Chain coating apparatus for liquid phosphorus source

Abstract

The utility model discloses a chain type coating equipment of liquid phosphorus source, this chain type coating equipment includes: conveying subassembly is provided with the roller way for conveying silicon wafer, the conveying roller of roller way is provided with the coating spare, the phosphorus source tank is set up below roller way, makes the phosphorus source in phosphorus source tank wet the coating spare on conveying roller, the coating wheel is set up above roller way, the coating wheel is suitable for coating the surface of silicon wafer close to the coating wheel. The utility model embodiment can make the different position of silicon wafer all be able to be coated to the phosphorus source through the installation of the phosphorus source tank in the lower part of the silicon wafer, thereby the phosphorus source that the silicon wafer surface contacts is also more uniform. In this way, the phosphorus source has obvious reduction through annealing gettering the impurity and defect in the silicon wafer body, thereby the influence of the quality fluctuation of silicon wafer to the efficiency is reduced, the convergence of the electrical performance distribution is improved, thereby the overall efficiency of the battery is improved.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic technology, specifically to a chain coating device for liquid phosphorus source. Background Technology

[0002] In the photovoltaic cell manufacturing process, variations in the quality of silicon wafers used can affect the overall efficiency of the cells. Impurities such as Fe, Cu, and Co in the silicon wafers can form recombination centers, impacting the conversion efficiency of the cells. Therefore, it is necessary to use a phosphorus source for gettering, which can effectively reduce internal impurities and defects in the silicon wafers, minimize the impact of silicon wafer quality fluctuations on efficiency, improve the convergence of electrical performance distribution, and ultimately increase the overall efficiency of the cells.

[0003] Currently, when coating with phosphorus source, the phosphorus slurry is usually first delivered to a sponge roller using a fixed dropper, and then applied to the silicon wafer surface by squeezing through the sponge roller. This results in the phosphorus source being coated on only one side of the silicon wafer, affecting the annealing and gettering effect, and ultimately impacting the conversion efficiency of the solar cell. Utility Model Content

[0004] Therefore, the technical problem to be solved by this utility model is that the silicon wafer is coated with phosphorus source on only one side in the prior art, the annealing gettering effect is poor, and the conversion efficiency of the battery cell is low. Thus, a chain coating device for liquid phosphorus source is provided.

[0005] To achieve the above objectives, this utility model provides a chain coating device for liquid phosphorus source, which includes: a conveying assembly with rollers for conveying silicon wafers; and coating elements are disposed on the conveying rollers of the rollers.

[0006] A phosphorus source tank is disposed below the roller conveyor so that the phosphorus source in the phosphorus source tank wets the coating on the conveyor roller;

[0007] A coating wheel is disposed above the roller conveyor; the coating wheel is adapted to coat the surface of the silicon wafer adjacent to the coating wheel.

[0008] Optionally, the coating material is a sponge.

[0009] Optionally, the chain coating equipment also includes:

[0010] A conveying assembly is disposed above the coating wheel; the conveying assembly delivers the phosphate paste onto the coating wheel.

[0011] Optionally, the delivery assembly includes a phosphorus source dripper and a liquid storage container connected to the phosphorus source dripper; the liquid storage container contains a liquid phosphorus source.

[0012] Optionally, the phosphorus source tank is located below the roller conveyor and below the coating wheel, so that the phosphorus source on the coating wheel falls into the phosphorus source tank.

[0013] Optionally, the conveyor roller completely coats the surface of the silicon wafer near the conveyor roller using the coating member.

[0014] Optionally, the coating wheel is adapted to completely coat the surface of the silicon wafer adjacent to the coating wheel.

[0015] Optionally, the chain coating equipment also includes:

[0016] A phosphorus storage container contains a liquid phosphorus source; the phosphorus storage container is connected to the phosphorus source tank.

[0017] Optionally, the phosphorus source tank is further provided with a liquid level sensor for detecting the liquid level in the phosphorus source tank, and the liquid level sensor is communicatively connected to a liquid replenishment switch located at the outlet of the phosphorus storage container.

[0018] Optionally, the chain coating equipment also includes:

[0019] A drying device is located downstream of the coating roller and the conveyor roller along the conveying direction of the roller conveyor; the drying device performs a drying process on silicon wafers that have been coated with doped sources on the roller conveyor.

[0020] Compared with the prior art, the technical solution of this utility model has the following advantages:

[0021] 1. This utility model provides a chain coating device for liquid phosphorus source, the chain coating device comprising: a conveying assembly having a roller conveyor for conveying silicon wafers; a coating element disposed on the conveyor roller of the roller conveyor; a phosphorus source tank disposed below the roller conveyor, such that the phosphorus source in the phosphorus source tank wets the coating element on the conveyor roller; and a coating wheel disposed above the roller conveyor; the coating wheel being adapted to coat the surface of the silicon wafer near the coating wheel.

