Dry etching exhaust gas treatment device

Abstract

The utility model provides a kind of exhaust treatment device for dry etching, comprising: exhaust duct, the exhaust duct includes air inlet and exhaust port, the air inlet is connected with dry etching device;Heating belt, the heating belt is wrapped and arranged outside the exhaust duct;Deposition device, one end of the deposition device is connected with the air inlet, the other end of the deposition device is connected with the exhaust port, and the deposition device is adapted to make exhaust deposition to form polymer.The exhaust treatment device for dry etching provided by the utility model can reduce the condensation of exhaust to form polymer in the exhaust duct, reduce the blockage of exhaust duct, and improve the efficiency of exhaust treatment.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and in particular to a tail gas treatment device for dry etching. Background Technology

[0002] Dry etching is a crucial process in semiconductor manufacturing. It often requires the use of various chemical gases, which are extracted from the etching chamber during the process, creating various toxic and harmful exhaust gases. To avoid air pollution, these exhaust gases must be effectively treated before being released, thus reducing environmental impact.

[0003] Currently, the exhaust gas generated by the dry etching process is usually transported to the exhaust gas treatment device through pipelines for treatment before being discharged. However, during the treatment process, the exhaust gas is prone to depositing and forming polymers in the pipeline. After the polymers accumulate, they can easily cause blockages in the pipeline, resulting in poor exhaust. Regular shutdowns are required to maintain, inspect, and clean the pipeline, which takes a long time and affects the treatment and discharge of exhaust gas, thereby affecting the process and causing product manufacturing delays. Utility Model Content

[0004] The technical problem solved by this utility model is to provide a tail gas treatment device for dry etching, which can reduce the polymer deposited in the exhaust pipe and reduce the occurrence of exhaust pipe blockage.

[0005] To solve the above-mentioned technical problems, this utility model provides a tail gas treatment device for dry etching, comprising: an exhaust pipe including an air inlet and an exhaust outlet, the air inlet being connected to a dry etching device; a heating belt wrapped around the outside of the exhaust pipe; and a deposition device, one end of which is connected to the air inlet and the other end of which is connected to the exhaust outlet, the deposition device being adapted to deposit the tail gas to form a polymer.

[0006] Optionally, the exhaust pipe includes a main pipe, a first auxiliary pipe, and a second auxiliary pipe. The main pipe connects the air inlet and the exhaust outlet. One end of the deposition device is connected to the air inlet through the first auxiliary pipe, and the other end of the deposition device is connected to the exhaust outlet through the second auxiliary pipe.

[0007] Optionally, it also includes a first valve, which is disposed on the main pipeline and is used to control the opening and closing of the main pipeline.

[0008] Optionally, the deposition device includes a first deposition device connected to the first auxiliary pipe. The first deposition device includes a collection box and a collection liner disposed within the collection box, wherein the temperature inside the collection box is lower than the temperature inside the exhaust pipe.

[0009] Optionally, the deposition apparatus further includes a second deposition apparatus connected to the first deposition apparatus and the second auxiliary pipe, the second deposition apparatus including a collection chamber and a condenser disposed in the collection chamber.

[0010] Optionally, the heating band is also wrapped around the outside of the collection chamber.

[0011] Optionally, the condenser includes a condenser tube and a plurality of fins passing through the condenser tube, the plurality of fins being arranged in parallel along the flow direction of the exhaust gas.

[0012] Optionally, the shape of the fins may include arcuate, circular, or rectangular.

[0013] Optionally, when the fin is arc-shaped, the fin includes an arc-shaped edge and a straight edge connecting the two ends of the arc-shaped edge, and the straight edges of adjacent fins are arranged in opposite directions.

[0014] Optionally, a second valve may also be included, which is disposed on the second secondary pipeline to control the on / off state of the second secondary pipeline.

[0015] Optionally, a third valve may also be included, which is disposed on the first secondary pipe to control the opening and closing of the first secondary pipe.

[0016] Optionally, it also includes a gas input device, which is connected to the first auxiliary pipe, and the connection port between the gas input device and the first auxiliary pipe is located between the third valve and the first deposition device.

[0017] Optionally, a fourth valve may also be included, which is disposed on the connection passage between the gas input device and the first auxiliary pipe.

