A metal target heat treatment annealing device

CN224411831UActive Publication Date: 2026-06-26NANJING DAMAI SCI&TECH IND CO LTD
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Patent Information

Application Number
CN202521698486.0
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-08-11
Publication Date
2026-06-26
Estimated Expiration
2035-08-11

AI Technical Summary

Benefits of technology

[0019]本实用新型的有益效果:热处理退火时,金属靶材置于放置框上,在退火炉内处理,为避免放置区域温差,电机带动转杆及椭盘转动,椭盘挤压挤压块,使放置框下移并压缩弹簧,放置框与放置块套合,改变靶材放置区域,椭盘转离后,弹簧推动放置框上移,再次调整位置,配合防滑垫实现稳定放置,从而灵活调节靶材位置,保证均匀退火;

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Abstract

The utility model discloses a metal target material heat treatment annealing device, include: heat treatment annealing furnace, the heat treatment annealing furnace front hinged has the furnace door, the heat treatment annealing furnace outer wall fixed mounting has the support leg, push unit, push unit place above the support leg, push unit includes the elliptic disc, and places the frame and the placement block, takes and puts the unit, take and put the unit place below push unit, take and put the unit includes the clamping block, first magnetic ring and second magnetic ring, under the restriction of heat treatment annealing furnace, can to the metal target material heat treatment annealing treatment above the slide, under the restriction of push unit, can to the metal target material placement area change, avoid its placement area to produce the heat difference, under the restriction of take and put the unit, can quickly pull out the slide to the metal target material loading and unloading.
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Description

Technical Field

[0001] This utility model relates to the field of metal target processing technology, and in particular to a metal target heat treatment annealing device. Background Technology

[0002] Metal targets are target-shaped materials made of metal or metal alloys. As the core target source in sputtering coating processes, their surface atoms are sputtered and deposited onto the substrate surface under the bombardment of high-energy particles to form a functional metal film. Metal target heat treatment annealing equipment is a special equipment used to anneal metal targets. It mainly uses a heating unit to controllably heat, hold, and cool the metal target to eliminate the internal stress generated during the processing, improve its microstructure, and enhance its mechanical or physical properties.

[0003] During the production process, metal sputtering targets need to undergo heat treatment and annealing. Since the metal sputtering targets are often in a static state, this can easily lead to a heat difference in the metal sputtering targets, which affects the heat treatment and annealing effect.

[0004] Therefore, a heat treatment and annealing apparatus for metal targets is needed to solve the above problems. Utility Model Content

[0005] The purpose of this section is to outline some aspects of embodiments of the present invention and to briefly describe some preferred embodiments. Simplifications or omissions may be made in this section, as well as in the abstract and title of this application, to avoid obscuring the purpose of these documents; however, such simplifications or omissions should not be construed as limiting the scope of the present invention.

[0006] In view of the problems of the above-mentioned metal target heat treatment annealing device, this utility model is proposed.

[0007] Therefore, the purpose of this utility model is to provide a heat treatment annealing device for metal targets, which is used to solve the problem that "when metal targets are produced, they need to be heat treated and annealed. Often, the metal targets are in a static state, which can easily lead to poor heat treatment and affect the heat treatment annealing effect".

[0008] To solve the above-mentioned technical problems, this utility model provides the following technical solution: a heat treatment annealing apparatus for metal targets, comprising:

[0009] A heat treatment annealing furnace, wherein a furnace door is hinged to the front of the heat treatment annealing furnace and support legs are fixedly installed on the outer wall of the heat treatment annealing furnace;

[0010] A pushing unit is placed above the support leg. The pushing unit includes an elliptical disk, a placement frame, and a placement block. The elliptical disk is pressed against the extrusion block, causing the placement frame to slide downward and be fitted onto the outer wall of the placement block. The metal target material placed on the top surface of the placement frame is placed above the placement frame to avoid local heat differences in the metal target material placement area.

