A high-temperature workpiece stage and wafer heating equipment

Abstract

This utility model discloses a high-temperature workpiece stage and wafer heating equipment, relating to the field of wafer processing technology. Specifically, it includes a vacuum chamber, inside which are arranged heating components, a support platform, and a transmission structure. The heating component includes a heating bracket and a heater, with the heater connected to one end of the heating bracket. The support platform includes a bracket, located at the same end as the heater and the heating bracket, and aligned closely to the heater. The output end of the transmission structure is connected to the bracket. This application aligns the heater and bracket of the heating component. When the bracket rotates due to the operation of the transmission structure, the workpiece and heater are brought into close contact, increasing the effective contact area between them. This allows the heat from the heater to be concentrated and transferred to the workpiece. Simultaneously, during the rotation of the bracket, it causes the workpiece to rotate uniformly around the heater, further improving the heating uniformity of the workpiece and avoiding production defects caused by uncontrollable temperature.

Description

Technical Field

[0001] This utility model relates to the field of wafer processing technology, and in particular to a high-temperature workpiece stage and wafer heating equipment. Background Technology

[0002] A high-temperature workpiece stage is a precision device that can support workpieces and perform high-temperature processing. It typically consists of heating elements, a temperature control system, and a stage. It can provide a stable high-temperature environment and precise temperature control for workpieces and is widely used in industrial production and scientific research experiments, such as glass substrates, silicon wafers, and ceramic substrates for displays. This application takes wafers as an example.

[0003] In the semiconductor wafer manufacturing process, annealing is a core step in the "performance tuning" of thin film processing. It is generally performed after thin film deposition and aims to optimize the physical, chemical, or electrical properties of the thin film. Therefore, a high-temperature stage is often required in this core step to place the annealed wafer.

[0004] In semiconductor manufacturing, wafers are the core material, and their heating process has a significant impact on device performance and quality. Current technology often uses a closed vacuum region to place the wafer and heat it within an internal cavity. Specifically, a heater is placed on the inner wall of the cavity, and the wafer is heated by the heater's heat output. However, this approach has significant technical limitations, primarily due to the considerable distance between the heater and the wafer. This results in a gradual decrease in the amount of heat radiated from the heater towards the wafer, making it difficult to precisely control the temperature around the wafer. This temperature inhomogeneity can easily lead to wafer deformation and uneven film thickness, posing a serious threat to the performance and quality of semiconductor devices.

[0005] Therefore, this application aims to solve the problem of uniform heating of workpieces during the heating process and ensure the production quality of workpieces. Utility Model Content

[0006] The main purpose of this invention is to provide a high-temperature workpiece stage and wafer heating equipment, which aims to improve the heat accumulation capacity of the heater and improve the heating uniformity of the workpiece.

[0007] To achieve the above objectives, this utility model proposes a high-temperature workpiece stage, comprising:

[0008] A vacuum chamber, the interior of which is configured with:

[0009] A heating element includes a heating bracket and a heater, wherein the heater is connected to one end of the heating bracket;

[0010] A support platform, including a bracket, the bracket being disposed at the same end of the heater and the heating bracket, and aligned closely to the heater; and

[0011] The transmission structure has its output end connected to the bracket.

[0012] Furthermore, the heating component includes a hollow tube connected to the heating bracket on the side away from the heater.

[0013] Furthermore, at least one wire hole is provided at one end of the hollow tube near the heating bracket.

[0014] Furthermore, the heating component includes a protective cover connected to the outer wall of the heating bracket, and the protective cover and the heating bracket together form an opening facing the bracket.

[0015] Furthermore, the inner wall of the heating bracket is connected to a support column, and the heater is connected to the end of the support column to adjust the distance between the heater and the bracket.

[0016] Furthermore, the support platform includes a support frame and a connecting rod. One end of the connecting rod is connected to the edge of the support frame, and the other end is connected to the bracket. The end of the support frame away from the bracket is connected to the output end of the transmission structure.

