A cleaning mechanism for a vacuum system of an extruder

Abstract

A purification mechanism for a vacuum system in an extruder includes a housing, a water supply tank, a water storage tank, and a connecting pipe. The housing contains a water seal layer. The top of the housing has an inlet pipe for connecting to the extruder's exhaust gas source and an exhaust pipe for connecting to the vacuum system. The downstream end of the inlet pipe extends downwards into the water seal layer. An overflow port, adapted to the height of the water seal layer, is located on the side wall of the housing. A filter frame is installed on the top of the water storage tank, below the overflow port. The water supply tank is located above the housing and connected to it via a float valve, the float of which floats on the water seal layer. The upstream end of the connecting pipe is connected to the bottom of the water storage tank, and the downstream end supplies water to the water supply tank. A water pump is installed on the connecting pipe. This invention has a simple structure, low operating cost, and can meet the need for removing impurities from extruder exhaust gas for extended periods.

Description

Technical Field

[0001] This utility model relates to the field of plastic processing, and in particular to a cleaning mechanism for a vacuum system of an extruder. Background Technology

[0002] When plastic processing companies use molten plastic as raw material and extruders as processing equipment to produce plastic granules, they need to install a vacuum system to forcibly extract the waste gas generated during the extrusion process. Because the exhaust gas from the extruder contains small molecule impurities formed from the breakage of the molten plastic polymer, directly discharging it to the vacuum system would cause damage.

[0003] Currently, filters are typically installed upstream of the vacuum system's intake pipe to separate small molecule impurities. However, as these impurities accumulate, they can easily become clogged, causing a heavy load on the vacuum system and requiring the system to be shut down for filter replacement, which presents a usage defect.

[0004] Therefore, designing a mechanism for the vacuum system of an extruder that can continuously and under low load remove impurities from the exhaust gas is a problem that needs to be solved by those skilled in the art. Summary of the Invention

[0005] The purpose of this invention is to address the shortcomings of existing technologies by providing a purification mechanism for a vacuum system of an extruder. This mechanism has a simple structure, low operating costs, and can meet the need for removing impurities from the exhaust gas of the extruder for extended periods.

[0006] The technical solution of this utility model is: a purification mechanism for a vacuum system of an extruder, comprising a housing, a water supply tank, a water storage tank, and a connecting pipe. The housing is provided with a water seal layer. The top of the housing is provided with an air inlet pipe for connecting to the exhaust gas source of the extruder and an exhaust pipe for connecting to the vacuum system. The downstream end of the air inlet pipe extends downward into the water seal layer. An overflow port is provided on the side wall of the housing, adapted to the height of the water seal layer. A filter frame is provided on the top of the water storage tank, located below the overflow port. The water supply tank is located above the housing and is connected to the housing through a float valve. The float of the float valve floats on the water seal layer. The upstream end of the connecting pipe is connected to the bottom of the water storage tank, and the downstream end supplies water to the water supply tank. A water pump is provided on the connecting pipe.

[0007] The chamber is equipped with a horizontally extending buffer plate, which is located above the water seal layer, and the projection of the exhaust pipe is located on the buffer plate.

[0008] The exhaust pipe is connected to the vacuum system via a U-shaped pipe.

[0009] The container is also equipped with a water supply pipe that is connected to a water source.

[0010] The top of the water storage tank is provided with a supporting flange, and the filter frame is supported on the supporting flange of the water storage tank.

[0011] The downstream end of the intake pipe has a flared shape.

