Laser device

Abstract

The application discloses a laser device, comprising a conical lens, a focusing lens, a galvanometer and a focusing lens group, the conical lens, the focusing lens, the galvanometer and the focusing lens group are sequentially arranged along the propagation direction of light, the conical lens is used for forming a laser beam into a Bessel beam and transmitting the Bessel beam to the focusing lens, the focusing lens focuses the Bessel beam and transmits the Bessel beam to the galvanometer, the galvanometer can deflect and adjust the beam direction of the Bessel beam along the X-axis direction and the Y-axis direction and transmit the Bessel beam to the focusing lens group, and the focusing lens group forms the Bessel beam into a target Bessel beam perpendicular to the glass to be processed. Since the dynamic performance of the galvanometer is far superior to that of the motion platform, in the prior art, the motion platform needs to walk a polygonal path, in the application, the motion platform only needs to walk a macro trajectory, the beam direction is quickly changed by the galvanometer, the combined motion trajectory of the platform and the galvanometer is a polygonal line, and the laser processing requirement can be met, so that the laser processing efficiency is remarkably improved.

Description

Technical Field

[0001] This application relates to the field of laser processing technology, and in particular to a laser device. Background Technology

[0002] The current mainstream glass through-hole fabrication process is laser-induced etching: first, an ultrafast laser induces a modified region inside the glass, then the modified glass is immersed in an etching solution for etching. Because the etching speed of the modified region is much faster than that of the unmodified region, a through-hole is formed. However, in existing technologies, the platform needs to move along a zigzag line in the X and Y axes to move the laser head and / or the product stage in the X and Y axes to complete the laser modification at different locations. This causes two problems: first, the distance of each zigzag line is short, and the platform needs to stop before it can accelerate to high speed; second, after moving to each through-hole position, it is necessary to pause and wait for the platform to stabilize before the light can be emitted, ultimately resulting in low laser processing efficiency. Utility Model Content

[0003] In view of the shortcomings of the prior art, this application provides a laser device that can solve the problem of low laser processing efficiency caused by the mobile platform completing the modification.

[0004] The following technical solution is adopted in this embodiment:

[0005] A laser device includes a conical lens, a focusing lens, a galvanometer, and a focusing lens group. The conical lens, the focusing lens, the galvanometer, and the focusing lens group are arranged sequentially along the direction of light propagation. The conical lens is used to shape the laser beam into a Bessel beam and propagate it to the focusing lens. The focusing lens focuses the Bessel beam and propagates it to the galvanometer. The galvanometer can be deflected along the X-axis and Y-axis to adjust the beam direction of the Bessel beam and propagate it to the focusing lens group. The focusing lens group shapes the Bessel beam into a target Bessel beam perpendicular to the glass to be processed.

[0006] Furthermore, in the laser device, the galvanometer includes a lens that can be deflected along the X-axis and Y-axis to adjust the beam direction of the Bessel beam along the X-axis and Y-axis.

[0007] Furthermore, in the laser device, the galvanometer includes a first lens and a second lens. The first lens can be deflected along the X-axis to adjust the beam direction of the Bessel beam along the X-axis, and the second lens can be deflected along the Y-axis to adjust the beam direction of the Bessel beam along the Y-axis.

[0008] Furthermore, in the laser device, when the laser device is a picosecond laser device, the focusing lens group is a telecentric field lens.

[0009] Furthermore, in the laser device, when the laser device is a femtosecond laser device, the focusing lens group is a telecentric field lens.

[0010] Furthermore, in the laser device, when the laser device is a femtosecond laser device, the focusing lens group is an achromatic telecentric field lens.

[0011] Furthermore, the laser device further includes a laser, and the laser and the conical lens are arranged sequentially along the direction of light propagation. The laser generates a laser beam and propagates to the conical lens.

[0012] Furthermore, in the laser device, the laser is an ultrafast laser.