[0017] Furthermore, the transmission structure includes a sealing shaft, a driving wheel, an intermediate wheel one, an intermediate wheel two, and a driven wheel. The sealing shaft is rotatably connected to the inner wall of the vacuum chamber. The driving wheel is connected to the end of the sealing shaft. The driving wheel, the intermediate wheel one, the intermediate wheel two, and the driven wheel can all be selected as spur gears and mesh with each other in sequence. The middle part of the driven wheel is connected to the support frame.

[0018] Furthermore, the device includes a mounting bracket and a motor. A flange is provided on one side wall of the vacuum chamber, the mounting bracket is connected to the flange, the motor is placed on the mounting bracket, and its output end is connected to the sealing shaft.

[0019] Furthermore, it includes a thermocouple electrode feedthrough, which is connected to the flange.

[0020] This application also discloses a wafer heating device, which includes the above-mentioned high-temperature workpiece stage for placing wafers on the tray.

[0021] The above technical solution has the following advantages:

[0022] This application aligns the heater and the bracket of the heating component, and places the workpiece, such as a wafer, on the bracket. When the bracket rotates due to the operation of the transmission structure, the workpiece and the heater come into close contact, increasing the effective contact area between them. This allows the heat from the heater to be concentrated and transferred to the workpiece. At the same time, during the rotation of the bracket, it drives the workpiece to rotate evenly around the heater, further improving the uniformity of the workpiece's heating and avoiding production defects caused by uncontrollable temperature. Attached Figure Description

[0023] The present invention will now be described in detail with reference to specific embodiments and accompanying drawings, wherein:

[0024] Figure 1 This is a partial cross-sectional view of the present invention;

[0025] Figure 2 For practical purposes Figure 1 Enlarged view of point A in the middle;

[0026] Figure 3 This is a schematic diagram of the transmission structure of this utility model;

[0027] Figure 4 This is a cross-sectional view of the heating component of this utility model.

[0028] In the diagram: 1. Vacuum chamber; 2. Flange; 3. Sealing shaft; 4. Mounting bracket; 5. Motor; 6. Thermocouple electrode feedthrough; 7. Transmission structure; 71. Driving wheel; 72. Intermediate wheel one; 73. Intermediate wheel two; 74. Driven wheel; 75. Belt one; 76. Belt two; 8. Support platform; 81. Support frame; 82. Connecting rod; 83. Bracket; 9. Heating component; 91. Hollow tube; 92. Wire hole; 93. Heating bracket; 94. Thermocouple; 95. Protective cover; 96. Heater; 97. Support column. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the following specific embodiments are only used to explain this utility model and do not constitute a limitation on this utility model.

[0030] like Figures 1-4As shown, a high-temperature workpiece stage includes a vacuum chamber 1. Inside the vacuum chamber 1 are a heating element 9, a support platform 8, and a transmission structure 7. The heating element 9 includes a heating bracket 93 and a heater 96, with the heater 96 connected to one end of the heating bracket 93. The support platform 8 includes a bracket 83, which is located at the same end of the heater 96 and the heating bracket 93, and aligned closely to the heater 96. The output end of the transmission structure 7 is connected to the bracket 83. The heating element 9, the support platform 8, and the transmission structure 7 can all be installed on the inner wall of the vacuum chamber 1, or only one of them can be installed on the inner wall of the vacuum chamber 1. In this application, to increase the height of the workpiece inside the vacuum chamber 1 and facilitate easy loading and unloading, it is preferable that the transmission structure 7 is connected to the bottom side wall of the vacuum chamber 1, with the others extending sequentially towards the top of the vacuum chamber 1 along the transmission structure 7.