[0011] The pick-and-place unit is located below the push unit. The pick-and-place unit includes a locking block, a first magnetic ring, and a second magnetic ring. Under the constraint of magnetic repulsion, the locking block can be pushed to confine the slide plate inside the heat treatment annealing furnace. Under the constraint of the heat treatment annealing furnace, the metal target material above the slide plate can be heat treated and annealed. Under the constraint of the push unit, the placement area of ​​the metal target material can be changed to avoid heat difference in the placement area. Under the constraint of the pick-and-place unit, the slide plate can be quickly pulled out to load and unload the metal target material.

[0012] As a preferred embodiment of the metal target heat treatment annealing device of this utility model, the pushing unit includes a mounting plate fixedly installed on the outer wall of the heat treatment annealing furnace, a motor fixedly installed on the outer wall of the mounting plate, a rotating rod fixedly installed at the output end of the motor, and an elliptical disk fixedly installed on the outer wall of the rotating rod.

[0013] In a preferred embodiment of the metal target heat treatment annealing device of this utility model, a sliding plate is slidably arranged inside the heat treatment annealing furnace, a sliding rod is fixedly installed on the top surface of the sliding plate, a sleeve is slidably arranged on the outer wall of the sliding rod, and a spring is provided at the bottom of the sleeve.

[0014] In a preferred embodiment of the metal target heat treatment annealing device of this utility model, a placement frame is fixedly installed on the outer wall of the frame, a placement block is sleeved inside the placement frame, and an extrusion block is fixedly installed on the inner side of the placement frame.

[0015] In a preferred embodiment of the metal target heat treatment annealing device of this utility model, one end of the spring is fixedly installed to the bottom of the sleeve, and the end of the spring away from the sleeve is fixedly installed to the top surface of the slide plate. Under the elastic action of the spring, the sleeve can be pushed to reset.

[0016] As a preferred embodiment of the metal target heat treatment annealing device of this utility model, the device includes a pick-and-place unit, which includes a slot formed inside the slide plate. A limit strip is fixedly installed on the inner wall of the heat treatment annealing furnace. A card block is engaged inside the slot, and a push plate is fixedly installed at the bottom of the card block.

[0017] In a preferred embodiment of the metal target heat treatment annealing device of this utility model, a first magnetic ring is fixedly installed at the bottom of the push plate, a rod is slidably arranged inside the push plate, and a second magnetic ring is fixedly installed on the outer wall of the rod.

[0018] In a preferred embodiment of the metal target heat treatment annealing device of this utility model, the first magnetic ring and the second magnetic ring are magnetically repulsive, and the end of the rod frame is fixedly installed on the inner wall of the heat treatment annealing furnace. Under the restriction of magnetic repulsion, the locking block and the locking slot are stably engaged.

[0019] The beneficial effects of this utility model are as follows: During heat treatment annealing, the metal target is placed on the placement frame and processed in the annealing furnace. To avoid temperature differences in the placement area, the motor drives the rotating rod and the elliptical disk to rotate. The elliptical disk squeezes the extrusion block, causing the placement frame to move down and compress the spring. The placement frame and the placement block fit together, changing the target placement area. After the elliptical disk rotates away, the spring pushes the placement frame up, readjusting the position. With the help of the anti-slip pad, stable placement is achieved, thereby flexibly adjusting the target position and ensuring uniform annealing.

[0020] After annealing, pull down the push plate to disengage the card block from the slot, pull the slide plate, and slide along the limit strip to pick up and put in the target material. The operation is convenient. Push the slide plate back into the furnace, align the slot and the card block, and then release the push plate. Use the repulsive force of the two magnetic rings to push the push plate up to make the card block and the slot securely engaged. Attached Figure Description

[0021] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort. Among them:

[0022] Figure 1 This is a schematic diagram of the main structure of a metal target heat treatment annealing device according to the present invention.

[0023] Figure 2 This is a schematic diagram of the pushing unit and the picking and placing unit of a metal target heat treatment annealing device according to the present invention.

[0024] Figure 3 This is a schematic diagram of the pushing unit structure of a metal target heat treatment annealing device according to the present invention.