[0013] Furthermore, in the laser device, the laser has a free-triggering mode, and the time jitter between the trigger electrical pulse of the laser and the output laser pulse is <±1 / fseed.

[0014] Furthermore, the laser device also includes a beam expander, which is disposed between the laser and the conical lens along the direction of light propagation. The beam expander is used to adjust the beam diameter of the laser beam generated by the laser and propagate it to the conical lens.

[0015] Compared to existing technologies, this application provides a laser device comprising a conical lens, a focusing lens, a galvanometer, and a focusing lens group. The conical lens, focusing lens, galvanometer, and focusing lens group are arranged sequentially along the light propagation direction. The conical lens shapes the laser beam into a Bessel beam and propagates it to the focusing lens. The focusing lens focuses the Bessel beam and propagates it to the galvanometer. The galvanometer can deflect along the X-axis and Y-axis to adjust the beam direction of the Bessel beam and propagate it to the focusing lens group. The focusing lens group shapes the Bessel beam into a target Bessel beam perpendicular to the glass to be processed. The focusing lens and the focusing lens group work together to reduce the Bessel beam and increase its intensity, enabling the target Bessel beam to modify the glass. The galvanometer and the focusing lens group work together to adjust the position of the Bessel beam so that the target Bessel beam is perpendicular to the glass. With this design, the dynamic performance of the galvanometer is far superior to that of the motion platform (acceleration is tens of times higher). Therefore, in the case where the motion platform needs to follow a broken path in the prior art, in this invention, the motion platform only needs to follow a macroscopic trajectory (straight line or small curvature arc). By quickly changing the beam direction by the galvanometer, the combined motion trajectory of the platform and the galvanometer is a broken line, which can meet the requirements of laser processing and thus significantly improve the efficiency of laser processing. Attached Figure Description

[0016] Figure 1 Schematic diagram of the structure of a specific embodiment of the laser device provided in this application Figure 1 (The galvanometer includes lenses.)

[0017] Figure 2 Schematic diagram of the structure of a specific embodiment of the laser device provided in this application Figure 2 (The galvanometer includes a first lens and a second lens.)

[0018] Figure 3 The motion trajectory of the laser head and / or platform in a specific embodiment of the laser device provided in this application.

[0019] Among them, 10 is a conical lens; 20 is a focusing lens; 30 is a galvanometer; 31 is a lens; 32 is the first lens; 33 is the second lens; 40 is a focusing lens group; 50 is a laser; 60 is a beam expander; and 70 is glass. Detailed Implementation

[0020] To make the objectives, technical solutions, and effects of this application clearer and more explicit, the following detailed description of this application is provided with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only for explaining this application and are not intended to limit this application. Unless further described, elements, structures, and features in one embodiment may be advantageously combined with other embodiments.

[0021] It should be noted that when a metastructure is referred to as "fixed to" or "set on" another metastructure, it can be directly on or indirectly on that other metastructure. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated.

[0022] The terms “length”, “width”, “upper”, “lower”, “front”, “back”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom”, “inner”, “outer”, etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation.

[0023] Please see Figures 1 to 3The laser device provided in this application includes a conical lens 10, a focusing lens 20, a galvanometer 30, and a focusing lens group 40. The conical lens 10, focusing lens 20, galvanometer 30, and focusing lens group 40 are arranged sequentially along the light propagation direction. The conical lens 10 shapes the laser beam into a Bessel beam and propagates it to the focusing lens 20. The focusing lens 20 focuses the Bessel beam and propagates it to the galvanometer 30. The galvanometer 30 can deflect along the X-axis and Y-axis to adjust the beam direction of the Bessel beam and propagate it to the focusing lens group 40. The focusing lens group 40 shapes the Bessel beam into a target Bessel beam perpendicular to the glass 70 to be processed. The focusing lens 20 and the focusing lens group 40 work together to reduce the Bessel beam and increase its intensity, so that the target Bessel beam can modify the glass 70. The galvanometer 30 and the focusing lens group 40 work together to adjust the position of the Bessel beam so that the target Bessel beam is perpendicular to the glass 70. With this design approach, the dynamic performance of the galvanometer 30 is far superior to that of the motion platform (acceleration is tens of times higher). Therefore, in situations where the motion platform needs to follow a polygonal path (such as...) in existing technologies, this approach is more suitable. Figure 3 As shown in Z1), in this invention, the motion platform only needs to follow a macroscopic trajectory (a straight line or a small curvature arc, such as...). Figure 3 As shown in Z2 (using a straight line as an example), by rapidly changing the beam direction through the galvanometer 30, the combined motion trajectory of the platform and the galvanometer 30 becomes a broken line, which can meet the requirements of laser processing and thus significantly improve the efficiency of laser processing.