[0031] Specifically, the input end of the transmission structure 7 is connected to the bottom wall of the vacuum chamber 1, and its output end is connected to the bracket 83. This allows the input end of the transmission structure 7 to rotate under external drive, and its output end to drive the bracket 83 to rotate, thereby enabling the workpiece on the bracket 83 to rotate synchronously. This causes the workpiece to rotate above the heater 96, and the heater 96 to uniformly heat the workpiece directly above it. The workpiece is close to the heater 96, improving the thermal efficiency of the heater 96 and minimizing heat loss to prevent the temperature from being difficult to control precisely during workpiece heating, which would affect the yield of the workpiece. Preferably, the heater 96 and the workpiece have similar shapes, such as a uniformly round plate. The bracket 83 is provided with a groove for placing the workpiece to define its position. A notch can also be made on the bracket 83 to facilitate the removal of the workpiece from the groove. The bracket 83 and the heater 96 are aligned such that the heater 96 and the workpiece are in the same straight line direction, and their plate surfaces are parallel and close to each other, increasing their effective contact area.

[0032] like Figure 1 and Figure 4 As shown, the heating component 9 includes a hollow tube 91, which is connected to the heating bracket 93 on the side away from the heater 96. The hollow tube 91 can reduce its overall mass while increasing the height of the heating bracket 93.

[0033] Furthermore, at least one wire hole 92 is provided at one end of the hollow tube 91 near the heating bracket 93. The interior of the hollow tube 91 is used for wiring, allowing the wire to pass through the hollow tube and extend out of the wire hole 92. One or more wire holes 92 can be provided, and three are preferably provided in this application, so that the wires extend from different directions to simplify wiring and reduce damage to the wires. A thermocouple 94 is also installed on the heating bracket 93, with the thermocouple 94 close to the heater 96 to detect the temperature at the heater 96, ensuring that the temperature of the heater 96 reaches the predetermined requirements, which helps in real-time monitoring. The terminals of the thermocouple 94 pass through the heating bracket 93, which facilitates wire connection and reduces the impact of high temperature on it.

[0034] like Figure 3 As shown, the heating component 9 includes a protective cover 95, which is connected to the outer wall of the heating bracket 93. The protective cover 95 and the heating bracket 93 together form an opening facing the support 83. The protective cover 95 is located outside the heater 96, and the heating bracket 93 is located below the heater 96. The protective cover 95 and the heating bracket 93 are fixed together, ensuring that the heater 96 is in a container with an upper opening. The heater 96 can only dissipate heat from the top, causing the heat to accumulate towards the support 83, thereby improving heat utilization efficiency and further reducing heat loss caused by thermal radiation.

[0035] like Figure 4 As shown, a support column 97 is connected to the inner wall of the heating bracket 93, and a heater 96 is connected to the end of the support column 97 to adjust the distance between the heater 96 and the bracket 83. One or more support columns 97 can be provided. One end of the support column 97 is connected to the bottom wall of the heating bracket 93, and the other end is used to support the heater 96, ensuring that the heater 96 is in a horizontal position. The support column can be bolted or have an external thread at one end, allowing adjustment of the positional relationship between the support column and the heating bracket 93, adjusting the distance between the heater 96 and the bracket 83, ensuring that the radiation distance between the heater 96 and the workpiece is adjustable, improving the adaptability range, and facilitating the adjustment of temperature feedback sensitivity.

[0036] like Figure 2 and Figure 3 As shown, the support platform 8 includes a support frame 81 and a connecting rod 82. One end of the connecting rod 82 is connected to the edge of the support frame 81, and the other end is connected to the bracket 83. The end of the support frame 81 away from the bracket 83 is connected to the output end of the transmission structure 7. When the transmission structure 7 is driven by an external force, the transmission structure 7 drives the support frame 81, the connecting rod 82, and the bracket 83 to rotate, thereby causing the workpiece on the bracket 83 to rotate and be heated. The connecting rods 82 are preferably evenly distributed on the edge of the support frame 81, such as three vertically evenly connected connecting rods 82 on the edge of the support frame 81, to improve the placement accuracy of the workpiece, ensure that the workpiece is in a horizontal state on the bracket 83, and increase the effective contact surface with the heater 96. The hollow tube 91 facilitates the entry of the heater 96 cable, avoiding the rotation area of ​​the support platform 8 to prevent interference.

