An elongated plasma processing chamber structure

Abstract

This utility model discloses a long plasma processing chamber structure, relating to the technical field of ion processing chamber devices. It includes a main chamber with three interconnected cavities inside. Three integrated plates are provided on the top surface of the main chamber. Weight-reducing holes are provided at the upper and lower ends between adjacent cavities, and a light-passing shaft fixing hole is provided in the middle between adjacent cavities. This utility model, through the cooperation of the collecting plate and the burner pressure plate, facilitates the simultaneous spraying of ions in different directions, enabling rapid object processing and improving the device's object processing capability. The cooperation between the high-voltage line inlet and the cavity facilitates the ignition of the internal mixed gas, allowing for better control of ion spray and improving the device's precise control over object processing. This device enhances both object processing capability and ion spray control.

Description

Technical Field

[0001] This utility model relates to the technical field of ion treatment chamber equipment, and in particular to a long plasma treatment chamber structure. Background Technology

[0002] The elongated plasma processing chamber structure is a device for continuous material surface modification. It is suitable for efficient plasma cleaning, coating, and etching processes of strip or roll materials such as semiconductor wafers, photovoltaic thin films, and flexible electronic substrates. It can achieve uniform processing and adapt to the needs of automated production lines. Traditional plasma processing chambers are single chambers, and plasma can only perform single-point processing or rotational processing. They cannot fix the processing area of ​​elongated materials. The processing of elongated materials only involves back-and-forth movement, which is inefficient, and the processing effect is uneven and unstable, failing to meet the needs of rapid production. The purpose of this utility model is to provide a product that can process elongated materials without reciprocating movement, and can improve production efficiency and achieve uniform and stable processing effects. Utility Model Content

[0003] The purpose of this invention is to address the shortcomings of existing technologies by proposing a long plasma processing cavity structure.

[0004] To achieve the above objectives, the present invention adopts the following technical solution: a long plasma treatment cavity structure, including a main cavity, and the main cavity has three vertically connected cavities. The top surface of the main cavity is provided with three integrated plates. Two of the integrated plates are respectively installed at one end and the middle of the top surface of the main cavity, and one integrated plate is installed in the opposite direction at the other end of the top surface of the main cavity. Weight reduction holes are respectively opened at the upper and lower ends between two adjacent cavities, and a light-passing shaft fixing bracket hole is opened in the middle between two adjacent cavities.

[0005] Preferably, a plurality of first locking nuts are installed on the periphery of the top surface of the integrated plate. The first locking nuts are installed in pairs at both ends and the middle of the periphery of the integrated plate, and the integrated plate is connected to the main cavity through the first locking nuts.

[0006] Preferably, four high-voltage line inlets are provided on one side of the top surface of the integrated plate. The high-voltage line inlets penetrate the integrated plate and are connected to the upper end of the cavity inside the main cavity. A groove is provided horizontally inside the integrated plate, and an air inlet pipe connector is installed at one end of the groove.

[0007] Preferably, three collecting plates are installed on the bottom surface of the main cavity. The collecting plates are staggered on the bottom surface of the main cavity, and multiple connecting holes are opened inside the collecting plates. The connecting holes are connected to the lower end of the internal cavity of the main cavity, and a burner pressure plate is installed on the top surface of the collecting plates.

[0008] Preferably, the burner pressure plate is equipped with second locking nuts at both ends and the middle, and three spare burner holes are respectively opened on both sides of the second locking nut in the middle. The spare burner holes are respectively connected to the connecting hole. The burner pressure plate is connected to the collecting plate through the second locking nuts, and burners are installed on the four spare burner holes.

[0009] Compared with the prior art, the beneficial effects of this utility model are as follows: In this utility model, the cooperation between the main cavity and the collecting plate facilitates the collection and spraying of ions inside the main cavity, which facilitates the guidance of ions and improves the utilization rate of ions. The cooperation between the collecting plate and the burner pressure plate facilitates the simultaneous spraying of ions in different directions to handle the problem, which facilitates the rapid processing of objects and improves the device's ability to process objects. The cooperation between the high-voltage line inlet and the cavity facilitates the ignition of the internal mixed gas and the control of ion spraying, which improves the device's ability to precisely control the processing of objects. This device improves the processing capacity of objects and the control of ion spraying. Attached Figure Description

[0010] The accompanying drawings, which are included to provide a further understanding of the present invention and form part of this application, illustrate exemplary embodiments of the present invention and, together with the description thereof, serve to explain the present invention and do not constitute an undue limitation thereof. In the drawings:

[0011] Figure 1 This is a three-dimensional schematic diagram of the overall structure proposed in this utility model;

[0012] Figure 2 This is a three-dimensional schematic diagram of a portion of the structure proposed in this utility model;

[0013] Figure 3 This is a three-dimensional schematic diagram of the integrated board proposed in this utility model;

[0014] Figure 4 This is a schematic cross-sectional view of the collecting plate proposed in this utility model;

[0015] Figure 5 This is a schematic cross-sectional view of the main cavity proposed in this utility model.