[0024] In some embodiments, to enable the galvanometer 30 to flexibly change the beam direction along the X and Y axes, as an optional implementation, the galvanometer 30 includes a lens 31 that can deflect along the X and Y axes to adjust the beam direction of the Bessel beam along the X and Y axes. Specifically, the galvanometer 30 is a fast-reflecting mirror, which can make the perpendicularity of the Bessel beam below the focusing lens group 40 to the glass cup 70 better.

[0025] As another optional implementation, the galvanometer 30 includes a first lens 32 and a second lens 33. The first lens 32 can be deflected along the X-axis to adjust the beam direction of the Bessel beam along the X-axis, and the second lens 33 can be deflected along the Y-axis to adjust the beam direction of the Bessel beam along the Y-axis.

[0026] In some embodiments, as an optional implementation, when the laser device is a picosecond laser device, the focusing lens group 40 is a telecentric field lens. This design allows the picosecond laser to use a telecentric field lens as the focusing lens group 40, thereby improving the consistency, accuracy, and quality of precision machining.

[0027] As an alternative implementation, when the laser device is a femtosecond laser device, the focusing lens group 40 is a telecentric field lens. This design, when the laser device is a femtosecond laser, uses the telecentric characteristics to improve the precision and consistency of femtosecond laser processing, thus meeting its high requirements for focusing stability.

[0028] As another optional implementation, when the laser device is a femtosecond laser device, the focusing lens group 40 is an achromatic telecentric lens. With this design, since the spectrum of femtosecond lasers is relatively wide, achromatic light can be converged to converge light of different wavelengths, resulting in better roundness and uniformity of the femtosecond target Bessel light across the entire field of view compared to when using a non-achromatic telecentric lens.

[0029] In some embodiments, the laser device further includes a laser 50 for generating a laser beam, with the laser 50 and the conical lens 10 arranged sequentially along the direction of light propagation, the laser 50 generating a laser beam and propagating to the conical lens 10.

[0030] Specifically, laser 50 is an ultrafast laser 50. This design utilizes the ultrafast laser's ultra-high peak power and ultra-short pulse width, combined with the non-diffraction characteristics of Bessel beams, to perform localized, through-process modification of the glass.

[0031] Preferably, the laser 50 has a free-triggering mode, and the time jitter between the trigger electrical pulse and the output laser pulse of the laser 50 is <±1 / fseed. This design strictly limits the time deviation between triggering and output to a very small time scale (1 / fseed) corresponding to the seed frequency, significantly reducing random time errors and achieving higher time synchronization accuracy, thus resulting in better glass via position accuracy.

[0032] In some embodiments, the laser device further includes a beam expander 60, which is disposed between the laser 50 and the conical lens 10 along the direction of light propagation. The beam expander 60 is used to adjust the beam diameter of the laser beam generated by the laser 50 and propagate it to the conical lens 10. With this design, the beam expander 60 can adjust the beam diameter of the ultrafast laser beam, thereby adjusting the depth of focus of the Bessel beam to suit the thickness of the glass 70.