[0018] Compared with the prior art, the technical solution of this utility model embodiment has the following beneficial effects:

[0019] The exhaust gas treatment device provided by this technical solution has two aspects. First, a heating belt is installed outside the exhaust pipe. The heating belt can heat the exhaust gas in the exhaust pipe, thereby increasing the temperature of the exhaust gas and reducing the deposition of polymers in the exhaust pipe. Second, a deposition device is installed between the air inlet and the exhaust outlet of the exhaust pipe. When the high-temperature exhaust gas enters the deposition device, it is easily deposited in the deposition device upon encountering cold air, thus preventing the formation of polymers in the exhaust pipe and reducing the occurrence of exhaust pipe blockage.

[0020] Furthermore, the exhaust pipe includes a main pipe, a first auxiliary pipe, and a second auxiliary pipe. The main pipe connects the air inlet and the exhaust outlet. One end of the deposition device is connected to the air inlet via the first auxiliary pipe, and the other end of the deposition device is connected to the exhaust outlet via the second auxiliary pipe. The exhaust pipe, including the main pipe and the first and second auxiliary pipes, allows for temporary venting through the main pipe when cleaning polymer deposits in the deposition device, eliminating the need for machine shutdown and improving production efficiency.

[0021] Furthermore, when the fin is arc-shaped, the fin includes an arc-shaped edge and a straight edge connecting the two ends of the arc-shaped edge, with the straight edges of adjacent fins facing opposite directions. The arc-shaped fins and the opposite orientation of the straight edges of adjacent fins allow for a change in exhaust gas velocity at the corners of the arc-shaped edges, enabling the exhaust gas to more fully contact the fin surface and facilitating polymer condensation on the fin surface. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the exhaust gas treatment device for dry etching in one embodiment of the present invention;

[0023] Figure 2 This is a schematic diagram of the shape of the fins in one embodiment of the present invention;

[0024] Figure 3 This is a schematic diagram showing the orientation of the straight edges of adjacent fins in one embodiment of the present invention. Detailed Implementation

[0025] As described in the background section, when dealing with exhaust gas generated by dry etching processes, polymers are easily deposited in the exhaust pipes. After a long period of accumulation, these polymers can clog the pipes, requiring machine shutdown for maintenance and cleaning. Machine downtime affects the treatment and emission of exhaust gas, leading to reduced production efficiency.

[0026] To address the aforementioned problems, this utility model provides a dry etching exhaust gas treatment device, including an exhaust pipe, a heating belt, and a deposition device. The exhaust pipe discharges the exhaust gas generated by the dry etching device. The heating belt is wrapped around the outside of the exhaust pipe to maintain a high temperature in the environment of the exhaust pipe and the exhaust gas inside, thereby reducing the deposition of polymers in the exhaust pipe. Furthermore, a deposition device is installed between the inlet and outlet of the exhaust pipe. When the exhaust gas passes through the deposition device, it easily condenses into a solid upon cooling, allowing harmful substances in the exhaust gas to deposit as polymers as possible within the deposition device. This improves the cleanliness of the exhaust gas and reduces polymer deposition in the exhaust pipe, thus minimizing the occurrence of exhaust pipe blockage.

[0027] To make the above-mentioned objectives, features and beneficial effects of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings.

[0028] Figure 1 This is a schematic diagram of the exhaust gas treatment device for dry etching in one embodiment of the present invention; Figure 2 This is a schematic diagram of the shape of the fins in one embodiment of the present invention; Figure 3 This is a schematic diagram showing the orientation of the straight edges of adjacent fins in one embodiment of the present invention.

[0029] refer to Figure 1 The dry etching exhaust gas treatment device 10 includes: an exhaust pipe 100, which includes an air inlet 101 and an exhaust outlet 102, the air inlet 101 being connected to a dry etching device (not shown); a heating band 200, which is wrapped around the outside of the exhaust pipe 100; and a deposition device 300, one end of which is connected to the air inlet 101 and the other end of which is connected to the exhaust outlet 102, the deposition device 300 being adapted to deposit the exhaust gas to form a polymer.

[0030] In this embodiment, the dry etching apparatus generates exhaust gas during the dry etching process. The exhaust gas enters the exhaust pipe 100 through the air inlet 101, then passes through the deposition apparatus 300, and finally is discharged from the exhaust port 102.

[0031] In this embodiment, the heating band 200 is wrapped around the outside of the exhaust pipe 100, which can heat the exhaust pipe 100 and maintain a high ambient temperature inside the exhaust pipe 100, making it less likely for the exhaust gas to condense into polymers upon cooling in the exhaust pipe 100. In addition, the exhaust gas heated by the heating band in the exhaust pipe is more likely to be cooled and deposited in the deposition device 300 to form polymers when passing through the deposition device, reducing the amount of toxic and harmful substances in the exhaust gas. Since most of the toxic and harmful substances are deposited in the deposition device 300, it can reduce their deposition and polymer formation in the exhaust pipe 100, reduce the occurrence of blockage in the exhaust pipe 100, and facilitate the normal treatment and emission of exhaust gas.

