] The first inspection door 60 and / or the second inspection door 70 are provided with a third installation port 160 for easy installation or disassembly of components in the future. The first inspection door 60 and / or the second inspection door 70 are provided with a fourth installation port 170 for installing an ion source neutralizer. The ion source neutralizer is used to attract and neutralize excess charged ions in the first ion source 40 and the second ion source 50, thereby protecting the stable operation of the equipment.

[0032] An observation window 180 is connected to the first inspection door 60 and / or the second inspection door 70 for observing the coating status. A baffle is provided inside the observation window 180, and a first handle 190 is provided on the observation window 180. One end of the first handle 190 is connected to the baffle. The baffle is used to isolate the coating material and protect the glass of the observation window 180. The baffle is moved by rotating the first handle 190 up and down.

[0033] The first inspection door 60 and the second inspection door 70 are provided with a second handle 200 to facilitate opening or closing the first inspection door 60 and the second inspection door 70.

[0034] The beneficial effects of this utility model are as follows: This utility model proposes an easy-to-maintain IBE ion beam etching device, including a cavity body 10. A target material 20 is connected inside the cavity body 10. A stage mechanism 30 is provided above the target material 20. The stage mechanism 30 is connected to the cavity body 10 through a rotation drive mechanism. The rotation drive mechanism drives the stage mechanism 30 to adjust its angle. A wafer substrate to be coated is provided on the stage mechanism 30. A first ion source 40 is provided on one side of the cavity body 10, and a second ion source 50 is provided on the other side. A first inspection door 60 is connected to one side of the cavity body 10, and a second inspection door 70 is connected to the other side of the cavity body 10 and located at the first inspection door. On opposite sides of door 60, both the first inspection door 60 and the second inspection door 70 are hinged to the cavity body 10 via hinges 80. The lower part of the first inspection door 60 is provided with a first mounting port 90, and the first ion source 40 is connected to the first mounting port 90. The upper part of the second inspection door 70 is provided with a second mounting port 100, and the second ion source 50 is connected to the second mounting port 100. When the first ion source 40 or the second ion source 50 malfunctions, repairs can be performed by opening the corresponding first inspection door 60 or second inspection door 70. By providing the first inspection door 60 and the second inspection door 70, the efficiency of repairs is greatly improved, saving time and effort, and is also very convenient.

[0035] The embodiments described above are merely illustrative of several implementations of this utility model, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of this utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. An easy-to-maintain IBE ion beam etching apparatus, comprising a cavity body (10), wherein a target material (20) is connected inside the cavity body (10), and a stage mechanism (30) is provided above the target material (20). The stage mechanism (30) is connected to the cavity body (10) via a rotation drive mechanism, the rotation drive mechanism drives the stage mechanism (30) to adjust its angle, and a wafer substrate to be coated is provided on the stage mechanism (30). A first ion source (40) is provided on one side of the cavity body (10), and a second ion source (50) is provided on the other side. The apparatus is characterized in that: A first inspection door (60) is connected to one side of the cavity body (10), and a second inspection door (70) is connected to the other side of the cavity body (10) and located on the opposite side of the first inspection door (60). The first inspection door (60) and the second inspection door (70) are both hinged to the cavity body (10) by a hinge (80). The lower part of the first inspection door (60) is provided with a first mounting port (90), and the first ion source (40) is connected to the first mounting port (90). The upper part of the second inspection door (70) is provided with a second mounting port (100), and the second ion source (50) is connected to the second mounting port (100). When the first ion source (40) or the second ion source (50) malfunctions, maintenance can be performed by opening the corresponding first inspection door (60) or second inspection door (70).

2. The easily maintainable IBE ion beam etching apparatus according to claim 1, characterized in that: On both sides of the cavity body (10), there are multiple pressure blocks (110) at the contact edge with the first inspection door (60) or the second inspection door (70). The pressure blocks (110) are L-shaped. One end of the pressure block (110) is fastened to the edge of the first inspection door (60) or the second inspection door (70). The other end of the pressure block (110) is connected to the side of the cavity body (10) by bolts, so that the cavity body (10) has good sealing performance.

3. The easily maintainable IBE ion beam etching apparatus according to claim 2, characterized in that: Switch sensors (120) are provided on both sides of the cavity body (10) at the contact edges with the first inspection door (60) or the second inspection door (70) to monitor the sealing status of the first inspection door (60) or the second inspection door (70).

4. The easily maintainable IBE ion beam etching apparatus according to claim 2, characterized in that: The pressure block (110) has a bottom surface (130) on the side near the cavity body (10). The bottom surface (130) is horizontal. The end of the bottom surface (130) away from the first inspection door (60) or the second inspection door (70) has a protrusion (140) extending towards the cavity body (10). When the first inspection door (60) and the second inspection door (70) are installed and the cavity body (10) is not evacuated, the bottom surface (130) near the first inspection door (60) and the second inspection door (70) are not suctioned. There is a gap between one end of the first inspection door (60) or the second inspection door (70) and the cavity body (10). After the first inspection door (60) and the second inspection door (70) are installed and the cavity body (10) is evacuated, the first inspection door (60) and the second inspection door (70) are sucked together. By tightening the pressure block (110) again, the gap between the bottom surface (130) and the cavity body (10) is reduced or there is no gap. The remaining amount of the protrusion (140) helps to press the first inspection door (60) or the second inspection door (70) together.

5. The easily maintainable IBE ion beam etching apparatus according to claim 4, characterized in that: The allowance of the bump (140) is 2-3 mm.

6. The easily maintainable IBE ion beam etching apparatus according to claim 4, characterized in that: The bottom plate of the cavity body (10) is provided with a groove (150) near the pressure block (110). The groove (150) is used to make way for the pressure block (110) during installation, so as to facilitate installation.

7. The easily maintainable IBE ion beam etching apparatus according to claim 1, characterized in that: The first inspection door (60) and / or the second inspection door (70) are provided with a third installation port (160) for easy installation or disassembly of components later.

8. The easily maintainable IBE ion beam etching apparatus according to claim 7, characterized in that: The first inspection door (60) and / or the second inspection door (70) are provided with a fourth installation port (170) for installing an ion source neutralizer. The ion source neutralizer is used to attract and neutralize excess charged ions in the first ion source (40) and the second ion source (50), thereby protecting the stable operation of the equipment.

9. The easily maintainable IBE ion beam etching apparatus according to claim 8, characterized in that: An observation window (180) is connected to the first inspection door (60) and / or the second inspection door (70) for observing the coating status. A baffle is provided inside the observation window (180), and a first handle (190) is provided on the observation window (180). One end of the first handle (190) is connected to the baffle. The baffle is used to isolate the coating material and protect the glass of the observation window (180). The baffle is moved by rotating the first handle (190) up and down.

10. The easily maintainable IBE ion beam etching apparatus according to claim 9, characterized in that: A second handle (200) is connected to the first inspection door (60) and the second inspection door (70) to facilitate opening or closing the first inspection door (60) and the second inspection door (70).

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