[0012] The above technical solution has the following beneficial effects:

[0013] 1. The impurity removal mechanism of the extruder vacuum system includes a housing, a water supply tank, a water storage tank, and connecting pipes. The housing contains a water seal layer, meaning it stores water at a specified level. The top of the housing has an inlet pipe for connecting to the extruder's exhaust gas source and an exhaust pipe for connecting to the vacuum system. The downstream end of the inlet pipe extends downwards into the water seal layer. Extruder exhaust containing small molecule impurities enters the water seal layer through the inlet pipe. These impurities are adsorbed and trapped by the water seal layer and float on its surface. Since the gas in the water seal layer is insoluble, it collects above the water seal layer and is then extracted by the vacuum system through the exhaust pipe. This also creates negative pressure on the extruder, meeting its operating requirements. An overflow port, adapted to the height of the water seal layer, allows the surface layer containing floating small molecule impurities to drain out of the housing, preventing the accumulation of these impurities within the housing. A filter frame is installed on the top of the water storage tank, located below the overflow port. Water containing small molecule impurities overflowing from the tank passes through the filter frame and is collected in the storage tank. The small molecule impurities are trapped by the filter frame, which does not affect the normal operation of the extruder's vacuum system. The filter frame can be cleaned or replaced at any time, ensuring continuous operation of the impurity removal mechanism. The replenishment tank is located above the housing and is connected to the housing via a float valve. The float of the float valve floats on the water seal layer. The upstream end of the connecting pipe is connected to the bottom of the water storage tank, and the downstream end supplies water to the replenishment tank. A water pump is installed on the connecting pipe. Water collected in the water storage tank is pumped into the replenishment tank. As the water seal layer continues to overflow from the housing, the height of the water seal layer decreases. The float of the float valve then decreases, opening the float valve. This allows water in the replenishment tank to automatically replenish the housing under gravity, restoring the height of the water seal layer to its original height, thus achieving continuous impurity removal.

[0014] 2. A horizontally extending buffer plate is installed inside the chamber. The buffer plate is located above the water seal layer, and the projection of the exhaust pipe is located on the buffer plate. This can effectively prevent water inside the chamber from escaping into the exhaust pipe due to negative pressure, thus ensuring the operational stability of the vacuum system.

[0015] 3. The exhaust pipe is connected to the vacuum system via a U-shaped pipe to trap a small amount of liquid water and ensure the stability of the vacuum system.

[0016] 4. The downstream end of the intake pipe has a flared structure, which reduces the speed at which exhaust gas enters the water seal layer, avoids violent fluctuations in the water seal layer inside the chamber, increases the contact area between the exhaust gas and the water seal layer, and also improves the adsorption efficiency of the water seal layer for small molecule impurities.

[0017] The following description, in conjunction with the accompanying drawings and specific embodiments, provides further details. Attached Figure Description

[0018] Figure 1 This is a connection diagram of the present invention.

[0019] In the attached diagram, 1 is the housing, 2 is the water supply tank, 3 is the water storage tank, 4 is the connecting pipe, 5 is the air inlet pipe, 6 is the exhaust pipe, 7 is the overflow port, 8 is the filter frame, 9 is the float valve, 10 is the water pump, 11 is the buffer plate, 12 is the U-shaped pipe, and 13 is the water supply pipe. Detailed Implementation

[0020] See Figure 1 This is a specific embodiment of a cleaning mechanism in a vacuum system for an extruder. The cleaning mechanism of the vacuum system for an extruder includes a housing 1, a water supply tank 2, a water storage tank 3, and a connecting pipe 4. The housing, water supply tank, and water storage tank are all plastic containers. Obviously, the housing is a closed housing, while the water supply tank and water storage tank are open tanks. A water seal layer is provided in the housing 1. The top of the housing 1 is provided with an air inlet pipe 5 for connecting to the exhaust gas source of the extruder and an exhaust pipe 6 for connecting to the vacuum system. The downstream end of the air inlet pipe 5 extends downward into the water seal layer. Specifically, the downstream end of the air inlet pipe 5 has a flared structure. The exhaust pipe 6 is connected to the vacuum system through a U-shaped pipe 12. To prevent water in the housing from escaping into the exhaust pipe due to negative pressure, a horizontally extending buffer plate 11 is provided inside the housing 1. This buffer plate 11 is located above the water seal layer, and the projection of the exhaust pipe 6 is located on the buffer plate 11, separating the upstream end of the exhaust pipe from the water seal layer by the buffer plate. An overflow port 7 is provided on the side wall of the housing 1, which is adapted to the height of the water seal layer. A filter frame 8 is provided on the top of the water storage tank 3, located below the overflow port 7. Specifically, a supporting flange is provided on the top of the water storage tank 3, and the filter frame 8 is supported on the supporting flange of the water storage tank. The filter frame is a conventional simple filter device, which is constructed by arranging a filter screen inside the frame, which is convenient for cleaning and keeps the filter screen in a taut state. The water supply tank 2 is located above the housing 1 and is connected to the housing 1 through a float valve 9. The float of the float valve 9 floats on the water seal layer. The upstream end of the connecting pipe 4 is connected to the bottom of the water storage tank 3, and the downstream end supplies water to the water supply tank 2. A water pump 10 is provided on the connecting pipe 4.