[0032] Continue to refer to Figure 1 The exhaust pipe 100 includes a main pipe 110, a first auxiliary pipe 120, and a second auxiliary pipe 130. The main pipe 110 connects the air inlet 101 and the exhaust outlet 102. One end of the deposition device 300 is connected to the air inlet 101 through the first auxiliary pipe 120, and the other end of the deposition device 300 is connected to the exhaust outlet 102 through the second auxiliary pipe 130.

[0033] In this embodiment, the first auxiliary pipe 120 includes a first air port 121 and a second air port 122. The first air port 121 is connected to the main pipe 110 and located between the air inlet 101 and the exhaust port 102. The second air port 122 is connected to one end of the deposition device 300. The second auxiliary pipe 130 includes a third air port 131 and a fourth air port 132. The third air port 131 is connected to the main pipe 110 and located between the air inlet 101 and the exhaust port 102. The fourth air port 132 is connected to the other end of the deposition device 300.

[0034] In this embodiment, the main pipe 110, the first auxiliary pipe 120, the second auxiliary pipe 130, and the deposition device 300 are detachably connected to each other. When it is necessary to clean the polymer in the deposition device 300 or the exhaust pipe 100, it is convenient to disassemble the main pipe 110, the first auxiliary pipe 120, the second auxiliary pipe 130, and the deposition device 300 for cleaning and maintenance.

[0035] In this embodiment, the heating band 200 is wrapped around the outside of the main pipe 110, the first auxiliary pipe 120 and the second auxiliary pipe 130.

[0036] In this embodiment, the dry etching exhaust gas treatment device 10 further includes a first valve 410, which is disposed on the main pipe 110 and is used to control the opening and closing of the main pipe 110. Specifically, the first valve 410 is located between the first gas port 121 of the first auxiliary pipe 120 and the third gas port 131 of the second auxiliary pipe 130.

[0037] In this embodiment, the dry etching exhaust gas treatment device 10 further includes a second valve 420 and a third valve 430. The second valve 420 is disposed on the second auxiliary pipe 130 to control the opening and closing of the second auxiliary pipe 130, and the third valve 430 is disposed on the first auxiliary pipe 120 to control the opening and closing of the first auxiliary pipe 120.

[0038] In this embodiment, during exhaust gas treatment, the first valve 410 is closed while the second valve 420 and the third valve 430 are opened. The exhaust gas enters the exhaust pipe 100 from the inlet 101. Since the main pipe 110 is disconnected, the exhaust gas enters the first auxiliary pipe 120 from the first outlet 121. It travels along the path of the first auxiliary pipe 120, the deposition device 300, and the second auxiliary pipe 130 to the exhaust outlet 102. This ensures that the exhaust gas passes through the deposition device 300 before being discharged from the exhaust outlet 102, thereby condensing most of the toxic and harmful substances in the exhaust gas in the deposition device 300 and reducing the formation of polymers in the exhaust pipe 100.

[0039] In this embodiment, the deposition device 300 includes a first deposition device 310, which is connected to the first secondary pipe 120. The first deposition device 310 includes a collection box 311 and a collection liner 312 disposed in the collection box 311. The temperature inside the collection box 311 is lower than the temperature inside the exhaust pipe 100.

[0040] In this embodiment, no heating belt or other heating device is provided outside the first deposition device 310.

[0041] In this embodiment, the exhaust gas generated by the dry etching device enters the exhaust pipe 100 through the air inlet 101 and enters the first deposition device 310 along the first auxiliary pipe 120. Since the exhaust pipe 100 is equipped with a heating belt 200, the temperature of the exhaust gas increases after passing through the exhaust pipe 100. When it enters the first deposition device 310, it is easy to condense into polymers when it encounters cold air. This allows the toxic and harmful substances in the exhaust gas to be deposited in the collection liner 312 as much as possible, effectively reducing the toxic and harmful substances in the exhaust gas and also reducing the deposition of polymers in the exhaust pipe 100.

[0042] The inner liner 312 can be made of metal materials such as copper, aluminum, and stainless steel.