[0037] like Figures 1-3As shown, the transmission structure 7 includes a sealing shaft 3, a driving wheel 71, an intermediate wheel 72, an intermediate wheel 73, and a driven wheel 74. The sealing shaft 3 is rotatably connected to the inner wall of the vacuum chamber 1. The driving wheel 71 is connected to the end of the sealing shaft 3. The driving wheel 71, intermediate wheel 72, intermediate wheel 73, and driven wheel 74 can all be driven by spur gears and mesh sequentially. The middle part of the driven wheel 74 is connected to the support frame 81. Preferably, the sealing shaft 3 uses a magnetohydrodynamic (MHD) system to isolate the vacuum environment from the atmospheric environment, transmitting power from the atmospheric side to the vacuum chamber 1. The sealing shaft 3 drives the driving wheel 71 to rotate, which in turn drives the intermediate wheel 72 to rotate. The intermediate wheel 72 then drives the intermediate wheel 73 to rotate, which in turn drives the driven wheel 74 to rotate. The driven wheel 74 drives the support frame 81 to rotate, thereby rotating the bracket 83 connected to the support frame 81. The intermediate wheels 72 and 73 can be coaxial or meshed, depending on the requirements.

[0038] Flexible transmission, such as belts or chains, can be used between the driving wheel 71 and intermediate wheel 72. In this case, the driving wheel 71, intermediate wheel 72, intermediate wheel 73, and driven wheel 74 are all pulleys. In this application, if all are pulleys, a belt 75 is fitted between the driving wheel 71 and intermediate wheel 72. That is, the driving wheel 71 drives the intermediate wheel 72 to rotate through the belt 75. The intermediate wheel 72 and intermediate wheel 73 rotate coaxially. A belt 76 is fitted between the intermediate wheel 73 and driven wheel 74. The intermediate wheel 73 drives the driven wheel 74 to rotate through the belt 76, so that the driving wheel 71 indirectly drives the driven wheel 74 to rotate.

[0039] This application employs multi-stage spur gear meshing transmission or multi-stage belt transmission to improve the smoothness of transmission and the accuracy of positioning.

[0040] A bearing is provided in the middle of the driven wheel 74. The support frame 81 rotates synchronously with the driven wheel 74 through the outer ring of the bearing. The inner ring of the bearing is installed on the housing outside the transmission structure 7 and is fixed to the hollow shaft, ensuring that the support platform 8 and the heating component 9 rotate and are fixed at the output end of the transmission structure 7 respectively.

[0041] This application includes a mounting frame 4 and a motor 5. A flange 2 is provided on one side wall of the vacuum chamber 1. The mounting frame 4 is connected to the flange 2. The motor 5 is placed on the mounting frame 4, and its output end is connected to the sealing shaft 3. The flange 2 is divided into two groups. One group is connected to the bottom wall of the vacuum chamber 1, and the other group is rotatably connected to the outer wall of the sealing shaft 3. The flange 2 at the vacuum chamber 1 is preferably a CF sealing flange 2, and the connection is achieved through the two groups of flanges 2.

[0042] Motor 5 drives the spindle of sealing shaft 3 to rotate through a coupling. The upper end of sealing shaft 3 is supported by a shaft support tube. The outer ring of the deep groove ball bearing is fixed to the outer dimension tube of sealing shaft 3, and the inner ring is fixed to the spindle of sealing shaft 3, thereby supporting the spindle of sealing shaft 3 and preventing it from swinging left and right.

[0043] This application includes a thermocouple electrode feed passage 6, which is connected to a flange 2. The thermocouple electrode feed passage 6 is a cable inlet between the vacuum environment and the atmospheric environment, serving a sealing and insulation function. It is used to feed the heating power from the atmospheric environment into the vacuum chamber 1 and to lead out the signal from the thermocouple 94 inside the vacuum chamber 1, thus realizing the arrangement of the wires.

[0044] This application also discloses a wafer heating device, which includes the above-mentioned high-temperature workpiece stage for placing the wafer on the bracket 83. When the wafer is placed in the groove of the bracket 83, the output end of the motor 5 drives the sealing shaft 3 to rotate. The sealing shaft 3 drives the support frame 81 to rotate through the transmission structure 7. The support frame 81 drives the bracket 83 to rotate, so as to drive the wafer to rotate evenly above the heater 96 and improve the uniformity of the wafer's heating.