[0016] The numbers in the diagram are: 1. Main cavity; 2. Integrated plate; 3. Air inlet pipe connector; 4. First locking nut; 5. Collection plate; 6. Burner pressure plate; 7. Second locking nut; 8. Burner. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0018] Example: See Figure 1-5 This utility model discloses a long plasma treatment cavity structure, including a main cavity 1. The main cavity 1 has three vertically connected cavities inside, which facilitate the connection of various components. The top surface of the main cavity 1 is provided with three integrated plates 2. Two integrated plates 2 are respectively installed at one end and the middle of the top surface of the main cavity 1, and one integrated plate 2 is installed in the opposite direction at the other end of the top surface of the main cavity 1. Weight reduction holes are respectively opened at the upper and lower ends between two adjacent cavities. A light-passing shaft fixing bracket hole is opened in the middle between two adjacent cavities, which facilitates the stabilization and fixation of the main cavity 1. Multiple first locking nuts 4 are installed on the periphery of the top surface of the integrated plate 2. The first locking nuts 4 are installed in pairs at both ends and the middle of the periphery of the integrated plate 2, and the integrated plate 2 is connected to the main cavity 1 through the first locking nuts 4, which facilitates the fixation of the integrated plate 2 to the upper end of the main cavity 1.

[0019] In this invention, four high-voltage line inlets are provided on one side of the top surface of the integrated plate 2. The high-voltage line inlets penetrate the integrated plate 2 and are connected to the upper end of the cavity inside the main cavity 1. A groove is provided horizontally inside the integrated plate 2, and an air inlet pipe connector 3 is installed at one end of the groove to facilitate the ignition of the gas in the cavity through the high-voltage line. Three collecting plates 5 are installed on the bottom surface of the main cavity 1. The collecting plates 5 are staggered on the bottom surface of the main cavity 1, and multiple connecting holes are provided inside the collecting plates 5. The connecting holes are connected to the lower end of the cavity inside the main cavity 1. A burner pressure plate 6 is installed on the top surface of the collecting plates 5 to facilitate the guidance of the ejected ions through the connecting holes. Second locking nuts 7 are installed at both ends and in the middle of the burner pressure plate 6. Three spare burner holes are provided on both sides of the middle second locking nut 7. The spare burner holes are connected to the connecting holes. The burner pressure plate 6 is connected to the collecting plates 5 through the second locking nuts 7. Burners 8 are installed on the four spare burner holes to facilitate the protection device.

[0020] Working principle: When using this utility model, first fix the device through the hole of the light-passing shaft fixing bracket. At this time, connect the high-voltage line through the high-voltage line inlet. Then place the object to be processed under the burner pressure plate 6. When the object passes through the burner pressure plate 6, the gas inside the cavity of the main chamber 1 is ignited by the high voltage. The gas is collected by the collecting plate 5 and sprayed out through the spare hole of the burner nozzle. At this time, the object surface is processed in multiple directions by the three burner pressure plates 6. When the object is processed, the air inlet can be closed to stop the flame from spraying from the spare hole of the burner nozzle, and the processed object can be removed. The processing is now complete.

[0021] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. An elongated plasma processing chamber structure comprising a main chamber (1), characterized in that: The main cavity (1) has three vertically connected cavities inside, and the top surface of the main cavity (1) has three integrated plates (2). Two of the integrated plates (2) are installed at one end and the middle of the top surface of the main cavity (1), and one integrated plate (2) is installed in the opposite direction at the other end of the top surface of the main cavity (1). Weight reduction holes are opened at the upper and lower ends between two adjacent cavities, and a light-passing shaft fixing bracket hole is opened in the middle between two adjacent cavities.

2. The elongated plasma processing chamber structure of claim 1, wherein: Multiple first locking nuts (4) are installed on the periphery of the top surface of the integrated plate (2). The first locking nuts (4) are installed in pairs at both ends and the middle of the periphery of the integrated plate (2), and the integrated plate (2) is connected to the main cavity (1) through the first locking nuts (4).

3. The elongated plasma processing chamber structure of claim 1, wherein: The integrated plate (2) has four high-voltage line inlets on one side of its top surface. The high-voltage line inlets penetrate the integrated plate (2) and are connected to the upper end of the cavity inside the main cavity (1). The integrated plate (2) has a groove in the middle, and an air inlet pipe connector (3) is installed at one end of the groove.

4. The elongated plasma processing chamber structure of claim 1, wherein: Three collecting plates (5) are installed on the bottom surface of the main cavity (1). The collecting plates (5) are staggered on the bottom surface of the main cavity (1), and multiple connecting holes are opened inside the collecting plates (5). The connecting holes are connected to the lower end of the cavity inside the main cavity (1). A burner pressure plate (6) is installed on the top surface of the collecting plates (5).

5. The elongated plasma processing chamber structure of claim 4, wherein: The burner pressure plate (6) is equipped with a second locking nut (7) at both ends and in the middle. Three spare nozzle holes are opened on both sides of the second locking nut (7) in the middle. The spare nozzle holes are connected to the connecting hole. The burner pressure plate (6) is connected to the collecting plate (5) through the second locking nut (7). The four spare nozzle holes are equipped with burners (8).

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