[0022] This embodiment of the invention installs a phosphorus source tank on the roller conveyor below the silicon wafer. During normal production, the coating material on the conveyor roller is continuously wetted within the phosphorus source tank, resulting in more phosphorus source adhering to the silicon wafer surface as the conveyor roller rotates. This ensures that different locations on the silicon wafer are coated with phosphorus source, leading to more uniform phosphorus source contact on the wafer surface. Consequently, the impurities and defects within the silicon wafer are significantly reduced through annealing and gettering, thereby minimizing the impact of silicon wafer quality fluctuations on efficiency, improving the convergence of electrical performance distribution, and ultimately enhancing the overall efficiency of the battery. Attached Figure Description

[0023] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0024] Figure 1 This is a schematic diagram of the overall structure of the chain coating device for liquid phosphorus source according to an embodiment of the present invention.

[0025] Figure label:

[0026] 1. Conveyor roller; 2. Phosphorus source tank; 3. Phosphorus source; 4. Coating wheel; 5. Silicon wafer; 6. Phosphorus source dripper; 7. Liquid replenishment switch; 8. Phosphorus storage container; 9. Liquid storage container; 10. Drying device. Detailed Implementation

[0027] The technical solution of this utility model will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0028] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0029] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can also refer to the internal connection of two components; and they can refer to a wireless connection or a wired connection. For those skilled in the art, the specific meaning of the above terms in this utility model can be understood according to the specific circumstances.

[0030] Furthermore, the technical features involved in the different embodiments of this utility model described below can be combined with each other as long as they do not conflict with each other.

[0031] In the photovoltaic cell manufacturing process, variations in the quality of silicon wafers used can affect the overall efficiency of the cells. Impurities such as Fe, Cu, and Co in the silicon wafers can form recombination centers, impacting the conversion efficiency of the cells. Therefore, it is necessary to use a phosphorus source for gettering, which can effectively reduce internal impurities and defects in the silicon wafers, minimize the impact of silicon wafer quality fluctuations on efficiency, improve the convergence of electrical performance distribution, and ultimately increase the overall efficiency of the cells.

[0032] Currently, when coating with phosphorus source, the phosphorus slurry is usually first delivered to a sponge roller using a fixed dropper, and then applied to the silicon wafer surface by squeezing through the sponge roller. This results in the phosphorus source being coated on only one side of the silicon wafer, affecting the annealing and gettering effect, and ultimately impacting the conversion efficiency of the solar cell.

[0033] Therefore, the technical problem to be solved by this utility model is that the silicon wafer is coated with phosphorus source on only one side in the prior art, the annealing gettering effect is poor, and the conversion efficiency of the battery cell is low. Thus, a chain coating device for liquid phosphorus source is provided.

[0034] Example 1

[0035] like Figure 1 As shown, this utility model embodiment provides a chain coating device for liquid phosphorus source 3, which includes a conveying component, a phosphorus source tank 2, and a coating wheel 4.

[0036] Specifically, in this embodiment of the invention, the conveying assembly is provided with a roller conveyor for conveying silicon wafers 5, and a coating is provided on the conveying roller 1 of the roller conveyor. The coating can be a sponge, thus forming a sponge roller with the conveying roller 1. Of course, those skilled in the art can change the material of the coating according to the actual situation. This embodiment is merely an example of the material of the coating, but it is not limited thereto, as long as the same technical effect can be achieved.

[0037] Furthermore, the phosphorus source tank 2 can be positioned below the roller conveyor, so that the phosphorus source 3 in the phosphorus source tank 2 wets the coating on the conveyor roller 1. Specifically, the phosphorus source 3 in the phosphorus source tank 2 can be added manually or replenished by an automatic replenishment device. Of course, those skilled in the art can make changes according to the actual situation. This embodiment is merely an example and is not intended to limit the scope, as long as the same technical effect can be achieved.

[0038] Furthermore, a coating wheel 4 is disposed above the roller conveyor, and the coating wheel 4 is adapted to coat the surface of the silicon wafer 5 near the coating wheel 4. The coating wheel 4 can also be a sponge roller.

[0039] This embodiment of the invention installs a phosphorus source tank 2 on the roller conveyor at the lower part of the silicon wafer 5. During normal production, the coating material on the conveyor roller 1 is continuously wetted within the phosphorus source tank 2, resulting in more phosphorus source 3 adhering to the surface of the silicon wafer 5 as the conveyor roller 1 rotates. This ensures that different locations on the silicon wafer 5 are coated with phosphorus source 3, leading to more uniform contact of phosphorus source 3 on the surface of the silicon wafer 5. Consequently, the impurities and defects in the silicon wafer 5 are significantly reduced through annealing and gettering, thereby reducing the impact of silicon wafer quality fluctuations on efficiency, improving the convergence of electrical performance distribution, and ultimately increasing the overall efficiency of the battery.