[0045] Working principle:

[0046] In operation, the control system provides power and introduces cables into the heater 96 through the thermocouple electrode feedthrough 6. The heater 96 begins heating according to the system-set temperature. Thermocouple 94 can detect the real-time temperature of the heater 96 and feed it back to the control system, thus forming a closed-loop control. Simultaneously, motor 5 starts rotating at the system-set speed. Motor 5 drives the spindle of the magnetic fluid sealing shaft 3 to rotate through a coupling. The magnetic fluid sealing shaft 3 drives several wheels of the transmission structure 7. The power is ultimately driven by the belt set or wheel set to rotate the support platform 8, thereby driving the bracket 83 and the wafer to rotate. The rotation of the wafer improves the uniformity of the wafer's heating temperature.

[0047] The above description is only a preferred embodiment of the present utility model and does not limit the patent scope of the present utility model. All equivalent structural transformations made under the inventive concept of the present utility model using the contents of the present utility model specification and drawings, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present utility model.

Claims

1. A high-temperature workpiece stage, characterized in that, include: Vacuum chamber (1), the interior of which is configured with: The heating component (9) includes a heating bracket (93) and a heater (96), wherein the heater (96) is connected to one end of the heating bracket (93); A support platform (8) includes a bracket (83) disposed at the same end of the heater (96) and the heating bracket (93), and aligned closely to the heater (96); and The transmission structure (7) has its output end connected to the bracket (83).

2. The high temperature object table of claim 1, wherein, The heating component (9) includes a hollow tube (91) connected to the heating bracket (93) on the side away from the heater (96).

3. The high temperature object table of claim 2, wherein, The hollow tube (91) has at least one wire hole (92) at one end near the heating bracket (93).

4. The high temperature object table of claim 1, wherein, The heating component (9) includes a cover (95) connected to the outer wall of the heating bracket (93), and the cover (95) and the heating bracket (93) together form an opening facing the bracket (83).

5. The high temperature object table of claim 1, wherein, The inner wall of the heating bracket (93) is connected to a support column (97), and the heater (96) is connected to the end of the support column (97) to adjust the distance between the heater (96) and the bracket (83).

6. The high-temperature workpiece stage as described in claim 1, characterized in that, The support platform (8) includes a support frame (81) and a connecting rod (82). One end of the connecting rod (82) is connected to the edge of the support frame (81), and the other end is connected to the bracket (83). The end of the support frame (81) away from the bracket (83) is connected to the output end of the transmission structure (7).

7. The high-temperature workpiece stage as described in claim 6, characterized in that, The transmission structure (7) includes a sealing shaft (3), a driving wheel (71), an intermediate wheel one (72), an intermediate wheel two (73), and a driven wheel (74). The sealing shaft (3) is rotatably connected to the inner wall of the vacuum chamber (1). The driving wheel (71) is connected to the end of the sealing shaft (3). A belt one (75) is sleeved between the driving wheel (71) and the intermediate wheel one (72). The intermediate wheel one (72) and the intermediate wheel two (73) are coaxially fixed. A belt two (76) is sleeved between the intermediate wheel two (73) and the driven wheel (74). The middle part of the driven wheel (74) is connected to the support frame (81).

8. The high-temperature workpiece stage as described in claim 7, characterized in that, Includes a mounting bracket (4) and a motor (5). A flange (2) is provided on one side wall of the vacuum chamber (1). The mounting bracket (4) is connected to the flange (2). The motor (5) is placed on the mounting bracket (4), and its output end is connected to the sealing shaft (3).

9. The high-temperature workpiece stage as described in claim 8, characterized in that, It includes a thermocouple electrode feed (6), which is connected to the flange (2).

10. A wafer heating device, characterized in that, It includes a high-temperature workpiece stage as described in any one of claims 1 to 9, for placing a wafer on the holder (83).

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