[0025] Figure 4 This is a partial structural diagram of the driving unit of a metal target heat treatment annealing device according to the present invention.

[0026] Figure 5 This is a schematic diagram of the pick-and-place unit structure of a metal target heat treatment annealing device according to the present invention.

[0027] Figure 6 This is an exploded structural diagram of the loading and unloading unit of a metal target heat treatment annealing device according to the present invention.

[0028] Figure descriptions: 100, Heat treatment annealing furnace; 101, Furnace door; 102, Support leg; 200, Pushing unit; 300, Picking and placing unit; 201, Mounting plate; 202, Motor; 203, Rotating rod; 204, Elliptical disk; 205, Slide plate; 206, Slide rod; 207, Sleeve; 208, Spring; 209, Placement frame; 210, Placement block; 211, Extrusion block; 301, Slot; 302, Limiting strip; 303, Push plate; 304, Locking block; 305, First magnetic ring; 306, Rod frame; 307, Second magnetic ring. Detailed Implementation

[0029] To make the above-mentioned objectives, features and advantages of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings.

[0030] Many specific details are set forth in the following description in order to provide a full understanding of the present invention. However, the present invention may also be implemented in other ways different from those described herein. Those skilled in the art can make similar extensions without departing from the spirit of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0031] Secondly, the term "an embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The phrase "in one embodiment" appearing in different places in this specification does not necessarily refer to the same embodiment, nor is it a single or selective embodiment that excludes other embodiments.

[0032] Secondly, this utility model is described in detail with reference to the schematic diagrams. When describing the embodiments of this utility model, for ease of explanation, the cross-sectional views illustrating the device structure may be partially enlarged, not adhering to the usual scale. Furthermore, the schematic diagrams are merely examples and should not limit the scope of protection of this utility model. In addition, actual manufacturing should include the three-dimensional spatial dimensions of length, width, and depth.

[0033] Example 1

[0034] Reference Figure 1 and Figure 2 This is the first embodiment of the present invention, which provides a heat treatment annealing apparatus for metal targets, comprising:

[0035] The heat treatment annealing furnace 100 has a furnace door 101 hinged to the front and a support leg 102 fixedly installed on the outer wall of the heat treatment annealing furnace 100.

[0036] The pushing unit 200 is positioned above the support leg 102. The pushing unit 200 includes an elliptical disk 204, a placement frame 209, and a placement block 210. The elliptical disk 204 is pressed by the extrusion block 211, causing the placement frame 209 to slide downward and be fitted onto the outer wall of the placement block 210. This places the metal target material placed on the top surface of the placement frame 209 above the placement frame 209, thus avoiding local heat differences in the metal target material placement area.

[0037] The pick-and-place unit 300 is located below the push unit 200. The pick-and-place unit 300 includes a card block 304, a first magnetic ring 305 and a second magnetic ring 307. Under the restriction of magnetic repulsion, the card block 304 can be pushed to restrict the slide plate 205 inside the heat treatment annealing furnace 100.

[0038] In use, under the constraints of the heat treatment annealing furnace 100, the metal target material above the slide plate 205 can be heat treated and annealed. Under the constraints of the pushing unit 200, the placement area of ​​the metal target material can be changed to avoid heat difference in the placement area. Under the constraints of the pick-and-place unit 300, the slide plate 205 can be pulled out quickly to load and unload the metal target material.

[0039] Example 2

[0040] Reference Figure 3 and Figure 4 This is the second embodiment of the present invention. Unlike the previous embodiment, this embodiment is further optimized based on the above embodiment, as follows:

[0041] The pushing unit 200 includes a mounting plate 201 fixedly installed on the outer wall of the heat treatment annealing furnace 100. A motor 202 is fixedly installed on the outer wall of the mounting plate 201. A rotating rod 203 is fixedly installed at the output end of the motor 202. An elliptical disk 204 is fixedly installed on the outer wall of the rotating rod 203. A sliding plate 205 is slidably arranged inside the heat treatment annealing furnace 100. A sliding rod 206 is fixedly installed on the top surface of the sliding plate 205. A sleeve 207 is slidably arranged on the outer wall of the sliding rod 206. A spring 208 is provided at the bottom of the sleeve 207. A placement frame 209 is fixedly installed on the outer wall of the sleeve 207. A placement block 210 is sleeved inside the placement frame 209. An extrusion block 211 is fixedly installed on the inner side of the placement frame 209.