[0021] To replenish the lost water, a water supply pipe 13 is also installed on the tank 1, which is connected to a water source.

[0022] The working principle of this invention is as follows: The vacuum system provides negative pressure to the extruder, and the water pump is activated, causing the water in the tank to circulate through the storage tank and the replenishment tank. Exhaust gas from the extruder containing small molecule impurities enters the water seal layer of the tank through the air inlet pipe. These impurities are adsorbed and trapped by the water seal layer and float on its surface. The gases in the water seal layer are insoluble and collect above it, then are extracted by the vacuum system through the exhaust pipe. The surface layer of the water containing these impurities is discharged from the tank through the overflow port. The impurities are trapped by the filter frame. The water collected in the storage tank is pumped to the replenishment tank. As the water seal layer continuously overflows from the tank, its height decreases. This causes the float of the float valve to drop, opening the valve and allowing water from the replenishment tank to automatically replenish the tank under gravity, restoring the water seal layer to its original height and achieving continuous impurity removal. When the water seal layer level drops to a point where overflow is impossible, a certain amount of water is added through the replenishment pipe.

Claims

1. A purification mechanism for a vacuum system of an extruder, characterized in that: The system includes a housing (1), a water supply tank (2), a water storage tank (3), and a connecting pipe (4). The housing (1) is equipped with a water seal layer. The top of the housing (1) is equipped with an air inlet pipe (5) for connecting to the exhaust gas source of the extruder and an exhaust pipe (6) for connecting to the vacuum system. The downstream end of the air inlet pipe (5) extends downward into the water seal layer. An overflow port (7) is provided on the side wall of the housing (1), which is adapted to the height of the water seal layer. A filter frame (8) is provided on the top of the water storage tank (3) and is located below the overflow port (7). The water replenishment tank (2) is located above the box body (1) and is connected to the box body (1) through a float valve (9). The float of the float valve (9) floats on the water seal layer. The upstream end of the connecting pipe (4) is connected to the bottom of the water storage tank (3) and the downstream end supplies water to the water replenishment tank (2). A water pump (10) is provided on the connecting pipe (4).

2. The impurity removal mechanism of the extruder vacuum system according to claim 1, characterized in that: The housing (1) is provided with a horizontally extending buffer plate (11), which is located above the water seal layer, and the projection of the exhaust pipe (6) is located on the buffer plate (11).

3. The impurity removal mechanism of the extruder vacuum system according to claim 1, characterized in that: The exhaust pipe (6) is connected to the vacuum system via a U-shaped pipe (12).

4. The impurity removal mechanism of the extruder vacuum system according to claim 1, characterized in that: The box (1) is also equipped with a water supply pipe (13) connected to a water source.

5. The impurity removal mechanism of the extruder vacuum system according to claim 1, characterized in that: The top of the water storage tank (3) is provided with a support flange, and the filter frame (8) is supported on the support flange of the water storage tank.

6. The impurity removal mechanism of the extruder vacuum system according to claim 1, characterized in that: The downstream end of the air intake pipe (5) has a flared structure.

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