[0043] In this embodiment, the collection box 311 further includes a collection box door 313. When the collection box door 313 is closed, it seals the collection box 311. When the collection box door 311 is opened, it is convenient to remove the collection liner 312 from the collection box 311.

[0044] In this embodiment, the deposition apparatus 300 further includes a second deposition apparatus 320, which is connected to the first deposition apparatus 310 and the second auxiliary pipe 130. The second deposition apparatus 320 includes a collection chamber 321 and a condenser 322 disposed in the collection chamber.

[0045] In this embodiment, after the exhaust gas passes through the first deposition device 310 where a portion of the polymer is deposited, it passes through the second deposition device 320 where the remaining doped polymer in the exhaust gas is deposited again. This further reduces the polymer content in the exhaust gas, reduces the formation of polymer deposited in the exhaust pipe 100, and reduces the risk of the exhaust pipe 100 being blocked.

[0046] In this embodiment, the heating band 200 is also wrapped around the outside of the collection chamber 321.

[0047] In this embodiment, a condenser 322 is provided inside the collection chamber 321, and a heating band 200 heats the temperature inside the collection chamber 321. After the exhaust gas enters the collection chamber 321, the temperature difference between it and the condenser 322 is more obvious, and the exhaust gas is more likely to condense on the condenser 322 to form a polymer.

[0048] Continue to refer to Figure 1 The condenser 322 includes a condenser tube 323 and a plurality of fins 324 passing through the condenser tube 323, wherein the plurality of fins 324 are arranged in parallel along the flow direction of the exhaust gas.

[0049] In this embodiment, the length direction of the condenser tube 323 is consistent with the flow direction of the exhaust gas.

[0050] In this embodiment, the condenser tube 323 is bent into a U-shape and vertically penetrates the fin 324.

[0051] In this embodiment, the condenser tube 323 includes an inlet 327 and an outlet 328. The inlet 327 is used to pass cold water into the condenser tube 323, so that the exhaust gas can be cooled and condensed on the fins 324 to form a polymer.

[0052] In some embodiments, one or more sets of U-shaped condenser tubes may be provided.

[0053] In some embodiments, the shape of the fin 324 includes an arc shape, a circle, or a rectangle.

[0054] refer to Figure 2 In this embodiment, the fin 324 is arc-shaped, and the arc-shaped fin includes an arc-shaped edge 325 and a straight edge 326 connecting the arc-shaped edge 325.

[0055] Furthermore, the fin 324 has a superior arc shape, meaning that the arc side is larger than a semicircle.

[0056] By using arc-shaped fins with curved edges, the exhaust gas will be affected by the angle of the curved edges when flowing in the collection chamber 321, and the flow rate of the exhaust gas will change. This allows the exhaust gas to come into fuller contact with the fins 324, resulting in more polymer condensing on the fins 324.

[0057] refer to Figure 3 In this embodiment, the straight edges 326 of adjacent fins 324 are arranged in opposite directions.

[0058] In this embodiment, two adjacent fins 324 are installed opposite to each other. When the exhaust gas flows in the collection chamber 321, it can bend along the arc edge of the fin 324, which increases the contact between the exhaust gas and the fin 324, thereby allowing the polymer in the exhaust gas to be deposited more fully, thus reducing the amount of polymer deposited in the exhaust pipe 100. Figure 1 The arrows in the diagram indicate the path of the exhaust gas flowing along the arc-shaped edge of fin 324.

[0059] In this embodiment, the collection chamber 321 further includes a collection chamber door 329. One end of the opening of the U-shaped condenser tube 323 passes through the collection chamber door 329. The inlet 327 and outlet 328 of the condenser tube 323 are located outside the collection chamber 321, and the rest of the condenser tube 323 and the fins 324 are located inside the collection chamber 321. By opening the collection chamber door 329, the condenser 322 can be removed for cleaning or replacement of the fins 324.

[0060] Continue to refer to Figure 1 The dry etching exhaust gas treatment device 10 also includes a gas input device (not shown), which is connected to the first auxiliary pipe 120, and the connection port between the gas input device and the first auxiliary pipe 120 is located between the third valve 430 and the first deposition device 310.

[0061] In this embodiment, the dry etching exhaust gas treatment device 10 further includes a fourth valve 440, which is disposed on the connection passage between the gas input device and the first auxiliary pipe 120.

[0062] In this embodiment, the gas input device is used to input nitrogen into the exhaust pipe 100 and the deposition device 300. After the exhaust gas treatment is completed, or when the exhaust gas treatment device needs to be disassembled for maintenance or cleaning, non-toxic and harmless nitrogen needs to be discharged into the exhaust gas treatment device first to clear the residual exhaust gas in the exhaust gas treatment device.