[0040] Furthermore, in an optional embodiment of this invention, the chain coating apparatus further includes a conveying assembly disposed above the coating wheel 4. The conveying assembly is used to deliver the phosphate paste onto the coating wheel 4.

[0041] Furthermore, in an optional embodiment of the present invention, the delivery assembly further includes a phosphorus source dripper 6 and a liquid storage container 9 connected to the phosphorus source dripper 6, wherein the liquid storage container 9 contains a liquid phosphorus source 3.

[0042] Furthermore, in an optional embodiment of this utility model, the phosphorus source tank 2 is located below the roller conveyor and below the coating wheel 4, so that the phosphorus source 3 on the coating wheel 4 falls into the phosphorus source tank 2.

[0043] Furthermore, in an optional embodiment of the present invention, the conveyor roller 1 completely coats the surface of the silicon wafer 5 near the conveyor roller 1 using the coating member.

[0044] Furthermore, in an optional embodiment of the present invention, the coating wheel 4 is adapted to completely coat the surface of the silicon wafer 5 near the coating wheel 4.

[0045] Furthermore, in an optional embodiment of this invention, the chain coating device further includes a phosphorus storage container 8, which contains a liquid phosphorus source 3, and the phosphorus storage container 8 is connected to the phosphorus source tank 2. The phosphorus storage container 8 is used to replenish the liquid phosphorus source 3 into the phosphorus source tank 2.

[0046] Furthermore, in an optional embodiment of this utility model, a liquid level sensor for detecting the liquid level in the phosphorus source tank 2 is also provided in the phosphorus source tank 2. The liquid level sensor is communicatively connected to a liquid replenishment switch 7 located at the outlet of the phosphorus storage container 8. Of course, those skilled in the art can select other types of automatic liquid replenishment devices according to actual conditions. This embodiment is merely an example and is not intended to limit the scope, as long as it achieves the same technical effect.

[0047] Furthermore, in an optional embodiment of the present invention, the chain coating equipment further includes a drying device 10, which is located downstream of the coating roller 4 and the conveying roller 1 along the conveying direction of the roller table; the drying device 10 performs drying treatment on the silicon wafer 5 that has been coated with doped sources on the roller table.

[0048] Obviously, the above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. However, obvious variations or modifications derived therefrom are still within the protection scope of this invention.

Claims

1. A chain coating device for liquid phosphorus source, characterized in that, include: The conveying assembly is provided with rollers for conveying silicon wafers (5); the conveying rollers (1) of the rollers are provided with coatings; A phosphorus source tank (2) is provided below the roller conveyor so that the phosphorus source (3) in the phosphorus source tank (2) wets the coating on the conveyor roller (1); A coating wheel (4) is disposed above the roller conveyor; the coating wheel (4) is adapted to coat the surface of the silicon wafer (5) near the coating wheel (4).

2. The chain coating apparatus according to claim 1, characterized in that, The coated component is a sponge.

3. The chain coating apparatus of claim 1, wherein, Also includes: A conveying assembly is disposed above the coating wheel (4); the conveying assembly delivers phosphate paste to the coating wheel (4).

4. The chain coating apparatus according to claim 3, wherein The delivery assembly includes a phosphorus source dripper (6) and a liquid storage container (9) connected to the phosphorus source dripper (6); the liquid storage container (9) contains a liquid phosphorus source (3).

5. The chain coating apparatus according to any one of claims 1 to 4, characterized in that, The phosphorus source tank (2) is located below the roller conveyor and below the coating wheel (4), so that the phosphorus source (3) on the coating wheel (4) falls into the phosphorus source tank (2).

6. The chain coating apparatus according to any one of claims 1 to 4, characterized in that, The conveyor roller (1) completely coats the surface of the silicon wafer (5) near the conveyor roller (1) using the coating material.

7. The chain coating apparatus according to any one of claims 1 to 4, characterized in that, The coating wheel (4) is adapted to completely coat the surface of the silicon wafer (5) near the coating wheel (4).

8. The chain coating apparatus according to any one of claims 1 to 4, characterized in that, Also includes: A phosphorus storage container (8) contains a liquid phosphorus source (3); the phosphorus storage container (8) is connected to the phosphorus source tank (2).

9. The chain coating apparatus of claim 8, wherein, The phosphorus source tank (2) is also equipped with a liquid level sensor for detecting the liquid level in the phosphorus source tank (2), and the liquid level sensor is communicatively connected to the liquid replenishment switch (7) located at the outlet of the phosphorus storage container (8).

10. The chain coating apparatus according to any one of claims 1 to 4, characterized in that, Also includes: The drying device (10) is located downstream of the coating wheel (4) and the conveying roller (1) along the conveying direction of the roller conveyor. The drying device (10) dries the silicon wafers (5) that have been coated with doped sources on the roller conveyor.

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