[0042] One end of the spring 208 is fixedly installed to the bottom of the sleeve 207, and the other end of the spring 208 away from the sleeve 207 is fixedly installed to the top surface of the slide plate 205. Under the elastic action of the spring 208, the sleeve 207 can be pushed to reset.

[0043] In use, when heat-treating and annealing the metal target, it is placed above the placement frame 209. Under the constraints of the heat treatment annealing furnace 100, it can be heat-treated. To avoid heat differences in the placement area of ​​the metal target, its position needs to be adjusted. At this time, the motor 202 is started, and the rotating rod 203 fixedly installed at its output end rotates accordingly. The rotating rod 203 drives the elliptical disk 204 to rotate, and the elliptical disk 204 slides and presses against the top surface of the extrusion block 211. The extrusion block 211 drives the placement frame 209 downwards. The sleeve 207 fixedly installed on the outer wall of the placement frame 209 slides on the outer wall of the slide rod 206, compressing the spring 208 sleeved on the outer wall of the slide rod 206. At this time, the placement frame 209 and the placement block... When the metal target is placed above the placement block 210, the compression block 211 continues to drive the placement frame 209 downward, thus changing the placement area of ​​the metal target for uniform heat treatment and annealing. Subsequently, the elliptical disk 204 rotates and no longer compresses the compression block 211. Under the elastic action of the spring 208, the sleeve 207 is pushed upward. The sleeve 207 supports the bottom of the metal target through the placement frame 209, driving it upward and changing the placement area of ​​the metal target again. Under the restriction of the anti-slip pads on the top surface of the placement frame 209 and the placement block 210, the metal target can be placed stably. This structure can realize flexible adjustment of the placement area of ​​the metal target for uniform heat treatment and annealing.

[0044] Example 3

[0045] Reference Figure 5 and Figure 6 This is the third embodiment of the present invention. Unlike the previous embodiment, this embodiment is further optimized based on the above embodiments, as detailed below:

[0046] The pick-and-place unit 300 includes a slot 301 inside the slide plate 205, a limit strip 302 fixedly installed on the inner wall of the heat treatment annealing furnace 100, a block 304 being engaged inside the slot 301, a push plate 303 being fixedly installed at the bottom of the block 304, a first magnetic ring 305 being fixedly installed at the bottom of the push plate 303, a rod 306 being slidably arranged inside the push plate 303, and a second magnetic ring 307 being fixedly installed on the outer wall of the rod 306.

[0047] Among them, the first magnetic ring 305 and the second magnetic ring 307 are magnetically repulsive, and the end of the rod 306 is fixedly installed on the inner wall of the heat treatment annealing furnace 100. Under the restriction of magnetic repulsion, the card block 304 is stably engaged with the card slot 301.

[0048] In use, after the metal target material has been heat-treated and annealed, the push plate 303 is pulled down and slides on the outer wall of the rod frame 306. The locking block 304 is no longer engaged with the slot 301. The slide plate 205 is pulled, and the two sides of the slide plate 205 slide on the outer wall of the limiting strip 302, so that the metal target material above the slide plate 205 can be taken out. The sliding slide plate 205 can conveniently pick up and put down the metal target material, making the processing more convenient. When the slide plate 205 is pushed into the heat treatment annealing furnace 100, the slot 301 and the locking block 304 are aligned, and the push plate 303 is released. Under the magnetic repulsion of the first magnetic ring 305 and the second magnetic ring 307, the push plate 303 can be pushed upward, so that the locking block 304 is stably engaged with the slot 301.