[0063] In this embodiment, during maintenance and cleaning, the fourth valve 440, the first valve 410, and the second valve 420 are opened, and the third valve 430 is closed. Nitrogen gas enters from the gas input device and flows along the path of the first auxiliary pipe 120, the first deposition device 310, the second deposition device 320, the second auxiliary pipe 130, and the main pipe 110 until the entire exhaust gas treatment device is filled. Passing through harmless gas for a period of time before maintenance and cleaning ensures that no exhaust gas residue remains in the exhaust gas treatment device, protecting the health and safety of maintenance personnel.

[0064] In this embodiment, after nitrogen purging for a period of time, the fourth valve 440 and the second valve 420 are closed, while the first valve 410 remains open and the third valve 430 remains closed. At this time, the exhaust gas can be discharged through the main pipe 110. Maintenance personnel can open the collection box door 313 to remove the collection liner 312 for polymer cleaning, and open the collection chamber door 329 to remove the condenser 322 for cleaning or replacement of the fins 324. Maintenance and cleaning can be performed without stopping the machine, saving maintenance time and improving production efficiency. After the maintenance and cleaning work is completed, the first valve 410 is closed again, and the second valve 420 and the third valve 430 are opened to continue the exhaust gas discharge treatment.

[0065] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. An exhaust gas treatment device for dry etching, characterized by comprising: include: An exhaust pipe, the exhaust pipe including an air inlet and an exhaust outlet, the air inlet being connected to a dry etching apparatus; A heating element, which is wrapped around the outside of the exhaust pipe; A deposition device, one end of which is connected to the air inlet and the other end of which is connected to the exhaust outlet, the deposition device being adapted to deposit exhaust gas to form a polymer.

2. The exhaust gas treatment device for dry etching according to claim 1, wherein The exhaust pipe includes a main pipe, a first auxiliary pipe, and a second auxiliary pipe. The main pipe connects the air inlet and the exhaust outlet. One end of the deposition device is connected to the air inlet through the first auxiliary pipe, and the other end of the deposition device is connected to the exhaust outlet through the second auxiliary pipe.

3. The exhaust gas treatment device for dry etching according to claim 2, wherein It also includes a first valve, which is installed on the main pipeline and is used to control the opening and closing of the main pipeline.

4. The exhaust gas treatment apparatus for dry etching according to claim 2, wherein The deposition device includes a first deposition device connected to a first auxiliary pipe. The first deposition device includes a collection box and a collection liner disposed within the collection box. The temperature inside the collection box is lower than the temperature inside the exhaust pipe.

5. The exhaust gas treatment apparatus for dry etching according to claim 4, wherein The deposition apparatus further includes a second deposition apparatus connected to the first deposition apparatus and the second auxiliary pipe. The second deposition apparatus includes a collection chamber and a condenser disposed within the collection chamber.

6. The exhaust gas treatment apparatus for dry etching according to claim 5, wherein The heating belt is also wrapped around the outside of the collection chamber.

7. The exhaust gas treatment device for dry etching according to claim 5, wherein The condenser includes a condenser tube and multiple fins passing through the condenser tube, the multiple fins being arranged in parallel along the flow direction of the exhaust gas.

8. The exhaust gas treatment apparatus for dry etching according to claim 7, wherein The shape of the fins can be arc-shaped, circular, or rectangular.

9. The exhaust gas treatment device for dry etching according to claim 8, wherein When the fin is arc-shaped, the fin includes an arc-shaped edge and a straight edge connecting the two ends of the arc-shaped edge, and the straight edges of adjacent fins are arranged in opposite directions.

10. The exhaust gas treatment apparatus for dry etching according to claim 2, wherein It also includes a second valve, which is installed on the second secondary pipeline to control the opening and closing of the second secondary pipeline.

11. The dry etching exhaust treatment apparatus as recited in claim 4, wherein It also includes a third valve, which is installed on the first secondary pipe to control the opening and closing of the first secondary pipe.

12. The exhaust gas treatment apparatus for dry etching according to claim 11, wherein It also includes a gas input device, which is connected to the first auxiliary pipe, and the connection port between the gas input device and the first auxiliary pipe is located between the third valve and the first deposition device.

13. The dry etching tail gas treatment apparatus according to claim 12, wherein It also includes a fourth valve, which is disposed on the connection passage between the gas input device and the first auxiliary pipeline.

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