[0033] This application provides a laser device comprising a conical lens 10, a focusing lens 20, a galvanometer 30, and a focusing lens group 40. The conical lens 10, focusing lens 20, galvanometer 30, and focusing lens group 40 are sequentially arranged along the light propagation direction. The conical lens 10 shapes the laser beam into a Bessel beam and propagates it to the focusing lens 20. The focusing lens 20 focuses the Bessel beam and propagates it to the galvanometer 30. The galvanometer 30 can deflect along the X-axis and Y-axis to adjust the beam direction of the Bessel beam and propagate it to the focusing lens group 40. The focusing lens group 40 shapes the Bessel beam into a target Bessel beam perpendicular to the glass 70 to be processed. The focusing lens 20 and the focusing lens group 40 work together to reduce the Bessel beam and increase its intensity, enabling the target Bessel beam to modify the glass 70. The galvanometer 30 and the focusing lens group 40 work together to adjust the position of the Bessel beam, ensuring that the target Bessel beam is perpendicular to the glass 70. With this design, since the dynamic performance of the galvanometer 30 is far superior to that of the motion platform, in the case where the motion platform needs to follow a broken line path in the prior art, in this invention, the motion platform only needs to follow a macroscopic trajectory. By rapidly changing the beam direction through the galvanometer 30, the combined motion trajectory of the platform and the galvanometer 30 becomes a broken line, which can meet the requirements of laser processing and thus significantly improve the efficiency of laser processing.

[0034] It is understood that those skilled in the art can make equivalent substitutions or changes based on the technical solution and concept of this application, and all such substitutions or changes should fall within the protection scope of the appended claims.

Claims

1. A laser device, characterized in that, The system includes a conical lens, a focusing lens, a galvanometer, and a focusing lens group. The conical lens, the focusing lens, the galvanometer, and the focusing lens group are arranged sequentially along the direction of light propagation. The conical lens is used to shape the laser beam into a Bessel beam and propagate it to the focusing lens. The focusing lens focuses the Bessel beam and propagates it to the galvanometer. The galvanometer can be deflected along the X-axis and Y-axis to adjust the beam direction of the Bessel beam and propagate it to the focusing lens group. The focusing lens group shapes the Bessel beam into a target Bessel beam perpendicular to the glass to be processed.

2. The laser device according to claim 1, characterized in that, The galvanometer includes a lens that can be deflected along the X-axis and Y-axis to adjust the beam direction of the Bessel beam along the X-axis and Y-axis.

3. The laser device according to claim 1, characterized in that, The galvanometer includes a first lens and a second lens. The first lens can be deflected along the X-axis to adjust the beam direction of the Bessel beam along the X-axis, and the second lens can be deflected along the Y-axis to adjust the beam direction of the Bessel beam along the Y-axis.

4. The laser device according to claim 1, characterized in that, When the laser device is a picosecond laser device, the focusing lens group is a telecentric field lens.

5. The laser device according to claim 1, characterized in that, When the laser device is a femtosecond laser device, the focusing lens group is a telecentric field lens.

6. The laser device according to claim 1, characterized in that, When the laser device is a femtosecond laser device, the focusing lens group is an achromatic telecentric field lens.

7. The laser device according to any one of claims 1 to 6, characterized in that, The laser device further includes a laser, and the laser and the conical lens are arranged sequentially along the direction of light propagation. The laser generates a laser beam and propagates to the conical lens.

8. The laser device according to claim 7, characterized in that, The laser is an ultrafast laser.

9. The laser device according to claim 7, characterized in that, The laser has a free-triggering mode, and the time jitter between the trigger electrical pulse and the output laser pulse of the laser is <±1 / fseed.

10. The laser device according to claim 7, characterized in that, The laser device further includes a beam expander, which is disposed between the laser and the conical lens along the direction of light propagation. The beam expander is used to adjust the beam diameter of the laser beam generated by the laser and propagate it to the conical lens.

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