[0049] It is worth noting that the entire device is controlled by a controller. Since the controller is a common device and belongs to existing mature technology, its electrical connection relationship and specific circuit structure will not be described in detail here.

[0050] It should be understood that numerous specific implementation decisions can be made during the development of any practical implementation, such as in any engineering or design project. Such development efforts may be complex and time-consuming, but for those of ordinary skill in the art who benefit from this disclosure, the development effort will be a routine task in design, manufacturing, and production without requiring extensive experimentation.

[0051] It should be noted that the above embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although this utility model has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solution of this utility model without departing from the spirit and scope of the technical solution of this utility model, and all such modifications or substitutions should be covered within the scope of the claims of this utility model.

Claims

1. A heat treatment annealing apparatus for metal targets, characterized in that, include: A heat treatment annealing furnace (100) is provided with a furnace door (101) hinged to the front of the heat treatment annealing furnace (100) and a support leg (102) is fixedly installed on the outer wall of the heat treatment annealing furnace (100). A pushing unit (200) is placed above the support leg (102). The pushing unit (200) includes an elliptical disk (204), a placement frame (209), and a placement block (210). The elliptical disk (204) is pressed by the extrusion block (211) to make the placement frame (209) slide downward and fit on the outer wall of the placement block (210). The metal target material placed on the top surface of the placement frame (209) is placed above the placement frame (209) to avoid local heat difference in the metal target material placement area. The pick-and-place unit (300) is located below the push unit (200). The pick-and-place unit (300) includes a card block (304), a first magnetic ring (305) and a second magnetic ring (307), which can push the card block (304) under magnetic repulsion to restrict the slide plate (205) inside the heat treatment annealing furnace (100).

2. The heat treatment annealing apparatus for metal targets according to claim 1, characterized in that: The pushing unit (200) includes a mounting plate (201) fixedly installed on the outer wall of the heat treatment annealing furnace (100), a motor (202) fixedly installed on the outer wall of the mounting plate (201), a rotating rod (203) fixedly installed at the output end of the motor (202), and an elliptical disk (204) fixedly installed on the outer wall of the rotating rod (203).

3. The heat treatment annealing apparatus for metal targets according to claim 2, characterized in that: The heat treatment annealing furnace (100) has a sliding plate (205) inside, a sliding rod (206) is fixedly installed on the top surface of the sliding plate (205), a sleeve (207) is slidably installed on the outer wall of the sliding rod (206), and a spring (208) is provided at the bottom of the sleeve (207).

4. The heat treatment annealing apparatus for metal sputtering targets according to claim 3, characterized in that: The outer wall of the frame (207) is fixedly installed with a placement frame (209), a placement block (210) is sleeved inside the placement frame (209), and a pressing block (211) is fixedly installed on the inner side of the placement frame (209).

5. The heat treatment annealing apparatus for metal targets according to claim 3, characterized in that: One end of the spring (208) is fixedly installed at the bottom of the sleeve (207), and the other end of the spring (208) away from the sleeve (207) is fixedly installed at the top surface of the slide plate (205).

6. The heat treatment annealing apparatus for metal targets according to claim 1, characterized in that: The pick-and-place unit (300) includes a slot (301) opened inside the slide plate (205), a limit strip (302) is fixedly installed on the inner wall of the heat treatment annealing furnace (100), a card block (304) is engaged inside the slot (301), and a push plate (303) is fixedly installed at the bottom of the card block (304).

7. The heat treatment annealing apparatus for metal targets according to claim 6, characterized in that: A first magnetic ring (305) is fixedly installed at the bottom of the push plate (303), a rod frame (306) is slidably arranged inside the push plate (303), and a second magnetic ring (307) is fixedly installed on the outer wall of the rod frame (306).

8. The heat treatment annealing apparatus for metal targets according to claim 7, characterized in that: The first magnetic ring (305) and the second magnetic ring (307) are magnetically repulsive, and the end of the rod (306) is fixedly installed on the inner wall of the heat treatment annealing furnace (100).